EP2926378A1 - Optical component and photovoltaic device - Google Patents

Optical component and photovoltaic device

Info

Publication number
EP2926378A1
EP2926378A1 EP13857890.1A EP13857890A EP2926378A1 EP 2926378 A1 EP2926378 A1 EP 2926378A1 EP 13857890 A EP13857890 A EP 13857890A EP 2926378 A1 EP2926378 A1 EP 2926378A1
Authority
EP
European Patent Office
Prior art keywords
optical component
antireflection layer
particles
suspension liquid
substrate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
EP13857890.1A
Other languages
German (de)
French (fr)
Other versions
EP2926378A4 (en
Inventor
Yunxin GU
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Saint Gobain Glass France SAS
Compagnie de Saint Gobain SA
Original Assignee
Saint Gobain Glass France SAS
Compagnie de Saint Gobain SA
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Saint Gobain Glass France SAS, Compagnie de Saint Gobain SA filed Critical Saint Gobain Glass France SAS
Publication of EP2926378A1 publication Critical patent/EP2926378A1/en
Publication of EP2926378A4 publication Critical patent/EP2926378A4/en
Withdrawn legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
    • H10F77/00—Constructional details of devices covered by this subclass
    • H10F77/30—Coatings
    • H10F77/306—Coatings for devices having potential barriers
    • H10F77/311—Coatings for devices having potential barriers for photovoltaic cells
    • H10F77/315—Coatings for devices having potential barriers for photovoltaic cells the coatings being antireflective or having enhancing optical properties
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
    • G02B1/11—Anti-reflection coatings
    • G02B1/113—Anti-reflection coatings using inorganic layer materials only
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
    • H10F77/00—Constructional details of devices covered by this subclass
    • H10F77/70—Surface textures, e.g. pyramid structures
    • H10F77/707—Surface textures, e.g. pyramid structures of the substrates or of layers on substrates, e.g. textured ITO layer on a glass substrate
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
    • Y02E10/00—Energy generation through renewable energy sources
    • Y02E10/50—Photovoltaic [PV] energy

Definitions

  • the present disclosure generally relates to optical material field, and more particularly, to an optical component and a photovoltaic device.
  • an antireflection layer may be formed on the substrate to reduce light reflection.
  • the refractive index of the antireflection layer equals to the square root of a product of refractive indexes of the air and the substrate (a refractive indexes matching condition)
  • the thickness of the antireflection layer equals to one fourth of the light wavelength (a thickness matching condition)
  • the antireflection layer may reduce reflection of lights having the wavelength effectively.
  • the antireflection layer may be an antireflection layer with moth-eye structure, a porous silicon oxide layer, or a multi-layer antireflection coating including high refractive index material and low refractive index material alternatively stacked, etc.
  • the conventional antireflection layers mentioned above are usually not provided with the property of contamination resistance.
  • the antireflection layer needs to be coated with an additional layer, such as a low surface energy layer, which may adversely influence the antireflection effect.
  • embodiments of this disclosure provide an antireflection film having property of contamination resistance.
  • a contamination-resistant layer may be formed on an antireflection film, which may not cause substantial degradation of antireflection effect.
  • an optical component which may include: a substrate; and a first antireflection layer which comprises a packing medium and a particle array comprising a plurality of particles, wherein the packing medium fills at least in part voids formed between the plurality of particles.
  • the first antireflection layer having the above-mentioned structure may have properties of both antireflection and contamination resistance.
  • the optical component further comprises a second antireflection layer between the substrate and first antireflection layer.
  • the second antireflection layer may include a plurality of silica microspheres and voids formed between the plurality of silica microspheres.
  • the plurality of silica microspheres may have a diameter ranging from lOnm to 20nm.
  • the plurality of particles may be microspheres which have a diameter ranging from 80nm to 250nm.
  • the packing medium may include a plurality of nanoparticles.
  • the plurality of particles and the plurality of nanoparticles may be one or more selected from silica microspheres, titanium oxide microspheres, aluminum oxide microspheres and zirconium oxide microspheres.
  • the plurality of nanoparticles may include silica microspheres having a diameter ranging from 7nm to 12nm, and the plurality of particles may include silica microspheres having a diameter ranging from 80nm to 250nm.
  • the packing medium may fill at least 90% of the voids formed between the plurality of particles.
  • the plurality of particles and the packing medium may be integrated as a whole.
  • a photovoltaic device which may include an optical component provided in embodiments of the disclosure, wherein the optical component comprises a transparent substrate; and a solar cell, located on a side of the substrate on which the first antireflection layer is not located.
  • FIG. 1 schematically illustrates a cross-sectional view of an optical component 100 according to one embodiment of the present disclosure
  • FIG. 2 schematically illustrates a cross-sectional view of an optical component 200 according to one embodiment of the present disclosure
  • FIG. 3 schematically illustrates a cross-sectional view of an optical component 300 according to one embodiment of the present disclosure
  • FIG. 4 schematically illustrates a cross-sectional view of an optical component 400 according to one embodiment of the present disclosure
  • FIG. 5 schematically illustrates a cross-sectional view of an optical component 500 according to one embodiment of the present disclosure
  • FIG. 6 schematically illustrates a flow chart of a method for forming an optical component according to one embodiment of the present disclosure
  • FIG. 7 schematically illustrates a flow chart of a method for forming an optical component according to another embodiment of the present disclosure
  • FIG. 8 schematically illustrates a flow chart of a process S300 shown in FIG. 7 according to one embodiment of the present disclosure
  • FIG. 9 schematically illustrates a flow chart of a process S200 shown in FIG. 6 or FIG. 7 according to one embodiment of the present disclosure
  • FIG. 10 schematically illustrates a flow chart of a process S200 shown in FIG. 6 or FIG. 7 according to another embodiment of the present disclosure
  • FIG. 11 schematically illustrates a transmission spectrum of an exemplary optical component 100 according to one embodiment of the present disclosure.
  • FIG. 12 schematically illustrates a transmission spectrum of an exemplary optical component 200 according to one embodiment of the present disclosure.
  • a device provided in embodiments of the present disclosure is described with reference to a method for forming the same device. It should be noted that the device is independent from the method. In other words, the device provided in embodiments of the present disclosure may be formed with other methods, and the method provided in embodiments of the present disclosure is not limited to obtain the device disclosed in the embodiments.
  • FIG. 6 schematically illustrates a flow chart of a method for forming an optical component according to one embodiment of the present disclosure.
  • a substrate is provided.
  • the substrate may be made of any suitable material, including but not limited to, glass, metal, polymer or semiconductor.
  • the substrate may have any suitable shape, such as a flat surface, a curved surface, etc.
  • a first antireflection layer is formed.
  • the first antireflection layer includes a packing medium and a particle array including a plurality of particles.
  • the packing medium fills at least in part voids formed between the plurality of particles.
  • An optical component 100 shown in FIG. 1 may be formed by using the method shown in FIG. 6.
  • the optical component 100 includes a substrate 120 and a first antireflection layer 140 formed thereon.
  • the first antireflection layer 140 includes a particle array including a plurality of particles 142, and a packing medium 144 which fills voids formed between the plurality of particles 142 in part.
  • the packing medium 144 includes a plurality of nanoparticles, each of which has a diameter significantly less than that of the particles 142. That is, the first antireflection layer 140 has a heterogeneous particle structure.
  • the first antireflection layer 140 having a heterogeneous particle structure has properties of both antireflection and contamination resistance. That is, there is no need to coat a contamination-resistant layer on the antireflection layer, which may avoid potential degradation of antireflection effect caused by the contamination-resistant layer.
  • the phenomenon mentioned above may be interpreted as follows.
  • the particle array formed by large-size particles 142 has a suitable roughness, which makes the heterogeneous particle structure have the capability of resisting contamination.
  • the small-size nanoparticles 144 can avoid a sudden change of the refractive index at the interface between the heterogeneous particle structure and the substrate, which makes the heterogeneous particle structure have the antireflective property.
  • the refractive index of the first antireflection layer 140 changes gradually from the top surface of the nanoparticles 144 to the interface between the heterogeneous particle structure and the substrate 120. Otherwise, if there are no nanoparticles 144, the refractive index may change sharply at the interface between the particles 142 and the substrate 120.
  • particle array is intended to refer to a single-layer array including the plurality of particles 142.
  • an array having a local multi-layer structure such as a double layer which may appear due to limited experiment condition, also belongs to the scope of the term “particle array” disclosed herein.
  • the arrangement of the plurality of particles 142 may be ordered or disordered.
  • the plurality of particles 142 may include, but not limited to, silicon oxide, titanium oxide, aluminum oxide or zirconium oxide.
  • the plurality of particles 142 may have a shape of sphere, regular dodecahedron, triacontahedron or irregular polyhedron, or have any other suitable shape.
  • the size of the particles 142 may be selected according to the thickness of the conventional single-layer antireflection layer, such as a magnesium fluoride layer, a porous silicon oxide layer.
  • the particles 142 When the plurality of particles 142 are microspheres which are configured closely and voids formed between the plurality of particles is filled with the plurality of nanoparticles 144, the particles 142 may have a diameter substantially equal to the thickness of the single-layer antireflection layer. When the plurality of particles 142 are microspheres which are configured closely and the degree of filling for the voids formed between the plurality of particles exceeds 90%, the particles 142 may have a radius substantially equal to the thickness of the single-layer antireflection layer.
  • the antireflection layer having a heterogeneous particle structure provided in embodiments of this disclosure may have properties of both antireflection and contamination resistance. In some embodiments, the particles 142 may have a diameter ranging from about 80nm to about 250nm.
  • the first antireflection layer 140 described in the embodiments of this disclosure has a heterogeneous particle structure, which is provided with properties of both antireflection and contamination resistance.
  • the term "voids formed between the plurality of particles”, as used herein, is intended to refer to spaces between the plurality of particles which may have a height no greater than that of the particles, such as 80%, 70%, 60%, 50% height of the particles.
  • the plurality of nanoparticles 144 exceed the voids formed between the plurality of particles, it may cause degradation of antireflection effect of the antireflection layer.
  • the nanoparticles 144 fill the voids to a height of about 50% of the height of the particles 142, which may achieve a satisfactory effect of antireflection and contamination resistance.
  • a first suspension liquid which includes silica microspheres having a diameter ranging from 80nm to 250nm.
  • silica microspheres having a diameter of lOOnm may be dispersed in ethanol, so as to obtain a suspension liquid wherein a mass ratio of the silica microspheres to the suspension liquid is about 1%.
  • the first suspension liquid is coated on the substrate 120 and the substrate 120 coated with the first suspension liquid is dried.
  • Spinning coating, dip coating, spraying coating, or other suitable methods may be used to coat the substrate 120 with the first suspension liquid.
  • a second suspension liquid which includes silica microspheres having a diameter ranging from 7nm to 12nm.
  • silica microspheres having a diameter ranging from lOnm to 12nm may be dispersed in ethanol, so as to obtain a suspension liquid wherein a mass ratio of the silica microspheres to the suspension liquid is about 0.5%.
  • the second suspension liquid is coated on the substrate 120 and the substrate 120 coated with the second suspension liquid is dried.
  • Spinning coating, dip coating, spraying coating, or other suitable methods may be used to coat the substrate 120 with the second suspension liquid.
  • the process S200 may further include, such as, annealing the substrate for two hours at a temperature of about 480°C after coating the substrate with the second suspension liquid, so as to enhance mechanical strength of the first antireflection layer 140.
  • the packing medium may be formed by Chemical Vapor Deposition (CVD), or formed through dipping and sintering.
  • the optical component 100 may be formed according to the method shown in FIG. 9: providing a glass substrate, using silica microspheres having a diameter of about lOOnm as the particles 142, and using silica microspheres having a diameter ranging from about lOnm to about 12nm as the nanoparticles 144 which fill the voids formed between the plurality of particles 142 to a height about 50% of the height of the particles 142.
  • Transmission spectra of the optical component 100 are shown in FIG. 11, which are illustrated by a full line labeled C910 and a dotted line labeled C920, respectively.
  • the full line C910 denotes a transmission spectrum of the optical component 100 obtained after the optical component 100 has just been formed.
  • the dotted line C920 denotes a transmission spectrum of the optical component 100 which has been placed on a housetop at an angle of 45° for two days.
  • transmission spectra of a bare glass before and after being placed on a housetop at an angle of 45° for two days are also provided, which are marked with a full line labeled C930 and a dotted line labeled C940, respectively.
  • the Y axis represents light transmittance (as a percent)
  • the X axis represents wavelength (in nanometers).
  • the light transmittance of the optical component 100 having the first antireflection layer 140 is substantially increased compared with that of the bare glass and changes very little after the optical component 100 having the first antireflection layer 140 is placed on the housetop for two days. While the maximum value of the light transmittance of the bare glass changes from 91.8% to 91.3%, after it is placed on the housetop for two days. That is, the first antireflection layer 140 have properties of both antireflection and contamination resistance.
  • FIG. 7 schematically illustrates a method for forming an optical component according to another embodiment of the present disclosure. Compared with the embodiments shown in FIG. 6, a process S300 is added between the processes SI 00 and S200 in the embodiment shown in FIG. 7.
  • a second antireflection layer is formed, which may be a conventional antireflection layer, or may be developed after the present application is filed.
  • the second antireflection layer may include, but not limited to, a porous silicon oxide layer, a magnesium fluoride layer, a mesoporous silicon oxide particles layer, or a film with moth-eye structure.
  • An optical component 200 shown in FIG. 2 may be formed with the method shown in FIG. 7.
  • the optical component 200 may further include a second antireflection layer 160 formed between the substrate 120 and the first antireflection layer 140.
  • the first antireflection layer 140 having a heterogeneous particle structure on the second antireflection layer 160 not only the contamination-resistant property can be achieved, but also the antireflection effect of the second antireflection layer 160 may not be affected substantially, which thereby may overcome or alleviate the problem of degradation of antireflection effect which may be caused by other contamination-resistant layers.
  • a suspension liquid including silica microspheres is provided.
  • silica microspheres having a diameter ranging from lOnm to 20nm may be dispersed in water to obtain a suspension liquid wherein a mass ratio of the silica microspheres to the suspension liquid is about 25%.
  • the suspension liquid is then diluted with ethanol to have a mass ratio of about 0.5%.
  • the substrate is drawn out of the suspension liquid.
  • the substrate may be drawn out of the suspension liquid at a speed of 3mm/s.
  • the process S300 may be performed to form the suitable second antireflection layer 160 with any suitable method.
  • a magnesium fluoride layer may be formed with Magnetron Sputter Plating.
  • optical component 200 provided in embodiments of the present disclosure will be described hereinafter.
  • the second antireflection layer 160 is formed according to the method shown in FIG. 8. Specifically, a glass substrate is provided. Silica microspheres having a diameter ranging from lOnm to 20nm are dispersed in water to obtain a suspension liquid having a mass ratio of about 25%. The suspension liquid is then diluted with ethanol to have a mass ratio of about 0.5%. The glass substrate is dipped into the diluted suspension liquid. Then the glass substrate is drawn out of the suspension liquid and is dried in air. Then, the first antireflection layer 140 is formed according to the method shown in FIG. 9.
  • silica microspheres having a diameter of about lOOnm are used as the particles 142
  • silica microspheres having a diameter ranging from lOnm to 12nm are used as the nanoparticles 144 which fill the voids formed between the plurality of particles 142 to a height of about 50% of the height of the particles 142.
  • the optical component 200 obtained in this way may have a transmission spectrum illustrated by a curved line labeled C110 shown in FIG. 12.
  • a curved line C120 denotes a transmission spectrum of a bare glass (which is illustrated by a thumbnail image on the upper right);
  • a curved line labeled C130 denotes a transmission spectrum of an optical component having a second antireflection layer 160, but without a first antireflection layer 140 (which is illustrated by a thumbnail image on the lower left);
  • a curved line labeled CI 40 denotes a transmission spectrum of an optical component having a second antireflection layer 160, and a first antireflection layer 140 which has a plurality of large-size particles 142, but has no nanoparticles 144 (which is illustrated by a thumbnail image on the lower right).
  • the Y axis represents light transmittance (as a percent)
  • the X axis represents wavelength (in nanometers).
  • the antireflection effect of the optical component 200 (corresponding to the curved line labeled CI 10) is not substantially degraded. Instead, the antireflection effect is improved in the wavelength range of 400nm to 2000nm, which makes the optical component 200 advantageous in applications on a photoelectric device which works in the wavelength range of 400nm to 2000nm.
  • the optical component 200 (corresponding to the curved line labeled CI 10) has better antireflection effect over the whole wavelength range.
  • FIG. 10 schematically illustrates the process S200 shown in FIG. 6 or FIG. 7 according to another embodiment of the present disclosure.
  • the process S200 may further include S250: annealing the substrate to make the silica microspheres in a molten state.
  • An optical component 300 shown in FIG. 3 may be obtained according to the method illustrated in FIG. 10.
  • a packing medium 344 of a first antireflection layer 340 of the optical component 300 fills at least 90% of the voids formed between the plurality of particles 142, and the plurality of particles 142 together with the packing medium 344 are integrated as a whole.
  • the first antireflection layer 340 has properties of both antireflection and contamination resistance.
  • the first antireflection layer 340 may further prevent water or impurities from entering thereinto.
  • the packing medium 344 may be formed with, but not limited to, the method shown in FIG. 10.
  • the packing medium 344 may be formed by Chemical Vapor Deposition (CVD), Physical Vapor Deposition (PVD), dipping and sintering, or any other suitable method.
  • FIG. 4 schematically illustrates a cross-sectional view of an optical component 400 according to one embodiment of the present disclosure.
  • a packing medium 444 may include one or more selected from porous silicon oxide, porous titanium oxide, porous aluminum oxide and porous zirconium oxide. Similar to the first antireflection layer 140, a first antireflection layer 440 of the optical component 400 has the properties of both antireflection and contamination resistance as well.
  • the first antireflection layer 440 may be formed with any appropriate method.
  • tetraethoxysilane (TEOS) collosol and silica particles 142 may be mixed, and the substrate 120 may be coated with the mixture by spin coating. Then a heat treatment may be performed on the substrate to obtain the first antireflection layer 440, where the packing medium 444 includes porous silicon oxide.
  • TEOS tetraethoxysilane
  • FIG. 5 schematically illustrates a cross-sectional view of an optical component 500 according to one embodiment of the present disclosure.
  • the optical component 500 includes a transparent compact layer 580, which is disposed between the first antireflection layer 440 and the substrate 120.
  • the transparent compact layer 580 may include one or more materials selected from a group consisting of silicon oxide, titanium oxide, aluminum oxide and zirconium oxide.
  • the transparent compact layer 580 may prevent outward diffusion of alkali metal ions or alkali earth metal ions from the substrate 120.
  • the transparent compact layer 580 can be combined with other embodiments of the disclosure.
  • the transparent compact layer 580 may be provided between the first antireflection layer 140 and the substrate 120 of the optical component 100, or provided between the second antireflection layer 160 and the substrate 120 of the optical component 200, or provided between the first antireflection layer 340 and the substrate 120 of the optical component 300.
  • silica microspheres are taken as an example to illustrate the particles 142 and the nanoparticles 144. It should be noted that the particles 142 and the nanoparticles 144 may include titanium oxide microspheres, aluminum oxide microspheres or zirconium oxide microspheres.
  • the particles 142 may include a material same as or different from that of the nanoparticles 144.
  • the particles 142 may include one or more kinds of materials, and the nanoparticles 144 may also include one or more kinds of materials.
  • the particles 142 and the nanoparticles 144 may have a shape of sphere, but not limited thereto. In some embodiments, the particles 142 and the nanoparticles 144 may have a shape of regular dodecahedron or triacontahedron, or irregular polyhedron, or any other suitable shape.

Landscapes

  • Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Inorganic Chemistry (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Surface Treatment Of Optical Elements (AREA)
  • Optical Elements Other Than Lenses (AREA)

Abstract

An optical component (200) and photovoltaic device are provided. The optical component (200) comprises a substrate (120); a first antireflection layer (140) including a packing medium (144) and a particle array comprising a plurality of particles (142), where the packing medium (144) fills at least in part voids formed between the plurality particles (142).

Description

OPTICAL COMPONENT AND PHOTOVOLTAIC DEVICE
CROSS REFERRENCE TO RELATED APPLICATIONS
[0001] The present application claims priority to Chinese patent application No. 201220653796.7, filed on November 30, 2012, and entitled "Optical Component and Photovoltaic Device", the entire disclosure of which is incorporated herein by reference.
TECHNICAL FIELD
[0002] The present disclosure generally relates to optical material field, and more particularly, to an optical component and a photovoltaic device.
BACKGROUND
[0003] Generally, when light transmits from a first medium to a second medium, a portion of the light may change the propagation direction at the interface between the two mediums and return to the first medium. This phenomenon is known as light reflection. Furthermore, the strength of the light reflection at the interface between the different mediums usually increases with the difference between the refractive indexes of the different mediums.
[0004] Reducing light reflection in devices, such as a photovoltaic device or a display, has been a research focus. When lights transmit into a substrate, it is found by those skilled in the art that an antireflection layer may be formed on the substrate to reduce light reflection. Especially, when the antireflection layer meets the following requirements: the refractive index of the antireflection layer equals to the square root of a product of refractive indexes of the air and the substrate (a refractive indexes matching condition), and the thickness of the antireflection layer equals to one fourth of the light wavelength (a thickness matching condition), the antireflection layer may reduce reflection of lights having the wavelength effectively. Currently, the antireflection layer may be an antireflection layer with moth-eye structure, a porous silicon oxide layer, or a multi-layer antireflection coating including high refractive index material and low refractive index material alternatively stacked, etc.
[0005] However, the conventional antireflection layers mentioned above are usually not provided with the property of contamination resistance. Typically, to make a photovoltaic device or a display be contamination-resistant, the antireflection layer needs to be coated with an additional layer, such as a low surface energy layer, which may adversely influence the antireflection effect.
SUMMARY
[0006] In light of the problems mentioned above, embodiments of this disclosure provide an antireflection film having property of contamination resistance. In another aspect, a contamination-resistant layer may be formed on an antireflection film, which may not cause substantial degradation of antireflection effect.
[0007] In one embodiment, an optical component is provided, which may include: a substrate; and a first antireflection layer which comprises a packing medium and a particle array comprising a plurality of particles, wherein the packing medium fills at least in part voids formed between the plurality of particles.
[0008] It is found that the first antireflection layer having the above-mentioned structure may have properties of both antireflection and contamination resistance.
[0009] In some embodiments, the optical component further comprises a second antireflection layer between the substrate and first antireflection layer.
[0010] In some embodiments, the second antireflection layer may include a plurality of silica microspheres and voids formed between the plurality of silica microspheres. In some embodiments, the plurality of silica microspheres may have a diameter ranging from lOnm to 20nm.
[0011] In some embodiments, the plurality of particles may be microspheres which have a diameter ranging from 80nm to 250nm.
[0012] In some embodiments, the packing medium may include a plurality of nanoparticles.
[0013] In some embodiments, the plurality of particles and the plurality of nanoparticles may be one or more selected from silica microspheres, titanium oxide microspheres, aluminum oxide microspheres and zirconium oxide microspheres.
[0014] In some embodiments, the plurality of nanoparticles may include silica microspheres having a diameter ranging from 7nm to 12nm, and the plurality of particles may include silica microspheres having a diameter ranging from 80nm to 250nm.
[0015] In some embodiments, the packing medium may fill at least 90% of the voids formed between the plurality of particles.
[0016] In some embodiments, the plurality of particles and the packing medium may be integrated as a whole.
[0017] In one embodiment, a photovoltaic device is provided, which may include an optical component provided in embodiments of the disclosure, wherein the optical component comprises a transparent substrate; and a solar cell, located on a side of the substrate on which the first antireflection layer is not located.
[0018] The above descriptions summarize features and configurations of this disclosure. And additional features may be provided hereinafter, which provide embodiments of subject matter defined in the appended claims. The specific features and acts described above may be used to implement the claims. It should be appreciated that the present invention provides many applicable inventive concepts that can be embodied in a wide variety of specific contexts, to fulfill the same purpose as disclosed herein. The specific embodiments discussed are merely illustrative of specific ways to make and use the invention, and do not limit the scope of the invention.
BRIEF DESCRIPTION OF THE DRAWINGS
[0019] A further understanding of the nature and advantages of various embodiments may be realized by reference to the following figures;
[0020] FIG. 1 schematically illustrates a cross-sectional view of an optical component 100 according to one embodiment of the present disclosure;
[0021] FIG. 2 schematically illustrates a cross-sectional view of an optical component 200 according to one embodiment of the present disclosure;
[0022] FIG. 3 schematically illustrates a cross-sectional view of an optical component 300 according to one embodiment of the present disclosure;
[0023] FIG. 4 schematically illustrates a cross-sectional view of an optical component 400 according to one embodiment of the present disclosure;
[0024] FIG. 5 schematically illustrates a cross-sectional view of an optical component 500 according to one embodiment of the present disclosure;
[0025] FIG. 6 schematically illustrates a flow chart of a method for forming an optical component according to one embodiment of the present disclosure;
[0026] FIG. 7 schematically illustrates a flow chart of a method for forming an optical component according to another embodiment of the present disclosure;
[0027] FIG. 8 schematically illustrates a flow chart of a process S300 shown in FIG. 7 according to one embodiment of the present disclosure;
[0028] FIG. 9 schematically illustrates a flow chart of a process S200 shown in FIG. 6 or FIG. 7 according to one embodiment of the present disclosure;
[0029] FIG. 10 schematically illustrates a flow chart of a process S200 shown in FIG. 6 or FIG. 7 according to another embodiment of the present disclosure; [0030] FIG. 11 schematically illustrates a transmission spectrum of an exemplary optical component 100 according to one embodiment of the present disclosure; and
[0031] FIG. 12 schematically illustrates a transmission spectrum of an exemplary optical component 200 according to one embodiment of the present disclosure.
[0032] Unless expressly stated to the contrary, like reference numerals and labels in different figures refer to similar elements. Further, the figures are drawn to emphasize specific features relevant to the exemplary embodiments, so elements in the figures may not be drawn to scale. For clarity of illustration, a sub-label may be associated with a reference numeral to denote one of mutiple similar components, materials or steps.
DETAILED DESCRIPTION
[0033] The disclosure will be described in detail with reference to certain embodiments. It will be understood by those skilled in the art that various changes may be made without departing from the spirit or scope of the disclosure. Accordingly, the present disclosure is not limited to the embodiments disclosed.
[0034] For the purpose of illustration, a device provided in embodiments of the present disclosure is described with reference to a method for forming the same device. It should be noted that the device is independent from the method. In other words, the device provided in embodiments of the present disclosure may be formed with other methods, and the method provided in embodiments of the present disclosure is not limited to obtain the device disclosed in the embodiments.
[0035] FIG. 6 schematically illustrates a flow chart of a method for forming an optical component according to one embodiment of the present disclosure.
[0036] First, in SI 00, a substrate is provided. The substrate may be made of any suitable material, including but not limited to, glass, metal, polymer or semiconductor. The substrate may have any suitable shape, such as a flat surface, a curved surface, etc.
[0037] In S200, a first antireflection layer is formed. The first antireflection layer includes a packing medium and a particle array including a plurality of particles. The packing medium fills at least in part voids formed between the plurality of particles.
[0038] An optical component 100 shown in FIG. 1 may be formed by using the method shown in FIG. 6.
[0039] Referring to FIG. 1, the optical component 100 includes a substrate 120 and a first antireflection layer 140 formed thereon. The first antireflection layer 140 includes a particle array including a plurality of particles 142, and a packing medium 144 which fills voids formed between the plurality of particles 142 in part.
[0040] Specifically, the packing medium 144 includes a plurality of nanoparticles, each of which has a diameter significantly less than that of the particles 142. That is, the first antireflection layer 140 has a heterogeneous particle structure.
[0041] It is found that the first antireflection layer 140 having a heterogeneous particle structure has properties of both antireflection and contamination resistance. That is, there is no need to coat a contamination-resistant layer on the antireflection layer, which may avoid potential degradation of antireflection effect caused by the contamination-resistant layer.
[0042] The phenomenon mentioned above may be interpreted as follows. The particle array formed by large-size particles 142 has a suitable roughness, which makes the heterogeneous particle structure have the capability of resisting contamination. And the small-size nanoparticles 144 can avoid a sudden change of the refractive index at the interface between the heterogeneous particle structure and the substrate, which makes the heterogeneous particle structure have the antireflective property. Specifically, the refractive index of the first antireflection layer 140 changes gradually from the top surface of the nanoparticles 144 to the interface between the heterogeneous particle structure and the substrate 120. Otherwise, if there are no nanoparticles 144, the refractive index may change sharply at the interface between the particles 142 and the substrate 120.
[0043] It should be noted that the term "particle array", as used herein, is intended to refer to a single-layer array including the plurality of particles 142. However, an array having a local multi-layer structure, such as a double layer which may appear due to limited experiment condition, also belongs to the scope of the term "particle array" disclosed herein.
[0044] In some embodiments, the arrangement of the plurality of particles 142 may be ordered or disordered. In some embodiments, the plurality of particles 142 may include, but not limited to, silicon oxide, titanium oxide, aluminum oxide or zirconium oxide. In some embodiments, the plurality of particles 142 may have a shape of sphere, regular dodecahedron, triacontahedron or irregular polyhedron, or have any other suitable shape. The size of the particles 142 may be selected according to the thickness of the conventional single-layer antireflection layer, such as a magnesium fluoride layer, a porous silicon oxide layer. When the plurality of particles 142 are microspheres which are configured closely and voids formed between the plurality of particles is filled with the plurality of nanoparticles 144, the particles 142 may have a diameter substantially equal to the thickness of the single-layer antireflection layer. When the plurality of particles 142 are microspheres which are configured closely and the degree of filling for the voids formed between the plurality of particles exceeds 90%, the particles 142 may have a radius substantially equal to the thickness of the single-layer antireflection layer. The antireflection layer having a heterogeneous particle structure provided in embodiments of this disclosure may have properties of both antireflection and contamination resistance. In some embodiments, the particles 142 may have a diameter ranging from about 80nm to about 250nm.
[0045] In light of the above description, the first antireflection layer 140 described in the embodiments of this disclosure has a heterogeneous particle structure, which is provided with properties of both antireflection and contamination resistance.
[0046] It also should be noted that the term "voids formed between the plurality of particles", as used herein, is intended to refer to spaces between the plurality of particles which may have a height no greater than that of the particles, such as 80%, 70%, 60%, 50% height of the particles. When the plurality of nanoparticles 144 exceed the voids formed between the plurality of particles, it may cause degradation of antireflection effect of the antireflection layer. Referring to FIG. 1, the nanoparticles 144 fill the voids to a height of about 50% of the height of the particles 142, which may achieve a satisfactory effect of antireflection and contamination resistance.
[0047] Hereunder, the process S200 shown in FIG. 6 will be described in conjunction with FIG. 9.
[0048] In S210, a first suspension liquid, which includes silica microspheres having a diameter ranging from 80nm to 250nm, is provided. For example, silica microspheres having a diameter of lOOnm may be dispersed in ethanol, so as to obtain a suspension liquid wherein a mass ratio of the silica microspheres to the suspension liquid is about 1%.
[0049] In S220, the first suspension liquid is coated on the substrate 120 and the substrate 120 coated with the first suspension liquid is dried. Spinning coating, dip coating, spraying coating, or other suitable methods may be used to coat the substrate 120 with the first suspension liquid.
[0050] In S230, a second suspension liquid, which includes silica microspheres having a diameter ranging from 7nm to 12nm, is provided. For example, silica microspheres having a diameter ranging from lOnm to 12nm may be dispersed in ethanol, so as to obtain a suspension liquid wherein a mass ratio of the silica microspheres to the suspension liquid is about 0.5%.
[0051] In S240, the second suspension liquid is coated on the substrate 120 and the substrate 120 coated with the second suspension liquid is dried. Spinning coating, dip coating, spraying coating, or other suitable methods may be used to coat the substrate 120 with the second suspension liquid.
[0052] In some embodiments, the process S200 may further include, such as, annealing the substrate for two hours at a temperature of about 480°C after coating the substrate with the second suspension liquid, so as to enhance mechanical strength of the first antireflection layer 140.
[0053] It should be noted that examples shown in FIG. 9 are presented for exemplary purposes only, and the present disclosure should not be limited thereto. The process S200 may be implemented with any other suitable methods. For example, after the substrate is coated with the first suspension liquid and dried, the packing medium may be formed by Chemical Vapor Deposition (CVD), or formed through dipping and sintering.
[0054] An optical component 100 provided in embodiments of the present disclosure will be described hereinafter.
[0055] The optical component 100 may be formed according to the method shown in FIG. 9: providing a glass substrate, using silica microspheres having a diameter of about lOOnm as the particles 142, and using silica microspheres having a diameter ranging from about lOnm to about 12nm as the nanoparticles 144 which fill the voids formed between the plurality of particles 142 to a height about 50% of the height of the particles 142. Transmission spectra of the optical component 100 are shown in FIG. 11, which are illustrated by a full line labeled C910 and a dotted line labeled C920, respectively. The full line C910 denotes a transmission spectrum of the optical component 100 obtained after the optical component 100 has just been formed. The dotted line C920 denotes a transmission spectrum of the optical component 100 which has been placed on a housetop at an angle of 45° for two days. By contrast,, transmission spectra of a bare glass before and after being placed on a housetop at an angle of 45° for two days are also provided, which are marked with a full line labeled C930 and a dotted line labeled C940, respectively. In FIG. 11, the Y axis represents light transmittance (as a percent), and the X axis represents wavelength (in nanometers).
[0056] Referring to FIG. 11, the light transmittance of the optical component 100 having the first antireflection layer 140 is substantially increased compared with that of the bare glass and changes very little after the optical component 100 having the first antireflection layer 140 is placed on the housetop for two days. While the maximum value of the light transmittance of the bare glass changes from 91.8% to 91.3%, after it is placed on the housetop for two days. That is, the first antireflection layer 140 have properties of both antireflection and contamination resistance.
[0057] FIG. 7 schematically illustrates a method for forming an optical component according to another embodiment of the present disclosure. Compared with the embodiments shown in FIG. 6, a process S300 is added between the processes SI 00 and S200 in the embodiment shown in FIG. 7.
[0058] In S300, a second antireflection layer is formed, which may be a conventional antireflection layer, or may be developed after the present application is filed. The second antireflection layer may include, but not limited to, a porous silicon oxide layer, a magnesium fluoride layer, a mesoporous silicon oxide particles layer, or a film with moth-eye structure.
[0059] An optical component 200 shown in FIG. 2 may be formed with the method shown in FIG. 7.
[0060] Referring to FIG. 2, compared with the optical component 100, the optical component 200 may further include a second antireflection layer 160 formed between the substrate 120 and the first antireflection layer 140.
[0061] It is found that, by forming the first antireflection layer 140 having a heterogeneous particle structure on the second antireflection layer 160, not only the contamination-resistant property can be achieved, but also the antireflection effect of the second antireflection layer 160 may not be affected substantially, which thereby may overcome or alleviate the problem of degradation of antireflection effect which may be caused by other contamination-resistant layers.
[0062] Hereunder, the process S300 shown in FIG. 7 will be described in conjunction with FIG. 8.
[0063] In S310, a suspension liquid including silica microspheres is provided. For example, silica microspheres having a diameter ranging from lOnm to 20nm may be dispersed in water to obtain a suspension liquid wherein a mass ratio of the silica microspheres to the suspension liquid is about 25%. The suspension liquid is then diluted with ethanol to have a mass ratio of about 0.5%.
[0064] In S320, a substrate is dipped into the suspension liquid.
[0065] In S330, the substrate is drawn out of the suspension liquid. For example, the substrate may be drawn out of the suspension liquid at a speed of 3mm/s.
[0066] It should be noted that examples shown in FIG. 8 are presented for descriptive purpose, but not intended to be limiting. The process S300 may be performed to form the suitable second antireflection layer 160 with any suitable method. For example, a magnesium fluoride layer may be formed with Magnetron Sputter Plating.
[0067] An optical component 200 provided in embodiments of the present disclosure will be described hereinafter.
[0068] Firstly, the second antireflection layer 160 is formed according to the method shown in FIG. 8. Specifically, a glass substrate is provided. Silica microspheres having a diameter ranging from lOnm to 20nm are dispersed in water to obtain a suspension liquid having a mass ratio of about 25%. The suspension liquid is then diluted with ethanol to have a mass ratio of about 0.5%. The glass substrate is dipped into the diluted suspension liquid. Then the glass substrate is drawn out of the suspension liquid and is dried in air. Then, the first antireflection layer 140 is formed according to the method shown in FIG. 9. Specifically, silica microspheres having a diameter of about lOOnm are used as the particles 142, and silica microspheres having a diameter ranging from lOnm to 12nm are used as the nanoparticles 144 which fill the voids formed between the plurality of particles 142 to a height of about 50% of the height of the particles 142.
[0069] The optical component 200 obtained in this way may have a transmission spectrum illustrated by a curved line labeled C110 shown in FIG. 12. By contrast, a curved line C120 denotes a transmission spectrum of a bare glass (which is illustrated by a thumbnail image on the upper right); a curved line labeled C130 denotes a transmission spectrum of an optical component having a second antireflection layer 160, but without a first antireflection layer 140 (which is illustrated by a thumbnail image on the lower left); and a curved line labeled CI 40 denotes a transmission spectrum of an optical component having a second antireflection layer 160, and a first antireflection layer 140 which has a plurality of large-size particles 142, but has no nanoparticles 144 (which is illustrated by a thumbnail image on the lower right). In FIG. 12, the Y axis represents light transmittance (as a percent), and the X axis represents wavelength (in nanometers).
[0070] Referring to FIG. 12, compared with the optical component having the second antireflection layer 160, but without the first antireflection layer 140 (corresponding to the curved line labeled CI 30), the antireflection effect of the optical component 200 (corresponding to the curved line labeled CI 10) is not substantially degraded. Instead, the antireflection effect is improved in the wavelength range of 400nm to 2000nm, which makes the optical component 200 advantageous in applications on a photoelectric device which works in the wavelength range of 400nm to 2000nm.
[0071] Compared with the optical component in which the first antireflection layer 140 has a plurality of large-size particles 142, but has no nanoparticles 144 (corresponding to the curved line labeled C140), the optical component 200 (corresponding to the curved line labeled CI 10) has better antireflection effect over the whole wavelength range.
[0072] FIG. 10 schematically illustrates the process S200 shown in FIG. 6 or FIG. 7 according to another embodiment of the present disclosure.
[0073] The process S200 may further include S250: annealing the substrate to make the silica microspheres in a molten state.
[0074] An optical component 300 shown in FIG. 3 may be obtained according to the method illustrated in FIG. 10.
[0075] Referring to FIG. 3, compared with the first antireflection layer 140 of the optical component 100 or 200, a packing medium 344 of a first antireflection layer 340 of the optical component 300 fills at least 90% of the voids formed between the plurality of particles 142, and the plurality of particles 142 together with the packing medium 344 are integrated as a whole. Similar to the first antireflection layer 140, the first antireflection layer 340 has properties of both antireflection and contamination resistance. Other than the advantages of the first antireflection layer 140, the first antireflection layer 340 may further prevent water or impurities from entering thereinto.
[0076] It should be noted that the packing medium 344 may be formed with, but not limited to, the method shown in FIG. 10. For example, the packing medium 344 may be formed by Chemical Vapor Deposition (CVD), Physical Vapor Deposition (PVD), dipping and sintering, or any other suitable method. [0077] FIG. 4 schematically illustrates a cross-sectional view of an optical component 400 according to one embodiment of the present disclosure. In the optical component 400, a packing medium 444 may include one or more selected from porous silicon oxide, porous titanium oxide, porous aluminum oxide and porous zirconium oxide. Similar to the first antireflection layer 140, a first antireflection layer 440 of the optical component 400 has the properties of both antireflection and contamination resistance as well.
[0078] It should be noted that the first antireflection layer 440 may be formed with any appropriate method. In some embodiments, tetraethoxysilane (TEOS) collosol and silica particles 142 may be mixed, and the substrate 120 may be coated with the mixture by spin coating. Then a heat treatment may be performed on the substrate to obtain the first antireflection layer 440, where the packing medium 444 includes porous silicon oxide.
[0079] FIG. 5 schematically illustrates a cross-sectional view of an optical component 500 according to one embodiment of the present disclosure. Referring to FIG. 5, the optical component 500 includes a transparent compact layer 580, which is disposed between the first antireflection layer 440 and the substrate 120. The transparent compact layer 580 may include one or more materials selected from a group consisting of silicon oxide, titanium oxide, aluminum oxide and zirconium oxide. The transparent compact layer 580 may prevent outward diffusion of alkali metal ions or alkali earth metal ions from the substrate 120.
[0080] It should be noted that the transparent compact layer 580 can be combined with other embodiments of the disclosure. For example, the transparent compact layer 580 may be provided between the first antireflection layer 140 and the substrate 120 of the optical component 100, or provided between the second antireflection layer 160 and the substrate 120 of the optical component 200, or provided between the first antireflection layer 340 and the substrate 120 of the optical component 300. [0081] In the above description, silica microspheres are taken as an example to illustrate the particles 142 and the nanoparticles 144. It should be noted that the particles 142 and the nanoparticles 144 may include titanium oxide microspheres, aluminum oxide microspheres or zirconium oxide microspheres. The particles 142 may include a material same as or different from that of the nanoparticles 144. The particles 142 may include one or more kinds of materials, and the nanoparticles 144 may also include one or more kinds of materials. The particles 142 and the nanoparticles 144 may have a shape of sphere, but not limited thereto. In some embodiments, the particles 142 and the nanoparticles 144 may have a shape of regular dodecahedron or triacontahedron, or irregular polyhedron, or any other suitable shape.
[0082] Although the present disclosure has been disclosed above with reference to preferred embodiments thereof, it should be understood that the disclosure is presented by way of example only, and not limitation. Those skilled in the art can modify and vary the embodiments without departing from the spirit and scope of the present disclosure.

Claims

We claim:
1. An optical component, comprising:
a substrate; and
a first antireflection layer which comprises a packing medium and a particle array comprising a plurality of particles,
wherein the packing medium fills at least in part voids formed between the plurality of particles.
2. The optical component according to claim 1, further comprising a second antireflection layer located between the substrate and the first antireflection layer.
3. The optical component according to claim 2, wherein the second antireflection layer is a porous silicon oxide film.
4. The optical component according to claim 2, wherein the second antireflection layer comprises a plurality of silica microspheres and voids formed between the plurality of silica microspheres.
5. The optical component according to claim 4, wherein the plurality of silica microspheres have a diameter ranging from lOnm to 20nm.
6. The optical component according to claim 1, wherein the plurality of particles are microspheres which have a diameter ranging from 80nm to 250nm.
7. The optical component according to any one of claims 1 to 6, wherein the packing medium comprises a plurality of nanoparticles.
8. The optical component according to claim 7, wherein the plurality of particles and the plurality of nanoparticles are one or more selected from silica microspheres, titanium oxide microspheres, aluminum oxide microspheres and zirconium oxide microspheres.
9. The optical component according to claim 8, wherein the plurality of nanoparticles comprise silica microspheres having a diameter ranging from 7nm to 12nm, and the plurality of particles comprise silica microspheres having a diameter ranging from 80nm to 250nm.
10. The optical component according to claim 9, wherein the first antireflection layer is manufactured according to the following steps:
providing a first suspension liquid of silica microspheres having a diameter ranging from 80nm to 250nm,
applying the first suspension liquid on the substrate and drying the applied first suspension liquid,
providing a second suspension liquid of silica microspheres having a diameter ranging from 7nm to 12nm, and
applying the second suspension liquid on the substrate and drying the applied second suspension liquid.
11. The optical component according to any one of claims 1 to 6, wherein the packing medium fills at least 90% of the voids formed between the plurality of particles.
12. The optical component according to claim 11, wherein the plurality of particles and the packing medium are integrated as a whole.
13. The optical component according to claim 12, wherein the first antireflection layer is manufactured according to the following steps:
providing a first suspension liquid of silica microspheres having a diameter ranging from 80nm to 250nm,
applying the first suspension liquid on the substrate and drying the applied first suspension liquid,
providing a second suspension liquid of silica microspheres having a diameter ranging from 7nm to 12nm,
applying the second suspension liquid on the substrate and drying the applied second suspension liquid, and
annealing a result of the forgoing steps so that the silica microspheres are in a molten state.
14. A photovoltaic device, comprising:
an optical component of any one of claims 1 to 13, wherein the substrate of the optical component is transparent; and a solar cell, located on a side of the substrate on which the first antireflection layer is not located.
EP13857890.1A 2012-11-30 2013-11-25 OPTICAL COMPONENT AND PHOTOVOLTAIC DEVICE Withdrawn EP2926378A4 (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
CN2012206537967U CN202948938U (en) 2012-11-30 2012-11-30 Optical component and photovoltaic device
PCT/CN2013/087746 WO2014082550A1 (en) 2012-11-30 2013-11-25 Optical component and photovoltaic device

Publications (2)

Publication Number Publication Date
EP2926378A1 true EP2926378A1 (en) 2015-10-07
EP2926378A4 EP2926378A4 (en) 2016-07-27

Family

ID=48424626

Family Applications (1)

Application Number Title Priority Date Filing Date
EP13857890.1A Withdrawn EP2926378A4 (en) 2012-11-30 2013-11-25 OPTICAL COMPONENT AND PHOTOVOLTAIC DEVICE

Country Status (3)

Country Link
EP (1) EP2926378A4 (en)
CN (1) CN202948938U (en)
WO (1) WO2014082550A1 (en)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN103048706B (en) * 2012-11-30 2016-09-14 法国圣戈班玻璃公司 Optical module and manufacture method, photovoltaic device
CN202948938U (en) * 2012-11-30 2013-05-22 法国圣戈班玻璃公司 Optical component and photovoltaic device
CN113113497B (en) * 2021-04-13 2023-01-24 河南大学 Solar cell using organic synergist and preparation method thereof
WO2025153429A1 (en) * 2024-01-19 2025-07-24 Swiss Pv Ag Composition and method for manufacturing a glazing unit using the same

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4267741B2 (en) * 1999-03-09 2009-05-27 富士フイルム株式会社 Anti-glare antireflection film and image display device
JP2001177130A (en) * 1999-12-16 2001-06-29 Kanegafuchi Chem Ind Co Ltd Solar cell module
JP2002182006A (en) * 2000-12-19 2002-06-26 Nippon Sheet Glass Co Ltd Antireflection film, base material and photoelectric conversion device including the same
EP1759428B1 (en) * 2004-06-14 2016-05-18 Philips Intellectual Property & Standards GmbH Led with improved light emission profile
JP5063926B2 (en) * 2006-04-20 2012-10-31 株式会社カネカ Method for producing antireflection substrate
JP5536977B2 (en) * 2007-03-30 2014-07-02 パナソニック株式会社 Surface emitter
TW200913287A (en) * 2007-09-13 2009-03-16 Delta Electronics Inc Solar cell and manufacturing method thereof
CN101431111A (en) * 2007-11-08 2009-05-13 和椿科技股份有限公司 dye-sensitized solar cell
DE112010002848B4 (en) * 2009-07-08 2016-02-04 Mitsubishi Electric Corp. Coating agent for a solar cell module and method for producing the solar cell module
GB201014024D0 (en) * 2010-08-20 2010-10-06 Oxford Energy Technologies Ltd Optical coating
CN202948938U (en) * 2012-11-30 2013-05-22 法国圣戈班玻璃公司 Optical component and photovoltaic device

Also Published As

Publication number Publication date
CN202948938U (en) 2013-05-22
EP2926378A4 (en) 2016-07-27
WO2014082550A1 (en) 2014-06-05

Similar Documents

Publication Publication Date Title
US10281617B1 (en) Highly durable hydrophobic antireflection structures and method of manufacturing the same
Gwon et al. Superhydrophobic and antireflective nanograss-coated glass for high performance solar cells
CN106526719B (en) Homogeneity bilayer SiO2The automatically cleaning antireflective film compound with polytetrafluoroethylene (PTFE) and preparation method
Khan et al. A mini review: antireflective coatings processing techniques, applications and future perspective
US20110168261A1 (en) High transmittance optical windows and method of constructing the same
CN103048706B (en) Optical module and manufacture method, photovoltaic device
US9914850B2 (en) Antireflection film, optical member, and method of producing optical member
KR20110137367A (en) Optical coating
KR101194257B1 (en) Transparent substrate for solar cell having a broadband anti-reflective multilayered coating thereon and method for preparing the same
AU2011298373A1 (en) Glass substrate coated with an anti-reflective layer
KR20120012555A (en) Gradually varying refractive index of the silicon multilayer anti-reflective film, a method of manufacturing the same and a solar cell having the same and a method of manufacturing the same
WO2008141158A2 (en) Substrate surface structures and processes for forming the same
JP2013529845A (en) Substrate provided with transparent conductive oxide film and method for manufacturing the same
Wang et al. Porous SiO2/MgF2 broadband antireflection coatings for superstrate-type silicon-based tandem cells
EP2926378A1 (en) Optical component and photovoltaic device
CN104678461B (en) Graded index materials preparation method
Liu et al. Inverse optical cavity design for ultrabroadband light absorption beyond the conventional limit in low‐bandgap nonfullerene acceptor–based solar cells
CN106733548A (en) A kind of preparation method of the double-deck oxidation silicone self-cleaning antireflective film of the modified homogeneity in surface
US20150263189A1 (en) Thin film and method for manufacturing the same
KR101194258B1 (en) Transparent substrate for solar cell having a broadband anti-reflective multilayered coating thereon and method for preparing the same
KR102882789B1 (en) Encapsulation structure for transparent flexible organic electronic device
CN114262165B (en) An omnidirectional reflective red glass
CN203164447U (en) Optical component and photovoltaic device
CN103311332A (en) Solar module and manufacturing method thereof
US12216243B2 (en) Air-spaced encapsulated dielectric nanopillars for flat optical devices

Legal Events

Date Code Title Description
PUAI Public reference made under article 153(3) epc to a published international application that has entered the european phase

Free format text: ORIGINAL CODE: 0009012

17P Request for examination filed

Effective date: 20150630

AK Designated contracting states

Kind code of ref document: A1

Designated state(s): AL AT BE BG CH CY CZ DE DK EE ES FI FR GB GR HR HU IE IS IT LI LT LU LV MC MK MT NL NO PL PT RO RS SE SI SK SM TR

AX Request for extension of the european patent

Extension state: BA ME

RIN1 Information on inventor provided before grant (corrected)

Inventor name: GU, YUNXIN

DAX Request for extension of the european patent (deleted)
RA4 Supplementary search report drawn up and despatched (corrected)

Effective date: 20160629

RIC1 Information provided on ipc code assigned before grant

Ipc: H01L 31/04 20060101ALI20160623BHEP

Ipc: H01L 31/0236 20060101ALI20160623BHEP

Ipc: H01L 31/0216 20060101AFI20160623BHEP

17Q First examination report despatched

Effective date: 20171206

STAA Information on the status of an ep patent application or granted ep patent

Free format text: STATUS: THE APPLICATION IS DEEMED TO BE WITHDRAWN

18D Application deemed to be withdrawn

Effective date: 20190820