EP3874259A1 - Chemically sensitive sensor comprising micro-barrier and method of fabrication thereof - Google Patents
Chemically sensitive sensor comprising micro-barrier and method of fabrication thereofInfo
- Publication number
- EP3874259A1 EP3874259A1 EP19880733.1A EP19880733A EP3874259A1 EP 3874259 A1 EP3874259 A1 EP 3874259A1 EP 19880733 A EP19880733 A EP 19880733A EP 3874259 A1 EP3874259 A1 EP 3874259A1
- Authority
- EP
- European Patent Office
- Prior art keywords
- micro
- barrier
- sensitive sensor
- chemically sensitive
- substrate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N27/00—Investigating or analysing materials by the use of electric, electrochemical, or magnetic means
- G01N27/02—Investigating or analysing materials by the use of electric, electrochemical, or magnetic means by investigating impedance
- G01N27/04—Investigating or analysing materials by the use of electric, electrochemical, or magnetic means by investigating impedance by investigating resistance
- G01N27/12—Investigating or analysing materials by the use of electric, electrochemical, or magnetic means by investigating impedance by investigating resistance of a solid body in dependence upon absorption of a fluid; of a solid body in dependence upon reaction with a fluid, for detecting components in the fluid
- G01N27/125—Composition of the body, e.g. the composition of its sensitive layer
- G01N27/127—Composition of the body, e.g. the composition of its sensitive layer comprising nanoparticles
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- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01G—COMPOUNDS CONTAINING METALS NOT COVERED BY SUBCLASSES C01D OR C01F
- C01G7/00—Compounds of gold
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N33/00—Investigating or analysing materials by specific methods not covered by groups G01N1/00 - G01N31/00
- G01N33/0004—Gaseous mixtures, e.g. polluted air
- G01N33/0009—General constructional details of gas analysers, e.g. portable test equipment
- G01N33/0027—General constructional details of gas analysers, e.g. portable test equipment concerning the detector
- G01N33/0036—General constructional details of gas analysers, e.g. portable test equipment concerning the detector specially adapted to detect a particular component
- G01N33/0047—Organic compounds
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
- G03F7/0382—Macromolecular compounds which are rendered insoluble or differentially wettable the macromolecular compound being present in a chemically amplified negative photoresist composition
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
- G03F7/2002—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image
- G03F7/2004—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image characterised by the use of a particular light source, e.g. fluorescent lamps or deep UV light
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
- G03F7/30—Imagewise removal using liquid means
- G03F7/32—Liquid compositions therefor, e.g. developers
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y35/00—Methods or apparatus for measurement or analysis of nanostructures
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y40/00—Manufacture or treatment of nanostructures
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- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
- C01P2004/00—Particle morphology
- C01P2004/01—Particle morphology depicted by an image
- C01P2004/04—Particle morphology depicted by an image obtained by TEM, STEM, STM or AFM
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- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
- C01P2004/00—Particle morphology
- C01P2004/60—Particles characterised by their size
- C01P2004/64—Nanometer sized, i.e. from 1-100 nanometer
Definitions
- the present invention relates to a chemically sensitive sensor for detecting volatile organic compounds, the sensor comprising a micro-barrier and a sensing layer based on organically capped metallic nanoparticles.
- the invention further provides a method for the fabrication of the chemically sensitive sensor.
- Chemically sensitive sensors can be employed in various applications, such as medical diagnosing, process-control and environmental-monitoring, due to their ability to detect various volatile organic compounds (VOCs).
- Chemically sensitive sensors are usually fabricated using conductive or semi-conductive materials, which are often based on metal nanoparticles (MNPs).
- MNPs metal nanoparticles
- Such sensors can contain a chemically sensitive semiconductor thin film formed by depositing a suspension comprising organically- modified MNPs and a suitable solvent onto planar microelectrodes.
- the electrodes are typically micro-fabricated in clean room facilities by photolithography, spattering or evaporation of noble metals, such as, for example, gold or platinum, or some transition metals, including, inter alia, titanium, and followed by lift-off process.
- the electrodes can have an interdigitated design.
- the electrodes within the interdigitated array are typically separated by a few micrometer distances and are supported by an insulation layer, such as Si or Si0 2 (Wohltjen et al., IEEE Trans. Electron Devices., 1985, 32: 1170-1174).
- U.S. Patent No. 7,189,360 is directed to a circular chemiresistor for use in microchemical sensors.
- a pair of electrodes is fabricated on an electrically insulating substrate.
- the pattern of electrodes is arranged in a circle-filling geometry, such as a concentric, dual-track spiral design, or a circular interdigitated design.
- a drop of a chemically sensitive polymer i.e., chemiresistive ink
- This circularly-shaped electrode geometry maximizes the contact area between the pair of electrodes and the polymer deposit, which provides a lower and more stable baseline resistance than with linear-trace designs.
- Organically-modified MNPs suspension can be applied onto the electrodes by different techniques including, for example, drop-casting, layer-by-layer dipping, spin coating, and spraying.
- an inkjet-printing technique was developed, which is more precise that the previously used methods.
- inkj et-printing technology is based on thermal or piezoelectric heads, which generate droplets in small (from pL to nL) volume of ink.
- inkjet-printers use the MNPs suspension as the ink. Inkjet-printing is similar to drop casting, where the MNPs suspension is physically deposited onto the electrode spaces, while affording for significantly smaller and accurate drop size and precise ink deposition in predefined location on the substrate and/or the electrodes.
- the organically-modified MNPs film adopts an irregular morphology, such as, for example, non-uniform thickness of the sensing layer, which has a strong influence on sensor’s response.
- irregular morphology of deposited particulate suspensions is termed“coffee ring”, which can be observed as a narrow band of the particles deposited along the drop perimeter (also termed herein“contact line”), wherein the concentration of the particles in said band is significantly higher than in the central portion of the drop.
- Morphological abnormalities of the deposited drop are believed to occur due to different attraction and repulsion forces acting on the particulate matter within the drop deposited onto a solid surface during solvent evaporation, said forces creating irregular movements of matter within the drying drop.
- the emergence of coffee rings is speculated to be the result of the capillary flow induced by the differential evaporation rates across the drop, wherein the liquid evaporating from the edge is replenished by the liquid from the interior of the drop.
- the outward flow in a drying drop of liquid is produced when the contact line is pinned to the underlying surface.
- the resulting outward flow can carry nearly all the dispersed material to the contact line and thus accounts for the strong perimeter concentration of the dried drops.
- Marangoni effect results from the concentration gradient throughout the drop or the evaporation-induced nonuniform cooling along the surface of the drying drop, which produces a temperature gradient.
- concentration and/or temperature gradient leads to a surface-tension gradient along the droplet free surface. This surface-tension gradient, finally, induces a Marangoni (i.e.,.
- NPs gold nanoparticles
- the present invention provides a chemically sensitive sensor for detecting VOCs.
- the sensor comprises a substrate, an electrode array, a micro-barrier and a sensing layer.
- the sensing layer is formed of a core-shell material comprising metal nanoparticle cores capped by a shell of organic ligands.
- the micro-barrier surrounds the electrode array and the sensing layer, therefore defining the shape and the area of said layer.
- a method of fabrication of said chemically sensitive sensor wherein the addition of the micro- barrier can be implemented by a simple and readily-available process, such as for example, photolithography.
- the invention is based in part on the unexpected finding that chemically sensitive sensors comprising a MNPs-based sensing layer, which is confined by a micro-barrier, provide highly uniform responses when exposed to VOCs. It was not previously realized that a physical micro-barrier surrounding the deposited nanoparticles’ dispersion can decrease the extent of coffee ring formation, hinder evolution of the overall morphological irregularities of the sensing layer and increase functional reproducibility of the sensors. Increased reproducibility of the sensor response can further be induced by fine-tuning of the physical parameters and the material of the micro-barrier.
- the inventors have surprisingly found that using hydrophobic material for the formation of the micro-barrier significantly enhances sensor response reproducibility as compared to the sensors which do not include a micro-barrier and sensors with micro-barriers made of a hydrophilic material. Furthermore, the volume of the deposited MNPs suspension can be adjusted such that the drop height is aligned with the micro-barrier height, to further control uniformity of the sensing layer. Additionally, a combination of the hydrophobic micro-barrier with a hydrophilic substrate, which underlays the electrode array, provided the lowest variance of the sensors’ responses.
- the present invention provides a chemically sensitive sensor for detecting volatile organic compounds (VOCs), the sensor comprising: a substantially planar substrate having a top surface and a bottom surface, the substrate made of an electrically insulating material; an electrode array being disposed on the top surface of said substrate; a micro-barrier comprising an inner face and an outer face and being disposed on the top surface of the substrate and surrounding the electrode array; and a sensing layer comprising a multiplicity of core-shell particles in close-packed orientation, the particles comprising a metal nanoparticle (MNP) core and an organic ligand shell, wherein the MNP core has a mean particle size below about 15 nm, the sensing layer is in electric contact with said electrode array, and the shape of said sensing layer is confined by the micro-barrier.
- MNP metal nanoparticle
- said micro-barrier is made of a hydrophobic material.
- the sensing layer is hydrophobic.
- the micro-barrier can have s cross-sectional shape selected from the group consisting of circular, oval, square, rectangular, triangular, hexagonal, and polygon shape. Each possibility represents a separate embodiment of the invention.
- said micro-barrier has a height ranging from about 1 pm to about 20 pm. According to further embodiments, the micro-barrier has a height ranging from about 2 pm to about 5 pm. According to additional embodiments, said micro- barrier has a thickness ranging from about 10 pm to about 500 pm. According to some embodiments, the micro-barrier has an inner perimeter ranging from about 0.2 mm to about 15 mm. According to further embodiments, said micro-barrier has a circular cross-sectional shape with an inner diameter ranging from about 0.2 mm to about 5 mm. According to yet further embodiments, the inner face of the micro-barrier is substantially orthogonal to the top surface of the substrate. According to still further embodiments, said inner face is substantially smooth.
- the micro-barrier is made of an electrically insulating material. According to additional embodiments, said micro-barrier is made of an epoxy-based photoresist. According to some exemplary embodiments, the epoxy-based photoresist is SU-8.
- said MNP core has a mean particle size ranging from about 1.5 nm to about 5 nm.
- the organic ligand shell has a thickness ranging from about 1.2 nm to about 7 nm.
- Said core-shell particles can be arranged in a film configuration.
- the MNP core can comprise a metal selected from the group consisting of Au, Pt, Ag, Ni, Co, Pd, Cu, Al, Zn, Fe, and combinations thereof.
- said MNP core comprises a metal alloy selected from the group consisting of Au/Pt, Au/Ag, Au/Cu, Au/Ag/Cu, Au/Pd, Au/Ag/Cu/Pd, Pt/Rh, Ni/Co, and Pt/Ni/Fe.
- the MNP core comprises Au.
- the organic ligand can be selected from the group consisting of alkylthiols, arylthiols, alkylarylthiols, alkylthiolates, w-functionalized alkanethiolates, arenethiolates, (g-m ercaptopropy 1 )tri - ethy 1 oxy si 1 ane, dialkyl disulfides and combinations and derivatives thereof.
- the ligand is selected from the group consisting of dodecanethiol, 2-ethylhexanethiol, decanethiol, hexanethiol, dibutyl disulfide, 4-tert methylbenzenethiol, l-heptanethiol, butanethiol, benzylmercaptan, 3 -ethoxy tiophenol, tert- dodecanethiol and combinations thereof.
- the ligand is selected from dodecanethiol and 2-ethylhexanethiol. Each possibility represents a separate embodiment of the invention.
- the sensing layer has a substantially uniform thickness throughout its entire area.
- said sensing layer is essentially devoid of a polymer.
- the substrate is made of the electrically insulating material selected from the group consisting of silicon, silicon dioxide, quartz, glass, ceramic, plastic, Teflon, Kapton, and combinations thereof. Each possibility represents a separate embodiment of the invention. According to additional embodiments, said substrate is made of the electrically insulating material which is hydrophilic.
- the electrode array comprises a plurality of interdigitated electrodes.
- the electrodes are made of a material selected from the group consisting of Au, Pt, Ti, Cu, Ag, Pd, Ni, Al, and alloys and combinations thereof. Each possibility represents a separate embodiment of the invention.
- the chemically sensitive sensor comprises a plurality of electrode arrays, micro-barriers and sensing layers disposed on the top surface of the substrate.
- the present invention provides a method for fabricating a chemically sensitive sensor for detecting volatile VOCs, the method comprising the steps of:
- a substantially planar substrate having a top surface and a bottom surface, the substrate being made of an electrically insulating material
- a micro-barrier on the top surface of the substrate, wherein the micro-barrier surrounds the electrode array; and iv. forming a sensing layer comprising a multiplicity of core-shell particles in close- packed orientation, the particles comprising a metal nanoparticle (MNP) core and an organic ligand shell, wherein the MNP core has a mean particle size below about 15 nm, the sensing layer is in electric contact with the electrode array, and the shape of the sensing layer is confined by said micro-barrier.
- MNP metal nanoparticle
- the micro-barrier is made of a hydrophobic material.
- the step of forming the micro barrier is performed by a photolithography process comprising applying a negative photoresist to the substrate and the electrode array, disposing a mask with a predefined pattern on the negative photoresist, exposing the negative photoresist to ultraviolet (UV) irradiation, and developing the remaining negative photoresist.
- the negative photoresist comprises an epoxy-based photoresist.
- the negative photoresist is applied to the substrate and the electrode array by spinning at a rate ranging from about 200 rpm to about 5000 rpm. According to still further embodiments, the spinning is performed for about 5 to about 120 seconds.
- the mask has a ring-shaped opening in a shape selected from the group consisting of circular, oval, square, rectangular, triangular, hexagonal, and polygon ring shape.
- the photolithography process does not include a step of photoresist lift off.
- the step of forming a sensing layer comprises applying a dispersion comprising the core-shell particles and a solvent onto the top surface of the substrate and/or the electrode array within the micro-barrier.
- the dispersion is hydrophobic.
- the dispersion can be applied by a process selected from inkjet-printing and drop-casting. Each possibility represents a separate embodiment of the invention.
- the dispersion is applied by inkjet-printing.
- the dispersion is applied in a volume ranging from about 5nL to about l50nL.
- said dispersion is applied in a volume which forms a drop, having essentially same height as the height of the micro-barrier.
- the MNP core of the core-shell particles comprises a metal selected from the group consisting of Au, Pt, Ag, Ni, Co, Pd, Cu, Al, Zn, Fe, and combinations thereof.
- the MNP core comprises a metal alloy selected from the group consisting of Au/Pt, Au/Ag, Au/Cu, Au/Ag/Cu, Au/Pd, Au/Ag/Cu/Pd, Pt/Rh, Ni/Co, and Pt/Ni/Fe.
- said MNP core comprises Au.
- the organic ligand of the core-shell particles is selected from the group consisting of alkylthiols, arylthiols, alkylarylthiols, alkylthiolates, w-functionalized alkanethiolates, arenethiolates, (Y-mercaptopropyl)tri-methyloxysilane, dialkyl disulfides and combinations and derivatives thereof.
- the organic ligand is selected from the group consisting of dodecanethiol, 2- ethylhexanethiol, decan ethiol, hexanethiol, dibutyl disulfide, 4-tert methylbenzenethiol, 1- heptanethiol, butanethiol, benzylmercaptan, 3 -ethoxy tiophenol, tert-dodecan ethiol and combinations thereof.
- the organic ligand is selected dodecanethiol and 2-ethylhexanethiol. Each possibility represents a separate embodiment of the invention.
- the solvent of the dispersion can be selected from the group consisting of toluene, 2-pentatone, ethanol and combinations thereof. Each possibility represents a separate embodiment of the invention.
- FIG. 1A Schematic side view representation of a sensor comprising a circular micro-barrier, prior to the formation of the sensing layer.
- Figure IB Schematic top view representation of a sensor comprising a circular micro-barrier, prior to the formation of the sensing layer.
- Figure 2A Schematic side view representation of a sensor comprising a rectangular micro-barrier, prior to the formation of the sensing layer.
- Figure 2B Schematic top view representation of a sensor comprising a rectangular micro-barrier, prior to the formation of the sensing layer.
- Figure 3 Schematic top view representation of a sensor comprising a circular micro- barrier and a sensing layer.
- Figure 4 Schematic top view representation of a sensor comprising a rectangular micro-barrier and a sensing layer.
- Figure 5 Schematic illustration of epoxy-based micro-barrier preparation process.
- Figure 6 Schematic illustration of a sensor device comprising eight sensing layers disposed within corresponding micro-barriers and a resistor for temperature control.
- Figure 7A Transmission-electron microscopy (TEM) image of dodecanethiol- capped Au nanoparticles (NPs) dispersion.
- TEM Transmission-electron microscopy
- Figure 7B TEM image of 2-ethylhexaethiol-capped Au NPs dispersion.
- Figure 7C Core size distribution of dodecanethiol-capped Au NPs having a narrow size distribution with an average diameter of about 2.4 nm
- Figure 7D Core size distribution of 2-ethylhexaethiol-capped Au NPs having a narrow size distribution with an average diameter of about 2.2 nm.
- Figures 8A-8C Optical microscopy images of contact angle at different micro- barriers.
- Figure 8A shows an optical-microscopy image of contact angle on SET-8 surface
- Figure 8B shows an optical-microscopy image of contact angle on treated oxygen-plasma SET-8 surface
- Figure 8C shows an optical-microscopy image of contact angle on S1O2 surface.
- Figures 9A-9D Scanning-electron microscopy (SEM) images of micro-barrier surface at different magnifications.
- Figure 9A shows a SEM image of Si0 2 micro-barrier at a magnification of lOk
- Figure 9B shows a SEM image of a SET-8 micro-barrier at a magnification of lOk
- Figure 9C shows a SEM image of the Si0 2 micro-barrier at a magnification of lk
- Figure 9D shows a SEM image of the SET-8 micro-barrier at a magnification of lk.
- Figure 10A Light-microscopy image of a sensor comprising 8 electrode arrays and corresponding sensing layers prepared by deposition of 20 nL of 2-ethylhexaethiol-capped Au NPs dispersion.
- Figure 10B Light-microscopy image of a sensor comprising 8 electrode arrays and a sensing layer prepared by deposition of 20 nL of 2-ethylhexaethiol-capped Au NPs dispersion, wherein the sensing layer is confined by S1O2 micro-barrier.
- Figure 10C Light-microscopy image of a sensor comprising 8 electrode arrays and a sensing layer prepared by deposition of 20 nL of 2-ethylhexaethiol-capped Au NPs dispersion, wherein the sensing layer is confined by SU-8 micro-barrier.
- Figure 10D Response rate of a sensor to the exposure of different concentrations of n-octanol, wherein the sensor comprising 8 electrode arrays and a sensing layer prepared by deposition of 20 nL of 2-ethylhexaethiol-capped Au NPs dispersion.
- Figure 10E Response rate of a sensor to the exposure of different concentrations of n-octanol, wherein the sensor comprising 8 electrode arrays and a sensing layer prepared by deposition of 20 nL of 2-ethylhexaethiol-capped Au NPs dispersion, wherein the sensing layer is confined by Si0 2 micro-barrier.
- Figure 10F Response rate of a sensor to the exposure of different concentrations of n-octanol, wherein the sensor comprising 8 electrode arrays and a sensing layer prepared by deposition of 20 nL of 2-ethylhexaethiol-capped Au NPs dispersion, wherein the sensing layer is confined by SU-8 micro-barrier.
- Figure 11 A Light-microscopy image of a sensor comprising 8 electrode arrays and a sensing layer prepared by deposition of 40 nL of 2-ethylhexaethiol-capped Au NPs dispersion.
- Figure 11B Light-microscopy image of a sensor comprising 8 electrode arrays and a sensing layer prepared by deposition of 40 nL of 2-ethylhexaethiol-capped Au NPs dispersion, wherein the sensing layer is confined by Si0 2 micro-barrier.
- Figure 11C Light-microscopy image of a sensor comprising 8 electrode arrays and a sensing layer prepared by deposition of 40 nL of 2-ethylhexaethiol-capped Au NPs dispersion, wherein the sensing layer is confined by SU-8 micro-barrier.
- Figure 11D Response rate of a sensor to the exposure of different concentrations of n-octanol, wherein the sensor comprising 8 electrode arrays and a sensing layer prepared by deposition of 40 nL of 2-ethylhexaethiol-capped Au NPs dispersion.
- Figure 11F Response rate of a sensor to the exposure of different concentrations of n-octanol, wherein the sensor comprising 8 electrode arrays and a sensing layer prepared by deposition of 40 nL of 2-ethylhexaethiol-capped Au NPs dispersion, wherein the sensing layer is confined by S1O2 micro-barrier.
- Figure 11G Response rate of a sensor to the exposure of different concentrations of n-octanol, wherein the sensor comprising 8 electrode arrays and a sensing layer prepared by deposition of 40 nL of 2-ethylhexaethiol-capped Au NPs dispersion, wherein the sensing layer is confined by SU-8 micro-barrier.
- Figure 12A Light-microscopy image of a sensor comprising 8 electrode arrays and a sensing layer prepared by deposition of 20 nL of dodecanethiol-capped Au NPs dispersion.
- Figure 12B Light-microscopy image of a sensor comprising 8 electrode arrays and a sensing layer prepared by deposition of 20 nL of dodecanethiol-capped Au NPs dispersion, wherein the sensing layer is confined by Si0 2 micro-barrier.
- Figure 12C Light-microscopy image of a sensor comprising 8 electrode arrays and a sensing layer prepared by deposition of 20 nL of dodecanethiol-capped Au NPs dispersion, wherein the sensing layer is confined by SU-8 micro-barrier.
- Figure 12D Response rate of a sensor to the exposure of different concentrations of n-octanol, wherein the sensor comprising 8 electrode arrays and a sensing layer prepared by deposition of 20 nL of dodecanethiol-capped Au NPs dispersion.
- Figure 12E Response rate of a sensor to the exposure of different concentrations of n-octanol, wherein the sensor comprising 8 electrode arrays and a sensing layer made of 20 nL of dodecanethiol-capped Au NPs dispersion, wherein the sensing layer is confined by Si0 2 micro-barrier.
- Figure 12F Response rate of a sensor to the exposure of different concentrations of n-octanol, wherein the sensor comprising 8 electrode arrays and a sensing layer prepared by deposition of 20 nL of dodecanethiol-capped Au NPs dispersion, wherein the sensing layer is confined by SU-8 micro-barrier.
- Figure 13A Light-microscopy image of a sensor comprising 8 electrode arrays and a sensing layer prepared by deposition of 40 nL of dodecanethiol-capped Au NPs dispersion.
- Figure 13B Light-microscopy image of a sensor comprising 8 electrode arrays and a sensing layer prepared by deposition of 40 nL of dodecanethiol-capped Au NPs dispersion, wherein the sensing layer is confined by Si0 2 micro-barrier.
- Figure 13C Light-microscopy image of a sensor comprising 8 electrode arrays and a sensing layer prepared by deposition of 40 nL of dodecanethiol-capped Au NPs dispersion, wherein the sensing layer is confined by SU-8 micro-barrier.
- Figure 13D Response rate of a sensor to the exposure of different concentrations of n-octanol, wherein the sensor comprising 8 electrode arrays and a sensing layer prepared by deposition of 40 nL of dodecanethiol-capped Au NPs dispersion.
- Figure 13E Response rate of a sensor to the exposure of different concentrations of n-octanol, wherein the sensor comprising 8 electrode arrays and a sensing layer prepared by deposition of 40 nL of dodecanethiol-capped Au NPs dispersion, wherein the sensing layer is confined by S1O2 micro-barrier
- Figure 13F Response rate of a sensor to the exposure of different concentrations of n-octanol, wherein the sensor comprising 8 electrode arrays and a sensing layer prepared by deposition of 40 nL of dodecanethiol-capped Au NPs dispersion, wherein the sensing layer is confined by SU-8 micro-barrier.
- Figure 14A Light-microscopy image of a sensor comprising one electrode array and a sensing layer prepared by deposition of 15 nL of dodecanethiol-capped Au NPs dispersion.
- Figure 14B Light-microscopy image of a sensor comprising one electrode array and a sensing layer prepared by deposition of 10 nL of dodecanethiol-capped Au NPs dispersion, wherein the sensing layer is confined by a micro-barrier.
- Figure 14C Light-microscopy image of a sensor comprising one electrode array and a sensing layer prepared by deposition of 22 nL of dodecanethiol-capped Au NPs dispersion, wherein the sensing layer is confined by a micro-barrier.
- Figure 14D Light-microscopy image of a sensor comprising one electrode array and a sensing layer prepared by deposition of 20 nL of dodecanethiol-capped Au NPs dispersion, wherein the sensing layer is confined by a micro-barrier.
- Figure 15A Schematic representation of the cross-section of a drop formed on the substrate by depositing 15 nL of dodecanethiol-capped Au NPs dispersion.
- Figure 15B Schematic representation of the cross-section of a drop formed on the substrate by depositing 10 nL of dodecanethiol-capped Au NPs dispersion, the drop being confined by a micro-barrier.
- Figure 15C Schematic representation of the cross-section of a drop formed on the substrate by depositing 22 nL of dodecanethiol-capped Au NPs dispersion, the drop being confined by a micro-barrier.
- Figure 15D Schematic representation of the cross-section of a drop formed on the substrate by depositing 20 nL of dodecanethiol-capped Au NPs dispersion, the drop being confined by a micro-barrier.
- the present invention provides a chemically sensitive sensor for detecting volatile organic compounds (VOCs), the sensor comprising a substrate, an electrode array disposed on said substrate, a micro-barrier, disposed on the substrate and surrounding the electrode array, and a MNPs-based sensing layer being in electric contact with the electrode array, wherein the shape of the sensing layer is confined by the micro-barrier. Further provided is a method for fabricating a chemically sensitive sensor for detecting volatile VOCs.
- the chemically sensitive sensors according to the principles of the present invention are highly reliable and functionally reproducible. The structure of the sensors and the method of their preparation increase reproducibility of sensor fabrication and allow optimization of the manufacturing process, thereby promoting its automation and simplifying of quality control.
- the sensor and method of the present invention are particularly suitable for use with core-shell particles comprising metal nanoparticle cores having a mean particle size below about 15 nm and a shell of organic ligands.
- sensing layers comprising such particles are prone to exhibiting non-uniform morphologies, when manufactured by drop casting or inkjet printing.
- the addition of a physical barrier not only prevents spreading of the deposited MNPs dispersion beyond the desired area, but also allows formation of a more uniform sensing layer.
- the effect of the micro-barrier addition is surprising as it enhances pinning of drops to the substrate surfaces, which is known to induce the evolution of coffee ring formation.
- hydrophobic micro-barrier provided lower thickness variance throughout the sensing layer as compared to the use of a hydrophilic micro-barrier.
- the MNP-s dispersion which was applied onto the substrate surrounded by the micro-barrier was also hydrophobic. Without wishing to being bound by theory or mechanism of action, it is believed that the micro-barrier prevents formation of a high contact angle between the substrate surface and the applied MNPs-based dispersion, thereby allowing more even evaporation of the dispersion solvent, which decreases concentration and temperature gradients throughout the drying drop. It is therefore assumed that the Marangoni flow within such drying drop surrounded by a micro-barrier is reduced, thereby restricting particle motion within the drop.
- Increased reproducibility of the sensor response can further be induced by fine-tuning of the thickness of the sensing layer and the volume of the deposited MNPs-based dispersion.
- the volume of the deposited MNPs suspension or dispersion can be adjusted such that the drop height is aligned with the micro-barrier height, to further control uniformity of the solvent evaporation and reduce thickness variance throughout the sensing layer. Additional improvement of the sensors’ structural and functional reproducibility can be attained by ensuring that the micro-barrier is substantially orthogonal to the top surface of the substrate and/or by reducing the surface roughness of the micro-barrier inner walls.
- the present invention provides a chemically sensitive sensor for detecting VOCs, the sensor comprising a substrate having a top surface and a bottom surface, the substrate made of an electrically insulating material; an electrode array being disposed on the top surface of the substrate; a micro-barrier comprising an inner face and an outer face and being disposed on the top surface of the substrate and surrounding the electrode array; and a sensing layer comprising a multiplicity of core-shell particles, the particles comprising a metal nanoparticle (MNP) core and an organic ligand shell, wherein the MNP core has a mean particle size below about 15 nm, the sensing layer is in electric contact with the electrode array, and the shape of the sensing layer is confined by the micro- barrier.
- MNP metal nanoparticle
- a method for fabricating a chemically sensitive sensor for detecting volatile VOCs comprising the steps of: i. providing a substrate having a top surface and a bottom surface, the substrate being made of an electrically insulating material; ii. forming an electrode array on the top surface of the substrate; iii. forming a micro-barrier on the top surface of the substrate, wherein the micro- barrier surrounds the electrode array; and iv.
- a sensing layer comprising a multiplicity of core-shell particles, the particles comprising a metal nanoparticle (MNP) core and an organic ligand shell, wherein the MNP core has a mean particle size below about 15 nm, the sensing layer is in electric contact with the electrode array, and the shape of the sensing layer is confined by the micro-barrier.
- MNP metal nanoparticle
- multiplicity of core-shell particles refers to two or more core-shell particles, such as, e.g., 50, 100, 500, 1000, 5000, or 10000 particles.
- volatile organic compound is intended to encompass organic compounds having high or low volatility (such as semi-volatile organic compounds), inorganic volatile compounds (VCs), other solvents, volatile toxic chemicals, and volatile explosives.
- the substrate of the sensor is configured to support the electrode array, the micro- barrier and the sensing layer.
- the substrate can by any substrate suitable for use in the fabrication of VOCs sensors.
- the substrate is an integral part of a printed circuit or a printed electronics component.
- suitable substrate materials include silicon, silicon dioxide, quartz, glass, ceramics, plastic, Teflon, Kapton, and combinations thereof.
- the substrate is made of a hydrophilic material or has a hydrophobic surface.
- the substrate is made of silicon.
- the substrate is made of silicon coated by a layer of native or intentionally formed silicon oxide.
- the top layer of the substrate includes silicon dioxide.
- hydrophilic refers in some embodiments to a material or object, having a water contact angle below 90°. In further embodiments, the term ’’hydrophilic” refers to a material or object, having a water contact angle below 80°, below 70° or below 60°. Each possibility represents a separate embodiment of the invention.
- the substrate is substantially planar.
- substantially planar refers in some embodiments to components that have their main extension in one plane in contrast to being shaped.
- a substantially planar substrate has a constant thickness throughout the longest dimension thereof. This does not exclude a general curvature of the substrate.
- the substrate has a thickness of at least about 0.1 mih.
- the substrate has a thickness of at least about 0.5 mih or at least about 1 mih.
- the substrate can further include electric circuit configured to control the sensor or to operatively connect the sensor to a measuring device and/or computing system, wherein the connection is implemented as known in the art, e.g., via suitable electric wires or wirelessly.
- the substrate can further include an additional type of sensor, such as, but not limited to, resistor, capacitor, quartz crystal microbalance, bulk acoustic wave (BAW) and surface acoustic wave (SAW) resonator, electrochemical cell, surface plasmon resonance (SPR), and optical spectroscope.
- the additional sensor can be configured for the detection of at least one of temperature, humidity, and pressure.
- the electrode array can include a pair of electrodes (a positive electrode and a negative electrode) or a plurality of said pairs of electrodes.
- the positive and the negative electrode can be separated by a gap ranging from about 0.2 mm to about 5 mm. In further embodiments, the gap ranges from about 0.5 mm to about 2.5 mm.
- the electrode array can further comprise patterned electrodes, for example, interdigitated electrodes.
- the electrode array includes a plurality of sets of interdigitated electrodes.
- the substrate includes a plurality of electrode arrays.
- the interdigitated electrodes can have any shape known in the art, such as, but not limited to circular, square, rectangular, triangular, or any other particular shape and geometry. Each possibility represents a separate embodiment of the invention.
- the electrode array comprises interdigitated circular electrodes.
- the interdigitated electrodes have an outer diameter ranging from about 0.2 mm to about 5 mm. In further embodiments, the interdigitated electrodes have an outer diameter ranging from about 0.5 mm to about 2.5 mm.
- the gaps between each two electrodes in the interdigitated electrode array can range from about 2 pm to about 50 pm. In some embodiments, the gaps range from about 5 pm to about 20 pm.
- the thickness of the electrodes in the interdigitated electrode array can range from about 2 pm to about 50 pm. In some embodiments, the thickness ranges from about 5 pm to about 20 pm.
- the electrode array may include a source and a drain electrode separated from one another by a source-drain gap.
- the electrode array may further comprise a gate electrode wherein the electric signal may be indicative of a certain property of the sensing layer under the influence of a gate voltage.
- the electrode array can comprise any metal having high electric conductivity.
- metals suitable for use in the electrode array of the VOCs sensor of the present invention include Au, Ti, Cu, Ag, Pd, Pt, Ni, Al, and combinations thereof.
- the electrode array comprises Pt electrodes.
- the sensing layer is disposed on top of the electrode array, for example, wherein said electrode array comprises interdigitated electrodes. In some embodiments, the sensing layer is disposed between the electrodes of the electrode array, for example wherein the electrode array includes a pair of electrodes.
- micro-barrier refers in some embodiments to a raised frame structure having any cross-sectional shape or geometry, disposed on the top surface of the substrate and surrounding the electrode array.
- micro-barrier is meant to encompass a frame structure which has a longest dimension in a micrometer or a millimeter range, i.e., ranging from about 1 pm to about 1000 mm, for example, from about 10 pm or about 50 pm or about 100 pm to about lmm or about 10 mm or about 50 mm or about 100 mm .
- the micro-barrier has an internal face and an external face.
- the distance between the external face and the internal face is defined as micro-barrier thickness.
- the extent to which the micro-barrier is raised above the top surface of the substrate is defined as micro-barrier height.
- the micro-barrier defines the shape and/or area of the sensing layer.
- the term“defines the shape and/or area of the sensing layer”, as used herein, refers in some embodiments to the confinement of the sensing layer by the micro barrier, such that the area of the sensing area cannot be larger than the cross-sectional area of the micro-barrier.
- the perimeter of the inner face of the micro barrier defines the shape and/or area of the sensing layer.
- the shape of the electrode array dictates the shape and/or the cross-sectional area of the micro-barrier.
- the micro-barrier can have a cross- sectional shape selected from circular, oval, square, rectangular, triangular, hexagonal, polygonal, or in any other particular shape or geometry. Each possibility represents a separate embodiment of the invention.
- the micro-barrier has a circular cross-section.
- micro-barrier has an inner perimeter ranging from about 0.5 mm to about 15 mm.
- micro-barrier has an inner perimeter ranging from about 1 mm to about 10 mm.
- the tern“inner perimeter”, as used herein, refers in some embodiments to the perimeter of the inner face of the micro-barrier.
- the micro-barrier has a circular cross-sectional shape with an inner diameter ranging from about 0.2 mm to about 5 mm. In certain embodiments, the micro-barrier has a circular cross-sectional shape with an inner diameter ranging from about 0.5 mm to about 2.5 mm. In some exemplary embodiments, the micro-barrier has a circular cross-sectional shape with an inner diameter of about 0.1 mm.
- the height of the micro-barrier can be chosen to prevent spreading of the sensing layer beyond the perimeter of the micro-barrier and/or the outer perimeter of the electrode- array. For example, if the sensing area is formed by drop casting a dispersion comprising core-shell particles, the micro-barrier can prevent spillover of said dispersion when applied onto the substrate. Furthermore, the height of the micro-barrier can be adjusted to be level with the deposited dispersion drop. According to some embodiments, the micro-barrier has a height ranging from about 0.5 pm to about 50 pm. According to further embodiments, the micro-barrier has a height ranging from about 0.5 pm to about 30 pm. According to yet further embodiments, the micro-barrier has a height ranging from about 1 pm to about 20 pm.
- the micro-barrier has a height ranging from about 1 pm to about 10 pm. In yet further embodiments, the height of the micro-barrier ranges from about 2 pm to about 5 pm. In certain embodiments, the height of the micro- barrier is about 2.5 pm.
- the inner face of the micro-barrier is substantially orthogonal to the top surface of the substrate.
- the inner face of the micro-barrier is substantially orthogonal to the top surface of the substrate throughout the entire height of the micro-barrier.
- the outer face of the micro- barrier is substantially orthogonal to the top surface of the substrate.
- the term“orthogonal”, as used herein, refers in some embodiments to an angle between the micro-barrier inner or outer face and the top surface of the substrate, which ranges from about 85° to about 95°.
- the thickness of the micro-barrier i.e., the distance between the inner face and the outer face
- the thickness of the micro-barrier ranges from about 20 to about 500 mih. According to some embodiments, the thickness of the micro-barrier ranges from about 50 to about 200 mih. In some exemplary embodiments, the thickness of the micro- barrier is about 100 mih.
- the inner face of the micro- barrier is substantially smooth.
- substantially smooth refers in some embodiments, to a surface having a roughness of less than about 0.5 nm.
- the roughness of the micro-barrier inner surface can be evaluated by investigating SEM images or by Atomic Force Microscopy (AFM) measurements.
- the micro-barrier is made of a hydrophobic material.
- hydrophobic refers in some embodiments to a material or object, having a water contact angle above 90°. In further embodiments, the term’’hydrophobic” refers to a material or object, having a water contact angle above 100°, above 110° or above 120°. Each possibility represents a separate embodiment of the invention.
- Non-limiting examples of suitable hydrophobic materials for the formation of the micro-barrier include different types of epoxy polymers.
- said epoxy polymer is a photoresist material.
- the photoresist can be selected from a negative photoresist and a positive photoresist.
- the epoxy-based photoresist is SET-8.
- SET-8 is a commonly used epoxy-based negative photoresist. Negative refers to a photoresist whereby the parts exposed to ETV become cross-linked, while the remainder of the film remains soluble and can be washed away during development.
- SET-8 is composed of Bisphenol A Novolac epoxy that is dissolved in an organic solvent.
- Bisphenol A is an organic synthetic compound with the chemical formula (CH3)2C(C6H 4 OH)2 belonging to the group of diphenylmethane derivatives and bisphenol s, with two hydroxyphenyl groups.
- Novolac is a phenol formaldehyde (PF) resin, which is a synthetic polymer obtained by the reaction of phenol or substituted phenol with formaldehyde.
- SET-8 comprises an average of 8 epoxy groups per moiety.
- the micro-barrier is made of a hydrophilic material.
- suitable hydrophilic materials include silicon having a silicon dioxide surface, silicon nitride and different types of metal oxides.
- the micro-barrier is made of an electrically insulating material.
- FIG. 1 A schematically illustrates a side view of sensor 101 prior to the formation of the sensing layer, according to some embodiments of the invention.
- Sensor 101 includes substrate 103, having top surface 103a and bottom surface 103b.
- Sensor 101 further includes micro-barrier 105 having inner face 105a and outer face 105b.
- Micro-barrier 105 has a circular cross-section and is disposed on substrate top surface 103a. The distance between inner face 105a and outer face 105b is defined as a thickness of micro-barrier 105. Perimeter of inner face 105a is defined as an inner perimeter of micro- barrier 105. Perimeter of outer face 105b is defined as an outer perimeter of micro-barrier 105.
- Micro-barrier 105 further has top surface 105c. The distance between top surface 105c and top surface 103a of substrate 103 is defined as a height of the micro-barrier.
- Sensor 101 further includes an electrode array (hidden from view) disposed on top surface 103a of substrate 103 and surrounded by micro-barrier 105.
- an electrode array hidden from view
- Bottom surface 103b of substrate 103 can be disposed on a printed circuit board or printed electronic component.
- substrate 103 itself can be an integral part of the printed circuit board or printed electronic component.
- sensor 101 includes substrate 103, having top surface 103a and a bottom surface (hidden from view).
- Sensor 101 further includes micro-barrier 105 and electrode array 107, disposed on top surface 103a of substrate 103.
- Micro-barrier 105 has inner face 105a and outer face 105b and surrounds electrode array 107. Perimeter of inner face 105a of micro-barrier 105 is only slightly larger than the outer perimeter of electrode array 107.
- Electrode array 107 includes a plurality of positive electrodes 109a, connected to contact pin 111a which is disposed outside micro-barrier 105. Electrode array 107 further includes a plurality of negative electrodes 109b, connected to contact pin 111b which is disposed outside micro-barrier 105. The plurality of circular electrodes 109a and 109b are thus contained within micro-barrier 105, wherein contact pins 111a and 111b are located outside the micro-barrier to allow convenient connection to a measuring device (not shown).
- FIG. 2A schematically illustrates a side view of sensor 201 prior to the formation of the sensing layer, according to some embodiments of the invention.
- Sensor 201 includes substrate 203, having top surface 203a and bottom surface 203b.
- Sensor 201 further includes micro-barrier 205 having inner face 205a and outer face 205b.
- Micro-barrier 205 has a rectangular cross-section and is disposed on substrate top surface 203a. The distance between inner face 205a and outer face 205b is defined as a thickness of micro-barrier 205. Perimeter of inner face 205a is defined as an inner perimeter of micro-barrier 205. Perimeter of outer face 205b is defined as an outer perimeter of micro- barrier 205.
- Micro-barrier 205 further has top surface 205c. The distance between top surface 205c and top surface 203a of substrate 203 is defined as a height of the micro-barrier.
- Sensor 201 further includes an electrode array including positive electrode 209a and negative electrode 209b, disposed on top surface 203a of substrate 203 and surrounded by micro-barrier 205. Electrodes 209a and 209b have a rectangular shape.
- sensor 201 includes substrate 203, having top surface 203a and a bottom surface (hidden from view).
- Sensor 201 further includes micro-barrier 205 and an electrode array including positive electrode 209a and negative electrode 209b, the micro-barrier and the electrodes being disposed on top surface 203a of substrate 203.
- Micro-barrier 205 has inner face 205a and outer face 205b.
- Micro-barrier 205 has a rectangular cross-section including sides 205’a, 205’b, 205’c, and 205’d.
- Electrodes 209a and 209b have a rectangular shape and are disposed within micro-barrier 205, essentially contacting sides 205’a and 205’c of micro-barrier 205, respectively.
- the length of the electrodes is only slightly smaller than the length of sides 205’ a and 205’ c of micro-barrier 205.
- the sensing layer comprises a multiplicity of core-shell particles, which are responsible for the VOCs detection.
- core-shell particles refers to metal-core organic-shell structures which are obtained, e.g., by coordination chemistry approaches, i.e., by coordinating multifunctional organic ligands to metal nanoparticle cores.
- the core-shell particle comprises a metallic core, wherein about 15%- 85% of its surface is covered by organic ligands.
- the core-shell particles comprise a monolayer or multilayers of organic ligands.
- the core-shell particles are disposed on the top surface of the substrate in close-packed orientation.
- the term“close-packed orientation”, as used herein, refers in some embodiments to a solid-state arrangement of the MNP cores, wherein organic ligand shells are in contact with their nearest neighbors and in which multiple molecular sized (for example, 0.1 to 3.0 nm) voids among the particles are interconnected.
- the core-sell particles are arranged in a film configuration.
- film refers in some embodiments to a configuration of well-arranged assembly of metallic nanoparticles, preferably in body centered cubic (BCC) or face centered cubic (FCC) configuration, wherein said MNPs comprise organic ligand shells.
- BCC body centered cubic
- FCC face centered cubic
- the metallic cores are separated from each other by their own organic ligand shell and the shell of adjacent core-shell particles, and molecular sized voids between said organic ligand shells, and not by a continuous organic film, such as, for example, polymeric film.
- the film can include one or more layers of the nanoparticles.
- a change in structural configuration of the sensing layer occurs upon adsorption of a VOC on an organic ligand of the core-shell particle. This change can be translated into an electrical signal measured by the electrodes in the electrode array. For example, upon VOCs adsorption the assembly of the core-shell particles can swell or aggregate, leading to a change in the permittivity constant of the sensing layer. The generated electrical signal is determined by the nature of the interaction between the VOC and the sensing layer.
- the sensors of the present invention are designed to not be limited to any particular VOCs, which can be detected by said sensors.
- the metal nanoparticle cores may have any desirable geometry including, but not limited to a cubic, a spherical, and a spheroidal geometry. Each possibility represents a separate embodiment of the present invention.
- the nanoparticle cores have a spherical shape.
- nanoparticles should be understood to include particles having a mean particle size in the range of above 1 nm but below 1000 nm.
- the metal nanoparticle cores have a mean particle size below about 10 nm.
- the metal nanoparticle cores have a mean particle size below about 5 nm.
- the metal nanoparticle cores have a mean particle size in the range of about 1 nm to about 15 nm.
- the metal nanoparticle cores have a mean particle size in the range of about 1 nm to about 10 nm.
- the metal nanoparticle cores have a mean particle size in the range of about 1.5 nm to about 5 nm. In still further embodiments, the metal nanoparticle cores have a mean particle size in the range of about 1.5 nm to about 3 nm. In yet further embodiments, the metal nanoparticle cores have a mean particle size in the range of about 2 to about 2.5 nm. In some exemplary embodiments, the metal nanoparticle cores have a mean particle size of about 2.2 and about 2.4 nm.
- particle size refers to the length of the particle in the longest dimension thereof if the particle is not spherical. If the particle is essentially spherical, the term“particle size” refers to the particle diameter. Accordingly, in certain such embodiments, the terms“particle size” and“particle diameter” are used interchangeably.
- mean particle size can refer to the size of monodisperse particles or polydisperse particles.
- mean particle size refers in some embodiments, to an arithmetic average of particle sizes as can be determined, for example, using Transmission Electron Microscopy (TEM).
- TEM Transmission Electron Microscopy
- the mean particle size can further be determined using other techniques known to those of skill in the art including, but not limited to, sedimentation flow fractionation, photon correlation spectroscopy, light scattering, electron scattering, disk centrifugation, and the like.
- the term“mean particle size below about 15 nm” refers to an arithmetic average of at least about 50% of the particles measured by the above-mentioned techniques. In further embodiments, the term“mean particle size below about 15 nm” refers to an arithmetic average of at least about 70% of the particles, at least about 80% of the particles, at least about 90% of the particles, or at least about 95% of the particles measured by the above-mentioned techniques.
- the size distribution of the metal nanoparticles cores is narrow.
- Nanoparticle size distribution is usually defined in terms of the mean particle size and the width of the distribution. The width of the distribution curve at one half of the maximum value is termed full width at half maximum (FWHM). The relationship between the FWHM and mean particle size is used as a measure of broadness or narrowness of the distribution.
- the term“narrow particle size distribution” refers to a distribution wherein the FWHM is less than or equal to 80% of the mean particle size. In some embodiments, the FWHM is less than or equal to 60% of the mean particle size. In other particular embodiments, the FWHM is less than or equal to 40% of the mean particle size.
- the metal nanoparticle core can comprise metals and/or metal alloys.
- suitable metals include Au, Pt, Ag, Ni, Co, Pd, Cu, Al, Zn, Fe, and combinations thereof.
- the metal alloys can be selected from, but not limited to Au/Pt, Au/Ag, Au/Cu, Au/Ag/Cu, Au/Pd, Au/Ag/Cu/Pd, Pt/Rh, Ni/Co, and Pt/Ni/Fe. Each possibility represents a separate embodiment of the present invention.
- the metal nanoparticle cores include Au.
- the organic ligand shell has thickness in the range of about 0.2 nm to about 7 nm. In further embodiments, the organic ligand shell has thickness in the range of about 0.2 nm to about 4 nm. In yet further embodiments, the organic ligand shell has thickness in the range of about 0.2 nm to about 2 nm. In still further embodiments, the organic ligand shell has thickness in the range of about 0.6 nm to about 2 nm. In additional embodiments, the organic ligand shell has thickness in the range of about 2 nm to about 4 nm. In certain embodiments, the organic ligand shell has thickness in the range of about 1.2 nm to about 7 nm. The thickness of the organic ligand shell can be estimated by the nature of the ligands forming said shell, as apparent to a skilled artisan.
- the organic ligands forming the shell of the core-shell particles can be selected from small molecules, monomers, oligomers or polymers, preferably short polymeric chains.
- the organic ligand is selected from small molecules, monomers, oligomers, and combinations thereof. Each possibility represents a separate embodiment of the invention.
- the sensing layer is devoid of a polymer which is not a part of the organic ligand of the core-shell particle.
- Non-limiting examples of the organic ligands suitable for use in the core-shell particles include alkylthiols, e.g., alkylthiols with C3-C24 chains, arylthiols, alkylarylthiols, alkylthiolates, w -functionalized alkylthiolates, arenethiolates, (co-mercaptopropyl)tri- methyloxysilane, dialkyl sulfides, diaryl sulfides, alkylaryl sulfides, dialkyl disulfides, diaryl disulfides, alkylaryl disulfides, alkyl sulfites, aryl sulfites, alkylaryl sulfites, alkyl sulfates, aryl sulfates, alkylaryl sulfates, xanthates, oligonucleotides, polynucleotides, dithiocarbamate, alkyl
- Additional organic ligands suitable for forming the shells of the core-shell particles include, but are not limited to, alkenyl thiols, alkynyl thiols, cycloalkyl thiols, heterocyclyl thiols, heteroaryl thiols, alkenyl thiolates, alkynyl thiolates, cycloalkyl thiolates, heterocyclyl thiolates, heteroaryl thiolates, alkenyl sulfides, alkynyl sulfides, cycloalkyl sulfides, heterocyclyl sulfides, heteroaryl sulfides, alkenyl disulfides, alkynyl disulfides, cycloalkyl disulfides, heterocyclyl disulfides, heteroaryl disulfides, alkenyl sulfites, alkynyl sulfites, cycloalkyl s
- an“alkyl” group refers to a saturated aliphatic hydrocarbon, including straight-chain, branched-chain and cyclic alkyl groups.
- the alkyl group has 1-12 carbons designated here as Ci-Ci2-alkyl.
- the alkyl group has 2-6 carbons designated here as C2-C 6 -alkyl.
- the alkyl group has 2-4 carbons designated here as C2-C 4 -alkyl.
- the alkyl group has 3-24 carbons designated here as C3-C24 alkyl.
- the alkyl group may be unsubstituted or substituted by one or more groups selected from halogen, haloalkyl, acyl, amido, ester, cyano, nitro, and azido.
- groups selected from halogen, haloalkyl, acyl, amido, ester, cyano, nitro, and azido.
- a "cycloalkyl” group refers to a non-aromatic mono- or multicyclic ring system.
- the cycloalkyl group has 3-10 carbon atoms.
- the cycloalkyl group has 5-10 carbon atoms.
- Exemplary monocyclic cycloalkyl groups include cyclopentyl, cyclohexyl, cycloheptyl and the like.
- An alkylcycloalkyl is an alkyl group as defined herein bonded to a cycloalkyl group as defined herein.
- the cycloalkyl group can be unsubstituted or substituted with any one or more of the substituents defined above for alkyl.
- alkenyl refers to an aliphatic hydrocarbon group containing at least one carbon-carbon double bond including straight-chain, branched-chain and cyclic alkenyl groups.
- the alkenyl group has 2-8 carbon atoms (a C2-8 alkenyl).
- the alkenyl group has 2-4 carbon atoms in the chain (a C2-4 alkenyl).
- alkenyl groups include, but are not limited to, ethenyl, propenyl, n-butenyl, i- butenyl, 3-methylbut-2-enyl, n-pentenyl, heptenyl, octenyl, cyclohexyl-butenyl and decenyl.
- An alkylalkenyl is an alkyl group as defined herein bonded to an alkenyl group as defined herein.
- the alkenyl group can be unsubstituted or substituted through available carbon atoms with one or more groups defined hereinabove for alkyl.
- alkynyl refers to an aliphatic hydrocarbon group containing at least one carbon-carbon triple bond including straight-chain and branched-chain.
- the alkynyl group has 2-8 carbon atoms in the chain (a C2-8 alkynyl).
- the alkynyl group has 2-4 carbon atoms in the chain (a C2-4 alkynyl).
- alkynyl groups include, but are not limited to, ethynyl, propynyl, n-butynyl, 2-butynyl, 3- methylbutynyl, n-pentynyl, heptynyl, octynyl and decynyl.
- An alkylalkynyl is an alkyl group as defined herein bonded to an alkynyl group as defined herein.
- the alkynyl group can be unsubstituted or substituted through available carbon atoms with one or more groups defined hereinabove for alkyl.
- aryl refers to an aromatic monocyclic or multicyclic ring system. In one embodiment, the aryl group has 6-10 carbon atoms. The aryl is optionally substituted with at least one "ring system substituents" and combinations thereof as defined herein. Exemplary aryl groups include, but are not limited to, phenyl or naphthyl.
- An alkylaryl is an alkyl group as defined herein bonded to an aryl group as defined herein. The aryl group can be unsubstituted or substituted through available carbon atoms with one or more groups defined hereinabove for alkyl.
- A“heteroaryl” group refers to a heteroaromatic system containing at least one heteroatom ring wherein the atom is selected from nitrogen, sulfur and oxygen.
- the heteroaryl contains 5 or more ring atoms.
- the heteroaryl group can be monocyclic, bicyclic, tricyclic and the like. Also included in this definition are the benzoheterocyclic rings.
- heteroaryls include thienyl, benzothienyl, l-naphthothienyl, thianthrenyl, furyl, benzofuryl, pyrrolyl, imidazolyl, pyrazolyl, pyridyl, pyrazinyl, pyrimidinyl, pyridazinyl, indolyl, isoindolyl, indazolyl, purinyl, isoquinolyl, quinolyl, naphthyridinyl, quinoxalinyl, quinazolinyl, cinnolinyl, pteridinyl, carbolinyl, thiazolyl, oxazolyl, isothiazolyl, isoxazolyl and the like.
- the heteroaryl group can be unsubstituted or substituted through available atoms with one or more groups defined hereinabove for alkyl.
- A“heterocyclic ring” or“heterocyclyl” group refers to five-membered to eight- membered rings that have 1 to 4 heteroatoms, such as oxygen, sulfur and/or in particular nitrogen. These five-membered to eight-membered rings can be saturated, fully unsaturated or partially unsaturated, with fully saturated rings being preferred.
- heterocyclic rings include, but are not limited to, piperidinyl, pyrrolidinyl pyrrolinyl, pyrazolinyl, pyrazolidinyl, morpholinyl, thiomorpholinyl, pyranyl, thiopyranyl, piperazinyl, indolinyl, dihydrofuranyl, tetrahydrofuranyl, dihydrothiophenyl, tetrahydrothiophenyl, dihydropyranyl, tetrahydropyranyl, and the like.
- An alkylheterocyclyl is an alkyl group as defined herein bonded to a heterocyclyl group as defined herein.
- the heterocyclyl group can be unsubstituted or substituted through available atoms with one or more groups defined hereinabove for alkyl.
- Ring system substituents refer to substituents attached to aromatic or non-aromatic ring systems including, but not limited to, H, halo, haloalkyl, (Ci-C 8 )alkyl, (C2-C 8 )alkenyl, (C 2 -C 8 )alkynyl, (C 6 -Cio)aryl, acyl, amido, ester, cyano, nitro, azido, and the like.
- halogen or "halo” group as used herein alone or as part of another group refers to chlorine, bromine, fluorine, and iodine.
- haloalkyl refers to an alkyl group having some or all of the hydrogens independently replaced by a halogen group including, but not limited to, trichloromethyl, tribromomethyl, trifluoromethyl, triiodomethyl, difluorom ethyl, chlorodifluorom ethyl, pentafluoroethyl, l, l-difluoroethyl bromom ethyl, chloromethyl, fluoromethyl, iodomethyl, and the like.
- acyl group as used herein encompasses groups such as, but not limited to, formyl, acetyl, propionyl, butyryl, pentanoyl, pivaloyl, hexanoyl, heptanoyl, octanoyl, nonanoyl, decanoyl, undecanoyl, dodecanoyl, benzoyl and the like.
- acyl groups are acetyl and benzoyl.
- An“alkoxy” group refers to an -O-alkyl group wherein R is alkyl as defined above.
- A“thio” group as used herein alone or as part of another group refers to an SH group.
- the terms“alkylthio”, “arylthio” or “arylalkylthio” as used herein alone or as part of another group refer to any of the above alkyl, arylalkyl or aryl groups linked to a sulfur atom.
- the organic ligand is selected from the group consisting of alkylthiols, arylthiols, alkylarylthiols, alkylthiolates, co-functionalized alkanethiolates, arenethiolates, (Y-mercaptopropyl)tri-methyloxy silane, dialkyl disulfides and combinations and derivatives thereof.
- alkylthiols arylthiols, alkylarylthiols
- alkylthiolates co-functionalized alkanethiolates
- arenethiolates co-functionalized alkanethiolates
- (Y-mercaptopropyl)tri-methyloxy silane dialkyl disulfides and combinations and derivatives thereof.
- alkylthiol or alkyl ary lthiol is selected from the group consisting of dodecanethiol, 2-ethylhexanethiol, 3- ethoxythiophenol, 2-ethoxythiophenol, decanethiol, 2-nitro-4-(trifluoromethyl)benzenethiol, butanethiol, benzyl mercaptan, octadecanethiol, 2-naphthalenethiol, 4- chlorobenzenemethanethiol, tert-dodecanethiol, hexanethiol, octadecanethiol, 1 -methyl-2 - imidazolethiol and combinations thereof.
- the organic ligand comprises an alkylthiol selected from dodecanethiol and 2-ethylhexanethiol.
- the core-shell particles can include either hydrophobic ligands or hydrophilic ligands. Each possibility represents a separate embodiment of the present invention. According to some exemplary embodiments, the core-shell particles comprise hydrophobic ligands.
- the hydrophobic ligand can be selected from the group consisting of dodecanethiol, 2-ethylhexanethiol, decanethiol, hexanethiol, dibutyl disulfide, 4-tert methylbenzenethiol, 1- heptanethiol, butanethiol, benzylmercaptan, 3 -ethoxy tiophenol, tert-dodecanethiol and combinations thereof. Each possibility represents a separate embodiment of the present invention.
- the core-shell particles comprise hydrophilic ligands.
- the hydrophilic ligand can be selected from the group consisting of 2-nitro-4- trifluoro-methylbenzenthiol, 4-chlorobenzenmethanethiol and combinations thereof. Each possibility represents a separate embodiment of the present invention.
- the sensing layer can be either hydrophobic or hydrophilic. Each possibility represents a separate embodiment of the invention. Hydrophobicity of the sensing layer can be determined by the type of organic ligands used to functionalize the metallic nanoparticle cores. The hydrophobicity of the sensing layer can further be determined by depositing the sensing layer material (i.e., core- shell particles from the corresponding dispersion) onto the substrate and measuring water contact angle after solvent evaporation.
- the sensing layer material i.e., core- shell particles from the corresponding dispersion
- the sensing layer is hydrophobic and the micro-barrier is made of a hydrophobic material.
- the sensing layer is hydrophilic.
- the micro-barrier is made of a hydrophilic material.
- the sensing layer can have any shape or geometry as known in the art, such as, but not limited to, circular, oval, square, rectangular, triangular, hexagonal, and polygonal shape.
- the area of the sensing layer can range from about 0.03 mm 2 to about 20 mm 2 . In further embodiments, the area of the sensing layer ranges from about 0.1 mm 2 to about 10 mm 2 , or from about 0.5 mm 2 to about 5 mm 2 . Each possibility represents a separate embodiment of the invention.
- the surface area of the sensing layer is about 1 mm 2 . It is to be understood that the shape and the surface area of the sensing layer are dictated by the shape and the area of the micro-barrier cross-section. In some embodiments, the area of the sensing layer is essentially the same as the cross-sectional area of the micro-barrier.
- the sensing layer is disposed on the substrate and is in electric contact with the electrode array. In some embodiments, the sensing layer is disposed on top of the electrode array.
- the term“in electric contact with the electrode array”, as used herein refers to an electric contact with at least one positive electrode and at least one negative electrode of the electrode array.
- the morphology of the sensing layer can be effectively controlled.
- the sensing layer has a substantially uniform thickness throughout the entire area thereof.
- substantially uniform refers in some embodiments to the variance of less than about 10% in the sensing layer thickness between the outer perimeter of the sensing layer and the remaining surface.
- the thickness of the sensing layer can be determined, inter alia , by Atomic Force Microscopy (AFM).
- sensor 301 comprises substrate 103, having top surface 103a.
- Sensor 301 further includes micro-barrier 105 and electrode array comprising a plurality of circular electrodes (hidden from view) and contact pins 111a and 111b, disposed on top surface 103a of substrate 103.
- Sensor 301 further includes sensing layer 113, which is disposed on top of the electrode array and is surrounded by micro-barrier 105. The area of sensing layer 113 is essentially the same as the cross-sectional area of micro- barrier 105.
- sensor 401 includes substrate 203, having top surface 203a.
- Sensor 401 further includes micro-barrier 205 and an electrode array including a positive electrode and a negative electrode (hidden from view), the micro-barrier and the electrodes being disposed on top surface 203a of substrate 203.
- Sensor 401 further includes sensing layer 213 disposed on top surface 203a of substrate 203, covering the electrodes. The area of sensing layer 213 is essentially the same as the cross-sectional area of micro- barrier 205.
- the sensor of the present invention can be configured, e.g., as a capacitive sensor, resistive sensor, chemiresi stive sensor, impedance sensor, field effect transistor sensor, strain gauge sensor and the like. Each possibility represents a separate embodiment of the present invention.
- the sensor of the present invention is configured as a chemiresi stive sensor (i.e., chemiresi stor). A change in resistance of such sensor is produced by the swelling or aggregation of the assembly of the core-shell particles in response to the adsorption of the VOCs, which proceeds through various chemical interactions.
- the interactions include, but are not limited to, hydrogen-bonding, host-guest, van der Waals, electrostatic, charge-transfer, antigen-antibody interactions, and combinations thereof.
- swelling refers to an increase of the average inter-particle distance in the assembly of core-shell particles.
- aggregation refers to a decrease of the average inter-particle distance in the assembly of core-shell particles. Changes in permittivity (translated into the measured change in resistance) usually occur in thin films having regions of voids in the sensing layer being composed of 2D or 3D films of organically capped metallic nanoparticles.
- the senor of the invention is configured to detect VOCs in a test sample.
- the test sample according to the principles of the present invention is selected from a gas sample, such as, for example, air or breath, and a fluid sample, e.g., bodily fluid or secretion.
- the sensor is configured to provide the detection of the presence and concentration of the analyte molecules in the surrounding environment.
- analytes which can be detected by the sensor, include VOCs selected from octane, benzaldehyde, hexane, hexanal, ethyl hexanol, octanol and trimethylbenzene.
- said VOC is octane
- the senor comprises a plurality of electrode arrays, respective micro-barriers and respective sensing layers disposed on a single substrate.
- the sensor is also termed sensor array.
- Arrangement of the sensors can be performed as is known in the art. Non-limiting arrangement includes a matrix of sensors (rows and/or columns) comprising a plurality of sensors, for example between 2 and 20 sensors, wherein each sensor independently generates an electrical signal in response to VOCs sensing.
- the core-shell nanoparticles of the plurality of sensing layers can be the same or different.
- the sensor array comprises sensors having MNP cores of a single species capped with various organic ligand shells. In alternative embodiments, the sensor array comprises sensors having MNP cores of various species.
- the signal of the chemically sensitive sensor can be detected and/or measured by a suitable detection device.
- the platform unit or its sensor is coupled to the signal detection and/or measuring device.
- Suitable detection and/or measuring devices should be susceptible to a change in any one or more of resistance, conductance, alternating current (AC), frequency, capacitance, impedance, inductance, mobility, electrical potential, piezoelectricity, and voltage threshold. Each possibility represents a separate embodiment of the present invention.
- the detection and/or measuring device is susceptible to a change in resistance or conductance of the sensor.
- the measuring devices are susceptible to swelling or aggregation of the core-shell particles.
- Changes in the electric properties of the sensor can be measured by any suitable device known in the art, including, inter alia , a data logger, a potentiostat, a voltmeter, a conductivity meter, an LCR meter or a millimeter.
- Changes in the piezoelectricity properties of the sensor set can be measured using, for example, a piezoelectric sensor.
- the measured signals can be displayed on a display or transmitted to a host computer.
- the signals obtained from the sensors can be analyzed by a computing system configured for executing various algorithms stored on a non-transitory memory.
- the chemically sensitive sensor or sensor array is coupled to said computing system.
- the algorithms can include learning and pattern recognition algorithms, such as, but not limited to, artificial neural network (ANN) algorithm, support vector machine (SVM), discriminant function analysis (DFA), principal component analysis (PCA), multi-layer perception (MLP), generalized regression neural network (GRNN), fuzzy inference system (FIS), self-organizing map (SOM), radial bias function (RBF), genetic algorithm (GAS), neuro-fuzzy system (NFS), adaptive resonance theory (ART), partial least squares (PLS), multiple linear regression (MLR), principal component regression (PCR), linear discriminant analysis (LDA), cluster analysis, nearest neighbor, Fisher linear discriminant analysis (FLDA), soft independent modeling of class analogy (SIMCA), K-nearest neighbors (KNN), genetic algorithms, and fuzzy logic algorithms and canonical discriminant analysis (CDA).
- ANN artificial neural network
- SVM support vector machine
- DFA discriminant function analysis
- PCA principal component analysis
- MLP multi-layer perception
- GRNN generalized regression neural network
- FIS fuzzy inference system
- the step of forming an electrode array can include depositing a metal onto the top surface of the substrate.
- metal deposition include e-beam evaporation, physical vapor deposition, sputter-deposition, drop-casting, field enhanced deposition, soft lithography, inkjet printing, and screen printing.
- the metal can be selected from Au, Pt, Ti, Cu, Ag, Pd, Pt, Ni, Al, and combinations thereof .
- the step of forming an electrode array comprises applying a shadow mask to the top surface of the substrate during metal deposition.
- the shadow mask can be fabricated by any suitable process as known in the art.
- a silicon wafer can be used, wherein a photoresist pattern is applied to the wafer and the wafer is etched for removing the silicon which is not protected by the photoresist.
- the micro-barrier can be formed by a method selected from photolithography, e- beam lithography, direct evaporation/sputtering through shadow mask, soft (stamp) contact, inkjet printing.
- formation of the micro-barrier is carried out by a photolithography process.
- the photolithography process includes a step of applying a negative photoresist to the substrate, and, optionally, to the electrode array.
- the negative photoresist can include an epoxy-based photoresist.
- said negative photoresist is SU-8. SU-8 is particularly suitable for use in the fabrication method of the present invention, as it enables formation of relatively thick (hundreds of micrometers) structures with nearly vertical side walls.
- the photoresist material can be applied to the surface of the substrate by any suitable method, such as, for example, spin-coating, or casting.
- the photoresist is applied by spinning.
- the photoresist is applied by spinning at a rate ranging from about 200 rpm to about 5000 rpm.
- spinning is performed at a rate ranging from about 500 rpm to about 2000 rpm.
- the photoresist is applied by increasing the spinning rate from about 500 rpm to about 2000 rpm.
- the spinning time can range from about 5 to about 120 seconds.
- the photolithography process further includes a step of disposing a mask with a predefined pattern on the negative photoresist.
- the mask can have a ring-shaped opening in a shape selected from circular, oval, square, rectangular, triangular, hexagonal, and polygonal ring shape. Each possibility represents a separate embodiment of the invention.
- the mask can be fabricated as described hereinabove in connection with the electrode array fabrication.
- the photolithography process further includes a step of exposing the negative photoresist to UV irradiation, wherein the photoresist is covered by the mask.
- the UV light intensity and exposure time can be selected based on the type and thickness of the applied photoresist.
- the photoresist is exposed to UV light with an intensity of 14 mW/cm 2 for 6 seconds.
- the photolithography process further includes a step of developing the remaining negative photoresist.
- the developer can be selected based on the photoresist type.
- the photoresist was SU-8 and the developer was propylene glycol methyl ether acetate (PGMEA), wherein the development process lasted for about 1 minute.
- PMEA propylene glycol methyl ether acetate
- the substrate is heated to remove moisture and any possible remaining solvents prior to the application of the photoresist.
- the substrate with the photoresist is heated following the application of the photoresist, following the UV exposure step, and/or following the development step. The heating can be performed at a temperature ranging from about 80°C to about 200°C for 1 to 30 minutes.
- the photolithography process does not include plasma cleaning following the development state. It was found by the inventors that oxygen plasma treatment of the micro-barrier photoresist material decreased its hydrophobicity, thereby potentially weakening the coffee ring elimination effect.
- the photolithography process does not include a step of photoresist lift-off, thereby preventing abrasion of the micro barrier structure and in particular the inner face thereof
- the step of forming a sensing layer comprises applying a dispersion comprising the core-sell particles and a solvent onto the electrode array within the micro-barrier.
- the core-shell particles can contain the metallic nanoparticle core and the organic ligand shell as described hereinabove.
- the synthesis of the core-shell particles can be carried out by various methods known in the art, for instance, by the two-phase method (Brust et ah, J. Chem. Soc. Chem. Commun., 801, 1994, 2) with some modifications (Hostetler et al., Langmuir, 14 1998, 24), using a variety of organic ligands to provide widely selective adsorption sites for VOCs adsorption.
- gold- based core-shell particles were synthesized by transferring AuClri from aqueous HAuCUvrHiO solution to a toluene solution by the phase-transfer reagent TOAB. After isolating the organic phase, excess thiols with toluene solution are added to the solution.
- the mole ratio of thiol: HAuCU* xH 2 0 can vary between 1 : 1 and 10: 1, depending on the thiol used.
- aqueous solution of reducing agent NaBH 4 in large excess is added. The reaction is constantly stirred at room temperature for at least 3 hours to produce a dark brown solution of the thiol-capped Au nanoparticles.
- the resulting solution can be further subjected to solvent removal in a rotary evaporator followed by multiple washings using ethanol and toluene.
- Suitable solvents for suspending the obtained core-shell particles can be selected from hydrophobic (or non-polar) and hydrophilic (or polar) solvents, based on the type of the organic ligand used.
- suitable solvents include toluene, 2- pentatone, hexane, ethanol, acetone, isopropyl, 2-pentanone, water and combinations thereof.
- the solvent is selected from toluene, 2-pentatone, and hexane.
- the term“dispersion” refers broadly to a heterogeneous mixture containing solid substances dispersed throughout liquid substances with or without the presence of dispersing agents, wherein the solid substances are either uniformly dispersed or sedimented.
- the term“dispersion” includes suspensions and colloids.
- the term“suspension” refers to a heterogeneous mixture containing solid particles that are sufficiently large for sedimentation.
- the internal phase (solid) is dispersed throughout the external phase (liquid) through agitation with or without the presence of dispersing agents.
- the dispersion comprises the core- shell particles in a form of a suspension.
- the dispersion of the core-shell particles is hydrophobic and the micro-barrier material is hydrophobic. In additional embodiments, the dispersion of the core-shell particles is hydrophilic and the micro-barrier material is hydrophilic.
- the sensing layer is manufactured through a self- assembly process to produce a film comprising the core-shell particles.
- self- assembly refers to a process of organization of molecules without intervening from an outside source. The self-assembly process takes place in a solution/solvent or directly on the solid-state substrate.
- Exemplary method for obtaining well-ordered two-dimensional assemblies of core- shell particles includes, but is not limited to, random deposition from dispersion or dispersion of cores-shell particles on solid surfaces.
- the deposition can be performed by inkjet printing or drop casting.
- the dispersion is applied by inkjet-printing.
- Inkjet printing is typically used for printing on solid-state or flexible substrates using an inkjet printer designated for printed electronics.
- a dispersion containing the core-shell particles is used as a filling material (or“ink”) of the printing head according to procedures well known in the art, as described in e.g., Holland et al. (Ink Maker 8, 83, 2005).
- the core-shell particles dispersion is applied onto the substrate, such that the formed sensing layer is in electric contact with the electrode array. In some embodiments, the dispersion is applied on top of the electrode array.
- the dispersion s applied to the center of the electrode array.
- the volume of the dispersion which is deposited onto the substrate, and optionally, the electrode array, can be adjusted to form a drop, having essentially the same height as the height of the micro-barrier.
- the desired volume can be deposited as a multiplicity of precisely measured drops of a smaller volume, such as, for example, 0.3 nL or 1 nL.
- the dispersion is applied in a total volume ranging from about 5nL to about 500nL. In further embodiments, the dispersion is applied in a total volume ranging from about 5nL to about l50nL. In some exemplary embodiments, the dispersion is applied in a total volume ranging from about 20nL to about 300nL. In a particular embodiment, the applied total volume ranges from about 20 nL to about 120 nL.
- the concentration of the core-shell particles in the dispersion can range from about 1 mg/ml to about 100 mg/ml. In some exemplary embodiments, the concentration of the core-shell particles in the dispersion ranges from about 5 mg/ml to about 20 mg/ml
- the step of forming the sensing layer further includes a drying step to allow solvent evaporation.
- the senor Due to the miniaturized dimensions of the sensor (in the range of a few micrometers), it could be installed in any electronic device including, but not limited to, a watch or cellular phone.
- the integration of the sensor array to a commonly used electronic device allows it to be used for monitoring health of a subject, as well as diagnosing various diseases.
- the sensor of the present invention can be used in various additional applications wherein the detection of VOCs is feasible.
- applications include, but are not limited to, environmental toxicology and remediation, medicine, materials quality control, food and agricultural products monitoring, heavy industrial manufacturing (automotive, aircraft, etc.), such as ambient air monitoring, worker protection, emissions control, and product quality testing; oil/gas petrochemical applications, such as combustible gas detection, H 2 S monitoring, hazardous leak detection and identification; hazardous spill identification, enclosed space surveying, utility and power applications, such as emissions monitoring and transformer fault detection; food/beverage/agriculture applications, such as freshness detection, fruit ripening control, fermentation process monitoring and control, flavor composition and identification, product quality and identification, and refrigerant and fumigant detection.
- Additional applications include, but are not limited to, cosmetic/perfume applications, such as fragrance formulation, product quality testing, and fingerprinting; chemical/plastics/pharmaceuticals applications, such as fugitive emission identification, leak detection, solvent recovery effectiveness, perimeter monitoring, and product quality testing; hazardous waste site applications, such as fugitive emission detection and identification, leak detection and identification, transportation applications, such as hazardous spill monitoring, refueling operations, shipping container inspection, and diesel/gasoline/aviation fuel identification; building/residential applications, such as natural gas detection, formaldehyde detection, smoke detection, automatic ventilation control (cooking, smoking, etc.), and air intake monitoring; hospital/medical applications, such as anesthesia and sterilization gas detection, infectious disease detection, breath, wound and bodily fluids analysis, and telesurgery.
- cosmetic/perfume applications such as fragrance formulation, product quality testing, and fingerprinting
- chemical/plastics/pharmaceuticals applications such as fugitive emission identification, leak detection, solvent recovery effectiveness, perimeter monitoring, and product quality testing
- Example 1 Fabrication of the chemically sensitive sensor
- the sensor was designed to include eight electrode arrays, wherein eight micro- barriers were disposed on the top surface of a solid substrate and surrounded each electrode array.
- FIG. 5 A schematic representation of SU-8 micro-barrier preparation is shown in Figure 5.
- the SU-8 micro-barrier was made using a photolithography process in clean room facilities.
- the wafer comprising eight electrode arrays was heated by a hot plate at l20°C for 5 minutes.
- After the wafer was cooled down to room temperature, it was coated with negative photoresist SU-8 2002 (purchased from MicroChem Corp., MA, USA) by using a spinner with gradual acceleration (500 rpm for 10 sec, and then an additional spinning of 2000 rpm for 30 sec).
- the wafer was heated by a hot plate at 95°C for 2 minutes followed by UV light exposing through a special mask with intensity of 14 mW/cm 2 for 6 sec.
- the negative photoresist was developed for 1 min using PGMEA developer and washed with isopropyl alcohol. Curing of said wafer was performed by heating on a hot plate at l50°C for 15 minutes. The height of the micro barrier was 2.35 ⁇ 0.05pm.
- micro-barriers Three types were fabricated, which differ in their height, including 2.4, 5.5 and 17.0 pm.
- the thickness of the micro-barriers was 100 pm and their inner diameter was about 1000 pm in each case.
- Core-shell particles including thiol-capped Au NPs were synthesized using two- phase method according to House et al. (J. Chem. Soc., Chem. Com., 1994, 2, 801-802).
- AuCU was first transferred from aqueous HAuCE’xFFO solution to a toluene solution by the phase-transfer reagent. After the organic phase was isolated, solution of thiol and toluene was added to the gold dispersion.
- the mole ratios of thiol: Au were 0.8: 1 for dodecanethiol and 0.7: 1 for 2-ethylhexanethiol -capped Au NPs.
- aqueous solution of reducing agent NaBH 4 in large excess 25 mL, 0.4 M, ice- cooled
- the reaction was stirred at room temperature for at least 3 hours, which produced a dark brown dispersion of the thiol-capped Au NPs.
- the resulting dispersion was subjected to solvent removal in a rotary evaporator and followed by multiple washings using ethanol and toluene.
- the core-shell particles dispersion was deposited onto the substrate and the electrode arrays by nanoprinter dispenser system sciFLEXARRAYER S3 (Scienion company, Germany), a non-contact piezo-dispensing system that allows dispersion of precise drops of 0.3 ⁇ 0.05 nanoliter.
- This inkjet-printing technique allowed dropping the thiol-capped gold NPs dispersion exactly at the middle of the electrode array.
- the obtained device is shown in Figure 6.
- the device consists of eight sensors and a resistor (in the middle) for temperature control. Each sensor is a chemically sensitive sensor comprising gold nanoparticle cores with specific organic ligands shells.
- Example 2 characterization of the dispersions of the core-shell particles
- TEM images show TEM images of thiol-caped Au NPs dispersion, including dodecanethiol-capped Au NPs dispersion ( Figure 7A) and 2-ethylhexaethiol-capped Au NPs dispersion ( Figure 7B).
- Figures 7C-7D show analysis of the metal core size distribution of thiol-caped Au NPs, including dodecanethiol-capped Au NPs ( Figure 7C) and 2-ethylhexaethiol-capped Au NPs ( Figure 7D). Transmission electron micrographs of the thiol-capped Au NPs confirmed the narrow size distribution of the dodecanethiol-capped Au NPs and of 2-ethylhexaethiol- capped Au NPs with a mean diameter of 2.4 nm and 2.2 nm, respectively.
- An additional sensor device was prepared, containing a micro-barrier made of silicon oxide.
- the Si0 2 micro-barrier was made using photolithography process at clean room facilities.
- a wafer comprising eight electrode arrays (as described in Example 1) was heated by a hot plate at l20°C for 5 minutes. After the wafer was cooled down to room temperature then was coated with photoresist AZ 2070 by using a spinner (at 2000 rpm for 60 seconds). Then the wafer was heated by a hot plate at H0°C for 2 minutes followed by ETV light exposing through a special mask with intensity of 14 mW/cm2 for 4 sec. Then the photoresist was developed for 1 min using TMAH developer and washed with DI water.
- Si0 2 was deposited by standard plasma-enhanced chemical vapor deposition system (PECVD Plasma- Therm, Vision 410) under vacuum and then under silane (SiFE) and oxygen atmosphere at l20°C for 2 minutes. Then the wafer was placed in hot N-Methyl-2- pyrrolidone (NMP) for 2 hours followed by sonication in acetone for additional 30 minutes, followed by a lift-off process.
- NMP N-Methyl-2- pyrrolidone
- the Si0 2 micro-barrier had a thickness of 100 pm, inner diameter of about 1000 pm and height of 2.4 pm.
- Example 4 Micro-barrier characterization
- the contact angle is the angle in which the liquid interface meets the solid interface.
- the contact angle is determined by the balance between adhesive and cohesive forces. As the tendency of a drop to spread out over a flat, solid surface increases, the contact angle decreases. Thus, the contact angle provides an inverse measure of wettability. A high contact angle indicates a low wettability, in which the fluid minimizes the contact with the surface. Since the tested fluid is predominantly hydrophilic, a higher contact angle suggests a more hydrophobic surface.
- Figures 8A-8C show goniometer images of the contact angle at different micro- barrier surfaces, including image of SU-8 contact angle (Figure 8A), image of oxygen- plasma treated SU-8 contact angle (Figure 8B), and image of Si0 2 contact angle (Figure 8C).
- the contact angles measured are 90 ⁇ 1° for SU-8 surface, 35 ⁇ 1° for treated SU-8 surface and no contact angle was formed at the Si0 2 surface.
- the untreated SU-8 is therefore a hydrophobic material.
- Figures 9A-9D show SEM images of the SU-8 and Si0 2 micro-barrier surfaces at different magnifications, including image of Si0 2 at lOk magnification ( Figure 9A), image of SU-8 at lOk magnification ( Figure 9B), image of Si0 2 at lk magnification ( Figure 9C), and image of SU-8 at lk magnification ( Figure 9D).
- SEM images of Si0 2 micro-barrier show wrecked edges and uneven and rough surface; which might result from the lift- off step during the preparation of the Si0 2 micro-barrier (Example 3). In contrast, the SEM images of SU-8 micro-barrier show straight edges and smooth surface.
- sensors 12 different types were fabricated as detailed hereinabove in Examples 1 and 3.
- the sensors differed in organic ligand type (dodecanethiol and 2-ethylhexantiol), micro-barrier material (SU-8 and Si0 2 ), micro-barrier height (2.4, 5.5, and 17 pm) and deposited volume of the dispersion (20, 40, and 120 nL). At least 8 similar sensors were tested for each experimental parameter to evaluate the reproducibility of sensors’ responses and morphology. Additionally, the effect of the addition of the micro-barrier was evaluated by comparing said sensors to sensors, which do not include any type of a micro-barrier.
- the response of the sensors to VOCs adsorption was measured as follows.
- the fabricated sensors were mounted on a custom polytetrafluoroethylene PTFE circuit board inside a stainless-steel test chamber with a volume of 100 cm 2 . Exposure to the VOCs was preceded by an initial evacuation step, in which the sensors were placed in vacuum oven for 25 hours (2-ethylhexaethiol-capped Au NPs) or 45 hours (dodecanethiol-capped Au NPs).
- the electric signal i.e., resistance as a function of time
- the electric signal i.e., resistance as a function of time
- a typical exposure cycle involved a 5 min vacuum (40 mtorr) baseline step, followed by 5 min under VOC exposure, and ended under vacuum for another 5 min.
- the sensors were exposed to n-Octane (CAS No. 11-65-9) at four different concentrations: 0, 41.4, 84.2 and 134.4 ppm.
- a parameter which was used to evaluate the sensors detection ability was the amplitude (or response rate %), which indicates sensor signal amplitude at different analyte concentrations.
- Response rate can be calculated by Equation 1 :
- AR/%*l 00 Equation 1 where AR is the baseline-corrected steady-state resistance change upon exposure of the sensor to analyte and i3 ⁇ 4 is the baseline resistance of the sensor in the absence of analyte.
- Figures 10D-10F, 11D-11F, 12D-12F, and 13D-13F show the response rate % at four different concentrations of n-octane.
- R end is relative resistance value at the end of response.
- Example 6 Effect of the micro-barrier material and organic ligand type
- Figures 10A-10F and 11A-11F compare the response of the three different sensor devices to n-octane, including a sensor without a micro-barrier, a sensor with SET-8 micro- barrier and a sensor with Si0 2 micro-barrier. Each device contained 8 individual sensors which were drop casted simultaneously and have the same structural and compositional characteristics. Additionally, two different volumes of the core-shell particles dispersion, including 20nl ( Figures 10A-10F) and 40nl ( Figures 11 A-l 1F) were used to find the optimal casting volume.
- the morphology of the sensing layers obtained with different micro-barrier materials further correlates with morphology studies of the SU-8 and the Si0 2 materials, showing a clear advantage of the SU-8 material which allows fabrication of a micro-barrier having a smooth surface.
- the casted dispersion volume was increased from 20 nL to 40 nL.
- the results were similar to those obtained with 20 nL.
- the addition of a micro-barrier made from Si02 helped to partially restrict the drop area, while the addition of a micro-barrier made of SU-8 polymer, restricts the drop more efficiently and reduced the morphology irregularity of the resulting sensors.
- the lowest VI value was obtained with the micro-barrier made from SU- 8 (Table 1 and Figures 1 1C-11F).
- FIGS 12A-12C show the sensing layer morphology when drop-casting 20 nL of dodecanethiol-based dispersion instead of 2-ethylhexantiol. Similar trend to that observed with the 2-ethylhexanethiol-based dispersion was observed for the three different manufacturing variants: without barrier, micro-barrier made of Si0 2 , and SU-8 polymer, respectively. The VI also followed the same trend, going from 15.2% to 9.2% in the case of the micro-barrier made of SU-8 (Table 1 and Figures 12C-12F).
- Figures 13A-13C show morphology of the sensing layers obtained by drop casting 40nL of a dispersion gold NPs modified with the organic ligand dodecanethiol.
- Figures 13D- 13F show that the sensor response variance was again lowest when using the SU-8 micro- barrier, as VI decreased from 12.6% to 2.5% (Table 1).
- micro-barrier increases morphological and functional uniformity of the sensors.
- fabrication of the micro-barrier from SU8, a hydrophobic material in nature amplifies the effect of the micro- barrier addition and enables fabrication of devices that operate in a more uniform fashion.
- Example 7 Optimization of the drop casted volume and micro-barrier height
- micro-barrier having a height of 2.35 pm.
- the micro-barrier thus forms a cavity, wherein the cavity is filled by the casted drop.
- Figures 14A-14D show light-microscopy images of sensors comprising one electrode array and a sensing layer prepared by deposition of varying volumes of the 5 mg/mL dispersion of dodecanethiol-capped Au NPs in toluene. It can be seen from Figurel4A that when preparing a sensing layer by depositing 15 nL of dodecanethiol-capped Au NPs dispersion without a micro-barrier, the obtained sensing layer was not uniform, as deposits of higher concentration of the NPs can be seen in the center and at the edges of the layer.
- Figure 14B shows that when a micro-barrier was added and the volume of the deposition was reduced to 10 nL, the obtained sensing layer was still non-uniform at the edges and center thereof.
- Figure 14C shows that when the micro-barrier was added and the volume of the deposited dispersion was increased to 22 nL, the obtained sensing layer had non-uniform edges. The most uniform sensing layer was obtained when the micro-barrier was added and the volume of the deposition was 20 nL ( Figure 14D).
- micro-barrier height can influence the formation of coffee rings, on the surface of the drying drop, which in turn can dictate an irregular behavior of sensors’ responses.
- Three different SU-8 micro-barrier heights were tested, including 2.4, 5.5 and l7pm.
- the volume of the deposited dispersion was also varied (20 nL, 40 nL, 120 nL, and 300 nL).
- Tables 2-3 summarize the results of the sensor unction characterization, including VI (Table 2) and response rate amplitude (Table 3).
- the second organic group was chosen again to be dodecanethiol.
- Table 2 further shows that 2.4 and 5.5um micro-barrier heights provided similar VI of 2.5 and 2.6%, respectively. However, each barrier height works best with different drop casting volume. 40nl works best for the 2.5um barrier and l20nl works best for the 5.5um barrier. The amplitude showed a tradeoff between the two micro-barrier heights (Table 3).
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- Combustion & Propulsion (AREA)
- Inorganic Chemistry (AREA)
- Medicinal Chemistry (AREA)
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Abstract
Description
Claims
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US201862753948P | 2018-11-01 | 2018-11-01 | |
| PCT/IL2019/051175 WO2020089901A1 (en) | 2018-11-01 | 2019-10-30 | Chemically sensitive sensor comprising micro-barrier and method of fabrication thereof |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| EP3874259A1 true EP3874259A1 (en) | 2021-09-08 |
| EP3874259A4 EP3874259A4 (en) | 2022-08-10 |
| EP3874259B1 EP3874259B1 (en) | 2025-04-09 |
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Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| EP19880733.1A Active EP3874259B1 (en) | 2018-11-01 | 2019-10-30 | Chemically sensitive sensor comprising micro-barrier and method of fabrication thereof |
Country Status (5)
| Country | Link |
|---|---|
| US (1) | US12196699B2 (en) |
| EP (1) | EP3874259B1 (en) |
| CN (1) | CN113383230A (en) |
| IL (1) | IL282790B1 (en) |
| WO (1) | WO2020089901A1 (en) |
Families Citing this family (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US12415721B2 (en) * | 2020-04-10 | 2025-09-16 | Northeastern University | High rate printing of microscale and nanoscale patterns using interfacial convective assembly |
| US20230124527A1 (en) * | 2021-10-06 | 2023-04-20 | Nanoscent Ltd. | Nanoparticles for chemiresistor sensors |
| US11307158B1 (en) * | 2021-10-06 | 2022-04-19 | Nanoscent Ltd. | Nanoparticles for chemiresistor sensors |
| EP4481373A1 (en) * | 2023-06-23 | 2024-12-25 | Infineon Technologies AG | Chemo-resistive sensor device |
| CN116990352B (en) * | 2023-07-05 | 2026-04-28 | 吉林大学 | A room-temperature self-healing NH3 sensor based on TPA-3DCNPZ and a stacked structure and its fabrication method. |
Family Cites Families (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US7189360B1 (en) * | 2002-01-24 | 2007-03-13 | Sandia Corporation | Circular chemiresistors for microchemical sensors |
| US7179421B1 (en) | 2002-01-24 | 2007-02-20 | Sandia Corporation | Multi-pin chemiresistors for microchemical sensors |
| JP2005003593A (en) | 2003-06-13 | 2005-01-06 | Oji Paper Co Ltd | Electrochemical measurement electrode |
| US8153439B2 (en) * | 2007-07-26 | 2012-04-10 | University of Lousiville Research Foundation, Inc. | Chemical sensors for detecting volatile organic compounds and methods of use |
| EP2215464B1 (en) * | 2007-11-20 | 2015-10-07 | Technion Research & Development Foundation Ltd. | Sensor system, use of sensor and method for sensing based on cubic nanoparticles capped with an organic coating |
| US7922939B2 (en) | 2008-10-03 | 2011-04-12 | The Board Of Trustees Of The University Of Illinois | Metal nanoparticle inks |
| WO2010079491A1 (en) | 2009-01-09 | 2010-07-15 | Technion Research And Development Foundation Ltd. | Volatile organic compounds as diagnostic markers in the breath for lung cancer |
| US8802568B2 (en) | 2012-09-27 | 2014-08-12 | Sensirion Ag | Method for manufacturing chemical sensor with multiple sensor cells |
| US11371951B2 (en) * | 2012-09-27 | 2022-06-28 | Sensirion Ag | Gas sensor comprising a set of one or more sensor cells |
| EP3337755B1 (en) * | 2015-08-17 | 2023-04-19 | Technion Research & Development Foundation Limited | Self-healing platform unit for pressure and analyte sensing |
-
2019
- 2019-10-30 CN CN201980087532.4A patent/CN113383230A/en active Pending
- 2019-10-30 US US17/289,422 patent/US12196699B2/en active Active
- 2019-10-30 IL IL282790A patent/IL282790B1/en unknown
- 2019-10-30 EP EP19880733.1A patent/EP3874259B1/en active Active
- 2019-10-30 WO PCT/IL2019/051175 patent/WO2020089901A1/en not_active Ceased
Also Published As
| Publication number | Publication date |
|---|---|
| CN113383230A (en) | 2021-09-10 |
| US12196699B2 (en) | 2025-01-14 |
| EP3874259A4 (en) | 2022-08-10 |
| US20210364461A1 (en) | 2021-11-25 |
| IL282790B1 (en) | 2026-04-01 |
| WO2020089901A1 (en) | 2020-05-07 |
| EP3874259B1 (en) | 2025-04-09 |
| WO2020089901A9 (en) | 2021-05-14 |
| IL282790A (en) | 2021-06-30 |
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