ES2067410A1 - Recubrimientos de nitruro de silicio producidos mediante lampara excimera de descarga silenciosa. - Google Patents

Recubrimientos de nitruro de silicio producidos mediante lampara excimera de descarga silenciosa.

Info

Publication number
ES2067410A1
ES2067410A1 ES09301284A ES9301284A ES2067410A1 ES 2067410 A1 ES2067410 A1 ES 2067410A1 ES 09301284 A ES09301284 A ES 09301284A ES 9301284 A ES9301284 A ES 9301284A ES 2067410 A1 ES2067410 A1 ES 2067410A1
Authority
ES
Spain
Prior art keywords
ceramic coatings
use
excimer lamp
silent discharge
coatings produced
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
ES09301284A
Other languages
English (en)
Other versions
ES2067410B1 (es
Inventor
Fernandez Pio Manuel Gonzalez
Parada Eduardo Garcia
Saracho Juan Maria Pou
Fernandez Maria Dolo Fernandez
Rodriguez Julia Serra
Fong Betty Mireya Leon
Y Perez-Amor Ma Perez-Martinez
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Universidade de Vigo
Original Assignee
Universidade de Vigo
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Universidade de Vigo filed Critical Universidade de Vigo
Priority to ES9301284A priority Critical patent/ES2067410B1/es
Publication of ES2067410A1 publication Critical patent/ES2067410A1/es
Application granted granted Critical
Publication of ES2067410B1 publication Critical patent/ES2067410B1/es
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/30Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
    • C23C16/40Oxides
    • C23C16/401Oxides containing silicon
    • C23C16/402Silicon dioxide
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/30Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
    • C23C16/32Carbides
    • C23C16/325Silicon carbide
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/30Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
    • C23C16/34Nitrides
    • C23C16/345Silicon nitride
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/48Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating by irradiation, e.g. photolysis, radiolysis, particle radiation
    • C23C16/482Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating by irradiation, e.g. photolysis, radiolysis, particle radiation using incoherent light, UV to IR, e.g. lamps

Abstract

RECUBRIMIENTOS DE NITRURO DE SILICIO PRODUCIDOS MEDIANTE LAMPARA EXCIMERA DE DESCARGA SILENCIOSA. RECUBRIMIENTOS DE NITRURO DE SILICIO PUEDEN SER APLICADOS SOBRE DIFERENTES MATERIALES Y COMPONENTES POR MEDIO DE UN METODO BASADO EN LA DEPOSICION QUIMICA A PARTIR DE VAPOR INDUCIDA POR LAMPARA (LAMP-CVD). LA FLEXIBILIDAD DE ESTE METODO PERMITE CONTROLAR LAS PROPIEDADES FISICO-QUIMICAS DE LOS RECUBRIMIENTOS, SIENDO DE ESPECIAL APLICACION EN LOS CAMPOS DE LA MICROELECTRONICA, OPTOELECTRONICA, CELULAS SOLARES Y PROTECCION DE MATERIALES.
ES9301284A 1993-06-10 1993-06-10 Recubrimientos de nitruro de silicio producidos mediante lampara excimera de descarga silenciosa. Expired - Fee Related ES2067410B1 (es)

Priority Applications (1)

Application Number Priority Date Filing Date Title
ES9301284A ES2067410B1 (es) 1993-06-10 1993-06-10 Recubrimientos de nitruro de silicio producidos mediante lampara excimera de descarga silenciosa.

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
ES9301284A ES2067410B1 (es) 1993-06-10 1993-06-10 Recubrimientos de nitruro de silicio producidos mediante lampara excimera de descarga silenciosa.
PCT/ES1994/000058 WO1994029493A2 (es) 1993-06-10 1994-06-09 Recubrimientos ceramicos producidos mediante lampara excimera de descarga silenciosa

Publications (2)

Publication Number Publication Date
ES2067410A1 true ES2067410A1 (es) 1995-03-16
ES2067410B1 ES2067410B1 (es) 1995-11-01

Family

ID=8282143

Family Applications (1)

Application Number Title Priority Date Filing Date
ES9301284A Expired - Fee Related ES2067410B1 (es) 1993-06-10 1993-06-10 Recubrimientos de nitruro de silicio producidos mediante lampara excimera de descarga silenciosa.

Country Status (2)

Country Link
ES (1) ES2067410B1 (es)
WO (1) WO1994029493A2 (es)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TW200424343A (en) * 2002-09-05 2004-11-16 Asml Us Inc Low temperature deposition of silicon based thin films by single-wafer hot-wall rapid thermal chemical vapor deposition

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
ES8606524A1 (es) * 1984-09-05 1986-04-01 Thiokol Morton Inc Un procedimiento para depositar un revestimiento de un ni- truro de metal de transicion seleccionado sobre un substrato
US4910043A (en) * 1987-07-16 1990-03-20 Texas Instruments Incorporated Processing apparatus and method
EP0464515A2 (en) * 1990-06-28 1992-01-08 Kabushiki Kaisha Toshiba Method of manufacturing silicon nitride film

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4631199A (en) * 1985-07-22 1986-12-23 Hughes Aircraft Company Photochemical vapor deposition process for depositing oxide layers
JPS6274084A (en) * 1985-09-27 1987-04-04 Sanyo Electric Co Ltd Production of periodic structure film
DE3919538A1 (de) * 1989-06-15 1990-12-20 Asea Brown Boveri Beschichtungsvorrichtung
FR2651782B1 (fr) * 1989-09-14 1993-03-19 Air Liquide Procede pour la realisation d'un depot d'un revetement protecteur inorganique et amorphe sur un substrat polymerique organique.

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
ES8606524A1 (es) * 1984-09-05 1986-04-01 Thiokol Morton Inc Un procedimiento para depositar un revestimiento de un ni- truro de metal de transicion seleccionado sobre un substrato
US4910043A (en) * 1987-07-16 1990-03-20 Texas Instruments Incorporated Processing apparatus and method
EP0464515A2 (en) * 1990-06-28 1992-01-08 Kabushiki Kaisha Toshiba Method of manufacturing silicon nitride film

Also Published As

Publication number Publication date
WO1994029493A2 (es) 1994-12-22
ES2067410B1 (es) 1995-11-01
WO1994029493A3 (es) 1995-02-09

Similar Documents

Publication Publication Date Title
AU600717B2 (en) Laser energy ignition system with purging chamber
ES2120699T3 (es) Cristal dotado de al menos una capa delgada, y su procedimiento de obtencion.
AU5904090A (en) Radiation curable acryloxyfunctional silicone coating composition
DE69119408T2 (de) Primeren und verfahren zur entdeckung des papillomaviruses durch die polymerasekettenreaktion
AU5992096A (en) Solar selective surface coating
EP1186913A3 (en) Reflector for an ultraviolet lamp system
MXPA00005376A (es) Sintesis enzimatica de gangliosidos.
ZA9308551B (en) Flat glass furnaces.
ES2132557T3 (es) Cristal hidrofobo de capas multiples.
MXPA04005180A (es) Composiciones de revestimiento curables para substratos de metal.
ZA9708141B (en) Glass article having a solar control coating.
TW376405B (en) Lithium and potassium copolysilicate barrier coatings
AU2121897A (en) Quick acting chemical sterilant
SG54564A1 (en) Semi-selective chemical vapor deposition
DE69614683T2 (de) Überzugszusammensetzung mit verbesserter haftung auf substrat
DE69421699D1 (de) Kohlenstoffzusammensetzungen und verfahren zur vorbereitung nichtleitender substrate zum elektrochemischen beschichten
ES8602974A1 (es) Un procedimiento de depositar una pelicula de aleacion semi-conductora amorfa sobre un sustrato
DE69407811T2 (de) Abreibbare plasma gespritzte dichtungen für gasturbinen
GR3024043T3 (en) Antifouling coating composition.
AU7556594A (en) Method for forming controlled release polymeric substrate
SG170616A1 (en) Diffusion barrier coatings having graded compositions and devices inforporting the same
NZ286285A (en) Substrate with mixed metal oxide coating which also contains phosphorus, aluminium or boron
HK1013180A1 (en) Sub-orbital high altitude communications system
GB0122692D0 (en) Soil-resistant coating for glass surfaces
NZ201906A (en) Surface coating plastics substrates in high intensity pulsed gas plasma

Legal Events

Date Code Title Description
FD2A Announcement of lapse in spain

Effective date: 20141120