ES2723201T3 - Inyector de haces neutros basado en iones negativos - Google Patents
Inyector de haces neutros basado en iones negativos Download PDFInfo
- Publication number
- ES2723201T3 ES2723201T3 ES13765855T ES13765855T ES2723201T3 ES 2723201 T3 ES2723201 T3 ES 2723201T3 ES 13765855 T ES13765855 T ES 13765855T ES 13765855 T ES13765855 T ES 13765855T ES 2723201 T3 ES2723201 T3 ES 2723201T3
- Authority
- ES
- Spain
- Prior art keywords
- accelerator
- negative ions
- ion source
- neutral beam
- injector based
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
Classifications
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- G—PHYSICS
- G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
- G21B—FUSION REACTORS
- G21B1/00—Thermonuclear fusion reactors
- G21B1/11—Details
- G21B1/15—Particle injectors for producing thermonuclear fusion reactions, e.g. pellet injectors
-
- G—PHYSICS
- G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
- G21K—TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
- G21K1/00—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating
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- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
- H05H7/00—Details of devices of the types covered by groups H05H9/00, H05H11/00, H05H13/00
- H05H7/08—Arrangements for injecting particles into orbits
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
- H05H7/00—Details of devices of the types covered by groups H05H9/00, H05H11/00, H05H13/00
- H05H7/22—Details of linear accelerators, e.g. drift tubes
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J27/00—Ion beam tubes
- H01J27/02—Ion sources; Ion guns
- H01J27/08—Ion sources; Ion guns using arc discharge
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
- H05H7/00—Details of devices of the types covered by groups H05H9/00, H05H11/00, H05H13/00
- H05H7/08—Arrangements for injecting particles into orbits
- H05H2007/081—Sources
- H05H2007/082—Ion sources, e.g. ECR, duoplasmatron, PIG, laser sources
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
- H05H3/00—Production or acceleration of neutral particle beams, e.g. molecular or atomic beams
- H05H3/02—Molecular or atomic beam generation
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
- Y02E30/00—Energy generation of nuclear origin
- Y02E30/10—Nuclear fusion reactors
Landscapes
- Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Plasma & Fusion (AREA)
- High Energy & Nuclear Physics (AREA)
- General Engineering & Computer Science (AREA)
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Combustion & Propulsion (AREA)
- Particle Accelerators (AREA)
- Plasma Technology (AREA)
- Electron Sources, Ion Sources (AREA)
- Saccharide Compounds (AREA)
- Physical Vapour Deposition (AREA)
- Apparatus For Disinfection Or Sterilisation (AREA)
Abstract
Inyector de haces neutros basado en iones negativos que comprende una fuente de iones (110) adaptada para producir un haz de iones negativos, un acelerador (150) y un neutralizador (170), en el que el inyector de haces neutros basado en iones negativos comprende además un preacelerador (111) acoplado a la fuente de iones, y en el que el acelerador está separado de la fuente de iones por una zona de transición (205) interpuesta entre el preacelerador y el acelerador, y caracterizado por que el inyector comprende además un par de imanes deflectores (130), en la zona de transición e interpuestos entre el preacelerador y el acelerador, estando configurado el par de imanes deflectores para permitir que un haz proveniente del preacelerador se desplace fuera de eje con respecto a un eje del preacelerador y sobre un eje del acelerador antes de entrar en el acelerador, de tal manera que se reduce la afluencia de partículas en co-corriente hacia el acelerador y se evita la corriente de retorno de partículas aceleradas hacia el preacelerador y la fuente de iones.
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
RU2012137795A RU2619923C2 (ru) | 2012-09-04 | 2012-09-04 | Инжектор пучка нейтральных частиц на основе отрицательных ионов |
US201361775444P | 2013-03-08 | 2013-03-08 | |
PCT/US2013/058093 WO2014039579A2 (en) | 2012-09-04 | 2013-09-04 | Negative ion-based neutral beam injector |
Publications (1)
Publication Number | Publication Date |
---|---|
ES2723201T3 true ES2723201T3 (es) | 2019-08-22 |
Family
ID=50191556
Family Applications (2)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
ES13765855T Active ES2723201T3 (es) | 2012-09-04 | 2013-09-04 | Inyector de haces neutros basado en iones negativos |
ES19157605T Active ES2907075T3 (es) | 2012-09-04 | 2013-09-04 | Inyector de haz basado en iones negativos |
Family Applications After (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
ES19157605T Active ES2907075T3 (es) | 2012-09-04 | 2013-09-04 | Inyector de haz basado en iones negativos |
Country Status (31)
Country | Link |
---|---|
EP (2) | EP3550571B1 (es) |
JP (2) | JP6216380B2 (es) |
KR (2) | KR102208372B1 (es) |
CN (2) | CN107316662B (es) |
AU (2) | AU2013312795B2 (es) |
BR (2) | BR122020018713B1 (es) |
CA (1) | CA2883669C (es) |
CL (1) | CL2015000480A1 (es) |
CY (1) | CY1125123T1 (es) |
DK (2) | DK2893536T3 (es) |
EA (2) | EA030239B1 (es) |
ES (2) | ES2723201T3 (es) |
HK (1) | HK1214675A1 (es) |
HR (2) | HRP20220357T8 (es) |
HU (2) | HUE058277T2 (es) |
IL (2) | IL237570A (es) |
LT (2) | LT2893536T (es) |
MX (1) | MX345053B (es) |
MY (1) | MY171879A (es) |
NZ (3) | NZ705667A (es) |
PE (1) | PE20151215A1 (es) |
PH (2) | PH12015500403A1 (es) |
PL (2) | PL2893536T3 (es) |
PT (2) | PT3550571T (es) |
RS (2) | RS58649B1 (es) |
RU (1) | RU2619923C2 (es) |
SG (2) | SG11201501587WA (es) |
SI (2) | SI3550571T1 (es) |
UA (1) | UA118959C2 (es) |
WO (1) | WO2014039579A2 (es) |
ZA (1) | ZA201502214B (es) |
Families Citing this family (25)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US9591740B2 (en) | 2013-03-08 | 2017-03-07 | Tri Alpha Energy, Inc. | Negative ion-based neutral beam injector |
JP6266399B2 (ja) * | 2014-03-26 | 2018-01-24 | 住友重機械工業株式会社 | 中性子捕捉療法装置 |
RU2696268C2 (ru) * | 2014-11-19 | 2019-08-01 | Таэ Текнолоджиз, Инк. | Фотонный нейтрализатор для инжекторов пучков нейтральных частиц |
CN106932808B (zh) * | 2015-12-30 | 2023-07-14 | 核工业西南物理研究院 | 一种长脉冲主动水冷量热靶大流量的异形水路结构 |
CN106932809B (zh) * | 2015-12-30 | 2023-07-14 | 核工业西南物理研究院 | 一种w字形多板变角组合结构的主动水冷量热靶结构 |
CN106935278B (zh) * | 2015-12-30 | 2019-03-26 | 核工业西南物理研究院 | 一种中性束注入器支撑与对接装置 |
CN106507576A (zh) * | 2016-11-04 | 2017-03-15 | 中国工程物理研究院流体物理研究所 | 金属氢化物离子源的离子过滤装置、方法及中子发生器 |
US9865433B1 (en) * | 2016-12-19 | 2018-01-09 | Varian Semiconductor Equipment Associats, Inc. | Gas injection system for ion beam device |
CN106783491A (zh) * | 2016-12-23 | 2017-05-31 | 信利(惠州)智能显示有限公司 | 一种离子注入设备及其使用方法 |
CN107318213B (zh) * | 2017-07-06 | 2019-05-31 | 复旦大学 | 高电荷态离子的实验装置 |
CN107833817B (zh) * | 2017-10-18 | 2019-05-21 | 东莞中子科学中心 | 一种铯催化负氢离子潘宁源的除铯方法及除铯引出电源 |
CN107946159B (zh) * | 2017-11-24 | 2019-07-23 | 新奥科技发展有限公司 | 一种可调式离子源及静电约束聚变反应器 |
RU2683963C1 (ru) * | 2018-04-04 | 2019-04-03 | федеральное государственное автономное образовательное учреждение высшего образования "Национальный исследовательский ядерный университет "МИФИ" (НИЯУ МИФИ) | Импульсный генератор термоядерных нейтронов |
US11251075B2 (en) * | 2018-08-06 | 2022-02-15 | Mattson Technology, Inc. | Systems and methods for workpiece processing using neutral atom beams |
US11482342B2 (en) * | 2018-10-07 | 2022-10-25 | Tanner L. Horne | Nuclear fusion reactor with toroidal superconducting magnetic coils implementing inertial electrostatic heating |
CN112151196B (zh) * | 2019-06-28 | 2024-08-09 | 核工业西南物理研究院 | 一种具有三棱柱反射阵列的气体靶中性化器 |
US11678430B2 (en) | 2019-08-30 | 2023-06-13 | Tae Technologies, Inc. | Neutron generating target for neutron beam systems |
CN112927820B (zh) * | 2019-12-05 | 2024-07-16 | 核工业西南物理研究院 | 一种nnbi正负离子束偏及离子吞噬一体化结构 |
RU2735945C1 (ru) * | 2020-03-03 | 2020-11-11 | Игорь Васильевич ВИНЯР | Центробежный инжектор макрочастиц термоядерного топлива |
CN111741585B (zh) * | 2020-05-26 | 2021-09-03 | 中国原子能科学研究院 | 一种用于标记中子束无损检测的移动式d-t中子发生器 |
CN111755317B (zh) * | 2020-06-30 | 2023-03-14 | 中国科学院近代物理研究所 | 一种用于二次离子质谱仪的射频负离子源 |
RU2020124384A (ru) | 2020-07-23 | 2022-01-26 | Таэ Текнолоджиз, Инк. | Системы, устройства и способы для снижения деформации и стойкости в металлических телах |
WO2023178009A1 (en) | 2022-03-14 | 2023-09-21 | The Trustees Of Princeton University | System and method for stellarator neutron source |
WO2023178004A1 (en) | 2022-03-14 | 2023-09-21 | The Trustees Of Princeton University | Planar coil stellarator |
GB2619948B (en) * | 2022-06-22 | 2024-06-12 | Fusion Reactors Ltd | Neutral beam injection apparatus and method |
Family Cites Families (30)
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US4093858A (en) * | 1977-06-06 | 1978-06-06 | The United States Of America As Represented By The United States Department Of Energy | Cesium injection system for negative ion duoplasmatrons |
US4127442A (en) * | 1977-06-16 | 1978-11-28 | The United States Of America As Represented By The United States Department Of Energy | Charge exchange cooling in the tandem mirror plasma confinement apparatus |
SU818366A1 (ru) * | 1979-09-17 | 1987-08-23 | Московский авиационный институт им.Серго Орджоникидзе | Источник ионов |
JPS57191940A (en) * | 1981-05-22 | 1982-11-25 | Univ Kyoto | Negative hydrogen or heavy hydrogen ion source using semiconductor |
US4439395A (en) * | 1981-04-13 | 1984-03-27 | The United States Of America As Represented By The United States Department Of Energy | Neutral beamline with improved ion energy recovery |
US4588955A (en) * | 1983-06-01 | 1986-05-13 | The United States Of America As Represented By The United States Department Of Energy | Transverse field focused system |
JPH01213998A (ja) * | 1988-02-22 | 1989-08-28 | Japan Atom Energy Res Inst | 負イオン源を用いた中性粒子入射装置 |
JPH02183998A (ja) * | 1989-01-11 | 1990-07-18 | Hitachi Ltd | 中性粒子入射装置 |
US4960990A (en) * | 1989-12-26 | 1990-10-02 | The United States Of America As Represented By The Secretary Of The Army | Non coherent photoneutralizer |
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JPH0980200A (ja) * | 1995-09-08 | 1997-03-28 | Nissin Electric Co Ltd | イオン発生装置 |
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JP3789655B2 (ja) * | 1998-09-03 | 2006-06-28 | 独立行政法人 日本原子力研究開発機構 | セシウム導入装置 |
JP2002022870A (ja) * | 2000-07-13 | 2002-01-23 | Toshiba Corp | 中性粒子入射装置 |
US6534775B1 (en) * | 2000-09-01 | 2003-03-18 | Axcelis Technologies, Inc. | Electrostatic trap for particles entrained in an ion beam |
JP2003270400A (ja) * | 2002-03-18 | 2003-09-25 | Taiyo Material:Kk | 中性子発生管用pig型負イオン源 |
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US8309941B2 (en) * | 2008-05-22 | 2012-11-13 | Vladimir Balakin | Charged particle cancer therapy and patient breath monitoring method and apparatus |
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US8309936B2 (en) * | 2009-02-27 | 2012-11-13 | Trustees Of Columbia University In The City Of New York | Ion deflector for two-dimensional control of ion beam cross sectional spread |
CA2754345C (en) * | 2009-03-04 | 2015-06-23 | Zakrytoe Aktsionernoe Obshchestvo Protom | Multi-field charged particle cancer therapy method and apparatus |
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2012
- 2012-09-04 RU RU2012137795A patent/RU2619923C2/ru active
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2013
- 2013-04-09 UA UAA201503114A patent/UA118959C2/uk unknown
- 2013-09-04 AU AU2013312795A patent/AU2013312795B2/en active Active
- 2013-09-04 PL PL13765855T patent/PL2893536T3/pl unknown
- 2013-09-04 KR KR1020207022598A patent/KR102208372B1/ko active IP Right Grant
- 2013-09-04 HU HUE19157605A patent/HUE058277T2/hu unknown
- 2013-09-04 NZ NZ705667A patent/NZ705667A/en unknown
- 2013-09-04 EP EP19157605.7A patent/EP3550571B1/en active Active
- 2013-09-04 LT LTEP13765855.5T patent/LT2893536T/lt unknown
- 2013-09-04 SI SI201331969T patent/SI3550571T1/sl unknown
- 2013-09-04 KR KR1020157008630A patent/KR102144601B1/ko active Application Filing
- 2013-09-04 MY MYPI2015700550A patent/MY171879A/en unknown
- 2013-09-04 SI SI201331426T patent/SI2893536T1/sl unknown
- 2013-09-04 CN CN201710416714.4A patent/CN107316662B/zh active Active
- 2013-09-04 PL PL19157605T patent/PL3550571T3/pl unknown
- 2013-09-04 NZ NZ733021A patent/NZ733021A/en unknown
- 2013-09-04 RS RS20190414A patent/RS58649B1/sr unknown
- 2013-09-04 CA CA2883669A patent/CA2883669C/en active Active
- 2013-09-04 LT LTEP19157605.7T patent/LT3550571T/lt unknown
- 2013-09-04 PT PT191576057T patent/PT3550571T/pt unknown
- 2013-09-04 NZ NZ745718A patent/NZ745718A/en unknown
- 2013-09-04 EA EA201590506A patent/EA030239B1/ru unknown
- 2013-09-04 DK DK13765855.5T patent/DK2893536T3/en active
- 2013-09-04 MX MX2015002783A patent/MX345053B/es active IP Right Grant
- 2013-09-04 BR BR122020018713-1A patent/BR122020018713B1/pt active IP Right Grant
- 2013-09-04 SG SG11201501587WA patent/SG11201501587WA/en unknown
- 2013-09-04 RS RS20220258A patent/RS63056B1/sr unknown
- 2013-09-04 PE PE2015000285A patent/PE20151215A1/es active IP Right Grant
- 2013-09-04 DK DK19157605.7T patent/DK3550571T3/da active
- 2013-09-04 PT PT13765855T patent/PT2893536T/pt unknown
- 2013-09-04 EA EA201890602A patent/EA039453B1/ru unknown
- 2013-09-04 ES ES13765855T patent/ES2723201T3/es active Active
- 2013-09-04 HR HRP20220357TT patent/HRP20220357T8/hr unknown
- 2013-09-04 HU HUE13765855A patent/HUE043299T2/hu unknown
- 2013-09-04 JP JP2015530153A patent/JP6216380B2/ja active Active
- 2013-09-04 CN CN201380057640.XA patent/CN104903967B/zh active Active
- 2013-09-04 ES ES19157605T patent/ES2907075T3/es active Active
- 2013-09-04 BR BR112015004801-3A patent/BR112015004801B1/pt not_active IP Right Cessation
- 2013-09-04 SG SG10201705839PA patent/SG10201705839PA/en unknown
- 2013-09-04 WO PCT/US2013/058093 patent/WO2014039579A2/en active Application Filing
- 2013-09-04 EP EP13765855.5A patent/EP2893536B1/en active Active
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2015
- 2015-02-24 PH PH12015500403A patent/PH12015500403A1/en unknown
- 2015-02-27 CL CL2015000480A patent/CL2015000480A1/es unknown
- 2015-03-04 IL IL237570A patent/IL237570A/en active IP Right Grant
- 2015-03-31 ZA ZA2015/02214A patent/ZA201502214B/en unknown
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2016
- 2016-03-07 HK HK16102528.9A patent/HK1214675A1/zh unknown
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2017
- 2017-08-18 AU AU2017216558A patent/AU2017216558B2/en active Active
- 2017-08-20 IL IL254061A patent/IL254061B/en unknown
- 2017-09-22 JP JP2017182033A patent/JP6549666B2/ja active Active
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2018
- 2018-04-26 PH PH12018500893A patent/PH12018500893A1/en unknown
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2019
- 2019-04-11 HR HRP20190684TT patent/HRP20190684T1/hr unknown
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2022
- 2022-03-15 CY CY20221100205T patent/CY1125123T1/el unknown
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