ES361728A1 - Procedimiento para la fabricacion de un material de copia fotosensitivo. - Google Patents

Procedimiento para la fabricacion de un material de copia fotosensitivo.

Info

Publication number
ES361728A1
ES361728A1 ES361728A ES361728A ES361728A1 ES 361728 A1 ES361728 A1 ES 361728A1 ES 361728 A ES361728 A ES 361728A ES 361728 A ES361728 A ES 361728A ES 361728 A1 ES361728 A1 ES 361728A1
Authority
ES
Spain
Prior art keywords
solvent
protein
solution
isopropyl alcohol
water
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
ES361728A
Other languages
English (en)
Spanish (es)
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Keuffel and Esser Co
Original Assignee
Keuffel and Esser Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Keuffel and Esser Co filed Critical Keuffel and Esser Co
Publication of ES361728A1 publication Critical patent/ES361728A1/es
Expired legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/54Absorbers, e.g. of opaque materials
    • G03F1/56Organic absorbers, e.g. of photo-resists
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03CPHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
    • G03C1/00Photosensitive materials
    • G03C1/66Compositions containing chromates as photosensitive substances
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/038Macromolecular compounds which are rendered insoluble or differentially wettable

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
  • Paints Or Removers (AREA)
ES361728A 1967-12-21 1968-12-20 Procedimiento para la fabricacion de un material de copia fotosensitivo. Expired ES361728A1 (es)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US69229167A 1967-12-21 1967-12-21

Publications (1)

Publication Number Publication Date
ES361728A1 true ES361728A1 (es) 1970-09-16

Family

ID=24779990

Family Applications (1)

Application Number Title Priority Date Filing Date
ES361728A Expired ES361728A1 (es) 1967-12-21 1968-12-20 Procedimiento para la fabricacion de un material de copia fotosensitivo.

Country Status (7)

Country Link
AT (1) AT300552B (enrdf_load_stackoverflow)
BE (1) BE725688A (enrdf_load_stackoverflow)
DE (1) DE1815393A1 (enrdf_load_stackoverflow)
ES (1) ES361728A1 (enrdf_load_stackoverflow)
FR (1) FR1597935A (enrdf_load_stackoverflow)
GB (1) GB1234236A (enrdf_load_stackoverflow)
NL (1) NL6817760A (enrdf_load_stackoverflow)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5113408B1 (enrdf_load_stackoverflow) * 1970-08-15 1976-04-28

Also Published As

Publication number Publication date
AT300552B (de) 1972-07-25
DE1815393A1 (de) 1969-07-24
GB1234236A (enrdf_load_stackoverflow) 1971-06-03
FR1597935A (enrdf_load_stackoverflow) 1970-06-29
BE725688A (enrdf_load_stackoverflow) 1969-06-18
NL6817760A (enrdf_load_stackoverflow) 1969-06-24

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