EP4021373A1 - Dental composition - Google Patents
Dental compositionInfo
- Publication number
- EP4021373A1 EP4021373A1 EP20800548.8A EP20800548A EP4021373A1 EP 4021373 A1 EP4021373 A1 EP 4021373A1 EP 20800548 A EP20800548 A EP 20800548A EP 4021373 A1 EP4021373 A1 EP 4021373A1
- Authority
- EP
- European Patent Office
- Prior art keywords
- moiety
- hydrogen
- dental composition
- alkyl
- acidic compound
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000000203 mixture Substances 0.000 title claims abstract description 62
- 239000003999 initiator Substances 0.000 claims abstract description 30
- 239000000178 monomer Substances 0.000 claims abstract description 17
- 239000003504 photosensitizing agent Substances 0.000 claims abstract description 16
- 238000010521 absorption reaction Methods 0.000 claims abstract description 3
- 229910052739 hydrogen Inorganic materials 0.000 claims description 36
- 239000001257 hydrogen Substances 0.000 claims description 36
- 150000001875 compounds Chemical class 0.000 claims description 28
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims description 25
- 150000003254 radicals Chemical class 0.000 claims description 21
- 125000000218 acetic acid group Chemical group C(C)(=O)* 0.000 claims description 20
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 claims description 19
- 150000001412 amines Chemical class 0.000 claims description 18
- 125000002887 hydroxy group Chemical group [H]O* 0.000 claims description 17
- 125000003118 aryl group Chemical group 0.000 claims description 10
- 125000000753 cycloalkyl group Chemical group 0.000 claims description 9
- 150000003512 tertiary amines Chemical class 0.000 claims description 9
- 150000003513 tertiary aromatic amines Chemical class 0.000 claims description 9
- 125000004432 carbon atom Chemical group C* 0.000 claims description 8
- 150000001732 carboxylic acid derivatives Chemical class 0.000 claims description 8
- XMBWDFGMSWQBCA-UHFFFAOYSA-N hydrogen iodide Chemical class I XMBWDFGMSWQBCA-UHFFFAOYSA-N 0.000 claims description 7
- 239000000654 additive Substances 0.000 claims description 6
- 230000000996 additive effect Effects 0.000 claims description 6
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 claims description 5
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 claims description 4
- 125000000217 alkyl group Chemical group 0.000 claims description 4
- 229910052799 carbon Inorganic materials 0.000 claims description 4
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 claims description 4
- 125000001301 ethoxy group Chemical group [H]C([H])([H])C([H])([H])O* 0.000 claims description 4
- 125000001072 heteroaryl group Chemical group 0.000 claims description 4
- 125000000956 methoxy group Chemical group [H]C([H])([H])O* 0.000 claims description 4
- 125000004430 oxygen atom Chemical group O* 0.000 claims description 4
- 150000004714 phosphonium salts Chemical class 0.000 claims description 4
- 150000003573 thiols Chemical class 0.000 claims description 4
- PGRHXDWITVMQBC-UHFFFAOYSA-N dehydroacetic acid Natural products CC(=O)C1C(=O)OC(C)=CC1=O PGRHXDWITVMQBC-UHFFFAOYSA-N 0.000 claims description 3
- IBDVWXAVKPRHCU-UHFFFAOYSA-N 2-(2-methylprop-2-enoyloxy)ethyl 3-oxobutanoate Chemical compound CC(=O)CC(=O)OCCOC(=O)C(C)=C IBDVWXAVKPRHCU-UHFFFAOYSA-N 0.000 claims description 2
- 239000004287 Dehydroacetic acid Substances 0.000 claims description 2
- RWSOTUBLDIXVET-UHFFFAOYSA-N Dihydrogen sulfide Chemical class S RWSOTUBLDIXVET-UHFFFAOYSA-N 0.000 claims description 2
- 125000002843 carboxylic acid group Chemical group 0.000 claims description 2
- 229940061632 dehydroacetic acid Drugs 0.000 claims description 2
- 235000019258 dehydroacetic acid Nutrition 0.000 claims description 2
- MHKKFFHWMKEBDW-UHFFFAOYSA-N dimethyl 2,5-dioxocyclohexane-1,4-dicarboxylate Chemical compound COC(=O)C1CC(=O)C(C(=O)OC)CC1=O MHKKFFHWMKEBDW-UHFFFAOYSA-N 0.000 claims description 2
- QUGJYNGNUBHTNS-UHFFFAOYSA-N ethyl 2-(benzhydrylideneamino)acetate Chemical compound C=1C=CC=CC=1C(=NCC(=O)OCC)C1=CC=CC=C1 QUGJYNGNUBHTNS-UHFFFAOYSA-N 0.000 claims description 2
- YMCDYRGMTRCAPZ-UHFFFAOYSA-N ethyl 2-acetyl-3-oxobutanoate Chemical compound CCOC(=O)C(C(C)=O)C(C)=O YMCDYRGMTRCAPZ-UHFFFAOYSA-N 0.000 claims description 2
- NWMTWESXONQJPU-UHFFFAOYSA-N ethyl 2-ethyl-2-methyl-3-oxobutanoate Chemical compound CCOC(=O)C(C)(CC)C(C)=O NWMTWESXONQJPU-UHFFFAOYSA-N 0.000 claims description 2
- FNENWZWNOPCZGK-UHFFFAOYSA-N ethyl 2-methyl-3-oxobutanoate Chemical compound CCOC(=O)C(C)C(C)=O FNENWZWNOPCZGK-UHFFFAOYSA-N 0.000 claims description 2
- JHZPNBKZPAWCJD-UHFFFAOYSA-N ethyl 2-oxocyclopentane-1-carboxylate Chemical compound CCOC(=O)C1CCCC1=O JHZPNBKZPAWCJD-UHFFFAOYSA-N 0.000 claims description 2
- 125000002560 nitrile group Chemical group 0.000 claims description 2
- 150000002825 nitriles Chemical class 0.000 claims description 2
- 229910052757 nitrogen Inorganic materials 0.000 claims description 2
- IJGRMHOSHXDMSA-UHFFFAOYSA-N nitrogen Substances N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 claims description 2
- QJGQUHMNIGDVPM-UHFFFAOYSA-N nitrogen group Chemical group [N] QJGQUHMNIGDVPM-UHFFFAOYSA-N 0.000 claims description 2
- 150000002431 hydrogen Chemical class 0.000 claims 16
- 235000013350 formula milk Nutrition 0.000 claims 9
- 241000183024 Populus tremula Species 0.000 claims 1
- JEQRBTDTEKWZBW-UHFFFAOYSA-N dehydroacetic acid Chemical compound CC(=O)C1=C(O)OC(C)=CC1=O JEQRBTDTEKWZBW-UHFFFAOYSA-N 0.000 claims 1
- VNQXSTWCDUXYEZ-UHFFFAOYSA-N 1,7,7-trimethylbicyclo[2.2.1]heptane-2,3-dione Chemical compound C1CC2(C)C(=O)C(=O)C1C2(C)C VNQXSTWCDUXYEZ-UHFFFAOYSA-N 0.000 description 96
- 229930006711 bornane-2,3-dione Natural products 0.000 description 91
- -1 aromatic tertiary amines Chemical class 0.000 description 32
- 125000001570 methylene group Chemical group [H]C([H])([*:1])[*:2] 0.000 description 12
- 238000006116 polymerization reaction Methods 0.000 description 11
- 239000011347 resin Substances 0.000 description 11
- 229920005989 resin Polymers 0.000 description 11
- CERQOIWHTDAKMF-UHFFFAOYSA-M Methacrylate Chemical group CC(=C)C([O-])=O CERQOIWHTDAKMF-UHFFFAOYSA-M 0.000 description 10
- 125000003545 alkoxy group Chemical group 0.000 description 7
- 150000002596 lactones Chemical class 0.000 description 7
- 150000001450 anions Chemical class 0.000 description 4
- 230000000052 comparative effect Effects 0.000 description 4
- 125000000623 heterocyclic group Chemical group 0.000 description 4
- 239000000523 sample Substances 0.000 description 4
- 230000002110 toxicologic effect Effects 0.000 description 4
- 231100000027 toxicology Toxicity 0.000 description 4
- NIXOWILDQLNWCW-UHFFFAOYSA-M Acrylate Chemical compound [O-]C(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-M 0.000 description 3
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 3
- QSJXEFYPDANLFS-UHFFFAOYSA-N Diacetyl Chemical group CC(=O)C(C)=O QSJXEFYPDANLFS-UHFFFAOYSA-N 0.000 description 3
- CERQOIWHTDAKMF-UHFFFAOYSA-N Methacrylic acid Chemical compound CC(=C)C(O)=O CERQOIWHTDAKMF-UHFFFAOYSA-N 0.000 description 3
- 229910002056 binary alloy Inorganic materials 0.000 description 3
- RAXXELZNTBOGNW-UHFFFAOYSA-N imidazole Natural products C1=CNC=N1 RAXXELZNTBOGNW-UHFFFAOYSA-N 0.000 description 3
- MGFYSGNNHQQTJW-UHFFFAOYSA-N iodonium Chemical compound [IH2+] MGFYSGNNHQQTJW-UHFFFAOYSA-N 0.000 description 3
- 238000002386 leaching Methods 0.000 description 3
- 238000012986 modification Methods 0.000 description 3
- 230000004048 modification Effects 0.000 description 3
- CIZFAASMIWNDTR-UHFFFAOYSA-N (4-methylphenyl)-[4-(2-methylpropyl)phenyl]iodanium Chemical compound C1=CC(CC(C)C)=CC=C1[I+]C1=CC=C(C)C=C1 CIZFAASMIWNDTR-UHFFFAOYSA-N 0.000 description 2
- BVQVLAIMHVDZEL-UHFFFAOYSA-N 1-phenyl-1,2-propanedione Chemical compound CC(=O)C(=O)C1=CC=CC=C1 BVQVLAIMHVDZEL-UHFFFAOYSA-N 0.000 description 2
- FJPGAMCQJNLTJC-UHFFFAOYSA-N 2,3-Heptanedione Chemical compound CCCCC(=O)C(C)=O FJPGAMCQJNLTJC-UHFFFAOYSA-N 0.000 description 2
- XCBBNTFYSLADTO-UHFFFAOYSA-N 2,3-Octanedione Chemical compound CCCCCC(=O)C(C)=O XCBBNTFYSLADTO-UHFFFAOYSA-N 0.000 description 2
- KVFQMAZOBTXCAZ-UHFFFAOYSA-N 3,4-Hexanedione Chemical compound CCC(=O)C(=O)CC KVFQMAZOBTXCAZ-UHFFFAOYSA-N 0.000 description 2
- HRPVXLWXLXDGHG-UHFFFAOYSA-N Acrylamide Chemical compound NC(=O)C=C HRPVXLWXLXDGHG-UHFFFAOYSA-N 0.000 description 2
- 239000004215 Carbon black (E152) Substances 0.000 description 2
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical group CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 2
- YLQBMQCUIZJEEH-UHFFFAOYSA-N Furan Chemical compound C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 2
- KYQCOXFCLRTKLS-UHFFFAOYSA-N Pyrazine Chemical compound C1=CN=CC=N1 KYQCOXFCLRTKLS-UHFFFAOYSA-N 0.000 description 2
- JUJWROOIHBZHMG-UHFFFAOYSA-N Pyridine Chemical compound C1=CC=NC=C1 JUJWROOIHBZHMG-UHFFFAOYSA-N 0.000 description 2
- KAESVJOAVNADME-UHFFFAOYSA-N Pyrrole Chemical compound C=1C=CNC=1 KAESVJOAVNADME-UHFFFAOYSA-N 0.000 description 2
- YTPLMLYBLZKORZ-UHFFFAOYSA-N Thiophene Chemical compound C=1C=CSC=1 YTPLMLYBLZKORZ-UHFFFAOYSA-N 0.000 description 2
- 230000002378 acidificating effect Effects 0.000 description 2
- 150000004982 aromatic amines Chemical class 0.000 description 2
- 230000008901 benefit Effects 0.000 description 2
- WURBFLDFSFBTLW-UHFFFAOYSA-N benzil Chemical compound C=1C=CC=CC=1C(=O)C(=O)C1=CC=CC=C1 WURBFLDFSFBTLW-UHFFFAOYSA-N 0.000 description 2
- HKWWDSQUZURFQR-UHFFFAOYSA-N bis(4-methylphenyl)iodanium Chemical compound C1=CC(C)=CC=C1[I+]C1=CC=C(C)C=C1 HKWWDSQUZURFQR-UHFFFAOYSA-N 0.000 description 2
- UEJFJTOGXLEPIV-UHFFFAOYSA-M bis(4-tert-butylphenyl)iodanium;4-methylbenzenesulfonate Chemical compound CC1=CC=C(S([O-])(=O)=O)C=C1.C1=CC(C(C)(C)C)=CC=C1[I+]C1=CC=C(C(C)(C)C)C=C1 UEJFJTOGXLEPIV-UHFFFAOYSA-M 0.000 description 2
- 229940000425 combination drug Drugs 0.000 description 2
- 125000004122 cyclic group Chemical group 0.000 description 2
- 239000003479 dental cement Substances 0.000 description 2
- OZLBDYMWFAHSOQ-UHFFFAOYSA-N diphenyliodanium Chemical compound C=1C=CC=CC=1[I+]C1=CC=CC=C1 OZLBDYMWFAHSOQ-UHFFFAOYSA-N 0.000 description 2
- 238000002845 discoloration Methods 0.000 description 2
- 125000005842 heteroatom Chemical group 0.000 description 2
- MWVFCEVNXHTDNF-UHFFFAOYSA-N hexane-2,3-dione Chemical compound CCCC(=O)C(C)=O MWVFCEVNXHTDNF-UHFFFAOYSA-N 0.000 description 2
- 229930195733 hydrocarbon Natural products 0.000 description 2
- 150000002430 hydrocarbons Chemical group 0.000 description 2
- 230000000977 initiatory effect Effects 0.000 description 2
- 150000002734 metacrylic acid derivatives Chemical class 0.000 description 2
- 125000002950 monocyclic group Chemical group 0.000 description 2
- XYZAPOXYXNIBEU-UHFFFAOYSA-N octane-4,5-dione Chemical compound CCCC(=O)C(=O)CCC XYZAPOXYXNIBEU-UHFFFAOYSA-N 0.000 description 2
- MPQXHAGKBWFSNV-UHFFFAOYSA-N oxidophosphanium Chemical class [PH3]=O MPQXHAGKBWFSNV-UHFFFAOYSA-N 0.000 description 2
- TZMFJUDUGYTVRY-UHFFFAOYSA-N pentane-2,3-dione Chemical compound CCC(=O)C(C)=O TZMFJUDUGYTVRY-UHFFFAOYSA-N 0.000 description 2
- 125000002924 primary amino group Chemical group [H]N([H])* 0.000 description 2
- 230000005855 radiation Effects 0.000 description 2
- 238000010526 radical polymerization reaction Methods 0.000 description 2
- 230000009257 reactivity Effects 0.000 description 2
- 229920006395 saturated elastomer Polymers 0.000 description 2
- 229930195734 saturated hydrocarbon Natural products 0.000 description 2
- 125000005504 styryl group Chemical group 0.000 description 2
- BDHFUVZGWQCTTF-UHFFFAOYSA-M sulfonate Chemical compound [O-]S(=O)=O BDHFUVZGWQCTTF-UHFFFAOYSA-M 0.000 description 2
- 125000005497 tetraalkylphosphonium group Chemical group 0.000 description 2
- FAUOSXUSCVJWAY-UHFFFAOYSA-N tetrakis(hydroxymethyl)phosphanium Chemical compound OC[P+](CO)(CO)CO FAUOSXUSCVJWAY-UHFFFAOYSA-N 0.000 description 2
- 231100000331 toxic Toxicity 0.000 description 2
- 230000002588 toxic effect Effects 0.000 description 2
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 2
- 229920002554 vinyl polymer Polymers 0.000 description 2
- LKENZCXDBCULOT-UHFFFAOYSA-N 1-(2-hydroxyphenyl)-2-phenylethane-1,2-dione Chemical compound OC1=CC=CC=C1C(=O)C(=O)C1=CC=CC=C1 LKENZCXDBCULOT-UHFFFAOYSA-N 0.000 description 1
- JQPFYXFVUKHERX-UHFFFAOYSA-N 2-hydroxy-2-cyclohexen-1-one Natural products OC1=CCCCC1=O JQPFYXFVUKHERX-UHFFFAOYSA-N 0.000 description 1
- 125000003903 2-propenyl group Chemical group [H]C([*])([H])C([H])=C([H])[H] 0.000 description 1
- AGJRLWIJQUQEDV-UHFFFAOYSA-N 3,3,18,18-tetramethylcyclooctadecane-1,2-dione Chemical compound CC1(C)CCCCCCCCCCCCCCC(C)(C)C(=O)C1=O AGJRLWIJQUQEDV-UHFFFAOYSA-N 0.000 description 1
- DTLUXZSCFRVBER-UHFFFAOYSA-N 3,3,6,6-tetramethylcyclohexane-1,2-dione Chemical compound CC1(C)CCC(C)(C)C(=O)C1=O DTLUXZSCFRVBER-UHFFFAOYSA-N 0.000 description 1
- OFUVUDZHGRTQMW-UHFFFAOYSA-N 3,3,8,8-tetramethylcyclooctane-1,2-dione Chemical compound CC1(C)CCCCC(C)(C)C(=O)C1=O OFUVUDZHGRTQMW-UHFFFAOYSA-N 0.000 description 1
- NYWSOZIZKAROHJ-UHFFFAOYSA-N 5-phenylthianthren-5-ium Chemical compound C12=CC=CC=C2SC2=CC=CC=C2[S+]1C1=CC=CC=C1 NYWSOZIZKAROHJ-UHFFFAOYSA-N 0.000 description 1
- KXJVWNBVRRZEHH-UHFFFAOYSA-N 7,7-dimethylbicyclo[2.2.1]heptane-2,3-dione Chemical compound C1CC2C(=O)C(=O)C1C2(C)C KXJVWNBVRRZEHH-UHFFFAOYSA-N 0.000 description 1
- QTBSBXVTEAMEQO-UHFFFAOYSA-M Acetate Chemical compound CC([O-])=O QTBSBXVTEAMEQO-UHFFFAOYSA-M 0.000 description 1
- BTBUEUYNUDRHOZ-UHFFFAOYSA-N Borate Chemical compound [O-]B([O-])[O-] BTBUEUYNUDRHOZ-UHFFFAOYSA-N 0.000 description 1
- CPELXLSAUQHCOX-UHFFFAOYSA-M Bromide Chemical compound [Br-] CPELXLSAUQHCOX-UHFFFAOYSA-M 0.000 description 1
- LBOWWGIJBVYOAA-UHFFFAOYSA-N C(=O)C=O.CCC(C(CCC)=O)=O Chemical compound C(=O)C=O.CCC(C(CCC)=O)=O LBOWWGIJBVYOAA-UHFFFAOYSA-N 0.000 description 1
- VEXZGXHMUGYJMC-UHFFFAOYSA-M Chloride anion Chemical compound [Cl-] VEXZGXHMUGYJMC-UHFFFAOYSA-M 0.000 description 1
- SNRUBQQJIBEYMU-UHFFFAOYSA-N Dodecane Chemical group CCCCCCCCCCCC SNRUBQQJIBEYMU-UHFFFAOYSA-N 0.000 description 1
- KRHYYFGTRYWZRS-UHFFFAOYSA-M Fluoride anion Chemical compound [F-] KRHYYFGTRYWZRS-UHFFFAOYSA-M 0.000 description 1
- BDAGIHXWWSANSR-UHFFFAOYSA-M Formate Chemical compound [O-]C=O BDAGIHXWWSANSR-UHFFFAOYSA-M 0.000 description 1
- ZCQWOFVYLHDMMC-UHFFFAOYSA-N Oxazole Chemical compound C1=COC=N1 ZCQWOFVYLHDMMC-UHFFFAOYSA-N 0.000 description 1
- 229910019142 PO4 Inorganic materials 0.000 description 1
- PCNDJXKNXGMECE-UHFFFAOYSA-N Phenazine Natural products C1=CC=CC2=NC3=CC=CC=C3N=C21 PCNDJXKNXGMECE-UHFFFAOYSA-N 0.000 description 1
- WTKZEGDFNFYCGP-UHFFFAOYSA-N Pyrazole Chemical compound C=1C=NNC=1 WTKZEGDFNFYCGP-UHFFFAOYSA-N 0.000 description 1
- CZPWVGJYEJSRLH-UHFFFAOYSA-N Pyrimidine Chemical compound C1=CN=CN=C1 CZPWVGJYEJSRLH-UHFFFAOYSA-N 0.000 description 1
- WBTCZXYOKNRFQX-UHFFFAOYSA-N S1(=O)(=O)NC1=O Chemical group S1(=O)(=O)NC1=O WBTCZXYOKNRFQX-UHFFFAOYSA-N 0.000 description 1
- QAOWNCQODCNURD-UHFFFAOYSA-L Sulfate Chemical compound [O-]S([O-])(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-L 0.000 description 1
- FZWLAAWBMGSTSO-UHFFFAOYSA-N Thiazole Chemical compound C1=CSC=N1 FZWLAAWBMGSTSO-UHFFFAOYSA-N 0.000 description 1
- 150000001252 acrylic acid derivatives Chemical class 0.000 description 1
- 125000002252 acyl group Chemical group 0.000 description 1
- 239000000853 adhesive Substances 0.000 description 1
- 230000001070 adhesive effect Effects 0.000 description 1
- 150000001299 aldehydes Chemical group 0.000 description 1
- 150000001336 alkenes Chemical class 0.000 description 1
- 125000003342 alkenyl group Chemical group 0.000 description 1
- 125000004183 alkoxy alkyl group Chemical group 0.000 description 1
- 125000005907 alkyl ester group Chemical group 0.000 description 1
- 125000004414 alkyl thio group Chemical group 0.000 description 1
- 125000002947 alkylene group Chemical group 0.000 description 1
- 125000000304 alkynyl group Chemical group 0.000 description 1
- IYABWNGZIDDRAK-UHFFFAOYSA-N allene Chemical group C=C=C IYABWNGZIDDRAK-UHFFFAOYSA-N 0.000 description 1
- 125000003368 amide group Chemical group 0.000 description 1
- 125000003710 aryl alkyl group Chemical group 0.000 description 1
- 150000001540 azides Chemical class 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- 229930188620 butyrolactone Natural products 0.000 description 1
- 125000002915 carbonyl group Chemical group [*:2]C([*:1])=O 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 239000013065 commercial product Substances 0.000 description 1
- 125000001995 cyclobutyl group Chemical group [H]C1([H])C([H])([H])C([H])(*)C1([H])[H] 0.000 description 1
- 125000000582 cycloheptyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])([H])C([H])(*)C([H])([H])C1([H])[H] 0.000 description 1
- OILAIQUEIWYQPH-UHFFFAOYSA-N cyclohexane-1,2-dione Chemical compound O=C1CCCCC1=O OILAIQUEIWYQPH-UHFFFAOYSA-N 0.000 description 1
- 125000000113 cyclohexyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])(*)C([H])([H])C1([H])[H] 0.000 description 1
- 125000000640 cyclooctyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])([H])C([H])(*)C([H])([H])C([H])([H])C1([H])[H] 0.000 description 1
- 125000001511 cyclopentyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])(*)C1([H])[H] 0.000 description 1
- 125000001559 cyclopropyl group Chemical group [H]C1([H])C([H])([H])C1([H])* 0.000 description 1
- 125000004855 decalinyl group Chemical group C1(CCCC2CCCCC12)* 0.000 description 1
- 125000002704 decyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- 239000011350 dental composite resin Substances 0.000 description 1
- 239000005548 dental material Substances 0.000 description 1
- 210000004262 dental pulp cavity Anatomy 0.000 description 1
- 230000001419 dependent effect Effects 0.000 description 1
- 238000011161 development Methods 0.000 description 1
- 230000018109 developmental process Effects 0.000 description 1
- 239000012955 diaryliodonium Substances 0.000 description 1
- 125000005520 diaryliodonium group Chemical group 0.000 description 1
- 150000005690 diesters Chemical class 0.000 description 1
- 125000003438 dodecyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- 150000002148 esters Chemical group 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 230000001747 exhibiting effect Effects 0.000 description 1
- 238000002474 experimental method Methods 0.000 description 1
- YEJRWHAVMIAJKC-UHFFFAOYSA-N gamma-butyrolactone Natural products O=C1CCCO1 YEJRWHAVMIAJKC-UHFFFAOYSA-N 0.000 description 1
- 229910052736 halogen Inorganic materials 0.000 description 1
- 150000002367 halogens Chemical class 0.000 description 1
- 150000002390 heteroarenes Chemical class 0.000 description 1
- 125000002768 hydroxyalkyl group Chemical group 0.000 description 1
- 125000001841 imino group Chemical group [H]N=* 0.000 description 1
- 238000011835 investigation Methods 0.000 description 1
- 125000000959 isobutyl group Chemical group [H]C([H])([H])C([H])(C([H])([H])[H])C([H])([H])* 0.000 description 1
- 125000001972 isopentyl group Chemical group [H]C([H])([H])C([H])(C([H])([H])[H])C([H])([H])C([H])([H])* 0.000 description 1
- 125000001449 isopropyl group Chemical group [H]C([H])([H])C([H])(*)C([H])([H])[H] 0.000 description 1
- 125000005641 methacryl group Chemical group 0.000 description 1
- FQPSGWSUVKBHSU-UHFFFAOYSA-N methacrylamide Chemical compound CC(=C)C(N)=O FQPSGWSUVKBHSU-UHFFFAOYSA-N 0.000 description 1
- 125000001421 myristyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 125000004108 n-butyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- 125000000740 n-pentyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- 125000004123 n-propyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- 125000001971 neopentyl group Chemical group [H]C([*])([H])C(C([H])([H])[H])(C([H])([H])[H])C([H])([H])[H] 0.000 description 1
- 125000002868 norbornyl group Chemical group C12(CCC(CC1)C2)* 0.000 description 1
- 125000001181 organosilyl group Chemical group [SiH3]* 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- NBIIXXVUZAFLBC-UHFFFAOYSA-K phosphate Chemical compound [O-]P([O-])([O-])=O NBIIXXVUZAFLBC-UHFFFAOYSA-K 0.000 description 1
- 235000021317 phosphate Nutrition 0.000 description 1
- 239000010452 phosphate Substances 0.000 description 1
- ACVYVLVWPXVTIT-UHFFFAOYSA-M phosphinate Chemical group [O-][PH2]=O ACVYVLVWPXVTIT-UHFFFAOYSA-M 0.000 description 1
- UEZVMMHDMIWARA-UHFFFAOYSA-M phosphonate Chemical group [O-]P(=O)=O UEZVMMHDMIWARA-UHFFFAOYSA-M 0.000 description 1
- 238000000016 photochemical curing Methods 0.000 description 1
- 229920000642 polymer Polymers 0.000 description 1
- 230000000379 polymerizing effect Effects 0.000 description 1
- 238000002360 preparation method Methods 0.000 description 1
- QQONPFPTGQHPMA-UHFFFAOYSA-N propylene Natural products CC=C QQONPFPTGQHPMA-UHFFFAOYSA-N 0.000 description 1
- 125000004805 propylene group Chemical group [H]C([H])([H])C([H])([*:1])C([H])([H])[*:2] 0.000 description 1
- PBMFSQRYOILNGV-UHFFFAOYSA-N pyridazine Chemical compound C1=CC=NN=C1 PBMFSQRYOILNGV-UHFFFAOYSA-N 0.000 description 1
- UMJSCPRVCHMLSP-UHFFFAOYSA-N pyridine Natural products COC1=CC=CN=C1 UMJSCPRVCHMLSP-UHFFFAOYSA-N 0.000 description 1
- 150000003839 salts Chemical class 0.000 description 1
- 239000000565 sealant Substances 0.000 description 1
- 125000002914 sec-butyl group Chemical group [H]C([H])([H])C([H])([H])C([H])(*)C([H])([H])[H] 0.000 description 1
- 230000035945 sensitivity Effects 0.000 description 1
- 238000001179 sorption measurement Methods 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 125000001424 substituent group Chemical group 0.000 description 1
- RWSOTUBLDIXVET-UHFFFAOYSA-O sulfonium Chemical compound [SH3+] RWSOTUBLDIXVET-UHFFFAOYSA-O 0.000 description 1
- 125000000472 sulfonyl group Chemical group *S(*)(=O)=O 0.000 description 1
- 229910052717 sulfur Inorganic materials 0.000 description 1
- 125000004434 sulfur atom Chemical group 0.000 description 1
- 229910021653 sulphate ion Inorganic materials 0.000 description 1
- 230000009897 systematic effect Effects 0.000 description 1
- 125000000999 tert-butyl group Chemical group [H]C([H])([H])C(*)(C([H])([H])[H])C([H])([H])[H] 0.000 description 1
- IOIHFHNPXJFODN-UHFFFAOYSA-M tetrakis(hydroxymethyl)phosphanium;hydroxide Chemical compound [OH-].OC[P+](CO)(CO)CO IOIHFHNPXJFODN-UHFFFAOYSA-M 0.000 description 1
- 229930192474 thiophene Natural products 0.000 description 1
- 125000005409 triarylsulfonium group Chemical group 0.000 description 1
- 150000003852 triazoles Chemical class 0.000 description 1
- 238000004383 yellowing Methods 0.000 description 1
- SXPUVBFQXJHYNS-UHFFFAOYSA-N α-furil Chemical compound C=1C=COC=1C(=O)C(=O)C1=CC=CO1 SXPUVBFQXJHYNS-UHFFFAOYSA-N 0.000 description 1
Classifications
-
- A—HUMAN NECESSITIES
- A61—MEDICAL OR VETERINARY SCIENCE; HYGIENE
- A61K—PREPARATIONS FOR MEDICAL, DENTAL OR TOILETRY PURPOSES
- A61K6/00—Preparations for dentistry
- A61K6/60—Preparations for dentistry comprising organic or organo-metallic additives
- A61K6/62—Photochemical radical initiators
-
- A—HUMAN NECESSITIES
- A61—MEDICAL OR VETERINARY SCIENCE; HYGIENE
- A61K—PREPARATIONS FOR MEDICAL, DENTAL OR TOILETRY PURPOSES
- A61K6/00—Preparations for dentistry
- A61K6/60—Preparations for dentistry comprising organic or organo-metallic additives
-
- A—HUMAN NECESSITIES
- A61—MEDICAL OR VETERINARY SCIENCE; HYGIENE
- A61K—PREPARATIONS FOR MEDICAL, DENTAL OR TOILETRY PURPOSES
- A61K6/00—Preparations for dentistry
- A61K6/80—Preparations for artificial teeth, for filling teeth or for capping teeth
- A61K6/884—Preparations for artificial teeth, for filling teeth or for capping teeth comprising natural or synthetic resins
- A61K6/887—Compounds obtained by reactions only involving carbon-to-carbon unsaturated bonds
-
- A—HUMAN NECESSITIES
- A61—MEDICAL OR VETERINARY SCIENCE; HYGIENE
- A61K—PREPARATIONS FOR MEDICAL, DENTAL OR TOILETRY PURPOSES
- A61K6/00—Preparations for dentistry
- A61K6/80—Preparations for artificial teeth, for filling teeth or for capping teeth
- A61K6/884—Preparations for artificial teeth, for filling teeth or for capping teeth comprising natural or synthetic resins
- A61K6/887—Compounds obtained by reactions only involving carbon-to-carbon unsaturated bonds
- A61K6/889—Polycarboxylate cements; Glass ionomer cements
Definitions
- the present invention relates to a dental composition
- a dental composition comprising at least one polymerizable monomer having at least one ethylenically unsaturated group and a radical initiator system, which comprises a photosensitizer having an ab- sorption maximum ranging from 400 nm to 800 nm and at least one CH- acidic compound as coinitiator.
- the restoration of teeth commonly involves a photocurable dental compo sition containing free radically polymerizable resins.
- Photocuring of a dental com- position involves a photoinitiator system generating free radicals upon exposure to visible light.
- photosensitizers such as camphorquinone (CQ) optionally in combination with a tertiary aromatic amine are frequently used as photoinitiator systems.
- a dental composition comprising an initiator system, which shall be at least substantially free, preferably completely free, of amines, especially of tertiary amines, more especially of tertiary aromatic amines.
- a dental composition comprising a radical initiator system containing a combination of a photosensitizer and at least one coinitiator being a CH-acidic compound, wherein such an inventive dental composition can reduce, or ideally avoid or eliminate, the leaching problems and the toxicological concerns of the commonly uses coin itiators based on tertiary aromatic amines, while improving the required biocom patibility simultaneously.
- the present invention accordingly provides a dental composition
- a dental composition comprising a) at least one polymerizable monomer having at least one ethyleni- cally unsaturated group; characterized in that the dental composition further comprises b) a radical initiator system comprising i. a photosensitizer having an absorption maximum ranging from 400 nm to 800 nm; and ii. at least one CH- acidic compound as coinitiator.
- the present invention provides a dental composition
- a dental composition comprising a radical initiator system, which is at least substantially free, preferably com pletely free, of amines, especially of tertiary amines, more especially of tertiary aromatic amines.
- the present invention provides new coinitiators for common pho tosensitizers, such as camphorquinone, in dental compositions, wherein the coin itiators are free of amines.
- a dental composition which comprises a radical initiator system containing a combination of a photosensitizer and at least one coinitiator being a CH-acidic compound, wherein such an inventive dental com position can reduce, or ideally avoid or eliminate, the leaching problems and the toxicological concerns of the commonly uses coinitiators based on tertiary aro matic amines, while improving the required biocompatibility simultaneously.
- the dental composition comprising at least one CH-acidic compound as coinitiator provides improved polymerization efficiency including a good conver- sion without posing leaching problems of aromatic amines.
- a coinitiator be ing a CH-acidic compound of the present invention is stable to strong acidic me dia and thereby suitable for dental application such as adhesives and self-etching preparations.
- Such coinitiators of the present invention when being incorporated into such a dental composition have low tendency towards discoloration while exhibiting good storage stability at the same time.
- FIG. 1 depicts photopolymerization profiles of methacrylate functions
- alkoxy group refers to a monoradi- cal branched or unbranched saturated hydrocarbon chain having from 1 to 18 carbon atoms, wherein at least one carbon atom of such an alkoxy group is sub stituted by one oxygen atom. Such an alkoxy group is attached by said at least one oxygen atom to a carbon atom of a chemical compound.
- This term can be exemplified by groups such as methoxy, ethoxy, and the like. That means the term “alkoxy group” is defined in the context of the present invention as any chem ist would understand it based on common chemical knowledge.
- aryl refers to C6-C10-membered aromatic, heterocyclic, fused aromatic, fused heterocyclic, biaromatic, or bihetereocyclic ring systems.
- aryl includes 5-, 6-, 7-, 8-, 9-, and 10-membered sin gle-ring aromatic groups that may include from zero to four heteroatoms, for ex ample, benzene, pyrrole, furan, thiophene, imidazole, oxazole, thiazole, triazole, pyrazole, pyridine, pyrazine, pyridazine, pyrimidine, and the like.
- aryl groups having heteroatoms in the ring structure may also be referred to as “het eroaryl” or “heterocycles” or “heteroaromatics”.
- the aromatic ring can be substi tuted at one or more ring positions with one or more substituents including, but not limited to, halogen, azide, alkyl, aralkyl, alkenyl, alkynyl, cycloalkyl, hydroxyl, alkoxyl, amino (or quaternized amino), nitro, sulfhydryl, imino, amido, phospho- nate, phosphinate, carbonyl, carboxyl, silyl, ether, alkylthio, sulfonyl, sulfonamido, ketone, aldehyde, ester, heterocyclyl, aromatic or heteroaromatic moieties, -- CF3, --CN, and combinations thereof.
- cycloalkyl refers to monocyclic or polycyclic cycloalkyl radical.
- monocyclic acycloakyl include cyclopropyl, cyclobutyl, cyclopentyl, cyclohexyl, cycloheptyl, and cyclooctyl.
- polycyclic cycloalkyl radical include, for example admantyl, norbornyl, decalinyl, 7,7-dimethyl-bicy- clo[2.2.1]heptanyl, tricyclo[5.2.1 02,6]decyl and the like.
- (meth)acrylate in the context of the present disclosure is meant to refer to the acrylate as well as to the corresponding methacrylate.
- (meth)acrylamide in the context of the present disclosure is meant to include acrylamide and methacrylamide.
- polymerizable monomer in the context of the present disclosure means any monomer capable of radical polymerization.
- the polymerizable mon- omer includes at least one ethylenically unsaturated groups.
- the at least one ethylenically unsaturated groups include vinyl, allyl, acryl, methacryl, and styryl.
- a polymerizable monomer having at least one ethylenically un saturated group and “ethylenically unsaturated monomers” may be used inter changeably.
- radiation initiator system in the context of the present disclosure means any system comprising a sensitizer and at least one coinitiator forming free radicals when activate by thermal or light and/or ambient redox conditions, whereby polymerization of polymerizable monomer is initiated.
- sensitizer in the context of the present disclosure which can absorb radiation of a wavelength in the range of 400 to 800 nm, when it is ex- posed but which cannot by itself, i.e. without the addition of coinitiators, form free radicals. Sensitizers used in the present disclosure have to be capable of inter acting with the coinitiators used in the present disclosure.
- the dental composition of the present disclosure comprises one or more polymerizable monomers having at least one ethylenically unsaturated group.
- Polymerizable monomers may be acrylates, methacrylates, ethylenically unsaturated compounds, carboxyl group-containing unsaturated monomers, C2- 8 hydroxyl alkyl esters of (meth)acrylic acid, C1-24 alkyl esters or cycloalkyl es ters of (meth)acrylic acid, C2-18 alkoxyalkyl esters of (meth)acrylic acid, olefins or diene compounds, monoesters/diesters, monoethers, adducts, vinyl monomer, styryl monomer, TPH resin, SDR Resin, PBA resins and/or BPA-free resins.
- the dental composition of the present disclosure includes a radical initiator system.
- the radical initiator system may include a photoinitiator.
- Suitable pho- toinitiators may be in the form of a binary or tertiary system.
- a binary system may include a photosensitizer and a CH-acidic compound as coinitiator.
- a tertiary sys tem may further include additionally an iodonium, sulfonium or phosphonium salt.
- CH-acidic com pound refers to an “a-CH-acidic compound”. This definition at the latest is clear understandable (s.a. general textbooks of organic chemistry like “Organikum”).
- Such CH-acidic compounds can comprise a further functionality, such as at least one ethylenically unsaturated group, which allows taking part in the polymerization process as the at least one polymerizable monomer.
- the at least one CH-acidic compound is a compound according to the following formula (I):
- R8, R9 a hydrogen, a C1 - C8 alkyl, or an acetyl moiety; preferably a hydrogen, a methyl, or an acetyl moiety; with the proviso that at least Rs or R9 is a hydrogen moiety.
- R11, R12 a hydrogen, a C1 - C8 alkyl, or a -CH2CH20C(0)C(CH3)CH2 moiety; preferably a hydrogen, a methyl, an ethyl or a -CH2CH20C(0)C(CH3)CH2 moiety;
- R7 a C1 - C8 alkoxy, a C1 - C8 alkyl, a hydroxy, a thiol, an amine, or a - 0CH2CH20C(0)C(CH3)CH2 moiety; preferably a methoxy, an ethoxy, a hydroxy, an amine, a methyl, or a -0CH2CH20C(0)C(CH3)CH2 moiety;
- the at least one CH-acidic compound is ethyl 2-methylaceto- acetate (HD-3), eth
- the at least one CH-acidic compound is a compound according to one of the following formulas (lla) and (llb): wherein
- R3, R4, R6 a hydrogen, a C1 - C8 alkyl, a carboxylic acid, an acetyl, or a - 0C(0)CHCH2 moiety; and more preferably wherein the at least one CH-acidic compound is a-acetyl- butyrolactone (HD-8) or (R)- a-acryloyloxy-b,b-dimethyl-y-butyrolactone (HD-9).
- HD-8 a-acetyl- butyrolactone
- HD-9 a-acryloyloxy-b,b-dimethyl-y-butyrolactone
- the additive is present in an amount of from 0.01 to 5 percent by weight based on the total weight of the dental com position.
- Such an iodonium compound can comprise the following Formula (C): wherein
- R21 and R22 are independent from each other, represent an organic moiety, and A- is an anion.
- the iodonium compound is di-(4-t- butylphenyl)-iodonium hexafluorophosphate, di(4-methylphenyl)iodonium (Me2- DPI) hexafluorophosphate, or Bis(4-tert-butylphenyl)iodonium p-toluenesul- fonate.
- the triaryl sulfonium salt may be S-(phenyl)thianthrenium hexafluorophos phate:
- the phosphonium salts of Formula (E) may be tetraalkyl phosphonium salts tetrakis-(hydroxymethyl)-phosphonium (THP) salt or a tetrakis-(hydroxyme- thyl)-phosphonium hydroxide (THPOH) salt, wherein the anion of the tetraalkyl phosphonium salt is selected from the group consisting of formate, acetate, phos phate, sulphate, fluoride, chloride, bromide and iodide.
- the at least one CH-acidic compound is present in an amount of from 0.01 to 5 percent by weight based on the total weight of the dental composition.
- the dental composition comprises a radical initiator system, which is at least substantially free, preferably completely free, of amines, especially of tertiary amines, more especially of tertiary aromatic amines.
- a radical initiator system which is at least substantially free, preferably completely free, of amines, especially of tertiary amines, more especially of tertiary aromatic amines.
- Example 1 Use of (R)-a-acyloyl-Y -butyrolactone (HD-8) as coinitiator for polymerization of TPH3 resin (a methacrylate resin)
- CQ/lactone (HD-8)/Speedcure 938 (0.5/3/1% w/w) under ex- posure to Smartlite Focus (300 mW.cm -2 ); sample thickness 1.4mm; under air. (as shown in FIG.1). It was observed that there is good reactivity of CQ/lactone (HD-8)/speedcure 938 in TPH3. It is similar to CQ/ DMABE, but amine free sys- tem.
- Example 3 Systematic investigation of a plurality of CH-acidic compounds in combination with CQ plus comparison to CQ alone and in com- bination with a tertiary amine (DMABE)
- CQ/HD-3/SC938 (0.5/3/1 % w/w) (3) CQ/HD-3/SC938 (0.5/3/1 % w/w) (4) CQ/HD-4/SC938 (0.5/3/1 % w/w) (5) CQ/HD-5/SC938 (0.5/3/1 % w/w) (6) CQ/HD-6/SC938
- (R)-a-acryloyloxy-b,b-dimethyl-y-butyrolactone (HD-9) was proposed as a new coinitiator in combination with camphorquinone.
- the polymer izations of TPH3 resin in presence of CQ/HD-9, CQ/HD-9/SC938 and CQ/DMABE/HD-9 as photoinitiating systems are shown in FIG. 4.
- the amine- free system CQ/HD-9/SC938 presents excellent polymerization performances similar to the reference comparative system CQ/DMABE.
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- Health & Medical Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Oral & Maxillofacial Surgery (AREA)
- Epidemiology (AREA)
- Animal Behavior & Ethology (AREA)
- General Health & Medical Sciences (AREA)
- Public Health (AREA)
- Veterinary Medicine (AREA)
- Biophysics (AREA)
- Plastic & Reconstructive Surgery (AREA)
- Dental Preparations (AREA)
Abstract
The present invention is related to a dental composition comprising at least one polymerizable monomer having at least one ethylenically unsaturated group; and a radical initiator system comprising a photosensitizer having an absorption maximum ranging from 400 nm to 800 nm; and at least one CH-acidic compound as coinitiator.
Description
DENTAL COMPOSITION
Field of the Invention
The present invention relates to a dental composition comprising at least one polymerizable monomer having at least one ethylenically unsaturated group and a radical initiator system, which comprises a photosensitizer having an ab- sorption maximum ranging from 400 nm to 800 nm and at least one CH- acidic compound as coinitiator.
Background of the Invention
The restoration of teeth commonly involves a photocurable dental compo sition containing free radically polymerizable resins. Photocuring of a dental com- position involves a photoinitiator system generating free radicals upon exposure to visible light. Conventionally, photosensitizers such as camphorquinone (CQ) optionally in combination with a tertiary aromatic amine are frequently used as photoinitiator systems.
However, the presence of amines in (meth)acrylate containing composi- tions can cause yellowing in the resulting photocured composition. Another dis advantage of the tertiary aromatic amine is their discoloration tendency and their sensitivity to strong acidic media. Furthermore, aromatic tertiary amines react with oxygen radicals. Thus, while beneficial on the one hand that its use avoids a sticky surface, on the other hand more aromatic amine is needed for initiation than the stoichiometric requirement with the respective photosensitizer such as CQ. Tertiary amines for use as coinitiators in dental compositions may leach out
of the cured composition which may give rise to toxicological concern. Especially, the toxicological concerns about tertiary aromatic amines requires the develop ment of new coinitiators for photosensitizers such as CQ in dental materials.
Objective of the present Invention In view of the prior art, it was thus an object of the present invention to provide a new dental composition comprising an initiator system, which shall not exhibit the aforementioned shortcomings of the known prior art dental composi tions.
In particular, it was an object of the present invention to provide a dental composition comprising an initiator system, which shall be at least substantially free, preferably completely free, of amines, especially of tertiary amines, more especially of tertiary aromatic amines.
What is needed therefore is a way to provide new coinitiators for common photosensitizers, such as camphorquinone, in dental compositions, wherein the coinitiators are free of amines.
Furthermore, it was an object of the present invention to provide a dental composition comprising a radical initiator system containing a combination of a photosensitizer and at least one coinitiator being a CH-acidic compound, wherein such an inventive dental composition can reduce, or ideally avoid or eliminate, the leaching problems and the toxicological concerns of the commonly uses coin itiators based on tertiary aromatic amines, while improving the required biocom patibility simultaneously.
Summary of the Invention
These objects and also further objects which are not stated explicitly but are immediately derivable or discernible from the connections discussed herein by way of introduction are achieved by a dental composition having all features
of claim 1. Appropriate modifications of the dental composition are protected in dependent claims 2 to 15.
The present invention accordingly provides a dental composition compris ing a) at least one polymerizable monomer having at least one ethyleni- cally unsaturated group; characterized in that the dental composition further comprises b) a radical initiator system comprising i. a photosensitizer having an absorption maximum ranging from 400 nm to 800 nm; and ii. at least one CH- acidic compound as coinitiator.
It is thus possible in an unforeseeable manner to provide a new dental composition comprising an initiator system, which does not exhibit the aforemen tioned shortcomings of the known prior art dental compositions.
In particular, the present invention provides a dental composition compris ing a radical initiator system, which is at least substantially free, preferably com pletely free, of amines, especially of tertiary amines, more especially of tertiary aromatic amines.
Thereby, the present invention provides new coinitiators for common pho tosensitizers, such as camphorquinone, in dental compositions, wherein the coin itiators are free of amines.
Furthermore, a dental composition is provided, which comprises a radical initiator system containing a combination of a photosensitizer and at least one coinitiator being a CH-acidic compound, wherein such an inventive dental com position can reduce, or ideally avoid or eliminate, the leaching problems and the
toxicological concerns of the commonly uses coinitiators based on tertiary aro matic amines, while improving the required biocompatibility simultaneously.
The dental composition comprising at least one CH-acidic compound as coinitiator provides improved polymerization efficiency including a good conver- sion without posing leaching problems of aromatic amines. Such a coinitiator be ing a CH-acidic compound of the present invention is stable to strong acidic me dia and thereby suitable for dental application such as adhesives and self-etching preparations. Such coinitiators of the present invention when being incorporated into such a dental composition have low tendency towards discoloration while exhibiting good storage stability at the same time.
The at least one coinitiator being a CH-acidic compound acts by initiat ing polymerization of one or more polymerizable monomers having at least one ethylenically unsaturated groups. The coinitiators of the present invention pro vide biocompatibility with reduced release of components when incorporated into such dental compositions.
Brief Description of the Figures
For a more complete understanding of the present invention, reference is made to the following Detailed Description of the Invention considered in con junction with the accompanying figures, in which: FIG. 1 depicts photopolymerization profiles of methacrylate functions
(TPH3) in presence of (1) CQ (0.5% wt) or (2) CQ/lactone (HD-8) (0.5/3% w/w) or (4) CQ/ DMABE (0.5/1% w/w) or (3) CQ/lactone (HD-8)/Speedcure 938 (0.5/3/1 % w/w) under exposure to Smartlite Focus (300 mW.cm-2); sample thick ness 1.4mm; under air. FIG. 2 depicts photopolymerization profiles of C=C double bonds
(PrimeBond Active) in presence of (1) CQ (1.5% w/w) or (2) CQ/Speedcure 938 (1.5/0.75 % w/w) or (3) CQ/acetylbutyrolactone (HD-8)/iodonium sulfonate (1.5/1.2/0.75 % w/w) or (4) CQ/acetylbutyrolactone (HD-8)/Speedcure938
(1.5/1.2/0.75 % w/w) or under exposure to SmartLite Focus (300mW.cm-2); sam ple thickness 17mm; under air.
FIG. 3 depicts photopolymerization profiles of methacrylate functions (TPH3) in presence of camphorquinone as photoinitiator (under air; thickness = 1.4 mm; SmartLite Focus 300 mW.cm-2): (1) CQ/HD-1/SC938 (0.5/3/1 % w/w) (2) CQ/HD-2/SC938 (0.5/3/1 % w/w) (3) CQ/HD-3/SC938 (0.5/3/1 % w/w) (4) CQ/HD-4/SC938 (0.5/3/1 % w/w) (5) CQ/HD-5/SC938 (0.5/3/1 % w/w) (6) CQ/HD-6/SC938 (0.5/3/1 % w/w) (7) CQ/HD-7/SC938 (0.5/3/1 % w/w) (8) CQ/HD-8/SC938 (0.5/3/1 % w/w) (9) CQ/HD-10/SC938 (0.5/3/1 % w/w) (10) CQ/DMABE (0.5/0.5 % w/w) (11) CQ (0.5% w/w). The irradiation starts for t = 5 s.
FIG. 4 represents photopolymerization profiles of methacrylate functions (TPH3) in presence of camphorquinone as photoinitiator (under air; thickness = 1.4 mm; SmartLite Focus 300 mW.cm-2): (1) CQ/TPH3 (0.5/100 % w/w) (2) CQ/HD-9/TPH3 (0.5/5/95 % w/w) (3) CQ/HD-9/SC938/TPH3 (0.5/5/1/100 % w/w) (4) CQ/DMABE/TPH3 (0.5/0.6/100 % w/w) (5) CQ/DMABE/HD-9/TPH3 (0.5/0.6/5/95 % w/w). The irradiation starts for t = 5 s.
Detailed Description of the Invention
The term “alkyl”, unless otherwise specified, refers to a monoradical branched or unbranched saturated hydrocarbon chain having from 1 to 18 carbon atoms. This term can be exemplified by groups such as methyl, ethyl, n-propyl, iso-propyl, n-butyl, iso-butyl, sec-butyl, t-butyl, n-pentyl, isopentyl, neopentyl, n- hexyl, n-decyl, dodecyl, tetradecyl, and the like.
The term “alkoxy group”, unless otherwise specified refers to a monoradi- cal branched or unbranched saturated hydrocarbon chain having from 1 to 18 carbon atoms, wherein at least one carbon atom of such an alkoxy group is sub stituted by one oxygen atom. Such an alkoxy group is attached by said at least one oxygen atom to a carbon atom of a chemical compound. This term can be
exemplified by groups such as methoxy, ethoxy, and the like. That means the term “alkoxy group” is defined in the context of the present invention as any chem ist would understand it based on common chemical knowledge.
The term “alkylene”, unless otherwise specified refers to a linear satu- rated divalent hydrocarbon radical of one to four carbon atoms or a branched sat urated divalent hydrocarbon radical of three to four carbon atoms, e.g., meth ylene, ethylene, 2,2-dimethylethylene, propylene, 2-methylpropylene, butylene and the like, preferably methylene, ethylene, or propylene.
The term “aryl” refers to C6-C10-membered aromatic, heterocyclic, fused aromatic, fused heterocyclic, biaromatic, or bihetereocyclic ring systems. Broadly defined, “aryl”, as used herein, includes 5-, 6-, 7-, 8-, 9-, and 10-membered sin gle-ring aromatic groups that may include from zero to four heteroatoms, for ex ample, benzene, pyrrole, furan, thiophene, imidazole, oxazole, thiazole, triazole, pyrazole, pyridine, pyrazine, pyridazine, pyrimidine, and the like. Those “aryl” groups having heteroatoms in the ring structure may also be referred to as “het eroaryl” or “heterocycles" or "heteroaromatics". The aromatic ring can be substi tuted at one or more ring positions with one or more substituents including, but not limited to, halogen, azide, alkyl, aralkyl, alkenyl, alkynyl, cycloalkyl, hydroxyl, alkoxyl, amino (or quaternized amino), nitro, sulfhydryl, imino, amido, phospho- nate, phosphinate, carbonyl, carboxyl, silyl, ether, alkylthio, sulfonyl, sulfonamido, ketone, aldehyde, ester, heterocyclyl, aromatic or heteroaromatic moieties, -- CF3, --CN, and combinations thereof.
The term “cycloalkyl” refers to monocyclic or polycyclic cycloalkyl radical. Examples of monocyclic acycloakyl include cyclopropyl, cyclobutyl, cyclopentyl, cyclohexyl, cycloheptyl, and cyclooctyl. Examples of polycyclic cycloalkyl radical include, for example admantyl, norbornyl, decalinyl, 7,7-dimethyl-bicy- clo[2.2.1]heptanyl, tricyclo[5.2.1 02,6]decyl and the like.
The term "(meth)acrylate" in the context of the present disclosure is meant to refer to the acrylate as well as to the corresponding methacrylate.
The term “(meth)acrylamide” in the context of the present disclosure is meant to include acrylamide and methacrylamide.
The term “polymerizable monomer” in the context of the present disclosure means any monomer capable of radical polymerization. The polymerizable mon- omer includes at least one ethylenically unsaturated groups. The at least one ethylenically unsaturated groups include vinyl, allyl, acryl, methacryl, and styryl.
The term “a polymerizable monomer having at least one ethylenically un saturated group” and “ethylenically unsaturated monomers” may be used inter changeably. The term “radical initiator system” in the context of the present disclosure means any system comprising a sensitizer and at least one coinitiator forming free radicals when activate by thermal or light and/or ambient redox conditions, whereby polymerization of polymerizable monomer is initiated.
The term “coinitiator” in the context of the present disclosure means a com- pound that does not essentially absorb when exposed with UV radiation or visible light but forms free radicals together with the sensitizers used according to the present disclosure.
The term “sensitizer” in the context of the present disclosure which can absorb radiation of a wavelength in the range of 400 to 800 nm, when it is ex- posed but which cannot by itself, i.e. without the addition of coinitiators, form free radicals. Sensitizers used in the present disclosure have to be capable of inter acting with the coinitiators used in the present disclosure.
The present disclosure relates to a dental composition. The dental com position is selected from a dental adhesive, a dental composite, a root canal filling composition, a dental sealant and a dental cement.
The dental composition of the present disclosure comprises one or more polymerizable monomers having at least one ethylenically unsaturated group.
Polymerizable monomers may be acrylates, methacrylates, ethylenically unsaturated compounds, carboxyl group-containing unsaturated monomers, C2- 8 hydroxyl alkyl esters of (meth)acrylic acid, C1-24 alkyl esters or cycloalkyl es ters of (meth)acrylic acid, C2-18 alkoxyalkyl esters of (meth)acrylic acid, olefins or diene compounds, monoesters/diesters, monoethers, adducts, vinyl monomer, styryl monomer, TPH resin, SDR Resin, PBA resins and/or BPA-free resins.
A radical initiator system
The dental composition of the present disclosure includes a radical initiator system. The radical initiator system may include a photoinitiator. Suitable pho- toinitiators may be in the form of a binary or tertiary system. A binary system may include a photosensitizer and a CH-acidic compound as coinitiator. A tertiary sys tem may further include additionally an iodonium, sulfonium or phosphonium salt.
In the context of the present invention, the expression “CH-acidic com pound” refers to an “a-CH-acidic compound”. This definition at the latest is clear understandable (s.a. general textbooks of organic chemistry like “Organikum”).
Such CH-acidic compounds can comprise a further functionality, such as at least one ethylenically unsaturated group, which allows taking part in the polymerization process as the at least one polymerizable monomer.
This can be an additional advantage of making use such specific coinitia- tors, which are not only suitable to replace toxic amine based coinitiators, but also offers the possibility of being incorporated into the growing polymerization chain.
In one embodiment, the at least one CH-acidic compound is a compound according to the following formula (I):
wherein
R7, R10 = a C1 - C8 alkoxy, a C1 - C8 alkyl, a hydroxy, a thiol, an amine, or a - 0CH2CH20C(0)C(CH3)CH2 moiety; preferably a methoxy, an ethoxy, a hydroxy, an amine, a methyl, or a -0CH2CH20C(0)C(CH3)CH2 moiety; and
R8, R9 = a hydrogen, a C1 - C8 alkyl, or an acetyl moiety; preferably a hydrogen, a methyl, or an acetyl moiety; with the proviso that at least Rs or R9 is a hydrogen moiety. In a preferred embodiment thereof, the at least one CH-acidic compound is a compound according to one of the following formulas (la) and (lb):
wherein Rs, R9 = a hydrogen, a C1 - C8 alkyl, or an acetyl moiety; preferably a hydrogen, a methyl, or an acetyl moiety; with the proviso that at least Rs or R9 is a hydrogen moiety; and
R11, R12 = a hydrogen, a C1 - C8 alkyl, or a -CH2CH20C(0)C(CH3)CH2 moiety; preferably a hydrogen, a methyl, an ethyl or a -CH2CH20C(0)C(CH3)CH2 moiety;
wherein
R7 = a C1 - C8 alkoxy, a C1 - C8 alkyl, a hydroxy, a thiol, an amine, or a - 0CH2CH20C(0)C(CH3)CH2 moiety; preferably a methoxy, an ethoxy, a hydroxy, an amine, a methyl, or a -0CH2CH20C(0)C(CH3)CH2 moiety;
R8, R9 = a hydrogen, a C1 - C8 alkyl, or an acetyl moiety; preferably a hydrogen, a methyl, or an acetyl moiety; with the proviso that at least Rs or R9 is a hydrogen moiety; and R12 = a hydrogen, a C1 - C8 alkyl, or a -CH2CH20C(0)C(CH3)CH2 moiety; pref erably a hydrogen, a methyl, an ethyl or a -CH2CH20C(0)C(CH3)CH2 moiety; preferably wherein the at least one CH-acidic compound is ethyl 2-methylaceto- acetate (HD-3), ethyl diacetoacetate (HD-5), or 2-(methacryloyloxy) ethyl aceto- acetate (HD-10). In one alternative embodiment, the at least one CH-acidic compound is a compound according to the following formula (II):
wherein
Ri3 = a hydrogen, a C1 - C8 alkyl, a carboxylic acid, an acetyl, or a - CH20C(0)C(CH3)CH2 moiety; wherein the C1 - C8 alkyl moiety can be substi tuted by at least a nitrile group, a hydroxy group, or a carboxylic acid group; preferably a methyl, a -CH2OH, a -COOH, a -CH2COOH, a -CH2CN, an acetyl, or a -CH20C(0)C(CH3)CH2 moiety.
In a preferred embodiment thereof, the at least one CH-acidic compound is a compound according to one of the following formulas (lla) and (llb):
wherein
Ri4 = a hydrogen, a C1 - C8 alkyl, or a hydroxy moiety; preferably a methyl or a hydroxy moiety.
wherein
Ri5 = a hydrogen, a hydroxy, a carboxylic acid, a nitrile, or a -0C(0)C(CH3)CH2 moiety.
In another alternative embodiment, the at least one CH-acidic compound is a compound according to the following formula (III):
wherein
R16 = a hydrogen, a C1 - C18 alkyl, or a C1 - C18 cycloalkyl moiety; wherein in the C1 - C8 alkyl or cycloalkyl moiety at least one carbon atom can be substituted by nitrogen; and wherein the C1 - C8 alkyl or cycloalkyl moiety can be substituted by at least a double bonded oxygen atom, an aromatic and/or an heteroaromatic group; preferably wherein the at least one CH-acidic compound is N-(diphenyl- methylene) glycine ethyl ester (HD-1), ethyl 2-oxocyclopentanecarboxylate (HD- 2), or ethyl 2-ethyl-2-methylacetoacetate (HD-4).
In another alternative embodiment, the at least one CH-acidic compound is a compound according to the following formula (IV):
wherein
Ri7, Ri8 = a hydrogen or a C1 - C8 alkyl moiety; preferably wherein the at least one CH-acidic compound is dimethyl 1,4-cyclo- hexanedione-2,5-dicarboxylate (HD-6).
In another alternative embodiment, the at least one CH-acidic compound is a compound according to the following formula (V):
wherein Ri9, R20 = a hydrogen or a C1 - C8 alkyl moiety; preferably wherein the at least one CH-acidic compound is dehydroacetic acid (HD-7).
In another alternative embodiment, the at least one CH-acidic compound is a compound according to the following formula (VI):
wherein
Ri, R2, R3, R4, R5, R6 = a hydrogen, a C1 - C8 alkyl, a carboxylic acid, an acetyl, or a -0C(0)CHCH2 moiety; with the proviso that at least R1, R2, R5, orR6, preferably R5 or R6, is a hydrogen moiety; preferably wherein the at least one CH-acidic compound is a compound accord- ing to the following formula (Via):
wherein
R3, R4, R6 = a hydrogen, a C1 - C8 alkyl, a carboxylic acid, an acetyl, or a - 0C(0)CHCH2 moiety; and more preferably wherein the at least one CH-acidic compound is a-acetyl- butyrolactone (HD-8) or (R)- a-acryloyloxy-b,b-dimethyl-y-butyrolactone (HD-9).
In formula (Via), Ri, R2, and Rs are a hydrogen moiety, respectively.
Conclusively, according to one embodiment of the present invention, the at least one CH-acidic compound is a compound according to one of the above- defined formulas (I), (la), (lb), (II), (lla), (llb), (III), (IV), (V), (VI), and (Via).
If more than one CH-acidic compound is comprised by the inventive radical initiator system, all comprised CH-acidic compounds can be compounds accord ing to the same formula (I), (la), (lb), (II), (lla), (llb), (III), (IV), (V), (VI), or (Via). Alternatively, if more than one CH-acidic compound is comprised by the inventive radical initiator system, each of the comprised CH-acidic compounds can be a compound according to a formula (I), (la), (lb), (II), (lla), (llb), (III), (IV),
(V), (VI), or (Via), wherein two CH-acidic compounds are never being compounds according to the same formula (I), (la), (lb), (II), (lla), (llb), (III), (IV), (V), (VI), or (Via).
As a further alternative, if more than one CH-acidic compound is com- prised by the inventive radical initiator system, at least two of the comprised CH- acidic compounds can be a compound according to the same formula (I), (la), (lb), (II), (I la), (llb), (III), (IV), (V), (VI), or (Via).
In one embodiment, the dental composition further comprises an additive selected from iodonium salts, phosphonium salts, and sulfonium salts; preferably wherein said additive is an iodonium salt.
In one preferred embodiment thereof, the additive is present in an amount of from 0.01 to 5 percent by weight based on the total weight of the dental com position.
Such an iodonium compound can comprise the following Formula (C):
wherein
R21 and R22 are independent from each other, represent an organic moiety, and A- is an anion.
In embodiments, iodonium compounds include diphenyliodonium (DPI) hexafluorophosphate, di(4-methylphenyl)iodonium (Me2-DPI) hexafluorophos- phate, di-(4-t-butylphenyl)-iodonium hexafluorophosphate , diaryliodonium hex- afluoroantimonate, (4-methylphenyl)[4-(2-methylpropyl) phenyl] iodonium hex- afluoroantimonate, (4-methylphenyl)[4-(2-methylpropyl)phenyl]iodonium hex afluorophosphate (Irgacure® 250, commercial product available from BASF SE), (4-methylphenyl)[4-(2-methylpropyl) phenyl] iodonium tetrafluoroborate, 4-oc- tyloxyphenyl phenyliodonium hexafluoroantimonate, 4-(2-
hydroxytetradecyloxyphenyl) phenyliodonium hexafluoroantimonate, and 4-iso- propyl-4'-methyldiphenyliodonium borate.
According to a further embodiments, the iodonium compound is di-(4-t- butylphenyl)-iodonium hexafluorophosphate, di(4-methylphenyl)iodonium (Me2- DPI) hexafluorophosphate, or Bis(4-tert-butylphenyl)iodonium p-toluenesul- fonate.
According to yet further embodiments, the photo initiator may include a sul- fonium compound of the following Formula (D):
wherein
R23, R24 and R25 are independent from each other, represent an organic moiety or wherein any two of R23, R24 and R25 form a cyclic structure together with the sulfur atom to which they are bound, and A- is an anion.
The triaryl sulfonium salt may be S-(phenyl)thianthrenium hexafluorophos phate:
According to a further embodiment, the photo initiator may include a phosphonium compound of the following Formula (E):
wherein
R26, R27, R28 and R29 are independent from each other, represent an organic moi ety, and
A- is an anion.
The phosphonium salts of Formula (E) may be tetraalkyl phosphonium salts tetrakis-(hydroxymethyl)-phosphonium (THP) salt or a tetrakis-(hydroxyme- thyl)-phosphonium hydroxide (THPOH) salt, wherein the anion of the tetraalkyl phosphonium salt is selected from the group consisting of formate, acetate, phos phate, sulphate, fluoride, chloride, bromide and iodide.
Other suitable photoinitiators for polymerizing free radically photopolymer- izable compositions may include the class of phosphine oxides that typically have a functional wavelength range of about 380 nm to about 1200 nm. Further suita ble phosphine oxide free radical initiators with a functional wavelength range of about 380 nm to about 450 nm are acyl and bisacyl phosphine oxides.
In one embodiment, the photosensitizer is a 1 , 2-diketone compound, pref erably wherein the photosensitizer is present in an amount of from 0.01 to 5 per cent by weight based on the total weight of the dental composition.
The alpha-diketone sensitizer compound may be selected from camphor- quinone, 1,2-diphenylethane-1,2-dione (benzil), 1 ,2-cyclohexanedione, 2,3-pen- tanedione, 2,3-hexanedione, 3,4-hexanedione, 2,3-heptanedione, 3,4-heptane- dione glyoxal, biacetyl, 3,3,6,6-tetramethylcyclohexanedione, 3,3,7,7-tetrame- thyl-1 ,2-cycloheptanedione, 3,3,8,8-tetramethyl-1 ,2-cyclooctanedione;
3,3,18,18-tetramethyl-1,2-cyclooctadecanedione; dipivaloyl; furil, hydroxybenzil, 2,3-butanedione, 2,3-octanedione, 4,5-octanedione, and 1 -phenyl-1 ,2-propane- dione.
In one embodiment, the radical initiator system is present in an amount of from 0.1 to 10 percent by weight based on the total weight of the dental compo sition.
In one embodiment, the at least one CH-acidic compound is present in an amount of from 0.01 to 5 percent by weight based on the total weight of the dental composition.
In one embodiment, the dental composition comprises a radical initiator system, which is at least substantially free, preferably completely free, of amines, especially of tertiary amines, more especially of tertiary aromatic amines. The present invention thus addresses the problem of providing an in ventive dental composition comprising an amended initiator system.
The following non-limiting examples are provided to illustrate an embodi ment of the present invention and to facilitate understanding of the invention but are not intended to limit the scope of the invention, which is defined by the claims appended hereto.
Compounds used in inventive and comparative experiments are given in the following:
Herein, “SC938” refers to “speedcure 938”.
Example 1: Use of (R)-a-acyloyl-Y -butyrolactone (HD-8) as coinitiator for polymerization of TPH3 resin (a methacrylate resin)
Photopolymerization profiles of methacrylate functions (TPH3) in presence of (1) CQ (0.5% wt) or (2) CQ/lactone (HD-8) (0.5/3% w/w) or (4) CQ/ DMABE
(0.5/1% w/w) or (3) CQ/lactone (HD-8)/Speedcure 938 (0.5/3/1% w/w) under ex- posure to Smartlite Focus (300 mW.cm-2 ); sample thickness 1.4mm; under air. (as shown in FIG.1). It was observed that there is good reactivity of CQ/lactone (HD-8)/speedcure 938 in TPH3. It is similar to CQ/ DMABE, but amine free sys- tem.
Herein, it is clearly demonstrated that the use of a CH-acidic coinitiator in combination with CQ is better performing than CQ alone. Furthermore, it is shown that CQ with the CH-acidic coinitiator and an iodonium compound in a ternary system is even still much better performing than the binary system of CQ with the respective identical CH-acidic coinitiator. The comparative example of CQ with the tertiary amine DMABE shows a similar performance than the inventive ternary system example. This proves that the present invention has successfully provided a suitable dental composition comprising an initiator system, which can deliver the same performance than the environmentally toxic commonly used initiator system of CQ in combination with a tertiary amine as coinitiator.
Example 2: Use of (R)-a-acyloyl-y-butyrolactone (HD-8) as coinitiator for polymerization of Prime & bond Active resin (a methacrylate resin)
Photopolymerization profiles of C=C double bonds (PrimeBond Active) in presence of (1 ) CQ (1.5% w/w) or (2) CQ/Speedcure 938 (1.5/0.75 % w/w) or (3) CQ/acetylbutyrolactone (HD-8)/ Bis(4-t-butylphenyl)iodonium p-toluenesulfonate (1.5/1.2/0.75 % w/w) or (4) CQ/acetylbutyrolactone (HD-8)/Speedcure938 (1.5/1.2/0.75 % w/w) or under exposure to SmartLite Focus (300mW.cm-2); sam ple thickness 17mm; under air (Figure 2).
It was observed that there is good reactivity of CQ/lactone(HD- 8)/speedcure 938 and CQ/lactone/iodoinium sulfonate in PBA. It is an amine free system. Slight tacky polymers were obtained.
Herein, it is clearly demonstrated that the performance of a ternary in- ventive initiator system of CQ in combination with a CH-acidic compound and an iodonium compound is better than either CQ alone or the combination of CQ with an iodonium ion. This proves that the suitable performance shown in Figure 1 is depending on the CH-acidic compound. A combination of an iodonium compound with CQ is not superior and does not represent an alternative. However, if addi- tionally used with CQ and a CH-acidic compound, the use of such an iodonium compound has shown to be senseful in order to further improve the performance of the binary system of CQ and the respective CH-acidic compound.
Example 3. Systematic investigation of a plurality of CH-acidic compounds in combination with CQ plus comparison to CQ alone and in com- bination with a tertiary amine (DMABE)
Photopolymerization profiles of methacrylate functions (TPH3) in presence of camphorquinone as photoinitiator (under air; thickness = 1.4 mm; SmartLite Focus 300 mW.cm-2): (1) CQ/HD-1/SC938 (0.5/3/1 % w/w) (2) CQ/HD-2/SC938
(0.5/3/1 % w/w) (3) CQ/HD-3/SC938 (0.5/3/1 % w/w) (4) CQ/HD-4/SC938 (0.5/3/1 % w/w) (5) CQ/HD-5/SC938 (0.5/3/1 % w/w) (6) CQ/HD-6/SC938
(0.5/3/1 % w/w) (7) CQ/HD-7/SC938 (0.5/3/1 % w/w) (8) CQ/HD-8/SC938
(0.5/3/1 % w/w) (9) CQ/HD-10/SC938 (0.5/3/1 % w/w) (10) CQ/DMABE (0.5/0.5 % w/w) (11 ) CQ (0.5% w/w). The irradiation starts for t = 5 s (as depicted in FIG. 3). New CH-acidic compounds (HD-1 to HD-10) were used as efficient co- initiators in combination with camphorquinone (CQ) for the free radical polymeri zation of methacrylates under air and under exposure to a blue dental LED (SmartLite Focus - Dentsply Sirona). Remarkably, they can be used in combina tion with CQ and an iodonium salt and these amine-free systems present
excellent polymerization performances, even in comparison to the current com parative reference systems CQ/DMABE and CQ alone. For example, the polymerizations of TPH3 resin (a methacrylate resin) in presence of CQ/CH- acidic compound/SC938 using 9 different CH-acidic compounds as coinitiator in the respectively investigated photoinitiating system are shown in Figure 3.
Herein, it is again proven that the performance of a ternary inventive initi ator system of CQ in combination with a CH-acidic compound and an iodonium compound is better than either CQ alone or at least similar to a combination of CQ with a commonly used tertiary amine (DMABE) as coinitiator. Example 4. Use of (R)-a-acryloyloxy-b,b-dimethyl-y-butyrolactone
(HD-9) as coinitiator
(R)-a-acryloyloxy-b,b-dimethyl-y-butyrolactone (HD-9) was proposed as a new coinitiator in combination with camphorquinone. For example, the polymer izations of TPH3 resin in presence of CQ/HD-9, CQ/HD-9/SC938 and CQ/DMABE/HD-9 as photoinitiating systems are shown in FIG. 4. The amine- free system CQ/HD-9/SC938 presents excellent polymerization performances similar to the reference comparative system CQ/DMABE.
Photopolymerization profiles of methacrylate functions (TPH3) in presence of camphorquinone as photoinitiator (under air; thickness = 1.4 mm; SmartLite Focus 300 mW.crrr2): (1 ) CQ/TPH3 (0.5/100 % w/w) (2) CQ/HD-9/TPH3 (0.5/5/95 % w/w) (3) CQ/HD-9/SC938/TPH3 (0.5/5/1/100 % w/w) (4) CQ/DMABE/TPH3 (0.5/0.6/100 % w/w). The irradiation starts for t = 5 s. (as depicted in FIG. 4).
While the principles of the invention have been explained in relation to cer tain embodiments, it is to be understood that various modifications thereof will become apparent to those skilled in the art upon reading the specification. There fore, it is to be understood that the invention disclosed herein is intended to cover such modifications as fall within the scope of the appended claims. The scope of the invention is limited only by the scope of the appended claims.
Claims
1. Dental composition comprising a) at least one polymerizable monomer having at least one ethyleni- cally unsaturated group; characterized in that the dental composition further comprises b) a radical initiator system comprising i. a photosensitizer having an absorption maximum ranging from 400 nm to 800 nm; and ii. at least one CH- acidic compound as coinitiator.
2. Dental composition according to claim 1 characterized in that the at least one CH-acidic compound is a compound according to the following for mula (I):
wherein
R7, R10 = a C1 - Csalkoxy, a C1 - C8 alkyl, a hydroxy, a thiol, an amine, or a -0CH2CH20C(0)C(CH3)CH2 moiety; preferably a methoxy, an ethoxy, a hydroxy, an amine, a methyl, or a -0CH2CH20C(0)C(CH3)CH2 moiety; and
R8, R9 = a hydrogen, a C1 - C8 alkyl, or an acetyl moiety; preferably a hydrogen, a methyl, or an acetyl moiety; with the proviso that at least Rs or R9 is a hydrogen moiety.
3 . Dental composition according to claim 2 characterized in that the at least one CH-acidic compound is a compound according to one of the following formulas (la) and (lb):
wherein
R8, R9 = a hydrogen, a C1 - C8 alkyl, or an acetyl moiety; preferably a hydrogen, a methyl, or an acetyl moiety; with the proviso that at least Rs or R9 is a hydrogen moiety; and R11, R12 = a hydrogen, a C1 - C8 alkyl, or a -CH2CH20C(0)C(CH3)CH2 moiety; preferably a hydrogen, a methyl, an ethyl or a - CH2CH20C(0)C(CH3)CH2 moiety;
wherein
R7 = a C1 - C8alkoxy, a C1 - C8 alkyl, a hydroxy, a thiol, an amine, or a - 0CH2CH20C(0)C(CH3)CH2 moiety; preferably a methoxy, an ethoxy, a hydroxy, an amine, a methyl, or a -0CH2CH20C(0)C(CH3)CH2 moiety;
R8 R9 = a hydrogen, a C1 - C8 alkyl, or an acetyl moiety; preferably a hydrogen, a methyl, or an acetyl moiety; with the proviso that at least Rs or R9 is a hydrogen moiety; and
R12 = a hydrogen, a C1 - C8 alkyl, or a -CH2CH20C(0)C(CH3)CH2 moiety; preferably a hydrogen, a methyl, an ethyl or a -CH2CH20C(0)C(CH3)CH2 moiety; preferably wherein the at least one CH-acidic compound is ethyl 2- methylacetoacetate (HD-3), ethyl diacetoacetate (HD-5), or 2-(methacry- loyloxy)ethyl acetoacetate (HD-10).
4. Dental composition according to claim 1 characterized in that the at least one CH-acidic compound is a compound according to the following for mula (II):
wherein
Ri 3 — a hydrogen, a C1 - C8 alkyl, a carboxylic acid, an acetyl, or a - CH20C(0)C(CH3)CH2 moiety; wherein the C1 - C8 alkyl moiety can be substituted by at least a nitrile group, a hydroxy group, or a carboxylic acid group; preferably a methyl, a -CH2OH, a -COOH, a -CH2COOH, a -CH2CN, an acetyl, or a -CH20C(0)C(CH3)CH2 moiety.
5 . Dental composition according to claim 4 characterized in that the at least one CH-acidic compound is a compound according to one of the following formulas (lla) and (llb):
wherein
R14 = a hydrogen, a C1 - C8 alkyl, or a hydroxy moiety; preferably a methyl or a hydroxy moiety.
wherein
R15 — a hydrogen, a hydroxy, a carboxylic acid, a nitrile, or a - 0C(0)C(CH3)CH2 moiety.
6. Dental composition according to claim 1 characterized in that the at least one CH-acidic compound is a compound according to the following for mula (III):
wherein
Ri6 = a hydrogen, a Ci - Ci8 alkyl, or a C1 - C18 cycloalkyl moiety; wherein in the C1 - C8 alkyl or cycloalkyl moiety at least one carbon atom can be substituted by nitrogen; and wherein the C1 - C8 alkyl or cycloalkyl moiety can be substituted by at least a double bonded oxygen atom, an aromatic and/or an heteroaromatic group; preferably wherein the at least one CH-acidic compound is N-(diphenyl- methylene) glycine ethyl ester (HD-1), ethyl 2-oxocyclopentanecarbox- ylate (HD-2), or ethyl 2-ethyl-2-methylacetoacetate (HD-4).
7. Dental composition according to claim 1 characterized in that the at least one CH-acidic compound is a compound according to the following for mula (IV):
wherein
Ri 7, Ri8 = a hydrogen or a C1 - C8 alkyl moiety;
preferably wherein the at least one CH-acidic compound is dimethyl 1,4- cyclohexanedione-2,5-dicarboxylate (HD-6).
8. Dental composition according to claim 1 characterized in that the at least one CH-acidic compound is a compound according to the following for- mula (V):
wherein Ri 9, R20 = a hydrogen or a C1 - C8 alkyl moiety; preferably wherein the at least one CH-acidic compound is dehydroacetic acid (HD-7).
9. Dental composition according to claim 1 characterized in that the at least one CH-acidic compound is a compound according to the following for- mula (VI):
wherein
Ri, R2, R3, R4, R5, R6 = a hydrogen, a C1 - C8 alkyl, a carboxylic acid, an acetyl, or a -0C(0)CHCH2 moiety; with the proviso that at least R1, R2, R5, orR6, preferably Rs or R6, is a hydrogen moiety; preferably wherein the at least one CH-acidic compound is a compound according to the following formula (Via):
wherein
R3, R4, R6 = a hydrogen, a C1 - C8 alkyl, a carboxylic acid, an acetyl, or a - 0C(0)CHCH2 moiety; and more preferably wherein the at least one CH-acidic compound is a- acetylbutyrolactone (HD-8) or (R)- a-acryloyloxy-b,b-dimethyl-y-butyrolac- tone (HD-9).
10. Dental composition according to one of the preceding claims characterized in that the dental composition further comprises an additive selected from iodonium salts, phosphonium salts, and sulfonium salts; preferably wherein said additive is an iodonium salt.
11. Dental composition according to claim 10 characterized in that the additive is present in an amount of from 0.01 to 5 percent by weight based on the total weight of the dental composition.
12. Dental composition according to one of the preceding claims characterized in that the photosensitizer is a 1 , 2-diketone compound, preferably wherein
the photosensitizer is present in an amount of from 0.01 to 5 percent by weight based on the total weight of the dental composition.
13. Dental composition according to one of the preceding claims characterized in that the radical initiator system is present in an amount of from 0.1 to 10 percent by weight based on the total weight of the dental composition.
14. Dental composition according to one of the preceding claims characterized in that the at least one CH-acidic compound is present in an amount of from 0.01 to 5 percent by weight based on the total weight of the dental composition.
15. Dental composition according to one of the preceding claims characterized in that the dental composition comprises a radical initiator system, which is at least substantially free, preferably completely free, of amines, espe cially of tertiary amines, more especially of tertiary aromatic amines.
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| EP19194736.5A EP3785692A1 (en) | 2019-08-30 | 2019-08-30 | Dental composition |
| PCT/EP2020/025386 WO2021037396A1 (en) | 2019-08-30 | 2020-08-28 | Dental composition |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| EP4021373A1 true EP4021373A1 (en) | 2022-07-06 |
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| EP19194736.5A Withdrawn EP3785692A1 (en) | 2019-08-30 | 2019-08-30 | Dental composition |
| EP20800548.8A Pending EP4021373A1 (en) | 2019-08-30 | 2020-08-28 | Dental composition |
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| Application Number | Title | Priority Date | Filing Date |
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| EP19194736.5A Withdrawn EP3785692A1 (en) | 2019-08-30 | 2019-08-30 | Dental composition |
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| Country | Link |
|---|---|
| US (1) | US12303574B2 (en) |
| EP (2) | EP3785692A1 (en) |
| JP (1) | JP7645872B2 (en) |
| CN (1) | CN114449989B (en) |
| AU (1) | AU2020339216B2 (en) |
| CA (1) | CA3152214A1 (en) |
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| EP3785692A1 (en) | 2019-08-30 | 2021-03-03 | DENTSPLY SIRONA Inc. | Dental composition |
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|---|---|---|---|---|
| US4411625A (en) * | 1980-08-29 | 1983-10-25 | Dentsply Research & Development Corp. | Broad spectrum light curable dental compositions |
| JPH092915A (en) | 1995-06-22 | 1997-01-07 | Terumo Corp | Adhesive for dental treatment |
| DE60312714T2 (en) | 2003-12-23 | 2007-12-06 | Dentsply Detrey Gmbh | Self-etching, self-priming, one-component dental adhesive composition |
| EP1872767A1 (en) | 2006-06-30 | 2008-01-02 | Ernst Mühlbauer GmbH & Co.KG | Polymérisable dental material |
| DE102010046697A1 (en) | 2010-09-28 | 2012-03-29 | Kettenbach Gmbh & Co. Kg | Polymerizable dental material with reactive paste former, cured dental material and their use |
| CA2997657C (en) * | 2015-10-08 | 2023-01-24 | Dentsply Detrey Gmbh | Polymerization initiator system and use thereof for preparation of a dental composition |
| EP3246001B1 (en) | 2016-05-19 | 2023-03-29 | DENTSPLY DETREY GmbH | Dental composition |
| JP6629090B2 (en) * | 2016-02-12 | 2020-01-15 | 株式会社トクヤマデンタル | Powder-liquid type dental hardening material |
| JP6868767B2 (en) | 2017-08-08 | 2021-05-12 | パナソニックIpマネジメント株式会社 | dishwasher |
| WO2020031897A1 (en) | 2018-08-09 | 2020-02-13 | 三井化学株式会社 | Polymerization initiator, curable composition, dental material, and preparation kit for curable composition |
| EP3785692A1 (en) | 2019-08-30 | 2021-03-03 | DENTSPLY SIRONA Inc. | Dental composition |
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2019
- 2019-08-30 EP EP19194736.5A patent/EP3785692A1/en not_active Withdrawn
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2020
- 2020-08-28 WO PCT/EP2020/025386 patent/WO2021037396A1/en not_active Ceased
- 2020-08-28 CN CN202080066392.5A patent/CN114449989B/en active Active
- 2020-08-28 EP EP20800548.8A patent/EP4021373A1/en active Pending
- 2020-08-28 CA CA3152214A patent/CA3152214A1/en active Pending
- 2020-08-28 AU AU2020339216A patent/AU2020339216B2/en active Active
- 2020-08-28 US US17/638,474 patent/US12303574B2/en active Active
- 2020-08-28 JP JP2022513669A patent/JP7645872B2/en active Active
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| WO2021037396A1 (en) | 2021-03-04 |
| CA3152214A1 (en) | 2021-03-04 |
| JP2022546105A (en) | 2022-11-02 |
| AU2020339216B2 (en) | 2026-02-19 |
| CN114449989B (en) | 2024-10-15 |
| US12303574B2 (en) | 2025-05-20 |
| EP3785692A1 (en) | 2021-03-03 |
| CN114449989A (en) | 2022-05-06 |
| JP7645872B2 (en) | 2025-03-14 |
| AU2020339216A1 (en) | 2022-03-17 |
| US20230000727A1 (en) | 2023-01-05 |
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