EP4587533A1 - Heat exchange method using low gwp fluids - Google Patents
Heat exchange method using low gwp fluidsInfo
- Publication number
- EP4587533A1 EP4587533A1 EP22783330.8A EP22783330A EP4587533A1 EP 4587533 A1 EP4587533 A1 EP 4587533A1 EP 22783330 A EP22783330 A EP 22783330A EP 4587533 A1 EP4587533 A1 EP 4587533A1
- Authority
- EP
- European Patent Office
- Prior art keywords
- heat transfer
- transfer fluid
- battery
- heat
- fluid
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
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- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
- C09K5/00—Heat-transfer, heat-exchange or heat-storage materials, e.g. refrigerants; Materials for the production of heat or cold by chemical reactions other than by combustion
- C09K5/08—Materials not undergoing a change of physical state when used
- C09K5/10—Liquid materials
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
- C09K5/00—Heat-transfer, heat-exchange or heat-storage materials, e.g. refrigerants; Materials for the production of heat or cold by chemical reactions other than by combustion
- C09K5/08—Materials not undergoing a change of physical state when used
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
- Y02E60/00—Enabling technologies; Technologies with a potential or indirect contribution to GHG emissions mitigation
- Y02E60/10—Energy storage using batteries
Definitions
- the present invention relates to a method for exchanging heat with an object using compositions comprising selected fluorinated nitro compounds having low GWP as heat transfer fluids.
- Heat transfer fluids are known in the art for applications in heating and cooling systems; typically, heat transfer fluids include water, aqueous brines, alcohols, glycols, ammonia, hydrocarbons, ethers and various halogen derivatives of these materials, such as chlorofluorocarbons (CFCs), hydrochlorofluorocarbons (HFCs), (per)fluorinated polyethers (PFPEs) and the like.
- CFCs chlorofluorocarbons
- HFCs hydrochlorofluorocarbons
- PFPEs perfluorinated polyethers
- Heat transfer fluids are used to transfer heat from one body to another, typically from a heat source to a heat sink so as to effect cooling of the heat source, heating of the heat sink or to remove unwanted heat generated by the heat source.
- the heat transfer fluid provides a thermal path between the heat source and the heat sink; it may be circulated through a loop system or other flow system to improve heat flow or it can be in direct contact with heat source and heat sink.
- Simpler systems use simply an airflow as heat transfer fluid, more complex system use specifically engineered gases or liquids which are heated or refrigerated in a portion of the system and then are delivered in thermal contact with the destination.
- a preferred method of use of the heat transfer fluids of the invention is a method wherein the fluids are used to transfer heat with electrical or electronic equipment and in particular to remove excess heat generated by the functioning of the electrical or electronic equipment.
- This application has high industrial importance since electrical and electronic equipment typically has a relatively narrow range of temperatures within which their performance is optimal. These applications include, as it will be specifically detailed later, thermostatic baths and cooling circuits.
- the fluids of the invention are dielectric fluids so that they are electrical insulators and can transfer heat to and from electrical and electronic equipment while being directly in contact with the electronics such as wires and integrated circuits.
- dielectric fluids when these fluids are used in cooling circuits wherein they are circulated in closed pipes (as it will be described more in detail below) so that they are not supposed to contact directly the electrically conductive parts of the equipment, the use of dielectric fluids is particularly advantageous because it reduces the risk of damage to the electrical or electronic equipment in case of leaks.
- Computing equipment such as computers, servers and the like generate substantial amounts of heat.
- Massive developments concentrating a large number of computers operating in shared locations such as server farms are getting more and more common.
- the industry of server farms, bitcoin mining farms and other supercomputing applications is growing extremely fast.
- a key factor in determining the building strategy of such installations is a control system which allows exchanging heat with such computing equipment.
- This system often called “thermal management system”, is typically used for cooling the computing equipment during its operation, but it can also be used for heating e.g. when starting up a system in a cold environment.
- Air is still the most commonly used fluid which however has the drawback to require large air gaps between electronic boards, which causes the installation to have very large footprints.
- Air cooling also requires massive air conditioning engines and their energy consumption is extremely high and represents a significant portion of the running costs for such installations.
- Fluorinated liquids are very effective heat transfer fluids.
- Commercial products exist such as Solvay’s Galden® and 3M’s FluorinertTM: these are liquid polymers or oligomers which are dielectric, have a high heat capacity, a low viscosity and are non-toxic and chemically inert so they can get in direct contact with electronic boards and also do not chemically interact with most materials.
- Solvay s Galden® and 3M’s FluorinertTM
- a drawback associated with these fluorinated fluids used so far is their high GWP value.
- GWP Global Warming Potential
- GWP100 The determination of GWP100 is performed by combining experimental data concerning the atmospheric lifetime of the chemical compound and its radiative efficiency with specific computational tool which are standard in the art and are described e.g. in the extensive review published by Hodnebrog et. Al. in Review of Geophysics, 51/2013, p 300-378.
- Highly stable halogenated molecules such as CF4 and chloro/fluoro alkanes have a very high GWP100 (7350 for CF 4 , 4500 for CFC-11).
- Hydrofluoroethers in particular segregated hydrofluoroethers, tend to have relatively low GWP100 values while the rest of their properties can be compared to those of the CFCs used in the past, for this reason some hydrofluoroethers have been used industrially and gained popularity as heat transfer fluids and are marketed e.g. by 3M under the trade name "Novec®”.
- Hydrofluoroethers are broadly described as heat transfer media due to their wide temperature range where they are liquid, and due to their low viscosity in a broad range of temperatures which makes them useful for applications as low temperature secondary refrigerants for use in secondary loop refrigeration systems where viscosity should not be too high at operating temperatures.
- Fluorinated ethers are described for example by 3M in US5713211 , by Dupont in US 2007/0187639 and by Solvay Solexis S.p.A. in WO 2007/099055 and WO2010034698.
- the present invention relates to a method for exchanging heat with an object said method comprising using a heat transfer fluid wherein said heat transfer fluid comprises one or more fluorinated nitrocompounds according to the general formula (I): wherein:
- R1 , R2, R3 and R4 are independently selected from H, Cl and F, with the proviso that at least one is either H or Cl.
- electronic computing equipment any individual or arrays of individual computer boards comprising microprocessors CPUs, GPUs, SSD and DDR Memory, and performing computational work, thus including both large server farms, internet servers, bitcoin mining factories, but also smaller individual computers, internet servers, computer gaming equipment. Both large and small installation may benefit from the heat transfer method of the present invention.
- semiconductor device in the present invention includes any electronic device which exploits the properties of semiconductor materials.
- Semiconductor devices are manufactured both as single devices and as integrated circuits which consist of a number (which can go from two to billions) of devices manufactured and interconnected on a single semiconductor substrate or “wafer”.
- semiconductor devices includes both the basic building blocks, such as diodes and transistors, to the complex architectures built from these basic blocks which extend to analog, digital and mixed signal circuits, such as processors, memory chips, integrated circuits, circuit boards, photo and solar cells, sensors and the like.
- semiconductor devices also includes any intermediate or unfinished product of the semiconductor industry derived from a semiconductor material wafer.
- the present invention relates to a method for exchanging heat with an object said method comprising using a heat transfer fluid wherein said heat transfer fluid comprises one or more chemical compounds having the general formula: wherein:
- R1 , R2, R3 and R4 are independently selected from H, Cl and F, with the proviso that at least one is either H or Cl.
- R1 , R2, R3 and R4 which are not H, F or Cl, are selected from, partially halogenated alkyl, fully halogenated alkyl, wherein the alkyl chain is C1-C4 and halogens are selected from Cl and F.
- partially halogenated alkyl, fully halogenated alkyl are preferably fluorinated and more preferably have a carbon chain from Ci to C3, even more preferably Ci.
- Particularly preferred fully fluorinated alkyl is -CF3.
- the heat transfer fluid of the invention comprises one or more compounds according to general formula (I) wherein at least two of R1 , R2, R3 and R4 are F.
- the heat transfer fluid of the invention comprises one or more compounds according to general formula (I) wherein at least one of R1 , R2, R3 and R4 is Cl, even more preferably wherein two of R1 , R2, R3 and R4 are Cl.
- a nitro/fluoro mixture for the present invention can be prepared using several different methods, including but not limited to: a- mixing pure nitric acid and anhydrous hydrogen fluoride in a molar ratio equal or higher than 1 :1 (HF/HNO3). (preferred range of molar ratio is 5:1 - 10:1) b- reacting carbonyl-difluoride and nitric acid to form the nitro/fluoro mixture like in method “a”.
- Step 2- Reaction of the halogenated olefin with the nitro/fluoro mixture
- the halogenated olefin is slowly added to the nitro/fluoro mixture placed in a metal reactor in a stoichiometric or slightly overstoichiometric ratio.
- the nitrofluorination reaction can be carried out in a pressurized reactor, in an atmospheric stirred tank reactor.
- the described nitrofluorination methods should not be considered as limiting. A skilled person would be able to apply variation and changes to the methods, and in particular to scale up the method for industrial application following conventional chemical engineering procedures.
- the method of the invention can be used to exchange heat with any object.
- the method of the invention is particularly useful when the object is an electronic computing equipment such as e.g. computer servers.
- the method of the present invention employs heat transfer fluids which are stable, dielectric, non flammable and non corrosive so that it can also be used in systems using the so called “immersion cooling” or “direct contact cooling”.
- immersion cooling or “direct contact cooling”.
- the fluids are placed in direct contact with the electronic circuit boards.
- Such fluids at their working temperature can be gaseous, liquids (single phase immersion cooling) or be in a gas/liquid equilibrium (i.e. around the boiling point of the liquid, in the so called “two phase immersion cooling”).
- immersion cooling electronic computer equipment such as CPUs, GPUs, Memory, and other electronics, including complete servers, are completely immersed in a thermally conductive dielectric liquid or coolant, which temperature is controlled through the use of a circulation system which pumps the liquid trough pipes and to heat exchangers or to radiator type coolers to reject the heat from the coolant.
- a circulation system which pumps the liquid trough pipes and to heat exchangers or to radiator type coolers to reject the heat from the coolant.
- Server immersion cooling is becoming a popular solution for server cooling solution, as it allows to drastically reduce energy usage through the elimination of the expensive air conditioning infrastructure. These systems are replaced with efficient low speed liquid circulation pumps and simpler heat exchanger and/or radiator systems.
- the temperatures used in liquid immersion cooling are determined by the highest temperature at which the devices being immersed can reliably operate. For servers this temperature range is typically between 15 to 65 °C, however in some cases this range is extended up to 75°C.
- Liquid immersion cooling is also used in the thermal management of computing equipment related to LEDs, Lasers, X-Ray machines, and Magnetic Resonance Imaging devices.
- Two phase immersion cooling is a technology marketed by Allied Control and a few other players, which involve submerging the electronic devices in closed tanks with a bath of dielectric fluid where the dielectric fluid has a boiling point corresponding to a desired temperature at which the bath can be set.
- the electronic devices heat up to the boiling point of the dielectric fluid the fluid turns into vapor subtracting heat.
- the vapor then condenses on a lid or coil condenser placed above the bath and precipitates again in the bath.
- a design of this type is particularly appreciated because it does not require recirculation of the dielectric fluid, and allows packing more electronic devices is a small space.
- Heat transfer fluids according to the invention i.e. comprising one or more compounds according to the general formula (I) as defined above can be formulated with compounds having boiling points between 40°C and 90°C (see examples in the experimental section below) and therefore find particular application in dual phase immersion cooling.
- the method of the invention can also be used in non immersion cooling system where the heat transfer fluid is circulated in a closed system and brought in thermal contact with the processors trough plates of thermally conductive materials, such as the server cooling solutions produced by Ebullient under the name of “module loops”.
- a dielectric fluid such as the heat transfer fluid of the present invention is anyway beneficial because the risk of leakages is always present and conductive liquids may have destructive effects on the electronics.
- the method of the invention can also find application for example in the semiconductor industry where temperature control during manufacturing of semiconductor devices is of great importance.
- the object which exchanges heat with the heat transfer fluid of the invention is a semiconductor device.
- Temperature control units (TCUs) are used all along the production line for the fabrication of semiconductor devices, and heat transfer fluids according to the invention can be employed to remove unwanted heat during steps like wafer etching and deposition processes, ion implantation and lithographic processes.
- the heat transfer fluid is typically circulated through the wafer mounts and each process tool which requires temperature control has its own individual TCU.
- TCUs Some tools of particular importance which include TCUs are silicon wafer etchers, steppers and ashers. Etching is performed using reactive plasma at temperatures ranging from 70°C to 150°C and the temperature of the wafer must be controlled precisely with the entire temperature range during the plasma treatment. Following the plasma treatment the etched parts are normally immersed in a solvent which removes the etched parts. This second step does not normally require temperature control as it is performed at mild or ambient temperature. When referring to an “etcher” in the present application, it is intended the equipment wherein the plasma treatment at high temperature is performed and which therefore requires a TCU.
- Steppers are used in the photolithography of wafers to form the reticules which are then used to expose the photosensitive mask. This process is carried out at temperatures between 40°C and 80°C, however temperature control is extremely important as the wafer need to be maintained at a precise fixed temperature (+/- 0.2°C) along the process to ensure good results.
- Ashing is a process where the photosensitive mask is removed from the wafer and is performed at temperatures from 40°C to 150°C. The system uses plasma and also here precise temperature control is particularly important.
- PECVD plasma enhanced chemical vapour deposition
- each Etcher, Asher, Stepper and plasma enhanced chemical vapor deposition (PECVD) chamber has its own TCU wherein, applying the method of the invention, a heat transfer fluid according to the invention can be recirculated.
- PECVD plasma enhanced chemical vapor deposition
- VPR vapor phase reflow
- Heat transfer fluids for use in the manufacturing of semiconductor devices are typically liquids which are dielectric, non corrosive, and exist in the liquid state in a broad range of temperatures with relatively low viscosity which makes them easily pumpable.
- the method of the invention can be used in all the steps of the manufacturing of semiconductor devices which require the semiconductor device to exchange heat with a heat transfer fluid.
- semiconductor processing equipment such as an Etcher, an Asher, a Stepper and a plasma enhanced chemical vapor deposition (PECVD) chamber: each of these equipment requires precise temperature control and/or heat dissipation and therefore they include temperature control units (TCUs) which can include the selected heat transfer fluid of the method of the invention.
- TCUs temperature control units
- the semiconductor device is cooled and heated using at least two baths made of heat transfer fluids, a cold one typically at a temperature of from -10 to -100°C, and a hot one typically at a temperature of from 60°C to 250°C.
- the method of the invention can be advantageously performed selecting the appropriate compound or blend of compounds according to the general formula (I) for making up the heat transfer fluid for the baths.
- the heat transfer fluid should be selected so that the same heat transfer fluid can be used in both bath thanks to the large temperature range in which the fluid is in liquid state, so that there is no risk of cross contamination of the baths.
- the method of the invention can also find application in vapor phase soldering, in fact the selected heat transfer fluid of the method of the invention can be formulated so to have a boiling point in line with that of the soldering paste, so that a semiconductor device comprising soldering paste which still has to be “cured” can be introduced into a closed chamber which contains the selected heat transfer fluid of the method of the invention at its boiling point in equilibrium with its heated vapors.
- the heated vapors will transfer heat to the semiconductor device thereby melting the soldering paste and therefore fixing the contacts as needed.
- high boiling point compounds according to the general formula will need to be used in the heat transfer fluid.
- An additional advantage is that a single heat transfer fluid can be used in multiple applications potentially allowing the use of a single heat transfer fluid across an entire semiconductor devices manufacturing facility.
- Another area wherein the method of the present invention can find application is the thermal management of batteries, in particular rechargeable batteries such as vehicle batteries for cars, trams, trains and the like.
- Lithium-ion based batteries which are based on different types of lithium salts.
- Batteries based on Lithium Manganese Oxide, Lithium Iron Phosphate and Lithium Nickel Manganese Cobalt Oxide find application e.g. in vehicles, power tools, e-bikes, and the like. Batteries based on Lithium Cobalt Oxide are typically used in smaller sizes and less intensive applications such as cell phones, portable computers and cameras. Batteries based on Lithium Nickel Cobalt Aluminum Oxide and Lithium Titanate are being considered in applications requiring high power and/or capacity such as electric powertrain and grid storage.
- BTMS Battery Thermal Management System
- the method of the invention can be also adapted to any heat exchange method e.g. for heating or cooling compartments (e.g. food stuffs compartments) including those on board of aircrafts, vehicles or boats, for heating or cooling industrial production equipment, for heating or cooling batteries during their operations, for forming thermostatic baths.
- heating or cooling compartments e.g. food stuffs compartments
- industrial production equipment e.g. heating or cooling batteries during their operations, for forming thermostatic baths.
- heat transfer fluids used in these fields include fluorocompounds.
- hydrofluorotethers have found application in these fields due to their chemical inertness, dielectricity, wide range of T in which they are liquid and pumpable (typically having a viscosity between 1 and 50 cps at the temperatures of use), low flammability and relatively low GWP.
- Commercially available hydrofluoroethers for use in these fields are e.g. those from the NovecTM series of 3M which combine all these properties with a relatively low GWP100 of from about 70 to 300.
- the present invention also encompasses an apparatus comprising an electronic computing equipment and a heat transfer fluid wherein said heat transfer fluid comprises one or more fluorinated nitrocompounds according to general formula (I) as defined above.
- the present invention relates to an apparatus comprising a battery, preferably a rechargeable battery, a thermal management system for said battery, said thermal management system for said battery comprising a heat transfer fluid exchanging heat with said battery, wherein said heat transfer fluid comprises one or more fluorinated nitrocompounds according to general formula (I) as defined above.
- the resulting material was analyzed by 19F-NMR spectrometry.
- the compounds of the invention have surprisingly good specific heat capacity which ensures a more efficient heat transfer. This is combined with other desirable properties in line with the other materials (non flammability, low GWP and very low dielectric constant). These properties in combination make the materials of the invention particularly suitable as heat transfer fluids. Heat transfer fluids comprising these compounds can be used in all the mentioned applications involving heat exchange with an electronic computing equipment, batteries or semiconductor devices.
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- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Combustion & Propulsion (AREA)
- Thermal Sciences (AREA)
- Materials Engineering (AREA)
- Organic Chemistry (AREA)
- Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
- Secondary Cells (AREA)
Abstract
Description
Claims
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| PCT/EP2022/075770 WO2024056187A1 (en) | 2022-09-16 | 2022-09-16 | Heat exchange method using low gwp fluids |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| EP4587533A1 true EP4587533A1 (en) | 2025-07-23 |
Family
ID=83546764
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| EP22783330.8A Pending EP4587533A1 (en) | 2022-09-16 | 2022-09-16 | Heat exchange method using low gwp fluids |
Country Status (4)
| Country | Link |
|---|---|
| EP (1) | EP4587533A1 (en) |
| JP (1) | JP2025531164A (en) |
| CN (1) | CN119866365A (en) |
| WO (1) | WO2024056187A1 (en) |
Family Cites Families (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CA2233874A1 (en) | 1995-10-20 | 1997-04-24 | Gregory J. Sherwood | Hydrofluoroethers as low temperature refrigerants |
| CN101370900A (en) | 2006-01-13 | 2009-02-18 | 纳幕尔杜邦公司 | Refrigerant additive composition comprising perfluoropolyether |
| ITMI20060381A1 (en) | 2006-03-02 | 2007-09-03 | Solvay Solexis Spa | THERMAL EXCHANGE FLUIDS |
| US7807074B2 (en) * | 2006-12-12 | 2010-10-05 | Honeywell International Inc. | Gaseous dielectrics with low global warming potentials |
| US8999192B2 (en) | 2008-09-26 | 2015-04-07 | Solvay Specialty Polymers Italy S.P.A. | Method for transferring heat |
| CN109074905B (en) * | 2016-05-04 | 2021-02-09 | 索尔维公司 | Method for dielectrically insulating electrically active parts |
-
2022
- 2022-09-16 EP EP22783330.8A patent/EP4587533A1/en active Pending
- 2022-09-16 JP JP2025515589A patent/JP2025531164A/en active Pending
- 2022-09-16 WO PCT/EP2022/075770 patent/WO2024056187A1/en not_active Ceased
- 2022-09-16 CN CN202280100027.0A patent/CN119866365A/en active Pending
Also Published As
| Publication number | Publication date |
|---|---|
| WO2024056187A1 (en) | 2024-03-21 |
| JP2025531164A (en) | 2025-09-19 |
| CN119866365A (en) | 2025-04-22 |
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