ES2110956T3 - Mezcla polimerizable mediante radiacion, y procedimiento para la obtencion de una mascara de reserva de soldadura. - Google Patents

Mezcla polimerizable mediante radiacion, y procedimiento para la obtencion de una mascara de reserva de soldadura.

Info

Publication number
ES2110956T3
ES2110956T3 ES90117636T ES90117636T ES2110956T3 ES 2110956 T3 ES2110956 T3 ES 2110956T3 ES 90117636 T ES90117636 T ES 90117636T ES 90117636 T ES90117636 T ES 90117636T ES 2110956 T3 ES2110956 T3 ES 2110956T3
Authority
ES
Spain
Prior art keywords
radiation
procedure
obtaining
welding
polymerizable
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
ES90117636T
Other languages
English (en)
Inventor
Michael Dr Emmelius
Walter Dr Herwig
Kurt Erbes
Rudolf Decker
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Morton International LLC
Original Assignee
Morton International LLC
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Morton International LLC filed Critical Morton International LLC
Application granted granted Critical
Publication of ES2110956T3 publication Critical patent/ES2110956T3/es
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00—Apparatus or processes for manufacturing printed circuits
    • H05K3/22—Secondary treatment of printed circuits
    • H05K3/28—Applying non-metallic protective coatings
    • H05K3/285—Permanent coating compositions
    • H05K3/287—Photosensitive compositions
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F257/00—Macromolecular compounds obtained by polymerising monomers on to polymers of aromatic monomers as defined in group C08F12/00
    • C08F257/02—Macromolecular compounds obtained by polymerising monomers on to polymers of aromatic monomers as defined in group C08F12/00 on to polymers of styrene or alkyl-substituted styrenes
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F283/00—Macromolecular compounds obtained by polymerising monomers on to polymers provided for in subclass C08G
    • C08F283/10—Macromolecular compounds obtained by polymerising monomers on to polymers provided for in subclass C08G on to polymers containing more than one epoxy radical per molecule
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/20—Masks or mask blanks for imaging by charged particle beam [CPB] radiation, e.g. by electron beam; Preparation thereof
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • G03F7/033—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K2203/00—Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
    • H05K2203/07—Treatments involving liquids, e.g. plating, rinsing
    • H05K2203/0779—Treatments involving liquids, e.g. plating, rinsing characterised by the specific liquids involved
    • H05K2203/0786—Using an aqueous solution, e.g. for cleaning or during drilling of holes
    • H05K2203/0793—Aqueous alkaline solution, e.g. for cleaning or etching
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/136—Coating process making radiation sensitive element

Landscapes

  • Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Manufacturing & Machinery (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Non-Metallic Protective Coatings For Printed Circuits (AREA)
  • Polymerisation Methods In General (AREA)
  • Epoxy Resins (AREA)
  • Dental Preparations (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Manufacturing Of Printed Circuit Boards (AREA)
  • Macromonomer-Based Addition Polymer (AREA)
  • Adhesives Or Adhesive Processes (AREA)
  • Analysing Materials By The Use Of Radiation (AREA)
  • Reinforced Plastic Materials (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)

Abstract

SE DESCRIBE UNA MEZCLA POLIMERIZABLE POR RADIACION, QUE CONTIENE UNA COMBINACION POLIMERIZABLE; UN AGLUTINANTE POLIMERO CON UNIDADES DE ACIDO METACRIL, UN ESTER DE ACIDO METALCRIL Y UN ESTIROL EN UN CONTENIDO DEL 40 AL 65% DE PESO, UN PIGMENTO MINERAL FINO EN ACIDO DE SILICE O BASE DE SILICATO, UN INICIADOR DE FOTOPOLIMERIZACION, UNA COMBINACION CON AL MENOS DOS GRUPOS DE EPOXI EN LA MOLECULA Y UN ENDURECEDOR TERMICO PARA GRUPOS EPOXI. LA MEZCLA ES ADECUADA ESPECIALMENTE PARA MASCARA DE SOLDADURA Y PUEDE ENDURECERSE TRAS LA ILUMINACION Y DESARROLLARSE POR CALENTAMIENTO A 80 HASTA 150 C PARA UN PATRON RESISTENTE A LAS CONDICIONES DE LA SOLDADURA.
ES90117636T 1989-09-21 1990-09-13 Mezcla polimerizable mediante radiacion, y procedimiento para la obtencion de una mascara de reserva de soldadura. Expired - Lifetime ES2110956T3 (es)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE3931467A DE3931467A1 (de) 1989-09-21 1989-09-21 Durch strahlung polymerisierbares gemisch und verfahren zur herstellung einer loetstopmaske

Publications (1)

Publication Number Publication Date
ES2110956T3 true ES2110956T3 (es) 1998-03-01

Family

ID=6389856

Family Applications (1)

Application Number Title Priority Date Filing Date
ES90117636T Expired - Lifetime ES2110956T3 (es) 1989-09-21 1990-09-13 Mezcla polimerizable mediante radiacion, y procedimiento para la obtencion de una mascara de reserva de soldadura.

Country Status (15)

Country Link
US (2) US5264324A (es)
EP (1) EP0418733B1 (es)
JP (1) JP2662083B2 (es)
KR (1) KR0161970B1 (es)
AT (1) ATE162316T1 (es)
AU (1) AU633363B2 (es)
CA (1) CA2025831C (es)
DE (2) DE3931467A1 (es)
DK (1) DK0418733T3 (es)
ES (1) ES2110956T3 (es)
FI (1) FI904605A0 (es)
IE (1) IE903402A1 (es)
IL (1) IL95739A (es)
NO (1) NO904115L (es)
ZA (1) ZA907479B (es)

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JP2706858B2 (ja) * 1991-07-30 1998-01-28 富士写真フイルム株式会社 光重合性組成物
DE4142735A1 (de) * 1991-12-21 1993-06-24 Hoechst Ag Durch strahlung polymerisierbares gemisch und verfahren zur herstellung einer loetstoppmaske
US5389497A (en) * 1992-06-03 1995-02-14 Nippon Paint Co., Ltd. Method for forming patterned solder mask
DE4234072A1 (de) * 1992-10-09 1994-04-14 Morton Int Inc Durch Strahlung polymerisierbares Gemisch und Verfahren zur Herstellung einer Lötstoppmaske
DE4316087A1 (de) * 1993-05-13 1994-11-17 Morton Int Inc Verfahren zum bildmäßigen Metallisieren von strukturierten Leiterplatten
DE4336901A1 (de) * 1993-10-28 1995-05-04 Du Pont Deutschland Photopolymerisierbares Gemisch und Verfahren zur Herstellung von Lötstopmasken
US5545510A (en) * 1995-03-28 1996-08-13 Mac Dermid, Inc. Photodefinable dielectric composition useful in the manufacture of printed circuits
US5925499A (en) * 1995-08-01 1999-07-20 Morton International, Inc. Epoxy-containing waterborne photoimageable composition
US5844308A (en) * 1997-08-20 1998-12-01 Cts Corporation Integrated circuit anti-bridging leads design
US5874197A (en) * 1997-09-18 1999-02-23 E. I. Du Pont De Nemours And Company Thermal assisted photosensitive composition and method thereof
US6645696B1 (en) * 2001-11-30 2003-11-11 Euv Llc. Photoimageable composition
DE10204114A1 (de) * 2002-02-01 2003-08-14 Basf Coatings Ag Thermisch und mit aktinischer Strahlung härtbares Stoffgemisch, Verfahren zu seiner Herstellung und seine Verwendung
EP1336630A3 (en) * 2002-02-15 2003-12-10 Shipley Co. L.L.C. Functionalized polymer
JP4500657B2 (ja) * 2004-11-30 2010-07-14 旭化成イーマテリアルズ株式会社 パターン形成材料、並びにパターン形成装置及びパターン形成方法
JP2006208730A (ja) * 2005-01-27 2006-08-10 Fuji Photo Film Co Ltd パターン形成材料、並びにパターン形成装置及びパターン形成方法
JP5661293B2 (ja) * 2010-02-08 2015-01-28 太陽ホールディングス株式会社 光硬化性樹脂組成物、ドライフィルム、硬化物及びプリント配線板
JP5829035B2 (ja) * 2011-03-31 2015-12-09 太陽インキ製造株式会社 光硬化性樹脂組成物、ドライフィルム、硬化物及びプリント配線板
WO2012141153A1 (ja) * 2011-04-13 2012-10-18 太陽インキ製造株式会社 光硬化性樹脂組成物、ドライフィルム、硬化物及びプリント配線板
DE102011083791A1 (de) * 2011-09-29 2013-04-04 Robert Bosch Gmbh Verfahren zur Herstellung einer Lötverbindung
TWI547759B (zh) * 2011-09-30 2016-09-01 Taiyo Ink Mfg Co Ltd A photosensitive resin composition, a hardened film thereof, and a printed wiring board
JP2017165846A (ja) 2016-03-15 2017-09-21 アーゼッド・エレクトロニック・マテリアルズ（ルクセンブルグ）ソシエテ・ア・レスポンサビリテ・リミテ 微細パターン形成用組成物およびそれを用いた微細パターン形成方法

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Also Published As

Publication number Publication date
AU633363B2 (en) 1993-01-28
DK0418733T3 (da) 1998-09-07
ATE162316T1 (de) 1998-01-15
EP0418733B1 (de) 1998-01-14
IE903402A1 (en) 1991-04-10
US5264324A (en) 1993-11-23
EP0418733A2 (de) 1991-03-27
NO904115D0 (no) 1990-09-20
EP0418733A3 (en) 1992-03-04
DE3931467A1 (de) 1991-04-04
CA2025831A1 (en) 1991-03-22
JP2662083B2 (ja) 1997-10-08
DE59010796D1 (de) 1998-02-19
AU6304790A (en) 1991-03-28
FI904605A0 (fi) 1990-09-19
IL95739A (en) 1995-03-15
IL95739A0 (en) 1991-06-30
ZA907479B (en) 1991-06-26
NO904115L (no) 1991-03-22
JPH03164742A (ja) 1991-07-16
KR910006781A (ko) 1991-04-30
US5387486A (en) 1995-02-07
CA2025831C (en) 2001-11-20
KR0161970B1 (ko) 1999-01-15

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