EP4294889A1 - Crystalline compound - Google Patents
Crystalline compoundInfo
- Publication number
- EP4294889A1 EP4294889A1 EP22706100.9A EP22706100A EP4294889A1 EP 4294889 A1 EP4294889 A1 EP 4294889A1 EP 22706100 A EP22706100 A EP 22706100A EP 4294889 A1 EP4294889 A1 EP 4294889A1
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- European Patent Office
- Prior art keywords
- cations
- compound
- agbii
- anions
- film
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
- C09K11/00—Luminescent materials, e.g. electroluminescent or chemiluminescent
- C09K11/08—Luminescent materials, e.g. electroluminescent or chemiluminescent containing inorganic luminescent materials
- C09K11/58—Luminescent materials, e.g. electroluminescent or chemiluminescent containing inorganic luminescent materials containing copper, silver or gold
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- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01G—COMPOUNDS CONTAINING METALS NOT COVERED BY SUBCLASSES C01D OR C01F
- C01G29/00—Compounds of bismuth
- C01G29/006—Compounds containing bismuth, with or without oxygen or hydrogen, and containing two or more other elements
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- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
- C09K11/00—Luminescent materials, e.g. electroluminescent or chemiluminescent
- C09K11/08—Luminescent materials, e.g. electroluminescent or chemiluminescent containing inorganic luminescent materials
- C09K11/61—Luminescent materials, e.g. electroluminescent or chemiluminescent containing inorganic luminescent materials containing fluorine, chlorine, bromine, iodine or unspecified halogen elements
- C09K11/615—Halogenides
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- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
- C01P2002/00—Crystal-structural characteristics
- C01P2002/70—Crystal-structural characteristics defined by measured X-ray, neutron or electron diffraction data
- C01P2002/76—Crystal-structural characteristics defined by measured X-ray, neutron or electron diffraction data by a space-group or by other symmetry indications
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- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
- C01P2002/00—Crystal-structural characteristics
- C01P2002/70—Crystal-structural characteristics defined by measured X-ray, neutron or electron diffraction data
- C01P2002/77—Crystal-structural characteristics defined by measured X-ray, neutron or electron diffraction data by unit-cell parameters, atom positions or structure diagrams
Definitions
- the invention relates to a crystalline compound, and to a semiconductor device comprising the crystalline compound.
- the invention also relates to processes for preparing the crystalline compound.
- PV photovoltaic
- APb 2+ X 3 phases with mixed halides Br- and I- suffer from halide or phase segregation during illumination, and exhibit instabilities towards light in the presence of oxygen, moisture, and heat which all involve a breakdown of the material usually by decomposition of the organic cation, leaving soluble and toxic PbI 2 .
- the Ruddlesden–Popper phases studied have also predominantly contained lead, and 2D octahedral networks have the added complication of charge-carrier confinement which means for high performance devices careful control of crystallization is required to grow the film with a preferred orientation in which the 2D perovskite layers are aligned orthogonally to the substrate.
- Bismuth bromide and chloride networks have been synthesised as double perovskites (MA) 2 KBiCl 6 (3.04 eV), (MA) 2 AgBiBr 6 (2.02 eV), Cs 2 AgBiCl 6 (2.77 eV) and Cs 2 AgBiBr 6 (2.19 eV), however they currently remain unsuitable to be useful in tandem cells: in the Cl-containing materials the band gaps are too wide to be combined efficiently with current efficient technologies (hybrid Pb perovskites, Si, CdTe); Cs 2 AgBiBr 6 has an unsuitable absorption coefficients containing a minima after the initial absorption onset; and (MA) 2 AgBiBr 6 contains the volatile CH 3 NH 3 cation.
- BiI 3 has been reported with an indirect band gap of 1.67(1) eV and devices have reached PCEs of 1.0%.
- Ag 1-3x Bi 1+x I 4 and CuBiI 4 have been reported with suitable band gaps of 1.64–1.93 eV; the variation arising from composition, sample type, and assuming direct or indirect band gaps.
- Cu-containing CuBiI 4 films have also recently been processed into devices reaching PCEs of 1.1%. However, CuBiI 4 is not a stable phase and decomposes when standing at room temperature.
- these compounds typically do not have the conventional perovskite structure widely investigated in relation to electronic devices (e.g. semiconductor and optoelectronic devices, such as photovoltaics). Instead, these compounds have cations in both octahedral and tetrahedral coordination environments.
- the invention provides compounds that (i) have a band gap of a suitable size for optoelectronic applications, in particular a band gap small enough for use in tandem cells, (ii) may be made from easily available, environmentally friendly, non-toxic materials (i.e. for instance do not require toxic lead compounds) and (iii) have a good stability profile. These compounds also exhibit good charge-carrier mobility, high absorption coefficients, long average photoluminescence lifetimes and low exciton binding energies, and can be manufactured as thin films suitable for integration into optoelectronic devices. For instance, the new compound Cu 2 AgBiI 6 has been synthesised as crystals, powder, and solution-processed thin films.
- Cu 2 AgBiI 6 represents the use of Ag + to stabilise CuBiI 4 , and the use of Cu + , which is typically too small to include in the larger 8 and 12 coordinate sites in conventional perovskite materials, to reduce the content of expensive Ag + compared to Ag1-3xBi1+xI4 compounds. Simulations involving this material indicate that there is the potential to deliver over 30% power conversion efficiency (PCE) when it is incorporated into a Cu 2 AgBiI 6 -on-Si tandem cell.
- PCE power conversion efficiency
- the present invention provides a crystalline compound comprising (i) One or more first cations, A; (ii) One or more second cations, B; (iii) One or more third cations, B’; (iv) One or more anions, X; wherein the one or more first cations, A, are different from the one or more second cations, B, and to the one or more third cations, B’, and wherein the one or more second cations, B, are different from the one or more first cations, A, and to the one or more third cations, B’, wherein at least some of the one or more third cations, B’, are in an octahedral coordination environment, and wherein at least some of the one or more first cations, A, are in a tetrahedral coordination environment.
- the invention also provides a film comprising a compound as described herein.
- the invention also provides a semiconductor device comprising a compound as described herein or a film as described herein.
- the invention also provides a process for producing a film comprising a crystalline compound comprising (i) One or more first cations, A; (ii) One or more second cations, B; (iii) One or more third cations, B’; (iv) One or more anions, X; wherein the one or more first cations, A, are different from the one or more second cations, B, and to the one or more third cations, B’, and wherein the one or more second cations, B, are different from the one or more first cations, A, and to the one or more third cations, B’, wherein at least some of the one or more third cations, B’, are in an octahedral coordination environment, and wherein at least some of the one or more first cations
- the invention also provides a process for producing a film comprising a crystalline compound comprising (i) One or more first cations, A; (ii) One or more second cations, B; (iii) One or more third cations, B’; (iv) One or more anions, X; wherein the one or more first cations, A, are different from the one or more second cations, B, and to the one or more third cations, B’, and wherein the one or more second cations, B, are different from the one or more first cations, A, and to the one or more third cations, B’, wherein at least some of the one or more third cations, B’, are in an octahedral coordination environment, and wherein at least some of the one or more first cations, A, are in a tetrahedral coordination environment, said process comprising: exposing the substrate to a vapour, which vapour comprises one or more reactants for producing said compound and
- FIGURES Figure 1(a) shows the Cu 2 AgBiI 6 structure solved from 100K SCXRD data with the composition constrained in line with the average composition Cu 2.15(16) Ag 1.04(5) Bi 0.92(7) I 6.00(11) from TEM EDX.
- Figure 1(b) shows layer 1 containing the sites Oct1 (occupied by 34.6% Ag + and 30.6% Bi 3+ ) and Cu1 with coordination environments shown in Figure 1(c) and Figure 1(d), respectively.
- Figure 1(e) shows that layer 2 contains site Cu2 with coordination environment shown in (f).
- Figure 2(a) shows the absorption coefficient of Cu 2 AgBiI 6 thin films (black) measured by a combination of Fourier Transform Infra-Red (FTIR) spectroscopy and Photothermal Deflection Spectroscopy (PDS). This is compared to the reported absorption coefficients of MAPbI 3 (blue dotted) and Cs 2 AgBiBr 6 (blue dashed), reproduced from Davies et al., and Longo et al., respectively (Longo et al, Understanding the Performance-Limiting Factors of Cs 2 AgBiBr 6 Double- Perovskite Solar Cells.
- FTIR Fourier Transform Infra-Red
- PDS Photothermal Deflection Spectroscopy
- Figure 2(c) shows the partial density of states of Cu 2 AgBiI 6 computed with density functional theory for configuration of cations with the lowest computed energy. The cumulative contributions from each species are shown along with the total density of states for energies relative to the computed Fermi energy.
- Figure 3(a) shows the natural logarithm of the absorption coefficient measured by Photothermal Deflection Spectroscopy(PDS), after it was scaled to match the FTIR absorption coefficient data (raw data and scaled data shown in Figures 14a and b, respectively), showing sub-band gap states down to 1.25 eV.
- PDS Photothermal Deflection Spectroscopy
- Figure 4(a) shows the structure of the cell in the optical modelling LiF/ITO/SnO 2 /C 60 /Cu 2 AgBiI 6 /PolyTPD/ITO/nc-SiO x :H/(i)a-Si:H/c-Si/(i)a-Si:H/(p)a- Si:H/AZO/Ag.
- Figure 4(b) shows the photovoltaic (PV) band gap, defined as the energy of the inflection point on the absorption edge, for Cu 2 AgBiI 6 films of varying thicknesses.
- PV photovoltaic
- Figure 4(c) shows the external quantum efficiency (EQE) and Figure 4(d) shows the J-V curve of a simulated Cu 2 AgBiI 6 on c-Si tandem solar cell, using a transfer matrix optical model, coupled with detailed balance.
- the diode parameters used were extracted from lead halide perovskite and c-Si J-V curves reported in literature.
- Figure 5 shows the Pawley fit to room temperature laboratory PXRD data of CuBiI4. The PXRD pattern is fitted using a cubic unit cell with space group Fd3 ⁇ m, previously reported by Fourcroy et al. Structure du Tetraiodure de Cuivre(I) et de Bismuth(III), CuBiI 4 . Acta Crystallogr.
- Figure 8 shows the PXRD patterns of AgBiI 4 and Cu 2 AgBiI 6 powders after being exposed to one week in the solar spectrum, sealed in capillaries in air. Also shown are the PXRD of the controls, which were kept in the dark in air. The range shown includes where the largest peaks would appear for possible decomposition phases AgI (black tick marks), CuI (red tick marks) and BiI 3 (blue tick marks), should they have been present.
- Figure 9(a) shows the Raman spectra of AgBiI 4 and Cu 2 AgBiI 6 control samples, showing the characteristic two peaks, which occur at low wavenumbers.
- Figure 11 shows a Pawley fit of PXRD pattern for Cu 2 AgBiI 6 films spincoated on FTO glass, fitted to a rhombohedral phase associated with a quaternary phase (black tick marks), a rhombohedral phase consistent with a Cu 3x Bi 1-x I 3 phase (red tick marks), and SnO 2 (blue tick marks).
- Figure 12 shows SEM images of (a, b) rough, large, dendritic grains obtained during the early stages of solution processing the Cu 2 AgBiI 6 films.
- Figure 13(a, b) show SEM images of the uniform, smooth morphology of the optimised Cu 2 AgBiI 6 film at x1001 and x13362 magnification, respectively.
- Figure 14(a) shows the raw PDS data of Cu 2 AgBiI 6 thin films.
- the PDS data (red) is scaled to match the absorption coefficient measured by FTIR (black).
- Figure 15 shows the partial density of states plots for the lowest energy configurations arising from each of the four independent ChemDASH calculations shown in Figure 24.
- the electronic structure is computed using the meta-GGA functional, SCAN,(Sun, J. et al., Strongly Constrained and Appropriately Normed Semilocal Density Functional. Phys. Rev. Lett.2015, 115 (3), 036402) and including spin-orbit coupling. Shown on each plot is the value of the smallest gap between occupied and unoccupied bands.
- Figure 18 shows the optical response of a Cs 2 AgBiBr 6 on silicon tandem was modelled using the transfer matrix method (Katsidis, C. C.; Siapkas, D. I., General Transfer-Matrix Method for Optical Multilayer Systems with Coherent, Partially Coherent, and Incoherent Interference. Appl. Opt. 2002, 41 (19), 3978-3987).
- the thickness of the Cs 2 AgBiBr 6 100 nm – 1000 nm
- the anti- reflective coating LiF (10nm – 150 nm) was varied using a differential evolution algorithm till the limiting tandem current was maximised.
- the optimised device structure was LiF (110 nm)/ITO (80 nm)/SnO2 (5 nm)/C60 (10 nm)/Cs 2 AgBiBr 6 (989 nm)/PolyTPD (5 nm)/ITO (25 nm)/nc-SiO x :H (110 nm)/i-a-Si:H (5 nm)/i-c-Si (250 um)/i-a-Si:H (5 nm)/p-a-Si:H (5 nm)/AZO (70 nm)/Ag (400 nm).
- the search bounds for Cu 2 AgBiI 6 film thicknesses were 1200–1400 nm, 800–1000 nm, and 400–530 nm for the films that optimised at thicknesses of 1389 nm, 999.9 nm and 529.6 nm, respectively.
- Figure 20(a) shows the TEM EDX of particles from the Cu 2 AgBiI 6 powder synthesis, showing how quenching from 350°C, rather than cooling slowly to room temperature, gives a compositionally homogeneous sample. (b) The samples are also more compositionally homogeneous if the melt is avoided.
- Figure 21(a) shows the SEM image of the Cu 2 AgBiI 6 crystal used for the SCXRD structural solution. The crystal was picked out of the Cu 2 AgBiI 6 powder synthesis.
- Figure 21(b) shows the SEM EDX showing the composition of the crystal to be within error of the powder.
- Figure 22 shows PXRD patterns for the compositional screening of Cu 3x Bi 1-x I 3 carried out between 0.18 ⁇ x ⁇ 0.32.
- Figure 24 shows the optimised geometry of the lowest energy configurations arising from each of the four independent ChemDASH calculations computed using the van der Waals functional, optB86b-vdW (Klime ⁇ , J. et al., Van der Waals Density Functionals Applied to Solids. Phys. Rev. B 2011, 83 (19), 195131).
- the computed energy for each configuration is given relative to configuration 1, the lowest energy overall.
- the green, blue, grey and pink spheres/polyhedra represent I ⁇ , Cu + , Ag + and Bi 3+ ions respectively.
- These low energy configurations represent different ordered arrangements of the cations consistent with the average structure determined experimentally.
- Figure 25 (a) shows the known ternary and new synthesized quaternary phases in the CuI–AgI–BiI 3 phase field and figure 25 (b) the forms in which they have been synthesized.
- Figure 25 (c) shows the average compositions of the materials synthesized in this investigation, measured with either SEM EDX (AgBiI 4 , CuBiI 4 ) or TEM EDX (CuAgBiI 5 , Cu 2 AgBiI 6 ), with 1 ⁇ errors (blue areas).
- the red spots in Figure 25(c) are the stoichiometric compositions chosen to represent the materials and are within error to the measured compositions.
- Figure 25 (d) shows the areas of the CuI–AgI– BiI 3 phase field explored during the investigation, in example 2.
- Figure 26 shows the unit cell nomenclature and cubic close-packed (CCP) iodide sub-lattices for the ternary and quaternery compounds in the CuI–AgI–BiI 3 phase field.
- CCP cubic close-packed
- Figure 26 (a) shows the cubic unit cell of Ag 1-3x Bi 1+x I 4 (x ⁇ 0) and CuBiI 4
- Figure 26 (b) shows the small trigonal unit cell of Ag 1-3x Bi 1+x I 4 (x ⁇ 0), CuBiI 4 and Cu 2 BiI 5 . It is helpful to directly compare the structures by transforming both these cells in to a large trigonal unit cell using the transformation matrices shown.
- Figure 26 (c) shows a large trigonal cell that has a and b directions double that of the small trigonal cell with a volume four times as large, and is ⁇ 3/2 the volume of the cubic unit cell.
- the quaternary compounds CuAgBiI 5 and Cu 2 AgBiI 6 crystallize in the large and small trigonal unit cells, respectively.
- Figure 26 (d) shows rhombohedral strain is defined in the case of the small and large trigonal cells. It can be described as extending or contracting the otherwise cubic structure along the body diagonal (111) cubic , shown by the red arrows. The green spheres represent the iodide ions.
- Figure 27 shows the nomenclatures used for the different octahedral network of ternary and quaternary compounds in the CuI–AgI–BiI 3 phase field.
- Figure 27a shows the defect-spinel octahedral motif consists of a disordered spinel motif (Figure 49).
- the octahedral motif is a 3D network of edge-sharing octahedra and consists of an overall occupancy of octahedral (O) sites of 1 ⁇ 2. Using the transformation matrix shown, it can be represented in the large trigonal unit cell where it can be considered as alternating between layers of 3/4 and 1/4 O site occupancy, maintain the overall 1/2 O site occupancy.
- Figure 27b) shows the 2D CdCl 2 octahedral motif consists of alternating between layers of full O site occupancy, and empty layers, giving overall 1/2 O site occupancy.
- Figure 27c shows the i-CdCl 2 octahedral motif consists of every possible O site being occupied, with layered ordering.
- the layered ordering means that the layers alternate between two different octahedral sites.
- Purple and yellow octahedra represent octahedral sites Oct1 and Oct2, respectively.
- Green spheres represent iodide ions. Unit cells are drawn with solid black lines.
- Figure 28a) shows the tetrahedral site in the spinel structure. One channel in the spinel octahedral motif is highlighted in yellow (top), and the same channel is selected after a 90° anti-clockwise rotation (bottom). The orange and red spheres represent Mg 2+ and O 2- ions, respectively.
- the blue octahedra represent Al–O octahedra.
- Figure 28b) shows the Cu sites in the CuAgBiI 5 defect-spinel octahedral motif, showing that the site has partial layered ordering by only occupying the layers with 1/4 O site occupancy (top). The channel highlighted in red shows that Cu site is different from that in the spinel (bottom).
- Figure 28c) shows the Cu sites in the small trigonal unit cell (Cu 2 BiI 5 and Cu 2 AgBiI 6 ) showing how they have partial layered ordering and occupy every possible T site.
- the Cu + and I- ions are blue and green, respectively.
- the purple octahedra represent the Bi–I octahedra.
- Figure 29(a) shows the new CuBiI 4 structure in the small trigonal cell refined using laboratory powder X–ray diffraction (PXRD) data.
- Figure 29(b) shows the octahedral coordination environment for site Bi1, occupied by 50% Bi 3+ .
- Figure 29(c and d) show the tetrahedral coordination environments for sites Cu1 and Cu2, respectively.
- Cu1 and Cu2 are occupied by 15% and 9% Cu + , respectively.
- Figure 29(e and f) show the I–I distances and I–I–I angles of I- sub- lattice, along the c-direction, and in the ab plane, respectively.
- the green, blue, and pink spheres represent I-, Cu + and Bi 3+ ions, respectively.
- Figure 30(a) shows the Pawley fit of high resolution synchrotron CuAgBiI 5 PXRD data with a cubic unit cell, showing the fit is not good for high Q-spacing due to rhombohedral strain.
- Figure 30(b) shows the Pawley fit of the same data using a large trigonal cell.
- Figure 30(c, d, e) show the measured, calculated and difference of the Rietveld refinement of the CuAgBiI 5 structure to a combination of high resolution synchrotron CuAgBiI 5 PXRD (MAC I11, Diamond Light Course, Oxfordshire, UK), HRPD bank 1 NPD , and HRPD bank 2 NPD (ISIS neutron and Muon Source, Oxfordshire, UK), respectively, shown in d-spacing
- Figure 31 (a-i) shows the new CuAgBiI 5 room temperature structure refined using combined high resolution synchrotron PXRD data and neutron powder diffraction (NPD).
- Figure 31(a-ii, a-iii) show the octahedral coordination environment for sites Oct1 and Oct2, respectively.
- FIG. 31 (a-iv) shows the tetrahedral coordination environment for site Cu1, occupied by 17.3(2)% Cu + .
- Figure 31(a-v, a-vi) show the I– I distances and I–I–I angles of I- sub-lattice, along the c-direction, and in the ab plane, respectively.
- the green, blue, gray, and pink spheres represent I-, Cu + , Ag + and Bi 3+ ions, respectively.
- Figure 32(a) shows the relationship between the type of octahedral motif (dimensionality) and overall octahedral (O) site occupancy (composition) for CuAgBiI 5 , Cu 2 AgBiI 6 , CuBiI 4 and reported structures AgBi 2 I 7 , Ag 2 Bi 3 I 11 , AgBiI 4 , Ag 2 BiI 5 , Ag 3 BiI 6 .
- Increasing overall O site occupancy takes the octahedral motif from 2D to 3D.
- Figure 32(b) shows the octahedral motif of ternary and quaternary phases in the CuI–AgI–BiI 3 phase field along the solid solution lines between BiI 3 to AgI (green), AgBiI 4 to CuI (blue) and BiI 3 to CuI (bottom axis).
- Figure 32(c) shows the structures along the AgBiI 4 to CuI solid solution line and the extra control given by the quaternary system by moving in different directions along the solid solution line, which can balance the need for decreasing expensive and photosensitive Ag + , increasing dimensionality, and increasing stability.
- Figure 33 shows PXRD patterns for the compositional screening of Cu 3x Bi 1-x I 3 carried out between 0.18 ⁇ x ⁇ 0.32.
- the red tick marks correspond to the Cu 0.45 Ag 0.55 I impurity peaks, and the black tick marks to the rhombohedral Ag-rich x ⁇ 0 Ag 1-3x Bi 1+x I 4 phases.
- Figure 35 shows a Pawley fit to the laboratory PXRD pattern of nominal composition Cu 1.5 Ag 0.5 BiI 5 .
- the tick marks for the CuI impurity, BiI 3 impurity, and the cubic Fd3 ⁇ m phase are black, red and blue, respectively.
- Figure 37 shows refined lattice parameters of (a) the Fd3 ⁇ m cubic phase and (b) zinc blende Cu 1- y Ag y I phase over the Cu x Ag 1-x BiI 4 solid solution series. Lattice parameters were refined against an internal LaB 6 standard using a Pawley fit.
- Figure 38 shows the Cu 4x (AgBi) 1-x I 4 solid solution corresponds to a line of compositions between the known phases CuI and AgBiI 4 .
- the red asterisks highlight peaks due to a rhombohedral R3 ⁇ m Ag-rich Ag1-3xBi1+xI4 impurity phase, no Cu 1-y Ag y I impurity is seen.
- Figure 39 (b) shows a selected Q range of the PXRD pattern for the 0.18 ⁇ x ⁇ 0.20 samples.
- the blue asterisks highlight peaks due to a Cu 1-y Ag y I impurity phase, no rhombohedral R3 ⁇ m Ag-rich Ag 1-3x Bi 1+x I 4 impurity phase is seen.
- the black line is the measured intensity
- the red line is the calculated PXRD pattern
- the blue line is the contribution of the CuI impurity phase.
- (b) The TEM EDX composition of particles from the 0.27 ⁇ x ⁇ 0.33 samples, showing them to be compositionally inhomogeneous along the Cu 4x (AgBi) 1-x I 4 solid solution line.
- Figure 41(b) shows the samples are also more compositionally homogeneous if the melt is avoided. These results are shown here for Cu 2 AgBiI 6 but are also true for CuAgBiI 5 .
- Figure 42(a) is a SEM image of the CuAgBiI 5 crystal used for the SCXRD structure. the crystal was picked out of the CuAgBiI 5 powder sample.
- Figure 42(b) shows the SEM EDX measurements of the crystal (red points) compared to the TEM EDX measurements of powder samples (black).
- Figure 43(a) shows the SEM image of the Cu 2 AgBiI 6 crystal used for the SCXRD structural solution. The crystal was picked out of the Cu 2 AgBiI 6 powder synthesis.
- Figure 43(b) shows the SEM EDX showing the composition of the crystal to be within error of the powder.
- Figure 44(a) shows SEM EDX measurements of large melt-grown and CVT-grown crystals.
- Figure 44(b) is an SEM image of melt-grown crystal.
- Figure 44(c) is an SEM image of CVT-grown crystal.
- (d) SEM image of the close-up of CVT-grown crystal surface. The crystals lack a well- defined shape as would be expected from a conventional crystal.
- Figure 45(a) shows the TEM EDX compositions of particles taken from the CuAgBiI 5 sample and repeats synthesized as explained in example 2.
- BiI 3 crystallizes in a trigonal unit cell with a HCP iodide sub-lattice.
- Figure 47(a) shows the zinc blende structure
- Figure 47(b) shows the tetrahedral coordination
- Figure 47(c) shows the I–I distances and I–I–I angles of the I- sub-lattice of CuI.
- CuI the Cu + is tetrahedrally-coordinated and fully ordered. The Cu + tetrahedra corner-share to form the zinc blende structure with the F4 ⁇ 3m space group.
- the CCP sub-lattice has two tetrahedral holes per iodide anion, so that for the composition of CuI only 1/2 of the tetrahedral (T) sites are occupied.
- Figure 47(d) shows the wurtzite structure
- Figure 47(e) shows the tetrahedral coordination
- Figure 47(f) shows the I–I distances and I–I–I angles of the I- sub-lattice of AgI.
- the Ag + is fully ordered on a site that is tetrahedrally coordinated.
- the tetrahedra corner share to form the wurtzite structure.
- Half of the total T sites are occupied for composition AgI.
- FIG 47(g) shows the BiI 3 structure
- Figure 47(h) shows the tetrahedral coordination
- Figure 47(i) shows the I–I distance and I–I–I angles of the I- sub-lattice of BiI 3
- the Bi 3+ is octahedrally coordinated, which edge-share to create a layered 2D network of octahedra.
- BiI 3 has an octahedral motif consisting of layers of 2/3 octahedral (O) site occupancy, separated by empty layers of no O site occupancy, giving an overall O site occupancy of 1/3 (Figure 54). Green, blue, gray and pink spheres represent the I-, Cu + , Ag + and Bi 3+ ions, respectively.
- Figure 48 shows the 2D BiI 3 octahedral motif consisting of layers of 2/3 octahedral (O) site occupancy, separated by empty layers of no O site occupancy, giving an overall O site occupancy of 1/3. Green and purple spheres represent the I- and Bi 3+ ions, respectively.
- Figure 49 shows the spinel octahedral motif is a 3D network of edge-sharing octahedra and consists of an overall occupancy of octahedral (O) sites of 1 ⁇ 2. Red and purple colors represent the O 2- and Al 3+ ions, respectively.
- Figure 50 shows the three different tetrahedral sites in the previously reported CuBiI 4 .structure.
- FIG 50a The Cu1 site is located where the layers of 3 ⁇ 4 and 1 ⁇ 4 O site occupancy meet, which is eight times in the unit cell, giving a multiplicity of eight.
- the 12 channels of four Cu + ions give the multiplicity of 48.
- Figure 50c) The eight Cu + ions of site Cu3 are at the eight places that four separate channels cross over in the unit cell.
- Figure 50c) highlights one of the Cu + ions, and the four channels that it is shared between.
- Figure 50d Cu2 and Cu3 sites share the channels.
- Figure 50e All three sites occupy every possible T site in the CCP sub-lattice.
- Figure 51 shows the Rietveld refinements of laboratory PXRD data collected at room temperature for the CuBiI 4 material, fitted to (a) the reported cubic Fd3 ⁇ m CuBiI 4 structure with a defect-spinel octahedral motif and (b) the new CuBiI 4 structure with the CdCl 2 octahedral motif.
- Figure 52 shows the CuBiI 4 structure as reported by Fourcroy et al. transformed in to a structure with the CdCl 2 octahedral motif, using the transformation matrix shown.
- Figure 53(a) shows the CuBiI 4 structural model corresponding to a 50% defect-spinel and 50% CdCl 2 octahedral motif. This is achieved by fixing the octahedral occupancy of octahedral sites common to both octahedral motifs. Then the octahedral sites that are only present in the defect- spinel and CdCl 2 octahedral motifs are fixed to half this value. Octahedral sites shared by both types of octahedral motifs are in black, the defect-spinel in orange, and the CdCl 2 in red.
- FIG. 53(b) shows the change in goodness of fit parameter for Rietveld refinements with respect to the ratio of defect-spinel:CdCl 2 cation motif in the model used in the refinement.
- Figure 54 shows the PXRD patterns of AgBiI 4 , CuAgBiI 5 and Cu 2 AgBiI 6 powders after being exposed to one week in the solar spectrum, sealed in capillaries in air. Also shown are the PXRD of the controls, which were kept in the dark in air.
- FIG 55(a) shows the Raman spectra of AgBiI 4 , CuAgBiI 5 and Cu 2 AgBiI 6 control samples, showing the characteristic two peaks, which occur at low wavenumbers.
- the Raman spectra of AgBiI 4 , CuAgBiI 5 and Cu 2 AgBiI 6 powders after being exposed to the solar spectrum in different atmospheres are shown in Figure 55b, c and d, respectively.
- An additional peak appears in the CuAgBiI 5 spectrum after one week in the AM1.5 solar spectrum in all atmospheres (*).
- Figure 56 shows the TEM EDX compositions of particles scraped off from the solution processed film with nominal composition of Cu 2 AgBiI 6 in solution.
- Figure 57 shows the Pawley fit of PXRD pattern for Cu 2 AgBiI 6 films spincoated on FTO glass, fitted to a rhombohedral phase associated with a quaternary phase (green tick marks), a rhombohedral phase consistent with a Cu 3x Bi 1-x I 3 phase (blue tick marks), and SnO 2 (pink tick marks). Measured using Cu wavelength.
- Figure 58 shows SEM images of (a, b) rough, large, dendritic grains obtained during the early stages of solution processing the Cu 2 AgBiI 6 films.
- Figure 59(a) shows the raw PDS data of Cu 2 AgBiI 6 thin films.
- Figure 59(b) shows the PDS data (black) is scaled to match the absorption coefficient measured by FTIR (red).
- Figure 60 shows the transient photoluminescence measurement on Cu 2 AgBiI 6 fitted by a stretched exponential function (red) with an average lifetime of 33 ns. Measured at 720 nm using TCSPC, as described in the Experimental Methods section of example 2.
- Figure 61 shows the density of states at the valence band maximum (VBM) of CuAgBiI 5 and Cu 2 AgBiI 6 powders, as measured by XPS.
- VBM valence band maximum
- Cu 2 AgBiI 6 has some more states just below the VBM than CuAgBiI 5 , suggesting the extra states are due to Cu.
- Figure 62(b) shows the composition of 9 points of the film measured by SEM EDX, with an average composition of Cu 0.82(5) Ag 0.96(9) Bi 1.07(4) I 3.98(13) corresponding to an iodine deficit of 20(3)%.
- Figure 62 (c) is an image of a CuAgBiI5 film, showing uniformity but a rough surface caused by the morphology seen in the SEM images in Figures 62 (d) and (e).
- Figure 62(f) is an image of the film when backlit by a white LED, showing the transmission of red light.
- Figure 63(a) shows the steady-state optical absorption coefficient measured for three thin films of CuAgBiI 5 using a Bruker Vertex 80v Fourier-Transform Infrared (FTIR) spectrometer. The shaded area indicates the standard error in the measurements from variation in thickness across the films. The inset shows the same data, without the error, on a logarithmic scale to make the onset at 900 nm clearer.
- FTIR Fourier-Transform Infrared
- Figure 63(b) shows the steady-state photoluminescence spectra measured for three fresh thin films of CuAgBiI 5 in vacuum following excitation by a continuous-wave laser at 398 nm with an excitation density of 40.5 Wcm -2 . Measured data are shown in crosses and lines show a ten- point moving average. The sharp peak at 800 nm is due to the second reflection of the laser signal from the diffraction grating in the detection setup.
- Figure 63(c) shows the time-resolved photoluminescence decays for a fresh thin film of CuAgBiI 5 measured in vacuum using Time- Correlated Single Photon Counting (TCSPC) following excitation by a 398 nm pulsed laser at a repetition rate of 5 MHz. The lowest-fluence decay was fitted with a stretched exponential, shown in yellow, yielding an average lifetime of 0.73 ns.
- Figure 63(d) shows the time-resolved photoluminescence decays for the same sample as in (c), measured in air after the time-resolved emission spectra shown in Figure 65. The lowest-fluence decay was again fitted with a stretched exponential, giving an average lifetime of 17.9 ns.
- Figures 63(e,f) show charge-carrier mobilities measured across for two thin films of CuAgBiI 5 using Optical-Pump Terahertz-Probe spectroscopy at fluences of 4.9, 12.5, 25 ⁇ Jcm -2 . The measured values and their experimental errors are shown in red with error bars, and the mean and standard error are shown as the black line and grey shaded area.
- Figure 64(a) shows the relationship between octahedral (O) site occupancy and type of octahedral motif formed, giving chemical control over dimensionality of the octahedral network. CuBiI 4 does not fit the trend but it found to be metastable at room temperature.
- Figure 64(b) shows the same relationship shown in the CuI-AgI-BiI 3 phase space, where the colour map and red contour lines represent O site occupancy.
- O site occupancy in (b) is not representative of materials which contain tetrahedral Ag + such as the room temperature structure of AgI.
- Figure 65(a) shows the time-resolved emission spectra measured in vacuum using TCSPC.
- the vertical and horizontal lines indicate spectral and transient decay slices, respectively, which are shown in Figures 65(b) and (c).
- the measured values in Figure 65(b) are shown as crosses, with the lines showing a five-point moving average.
- Figures 66(a, b) show steady-state photoluminescence spectra measured for two thin films of CuAgBiI 5 after being left in air and darkness for 20, 60, 90 minutes.
- the PL was measured following excitation by a continuous-wave laser at 398 nm with an excitation density of 39.0 Wcm -2 .
- the spectra after 20 minutes have the same shape as those measured in vacuum, shown in Figure 63(b).
- the PL spectra blue-shift and increase significantly in intensity for both samples, although on slightly different timescales. For clarity, we only plot lines showing the ten-point moving average of the measured data.
- Figures 66(c, d) show five steady-state photoluminescence spectra for a thin film of CuAgBiI 5 measured under continuous illumination over 15 s by a 398 nm laser at an intensity of 39.0 Wcm -2 after being left in air for 20 (c) and 90 (d) minutes, respectively. In both cases the spectra do not change shape but do decrease in intensity over 15 s of continuous illumination.
- Figure 67 shows images and SEM images of solution-processed Cu(Ag 1.5 Bi 0.5 )I 4 films in Example 3.
- Figure 69 shows SEM EDX measurements of nominal Cu(Ag 1.5 Bi 0.5 )I 4 in Example 3 giving an average composition of Cu 0.98(4) Ag 1.46(3) Bi 0.52(2) I 3.24(10) (blue). The compositional spread in Cu, Ag and Bi are smaller for those measured for CuAgBiI 5 (red) and Cu 2 AgBiI 6 (green) films.
- Figure 70 shows the absorption and photoluminescence spectra measured on Cu(Ag 1.5 Bi 0.5 )I 4 films in Example 3.
- Black tick marks correspond to the main trigonal phases for each fitting.
- Tick marks of a secondary trigonal phase, AgI, BiI 3 , and CuI are shown in orange, red, blue and green respectively.
- the broad unfitted peaks at 9.7° and 19.2° are due to decomposition product BiOI.
- Figure 74 shows the measured mobility plotted against the closest value of x Cu 4x (AgBi) 1-x I 4 calculated using the average compositions measured by SEM EDX.
- Figure 75 shows the measured absorption coefficients of Cu 4x (AgBi) 1-x I 4 films.
- Figure 77 shows annealed (air) and as deposited X-ray diffraction patterns of evaporated Cu 2 AgBiI 6 films from Example 5. Data was aligned using the quartz peaks at 16.3° and 33.1° as a reference.
- Figure 78 shows the top view SEM image of the as deposited film on quartz from Example 5 showing uniform coverage.
- Figure 79 shows the top view SEM image of uniform film on quartz from Example 5 annealed post-deposition at 110°C in air.
- Figure 80 shows the top view SEM image of a Cu2AgBiI6 film from Example 5 annealed post- deposition at 130°C in air.
- the lighter coloured material is silver resulting from beam damage when high electron acceleration voltage and high magnification is used. Upon reducing the magnification quickly, silver is absorbed back into the bulk lattice.
- Figure 81 shows the large area top view SEM image of a Cu2AgBiI6 film on quartz from Example 5 annealed post-deposition at 150°C in air showing pinholes
- Figure 82 shows the UV-VIS absorbance of as deposited and annealed Cu 2 AgBiI 6 on quartz from Example 5.
- Figure 83 shows the photoluminescence measurements of as deposited and annealed Cu 2 AgBiI 6 film on quartz showing peak photon emission at 720 nm.
- Figure 84 shows absorption and photoluminescence spectra comparing a Cu 2 AgBiI 6 film from Example 5 exposed to 400-700 nm light for one week to a film stored in the dark.
- Figure 85 shows absorption and photoluminescence spectrum comparing a Cu 2 AgBiI 6 film exposed to 400-700 nm light for three weeks to a film stored in the dark.
- Figure 86 is a photograph of the metallic silver lining the quartz crucibles used to deposit AgI. The yellow powder is trapped silver iodide.
- Figure 87 shows XRD patterns of fresh AgI powder compared to the residue left in the quartz crucible post-deposition. The XRD pattern belonging to the residue shows the presence of metallic silver.
- the peak positions of AgI (P 63 mc) and Ag ( ⁇ 3 ⁇ ⁇ ) were taken from references [11] and [12] in Example 5 respectively.
- Figure 88 shows cross sectional SEM images of Cu 2 AgBII 6 devices from Example 5 showing voids at the PEDOT:PSS/Cu2AgBII6 interface.
- the n-i-p device comprises of Glass//ITO//PEDOT:PSS//Cu 2 AgBiI 6 //PCBM//BCP//Ag.
- the dashed red box highlights void formation at the PEDOT:PSS//Cu-Ag-Bi-I interface when using quartz crucibles.
- Figure 89 shows cross section SEM images of Cu 2 AgBiI 6 films deposited from quartz crucibles on SnO 2 //ITO//Glass from Example 5.
- FIG. 90 shows cross sectional SEM images of evaporated Cu 2 AgBiI 6 films deposited from alumina crucibles on SnO 2 //ITO//Glass from Example 5. The Cu 2 AgBiI 6 is homogenous across the interface and no voids are observed.
- Figure 91 shows the fitting of (a) Cu 2p, (b) Ag 3d, (c) Bi 4f, and (d) I 3d core levels of X-ray photoelectron spectroscopy (XPS) data collected for CuAgBiI 5 bulk sample.
- XPS X-ray photoelectron spectroscopy
- FIG 92 shows the valence band maximum (VBM) and conduction band minimum (CBM) positions with respect to vacuum measured for CuAgBiI 5 and Cu2AgBiI 6 bulk samples. The ionisation potential are measured on bulk samples and the optical band gap measured on thin films.
- VBM valence band maximum
- CBM conduction band minimum
- Figure 93 shows five steady-state photoluminescence spectra for a thin film of CuAgBiI5 measured under continuous illumination over 15 s by a 398 nm laser at an intensity of 39.0 Wcm -2 after being left in air for 20 (a) and 90 (b) minutes, respectively. In both cases the spectra do not change shape but do decrease in intensity over 15 s of continuous illumination.
- Figure 94 shows structures in the CuI-AgI-BiI 3 phase space: binaries CuI, AgI and BiI 3 ; ternaries Ag 3 BiI 6 , Ag 2 BiI 5 , AgBiI 4 , AgBi 2 I 7 , Ag 2 Bi 3 I 11 , CuBiI 4 , Cu 2 BiI 5 ; and quaternary Cu 2 AgBiI 6 . Also included is CuAgBiI 5 . All these compounds consist of a close-packed iodide sub-lattice with varying arrangements of the cations filling the octahedral and tetrahedral interstitial sites to form the structures shown.
- Figure 95 shows (a) The three Cu + sites in CuBiI 4 (spinel) colour coded as yellow (site 1), orange (site 2) and red (site 3).
- a channel in the spinel octahedral (Oct) motif is highlighted in blue, which a cross-section is taken of to show the tetrahedral (Tet) sites inside (sites located behind the channel, which appear to be inside due to the 2D representation of the 3D structure, have been crossed out).
- the red site (site 3) is the same in spinel. Some, but not all, of the orange sites (site 2) are occupied in CuAgBiI 5 .
- the Tet sites in CuAgBiI 5 can be considered as a reflection of the spinel sites with the mirror plane down the centre of the channel (blue dashed line)
- (b) The two Cu + sites in the small trigonal unit cell (Cu 2 AgBiI 6 and CuBiI 4 (CdCl 2 )) showing layered ordering. Also shown are the connectivity’s of the Tet sites, which give a 3D Tet network
- the layered ordering of Cu + sites in CuAgBiI 5 means they are only in layers with 1/4 Oct interstitial occupancy and do not occupy all the sites associated with tetrahedral site 2 in CuBiI 4 (spinel).
- Figure 98 shows a cross sectional sketch of the iodine annealing setup, consisting of a metal base plate (1), a rubber gasket ring (2), a glass cover (3), a hole in the baseplate (4) and a valve connected to that hole (5).
- the samples (6) and the elemental solid iodine (7) are placed under the cover other before closing, evacuating and heating the setup.
- Figure 99 shows experimental XRD patterns of as-deposited and annealed Cu 2 AgBiI 6 films in ambient air. Annealed films were heated to 110°C, 130°C, and 150°C for 15 minutes using a hotplate. Small impurity peaks belonging to BiI 3 and a second quaternary Cu-Ag-Bi-I peak are labelled with (*) and (#) respectively. Peaks highlighted with (+) at 16.3° and 33.2° belong to the quartz substrate. There is no difference in the phases present in films annealed in air (Fig.99) and iodine (Fig.100).
- Figure 100 shows experimental XRD patterns of as-deposited and annealed Cu 2 AgBiI 6 films in iodine vapour.
- Annealed films were heated to 110°C, 130°C, and 150°C for 15 minutes using a hotplate. There is no difference in the phases present in films annealed in air (Fig.99) and iodine (Fig.100).
- Figure 101 shows absorption coefficient spectra of 250 nm thick Cu 2 AgBiI 6 films on quartz annealed at 110°C, 130°C and 150°C in air. Absorption coefficient data for evaporated 250 nm thick CuI on quartz is shown for comparison. All data was collected using a UV-VIS spectrophotometer.
- Figure 102 shows absorption coefficient spectra of 250 nm thick Cu 2 AgBiI 6 films on quartz annealed at 110°C, 130°C and 150°C in an iodine atmosphere.
- Figure 103 shows a photoluminescence (PL) spectra of as deposited, air, and iodine-annealed Cu 2 AgBiI 6 films on quartz. The PL spectra of CuI is included for reference. Excitation wavelength was 405 nm.
- Figure 104 shows Time Resolved Photoluminescence (TRPL) spectroscopy of as deposited and annealed films in air. Average lifetimes were extracted by fitting stretched exponentials of the form t ⁇ is the characteristic lifetime, t is time, and ⁇ is the stretching factor which accounts for the heterogeneity in decay mechanisms. t ⁇ was calculated using where ⁇ is the gamma function .
- Excitation wavelength was 405 nm.
- Figure 105 shows Time Resolved Photoluminescence (TRPL) spectroscopy of as deposited and annealed films in an iodine atmosphere. Average lifetimes were extracted by fitting stretched exponentials of the form where t ⁇ is the characteristic lifetime, t is time, and ⁇ is the stretching factor which accounts for the heterogeneity in decay mechanisms. was calculated using where ⁇ is the gamma function. Excitation wavelength was 405 nm.
- Figure 106 shows top view SEM images of a) as deposited and 150°C annealed Cu 2 AgBiI 6 films in b) air and c) iodine atmospheres. The lighter coloured material is CuI.
- optical material refers to a material which either (i) absorbs light, which may then generate free charge carriers; or (ii) accepts charge, both electrons and holes, which may subsequently recombine and emit light. Such materials may also be referred to as “photoactive materials”. Optoelectronic/photoactive materials may be examples of semiconducting materials.
- photovoltaic material refers to a material that absorbs light, then generates free charge carriers.
- electroluminescent material refers to a material that accepts charge, both electrons and holes, which subsequently recombine and emit light.
- photoluminescent material refers to a material that is able to absorb photons and undergo photoexcitation, then emit photons.
- a photoemissive material is a material which absorbs light of energies higher than band gap and reemits light at energies at the band gap.
- electroconductive material refers to a material that is able to conduct charge.
- An electronic material may be a hole conductor material, an electron transporting material, or a material capable of transporting electrons and holes.
- a semiconductor or semiconducting material may be an negative (n)-type semiconductor, a positive (p)-type semiconductor or an intrinsic (i) semiconductor.
- a semiconductor or semiconducting material may have a band gap of from 0.5 to 3.5 eV, for instance from 0.5 to 3.0 eV, from 0.5 to 2.5 eV, from 1.0 to 2.5 eV or from 1.0 to 2.0 eV (when measured at 300 K).
- semiconductor and “semiconducting material” have the same meaning herein and may be used interchangeably.
- the compounds defined herein are typically semiconductors.
- semiconductor device and “semiconducting device”, as used herein, refer to a device comprising a functional component which comprises a semiconducting material.
- Examples of semiconductor devices include an optoelectronic device such as a photovoltaic device, a solar cell, a photo detector, a photodiode, a photosensor, a chromogenic device, a transistor, a light-sensitive transistor, a phototransistor, a solid state triode, a battery, a battery electrode, a capacitor, a super- capacitor, a light-emitting device and a light-emitting diode.
- the terms “semiconductor device” and “semiconducting device” have the same meaning herein and may be used interchangeably.
- the term “optoelectronic device”, as used herein, refers to devices which source, control, detect or emit light. Light is understood to include any electromagnetic radiation.
- optoelectronic devices examples include photovoltaic devices, photodiodes (including solar cells), phototransistors, photomultipliers, photoresistors, light emitting devices, electroluminescent devices, light emitting diodes, charge injection lasers and X-ray scintillators.
- an “optoelectronic device” that is referred to herein is a photovoltaic device or an electroluminescent device.
- crystalline indicates a crystalline compound, which is a compound having an extended 3D crystal structure.
- a crystalline compound is typically in the form of crystals or, in the case of a polycrystalline compound, crystallites (i.e.
- n-type region refers to a region of one or more electron-transporting (i.e. n-type) materials.
- n-type layer refers to a layer of an electron- transporting (i.e. an n-type) material.
- An electron-transporting i.e.
- an n-type material could, for instance, be a single electron-transporting compound or elemental material.
- An electron- transporting compound or elemental material may be undoped or doped with one or more dopant elements.
- the term “p-type region”, as used herein, refers to a region of one or more hole-transporting (i.e. p- type) materials.
- the term “p-type layer” refers to a layer of a hole-transporting (i.e. a p- type) material.
- a hole-transporting (i.e. a p-type) material could be a single hole-transporting compound or elemental material, or a mixture of two or more hole-transporting compounds or elemental materials.
- a hole-transporting compound or elemental material may be undoped or doped with one or more dopant elements.
- the term “perovskite”, as used herein, refers to a material with a three-dimensional crystal structure related to that of CaTiO 3 or a material comprising a layer of material, which layer has a structure related to that of CaTiO 3 .
- the structure of CaTiO 3 can be represented by the formula ABX 3 , wherein A and B are cations of different sizes and X is an anion. In the unit cell, the A cations are at (0,0,0), the B cations are at (1/2, 1/2, 1/2) and the X anions are at (1/2, 1/2, 0).
- the A cation is typically twelve coordinate and the B cation is typically six coordinate (octahedral coordination).
- the A cation is usually larger than the B cation.
- the skilled person will appreciate that when A, B and X are varied, the different ion sizes may cause the structure of the perovskite material to distort away from the structure adopted by CaTiO 3 to a lower-symmetry distorted structure. The symmetry will also be lower if the material comprises a layer that has a structure related to that of CaTiO 3 .
- Materials comprising a layer of perovskite material are well known. For instance, the structure of materials adopting the K 2 NiF 4 -type structure comprises a layer of perovskite material.
- a perovskite material can be represented by the formula [A][B][X] 3 , wherein [A] is at least one cation, [B] is at least one cation and [X] is at least one anion.
- the different A cations may distributed over the A sites in an ordered or disordered way.
- the perovskite comprises more than one B cation
- the different B cations may distributed over the B sites in an ordered or disordered way.
- the perovskite comprise more than one X anion the different X anions may distributed over the X sites in an ordered or disordered way.
- perovskite also includes A/M/X materials adopting a Ruddlesden-Popper phase.
- Ruddlesden-Popper phase refers to a perovskite with a mixture of layered and 3D components.
- perovskites can adopt the crystal structure, where A and A’ are different cations and n is an integer from 1 to 8, or from 2 to 6.
- the term “perovskite” also includes A/M/X materials adopting a Dion-Jacobson phase. Dion-Jacobson phase refers to a perovskite with a mixture of layered and 3D components. Such perovskites can adopt the crystal structure, A where A and A’ are different cations and q is an integer from 1 to 8, or from 2 to 6.
- mixed 2D and 3D perovskite is used to refer to a perovskite film within which there exists both regions, or domains, of AMX 3 and perovskite phases.
- halide indicates the singly charged anion of an element in group VII of the periodic table.
- Halide includes fluoride, chloride, bromide and iodide.
- chalcogenide refers to an anion of group 6 element, i.e. of a chalcogen. Typically, chalcogenide refers to an oxide anion, a sulphide anion, a selenide anion or a telluride anion.
- consisting essentially of refers to a composition comprising the components of which it consists essentially as well as other components, provided that the other components do not materially affect the essential characteristics of the composition.
- a composition consisting essentially of certain components will comprise greater than or equal to 95 wt% of those components or greater than or equal to 99 wt% of those components.
- Crystalline compound The present invention provides a crystalline compound comprising (i) One or more first cations, A; (ii) One or more second cations, B; (iii) One or more third cations, B’; (iv) One or more anions, X; wherein the one or more first cations, A, are different from the one or more second cations, B, and to the one or more third cations, B’, and wherein the one or more second cations, B, are different from the one or more first cations, A, and to the one or more third cations, B’, wherein at least some of the one or more third cations, B’, are in an octahedral coordination environment, and wherein at least some of the one or more first cations, A, are in a tetrahe
- the one or more first cations, A, the one or more second cations, B, and the one or more third cations, B’ therefore each correspond to a different cation or group of cations.
- the crystalline compound must always contain a minimum of three different types of cation.
- present invention provides quaternary compounds in which some cations occupy tetrahedral sites and other cations occupy octahedral sites. This occupancy pattern permits a greater variety of compounds with useful optical and electronic properties to be accessed beyond the conventional group of perovskites, which do not contain cations occupying tetrahedral coordination environments.
- the smaller cations usually occupy octahedral sites in the anion lattice whilst the larger cations occupy twelve coordinate cuboctahedral sites.
- the crystalline compound is not a perovskite.
- This occupancy pattern also provides access to structures beyond the previously investigated Ag/Bi/I containing materials mentioned above, in which the cations occupy octahedral sites only.
- Cu-doped Ag 2 BiI 5 in which the Cu is said to replace Ag + at the octahedral site of the hexagonal Ag 2 BiI 5 structure is disclosed in J. W. Park et al, Sustainable Energy Fuels, 2021, DOI: 10.1039/D0SE01563F.
- At least some of the first cations, A are in a tetrahedral coordination environment.
- a cations In the crystalline compounds of the invention at least some of the one or more first cations, A, are in a tetrahedral coordination environment.
- the compounds of the invention are simple modifications of known perovskite or Ag/Bi/I containing materials, where additional cations are simply substituted for atoms on the existing octahedral sites.
- at least some of the one or more first cations, A form AX 4 tetrahedra.
- all of the one or more first cations, A are in a tetrahedral coordination environment. In other words, all of the one or more first cations, A, form AX 4 tetrahedra. In other instances, at least some of the one or more first cations, A, are in a tetrahedral coordination environment and at least some of the one or more first cations, A, are in a non-tetrahedral coordination environment, for instance an octahedral coordination environment. Thus, least some of the one or more first cations, A, form AX 4 tetrahedra and at least some of the one or more first cations, A, form AX 6 octahedra.
- the one or more first cations, A are of a size suitable to occupy a tetrahedral coordination environment in the anion lattice.
- the one or more first cations, A have a Shannon ionic radius of less than 1.5 ⁇ , preferably less than 1 ⁇ for instance less than 0.8 ⁇ or less than 0.7 ⁇ .
- the one or more first cations, A have a Shannon ionic radius between 0.3 and 1.5 ⁇ , for instance from 0.4 to 1.2 ⁇ or from 0.5 to 1 ⁇ .
- the one or more first cations, A may comprise one or more metal cations and/or one or more non- metal cations.
- the one or more first cations, A may comprise one or more metal cations of size suitable to occupy a tetrahedral coordination environment in the anion lattice.
- the one or more first cations, A may comprise one or more non-metal cations of size suitable to occupy a tetrahedral coordination environment in the anion lattice.
- the one or more first cations, A may comprise one or more metal cations of size suitable to occupy a tetrahedral coordination environment in the anion lattice and one or more non-metal cations of size suitable to occupy a tetrahedral coordination environment in the anion lattice.
- the one or more first cations, A comprise one or more of Mg 2+ , Ga 3+ , Ge 4+ , Si 4+ , P 5+ , Cu + , Zn 2+ , Ti 4+ , Al 3+ , In 3+ and Li + .
- the one or more first cations, A may comprise two or more or three or more of Mg 2+ , Ga 3+ , Ge 4+ , Si 4+ , P 5+ , Cu + , Zn 2+ , Ti 4+ , Al 3+ , In 3+ and Li + .
- the one or more first cations, A may consist of two cations selected from the group consisting of Mg 2+ , Ga 3+ , Ge 4+ , Si 4+ , P 5+ , Cu + , Zn 2+ , Ti 4+ , Al 3+ , In 3+ and Li + .
- the one or more first cations, A may be a single cation selected from the group consisting of Mg 2+ , Ga 3+ , Ge 4+ , Si 4+ , P 5+ , Cu + , Zn 2+ , Ti 4+ , Al 3+ , In 3+ and Li + .
- the one or more first cations, A may have the electronic configuration Nd 10 , wherein N is an integer from 3 to 5.
- the one or more first cations, A may have the electronic configuration 3d 10 , 4d 10 or 5d 10 , preferably the one or more first cations, A may have the electronic configuration 3d 10 or 4d 10 .
- Cations with the Nd 10 configuration may contribute to band edge states in the crystalline compound, thereby providing useful electronic properties.
- the one or more first cations, A comprise Cu + .
- the one or more first cations, A may comprise Cu + and one or more other cations selected from other metal cations of a size suitable to occupy a tetrahedral coordination environment in the anion lattice.
- the one or more first cations, A may comprise Cu + and one or more other cations selected from non-metal cations of a size suitable to occupy a tetrahedral coordination environment in the anion lattice.
- the one or more first cations, A may comprise Cu + and one or more other cations selected from other metal cations of a size suitable to occupy a tetrahedral coordination environment in the anion lattice and one or more other cations selected from non-metal cations of a size suitable to occupy a tetrahedral coordination environment in the anion lattice.
- the one or more first cations, A may comprise or consist of Cu + and one or more other cations selected from the group consisting of Mg 2+ , Ga 3+ , Ge 4+ , Si 4+ , P 5+ , Zn 2+ , Ti 4+ , Al 3+ , In 3+ and Li + .
- the one or more first cations, A may be a single cation which is Cu + .
- B cations Typically, at least some of the one or more second cations, B, are in an octahedral coordination environment. Thus, typically, at least some of the one or more second cations, B, form BX6 octahedra.
- all of the one or more second cations, B are in an octahedral coordination environment.
- all of the one or more second cations, B form BX 6 octahedra.
- the one or more second cations, B may comprise one or more metal cations and/or one or more non-metal cations.
- the one or more second cations, B may comprise one or more metal cations of size suitable to occupy a octahedral coordination environment in the anion lattice.
- the one or more second cations, B may comprise one or more non-metal cations of size suitable to occupy a octahedral coordination environment in the anion lattice.
- the one or more second cations, B may comprise one or more metal cations of size suitable to occupy a octahedral coordination environment in the anion lattice and one or more non-metal cations of size suitable to occupy a octahedral coordination environment in the anion lattice.
- the one or more second cations, B may comprise one or more alkali metal cations.
- the one or more second cations, B may comprise one or more transition metal cations.
- the one or more second cations, B may comprise one or more alkali earth metal cations.
- the one or more second cations, B may comprise one or more alkali metal cations and/or one or more alkali metal earth cations and/or one or more transition metal cations.
- the one or more second cations, B may comprise one or more alkali metal cations and one or more transition metal cations.
- the one or more second cations, B comprise one or more of Ag + , Mn 2+ , Fe 2+ , Co 2+ , Ni 2+ , Cr 3+ , V 2+ , Cd 2+ , Cu + , Au + , Pt 2+ , Pt 4+ , Mg 2+ , Li + , Na + , K + , Rb + , Cs + , In + , Ca 2+ , Sr 2+ , La 3+ and Y 3+ .
- the one or more second cations, B may comprise two or more, or three or more of Ag + , Mn 2+ , Fe 2+ , Co 2+ , Ni 2+ , Cr 3+ , V 2+ , Cd 2+ , Cu + , Au + , Pt 2+ , Pt 4+ , Mg 2+ , Li + , Na + , K + , Rb + , Cs + , In + , Ca 2+ , Sr 2+ , La 3+ and Y 3+ .
- the one or more second cations, B may consist of two cations selected from the group consisting of Ag + , Mn 2+ , Fe 2+ , Co 2+ , Ni 2+ , Cr 3+ , V 2+ , Cd 2+ , Cu + , Au + , Pt 2+ , Pt 4+ , Mg 2+ , Li + , Na + , K + , Rb + , Cs + , In + , Ca 2+ , Sr 2+ , La 3+ and Y 3+ .
- the one or more second cations, B may be a single cation selected from the group consisting of Ag + , Mn 2+ , Fe 2+ , Co 2+ , Ni 2+ , Cr 3+ , V 2+ , Cd 2+ , Cu + , Au + , Pt 2+ , Pt 4+ , Mg 2+ , Li + , Na + , K + , Rb + , Cs + , In + , Ca 2+ , Sr 2+ , La 3+ and Y 3+ .
- the one or more second cations, B comprise Ag + .
- the one or more second cations, B may comprise Ag + and one or more other cations selected from other metal cations of a size suitable to occupy an octahedral coordination environment in the anion lattice.
- the one or more second cations, B may comprise Ag + and one or more other cations selected from non-metal cations of a size suitable to occupy an octahedral coordination environment in the anion lattice.
- the one or more second cations, B may comprise Ag + and one or more other cations selected from other metal cations of a size suitable to occupy an octahedral coordination environment in the anion lattice and one or more other cations selected from non-metal cations of a size suitable to occupy an octahedral coordination environment in the anion lattice.
- the one or more second cations, B may comprise or consist of Ag + and one or more other cations selected from the group consisting of Mn 2+ , Fe 2+ , Co 2+ , Ni 2+ , Cr 3+ , V 2+ , Cd 2+ , Cu + , Au + , Pt 2+ , Pt 4+ , Mg 2+ , Li + , Na + , K + , Rb + , Cs + , In + , Ca 2+ , Sr 2+ , La 3+ and Y 3+ .
- the one or more second cations, B may comprise or consist of Ag + , Na + and In + .
- the one or more second cations, B may comprise or consist of Ag + and Na + .
- the one or more second cations, B may be a single cation which is Ag + .
- the one or more second cations may be a single cation which is Na + .
- the molar ratio of the one or more first cations, A, to the one or more second cations, B, in the crystalline compounds as described herein is preferably at least 1:9. In this context, the molar ratio is defined as being the molar ratio between all of the one or more first cations, A, and all of the one or more second cations, B, in the event that multiple types of A and B cation are present.
- the molar ratio of the one or more first cations, A, to the one or more second cations, B, in the crystalline compound may be at least 1:8, or at least 1:7, or at least 1:6.
- the molar ratio of the one or more first cations, A, to the one or more second cations, B is at least 1:5, for instance at least 1:1. Therefore, the compound may comprise a larger molar % of the one or more first cations, A, than of the one or more second cations, B.
- the molar ratio of the one or more first cations, A, to the one or more second cations, B may be at least 2:1, at least 3:1, at least 4:1 or at least 5:1.
- the molar ratio of the one or more first cations, A, to the one or more second cations, B may be no more than 20:1, typically no more than 10:1, for instance no more than 5:1.
- the molar ratio of the one or more first cations, A, to the one or more second cations, B is from 1:9 to 20:1, preferably from 1:5 to 10:1.
- B’ cations At least some of the one or more third cations, B’, are in an octahedral coordination environment.
- at least some of the one or more third cations, B’ form B’X 6 octahedra.
- all of the one or more third cations, B’ are in a octahedral coordination environment.
- all of the one or more third cations, B’ form B’X 6 octahedra.
- the one or more third cations, B’ may have the electronic configuration Ns 2 , wherein N is an integer from 2 to 7. Typically N is an integer from 3 to 6.
- the one or more third cations, B’ may have the electronic configuration 3s 2 , 4s 2 , 5s 2 or 6s 2 .
- the one or more third cations, B’ may comprise one or more metal cations and/or one or more non-metal cations.
- the one or more third cations, B’ may comprise one or more metal cations of size suitable to occupy an octahedral coordination environment in the anion lattice.
- the one or more third cations, B’ may comprise one or more non-metal cations of size suitable to occupy a octahedral coordination environment in the anion lattice.
- the one or more third cations, B’ may comprise one or more metal cations of size suitable to occupy a octahedral coordination environment in the anion lattice and one or more non-metal cations of size suitable to occupy a octahedral coordination environment in the anion lattice.
- the one or more third cations, B’ comprise one or more of Bi 3+ , Pb 2+ , Sn 2+ , Ge 2+ , In 3+ , Sb 3+ , Te 4+ , Tl + , In + and Se 4+ .
- the one or more third cations, B’ may comprise two or more or three or more of Bi 3+ , Pb 2+ , Sn 2+ , Ge 2+ , In + , Sb 3+ , Te 4+ , Tl + , In 3+ and Se 4+ .
- the one or more third cations, B’ may consist of two cations selected from the group consisting of Bi 3+ , Pb 2+ , Sn 2+ , Ge 2+ , In + , Sb 3+ , Te 4+ , Tl + , In 3+ and Se 4+ .
- the one or more third cations, B’ may be a single cation selected from the group consisting of Bi 3+ , Pb 2+ , Sn 2+ , Ge 2+ , In + , Sb 3+ , Te 4+ , Tl + , In 3+ and Se 4+ .
- the one or more third cations may be one or more, or two or more, or three or more of Bi 3+ , Sn 2+ , Ge 2+ , In + , Sb 3+ , Te 4+ , Tl + , In 3+ and Se 4+ .
- the one or more third cations, B’ comprise Bi 3+ .
- the one or more third cations, B’ may comprise Bi 3+ and one or more other cations selected from other metal cations of a size suitable to occupy an octahedral coordination environment in the anion lattice.
- the one or more third cations, B’ may comprise Bi 3+ and one or more other cations selected from non-metal cations of a size suitable to occupy an octahedral coordination environment in the anion lattice.
- the one or more third cations, B’ may comprise Bi 3+ and one or more other cations selected from other metal cations of a size suitable to occupy an octahedral coordination environment in the anion lattice and one or more other cations selected from non-metal cations of a size suitable to occupy an octahedral coordination environment in the anion lattice.
- the one or more third cations, B’ may comprise or consist of Bi 3+ and one or more other cations selected from the group consisting of Pb 2+ , Sn 2+ , Ge 2+ , In + , Sb 3+ , Te 4+ , Tl + , In 3+ and Se 4+ .
- the one or more third cations, B’ may be a single cation with is Bi 3+ .
- X anions Typically, the one or more anions, X, form a close-packed lattice. Thus, the one or more anions, X, may form a cubic close-packed lattice. The one or more anions, X, may form a hexagonal close- packed lattice.
- At least some of the one or more first cations, A occupy at least some of the tetrahedral sites
- at least some of the one or more second cations, B may occupy at least some of the octahedral sites
- at least some of the one or more third cations, B’ occupy at least some of the octahedral sites.
- all of the one or more first cations, A may occupy at least some of the tetrahedral sites
- all of the one or more second cations, B may occupy at least some of the octahedral sites
- all of the one or more third cations, B’ may occupy at least some of the octahedral sites.
- the one or more anions, X typically comprise one or more anions selected from halide anions and chalcogenide anions.
- the one or more anions, X may consist of halide anions only.
- the one or more anions, X may consist of chalcogenide anions only.
- the one or more anions, X may consist of both halide and chalcogenide anions.
- the one or more anions, X typically comprise one or more anions selected from F-, Cl-, Br-, I-, O 2- , S 2- , Se 2- and Te 2- .
- the one or more anions, X may comprise two or more or three or more anions selected from F-, Cl-, Br-, I-, O 2- , S 2- , Se 2- and Te 2- .
- the one or more anions, X may consist of two anions selected from the group consisting of F-, Cl-, Br-, I-, O 2- , S 2- , Se 2- and Te 2- .
- the one or more anions, X may comprise a single anion selected from the group consisting of F-, Cl-, Br-, I-, O 2- , S 2- , Se 2- and Te 2- .
- the one or more anions, X may comprise one or more anions selected from I-, Br-, Cl-, S 2- , Se 2- and O 2- .
- the one or more anions, X may comprise two or more anions selected from F-, Cl-, Br-, I-, O 2- , S 2- , Se 2- and Te 2- .
- the one or more anions, X may comprise two or more anions selected from I-, Br-, Cl-, S 2- , Se 2- and O 2- .
- the one or more anions, X may comprise S 2- and one or more anions selected from F-, Cl-, Br- and I-.
- the one or more anions, X may comprise S 2- and I-.
- the one or more anions, X may comprise two or more anions selected from F-, Cl-, Br- and I-.
- the one or more anions, X may comprise F- and one or more anions selected from Cl-, Br- and I-.
- the one or more anions, X may comprise Cl- and one or more anions selected from F-, Br- and I-.
- the one or more anions, X may comprise Br- and one or more anions selected from F-, Cl- and I-.
- the one or more anions, X may comprise I- and one or more anions selected from F-, Cl- and Br-.
- the one or more anions, X may comprise I- and Br-.
- the one or more anions, X may comprise Br- and Cl-.
- the one or more anions, X comprise I-.
- the one or more anions, X may comprise I- and one or more other anions selected from halide anions and chalcogenide anions.
- the one or more anions, X may comprise I- and one or more other anions selected from F-, Cl-, Br-, I-, O 2- , S 2- , Se 2- and Te 2- .
- the one or more anions, X may be a single anion which is I-.
- at least some of the one or more first cations, A are in an tetrahedral coordination environment; at least some of the one or more second cations, B, are in an octahedral coordination environment; and at least some of the one or more third cations, B’, are in an octahedral coordination environment.
- At least some of the one or more first cations, A may form AX 4 tetrahedra; at least some of the one or more second cations, B, may form BX 6 octahedra; and at least some of the one or more third cations, B’, may form B’X 6 octahedra.
- At least some of the one or more first cations, A may form AX 4 tetrahedra; at least some of the one or more second cations, B, may form BX 6 octahedra; at least some of the one or more third cations, B’, may form B’X 6 octahedra and the one or more anions, X, form a close-packed structure.
- at least some of the one or more first cations, A form AX 4 tetrahedra; all of the one or more second cations, B, form BX 6 octahedra; and all of the one or more third cations, B’, form B’X 6 octahedra.
- the compound comprises an interconnected network of B’X 6 octahedra.
- the compound may comprise a network of edge-sharing B’X 6 octahedra or a network of corner- sharing B’X 6 octahedra.
- the compound comprises an interconnected network of B’X 6 octahedra in which the one or more third cations, B’, comprise Bi 3+ and the one or more anions, X, comprise I-.
- the compound may comprises an interconnected network of BiI 6 octahedra, e.g. an network of edge-sharing BiI 6 octahedra or a network of corner-sharing BiI 6 octahedra.
- the crystalline compound may have a structure based around a cubic-close packed array of the one or more anions, X, in which the one or more second cations, B, and the one or more third cations, B’, occupy edge sharing octahedral sites.
- the crystalline compound may have a structure based around a cubic-close packed array of the one or more anions, X, in which at least some of the one or more second cations, B, and the one or more third cations, B’, occupy edge sharing octahedral sites which form a two-dimensional network of edge-sharing octahedra.
- the crystalline compound may have a structure based on the cadmium chloride structure.
- the crystalline compound may have a structure based around a cubic-close packed lattice of the one or more anions, X, in which the one or more second cations, B, and the one or more third cations, B’, occupy octahedral sites and the one or more first cations, A, occupy tetrahedral sites.
- the precise levels of occupancy of the octahedral and tetrahedral sites in the cubic-close packed lattice of the one or more anions, X will vary depending on the charges on the A, B and B’ cations.
- the crystalline compound may have a structure based on the spinel structure.
- the crystalline compound may be a compound in which the one or more first cations, A, have the electronic configuration Nd 10 , wherein N is an integer from 3 to 5 and the one or more third cations, B’, have the electronic configuration Ns 2 , wherein N is an integer from 2 to 7, preferably wherein N is an integer from 3 to 6.
- the crystalline compound may be a compound in which the one or more first cations, A, have the electronic configuration 3d 10 , 4d 10 or 5d 10 and the one or more third cations, B’, have the electronic configuration 3s 2 , 4s 2 , 5s 2 or 6s 2 .
- the crystalline compound may be a compound in which the one or more first cations, A, comprise one or more of Mg 2+ , Ga 3+ , Ge 4+ , Si 4+ , P 5+ , Cu + , Zn 2+ , Ti 4+ , Al 3+ , In 3+ and Li + ;the one or more second cations, B, comprise one or more of Ag + , Mn 2+ , Fe 2+ , Co 2+ , Ni 2+ , Cr 3+ , V 2+ , Cd 2+ , Cu + , Au + , Pt 2+ , Pt 4+ , Mg 2+ , Li + , Na + , K + , Rb + , Cs + , In + , Ca 2+ , Sr 2+ , La 3+ and Y 3+ ; the one or more third cations, B’, comprise one or more of Bi 3+ , Pb 2+ , Sn 2+ , Ge 2+ , In + ,
- the crystalline compound is a compound in which the one or more first cations, A, comprise Cu + ; the one or more second cations, B, comprise Ag + ; the one or more third cations, B’, comprise Bi 3+ ; and the one or more anions, X, comprise I-.
- the crystalline compound may be a compound in which the one or more first cations, A, are Cu + ; the one or more second cations, B, are Ag + ; the one or more third cations, B’, are Bi 3+ ; and the one or more anions, X, are I-.
- the compound may further comprises a dopant cation.
- the dopant is an additional cation which may take the site of one of the first (A), second (B) and/or third (B’) cations in the crystal structure. To balance the charge, this may require the presence of charge-balancing defects, e.g. vacancies, in the crystal structure.
- the dopant cation is present in low atomic concentration in the crystalline compound. For instance, the dopant cation may be present in an amount of less than 1at.% or an amount of less than 0.5 at.%, typically an amount of less than 0.1at.%.
- the dopant cation is selected from a transition metal cation or a rare earth cation.
- the dopant cation is selected from the group consisting of Ce 3+ , Er 3+ , Yb 3+ , Eu 2+ and Eu 3+ .
- the crystalline compound may be a compound of formula (I): [A] 4x ⁇ [B][B’] ⁇ 1-x [X] 4 (I); wherein [A] is the one or more first cations, [B] is the one or more second cations, [B’] is the one or more third cations and [X] is the one or more anions, wherein the one or more first cations, A, are different from the one or more second cations, B, and the one or more third cations, B’, and wherein the one or more second cations, B, are different from the one or more first cations, A, and the one or more third cations, B’, wherein at least some of the one or more third cations, B’, are in an octahedral coordination environment, and wherein at least some
- the charges on the A, B, B’ and X ions must be such that they can form a compound having the stoichiometry described above.
- the one or more first cations, A may be any first cations as described herein.
- the one or more second cations, B may be any second cations as described herein.
- the one or more third cations, B’ may be any third cations as described herein.
- the one or more anions, X may be any anions as described herein.
- the one or more first cations, A comprise Cu +
- the one or more second cations, B comprise Ag +
- the one or more third cations B’ comprise Bi 3+
- the one or more anions, X comprise I-.
- the stoichiometries deviate by ⁇ 30% from the “ideal” values calculated for formula (I) at a certain value of x.
- x is from 0.05 to 0.95, preferably from 0.1 to 0.5.
- x may be from 0.15 to 0.25.
- x may be from 0.30 to 0.35.
- x may be 0.2 or x may be 0.33.
- the compound of formula (I) may be a compound having the formula [A] ⁇ [B][B’] ⁇ [X] 5 wherein the stoichiometry of each of the ions in the compound may vary by ⁇ 30%.
- the compound of formula (I) may be a compound having the formula [A] 2 ⁇ [B][B’] ⁇ [X] 6 wherein the stoichiometry of each of the ions in the compound may vary by ⁇ 30%.
- the one or more first cations, A may be any first cations as described herein.
- the one or more second cations, B may be any second cations as described herein.
- the one or more third cations, B’ may be any third cations as described herein.
- the one or more anions, X may be any anions as described herein.
- the one or more first cations, A comprise Cu +
- the one or more second cations, B comprise Ag +
- the one or more third cations B’ comprise Bi 3+
- the one or more anions, X comprise I-.
- the one or more first cations, A may comprise Cu +
- the one or more second cations, B may comprise Ag + and Na+
- the one or more third cations B’ may comprise Bi 3+
- the one or more anions, X may comprise I-.
- the compound of formula (I) may be a compound of the formula Cu 2 Ag y Na (1-y) BiI 6 where y is from 0 to 1, and wherein the stoichiometry of each of the ions in the compound may vary by ⁇ 30%.
- x may be from 0.5 to 0.9, preferably about 0.7.
- the compound of formula (I) maybe a compound of formula Cu 6 (Ag 1-y Na y/2 In y/2 )BiI 10 where y is greater than 0 and less than 1, and wherein the stoichiometry of each of the ions in the compound may vary by ⁇ 30%.
- the compound of formula (I) may be a compound of formula (IA): Cu 4x ⁇ AgBi ⁇ 1-x I 4 (IA); wherein x is greater than 0 and less than 1, and wherein the stoichiometry of each of the ions in the compound of formula (IA) may vary by ⁇ 30%.
- the stoichiometry of each of the ions in the compound of formula (IA) may vary by ⁇ 20%, or by ⁇ 10%,.
- the compound is Cu 0.4 AgBiI 4.4 , wherein the stoichiometry of each of the ions in the compound may vary by ⁇ 30% (i.e. a compound satisfying the formula Cu (0.3-0.5) Ag (0.7-1.3) Bi (0.7-1.3) I (3.1- 5.7) ).
- the compound may be Cu 0.4 AgBiI 4.4 , wherein the stoichiometry of each of the ions in the compound may vary by ⁇ 20% or ⁇ 10%.
- the compound is CuAgBiI 5 , wherein the stoichiometry of each of the ions in the compound may vary by ⁇ 30% (i.e. a compound satisfying the formula Cu(0.7-1.3)Ag(0.7-1.3)Bi(0.7-1.3)I(3.5- 6.5 ).
- the compound may be CuAgBiI 5 , wherein the stoichiometry of each of the ions in the compound may vary by ⁇ 20% or ⁇ 10%.
- the compound is Cu 2 AgBiI 6 , wherein the stoichiometry of each of the ions in the compound may vary by ⁇ 30% (i.e.
- the compound may be Cu 2 AgBiI 6 , wherein the stoichiometry of each of the ions in the compound may vary by ⁇ 20% or ⁇ 10%.
- the compound is Cu 6 AgBiI 10 , wherein the stoichiometry of each of the ions in the compound may vary by ⁇ 30% (i.e. a compound satisfying the formula Cu (4.2-7.8) Ag (0.7-1.3) Bi (0.7-1.3) I (6- 13) ).
- the compound may be Cu 6 AgBiI 10 , wherein the stoichiometry of each of the ions in the compound may vary by ⁇ 20% or ⁇ 10%.
- the crystalline compound may be a compound of formula (II): [A] 1+2x ⁇ [B] 3x [B’] 1-x ⁇ 2 [X] 7+2x (II); wherein [A] is the one or more first cations, [B] is the one or more second cations, [B’] is the one or more third cations and [X] is the one or more anions, wherein the one or more first cations, A, are different from the one or more second cations, B, and the one or more third cations, B’, and wherein the one or more second cations, B, are different from the one or more first cations, A, and the one or more third cations, B’, wherein at least some of the one or more third cations, B’, are in an o
- the charges on the A, B, B’ and X ions must be such that they can form a compound having the stoichiometry described above.
- the one or more first cations, A may be any first cations as described herein.
- the one or more second cations, B may be any second cations as described herein.
- the one or more third cations, B’ may be any third cations as described herein.
- the one or more anions, X may be any anions as described herein.
- the one or more first cations, A comprise Cu +
- the one or more second cations, B comprise Ag +
- the one or more third cations B’ comprise Bi 3+
- the one or more anions, X comprise I-.
- the stoichiometries may deviate by ⁇ 30% from the “ideal” values calculated for formula (I) at a certain value of x.
- x is from 0.05 to 0.95, for instance from 0.1 to 0.6.
- x may be from 0.20 to 0.30. x may be from 0.45 to 0.55. Preferably x is 0.25 or x is 0.5.
- the compound of formula (II) may be a compound having the formula [A] ⁇ [B][B’] ⁇ [X] 5 wherein the stoichiometry of each of the ions in the compound may vary by ⁇ 30%.
- the compound of formula (II) may be a compound having the formula [A] ⁇ [B] 1.5 [B’] 0.5 ⁇ [X] 4 wherein the stoichiometry of each of the ions in the compound may vary by ⁇ 30%.
- the one or more first cations, A may be any first cations as described herein.
- the one or more second cations, B may be any second cations as described herein.
- the one or more third cations, B’ may be any third cations as described herein.
- the one or more anions, X may be any anions as described herein.
- the one or more first cations, A comprise Cu +
- the one or more second cations, B comprise Ag +
- the one or more third cations B’ comprise Bi 3+
- the one or more anions, X comprise I-.
- the compound of formula (II) may be a compound of formula (IIA): Cu 1+2x ⁇ Ag 3x Bi 1-x ⁇ 2 I 7+2x (IIA); wherein x is greater than 0 and less than 1, and wherein the stoichiometry of each of the ions in the compound of formula (IA) may vary by ⁇ 30%.
- the stoichiometries may deviate by ⁇ 30% from the “ideal” values calculated for formula (IIA) at a certain value of x.
- the stoichiometry of the Cu + cation, the Ag + cation, the Bi 3+ cation, and I- anion will fall within the following ranges: Cu (1.05-2.0) ⁇ Ag (0.53-0.98) Bi (0.53-0.98) ⁇ 2 I (5.25-9.98) .
- the ranges of possible stoichiometries for each ion in formula (IIA) can be calculated in an analogous way.
- the stoichiometry of each of the ions in the compound of formula (IIA) may vary by ⁇ 20%, or by ⁇ 10%.
- the compound is CuAg 1.5 Bi 0.5 I 4 , wherein the stoichiometry of each of the ions in the compound may vary by ⁇ 30% (i.e. a compound satisfying the formula Cu (0.7-1.3) Ag (1.05-1.95) Bi (0.35- 0.65) I (2.8-5.2) ).
- the compound may be CuAg 1.5 Bi 0.5 I 4 , wherein the stoichiometry of each of the ions in the compound may vary by ⁇ 20% or ⁇ 10%.
- the crystalline compound is a semiconductor.
- the crystalline compound is a semiconductor having a band gap of from 0.5 to 3.5 eV.
- the crystalline compound may be a compound which is a semiconductor having a band of from 0.5 to 3.0 eV, from 0.5 to 2.5 eV, from 1.0 to 2.5 eV or from 1.0 to 2.0 eV or from 1.5 to 2.5 eV.
- Film/device The invention also provides a film comprising a compound as described herein.
- the film is a film having a thickness of 2 ⁇ m or less.
- the film may have a thickness of from 1 to 2 ⁇ m.
- the film may have a thickness on the nanoscale, i.e. less than 1 ⁇ m.
- the thickness of the film may be from 1 to 1000 nm, from 1 to 500 nm or from 1 to 250 nm.
- the thickness of the film may be from 25 to 750 nm, from 50 to 500 nm or from 75 to 250 nm.
- the thickness of the film may be varied by changing the concentration of solution (when using solution processing techniques) or by changing evaporation time (when using evaporation processing techniques).
- the film comprising a compound as described herein may be a passivated film, which comprises: a) a compound as defined herein; and b) a passivating agent. Advantages of employing a passivating agent in the film are evidenced in Example 6 hereinbelow.
- the passivating agent may be a halogen, sulfur, selenium or an organic amine.
- the passivating agent is selected from one or more of iodine, sulfur, selenium or methylamine.
- the passivating agent is a halogen, and more preferably it is iodine.
- the passivating agent may be present in the film in, for example, molecular or ionic form.
- the invention also provides a semiconductor device comprising a compound as or a film as described herein.
- the semiconductor device may be an optoelectronic device (for instance a photovoltaic device, a solar cell, a photodetector, a photomultiplier, a photoresistor, a charge injection laser, a photodiode, a photosensor, a chromogenic device, a light-sensitive transistor, a phototransistor, a light-emitting device, an electroluminescent device, or a light-emitting diode, an X-ray scintillator), a luminescent device (for instance a phosphor in a display or in lighting), a transistor, a solid state triode, a battery, a battery electrode, a radiation detector, a capacitor or a super-capacitor.
- an optoelectronic device for instance a photovoltaic device, a solar cell, a photodetector, a photomultiplier, a photoresistor, a charge injection laser, a photodiode,
- the device is an optoelectronic device.
- the optoelectronic device is selected from a photovoltaic device, a light emitting device, a photodetector or an X-ray scintillator.
- the semiconductor device may be a photodetector, for instance a detector of visible light, infrared light, x-ray radiation and/or gamma ray radiation.
- the compound may be in any form within the semiconducting device.
- the compound is in the form of a layer, for instance a photoactive, photoemissive or photoabsorbent, layer.
- the compound is present in the form of a film as described herein.
- the film may be a passivated film as described herein.
- the semiconductor device may comprise a layer of the compound having a thickness of 2 ⁇ m or less.
- the compound often acts as a photoactive component (e.g. a photoabsorbent component or a photoemissive component) within the semiconductor device.
- the compound may alternatively act as a p-type semiconductor component, an n-type semiconductor component, or an intrinsic semiconductor component in the semiconductor device.
- the compound may form a layer of a p-type, n-type or intrinsic semiconductor in a transistor, e.g. a field effect transistor.
- the compound may form a layer of a p-type or n-type semiconductor in an optoelectronic device, e.g. a solar cell or an LED.
- the semiconductor device comprises: an n-type region comprising at least one n-type layer; a p-type region comprising at least one p-type layer; and, disposed between the n-type region and the p-type region: a layer comprising the compound or the film.
- the semiconductor device is often an optoelectronic device, which optoelectronic device comprises: an n-type region comprising at least one n-type layer; a p-type region comprising at least one p-type layer; and, disposed between the n-type region and the p-type region: a layer of semiconducting material which comprises (or consists essentially of) said compound, as defined herein.
- the optoelectronic device may be a tandem device.
- the tandem optoelectronic device may comprise an n-type region comprising at least one n-type layer; a p-type region comprising at least one p-type layer; and, disposed between the n-type region and the p-type region: a layer of semiconducting material which comprises (or consists essentially of) said compound, as defined herein, a charge recombination layer, and a layer of a second semiconductor.
- An n-type layer is typically a layer of an n-type semiconductor.
- a p-type layer is typically a layer of a p-type semiconductor.
- the n-type region comprises at least one n-type layer.
- the n-type region may comprise an n-type layer and an n-type exciton blocking layer. Such an n-type exciton blocking layer is typically disposed between the n-type layer and the layer(s) comprising the semiconducting material.
- the n- type region may have a thickness of from 50 nm to 1000 nm.
- the n-type region may have a thickness of from 50 nm to 500 nm, or from 100 nm to 500 nm.
- the n-type region comprises a compact layer of an n-type semiconductor.
- the n-type semiconductor may be selected from a metal oxide, a metal sulphide, a metal selenide, a metal telluride, a perovskite, amorphous Si, an n-type group IV semiconductor, an n-type group III- V semiconductor, an n-type group II-VI semiconductor, an n-type group I-VII semiconductor, an n- type group IV-VI semiconductor, an n-type group V-VI semiconductor, and an n-type group II-V semiconductor, any of which may be doped or undoped.
- the n-type 41emiconductor is selected from a metal oxide, a metal sulphide, a metal selenide, and a metal telluride.
- the n-type region may comprise an inorganic material selected from oxide of titanium, tin, zinc, niobium, tantalum, tungsten, indium, gallium, neodymium, palladium, or cadmium, or an oxide of a mixture of two or more of said metals.
- the n-type layer may comprise TiO 2 , SnO 2 , ZnO, SnO, Nb 2 O 5 , Ta 2 O 5 , WO 3 , W 2 O 5 , In 2 O 3 , Ga 2 O 3 , Nd 2 O 3 , PbO, or CdO.
- the n-type region may comprise an organic electron transporting materials, for instance C 60 , Phenyl-C61-butyric acid methyl ester (PCBM), Bis-PCBM, or 3,9-bis(2-methylene-(3-(1,1-dicyanomethylene)-indanone))- 5,5,11,11-tetrakis(4-hexylphenyl)-dithieno[2,3-d:2’,3’-d’]-s-indaceno[1,2-b:5,6-b’]dithiophene.
- organic electron transporting materials for instance C 60 , Phenyl-C61-butyric acid methyl ester (PCBM), Bis-PCBM, or 3,9-bis(2-methylene-(3-(1,1-dicyanomethylene)-indanone))- 5,5,11,11-tetrakis(4-hexylphenyl)-dithieno[2,3-d:2’,3’-d
- the n-type region may comprise an inorganic/organic bilayer such as a TiO 2 / fullerene bilayer, SnO/fullerene bilayer or a ZnO/ fullerene bilayer.
- the n-type region comprises SnO 2 or TiO 2 , for instance a compact layer of TiO 2 or SnO 2 .
- the n-type region also comprises a layer of a fullerene or a fullerene derivative (for instance C 60 or Phenyl-C61-butyric acid methyl ester (PCBM)).
- PCBM Phenyl-C61-butyric acid methyl ester
- the n-type region comprises TiO 2 , SnO 2 , ZnO, SnO, C 60 , PCBM, Bis-PCBM, 3,9-bis(2- methylene-(3-(1,1-dicyanomethylene)-indanone))-5,5,11,11-tetrakis(4-hexylphenyl)-dithieno[2,3- d:2’,3’-d’]-s-indaceno[1,2-b:5,6-b’]dithiophene, or an inorganic/organic bilayer such as a TiO 2 / fullerene bilayer, SnO/fullerene bilayer or a ZnO/fullerene bilayer.
- the p-type region comprises a compact layer of a p-type semiconductor.
- Suitable p-type semiconductors may be selected from polymeric or molecular hole transporters.
- the p-type layer employed in the semiconductor device of the invention may for instance comprise spiro-OMeTAD (2,2’,7,7’-tetrakis-(N,N-di-p-methoxyphenylamine)9,9’-spirobifluorene)), P3HT (poly(3-hexylthiophene)), PCPDTBT (Poly[2,1,3-benzothiadiazole-4,7-diyl[4,4-bis(2-ethylhexyl)- 4H-cyclopenta[2,1-b:3,4-b’]dithiophene-2,6-diyl]]), PVK (poly(N-vinylcarbazole)), HTM-TFSI (1- hexyl-3-methylimid
- the p-type region may comprise carbon nanotubes.
- the p-type material is selected from spiro- OMeTAD, P3HT, PCPDTBT and PVK.
- the p-type layer employed in the optoelectronic device comprises spiro-OMeTAD.
- the p-type layer may comprise an inorganic hole transporter.
- the p-type layer may comprise an inorganic hole transporter comprising an oxide of nickel, vanadium, copper or molybdenum; Ga 2 O 3 , CuSCN, NiO, CuI, CuBr, CuSCN, Cu 2 O, CuO or CIS; a perovskite; amorphous Si; a p-type group IV semiconductor, a p-type group III-V semiconductor, a p-type group II-VI semiconductor, a p-type group I-VII semiconductor, a p-type group IV-VI semiconductor, a p-type group V-VI semiconductor, and a p-type group II-V semiconductor, which inorganic material may be doped or undoped.
- an inorganic hole transporter comprising an oxide of nickel, vanadium, copper or molybdenum; Ga 2 O 3 , CuSCN, NiO, CuI, CuBr, CuSCN, Cu 2 O, CuO or CIS; a perovskite; amorphous
- the p-type layer may be a compact layer of said inorganic hole transporter.
- the p-type layer comprises a p-type material selected from NiO, Ga2O3, CuSCN, CuI, and CuO, spiro-OMeTAD, MeO-TPD, Tetracene, P3HT, Poly-TPD, or PTAA.
- the semiconductor device typically further comprises one or more first electrodes and one or more second electrodes.
- the one or more first electrodes are typically in contact with the n-type region, if such a region is present.
- the one or more second electrodes are typically in contact with the p- type region, if such a region is present.
- the one or more first electrodes are in contact with the n-type region and the one or more second electrodes are in contact with the p-type region; or the one or more first electrodes are in contact with the p-type region and the one or more second electrodes are in contact with the n-type region.
- the first and second electrode may comprise any suitable electrically conductive material.
- the first electrode typically comprises a transparent conducting oxide.
- the second electrode typically comprises one or more metals.
- the second electrode may alternatively comprise graphite.
- the first electrode typically comprises a transparent conducting oxide and the second electrode typically comprises one or more metals.
- the transparent conducting oxide typically comprises fluorine-doped tin oxide (FTO), indium tin oxide (ITO) or aluminium-doped zinc oxide (AZO), and typically ITO.
- the second electrode typically comprises a metal selected from silver, gold, copper, aluminium, platinum, palladium, or tungsten. Each electrode may form a single layer or may be patterned.
- the semiconductor device (for instance an optoelectronic device such as a photovoltaic device, or a light emitting device) may comprise the following layers in the following order: I. one or more first electrodes as defined herein; II. an n-type region comprising at least one n-type layer as defined herein; III.
- the semiconductor device may comprise the following layers in the following order: I. one or more first electrodes which comprise a transparent conducting oxide, preferably FTO; II. an n-type region comprising at least one n-type layer as defined herein; III. a layer of the semiconducting material comprising the crystalline compound as defined herein; IV. a p-type region comprising at least one p-type layer as defined herein; and V.
- the one or more second electrodes which comprise a metal, preferably silver or gold.
- the one or more first electrodes may have a thickness of from 100 nm to 700 nm, for instance of from 100 nm to 400 nm.
- the one or more second electrodes may have a thickness of from 10 nm to 500 nm, for instance from 50 nm to 200 nm or from 10 nm to 50 nm.
- the n-type region may have a thickness of from 50 nm to 500 nm.
- the p-type region may have a thickness of from 50 nm to 500 nm.
- the semiconductor device (for instance a photovoltaic device) of the invention may be a single- junction device.
- the photovoltaic device of the invention may be a tandem junction photovoltaic device, for instance a tandem junction or multi-junction solar cell.
- a tandem junction or multi-junction devices for instance tandem junction or multi-junction photovoltaic devices
- the herein disclosed crystalline compounds may be combined with known technologies to deliver optimised performance.
- the photovoltaic device of the invention is a tandem junction photovoltaic device
- the device additionally comprises a further photoactive region, i.e. a further region which absorbs light and which may then generate free charge carriers.
- the further photoactive region is other than the region which comprises the layer comprising the crystalline compound and the adjacent layers comprising charge-transporting materials (electron- and hole- transporting materials, respectively).
- the further photoactive region is generally outside of the region which comprises the layer comprising the crystalline compound and the adjacent layers comprising charge (electron- and hole-) transporting materials.
- the further photoactive region may be disposed between the first electrode and the layer comprising a charge (electron or hole) transporting material, or between the second electrode and the layer comprising a charge (hole or electron) transporting material, in the device of the invention as defined herein.
- the photovoltaic device of the invention is a multi-junction photovoltaic device, the device additionally comprises a plurality of further photoactive regions.
- Each one of the further photoactive regions may be disposed between the first electrode and the layer comprising a charge (electron or hole) transporting material, or between the second electrode and the layer comprising a charge (hole or electron) transporting material, in the device of the invention as defined herein.
- the or each further photoactive region comprises at least one layer of a semiconductor material.
- the semiconductor material may for instance comprise silicon. It may for instance comprise crystalline silicon.
- the semiconductor material may comprise copper zinc tin sulphide, copper zinc tin selenide, copper zinc tin selenide sulphide, copper indium gallium selenide, copper indium gallium diselenide or copper indium selenide.
- the further photoactive region may be a conventional silicon solar cell.
- the further photoactive region may be a conventional thin film solar cell which may, for instance, comprise crystalline silicon (c-Si) or another thin film technology such as copper zinc tin sulphide, copper zinc tin selenide, copper zinc tin selenide sulphide, copper indium gallium selenide, copper indium gallium diselenide or copper indium selenide.
- the further photoactive region is preferably a silicon sub-cell.
- at least one of the further photoactive regions may be a conventional silicon solar cell.
- At least one of the further photoactive regions may be a conventional thin film solar cell which may, for instance, comprise crystalline silicon or another thin film technology such as copper zinc tin sulphide, copper zinc tin selenide, copper zinc tin selenide sulphide, copper indium gallium selenide, copper indium gallium diselenide or copper indium selenide.
- the at least one of the further photoactive regions is a silicon sub-cell, typically a silicon sub-cell comprising crystalline silicon.
- the photovoltaic device may be a multi-junction photovoltaic device comprising silicon sub- cell comprising crystalline silicon.
- the optoelectronic device of the present invention is a light- emitting device.
- Process – solution processing The invention also provides a process for producing a film comprising a crystalline compound comprising (i) One or more first cations, A; (ii) One or more second cations, B; (iii) One or more third cations, B’; (iv) One or more anions, X; wherein the one or more first cations, A, are different from the one or more second cations, B, and to the one or more third cations, B’, and wherein the one or more second cations, B, are different from the one or more first cations, A, and to the one or more third cations, B’, wherein at least some of the one or more third cations, B’, are in an octahedral coordination environment, and wherein at least some of the one or more first cations, A, are in a tetrahedral coordination environment, said process comprising disposing a film-forming solution
- the one or more first cations, A may be any first cations as described herein.
- the one or more second cations, B may be any second cations as described herein.
- the one or more third cations, B’ may be any third cations as described herein.
- the one or more anions, X may be any anions as described herein.
- the one or more first cations, A comprise Cu +
- the one or more second cations, B comprise Ag +
- the one or more third cations B’ comprise Bi 3+
- the one or more anions, X comprise I-.
- the process comprises dissolving at least one compound comprising the one or more first cations, A, the one or more second cations, B, the one or more third cations, B’, and/or the one or more anions, X, in a solvent to form the film-forming solution.
- the process may comprise dissolving a compound comprising the one or more first cations, A, dissolving a compound comprising the one or more second cations, B, and dissolving a compound comprising the one or more third cations, B’, in a solvent to form the film-forming solution.
- the compound comprising the one or more first cations, A may be a compound of formula AX n , where n is an integer based on the charge of the one or more first cations.
- the compound comprising the one or more second cations, B may be a compound of formula BX n , where n is an integer based on the charge of the one or more second cations.
- the compound comprising the one or more third cations, B’ may be a compound B’X n , where n is an integer based on the charge of the one or more third cations.
- the process may also comprise dissolving a compound comprising the one or more anions, X, in a solvent to form the film-forming solution.
- the solvent comprises an organic solvent.
- the solvent may comprise a polar organic solvent.
- the solvent may comprise a polar aprotic organic solvent.
- the solvent is selected from dimethylsulfoxide, pyridine, dimethylformamide, N-butylamine, sulfolane (tetrahydrothiophene 1,1-dioxide) and mixtures thereof.
- the solvent may be a mixture of dimethylsulfoxide and dimethylformamide.
- the solvent comprises pyridine. Adding pyridine may improve the morphology of the films of the compound.
- the process may comprise dissolving a compound comprising the one or more first cations, A, in a first solvent to produce a first solution, dissolving a compound comprising the one or more second cations, B, and a compound comprising the one or more third cations, B’, in a second solvent to produce a second solution, and contacting the first solution with the second solution to form the film-forming solution.
- the first and/or the second solution may comprise the one or more anions, X. Both the first and second solutions may comprise the one or more anions, X.
- the process may comprise additionally dissolving a compound comprising the one or more anions, X, in the first solvent and/or second solvent.
- the process may comprise dissolving a compound comprising the one or more first cations, A, in a first solvent to produce a first solution, dissolving a compound comprising the one or more second cations, B, and a compound comprising the one or more third cations, B’, and a compound comprising the one or more anions, X, in a second solvent to produce a second solution, and contacting the first solution with the second solution to form the film-forming solution.
- the first solvent is different from the second solvent.
- the first and second solvents are usually organic solvents.
- the first and second solvents may be polar organic solvents.
- the first and second solvents may be polar aprotic organic solvents.
- the first and second solvents are selected from dimethylsulfoxide, pyridine, dimethylformamide, N-butylamine, sulfolane (tetrahydrothiophene 1,1-dioxide) and mixtures thereof.
- one of the first or second solvents comprises pyridine. Adding pyridine may improve the morphology of the films of the compound.
- the process may comprise a step of dissolving a compound comprising the one or more first cations, A, in a first solvent to produce a first solution is performed at a first temperature, wherein the first temperature is between 30 oC and 250 oC. Preferably the first temperature is between 100 oC and 200 oC.
- the step of dissolving a compound comprising the one or more second cations, B, and a compound comprising the one or more third cations, B’, in a second solvent to produce a second solution may be performed at a second temperature, wherein the second temperature is between 30 oC and 250 oC. Preferably the second temperature is between 75 oC and 150 oC.
- the film-forming solution may be stirred at a third temperature prior to disposing the film-forming solution on the substrate, where the third temperature is between 30 oC and 200 oC.
- the third temperature is between 75 oC and 150 oC.
- the substrate is preheated to a fourth temperature, wherein the fourth temperature is between 30 oC and 200 oC.
- the first temperature is between 100 oC and 200 oC.
- the substrate is typically kept at the fourth temperature whilst the film-forming solution is disposed on the substrate.
- the film-forming solution is disposed on the substrate by solution phase deposition.
- the film-forming solution may be disposed on the substrate by gravure coating, slot dye coating, screen printing, ink jet printing, doctor blade coating, spray coating, roll-to-roll (R2R) processing, and spin-coating.
- the film-forming solution is disposed on the substrate by spin-coating.
- the invention also provides a process for producing a film comprising a crystalline compound comprising (v) One or more first cations, A; (vi) One or more second cations, B; (vii) One or more third cations, B’; (viii) One or more anions, X; wherein the one or more first cations, A, are different from the one or more second cations, B, and to the one or more third cations, B’, and wherein the one or more second cations, B, are different from the one or more first cations, A, and to the one or more third cations, B’, wherein at least some of the one or more third cations, B’, are in an octahedral coordination environment, and wherein at least some of the one or more first cations, A, are in a tetrahedral coordination environment, said process comprising: exposing the substrate to a vapour, which vapour comprises one or more reactants for producing
- the process comprises evaporating one or more compounds comprising the one or more first cations, A, the one or more second cations, B, the one or more third cations, B’, and the one or more anions, X, to form the vapour.
- the steps of evaporating the one or more compounds and exposing the substrate to the vapour are performed in a vacuum.
- each of the one or more compounds are contained in a crucible that is opaque to visible light. This has the advantage of preventing degradation of the one or more compounds in the case where at least one of the one or more compounds is light sensitive.
- the one or more compounds are contained in alumina crucibles.
- the process comprises evaporating a first compound comprising the one or more first cations, A, evaporating a second compound comprising the one or more second cations, B, and evaporating a third compound comprising the one or more third cations, B’, to produce the vapour wherein at least one of the first, second and third compounds also comprises the one or more anions, X. In some instances, each of the first, second and third compounds comprises the one or more anions, X.
- the process may comprise evaporating a first compound of formula AX n , evaporating a second compound of formula BX n , evaporating a third compound of formula B’X n , wherein n is an integer dependent on the valence of the cation A, B or B’.
- the process may further comprises annealing the film.
- the process comprises annealing the film at a temperature of from 40 to 250 oC, for instance from 40 to 200 oC or from 40 to 150 oC.
- the process comprises annealing the film for 30 seconds to two hours, typically from 5 minutes to one hour.
- the process may further comprise exposing the film comprising a crystalline compound to a passivating agent. More specifically, in either process of the invention, the process may further comprise annealing the film in the presence of a passivating agent to produce a passivated film. Advantages of employing the passivating agent are evidenced in Example 6.
- the process comprises annealing the film at a temperature of from 40 oC to 250 oC, for instance from 40 oC to 200 oC or from 40 oC to 150 oC, in the presence of the passivating agent.
- the process comprises annealing the film at a temperature of about 150 oC, or less than about 150 oC, or about 130 oC, or less than about 130 oC, or about 110 oC, or less than about 110 oC, in the presence of the passivating agent.
- the process comprises annealing the film at room temperature, in the presence of the passivating agent.
- the process may for instance comprise annealing the film at a temperature of from room temperature to any of the temperatures mentioned above.
- the process may for instance comprise annealing the film at a temperature of from 15 oC to 250 oC, for instance from 15 oC to 150 oC or from 15 oC to 130 oC, or from 15 oC to 110 oC, in the presence of the passivating agent.
- the process may for instance comprise annealing the film at a temperature of from 80 oC to 250 oC, for instance from 100 oC to 200 oC or for instance from 120 oC to 180 oC, or from 130 oC to 160 oC, or from 140 oC to 190 oC, in the presence of the passivating agent.
- the process comprises annealing the film for 30 seconds to two hours, typically from 5 minutes to one hour.
- the passivating agent is selected from one or more of a halogen, sulfur, selenium or an organic amine. More typically the passivating agent is selected from one or more of iodine, sulfur, selenium or methylamine. Preferably the passivating agent is iodine.
- the passivating agent may be present in the resulting passivated film in, for example, molecular or ionic form.
- the passivating agent is applied to the film as a vapour. Accordingly, the process may comprise exposing the film to vapour comprising the passivating agent. More specifically, the process may comprise annealing the film in the presence of a vapour comprising the passivating agent, to produce the passivated film.
- the process may comprise annealing the film in an atmosphere of evaporated passivating agent, to produce the passivated film.
- Annealing the film to produce a passivated film may comprise applying the passivating agent to the film at a pressure of less than atmospheric pressure. For example, a pressure of about 5 kPa may be used to apply the passivating agent to the film.
- the passivating agent may be applied to the film under atmospheric pressure, or at a pressure above atmospheric pressure.
- the passivating agent may be applied to the film in an atmosphere comprising air, or in an atmosphere containing substantially no air.
- the substrate may be a component for a semiconductor device.
- the substrate may comprise an first or second electrode, as described herein, and disposed on that electrode, an n-type layer or a p-type layer, as described herein.
- the substrate may comprise a further photoactive region, as described herein.
- the semiconductor device may be a tandem or multi-junction semiconductor device, for instance a tandem or multi- junction photovoltaic device.
- the invention also provides a process for producing a semiconductor device comprising producing a film comprising a crystalline compound on a substrate using a process as described herein, and disposing one or more further components on the film to produce a semiconductor device.
- the process may further comprise disposing one or more n-type or a p-type layers, as described herein, on the film of the crystalline compound, then disposing a first or second electrode, as described herein, on the n-type or p-type layer.
- the skilled person would be well aware of methods for disposing such layers, for instance by spin-coating.
- the invention also provides the use of a compound as described herein as an optoelectronic material, preferably as a photovoltaic material or as an electroluminescent material.
- the invention also provides the use of a compound as described herein as a luminescent material.
- the invention also provides the use of a compound as described herein as a radiation detecting material, for instance as an X-ray scintillator.
- the invention also provides the use of a compound as described herein as a quantum cutter.
- Quantum cutting also referred to as down-conversion
- the starting materials used were CuI (99.999% Sigma–Aldrich) and AgI (99.999% Alfa Aesar).
- BiI 3 and AgBiI 4 were synthesised as previously reported.
- 1 Powder synthesis was carried out in evacuated sealed fused silica tubes. The fused silica tubes had a 6 mm internal diameter, 1 mm thick walls and were sealed at 10 -4 mbar to 15 cm in length.
- the sample in the tube was cooled in liquid N 2 during the evacuation and sealing process to avoid sublimation of the iodides.
- CuI (0.0728g), AgI (0.0505g) and BiI 3 (0.1268g) powders (nominal composition Cu 1.85 Ag 1.04 Bi 1.04 I 6.00 , just off the Cu 4x (AgBi) 1-x I 4 solid solution line, were sealed in the evacuated fused silica tube.
- the tube was placed upright in a furnace and heated at 5°C/min to 610°C and kept there overnight before cooling at 5°C/min to 350°C where it was kept for 5 days. It was then cooled to room temperature at 5°C/min.
- the tube was scored and carefully broken open to retrieve the black powder, which was pelletised in to pellets 5 mm in diameter using a pellet press.
- the pellets were sealed in an evacuated fused silica tube.
- the second heating consisted of heating the powder up at 5°C/min to 350°C, keeping it there for 5 days before taking the tube out of the furnace and quenching the bottom half of it (containing the powder) to room temperature in a water bath. It was found to be crucial to quench the material from 350°C and keep the annealing temperatures below the melting point of the mixture to avoid a compositional inhomogeneity which spanned the Cu 4x (AgBi) 1-x I 4 solid solution line ( Figures 20a and b).
- the solution was stirred at 150°C for 30 minutes.
- the hot solution was filtered with a PTFE syringe filter with 0.22 ⁇ m pore size.
- the filtered solution was then kept at 75°C during the entire spin-coating process.
- the solution was spin-coated on different substrates in a N 2 -filled drybox, with a speed of 4000 rpm for 60 seconds with 4000 rpm/s acceleration.
- the spin-coated films were then annealed at 50°C in air for 45 minutes, and, after this, at 150°C for 3 minutes.
- the films had a thickness of 280 nm, measured using a contact profilometer.
- Fluorine doped tin oxide (FTO) coated glass (15 ⁇ /sq) were etched using a 2M HCl solution and Zn powder.
- the patterned FTO substrates were cleaned through sequential sonication in soap, deionized water, acetone and isopropanol.
- the substrates were dried with a N 2 gun and exposed to O 2 plasma for 10 minutes.
- the SnO 2 electron transport layer was prepared by spin-coating a solution of SnCl 4 ⁇ 5H 2 O in isopropanol (17.5 mg/ml) on top of the FTO coated glasses using 3000 rpm speed for 30 seconds.
- the so-prepared films were annealed at 100°C for 10 min followed by an annealing at 180°C for 30 min in air. After this the Cu 2 AgBiI 6 film was deposited as explained in the thin film deposition.
- the hole transport material (SpiroOMeTAD, Lumtec) was dissolved in chlorobenzene (85 mg/ml) and doped with 20 ⁇ l of LiTFSI (500 mg/ml in butanol) and with 30 ⁇ l of tert-butylpyridine. This solution was then deposited on the Cu 2 AgBiI 6 layer by dynamic spin- coating in air at 2000 rpm for 45 seconds.
- Unit- cell indexation, data integration, and reduction were performed using Rigaku CrysAlisPro v171.38.43.
- the structure was solved and refined using SHELX-2013, 4 implemented through Olex2.
- 5 Compositional Analysis Scanning Electron Microscopy (SEM) and Energy Dispersive X-ray Spectroscopy (EDX) was used to measure the composition as a direct elemental analysis technique. Measurements were carried out using a Hitachi S-4800 SEM with an Oxford Instruments model 7200 EDS X-ray detector. Quantification was carried out using the microanalysis suite of the Inca Suite software (Version 4.15). All powders and crystals were sputtered with 15 nm Au to limit charging effects.
- TEM EDX Transmission Electron Microscopy (TEM) EDX was carried out using an JEOL JEM 2000FXII TEM microscope operating a W electron source operated at 200 kV, using an EDAX EDX detector, with quantification carried out using EDAX Genesis Spectrum (Version 5.217, 21-Jan- 2008). All samples were prepared by spreading a finely ground powder onto carbon coated Au grids. Beam intensity had to be lowered, by increasing the spot size of the beam, as to not decompose the samples. All compositions calculated from EDX measurements were normalised to the nominal iodide content unless otherwise stated.
- the resultant PL was collected and coupled into a grating spectrometer (Princeton Instruments, SP-2558), which directed the spectrally dispersed PL onto a photon-counting detector (PDM series from MPD), whose timing was controlled with a PicoHarp300 TCSPC event timer.
- PDM series photon-counting detector
- a laser fluence of 200 nJ cm -2 was used for both the spectral and transient measurements of Cu 2 AgBiI 6 , which were both taken at a temperature of 295 K.
- the PL decay trace in Figure 3b was measured at a wavelength of 720 nm.
- the samples were mounted in a gas-exchange helium cryostat (Oxford Instruments, OptistatCF2).
- the MAPbI 3 absorption spectrum was previously published in Davies et al. 9 THz photoconductivity
- An amplified laser system (Spectra Physics, MaiTai–Empower–Spitfire) with a central wavelength of 800 nm, 35 fs pulse duration and 5 kHz repetition rate was used to generate THz radiation via the inverse spin Hall effect, using an emitter made of 2 nm of tungsten / 1.8 nm of Co40Fe40B20/ 2 nm of platinum, supported by a quartz substrate.
- the transmitted THz radiation was detected using free-space electro-optic sampling with a 1 mm thick ZnTe (110) crystal, a Wollaston prism and a pair of balanced photodiodes.
- the THz pulse was measured in transmission geometry.
- the pump beam was frequency-doubled to 400 nm by a ⁇ -barium-borate (BBO) crystal.
- J–V characterisation J–V characterisation was measured using a Keithley 2400 sourcemeter and simulated air-mass 1.5 global tilt (AM1.5G) solar irradiation using a Wavelabs Sinus-220 light-emitting diode array, calibrated with a certified Si reference cell.
- the areas being measured were defined by using a black anodised aluminium mask placed directly in contact with glass side of the substrate and an enclosed sample holder, to shadow the rest of the device.
- Photothermal deflection spectroscopy (PDS) PDS is an ultrasensitive absorption measurement technique that detects heating of the sample due to the non-radiative relaxation of absorbed light and is insensitive to reflection and scattering.
- PDS enables the detection of absorbance signals with 5–6 orders of magnitude weaker than the band edge absorption.
- a monochromatic Pump light beam is shined on the sample (film on Quartz substrate), which on absorption produces a thermal gradient near the sample surface via non-radiative relaxation induced heating. This results in a refractive index gradient in the area surrounding the sample surface.
- This refractive index gradient is further enhanced by immersing the sample in an inert liquid FC-72 Fluorinert® (3M Company) which has a high refractive index change per unit change in temperature.
- a fixed wavelength CW laser probe beam is passed through this refractive index gradient producing a deflection proportional to the absorbed light at that particular wavelength, which is detected by a photo-diode and lock-in amplifier combination. Scanning through different wavelengths gives us the complete absorption spectra. Because this technique makes use of the non-radiative relaxation processes in the sample, it is immune to optical effects like interference and scattering. Furthermore, PDS technique is a powerful technique to measure the sub-bandgap tail states in a semiconductor up to an absorption coefficient of 1 cm -1 .
- the experimental absorption spectrum is fitted with the following model: Where A is a fitting constant and the excitonic part of the absorption ( ⁇ ′ ⁇ ) and the continuum part ( ⁇ ′ ⁇ ) are convoluted with gaussian broadening functions ⁇ ⁇ and ⁇ ⁇ , respectively.
- Optical Modelling The generalised transfer matrix method was used to model the optical response of the stack. 11 The python libraries Numpy and Scipy were used to perform the calculations. Transfer matrix calculations take the complex refractive index spectrum and thickness for each layer as input. The calculation provides us with absorptance of each layer, and the transmittance and reflectance of the stack.
- the calculated JV parameters for the Cu 2 AgBiI 6 sub-cell were: PCE The following were assumed for the Si sub- cell: 13 ⁇ 10 ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ 04 ⁇ ⁇ ⁇ ⁇ 104 ⁇ 0.0056.
- the thickness of the LiF (20-200nm) the two ITO layers (20-200nm), and Cu 2 AgBiI 6 (1200 ⁇ 1800nm) were varied with the indicated bounds using a differential evolution algorithm till a PCE maximum was obtained.
- the stack used as input for the Transfer Matrix Calculations is given in Table 2.
- Transfer Matrix Model Limitation Layer roughness is much smaller than the wavelength of light ( ⁇ 550nm). 2.
- the same transport materials conventionally used for hybrid perovskites, C60/SnO 2 and PolyTPD are used. This is a relatively minor assumption as most transport layers are thin and poorly absorbing in comparison to the absorber layer, so the precise transport layer does not matter.
- Example 1 Results Cu 2 AgBiI 6 Crystal Structure
- SCXRD single crystal X-ray diffraction data
- the Cu 2 AgBiI 6 structure consists of alternating layers of partially filled and vacant octahedral sites in a cubic close packed (CCP) iodide array. This can be considered a disordered CdCl 2 octahedral motif.
- the Ag+ and Bi3+ cations are shared by the octahedral site in a disordered fashion.
- the Bi3+ and Ag+ occupancies were constrained to the average TEM EDX pow-der composition of Cu2.15(16)Ag1.04(5)Bi0.92(7)I6.00(11) as 30.6% and 34.7%, respectively.
- the compositional constraint was required due to the high number of correlated parameters in the refinement deriving from cation disorder and the four twin components. Electron density in the difference Fourier map shows two Cu + sites (Cu1 and Cu2) with equal occupancy. They occupy every possible tetrahedral site facilitated by the CCP iodide sub-lattice. The Cu + occupancies were fixed to occupancies of 17.9%, in line with the measured composition. The bond distance and angles are summarised in Table 5. Table 5. Bond distances and bond angles for the Cu 2 AgBiI 6 structure refined against 100K SCXRD data.
- Cu 2 AgBiI 6 powder is stable when kept in the dark, in air, at room temperature.
- AgBiI 4 and Cu 2 AgBiI 6 showed no colour change after one week in the solar spectrum and showed no signs of decomposition by PXRD ( Figure 8) or Raman spectroscopy ( Figure 9).
- the Cu 2 AgBiI 6 composition therefore represents the stabilisation of a Cu-containing bismuth iodide solar absorber and is as stable as AgBiI 4 under the investigated conditions.
- Cu 2 AgBiI 6 has a much more suitable absorption profile compared to the alternative wide band gap, lead-free double perovskite Cs 2 AgBiBr 6 which consists of an initial peak in the absorption spectrum centred at 2.8 eV, followed by a minimum.
- Partial density of states plots show that the bottom of the conduction band is dominated by Bi 6p and I 5p states, similar to AgBiI 4 and BiI 3 . 25 In contrast, Cu 3d-states dominate at the top of the valence band in Cu 2 AgBiI 6 , mixed with the I 5p states which dominate when Cu is absent. Optical transitions near the band gap energy of Cu 2 AgBiI 6 will involve considerable Cu 3d to Bi 6p/I 5p character, in contrast to the I 5p to Bi 6p/I 5p transitions present in Ag 1-3x Bi 1+x I 4 and BiI 3.
- FIG 2a we also show the photoluminescence (PL) of the Cu 2 AgBiI 6 thin film, which we fit to a pseudo-Voigt function (convolution of a Gaussian and Lorentzian function) with a full width half maximum (FWHM) of 289 meV.
- the PL peak of Cu 2 AgBiI 6 is centred at 1.71 eV corresponding to a Stokes shift of 350 meV compared to the estimated direct band gap.
- MAPbI 3 we show the absorption and emission profile to that of MAPbI 3 in Figure 16.
- Charge-carrier mobilities can be limited by intrinsic factors such as couplings of charge carriers to phonons, but can also be influenced significantly by extrinsic factors such as crystallinity and energetic disorder. 49 Given the already-promising value measured here, improved understanding of both of these influences could lead to further enhancements of charge-carrier mobilities in Cu 2 AgBiI 6 , as was found with regards to crystallinity in the mixed-cation, mixed-halide lead halide perovskites.
- the cell did function, and delivered a PCE of 0.43%, a J sc of 1.54 mA/cm 2 , a V oc of 0.47 V and a fill factor of 59.6% (Figure 17a).
- the device shows hysteresis between the forward bias (FB)-to- short circuit (SC) and the SC-to-FB scan, with the first showing higher performances.
- FB forward bias
- SC SC-to-FB scan
- the steady state performances measured at the maximum power point, present good short-term stability, with both the current density and the PCE increasing over time (Figure 17b).
- the results show that this device architecture can deliver photocurrent and photovoltage, but it is clear that effort will be required to further optimise the devices.
- thermodynamic approach 52 as we describe in the materials and methods section.
- Shockley and Queisser introduced an idealised step-function absorption profile, where the band gap is clearly defined.
- the absorption onset is never infinitely steep, and the “PV band gap” is defined as the steepest point of the absorptance curve, which is easily deduced by taking the maximum of the differential of the external quantum efficiency spectrum.
- This PV band gap is therefore not an intrinsic property of the material, but a property of the PV cell, which is influenced by both absorber layer thickness, its optical absorption properties and the overall optical structure of the solar cell.
- the structure is based on a 2D edge-sharing octahedral network. Octahedral sites are occupied by Ag + and Bi 3+ in a disordered fashion and Cu + occupies all possible tetrahedral sites located in the cubic close packed iodide sub-lattice. Fitting the absorption profile using the Elliott model shows a band gap of the continuum of states of 2.06(1) eV and an exciton binding energy of only 25(2) meV, and the PV band gap, which we determine from the spectral response of modelled PV cells, can be tuned between 1.7–2.0 eV by varying film thicknesses from 1200–100 nm.
- Cu + is tetrahedrally coordinated in CuI and CuBiI 4 , where Bi 3+ is octahedral in a defect spinel structure.
- the sealed tubes were placed upright inside a furnace with enclosed heating elements and heated to 610°C to melt and mix the powders overnight.
- the furnace was cooled to 350°C at 5°C/min and kept there for 5 days.
- the tubes were quickly taken out of the furnace and the bottom half of each tube (containing the powder) was quenched to room temperature in a water bath.
- the red/purple vapour filling the tubes condensed above the water line away from the powder.
- the reactions formed a black powder at the bottom of the tube and tiny black crystals around the inside of the tubes. The small black crystals were too fragile to retrieve and would smear upon contact.
- a second heating consisted of heating the powder up at 5°C/min to 350°C, keeping it there for 5 days before taking the tube out of the furnace and quenching the bottom half of it (containing the powder) to room temperature in a water bath. The tube was scored and carefully broken open to retrieve the black powder.
- a small crystal of approximate dimensions 20 ⁇ m ⁇ 30 ⁇ m ⁇ 10 ⁇ m, with an average SEM EDX composition of Cu 1.75(6) Ag 1.26(13) Bi 1.08(7) I 6.00(5) was picked out of this sample for structural studies via SCXRD ( Figure 46).
- CuAgBiI 5 film deposition 156.5 mg AgI and 393.1 mg BiI 3 were dissolved in 0.8 ml DMSO at 100°C over 15 minutes with constant stirring.
- the substrates were quickly transferred to a dry box and heated to 150°C for deposition.100 ul of the hot CuAgBiI solution was deposited dymanically on to the hot substrate and spun at 4000 rpm for 45 seconds on a spincoater. The films were then annealed at 50°C for 30 minutes in air, over which the films turned from a clear orange film to a dark red-brown film. The film was then annealed at 150°C for 15 seconds in air to form the dark black film. Films were transferred to and kept in a N 2 filled glovebox until used for measurements.
- Powder X-ray diffraction (PXRD)
- PXRD Powder X-ray diffraction
- X-ray diffraction patterns collected on CuAgBiI 5 films were measured using a Panalytical X’Pert powder diffractometer, using radiation from a Cu-K ⁇ 1 source, across 2 ⁇ values ranging from 5-40 o .
- Neutron powder diffraction High-resolution time-of-flight (ToF) data were collected on the HRPD instrument at ISIS Neutron and Muon Source (RAL, Oxfordshire, U.K.) of powder samples at room temperature packed in to vanadium cans with a 6 mm diameter. Data from bank 1 and bank 2 were used for Rietveld refinement in combination with the PXRD I11 dataset.
- XPS X-ray Photoelectron Spectroscopy
- UV-Visible Absorption spectra were taken using a Bruker Vertex 80v Fourier-Transform Infrared (FTIR) spectrometer, with a tungsten halogen source and a silicon diode detector. Measurements were carried out under low vacuum ( ⁇ 5 mbar). To calculate the absorption coefficient, film thicknesses were measured using a Veeco Dektak 150 profilometer. Absorption coefficients were calculated as: where is the sample thickness, blank quartz substrate and silver mirror were used as references for the transmission and reflection, respectively.
- FTIR Fourier-Transform Infrared
- Photoluminescence (PL) spectra were measured following excitation by a 398 nm continuous wave laser (PicoHarp, LDH-D-C-405M) at a power density of 40.5 Wcm -2 .
- the emitted PL was collected and coupled into a grating spectrometer (Princeton Instruments SP-2558), after which light was detected by an iCCD camera (PI-MAX4, Princeton Instruments).
- Measurements on three fresh films were carried out under vacuum ( ⁇ 5 ⁇ 10 ⁇ mbar). Subsequently, two fresh films were exposed to air over 90 minutes, and measurements were carried out after 20, 60 and 90 minutes at a power density of 39.0 Wcm -2 .
- Time-Resolved Photoluminescence Measurements Time-Correlated Single Photon Counting was carried out using the same laser as above to photoexcite the thin films, but in pulsed excitation mode with a repetition rate of 5 MHz at fluences of 1480, 410, 180, 50 nJcm -2 . Photoluminescence was collected using the same monochromator, with a photon-counting detector (PDM series from MPD). Timing is controlled electronically using a PicoHarp300 event timer. Measurements were carried out on under vacuum ( ⁇ 5 ⁇ 10 ⁇ mbar) and air.
- the THz pulse was measured in transmission geometry.
- phase identification is carried out using Pawley fits to powder X-ray diffraction (PXRD) data to extract lattice parameters of phases (using LaB 6 as an internal standard) and comparing to those reported in the literature, and by SEM and TEM EDX as a direct measurement of elemental composition (using CuI, AgI and BiI3 powders as standards). Close stoichiometric representations are used to refer to the compounds, with their average compositions measured by SEM or TEM EDX shown in Figure 25c and Table 7.
- PXRD powder X-ray diffraction
- Table 7 the average compositions of the materials synthesized in this investigation, measured with either SEM EDX (CuBiI 4 ) or TEM EDX (CuAgBiI 5 , Cu 2 AgBiI 6 ), with 1 ⁇ errors.
- SEM EDX CuBiI 4
- TEM EDX CuAgBiI 5 , Cu 2 AgBiI 6
- the stoichiometric compositions chosen to represent the materials are within error to the measured compositions.
- the two different structures associated with these unit cells are indistinguishable by PXRD. 44
- the structure with the cubic unit cell is also indistinguishable from a 4-fold twinning of the structure with the metrically cubic small trigonal unit cell by single crystal X-ray diffraction (SCXRD).
- FIG. 26c There is a third type of unit cell, the large trigonal cell, depicted in Figure 26c.
- This cell is useful to compare structures with the cubic unit cell or the small trigonal unit cell.
- the small trigonal unit cell can also be transformed into the large trigonal unit cell by doubling it in the a and b directions using the transformation matrix in Figure 26.
- Rhombohedral strain can be thought of as extending or contracting the cubic unit cell along the body diagonal (111) cubic ( Figure 26d).
- the Bi-rich x > 0 Ag 1-3x Bi 1+x I 4 compounds (AgBi 2 I 7 , Ag 2 Bi 3 I 11 ) and CuBiI 4 have been reported with a cubic unit cell, 43, 47-48, 62 whereas the Ag-rich x ⁇ 0 Ag 1-3x Bi 1+x I 4 compounds (Ag 2 BiI 5 , Ag 3 BiI 6 ), have been reported in the small trigonal unit cell. 46, 48, 62 All the reported ternary phases have cubic close-packed (CCP) iodide sub-lattices. 2.1.1.
- CuBiI 4 A compositional screening of the Cu 3x Bi 1-x I 3 composition range was carried out between 0.18 ⁇ x ⁇ 0.32, at 0.02 intervals.
- BiI 3 impurities were seen for x > 0.25 samples, and CuI impurities for x ⁇ 0.25 samples.
- the PXRD pattern of the pure sample indexed to a cubic cell in the Fd3 ⁇ m space group as reported by Fourcroy et al.
- Cu(Ag 1.5 Bi 0.5 )I 4 is the composition where the material would have the same tetrahedral and octahedral occupancies as spinel MgAl 2 O 4 whilst satisfying charge balance.
- the large amounts of impurity phases show that the nominal composition is far from the new quaternary phase.
- the PXRD patterns of samples synthesized can all be fitted to a mixture of a F4 ⁇ 3m Cu1-yAgyI zinc blende, BiI3 and a cubic Fd3 ⁇ m phase (Figure 36).
- the lattice parameters of the Cu 1-y Ag y I zinc blende and the cubic Fd3 ⁇ m phase across the series were refined with respect to a LaB 6 internal standard ( Figure 37).
- the lattice parameter of the new quaternary phase for nominal composition Cu 1.5 Ag 0.5 BiI 5 lies within this range of lattice parameters.
- the extra CuI used in the reaction as x increases is therefore accounted for by an increase in the weight percentage of the zinc blende impurity phase.
- the range of lattice parameters over the series suggests that a range of quaternary Cu–Ag–Bi–I phases may exist under these synthetic conditions, however, since all samples contained impurity phases the targeted phases do not lie on the Cu x Ag 1-x BiI 4 solid solution line.
- the Cu 4x (AgBi) 1-x I 4 solid solution corresponds to a line of compositions between the known phases CuI and AgBiI 4 .
- the lattice parameter of the Cu 1-y Ag y I zinc blende impurity phase changes with composition and for 0.29 ⁇ x ⁇ 0.31 the impurity peaks are aligned with the main phase peaks and cannot be deconvoluted from the PXRD pattern during the Pawley fit.
- the Cu 1-y Ag y I zinc blende lattice parameter is interpolated to be half the lattice parameter of the main cubic Fd3 ⁇ m phase ( Figure 38).
- the Cu 1-y Ag y I zinc blende phase could not be identified, it is possible that this is a region where a pure quaternary phase also exists.
- the PXRD pattern indexes to a large trigonal cell in the R3 ⁇ m space group.
- the average composition of the Cu 2 AgBiI 6 powder was measured as Cu 2.15(16) Ag 1.04(5) Bi 0.92(7) I 6.00(11) by TEM EDX.
- the PXRD pattern indexes to a small trigonal cell in the R3 ⁇ m space group.
- Nomenclature referred to are described in the main text and shown in the corresponding figures.
- the columns contain the composition, unit cell type, octahedral motif type, tetrahedral site type, iodide sub-lattice packing, structure types, and references of the previously reported, and novel compounds.
- each octahedral site is occupied by 50% Ag + and 50% Bi 3+ , giving the octahedra full occupancy.
- x > 0 Ag 1-3x Bi 1+x I 4 (AgBi 2 I 7 , Ag 2 Bi 3 I 11 )
- vacancies arise on the octahedral site as there is now a less than 2:1 cation-to-anion ratio. Therefore, this octahedral motif will be referred to as defect-spinel, referring to its ability to contain vacancies.
- the reported structure of CuBiI 4 also has the defect-spinel octahedral motif, with octahedra occupied by 50% Bi 3+ and 50% vacant, as the Cu + cations occupy tetrahedral sites.
- the defect-spinel octahedral motif is a 3D network of edge-sharing octahedra and has an overall occupancy of O sites of 1/2.
- An alternative description is to consider the defect-spinel octahedral motif as a vacancy-ordered rock salt in which the occupied O sites are arranged in the defect-spinel motif.
- the defect-spinel motif can be represented in the large trigonal unit cell.
- the lowering of the symmetry of the unit cell means that there are now two octahedral sites, which must remain equally occupied to maintain the symmetry of the original cubic structure.
- the transformation shows that the defect-spinel octahedral motif can be considered as alternating between layers of 3/4 and 1/4 O site occupancy, maintaining the overall 1/2 O site occupancy.
- the tetrahedral Cu1 site is in the layer with 3/4 O site occupancy and shares faces with the octahedra in the layer with 1/4 O site occupancy. Therefore, it is located at the points where the octahedra from the 1/4 O site layers edge share with the octahedra from the 3 ⁇ 4 O site layers, which happens eight times in the unit cell.
- CuBiI 4 site Cu1 has a Cu occupancy of 18%.
- Site Cu2 has a multiplicity of 48, and HM point group 2mm ( Figure 50b). To understand the location of site Cu2, consider the empty channels left by the 1/2 O site occupancy. There are 12 linear channels per unit cell, which crossover to make a 3D network of channels. Each channel has four Cu + ions which are not shared by any other channel.
- the 12 channels of four Cu + ions gives the multiplicity of 48.
- CuBiI 4 site Cu2 has a Cu occupancy of 12%.
- Site Cu3 has a multiplicity of eight, and HM group (Figure 50c). These eight Cu + ions are at the eight places that four separate channels cross over in the unit cell. Figure 50c points to one of the Cu + ions, and highlights the four channels that it is in.
- CuBiI 4 site Cu3 has a Cu occupancy of 9%.
- Site Cu3 is the same site that is occupied in the spinel structure ( Figure 28a).
- Cu2 and Cu3 sites share the channels as shown in Figure 50d. Together, all three sites occupy every possible T site in the CCP sub-lattice ( Figure 50e). 2.2.1.
- the octahedral sites of the CdCl 2 octahedral motif are 50% occupied by Bi 3+ and 50% vacant.
- Partial layered ordering of the sites means that site Cu1 is in the layer with octahedral site Bi1 and Cu2 is in the layer with no O site. Both Cu sites have point symmetry 3m and are distorted along the c direction; the Cu1 Cu–I bond length pointing in the c direction is elongated (2.712(3) ⁇ ) compared to the other three bonds (2.660(1) ⁇ ) showing distortion of the Cu + towards an apex of the tetrahedron, and the Cu2 Cu–I bond length pointing in the c direction is shortened (2.553(3) ⁇ ) compared to the other three bonds (2.6071(8) ⁇ ) showing distortion of the Cu + towards the base of the tetrahedron.
- the ratio of the two structures was controlled via fixing the octahedral occupancies.
- the Cu + occupancies were fixed during the refinements to ensure the composition was maintained.
- CuAgBiI 5 Structure was solved by Rietveld refinement of complementary combined room temperature high resolution synchrotron PXRD (MAC detector, I11, Diamond Light Source, Oxfordshire, UK) and high resolution NPD (HRPD, ISIS Neutron and Muon Source, Oxfordshire, UK) datasets, with information also gathered from SCXRD data.
- SCXRD data collected at 100K showed that the solution was a structure with a defect-spinel octahedral motif, however trying to refine the Cu sites would cause an unstable refinement and therefore this defect-spinel octahedral motif was used to create a starting model to refine against the powder data instead.
- the location of Cu1 in the structure is in the empty channels caused by the unoccupied octahedra sites, the same as Cu2 site in the reported CuBiI 4 structure ( Figure 50b).
- the difference is that due to partial layered ordering Cu1 is only present in channels in the ab plane, which are half the total amount of channels shown in Figure 50b. This is also different from the site that is occupied in a classic spinel ( Figure 28a).
- the positioning of the tetrahedral Cu + in CuAgBiI 5 makes it a rhombohedrally-distorted defect CuBiI 4 structure.
- the Cu + is displaced away from the centre of the tetrahedron, towards the apex in the direction that points along the c-axis, which leads to one Cu–I bond (2.4923(2) ⁇ ) being shorter than the others (2.6908(3) ⁇ ), significantly distorted I–Cu–I angles of 112.14(4)° and 106.676(2)°.
- the refined composition of Cu 0.65(1) Ag 1.04(2) Bi 1.05(2) I 5.00 is within error of the average powder composition of Cu 0.88(17) Ag 1.10(6) Bi 0.98(8) I 5.00(11) measured by TEM EDX. 2.3. Bulk Photostability The phases reported here have varying stabilities in their powder forms.
- CuBiI 4 is a metastable material and decomposes back in to starting materials BiI 3 and CuI at room temperature, even in the dark. The rate of decomposition of CuBiI 4 can be slowed by storing the powder in a freezer at ⁇ 80°C.
- CuAgBiI 5 and Cu 2 AgBiI 6 are both stable when kept in the dark, in air, at room temperature.
- CuAgBiI 5 , Cu 2 AgBiI 6 and AgBiI 4 powders were exposed to the AM1.5 solar spectrum for one week, sealed in capillaries with synthetic air, laboratory air, and He atmospheres. CuAgBiI 5 experienced a color change from black to yellow in all atmospheres.
- CuAgBiI 5 and Cu 2 AgBiI 6 Thin Films The phases reported here have varying stabilities in their powder forms.
- CuBiI 4 is a metastable material and decomposes back in to starting materials BiI 3 and CuI at room temperature, even in the dark.
- the rate of decomposition of CuBiI 4 can be slowed by storing the powder in a freezer at ⁇ 80°C.
- CuAgBiI5 was stable when kept in the dark, in air, at room temperature. Therefore, we chose CuAgBiI 5 to process in to thin films for property measurements. Films were processed as described in the S.I.
- the sharp PL peak at 800 nm, observed in all three films, is from the second diffraction of the excitation laser signal from the diffraction grating in the detection setup.
- time-resolved PL measurements were carried out in vacuum using Time-Correlated Single Photon Counting (TCSPC).
- TCSPC Time-Correlated Single Photon Counting
- the low value of ⁇ is indicative of a highly heterogeneous decay, very similar to that observed in both Cs 2 AgBiBr 6 (see Schade et al., Structural and Optical Properties of Cs 2 AgBiBr 6 Double Perovskite.
- the thin films were only illuminated for very brief (c.a.15 s) periods during the PL measurements, during which acquisitions were taken every 3 s, after 20, 60 and 90 minutes, respectively.
- the results show PL spectra after 20 minutes that are similar to those measured on fresh films in vacuum, but which subsequently display a clear blue-shift and large rise in PL intensity under prolonged exposure to air, although the time taken for this to occur varied between the two samples.
- Similar variation of PL spectra with atmosphere has been widely reported for conventional metal-halide perovskites (Motti et al., Photoinduced Emissive Trap States in Lead Halide Perovskite Semiconductors.
- PL spectra were recorded at 3 second intervals under continuous illumination by the laser after 20 and 90 minutes for one sample ( Figures 66c and d).
- Figures 66c and d When measured under constant illumination the spectra of CuAgBiI 5 show a drop in intensity but no change in spectral shape, a process sometimes described as ‘photodarkening’, implying that light-induced effects are not the source of the blue- shift of the spectrum and increase in PL intensity.
- Photodarkening has been observed in lead-halide perovskites, under both vacuum and nitrogen (Motti et al., Photoinduced Emissive Trap States in Lead Halide Perovskite Semiconductors.
- Charge-carrier mobility is influenced by intrinsic effects, such as scattering off of ionised impurities or couplings between charge carriers and the crystal lattice, and extrinsic effects such as poor crystallinity and high energetic disorder or scattering off defects.
- the ternary and quaternary Cu–Ag–Bi–I materials can be synthesized as powders, crystals and thin films via solid state, vapour deposition and solution processing methods.
- compositional inhomogeneity and therefore TEM EDX was used to probe composition of individual particles of the sample.
- Compositionally homogeneous quaternary CuAgBiI 5 and Cu 2 AgBiI 6 powders were eventually realised by solid state synthesis, however during the optimisation there was evidence for many different compositions along the Cu 4x (AgBi) 1-x I 4 solid solution line which may be attainable via different synthetic routes such as using different temperatures in solid state synthesis, solution processing, or chemical vapour transport.
- compositions may be possible due to the fact that the ternary and quaternary materials are all based on a well-defined close-packed I- sub-lattice with a heavily disordered cation filling of tetrahedral Cu + , and octahedral Ag + and Bi 3+ which can be arranged in many different ways (they have a high configurational entropy).
- the Ag + in these materials has been shown to have octahedral coordination, in contradiction to the room temperature structure of AgI, for which Ag + has tetrahedral coordination.
- Figure 64 shows the type of octahedral motif against the O site occupancy.
- any O site occupancy more than 50% is between already fully occupied octahedral layers.
- this is a 3D octahedral motif because every interlayer O site will connect the adjacent layers.
- AgBiI 4 is indistinguishable by diffraction methods between the 3D defect- spinel octahedral motif and a 4-fold twin of the CdCl 2 octahedral motif (see Sansom et al., AgBiI 4 as a Lead-Free Solar Absorber with Potential Application in Photovoltaics. Chem. Mater.2017, 29 (4), 1538-1549). We have also shown here that the same ambiguity exists for CuBiI 4 .
- CuBiI 4 has either the 3D octahedral motif or twinned 2D CdCl2 octahedral motif, with an O site occupancy of only 25%.
- CuBiI 4 was found to decompose in to BiI 3 and CuI upon standing at room temperature showing that it is not a stable phase, likely due to the low O site occupancy.
- CuAgBiI 5 and Cu 2 AgBiI 6 represent phase stable Cu- and Bi-containing compounds in the CuI–AgI–BiI 3 phase field, achieved by taking advantage of the chemical tuning made available by the quaternary system to increase O site occupancy of CuBiI 4 ; for CuAgBiI 5 this corresponds to adding 4x Ag + for x (Cu + + Bi 3+ ). For Cu 2 AgBiI 6 this corresponds to adding x (Cu + + 2Ag + ) for every x Bi 3+ removed. 3.
- Figure 91 shows the fitting of (a) Cu 2p, (b) Ag 3d, (c) Bi 4f, and (d) I 3d core levels of X-ray photoelectron spectroscopy (XPS) data collected for CuAgBiI 5 bulk sample.
- XPS X-ray photoelectron spectroscopy
- Figure 92 shows the valence band maximum (VBM) and conduction band minimum (CBM) positions with respect to vacuum measured for CuAgBiI 5 and Cu2AgBiI 6 bulk samples. The ionisation potential are measured on bulk samples and the optical band gap measured on thin films.
- Figure 93 shows five steady-state photoluminescence spectra for a thin film of CuAgBiI 5 measured under continuous illumination over 15 s by a 398 nm laser at an intensity of 39.0 Wcm -2 after being left in air for 20 (a) and 90 (b) minutes, respectively.
- Figure 94 shows structures in the CuI-AgI-BiI 3 phase space: binaries CuI, AgI and BiI 3 ; ternaries Ag 3 BiI 6 , Ag 2 BiI 5 , AgBiI 4 , AgBi 2 I 7 , Ag 2 Bi 3 I 11 , CuBiI 4 , Cu 2 BiI 5 ; and quaternary Cu 2 AgBiI 6 . Also included is CuAgBiI 5 .
- Figure 95 shows (a) The three Cu + sites in CuBiI 4 (spinel) colour coded as yellow (site 1), orange (site 2) and red (site 3). A channel in the spinel octahedral (Oct) motif is highlighted in blue, which a cross-section is taken of to show the tetrahedral (Tet) sites inside (sites located behind the channel, which appear to be inside due to the 2D representation of the 3D structure, have been crossed out).
- the red site (site 3) is the same in spinel. Some, but not all, of the orange sites (site 2) are occupied in CuAgBiI 5 .
- the Tet sites in CuAgBiI 5 can be considered as a reflection of the spinel sites with the mirror plane down the centre of the channel (blue dashed line) (b)
- the two Cu + sites in the small trigonal unit cell (Cu 2 AgBiI 6 and CuBiI 4 (CdCl 2 )) showing layered ordering.
- the PL spectra of CuAgBiI 5 and Cu 2 AgBiI 6 were measured in vacuum and air, respectively.
- Figure 97 shows (a) The room temperature crystal structure of CuAgBiI 5 from Rietveld refinement of combined PXRD and NPD datasets, including coordination environments.
- the substrates were quickly transferred to a dry box and heated to 150°C for deposition.100 ul of the hot CuAgBiI solution was deposited dymanically on to the hot substrate and spun at 4000 rpm for 45 seconds on a spincoater. The films were then annealed at 50°C for 30 minutes in air, over which the films turned from a clear orange film to a dark red-brown film. The film was then annealed at 150°C for 15 seconds in air to form the brown film. Films were transferred to and kept in a N 2 filled glovebox until used for measurements.
- Example 4 Solution processing of films along Cu 4x (AgBi) 1-x I 4 line
- the composition of films measured by SEM EDX are shown in Figure 71. The average compositions are also reported, indicating some of the films contain iodine deficits.
- the Pawley fits to XRD patterns are shown in Figure 72.
- Figure 74 shows an order of magnitude increase in the mobility of the film with composition Cu 5.87(12) Ag 0.79(11) Bi 0.90(8) I 8.66(22) , compared to the film with composition Ag 1.05(3) Bi 1.07(7) I 4.00(7) .
- Figure 75 shows that there are very small changes in the band gap of the series of films.
- Method AgI, Bi and I 2 powders (Table 13) were dissolved in 0.8 ml DMSO at 140°C over 15 minutes with constant stirring.
- CuI powders were dissolved in pyridine at 140°C over 15 minutes with constant stirring.
- the AgBiI in DMSO and CuI in pyridine solutions were quickly filtered through a 0.22 ⁇ m pore-size, 13 mm diameter PTFE filter and combined into a single vial.
- the solutions were kept stirring at 100°C during deposition.
- Microscope slides were cut to size (approx. 24mm x 24 mm) and sonicated in soap and DI water, acetone and IPA for 15 minutes, dried using an N 2 gun, then further cleaned in a U.V.-Ozone generator. After which, the substrates were quickly transferred to a dry box and heated to 150°C for deposition.100 ul of the hot CuAgBiI solution was deposited dynamically on to the hot substrate and spun at 4000 rpm for 45 seconds on a spincoater.
- the films were then annealed at 50°C for 30 minutes in air, over which the films turned from a clear orange film to a dark red-brown film.
- the film was then annealed at 150°C for 15 seconds in air to form the films shown in Figure 76. Films were transferred to and kept in a N 2 filled glovebox until used for measurements. Table 13.
- the three power sources were custom made by Moorfield Nanotechnology and controlled by an Inficon SQC-310 deposition controller and the evaporation rates measured by three quartz crystal microbalances (QCM).
- the substrates were protected during the heating and cooling process by a mechanical shutter, and the substrates were rotated during deposition to improve substrate surface coverage.
- precursor tooling factors were calculated to correct the divergence between the true rate and thickness and the rate and thickness measured by the QCM. This was done by separately depositing 100 nm of each precursor at 0.7 ⁇ s -1 (as measured by the QCM and SQC-310) onto 30 x 30 mm glass. By measuring the thickness using a Dektak profilometer, a calibrated tooling factor was calculated using equation 1.
- X-ray diffraction was used to ensure only the precursor was evaporated and no impurities were deposited. All depositions were carried out under vacuum (2 x 10 -6 mbar). Prior to being loaded into the vacuum chamber, the substrates were sonicated in 200 ml of Decon and DI water (2% concentration), 200 ml of DI water, 200 ml acetone, and 200 ml isopropanol for 15 minutes each, then O 2 plasma cleaned for 10 minutes, and UV-Ozone cleaned for 15 minutes.
- UV-Visible absorption was measured in ambient air using a UV Spectrophotometer (Cary 300). Measurements of 200 nm thick evaporated Cu 2 AgBiI 6 films on quartz substrates are shown in Figure 82. Absorbance data shows the evaporated Cu 2 AgBiI 6 films strongly absorb in the UV- Visible region. Films that were not annealed showed the greatest absorbance, whilst absorbance decreased for films annealed at higher temperatures, possibly due to increasing pinhole density. Photoluminescent Spectroscopy (PL) was measured at in ambient air using a PicoQuant FluoTime 300 and analysed in EasyTau 2 software.
- PL Photoluminescent Spectroscopy
- the PL spectrum in Figure 83 shows the Cu 2 AgBiI 6 films are emissive with peak wavelength emission at 720 nm, in line with that found for solution processed films. Films annealed at higher temperatures are more emissive, whilst films annealed at 110°C or less emit weakly. A small shoulder at 690 nm for films annealed at 130°C and 150°C may correspond to the second rhombohedral phase found in the PXRD data.
- the photostability of a quaternary Cu 2 AgBiI 6 film was investigated by comparing the absorption and PL intensity of films left in the dark to those exposed to an 80W, 400-700 nm LED array.
- the experiment was conducted in an N 2 glovebox in the absence of O 2 and H 2 O ( ⁇ 5 ppm).
- the film was evaporated onto SnO 2 /ITO substrates and annealed at 110°C in air. One half of the sample was placed under the LED array, and the other half placed in a dark container.
- the absorbance and PL spectrum were measured after one week, and after three weeks.
- Figures 84-85 report the changes in absorption and PL after one and three weeks respectively.
- the absorption of the illuminated film is higher than the film stored in the dark, possibly due to increased scattering or increased sub-band gap absorption by trap states.
- the dark sample’s PL peak emission is at 718 nm, whilst the illuminated sample’s peak emission is blue-shifted to 707 nm and has lower intensity.
- the FWHM decreases from 360 meV to 340 meV.
- a further small increase in the illuminated film’s absorption is observed, but the relative difference in intensity between the illuminated and dark film decreases.
- silver originates from the photodissociation of silver iodide.
- Silver-halides have been intensely studied for their application to photography [6]–[10] .
- Exposure to above bandgap (2.83 eV or 438 nm) radiation dissociates silver iodide to form a latent image of Ag 0 particles and iodine I 0 .
- the reaction proceeds as follows: Upon illumination, an iodide valance band electron is promoted to the conduction band generating an e-h pair that are free to move through the AgI lattice. The pair can either recombine on an iodine site or become trapped at defect sites.
- Electrons trapped at defect sites can combine with mobile silver ions causing reduction of Ag + to Ag 0 .
- the presence of Ag 0 catalyses further reductions leading to clusters of Ag 0 which are used to develop a latent image.
- radiation is generated from a heated tungsten wire (T>2800K) used to heat the crucible and precursor, and the direct absorption of above bandgap photons by AgI is facilitated by the transparent quartz crucible.
- Pure silver evaporates at much greater temperature than the AgI deposition temperature and remains in the crucible, in contrast to iodine that rapidly sublimes onto the substrates.
- an opaque alumina (Al 2 O 3 ) crucible silver is not produced.
- the alumina crucibles also offer greater resistance to cracking.
- Void Formation Cross-section SEM micrographs of Cu 2 AgBiI 6 films deposited from quartz crucibles on PEDOT:PSS ( Figure 88) and SnO 2 ( Figure 89) respectively revealed the presence of interfacial voids. Voids are commonly observed in solution processed films and usually form from the imperfect evaporation of solvents, but it’s less commonly observed in evaporated films. The voids were unrelated to annealing atmosphere and temperature and were present in all as-deposited films implying formation during deposition/cooling. When replacing the quartz crucibles with alumina crucibles, the voids were eliminated (Figure 90).
- Cu 2 AgBiI 6 films were annealed at 110°C, 130°C, and 150°C in an I 2 atmosphere for 15 minutes. These films were compared to films annealed at the same temperature and for the same time in air.
- the annealing set up is shown in Figure 98.
- the base plate Prior to loading the samples, the base plate was pre-heated to the target temperature using a hotplate. Once the target temperature was reached, 250 nm thick Cu 2 AgBiI 6 samples and 1g of solid iodine crystals were positioned on the base plate before sealing the atmosphere with a rubber gasket, glass cover, and pumping down to a pressure of 5 KPa using a rotary vacuum pump.
- the bandgap was estimated to be 2.02 eV, 1.96 eV, 1.93 eV, 1.92 eV for as-deposited, and films annealed in air (110°C, 130°C and 150°C respectively). These values are in good agreement with films annealed in iodine (1.98 eV, 1.91 eV, and 1.90 eV) showing no significant difference in absorption properties at the band edge. However, films annealed at temperatures greater than 110°C in both air and iodine develop an absorption peak at approximately 3eV, which can be attributed to the generation of CuI.
- the lifetimes for as deposited, and 110°C, 130°C, and 150°C films in air were estimated to be 15.6 ns, 13.4 ns, 24.7 ns, and 34.3 ns respectively, whilst films annealed at the same temperature in an iodine atmosphere were estimated at 10.9 ns, 40.4 ns, and 51.8 ns respectively [2]. Due to the strong overlap between the CuI and Cu 2 AgBiI 6 emission wavelength, it is not clear whether this increase in lifetime is due to photo excited charges generated in Cu 2 AgBiI 6 , or CuI.
- a crystalline compound comprising (i) One or more first cations, A; (ii) One or more second cations, B; (iii) One or more third cations, B’; (iv) One or more anions, X; wherein the one or more first cations, A, are different from the one or more second cations, B, and to the one or more third cations, B’, and wherein the one or more second cations, B, are different from the one or more first cations, A, and to the one or more third cations, B’, wherein at least some of the one or more third cations, B’, are in an octahedral coordination environment, and wherein at least some of the one or more first cations, A, are in a tetrahedral coordination environment.
- a crystalline compound according to clause 1 wherein the compound is not a perovskite, and/or wherein the molar ratio of the one or more first cations, A, to the one or more second cations, B, in the crystalline compounds is at least 1:9, preferably wherein the molar ratio of the one or more first cations, A, to the one or more second cations, B, in the crystalline compounds is at least 1:5.
- a crystalline compound according clause 1 or clause 2 wherein at least some of the one or more first cations, A, form AX 4 tetrahedra. 4.
- a crystalline compound according to any preceding clause wherein the one or more first cations, A have the electronic configuration Nd 10 , wherein N is an integer from 3 to 5. 5. A crystalline compound according to any preceding clause wherein the one or more first cations, A, have an ionic radius of less than 1 ⁇ . 6. A crystalline compound according to any preceding clause wherein the one or more first cations, A, comprise one or more of Mg 2+ , Ga 3+ , Ge 4+ , Si 4+ , P 5+ , Cu + , Zn 2+ , Ti 4+ , Al 3+ , In 3+ and Li + . 7. A crystalline compound according to any preceding clause wherein the one or more first cations, A, comprise Cu + . 8.
- the one or more anions, X comprise one or more anions selected from halide anions and chalcogenide anions.
- the one or more anions, X comprise one or more of I-, Br-, Cl-, S 2- , Se 2- and O 2- .
- the one or more anions, X comprise I-. 19.
- a crystalline compound according to any preceding clause wherein: - at least some of the one or more first cations, A, form AX 4 tetrahedra; - at least some of the one or more second cations, B, form BX 6 octahedra; and - at least some of the one or more third cations, B’, form B’X 6 octahedra.
- 20. A crystalline compound according to any preceding clause wherein the crystalline compound has a structure based on the cadmium chloride structure.
- the one or more first cations, A comprise one or more of Mg 2+ , Ga 3+ , Ge 4+ , Si 4+ , P 5+ , Cu + , Zn 2+ , Ti 4+ , Al 3+ , In 3+ and Li + ;
- the one or more second cations, B comprise one or more of Ag + , Mn 2+ , Fe 2+ , Co 2+ , Ni 2+ , Cr 3+ , V 2+ , Cd 2+ , Cu + , Au + , Pt 2+ , Pt 4+ , Mg 2+ , Li + , Na + , K + , Rb + , Cs + , In + , Ca 2+ , Sr 2+ , La 3+ and Y 3+ ;
- the one or more third cations, B’ comprise one or more of Bi 3+ , Pb 2+ , Sn 2+ , Ge 2+ , In + ,
- the one or more first cations, A comprise Cu + ; the one or more second cations, B, comprise Ag + ; the one or more third cations, B’, comprise Bi 3+ ; and the one or more anions, X, comprise I-. 26.
- the compound is a compound of formula (I): [A] 4x ⁇ [B][B’] ⁇ 1-x [X] 4 (I); wherein [A] is the one or more first cations, [B] is the one or more second cations, [B’] is the one or more third cations and [X] is the one or more anions, wherein the one or more first cations, A, are different from the one or more second cations, B, and the one or more third cations, B’, and wherein the one or more second cations, B, are different from the one or more first cations, A, and the one or more third cations, B’, wherein at least some of the one or more third cations, B
- a passivated film comprising: a) a crystalline compound as defined in any one of clauses 1-38; and b) a passivating agent.
- 41. A passivated film according to clause 40, wherein the passivating agent is selected from one or more of iodine, sulfur, selenium or methylamine.
- a semiconductor device comprising a compound as defined in any one of clauses 1 to 38 or a film as defined in any one of clauses 39-41. 43.
- a semiconductor device wherein the device is an optoelectronic device, optionally wherein the semiconductor device is an optoelectronic device selected from a photovoltaic device, a light emitting device, a photodetector or an X-ray scintillator optionally wherein the semiconductor device is a photovoltaic device selected from a single- junction photovoltaic device, a tandem junction photovoltaic device or a multi-junction photovoltaic device. 44.
- a semiconductor device which semiconductor device comprises: an n-type region comprising at least one n-type layer; a p-type region comprising at least one p-type layer; and, disposed between the n-type region and the p-type region: a layer comprising the compound or the film. 45.
- a process for producing a film comprising a crystalline compound comprising (i) One or more first cations, A; (ii) One or more second cations, B; (iii) One or more third cations, B’; (iv) One or more anions, X; wherein the one or more first cations, A, are different from the one or more second cations, B, and to the one or more third cations, B’, and wherein the one or more second cations, B, are different from the one or more first cations, A, and to the one or more third cations, B’, wherein at least some of the one or more third cations, B’, are in an octahedral coordination environment, and wherein at least some of the one or more first cations, A, are in a tetrahedral coordination environment, said process comprising disposing a film-forming solution on a substrate wherein the film-forming solution comprises the one or more first cations, A,
- a process according to clause 45 wherein the film-forming solution comprises pyridine.
- the process comprises dissolving a compound comprising the one or more first cations, A, in a first solvent to produce a first solution, dissolving a compound comprising the one or more second cations, B, and a compound comprising the one or more third cations, B’, in a second solvent to produce a second solution, contacting the first solution with the second solution to form the film-forming solution.
- the first and/or the second solution comprises the one or more anions, X, optionally wherein both the first and second solutions comprise the one or more anions, X.
- 50. A process according to any one of clauses 47 to 49 wherein the first and second solvents are organic solvents, preferably wherein the first and second solvents are polar organic solvents, preferably wherein the first and second solvents are polar aprotic organic solvents.
- 51. A process according to any one of clauses 47 to 50 wherein the first and second solvents are selected from dimethylsulfoxide, pyridine, dimethylformamide, N-butylamine and mixtures thereof, preferably wherein one of the first or second solvents comprises pyridine. 52.
- a process according to any one of clauses 47 to 51 wherein the step of dissolving a compound comprising the one or more first cations, A, in a first solvent to produce a first solution is performed at a first temperature, wherein the first temperature is between 30 oC and 200 oC, preferably wherein the first temperature is between 100 oC and 200 oC. 53.
- a process according to any one of clauses 45 to 53 wherein the film-forming solution is stirred at a third temperature prior to disposing the film-forming solution on the substrate, wherein the third temperature is between 30 oC and 200 oC, preferably wherein the third temperature is between 75 oC and 150 oC. 55.
- the film-forming solution is disposed on the substrate by solution phase deposition, preferably wherein the film- forming solution is disposed on the substrate by spin-coating. 57.
- a process for producing a film comprising a crystalline compound comprising (i) One or more first cations, A; (ii) One or more second cations, B; (iii) One or more third cations, B’; (iv) One or more anions, X; wherein the one or more first cations, A, are different from the one or more second cations, B, and to the one or more third cations, B’, and wherein the one or more second cations, B, are different from the one or more first cations, A, and to the one or more third cations, B’, wherein at least some of the one or more third cations, B’, are in an octahedral coordination environment, and wherein at least some of the one or more first cations, A, are in a tetrahedral coordination environment, said process comprising: exposing the substrate to a vapour, which vapour comprises one or more reactants for producing said compound and allowing deposition of the
- a process according to clause 57 which process comprises evaporating one or more compounds comprising the one or more first cations, A, the one or more second cations, B, the one or more third cations, B’, and the one or more anions, X, to form the vapour.
- a process according to clause 57 or 58 wherein the steps of evaporating the one or more compounds and exposing the substrate to the vapour are performed in a vacuum.
- 60. A process according to clauses 58 or 59 wherein each of the one or more compounds are contained in a crucible that is opaque to visible light, preferably wherein the one or more compounds are contained in alumina crucibles. 61.
- a process according to any one of clauses 57 to 60 which process comprises evaporating a first compound comprising the one or more first cations, A, evaporating a second compound comprising the one or more second cations, B, and evaporating a third compound comprising the one or more third cations, B’, to produce the vapour wherein at least one of the first, second and third compounds also comprises the one or more anions, X. 62.
- the process further comprises exposing the film comprising a crystalline compound to a passivating agent.
- the passivating agent comprises vapour of one or more of iodine, sulfur, selenium or methylamine 68.
- a process for producing a semiconductor device comprising producing a film comprising a crystalline compound on a substrate using the process as defined in any one of clauses 45 to 67, and disposing one or more further components on the film to produce a semiconductor device. 69.
- a compound as defined in any one of clauses 1 to 38 as a. an optoelectronic material, preferably as a photovoltaic material or as an electroluminescent material; b. a luminescent material, preferably as a phosphor; c. a scintillator in a radiation detector; or d. a photodetector.
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| CN116495777A (en) * | 2023-04-12 | 2023-07-28 | 武汉理工大学深圳研究院 | A kind of hexagonal Cs2AgBiI6 perovskite nanocrystal material and its preparation method and application |
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