EP3418332A4 - Chromogenic composition, planographic printing original plate, method for producing planographic printing plate, and chromogenic compound - Google Patents

Chromogenic composition, planographic printing original plate, method for producing planographic printing plate, and chromogenic compound Download PDF

Info

Publication number
EP3418332A4
EP3418332A4 EP17753139.9A EP17753139A EP3418332A4 EP 3418332 A4 EP3418332 A4 EP 3418332A4 EP 17753139 A EP17753139 A EP 17753139A EP 3418332 A4 EP3418332 A4 EP 3418332A4
Authority
EP
European Patent Office
Prior art keywords
planographic printing
chromogenic
plate
producing
composition
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
EP17753139.9A
Other languages
German (de)
French (fr)
Other versions
EP3418332A1 (en
EP3418332B1 (en
Inventor
Takeshi Inasaki
Keisuke Nogoshi
Hiroaki Idei
Akio Mizuno
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujifilm Corp
Original Assignee
Fujifilm Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujifilm Corp filed Critical Fujifilm Corp
Publication of EP3418332A1 publication Critical patent/EP3418332A1/en
Publication of EP3418332A4 publication Critical patent/EP3418332A4/en
Application granted granted Critical
Publication of EP3418332B1 publication Critical patent/EP3418332B1/en
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/105—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having substances, e.g. indicators, for forming visible images
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
    • B41C1/00—Forme preparation
    • B41C1/10—Forme preparation for lithographic printing; Master sheets for transferring a lithographic image to the forme
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
    • B41C1/00—Forme preparation
    • B41C1/10—Forme preparation for lithographic printing; Master sheets for transferring a lithographic image to the forme
    • B41C1/1008—Forme preparation for lithographic printing; Master sheets for transferring a lithographic image to the forme by removal or destruction of lithographic material on the lithographic support, e.g. by laser or spark ablation; by the use of materials rendered soluble or insoluble by heat exposure, e.g. by heat produced from a light to heat transforming system; by on-the-press exposure or on-the-press development, e.g. by the fountain of photolithographic materials
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41N—PRINTING PLATES OR FOILS; MATERIALS FOR SURFACES USED IN PRINTING MACHINES FOR PRINTING, INKING, DAMPING, OR THE LIKE; PREPARING SUCH SURFACES FOR USE AND CONSERVING THEM
    • B41N1/00—Printing plates or foils; Materials therefor
    • B41N1/12—Printing plates or foils; Materials therefor non-metallic other than stone, e.g. printing plates or foils comprising inorganic materials in an organic matrix
    • B41N1/14—Lithographic printing foils
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09B—ORGANIC DYES OR CLOSELY-RELATED COMPOUNDS FOR PRODUCING DYES, e.g. PIGMENTS; MORDANTS; LAKES
    • C09B11/00—Diaryl- or thriarylmethane dyes
    • C09B11/04—Diaryl- or thriarylmethane dyes derived from triarylmethanes, i.e. central C-atom is substituted by amino, cyano, alkyl
    • C09B11/10—Amino derivatives of triarylmethanes
    • C09B11/24—Phthaleins containing amino groups ; Phthalanes; Fluoranes; Phthalides; Rhodamine dyes; Phthaleins having heterocyclic aryl rings; Lactone or lactame forms of triarylmethane dyes
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09B—ORGANIC DYES OR CLOSELY-RELATED COMPOUNDS FOR PRODUCING DYES, e.g. PIGMENTS; MORDANTS; LAKES
    • C09B23/00—Methine or polymethine dyes, e.g. cyanine dyes
    • C09B23/0008—Methine or polymethine dyes, e.g. cyanine dyes substituted on the polymethine chain
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09B—ORGANIC DYES OR CLOSELY-RELATED COMPOUNDS FOR PRODUCING DYES, e.g. PIGMENTS; MORDANTS; LAKES
    • C09B23/00—Methine or polymethine dyes, e.g. cyanine dyes
    • C09B23/0008—Methine or polymethine dyes, e.g. cyanine dyes substituted on the polymethine chain
    • C09B23/0016—Methine or polymethine dyes, e.g. cyanine dyes substituted on the polymethine chain the substituent being a halogen atom
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09B—ORGANIC DYES OR CLOSELY-RELATED COMPOUNDS FOR PRODUCING DYES, e.g. PIGMENTS; MORDANTS; LAKES
    • C09B23/00—Methine or polymethine dyes, e.g. cyanine dyes
    • C09B23/0008—Methine or polymethine dyes, e.g. cyanine dyes substituted on the polymethine chain
    • C09B23/0025—Methine or polymethine dyes, e.g. cyanine dyes substituted on the polymethine chain the substituent being bound through an oxygen atom
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09B—ORGANIC DYES OR CLOSELY-RELATED COMPOUNDS FOR PRODUCING DYES, e.g. PIGMENTS; MORDANTS; LAKES
    • C09B23/00—Methine or polymethine dyes, e.g. cyanine dyes
    • C09B23/0066—Methine or polymethine dyes, e.g. cyanine dyes the polymethine chain being part of a carbocyclic ring,(e.g. benzene, naphtalene, cyclohexene, cyclobutenene-quadratic acid)
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0045—Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/029—Inorganic compounds; Onium compounds; Organic compounds having hetero atoms other than oxygen, nitrogen or sulfur
    • G03F7/0295—Photolytic halogen compounds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • G03F7/033—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/16—Coating processes; Apparatus therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/16—Coating processes; Apparatus therefor
    • G03F7/168—Finishing the coated layer, e.g. drying, baking, soaking
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2002—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image
    • G03F7/2004—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image characterised by the use of a particular light source, e.g. fluorescent lamps or deep UV light
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2002—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image
    • G03F7/2004—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image characterised by the use of a particular light source, e.g. fluorescent lamps or deep UV light
    • G03F7/2006—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image characterised by the use of a particular light source, e.g. fluorescent lamps or deep UV light using coherent light; using polarised light
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
    • B41C2201/00—Location, type or constituents of the non-imaging layers in lithographic printing formes
    • B41C2201/02—Cover layers; Protective layers
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
    • B41C2210/00—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation
    • B41C2210/08—Developable by water or the fountain solution

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Architecture (AREA)
  • Structural Engineering (AREA)
  • Thermal Sciences (AREA)
  • Optics & Photonics (AREA)
  • Inorganic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials For Photolithography (AREA)
  • Printing Plates And Materials Therefor (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
EP17753139.9A 2016-02-19 2017-02-13 Chromogenic composition, planographic printing original plate, method for producing planographic printing plate, and chromogenic compound Active EP3418332B1 (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2016030505 2016-02-19
JP2017021607 2017-02-08
PCT/JP2017/005199 WO2017141882A1 (en) 2016-02-19 2017-02-13 Chromogenic composition, planographic printing original plate, method for producing planographic printing plate, and chromogenic compound

Publications (3)

Publication Number Publication Date
EP3418332A1 EP3418332A1 (en) 2018-12-26
EP3418332A4 true EP3418332A4 (en) 2019-03-20
EP3418332B1 EP3418332B1 (en) 2021-08-25

Family

ID=59625870

Family Applications (1)

Application Number Title Priority Date Filing Date
EP17753139.9A Active EP3418332B1 (en) 2016-02-19 2017-02-13 Chromogenic composition, planographic printing original plate, method for producing planographic printing plate, and chromogenic compound

Country Status (6)

Country Link
US (1) US10921712B2 (en)
EP (1) EP3418332B1 (en)
JP (1) JP6785295B2 (en)
CN (1) CN108699344B (en)
BR (1) BR112018016993B1 (en)
WO (1) WO2017141882A1 (en)

Families Citing this family (32)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN109642148B (en) 2016-08-31 2022-02-11 富士胶片株式会社 Color developing composition, lithographic printing plate precursor, method for producing lithographic printing plate, and compound
WO2018092661A1 (en) 2016-11-16 2018-05-24 富士フイルム株式会社 Radiation sensitive composition, original plate for lithographic printing plate, and method of manufacturing lithographic printing plate
JP6934939B2 (en) * 2017-05-31 2021-09-15 富士フイルム株式会社 How to make a lithographic printing plate original plate and a lithographic printing plate
CN110809521B (en) * 2017-06-30 2022-01-07 富士胶片株式会社 Lithographic printing plate precursor and method for producing lithographic printing plate
JP6832431B2 (en) * 2017-07-25 2021-02-24 富士フイルム株式会社 Planographic printing plate original plate, method for producing lithographic printing plate, and color-developing composition
WO2020090995A1 (en) * 2018-10-31 2020-05-07 富士フイルム株式会社 Lithographic printing plate original plate, method for producing lithographic printing plate and lithographic printing method
JP2020069790A (en) * 2018-10-31 2020-05-07 富士フイルム株式会社 Lithographic printing plate original plate, method for producing lithographic printing plate and lithographic printing method
JP2020069789A (en) * 2018-10-31 2020-05-07 富士フイルム株式会社 Lithographic printing plate original plate, method for producing lithographic printing plate and lithographic printing method
CN113168090A (en) 2018-12-10 2021-07-23 旭化成株式会社 Flexographic printing original plate and method for producing flexographic printing plate
JP7282886B2 (en) * 2019-06-28 2023-05-29 富士フイルム株式会社 On-machine development type lithographic printing plate precursor, method for preparing lithographic printing plate, and lithographic printing method
CN114051459B (en) 2019-06-28 2024-07-23 富士胶片株式会社 Lithographic printing plate precursor, method for producing lithographic printing plate, and lithographic printing method
WO2020262696A1 (en) 2019-06-28 2020-12-30 富士フイルム株式会社 Original plate for on-press development type lithographic printing plate, method for fabricating lithographic printing plate, and lithographic printing method
WO2020262688A1 (en) * 2019-06-28 2020-12-30 富士フイルム株式会社 Lithographic printing plate original plate, method for fabricating lithographic printing plate, and lithographic printing method
WO2020262686A1 (en) 2019-06-28 2020-12-30 富士フイルム株式会社 Original plate for on-press development type lithographic printing plate, method for fabricating lithographic printing plate, and lithographic printing method
JP7562527B2 (en) * 2019-06-28 2024-10-07 富士フイルム株式会社 Planographic printing plate original plate, method for preparing a planographic printing plate, and planographic printing method
WO2020262687A1 (en) * 2019-06-28 2020-12-30 富士フイルム株式会社 Planographic printing original plate, method for producing planographic printing plate, and planographic printing method
WO2020262692A1 (en) 2019-06-28 2020-12-30 富士フイルム株式会社 Original plate for on-press development type lithographic printing plate, method for fabricating lithographic printing plate, and lithographic printing method
EP3991985A4 (en) 2019-06-28 2022-09-07 FUJIFILM Corporation Planographic printing original plate, method for producing planographic printing plate, and planographic printing method
CN114072290B (en) 2019-06-28 2024-04-30 富士胶片株式会社 On-press development type lithographic printing plate precursor, method for producing lithographic printing plate, and lithographic printing method
US20210078350A1 (en) 2019-09-17 2021-03-18 Eastman Kodak Company Lithographic printing plate precursor and method of use
EP4082791B1 (en) 2019-12-27 2024-10-16 FUJIFILM Corporation Lithographic printing method
US11714354B2 (en) 2020-03-25 2023-08-01 Eastman Kodak Company Lithographic printing plate precursor and method of use
WO2021241519A1 (en) 2020-05-29 2021-12-02 富士フイルム株式会社 On-press-development-type lithographic printing plate precursor, lithographic printing plate production method, and lithographic printing method
JPWO2021241518A1 (en) 2020-05-29 2021-12-02
EP4159441A4 (en) 2020-05-29 2023-10-18 FUJIFILM Corporation Original plate for on-machine development type lithographic printing plate, lithographic printing plate manufacturing method, and lithographic printing method
EP4186708A4 (en) 2020-07-21 2023-12-13 FUJIFILM Corporation On-machine-developing-type planographic printing plate original plate, method for manufacturing planographic printing plate, and planographic printing method
CN112279804A (en) * 2020-11-20 2021-01-29 上海凌凯医药科技有限公司 Method for preparing 2-chloro-4-neopentyl pyridine
WO2022181724A1 (en) * 2021-02-26 2022-09-01 富士フイルム株式会社 On-press-development-type planographic printing plate precursor, method for fabricating planographic printing plate, planographic printing method, and coloring agent
WO2022212032A1 (en) 2021-04-01 2022-10-06 Eastman Kodak Company Lithographic printing plate precursor and method of use
US20230091079A1 (en) * 2021-07-23 2023-03-23 Eastman Kodak Company Lithographic printing plate precursor and method of use
US20230314935A1 (en) 2022-03-03 2023-10-05 Eastman Kodak Company Lithographic printing plate precursor and method of use
US20240069439A1 (en) 2022-08-12 2024-02-29 Eastman Kodak Company Lithographic printing plate precursor and method of use

Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2010033182A1 (en) * 2008-09-19 2010-03-25 Eastman Kodak Company On-press developable imageable elements
WO2015115598A1 (en) * 2014-01-31 2015-08-06 富士フイルム株式会社 Infrared-sensitive color developing composition, lithographic printing original plate, plate making method for lithographic printing plate, and infrared-sensitive color developer
EP2963495A1 (en) * 2013-02-27 2016-01-06 FUJIFILM Corporation Infrared-sensitive chromogenic composition, infrared-curable chromogenic composition, lithographic printing plate precursor, and plate formation method
WO2016027886A1 (en) * 2014-08-22 2016-02-25 富士フイルム株式会社 Color developing composition, lithographic printing original plate, method for making lithographic printing plate, and color developer
JP2017013318A (en) * 2015-06-30 2017-01-19 富士フイルム株式会社 Planographic printing original plate and method for producing planographic printing plate
WO2018043125A1 (en) * 2016-08-31 2018-03-08 富士フイルム株式会社 Presensitized plate and plate-making method using same

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2521702B2 (en) * 1985-04-26 1996-08-07 株式会社リコー Optical information recording medium
ATE421921T1 (en) 2004-07-08 2009-02-15 Agfa Graphics Nv METHOD FOR PRODUCING A PRECURSOR FOR A NEGATIVE HEAT SENSITIVE LITHOGRAPHIC PRINTING PLATE
US7425406B2 (en) * 2004-07-27 2008-09-16 Fujifilm Corporation Lithographic printing plate precursor and lithographic printing method
JP4705817B2 (en) * 2004-07-27 2011-06-22 富士フイルム株式会社 Planographic printing plate precursor and planographic printing method
ATE391014T1 (en) 2005-06-21 2008-04-15 Agfa Graphics Nv HEAT SENSITIVE IMAGE RECORDING ELEMENT
JP2013199089A (en) 2012-03-26 2013-10-03 Fujifilm Corp Infrared color-developing curable composition, lithographic printing plate original plate and plate making method
JP6523981B2 (en) * 2016-01-29 2019-06-05 富士フイルム株式会社 Negative-working lithographic printing plate precursor and method of preparing lithographic printing plate

Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2010033182A1 (en) * 2008-09-19 2010-03-25 Eastman Kodak Company On-press developable imageable elements
EP2963495A1 (en) * 2013-02-27 2016-01-06 FUJIFILM Corporation Infrared-sensitive chromogenic composition, infrared-curable chromogenic composition, lithographic printing plate precursor, and plate formation method
WO2015115598A1 (en) * 2014-01-31 2015-08-06 富士フイルム株式会社 Infrared-sensitive color developing composition, lithographic printing original plate, plate making method for lithographic printing plate, and infrared-sensitive color developer
WO2016027886A1 (en) * 2014-08-22 2016-02-25 富士フイルム株式会社 Color developing composition, lithographic printing original plate, method for making lithographic printing plate, and color developer
JP2017013318A (en) * 2015-06-30 2017-01-19 富士フイルム株式会社 Planographic printing original plate and method for producing planographic printing plate
WO2018043125A1 (en) * 2016-08-31 2018-03-08 富士フイルム株式会社 Presensitized plate and plate-making method using same

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
See also references of WO2017141882A1 *

Also Published As

Publication number Publication date
EP3418332A1 (en) 2018-12-26
WO2017141882A1 (en) 2017-08-24
BR112018016993B1 (en) 2022-12-13
JP6785295B2 (en) 2020-11-18
JPWO2017141882A1 (en) 2018-12-27
CN108699344B (en) 2020-12-04
BR112018016993A2 (en) 2018-12-26
US10921712B2 (en) 2021-02-16
US20180356730A1 (en) 2018-12-13
CN108699344A (en) 2018-10-23
EP3418332B1 (en) 2021-08-25

Similar Documents

Publication Publication Date Title
EP3418332A4 (en) Chromogenic composition, planographic printing original plate, method for producing planographic printing plate, and chromogenic compound
EP3508553A4 (en) Color-assuming composition, lithographic printing plate precursor, method for forming lithographic printing plate, and compound
EP3594009A4 (en) Lithographic printing plate original plate, and method for producing lithographic printing plate
EP3476616A4 (en) Planographic printing plate original plate, method for manufacturing planographic printing plate, and printing method
EP3511172A4 (en) Planographic printing original plate and method for manufacturing same, planographic printing original plate laminate, and planographic printing method
EP3590975A4 (en) Curable composition, lithographic printing plate precursor, method for preparing lithographic printing plate, and compound
EP3543790A4 (en) Radiation sensitive composition, original plate for lithographic printing plate, and method of manufacturing lithographic printing plate
EP3456547A4 (en) Original plate for lithographic printing plate, method for platemaking lithographic printing plate, and lithographic printing method
EP3747661A4 (en) Lithographic plate original plate, and method for producing lithographic plate
EP3251868A4 (en) Lithographic printing plate master, manufacturing method therefor, and printing method using same
EP3647069A4 (en) Lithographic printing original plate and method for producing lithographic printing plate
EP3409499A4 (en) Lithographic printing original plate and plate making method for lithographic printing plates
EP3660588A4 (en) Lithographic printing plate original plate, method for producing lithographic printing plate, and chromogenic composition
EP3511174A4 (en) Planographic printing plate original plate, method for manufacturing planographic printing plate, and planographic printing method
EP3318413A4 (en) Flexographic printing plate, original plate of flexographic printing plate, and manufacturing method therefor
EP3260917A4 (en) Photosensitive resin composition, planographic printing original plate, method for producing planographic printing plate, and polymer compound
EP3257685A4 (en) Lithographic printing original plate, method for manufacturing same, and printing method using same
EP3409498A4 (en) Lithographic printing original plate for on-press development, method for producing lithographic printing plate and lithographic printing method
EP3875282A4 (en) Lithographic printing plate original plate, method for producing lithographic printing plate and lithographic printing method
EP3202586A4 (en) Lithographic printing plate master, manufacturing method therefor, and printing method using same
EP3128369A4 (en) Photosensitive resin composition, lithographic printing original plate and method for producing lithographic printing plate
EP3263355A4 (en) Original plate of planographic printing plate, plate-making method for planographic printing plate, and printing method
EP3330097A4 (en) Lithographic printing original plate and plate making method
EP3219504A4 (en) Waterless planographic printing original plate, and method for manufacturing printed matter using waterless planographic printing plate
EP3437894A4 (en) Lithographic printing plate original plate and laminate thereof and method for manufacturing lithographic printing plate original plate

Legal Events

Date Code Title Description
STAA Information on the status of an ep patent application or granted ep patent

Free format text: STATUS: THE INTERNATIONAL PUBLICATION HAS BEEN MADE

PUAI Public reference made under article 153(3) epc to a published international application that has entered the european phase

Free format text: ORIGINAL CODE: 0009012

STAA Information on the status of an ep patent application or granted ep patent

Free format text: STATUS: REQUEST FOR EXAMINATION WAS MADE

17P Request for examination filed

Effective date: 20180817

AK Designated contracting states

Kind code of ref document: A1

Designated state(s): AL AT BE BG CH CY CZ DE DK EE ES FI FR GB GR HR HU IE IS IT LI LT LU LV MC MK MT NL NO PL PT RO RS SE SI SK SM TR

AX Request for extension of the european patent

Extension state: BA ME

REG Reference to a national code

Ref country code: DE

Ref legal event code: R079

Ref document number: 602017044744

Country of ref document: DE

Free format text: PREVIOUS MAIN CLASS: C09B0023000000

Ipc: C09B0011240000

A4 Supplementary search report drawn up and despatched

Effective date: 20190219

RIC1 Information provided on ipc code assigned before grant

Ipc: B41C 1/10 20060101ALI20190213BHEP

Ipc: G03F 7/16 20060101ALI20190213BHEP

Ipc: G03F 7/00 20060101ALI20190213BHEP

Ipc: G03F 7/033 20060101ALI20190213BHEP

Ipc: G03F 7/105 20060101ALI20190213BHEP

Ipc: G03F 7/004 20060101ALI20190213BHEP

Ipc: C09B 11/24 20060101AFI20190213BHEP

Ipc: G03F 7/027 20060101ALI20190213BHEP

Ipc: C09B 67/20 20060101ALI20190213BHEP

Ipc: G03F 7/26 20060101ALI20190213BHEP

Ipc: C09K 9/02 20060101ALI20190213BHEP

Ipc: G03F 7/20 20060101ALI20190213BHEP

Ipc: G03F 7/029 20060101ALI20190213BHEP

Ipc: C09B 23/01 20060101ALI20190213BHEP

Ipc: G03F 7/11 20060101ALI20190213BHEP

DAV Request for validation of the european patent (deleted)
DAX Request for extension of the european patent (deleted)
STAA Information on the status of an ep patent application or granted ep patent

Free format text: STATUS: EXAMINATION IS IN PROGRESS

17Q First examination report despatched

Effective date: 20201022

STAA Information on the status of an ep patent application or granted ep patent

Free format text: STATUS: EXAMINATION IS IN PROGRESS

RAP3 Party data changed (applicant data changed or rights of an application transferred)

Owner name: FUJIFILM CORPORATION

GRAP Despatch of communication of intention to grant a patent

Free format text: ORIGINAL CODE: EPIDOSNIGR1

STAA Information on the status of an ep patent application or granted ep patent

Free format text: STATUS: GRANT OF PATENT IS INTENDED

INTG Intention to grant announced

Effective date: 20210514

GRAS Grant fee paid

Free format text: ORIGINAL CODE: EPIDOSNIGR3

GRAA (expected) grant

Free format text: ORIGINAL CODE: 0009210

STAA Information on the status of an ep patent application or granted ep patent

Free format text: STATUS: THE PATENT HAS BEEN GRANTED

AK Designated contracting states

Kind code of ref document: B1

Designated state(s): AL AT BE BG CH CY CZ DE DK EE ES FI FR GB GR HR HU IE IS IT LI LT LU LV MC MK MT NL NO PL PT RO RS SE SI SK SM TR

REG Reference to a national code

Ref country code: CH

Ref legal event code: EP

REG Reference to a national code

Ref country code: DE

Ref legal event code: R096

Ref document number: 602017044744

Country of ref document: DE

REG Reference to a national code

Ref country code: IE

Ref legal event code: FG4D

Ref country code: AT

Ref legal event code: REF

Ref document number: 1423776

Country of ref document: AT

Kind code of ref document: T

Effective date: 20210915

REG Reference to a national code

Ref country code: LT

Ref legal event code: MG9D

REG Reference to a national code

Ref country code: NL

Ref legal event code: MP

Effective date: 20210825

REG Reference to a national code

Ref country code: AT

Ref legal event code: MK05

Ref document number: 1423776

Country of ref document: AT

Kind code of ref document: T

Effective date: 20210825

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: ES

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20210825

Ref country code: FI

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20210825

Ref country code: PT

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20211227

Ref country code: NO

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20211125

Ref country code: LT

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20210825

Ref country code: AT

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20210825

Ref country code: BG

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20211125

Ref country code: SE

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20210825

Ref country code: RS

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20210825

Ref country code: HR

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20210825

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: PL

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20210825

Ref country code: LV

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20210825

Ref country code: GR

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20211126

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: NL

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20210825

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: DK

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20210825

REG Reference to a national code

Ref country code: DE

Ref legal event code: R097

Ref document number: 602017044744

Country of ref document: DE

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: SM

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20210825

Ref country code: SK

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20210825

Ref country code: RO

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20210825

Ref country code: EE

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20210825

Ref country code: CZ

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20210825

Ref country code: AL

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20210825

PLBE No opposition filed within time limit

Free format text: ORIGINAL CODE: 0009261

STAA Information on the status of an ep patent application or granted ep patent

Free format text: STATUS: NO OPPOSITION FILED WITHIN TIME LIMIT

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: IT

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20210825

26N No opposition filed

Effective date: 20220527

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: SI

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20210825

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: MC

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20210825

REG Reference to a national code

Ref country code: CH

Ref legal event code: PL

REG Reference to a national code

Ref country code: BE

Ref legal event code: MM

Effective date: 20220228

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: LU

Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES

Effective date: 20220213

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: FR

Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES

Effective date: 20220228

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: LI

Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES

Effective date: 20220228

Ref country code: IE

Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES

Effective date: 20220213

Ref country code: CH

Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES

Effective date: 20220228

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: BE

Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES

Effective date: 20220228

P01 Opt-out of the competence of the unified patent court (upc) registered

Effective date: 20230515

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: HU

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT; INVALID AB INITIO

Effective date: 20170213

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: MK

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20210825

Ref country code: CY

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20210825

PGFP Annual fee paid to national office [announced via postgrant information from national office to epo]

Ref country code: DE

Payment date: 20231228

Year of fee payment: 8

Ref country code: GB

Payment date: 20240108

Year of fee payment: 8

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: MT

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20210825