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The present application claims priority to
Chinese Patent Application No. 202310859027.5, filed on July 13, 2023 , the entire contents of which are incorporated herein by reference.
TECHNICAL FIELD
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The present application relates to the technical field of separation and purification, and in particular to an electrode for plasma generation, a plasma generation device and a purification device.
BACKGROUND
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In the related art, electrodes used to generate plasma in plasma generation devices are mostly plate electrodes. Such plasma generation devices have an extremely small plasma coverage area, often on the micrometer scale, and are unable to effectively purify air, water, or other objects.
SUMMARY
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The main purpose of the present application is to provide an electrode for plasma generation, a plasma generation device and a purification device, aiming to increase the plasma coverage area generated by the plasma generation device and improve the purification effect.
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To achieve the above purpose, the present application proposes an electrode for plasma generation, and at least a part of the electrode for plasma generation is provided with a hollowed-out structure.
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In an embodiment of the present application, a minimum distance between any point in the hollowed-out structure and a hollowed-out edge of the electrode for plasma generation is d, and d is less than or equal to 2.5 mm.
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In an embodiment of the present application, the hollowed-out structure is provided throughout the electrode for plasma generation.
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In an embodiment of the present application, the electrode for plasma generation is provided to surround a cylindrical structure with a hollowed-out surface, and an installation space is formed in the cylindrical structure.
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In an embodiment of the present application, the electrode for plasma generation includes at least one spiral electrode.
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In an embodiment of the present application, the electrode for plasma generation includes two spiral electrodes, and the two spiral electrodes have opposite spiral directions and cross each other; and/or
the spiral electrodes are metal wires or metal flat strips extending spirally.
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In an embodiment of the present application, the electrode for plasma generation further includes at least two strip electrodes arranged side by side.
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In an embodiment of the present application, the electrode for plasma generation further includes:
- a connection electrode, the connection electrode is arranged at an angle to the at least two strip electrodes and connected to each of the at least two strip electrodes; and/or
- the at least two strip electrodes are metal wires or metal flat strips.
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In an embodiment of the present application, the electrode for plasma generation is a plate-shaped electrode provided with a plurality of hollowed-out holes; or
the electrode for plasma generation is a mesh-shaped electrode.
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In an embodiment of the present application, the electrode for plasma generation further includes:
- a plurality of point-shaped electrodes arranged in a lattice; and/or
- a plurality of block-shaped electrodes arranged in a lattice.
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The present application further proposes a plasma generation device, including:
- a first electrode;
- a dielectric layer provided at a surface of the first electrode; and
- a second electrode provided at a side of the dielectric layer away from the first electrode and covering at least a part of the dielectric layer, the second electrode is the electrode for plasma generation as described above.
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In an embodiment of the present application, the first electrode is a linear electrode, and the second electrode is provided to surround a periphery of the first electrode.
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In an embodiment of the present application, a voltage U applied to the second electrode of the plasma generation device satisfies: U is less than or equal to 3 kV.
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The present application further proposes a purification device, including: the plasma generation device as described above.
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In the technical solution of the present application, the electrode for plasma generation with the hollowed-out structure is provided, which can be applied in the plasma generation device and exposed to the environment to be purified. At least a part of the electrode for plasma generation exposed to the environment to be purified is hollowed out, which, on the one hand, effectively increases the outer extension of the electrode while using the same amount of material, and on the other hand, at the position of the hollowed-out structure, the plasma coverage areas generated by the partial electrodes enclosing the hollowed-out area are connected to each other, reducing the overlapping plasma coverage areas. This enables the plasma generation device to obtain a larger plasma coverage area when the same discharge voltage is applied, ensuring that the generated plasma is in full contact with external substances such as air or water, so as to effectively purify and disinfect the air, water, fabrics, skin, material surfaces, etc., and improve the purification effect.
BRIEF DESCRIPTION OF THE DRAWINGS
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To more clearly illustrate the technical solutions in the embodiments of the present application or in the related art, accompanying drawings required for the descriptions of the embodiments or the related art will be described briefly below. Obviously, the accompanying drawings described below are only some embodiments of the present application. For those skilled in the art, without inventive effort, other drawings can also be obtained based on the structures shown in these drawings.
- FIG. 1 is a structural diagram of a plasma generation device according to a first embodiment of the present application.
- FIG. 2 is a structural diagram of the plasma generation device according to a second embodiment of the present application.
- FIG. 3 is a structural diagram of an electrode for plasma generation with a strip-shaped mesh structure according to an embodiment of the present application.
- FIG. 4 is a structural diagram of the plasma generation device according to a third embodiment of the present application.
- FIG. 5 is a structural diagram of the electrode for plasma generation with a plate-shaped open-hole structure according to an embodiment of the present application.
- FIG. 6 is a structural diagram of the plasma generation device according to a fourth embodiment of the present application.
- FIG. 7 is a structural diagram of the plasma generation device according to a fifth embodiment of the present application.
- FIG. 8 is a structural diagram of the electrode for plasma generation with a mesh structure according to an embodiment of the present application.
- FIG. 9 is a structural diagram of the plasma generation device according to a sixth embodiment of the present application.
- FIG. 10 is a structural diagram of the electrode for plasma generation with a mesh structure according to another embodiment of the present application.
- FIG. 11 is a structural diagram of the plasma generation device according to a seventh embodiment of the present application.
- FIG. 12 is a structural diagram of the electrode for plasma generation with a partial hollowed-out structure according to an embodiment of the present application.
- FIG. 13 is a structural diagram of the plasma generation device according to an eighth embodiment of the present application.
- FIG. 14 is a structural diagram of the plasma generation device according to a ninth embodiment of the present application.
- FIG. 15 is a structural diagram of the plasma generation device according to a tenth embodiment of the present application.
- FIG. 16 is a structural diagram of the plasma generation device according to an eleventh embodiment of the present application.
- FIG. 17 is a structural diagram of the plasma generation device according to a twelfth embodiment of the present application.
Description of reference signs:
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| reference sign |
name |
reference sign |
name |
| 100 |
plasma generation device |
13 |
connection electrode |
| 10 |
electrode for plasma generation |
30 |
first electrode |
| 11 |
strip electrode |
50 |
dielectric layer |
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The realization of the objectives, functional features and advantages of the present application will be further described in conjunction with embodiments and with reference to the accompanying drawings.
DETAILED DESCRIPTION OF THE EMBODIMENTS
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The technical solutions in the embodiments of the present application will be described clearly and completely below in conjunction with the accompanying drawings. Obviously, the described embodiments are only some rather than all of the embodiments of the present application. Based on the embodiments of the present application, all other embodiments obtained by those skilled in the art without inventive efforts are within the scope of the present application.
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It should be noted that all directional indications in the embodiments of the present application (such as up, down, left, right, front, back, etc.) are only used to explain the relative position relationship, movement status, etc. between the various components under a certain specific posture (as shown in the figures). If the specific posture changes, the directional indication will also change accordingly.
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In the present application, unless otherwise specified or limited, the terms "connection" and "fixation" should be understood in a broad sense. For example, "fixation" can be fixed connection, detachable connection, or integration; can be mechanical connection or electrical connection; can be direct connection or indirect connection through an intermediate medium; can be internal communication between two elements or interaction between two elements, unless otherwise specified. For those skilled in the art, the specific meanings of the above terms in the present application can be understood according to specific circumstances.
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In addition, the descriptions of "first" and "second" in the present application are for descriptive purposes only and should not be understood as indicating or implying their relative importance or implicitly indicating the number of the technical features indicated. Therefore, the features defined as "first" and "second" may explicitly or implicitly include at least one of such features. In addition, the technical solutions between the various embodiments can be combined with each other, but this must be based on the fact that they can be implemented by those skilled in the art. When the combination of technical solutions is contradictory or cannot be implemented, it should be deemed that such combination of technical solutions does not exist and is not within the scope of the present application.
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The present application provides an electrode for plasma generation 10, which is applied in a plasma generation device 100. It should be understood that the working principle of the plasma generation device 100 is to form a positive or negative voltage between two electrodes. A dielectric layer 50 between the two electrodes can form dielectric barrier discharge. When a voltage of sufficient intensity is applied between the two electrodes, the air between the two electrodes is ionized to generate plasma. The generated plasma propagates from the electrode for plasma generation 10 for a distance along the surface of the dielectric, covers the periphery of the electrode for plasma generation 10, purifies the air, water, fabrics, skin, material surfaces, etc. that come into contact with the plasma to remove toxic and harmful substances from the substances. In addition, the plasma generation device 100 can be applied in a purification device, such as air conditioners, air purifiers, and floor scrubbers, to reduce the toxic and harmful substances contained in the air blown out by air conditioners and air purifiers, and to purify, sterilize, and disinfect the water used for cleaning in floor scrubbers. It can also be other purification device, such as for purification and disinfection of fabrics, skin, or material surfaces, etc., which is not limited here.
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Please refer to FIG. 1 to FIG. 13, in some embodiments of the present application, at least a part of the electrode for plasma generation 10 is provided with a hollowed-out structure.
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In this embodiment, at least a part of the electrode for plasma generation 10 is provided with a hollowed-out structure. The electrode for plasma generation 10 may be made of a rigid material to form a plate-shaped electrode with hollowed-out holes, or include a plurality of dot / block electrodes spaced apart. The electrode for plasma generation 10 may also be made of a flexible and easily shaped metal material, such as metal wire, metal strip or metal lines, weave into a mesh electrode wound into a spiral structure, or formed into a structure of arbitrary shapes. The hollowed-out structure may be a single hollowed-out hole or at least two hollowed-out holes arranged at intervals. The hollowed-out holes may be circular, square, or other regular or irregular shapes. They may also be mesh holes on a mesh electrode, interlayer gaps of a spiral electrode, or spacing areas between adjacent dot/block electrodes when the electrode for plasma generation 10 includes a plurality of dot/block electrodes arranged at intervals. In addition, the hollowed-out structure can be provided only in a part of the electrode for plasma generation 10, and the other part of the electrode for plasma generation 10 is a complete and continuous electrode surface, that is, the electrode for plasma generation 10 has a complete electrode surface with a limited size area. It can be understood that, in this case, under the same material usage, the provision of the hollowed-out structure can increase the forming area or length of the electrode for plasma generation 10. Conversely, under the same purification environment, the provision of the hollowed-out structure can reduce the material usage of the electrode for plasma generation 10.
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As for the plasma coverage area formed by the electrode for plasma generation 10, after the plasma generation device 100 generates plasma, the plasma will propagate from the electrode for plasma generation 10 for a distance along the surface of the medium, and cover the periphery of the electrode for plasma generation 10. It can be understood that for a planar electrode without the hollowed-out structure, it is equivalent to arranging multiple linear electrodes or dot/block electrodes without gaps. In this case, the plasma coverage area formed by the periphery of each linear electrode or dot/block electrode will overlap with the plasma coverage area formed by the adjacent electrode. In the electrode for plasma generation 10 proposed in this embodiment, adjacent linear or dot/block electrodes are spaced apart at the position of the hollowed-out structure. The plasma diffuses to the hollowed-out area along the surface of the dielectric, reducing the overlap of adjacent plasma coverage areas. The plasma coverage areas formed by adjacent electrodes can be connected to each other, enabling the plasma generation device 100 to obtain a larger plasma coverage area when the same discharge voltage is applied, and fully utilizes the plasma in the plasma coverage area formed around each electrode. This ensures that the generated plasma is in full contact with external substances such as air or water to effectively purify and disinfect the air, water, fabrics and other substances, thereby improving the purification effect.
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It should be noted that, in this embodiment, the electrode for plasma generation 10 may be provided with the hollowed-out structure only in a part of the area as shown in FIG. 12 and FIG. 13, or the hollowed-out structure may be provided throughout the entire electrode for plasma generation 10. When the hollowed-out structure is provided throughout the entire electrode for plasma generation 10, the plasma coverage area at each position of the electrode for plasma generation 10 can be fully utilized, thereby further improving the utilization efficiency of the plasma. However, in some embodiments, based on the convenience of connecting the electrode for plasma generation 10 to an external power source, or the convenience of installing the electrode for plasma generation 10 and the installation strength and stability, a partial area of the electrode for plasma generation 10 may be provided as a complete planar electrode area, thereby obtaining a larger plasma coverage area, improving the utilization efficiency of the plasma, and meeting other usage or installation requirements.
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Therefore, it can be understood that, in the technical solution of the present application, the electrode for plasma generation 10 with the hollowed-out structure is provided, which can be applied in the plasma generation device 100 and exposed to the environment to be purified. The at least a part of the electrode for plasma generation 10 exposed to the environment to be purified is hollowed out; on the one hand, under the premise of using the same amount of material, the outer extension of the electrode is equivalently increased; on the other hand, at the hollowed-out structure, the plasma coverage areas generated by the partial electrodes enclosing the hollowed-out part are connected to each other, reducing the overlapping plasma coverage areas. This enable the plasma generation device 100 to obtain a larger plasma coverage area when the same discharge voltage is applied, ensuring that the generated plasma is in full contact with external substances such as air or water to effectively purify and disinfect the air, water, fabrics, skin, material surfaces, etc., thereby improving the purification effect.
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In an embodiment of the present application, a minimum distance between any point in the partially hollowed portion of the electrode for plasma generation 10 and the hollowed edge is d, and d is less than or equal to 2.5 mm.
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In the present application, the hollowed-out structure is provided at the electrode for plasma generation 10 to reduce the overlap of the plasma coverage area between the electrodes, thereby obtaining a larger plasma coverage area. It can be understood that each hollowed-out position in the hollowed-out structure has a hollowed-out edge formed by the electrode, and the plasma in the hollowed-out position is also formed by diffusing inward from the electrode at the hollowed-out edge. In this embodiment, the distance d between any point in the partially hollowed-out position of the hollowed-out structure and the electrode at its nearest hollowed-out edge is limited to 2.5 mm. Within the scope of electrical safety, the maximum length of the plasma generated when the maximum voltage is applied and diffused outward from the electrode is about 2.5 mm. Therefore, if the distance between a certain point in the hollowed-out position and the nearest hollowed-out edge exceeds the diffusion length of the plasma, it is easy to cause the generated plasma coverage area to fail to completely cover the surface of the hollowed-out dielectric layer 50. That is, under the condition of the same external electrode volume or the same total coverage area, a part of the gap in the hollowed-out position is not covered by the plasma. When the distance d between any point in the hollowed-out position and the electrode at its nearest hollowed-out edge is not greater than 2.5 mm, if the maximum applied voltage does not exceed the safe power use conditions, the generated plasma area can cover the hollowed-out position, thereby having a good purification effect within the range of the hollowed-out position. The value of d can be determined based on the applied voltage, for example, it can be 0.1 mm, 0.5 mm, 1 mm, 1.5 mm, 2 mm, or 2.5 mm, as well as any value within 2.5 mm. It should be noted that with the development of technology, such as changes in the material of the plasma-generating electrode 10, the material of the dielectric layer 50, the plasma generation environment, and the range of applicable voltage values, those skilled in the art may adjust the value of d based on different conditions, and adopt other sizes that have similar effects to 2.5 mm under different conditions, and can even be greater than 2.5 mm.
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When a voltage is applied to the two electrodes of the plasma generation device 100 to generate plasma, the higher the voltage, the larger the plasma coverage area. However, if the voltage is too high, not only the energy consumption increases, but also the technical risk during operation is greatly increased. In addition, the plasma coverage area increased by increasing the voltage is limited. When a low voltage of 3 kV or less is applied to the plasma generation device 100, the technical risk is low and the power is relatively low. By observing the surface of the plasma generation device 100 during the discharge process, it can be determined whether the plasma completely covers the surface of the dielectric layer 50. If the overall electron density on the surface of the dielectric layer 50 is greater than 1.0*1018, uniform purple light can be observed on the surface of the plasma generation device 100, and the purple light completely covers the surface of the plasma generation device 100, which can be determined that the dielectric layer 50 is completely covered by the plasma. If the overall electron density on the surface of the dielectric layer 50 is less than 1.0*1018, the purple light cannot evenly cover the surface of the plasma generation device 100, and obvious dark stripes extending along the outer electrode can be observed, so that the minimum distance between any point in the hollowed-out area and the outer electrode does not exceed 2.5 mm. At this time, taking the critical value of 2.5 mm, the plasma can achieve full coverage of the dielectric layer 50 under the driving voltage of 3 kV. When the distance exceeds 2.5 mm, it is difficult for the plasma reactor to achieve full coverage at a voltage below 3 kV. It can be understood that, if the voltage is further increased, there will inevitably be a higher voltage at which the dielectric layer 50 of the plasma generation device 100 is completely covered by the plasma. However, excessively high voltages increase energy consumption and significantly increase technical risks, with serious negative consequences for manufacturing and practical applications. However, with the development of technology, the safe operating voltage range may gradually expand. In this case, the value of d at the hollowed-out area can be appropriately increased, so that complete coverage can be achieved even when d exceeds 2.5 mm. That is, in this embodiment, the maximum value of the distance d between any point in the hollowed-out area and the hollowed-out edge is limited to 2.5 mm. This allows the generated plasma to completely cover the surface of the plasma generation device 100 under the current safety voltage of 3 kV or less, in a low-voltage and low-energy application environment, thereby obtaining the maximum plasma coverage area.
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In addition, it should be noted that when each point of each hollowed-out position in the hollowed-out structure of the electrode for plasma generation 10 meets the above-mentioned size restrictions, the hollowed-out structure of the electrode for plasma generation 10 can be completely covered by the plasma, thereby achieving a more excellent purification effect. However, when only a part of the hollowed-out positions in the hollowed-out structure meet the above-mentioned size restrictions, the purification effect of the plasma generation device 100 can also be improved to a certain extent.
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Referring to FIG. 5, in an embodiment of the present application, the hollowed-out structure is provided throughout the electrode for plasma generation 10.
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In this embodiment, the hollowed-out structure is provided throughout the entire electrode for plasma generation 10, for example, a plate-shaped or cylindrical electrode with uniform openings, a mesh electrode, a spiral electrode is adopted, or a plurality of dot/block electrodes arranged in an array are provided. That is, the electrode for plasma generation 10 is divided into multiple areas according to a preset size, and each area has a hollowed-out structure. This arrangement allows the plasma coverage area at each position of the electrode for plasma generation 10 to be fully utilized. When using the same voltage material, the electrode for plasma generation 10 has a longer extension, which can achieve a larger plasma coverage area and further improve the utilization efficiency of the plasma. The hollowed-out structures provided on the plasma generation device 10 can be evenly distributed as shown in FIG. 3 to FIG. 11, or unevenly distributed as shown in FIG. 14 to FIG. 17, which is not limited here.
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Referring to FIG. 1 and FIG. 2, in an embodiment of the present application, the electrode for plasma generation 10 is provided to surround a cylindrical structure with a hollowed-out surface, and an installation space is formed in the cylindrical structure.
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The plasma generation device 100 includes a first electrode 30, a dielectric layer 50 and a second electrode. The electrode for plasma generation 10 proposed in the embodiment of the present application is used for the second electrode. The dielectric layer 50 is provided between the first electrode 30 and the second electrode to form a dielectric barrier discharge. In this embodiment, the first electrode 30 and the dielectric layer 50 are both provided within the second electrode, and the dielectric layer 50 is provided around the first electrode 30, so that the electrode for plasma generation 10 serving as the second electrode is a hollowed-out cylindrical structure provided around the dielectric layer 50, and its cross-section can be any shape such as a circle, an ellipse, a rectangle, a triangle, or other polygons. The hollowed-out cylindrical structure can be a spiral electrode formed by winding a metal wire, or a mesh electrode provided around it, an electrode structure with a cylindrical opening, or a plurality of dot/block electrode structures arranged around it, which is not limited here. This arrangement allows the plasma generation device 100 to form a coaxial wrapped structure with a spatial structural form, which can fully utilize the surface area of the first electrode 30 when the volume of the first electrode 30 is constant, resulting in a relatively larger discharge area between the first electrode 30 and the second electrode. Alternatively, when the discharge area of the plasma generation device 100 is constant, by making full use of the surface area of the first electrode 30, the volume of the first electrode 30 can be made relatively smaller, which in turn allows the volumes of the dielectric layer 50 and the second electrode to also be relatively smaller. Ultimately, the plasma generation device of the present application can achieve better purification performance while also being more compact.
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It should be noted that when the electrode for plasma generation 10 of this embodiment is used, and is a spiral electrode, a mesh electrode or a point block electrode, the dielectric layer 50 can serve as an attachment base for the electrode for plasma generation 10 and can be a rigid or flexible material that is easy to shape, so that the electrode for plasma generation 10 can be shaped into the desired structural form by relying on the dielectric layer 50.
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Referring to FIG. 1, in an embodiment of the present application, the electrode for plasma generation 10 includes at least one spiral electrode.
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This embodiment is one form of the electrode for plasma generation 10. A single spiral electrode can be formed by winding a single metal wire or flat metal strip around the outside of a dielectric layer 50. Alternatively, at least two spiral electrodes can be wound around the outside of the dielectric layer 50. The two spiral electrodes can have the same rotational direction or, as in the following embodiment, opposite rotational directions, such that the two spiral electrodes intersect. A hollowed-out gap is formed between adjacent layers of the spiral electrodes. In some embodiments, the minimum distance between any point in the partially hollowed-out portion of the electrode for plasma generation 10 and the hollowed-out edge is limited by a dimension d. In this case, for a single spiral electrode, the spiral spacing between adjacent layers is not more than 2d, thereby ensuring that the minimum distance between any point between adjacent layers and the spiral electrode meets the above dimension limitation, thereby ensuring that the generated plasma can cover the entire interlayer gap and improve the purification effect.
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Referring to FIG. 2, in an embodiment of the present application, the electrode for plasma generation 10 includes two spiral electrodes, which rotate in opposite directions and cross each other.
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This embodiment is one form of the electrode for plasma generation 10. The electrode for plasma generation 10 has a double helix structure, and the two spiral electrodes cross each other and rotate in opposite directions. Similarly, the position not covered by the spiral electrodes is the hollowed-out area, and the dielectric layer 50 located inside is exposed in the hollowed-out area. When the plasma is generated, the plasma diffuses from the spiral electrodes along the surface of the dielectric layer 50 into the hollowed-out area to cover the hollowed-out area, increasing the contact area between the plasma and external substances such as air or water, and achieving a better purification effect.
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In an embodiment of the present application, the spiral electrode is a spirally extended metal wire or metal flat bar. A spiral electrode formed from a metal wire uses less material, significantly reducing material usage and providing better plasma coverage at the same discharge voltage. While winding a metal flat strip to form a spiral electrode increases the contact area between the electrode for plasma generation 10 and the dielectric layer 50, which can improve the structural strength and stability of the electrode for plasma generation 10 when wound around the dielectric layer 50, prevent the electrode for plasma generation 10 from sliding, and ensure the stable performance of the plasma generation device.
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Referring to FIG. 3 and FIG. 4, in an embodiment of the present application, the electrode for plasma generation 10 includes at least two strip electrodes 11 arranged side by side.
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This embodiment is another form of the plasma-generating electrode 10, including at least two strip electrodes 11 arranged side by side. The gap between two adjacent strip electrodes 11 is a hollowed-out gap. The at least two strip electrodes 11 can be arranged side by side on a flat or curved surface, depending on actual needs. This provides high flexibility in shaping and is suitable for structural layouts that do not require purification. When the voltage is applied to the electrode for plasma generation 10, the voltage can be applied individually to each strip electrode 11, or can be applied through the connection electrode 13 as described in the following embodiments, which is not limited here.
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Referring to FIG. 3 and FIG. 4, in an embodiment of the present application, the electrode for plasma generation 10 further includes a connection electrode 13. The connection electrode 13 is provided at an angle to the strip electrodes 11 and is connected to each of the strip electrodes 11.
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In this embodiment, the electrode for plasma generation 10 further includes the connection electrode 13, and the connection electrode 13 is provided at an angle to and connected to each strip electrode 11. With such a configuration, the structure of the electrode for plasma generation 10 can be continuously integrated by connecting the strip electrodes 11 through the connection electrode 13, thereby preventing the electrodes from being scattered or lost. In addition, the connection electrode 13 can be connected to an external power source to apply an external voltage to the connection electrode 13 and each strip electrode 11, thereby improving the connection convenience of the electrode for plasma generation 10, and making the strip electrodes 11 be roughly connected in parallel. The voltages of the strip electrodes 11 are consistent, and the amount and extension range of the generated plasma are roughly the same, thereby improving the consistency of the purification effect at various positions of the plasma generation device 100.
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In an embodiment of the present application, the strip electrodes 11 are metal wires or metal flat strips. The strip electrode 11 formed from a metal wire uses less material, significantly reducing material usage and achieving better plasma coverage at the same discharge voltage. While winding a metal flat strip to form a strip electrode 11 increases the contact area between the electrode for plasma generation 10 and the dielectric layer 50, which can improve the structural strength and stability of the electrode for plasma generation 10 when provided at the dielectric layer 50, prevent the electrode for plasma generation 10 from sliding, and ensure the stable performance of the plasma generation device.
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Referring to FIG. 5, FIG. 6, FIG. 12 and FIG. 13, in an embodiment of the present application, the electrode for plasma generation 10 is a plate-shaped electrode having a plurality of hollowed-out holes.
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This embodiment is another form of the electrode for plasma generation 10, namely, a hollowed-out structure is formed by machining the plate-shaped electrode to form the hollowed-out holes. The hollowed-out holes can be circular holes, square holes, or holes with other regular or irregular shape. The plate-shaped electrode can be a flat plate or a curved plate, or can be formed into a cylindrical structure, which is not limited here. The electrode for plasma generation 10 is formed by machining hollowed-out holes on the plate-shaped electrode. The electrode for plasma generation 10 has a high structural strength and is not easily deformed or damaged, which also protects the dielectric layer 50 and the first electrode 30 covered therewith, thereby effectively ensuring the stable performance of the electrode for plasma generation 10 and the plasma generation device 100.
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Referring to FIG. 8 to FIG. 11, in an embodiment of the present application, the electrode for plasma generation 10 is a mesh electrode.
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This embodiment is another form of the electrode for plasma generation 10. The electrode for plasma generation 10 is configured as a mesh structure, and the mesh holes are hollowed-out positions. The mesh structure can be a chain link mesh, a woven mesh, or other mesh forms, which is not limited here. When the electrode for plasma generation 10 is configured as the mesh structure, on the one hand, the electrode for plasma generation 10 is easy to shape and can be bent to wrap around the dielectric layer 50; on the other hand, compared to the spiral electrode, the mesh electrode has a higher structural strength, and the intersection positions of the mesh holes are interconnected, making the structure less prone to disorganization and more stable.
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Referring to FIG. 7, in an embodiment of the present application, the electrode for plasma generation 10 includes a plurality of point electrodes arranged in a lattice; and/or, the electrode for plasma generation 10 includes a plurality of block electrodes arranged in a lattice.
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In this embodiment, the plurality of point electrodes or block electrodes are applied to the surface of the dielectric layer 50 as the second electrode, and the gap between two adjacent electrodes is the hollowed-out position. The combined electrode structure of split point electrodes and block electrodes can make the electrode for plasma generation 10 have higher scene applicability. According to the purification environment, the structural form of the dielectric layer 50 or the first electrode 30, the positions and gaps of each point electrode and block electrode can be freely combined and set, thereby further improving the applicability of the electrode for plasma generation 10.
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Referring to FIG. 1 and FIG. 2, the present application further provides a plasma generation device 100, including a first electrode 30, a dielectric layer 50 and a second electrode. The dielectric layer 50 is provided at the surface of the first electrode 30. The second electrode is provided on a side of the dielectric layer 50 away from the first electrode 30 and covers at least a part of the dielectric layer 50, and the electrode for plasma generation 10 as described in any one of the above embodiments is used. In the plasma generation device 100, since a positive or negative voltage is generated between the first electrode 30 and the second electrode, the dielectric layer 50 between the two electrodes can form a dielectric barrier discharge. When a voltage of sufficient intensity is applied between the two electrodes, the air between the two electrodes is ionized to generate plasma. The generated plasma propagates along the surface of the dielectric for a distance from the electrode for plasma generation 10, covers the periphery of the electrode for plasma generation 10, and purifies the air, water, fabric, skin, material surface, etc. that come into contact with the plasma, thereby removing toxic and harmful substances from the substances.
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The second electrode is the electrode for plasma generation 10 proposed in any of the above embodiments and is exposed to the environment to be purified. At least a part of the electrode for plasma generation 10 is hollowed out. On the one hand, under the premise of using the same amount of material, the outer extension of the electrode is equivalently increased. On the other hand, at the hollowed-out structure, the plasma coverage areas generated by the partial electrodes enclosing the hollowed-out structure are connected to each other, thereby reducing the overlapping plasma coverage areas. This allows the plasma generation device 100 to obtain a larger plasma coverage area when the same discharge voltage is applied, ensuring that the generated plasma is in full contact with external substances such as air or water, so as to effectively purify and disinfect the air, water and other substances, and improve the purification effect.
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In an embodiment of the present application, the first electrode 30 is a linear electrode, and the second electrode is provided to surround the periphery of the first electrode 30.
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In this embodiment, the first electrode 30 is the linear electrode, the dielectric layer 50 is wound around the outer side of the first electrode 30, and the second electrode is wound around the outer side of the dielectric layer 50. That is, the electrode for plasma generation 10 serving as the second electrode is a hollowed-out cylindrical structure wound around the dielectric layer 50, and its cross-section can be any shape such as a circle, an ellipse, a rectangle, a triangle, or other polygons. The hollowed-out cylindrical structure can be a spiral electrode formed by winding a metal wire, or a mesh electrode arranged in a surrounding manner, an electrode structure with a cylindrical opening, or a plurality of point block electrode structures arranged in a surrounding manner, which is not limited here. With such a configuration, the plasma generator 100 forms a coaxial wrapped structure and has a spatial structural form. When the volume of the first electrode 30 is constant, the surface area of the first electrode 30 can be fully utilized, resulting in a relatively larger discharge area between the first electrode 30 and the second electrode. Alternatively, when the discharge area of the plasma generator 100 is constant, since the surface area of the first electrode 30 is fully utilized, the volume of the first electrode 30 can be relatively smaller, and the volume of the dielectric layer 50 and the second electrode can also be relatively smaller. Ultimately, the plasma generating of the present application can achieve better purification performance and a more compact size.
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It should be noted that when the electrode for plasma generation 10 of this embodiment is a spiral electrode, a mesh electrode, or a dot/block electrode, the dielectric layer 50 can serve as an attachment base for the electrode for plasma generation 10 and can be made of a rigid or flexible material that is easy to shape, so that the electrode for plasma generation 10 can be shaped into the desired structural form by the dielectric layer 50.
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In an embodiment of the present application, the voltage U applied to the second electrode of the plasma generating device 100 satisfies U ≤ 3 kV.
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In this embodiment, in the plasma generation device 100, the voltage U applied to the second electrode satisfies that U does not exceed the short-time power frequency withstand voltage of 3 kV to meet the electrical safety range. At this time, when the hollowed-out structure on the electrode for plasma generation 10, i.e., the second electrode, satisfies that the minimum distance d between any point at the hollowed-out structure and the hollowed-out edge does not exceed 2.5 mm, and the generated plasma completely covers the surface of the dielectric layer when the applied voltage is 3 kV. When the minimum distance between any point at the hollowed-out structure and the hollowed-out edge is smaller, the applied voltage can be appropriately reduced to reduce the output power. It should be noted that with the development of technology, such as the material of the electrode for plasma generation 10, the material of the dielectric layer 50, the plasma generation environment, the change in the range of safe voltage values that can be applied, etc., those skilled in the art can adopt other voltage values with similar effects to 3kV according to different conditions, including but not limited to greater than 3kV.
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The present application also proposes a purification device, which includes the aforementioned plasma generation device 100. The purification device proposed in the present application may be, but is not limited to, an air conditioner, an air purifier, a floor scrubber, etc. The plasma generation device 100 provided in the purification device, when in operation, generates plasma that can reduce toxic and harmful substances contained in the air blown out by air conditioners and air purifiers, and purify, sterilize and disinfect the water used for cleaning in floor scrubbers. Other purification devices are also possible and are not limited here. Since the purification device proposed in the present application uses the technical solutions of all embodiments of the aforementioned electrode for plasma generation 10 and plasma generation device 100, it has at least all the advantages brought by all the aforementioned technical solutions, which will not be detailed here.
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The above description are only some embodiments of the present application and do not limit the scope of the present application. All equivalent structural transformations made using the contents of the specification and drawings of the present application under the inventive concept of the present application, or direct/indirect application in other related technical fields, are included in the scope of the present application.