EP2480500A1 - Process for surface modification of metal oxide particles - Google Patents
Process for surface modification of metal oxide particlesInfo
- Publication number
- EP2480500A1 EP2480500A1 EP10745643A EP10745643A EP2480500A1 EP 2480500 A1 EP2480500 A1 EP 2480500A1 EP 10745643 A EP10745643 A EP 10745643A EP 10745643 A EP10745643 A EP 10745643A EP 2480500 A1 EP2480500 A1 EP 2480500A1
- Authority
- EP
- European Patent Office
- Prior art keywords
- metal oxide
- oxide particles
- reaction mixture
- filter
- residence time
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Withdrawn
Links
- 239000002245 particle Substances 0.000 title claims abstract description 86
- 229910044991 metal oxide Inorganic materials 0.000 title claims abstract description 47
- 150000004706 metal oxides Chemical class 0.000 title claims abstract description 47
- 238000000034 method Methods 0.000 title claims abstract description 47
- 230000004048 modification Effects 0.000 title claims description 18
- 238000012986 modification Methods 0.000 title claims description 18
- 239000003607 modifier Substances 0.000 claims abstract description 25
- 239000011541 reaction mixture Substances 0.000 claims abstract description 21
- 238000006243 chemical reaction Methods 0.000 claims abstract description 20
- 239000007787 solid Substances 0.000 claims abstract description 11
- 239000007795 chemical reaction product Substances 0.000 claims abstract description 5
- 239000007789 gas Substances 0.000 claims description 31
- -1 polysiloxanes Polymers 0.000 claims description 19
- 229910052739 hydrogen Inorganic materials 0.000 claims description 18
- 150000002736 metal compounds Chemical class 0.000 claims description 18
- 239000001257 hydrogen Substances 0.000 claims description 17
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 claims description 13
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims description 12
- 238000002156 mixing Methods 0.000 claims description 12
- 229910052760 oxygen Inorganic materials 0.000 claims description 12
- 239000001301 oxygen Substances 0.000 claims description 12
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 11
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims description 8
- 229910052799 carbon Inorganic materials 0.000 claims description 8
- 239000000567 combustion gas Substances 0.000 claims description 8
- 229910052751 metal Inorganic materials 0.000 claims description 8
- 239000002184 metal Substances 0.000 claims description 8
- PNEYBMLMFCGWSK-UHFFFAOYSA-N Alumina Chemical compound [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 claims description 6
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 claims description 6
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 claims description 6
- 239000002253 acid Substances 0.000 claims description 6
- 229920001296 polysiloxane Polymers 0.000 claims description 6
- 239000000443 aerosol Substances 0.000 claims description 5
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 claims description 5
- 125000004122 cyclic group Chemical group 0.000 claims description 5
- 150000004820 halides Chemical class 0.000 claims description 5
- 235000012239 silicon dioxide Nutrition 0.000 claims description 5
- 239000000377 silicon dioxide Substances 0.000 claims description 5
- 229910052684 Cerium Inorganic materials 0.000 claims description 4
- UQSXHKLRYXJYBZ-UHFFFAOYSA-N Iron oxide Chemical compound [Fe]=O UQSXHKLRYXJYBZ-UHFFFAOYSA-N 0.000 claims description 4
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims description 4
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 claims description 4
- XLOMVQKBTHCTTD-UHFFFAOYSA-N Zinc monoxide Chemical compound [Zn]=O XLOMVQKBTHCTTD-UHFFFAOYSA-N 0.000 claims description 4
- 150000007513 acids Chemical class 0.000 claims description 4
- 238000002485 combustion reaction Methods 0.000 claims description 4
- 238000001816 cooling Methods 0.000 claims description 4
- 229910052710 silicon Inorganic materials 0.000 claims description 4
- 239000010703 silicon Substances 0.000 claims description 4
- 229910052725 zinc Inorganic materials 0.000 claims description 4
- 239000011701 zinc Substances 0.000 claims description 4
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 claims description 3
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 claims description 3
- QCWXUUIWCKQGHC-UHFFFAOYSA-N Zirconium Chemical compound [Zr] QCWXUUIWCKQGHC-UHFFFAOYSA-N 0.000 claims description 3
- 125000000217 alkyl group Chemical group 0.000 claims description 3
- 239000004411 aluminium Substances 0.000 claims description 3
- 229910052782 aluminium Inorganic materials 0.000 claims description 3
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 claims description 3
- 150000001412 amines Chemical class 0.000 claims description 3
- 125000003118 aryl group Chemical group 0.000 claims description 3
- 239000012535 impurity Substances 0.000 claims description 3
- 229910052738 indium Inorganic materials 0.000 claims description 3
- APFVFJFRJDLVQX-UHFFFAOYSA-N indium atom Chemical compound [In] APFVFJFRJDLVQX-UHFFFAOYSA-N 0.000 claims description 3
- 229910052742 iron Inorganic materials 0.000 claims description 3
- 229920002545 silicone oil Polymers 0.000 claims description 3
- 229910052718 tin Inorganic materials 0.000 claims description 3
- 239000010936 titanium Substances 0.000 claims description 3
- 229910052719 titanium Inorganic materials 0.000 claims description 3
- 239000004408 titanium dioxide Substances 0.000 claims description 3
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 claims description 3
- 229910052721 tungsten Inorganic materials 0.000 claims description 3
- 239000010937 tungsten Substances 0.000 claims description 3
- 229910052720 vanadium Inorganic materials 0.000 claims description 3
- 229910052727 yttrium Inorganic materials 0.000 claims description 3
- VWQVUPCCIRVNHF-UHFFFAOYSA-N yttrium atom Chemical compound [Y] VWQVUPCCIRVNHF-UHFFFAOYSA-N 0.000 claims description 3
- 229910052726 zirconium Inorganic materials 0.000 claims description 3
- MCMNRKCIXSYSNV-UHFFFAOYSA-N ZrO2 Inorganic materials O=[Zr]=O MCMNRKCIXSYSNV-UHFFFAOYSA-N 0.000 claims description 2
- XHCLAFWTIXFWPH-UHFFFAOYSA-N [O-2].[O-2].[O-2].[O-2].[O-2].[V+5].[V+5] Chemical compound [O-2].[O-2].[O-2].[O-2].[O-2].[V+5].[V+5] XHCLAFWTIXFWPH-UHFFFAOYSA-N 0.000 claims description 2
- 229910000410 antimony oxide Inorganic materials 0.000 claims description 2
- 125000004432 carbon atom Chemical group C* 0.000 claims description 2
- 150000001735 carboxylic acids Chemical class 0.000 claims description 2
- 229910000420 cerium oxide Inorganic materials 0.000 claims description 2
- 150000002148 esters Chemical class 0.000 claims description 2
- 229910003437 indium oxide Inorganic materials 0.000 claims description 2
- PJXISJQVUVHSOJ-UHFFFAOYSA-N indium(iii) oxide Chemical compound [O-2].[O-2].[O-2].[In+3].[In+3] PJXISJQVUVHSOJ-UHFFFAOYSA-N 0.000 claims description 2
- QGLKJKCYBOYXKC-UHFFFAOYSA-N nonaoxidotritungsten Chemical compound O=[W]1(=O)O[W](=O)(=O)O[W](=O)(=O)O1 QGLKJKCYBOYXKC-UHFFFAOYSA-N 0.000 claims description 2
- 150000001282 organosilanes Chemical class 0.000 claims description 2
- BMMGVYCKOGBVEV-UHFFFAOYSA-N oxo(oxoceriooxy)cerium Chemical compound [Ce]=O.O=[Ce]=O BMMGVYCKOGBVEV-UHFFFAOYSA-N 0.000 claims description 2
- SIWVEOZUMHYXCS-UHFFFAOYSA-N oxo(oxoyttriooxy)yttrium Chemical compound O=[Y]O[Y]=O SIWVEOZUMHYXCS-UHFFFAOYSA-N 0.000 claims description 2
- VTRUBDSFZJNXHI-UHFFFAOYSA-N oxoantimony Chemical compound [Sb]=O VTRUBDSFZJNXHI-UHFFFAOYSA-N 0.000 claims description 2
- RVTZCBVAJQQJTK-UHFFFAOYSA-N oxygen(2-);zirconium(4+) Chemical compound [O-2].[O-2].[Zr+4] RVTZCBVAJQQJTK-UHFFFAOYSA-N 0.000 claims description 2
- 229920006395 saturated elastomer Polymers 0.000 claims description 2
- XOLBLPGZBRYERU-UHFFFAOYSA-N tin dioxide Chemical compound O=[Sn]=O XOLBLPGZBRYERU-UHFFFAOYSA-N 0.000 claims description 2
- 229910001887 tin oxide Inorganic materials 0.000 claims description 2
- 229910001930 tungsten oxide Inorganic materials 0.000 claims description 2
- 229910001935 vanadium oxide Inorganic materials 0.000 claims description 2
- 239000011787 zinc oxide Substances 0.000 claims description 2
- GWXLDORMOJMVQZ-UHFFFAOYSA-N cerium Chemical compound [Ce] GWXLDORMOJMVQZ-UHFFFAOYSA-N 0.000 claims 1
- LEONUFNNVUYDNQ-UHFFFAOYSA-N vanadium atom Chemical compound [V] LEONUFNNVUYDNQ-UHFFFAOYSA-N 0.000 claims 1
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 12
- 230000001698 pyrogenic effect Effects 0.000 description 9
- 150000003254 radicals Chemical class 0.000 description 9
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 8
- POULHZVOKOAJMA-UHFFFAOYSA-N dodecanoic acid Chemical compound CCCCCCCCCCCC(O)=O POULHZVOKOAJMA-UHFFFAOYSA-N 0.000 description 8
- 125000000524 functional group Chemical group 0.000 description 8
- VNWKTOKETHGBQD-UHFFFAOYSA-N methane Chemical compound C VNWKTOKETHGBQD-UHFFFAOYSA-N 0.000 description 8
- CYIDZMCFTVVTJO-UHFFFAOYSA-N pyromellitic acid Chemical compound OC(=O)C1=CC(C(O)=O)=C(C(O)=O)C=C1C(O)=O CYIDZMCFTVVTJO-UHFFFAOYSA-N 0.000 description 8
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 description 6
- KRKNYBCHXYNGOX-UHFFFAOYSA-N citric acid Chemical compound OC(=O)CC(O)(C(O)=O)CC(O)=O KRKNYBCHXYNGOX-UHFFFAOYSA-N 0.000 description 6
- 230000001590 oxidative effect Effects 0.000 description 6
- 239000005639 Lauric acid Substances 0.000 description 4
- ATUOYWHBWRKTHZ-UHFFFAOYSA-N Propane Chemical compound CCC ATUOYWHBWRKTHZ-UHFFFAOYSA-N 0.000 description 4
- 230000001476 alcoholic effect Effects 0.000 description 4
- 239000012159 carrier gas Substances 0.000 description 4
- 230000003301 hydrolyzing effect Effects 0.000 description 4
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 4
- 230000003993 interaction Effects 0.000 description 4
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 4
- 229910052757 nitrogen Inorganic materials 0.000 description 4
- 239000000126 substance Substances 0.000 description 4
- 238000005979 thermal decomposition reaction Methods 0.000 description 4
- WFDIJRYMOXRFFG-UHFFFAOYSA-N Acetic anhydride Chemical compound CC(=O)OC(C)=O WFDIJRYMOXRFFG-UHFFFAOYSA-N 0.000 description 3
- OTMSDBZUPAUEDD-UHFFFAOYSA-N Ethane Chemical compound CC OTMSDBZUPAUEDD-UHFFFAOYSA-N 0.000 description 3
- ZMANZCXQSJIPKH-UHFFFAOYSA-N Triethylamine Chemical compound CCN(CC)CC ZMANZCXQSJIPKH-UHFFFAOYSA-N 0.000 description 3
- UGACIEPFGXRWCH-UHFFFAOYSA-N [Si].[Ti] Chemical compound [Si].[Ti] UGACIEPFGXRWCH-UHFFFAOYSA-N 0.000 description 3
- 229910052787 antimony Inorganic materials 0.000 description 3
- WATWJIUSRGPENY-UHFFFAOYSA-N antimony atom Chemical compound [Sb] WATWJIUSRGPENY-UHFFFAOYSA-N 0.000 description 3
- ZMIGMASIKSOYAM-UHFFFAOYSA-N cerium Chemical compound [Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce] ZMIGMASIKSOYAM-UHFFFAOYSA-N 0.000 description 3
- 238000004519 manufacturing process Methods 0.000 description 3
- 229910003455 mixed metal oxide Inorganic materials 0.000 description 3
- MQWFLKHKWJMCEN-UHFFFAOYSA-N n'-[3-[dimethoxy(methyl)silyl]propyl]ethane-1,2-diamine Chemical compound CO[Si](C)(OC)CCCNCCN MQWFLKHKWJMCEN-UHFFFAOYSA-N 0.000 description 3
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 3
- OBETXYAYXDNJHR-UHFFFAOYSA-N 2-Ethylhexanoic acid Chemical compound CCCCC(CC)C(O)=O OBETXYAYXDNJHR-UHFFFAOYSA-N 0.000 description 2
- SJECZPVISLOESU-UHFFFAOYSA-N 3-trimethoxysilylpropan-1-amine Chemical compound CO[Si](OC)(OC)CCCN SJECZPVISLOESU-UHFFFAOYSA-N 0.000 description 2
- PAYRUJLWNCNPSJ-UHFFFAOYSA-N Aniline Chemical compound NC1=CC=CC=C1 PAYRUJLWNCNPSJ-UHFFFAOYSA-N 0.000 description 2
- FERIUCNNQQJTOY-UHFFFAOYSA-N Butyric acid Chemical compound CCCC(O)=O FERIUCNNQQJTOY-UHFFFAOYSA-N 0.000 description 2
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 2
- ROSDSFDQCJNGOL-UHFFFAOYSA-N Dimethylamine Chemical compound CNC ROSDSFDQCJNGOL-UHFFFAOYSA-N 0.000 description 2
- QUSNBJAOOMFDIB-UHFFFAOYSA-N Ethylamine Chemical compound CCN QUSNBJAOOMFDIB-UHFFFAOYSA-N 0.000 description 2
- AEMRFAOFKBGASW-UHFFFAOYSA-N Glycolic acid Chemical compound OCC(O)=O AEMRFAOFKBGASW-UHFFFAOYSA-N 0.000 description 2
- BAVYZALUXZFZLV-UHFFFAOYSA-N Methylamine Chemical compound NC BAVYZALUXZFZLV-UHFFFAOYSA-N 0.000 description 2
- AFBPFSWMIHJQDM-UHFFFAOYSA-N N-methylaniline Chemical compound CNC1=CC=CC=C1 AFBPFSWMIHJQDM-UHFFFAOYSA-N 0.000 description 2
- 235000021355 Stearic acid Nutrition 0.000 description 2
- 235000011054 acetic acid Nutrition 0.000 description 2
- 125000003545 alkoxy group Chemical group 0.000 description 2
- GVFOJDIFWSDNOY-UHFFFAOYSA-N antimony tin Chemical compound [Sn].[Sb] GVFOJDIFWSDNOY-UHFFFAOYSA-N 0.000 description 2
- WPYMKLBDIGXBTP-UHFFFAOYSA-N benzoic acid Chemical compound OC(=O)C1=CC=CC=C1 WPYMKLBDIGXBTP-UHFFFAOYSA-N 0.000 description 2
- 239000001273 butane Substances 0.000 description 2
- 238000009792 diffusion process Methods 0.000 description 2
- XBDQKXXYIPTUBI-UHFFFAOYSA-N dimethylselenoniopropionate Natural products CCC(O)=O XBDQKXXYIPTUBI-UHFFFAOYSA-N 0.000 description 2
- DMBHHRLKUKUOEG-UHFFFAOYSA-N diphenylamine Chemical compound C=1C=CC=CC=1NC1=CC=CC=C1 DMBHHRLKUKUOEG-UHFFFAOYSA-N 0.000 description 2
- 229910052736 halogen Inorganic materials 0.000 description 2
- IPCSVZSSVZVIGE-UHFFFAOYSA-N hexadecanoic acid Chemical compound CCCCCCCCCCCCCCCC(O)=O IPCSVZSSVZVIGE-UHFFFAOYSA-N 0.000 description 2
- FFUAGWLWBBFQJT-UHFFFAOYSA-N hexamethyldisilazane Chemical compound C[Si](C)(C)N[Si](C)(C)C FFUAGWLWBBFQJT-UHFFFAOYSA-N 0.000 description 2
- 150000002431 hydrogen Chemical class 0.000 description 2
- 238000002955 isolation Methods 0.000 description 2
- JVTAAEKCZFNVCJ-UHFFFAOYSA-N lactic acid Chemical compound CC(O)C(O)=O JVTAAEKCZFNVCJ-UHFFFAOYSA-N 0.000 description 2
- 239000007788 liquid Substances 0.000 description 2
- BDAGIHXWWSANSR-UHFFFAOYSA-N methanoic acid Natural products OC=O BDAGIHXWWSANSR-UHFFFAOYSA-N 0.000 description 2
- 125000000956 methoxy group Chemical group [H]C([H])([H])O* 0.000 description 2
- 239000000203 mixture Substances 0.000 description 2
- PHQOGHDTIVQXHL-UHFFFAOYSA-N n'-(3-trimethoxysilylpropyl)ethane-1,2-diamine Chemical compound CO[Si](OC)(OC)CCCNCCN PHQOGHDTIVQXHL-UHFFFAOYSA-N 0.000 description 2
- REODOQPOCJZARG-UHFFFAOYSA-N n-[[diethoxy(methyl)silyl]methyl]cyclohexanamine Chemical compound CCO[Si](C)(OCC)CNC1CCCCC1 REODOQPOCJZARG-UHFFFAOYSA-N 0.000 description 2
- IJDNQMDRQITEOD-UHFFFAOYSA-N n-butane Chemical compound CCCC IJDNQMDRQITEOD-UHFFFAOYSA-N 0.000 description 2
- OFBQJSOFQDEBGM-UHFFFAOYSA-N n-pentane Natural products CCCCC OFBQJSOFQDEBGM-UHFFFAOYSA-N 0.000 description 2
- 239000003345 natural gas Substances 0.000 description 2
- QIQXTHQIDYTFRH-UHFFFAOYSA-N octadecanoic acid Chemical compound CCCCCCCCCCCCCCCCCC(O)=O QIQXTHQIDYTFRH-UHFFFAOYSA-N 0.000 description 2
- OQCDKBAXFALNLD-UHFFFAOYSA-N octadecanoic acid Natural products CCCCCCCC(C)CCCCCCCCC(O)=O OQCDKBAXFALNLD-UHFFFAOYSA-N 0.000 description 2
- 239000000843 powder Substances 0.000 description 2
- 125000002924 primary amino group Chemical group [H]N([H])* 0.000 description 2
- 239000011164 primary particle Substances 0.000 description 2
- 239000001294 propane Substances 0.000 description 2
- 238000010791 quenching Methods 0.000 description 2
- 230000035484 reaction time Effects 0.000 description 2
- FZHAPNGMFPVSLP-UHFFFAOYSA-N silanamine Chemical class [SiH3]N FZHAPNGMFPVSLP-UHFFFAOYSA-N 0.000 description 2
- 239000008117 stearic acid Substances 0.000 description 2
- ZDHXKXAHOVTTAH-UHFFFAOYSA-N trichlorosilane Chemical compound Cl[SiH](Cl)Cl ZDHXKXAHOVTTAH-UHFFFAOYSA-N 0.000 description 2
- 239000005052 trichlorosilane Substances 0.000 description 2
- QQQSFSZALRVCSZ-UHFFFAOYSA-N triethoxysilane Chemical compound CCO[SiH](OCC)OCC QQQSFSZALRVCSZ-UHFFFAOYSA-N 0.000 description 2
- NMEPHPOFYLLFTK-UHFFFAOYSA-N trimethoxy(octyl)silane Chemical compound CCCCCCCC[Si](OC)(OC)OC NMEPHPOFYLLFTK-UHFFFAOYSA-N 0.000 description 2
- GETQZCLCWQTVFV-UHFFFAOYSA-N trimethylamine Chemical compound CN(C)C GETQZCLCWQTVFV-UHFFFAOYSA-N 0.000 description 2
- NQPDZGIKBAWPEJ-UHFFFAOYSA-N valeric acid Chemical compound CCCCC(O)=O NQPDZGIKBAWPEJ-UHFFFAOYSA-N 0.000 description 2
- GPPXJZIENCGNKB-UHFFFAOYSA-N vanadium Chemical compound [V]#[V] GPPXJZIENCGNKB-UHFFFAOYSA-N 0.000 description 2
- QBYIENPQHBMVBV-HFEGYEGKSA-N (2R)-2-hydroxy-2-phenylacetic acid Chemical compound O[C@@H](C(O)=O)c1ccccc1.O[C@@H](C(O)=O)c1ccccc1 QBYIENPQHBMVBV-HFEGYEGKSA-N 0.000 description 1
- OBETXYAYXDNJHR-SSDOTTSWSA-M (2r)-2-ethylhexanoate Chemical compound CCCC[C@@H](CC)C([O-])=O OBETXYAYXDNJHR-SSDOTTSWSA-M 0.000 description 1
- WYTZZXDRDKSJID-UHFFFAOYSA-N (3-aminopropyl)triethoxysilane Chemical compound CCO[Si](OCC)(OCC)CCCN WYTZZXDRDKSJID-UHFFFAOYSA-N 0.000 description 1
- 125000006773 (C2-C7) alkylcarbonyl group Chemical group 0.000 description 1
- WRIDQFICGBMAFQ-UHFFFAOYSA-N (E)-8-Octadecenoic acid Natural products CCCCCCCCCC=CCCCCCCC(O)=O WRIDQFICGBMAFQ-UHFFFAOYSA-N 0.000 description 1
- BJEPYKJPYRNKOW-REOHCLBHSA-N (S)-malic acid Chemical compound OC(=O)[C@@H](O)CC(O)=O BJEPYKJPYRNKOW-REOHCLBHSA-N 0.000 description 1
- DVXHRXDVNXCARD-UHFFFAOYSA-N 1-[ethoxy-methyl-(2-methylpropyl)silyl]oxy-n-ethylethanamine Chemical compound CCNC(C)O[Si](C)(CC(C)C)OCC DVXHRXDVNXCARD-UHFFFAOYSA-N 0.000 description 1
- 125000004066 1-hydroxyethyl group Chemical group [H]OC([H])([*])C([H])([H])[H] 0.000 description 1
- 125000006017 1-propenyl group Chemical group 0.000 description 1
- MDCUXQDLRULTKI-UHFFFAOYSA-N 1-triethoxysilylundecan-1-amine Chemical compound CCCCCCCCCCC(N)[Si](OCC)(OCC)OCC MDCUXQDLRULTKI-UHFFFAOYSA-N 0.000 description 1
- SKFMNDZBCQCINV-UHFFFAOYSA-N 1-trimethoxysilylundecan-1-amine Chemical compound CCCCCCCCCCC(N)[Si](OC)(OC)OC SKFMNDZBCQCINV-UHFFFAOYSA-N 0.000 description 1
- PKFHRDQMVBGXGO-UHFFFAOYSA-N 2,4-dinitro-n-(3-triethoxysilylpropyl)aniline Chemical compound CCO[Si](OCC)(OCC)CCCNC1=CC=C([N+]([O-])=O)C=C1[N+]([O-])=O PKFHRDQMVBGXGO-UHFFFAOYSA-N 0.000 description 1
- VEMKNBXDBBUVQZ-UHFFFAOYSA-N 2-(3-trimethoxysilylpropoxy)aniline Chemical compound CO[Si](OC)(OC)CCCOC1=CC=CC=C1N VEMKNBXDBBUVQZ-UHFFFAOYSA-N 0.000 description 1
- QMOCHTLIIWRLQV-UHFFFAOYSA-N 2-[methyl(3-trimethoxysilylpropyl)amino]ethanol Chemical compound CO[Si](OC)(OC)CCCN(C)CCO QMOCHTLIIWRLQV-UHFFFAOYSA-N 0.000 description 1
- QXULZQKARBZMBR-UHFFFAOYSA-N 2-methyl-n-(3-trimethoxysilylpropyl)propan-2-amine Chemical compound CO[Si](OC)(OC)CCCNC(C)(C)C QXULZQKARBZMBR-UHFFFAOYSA-N 0.000 description 1
- 125000000094 2-phenylethyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])([H])C([H])([H])* 0.000 description 1
- 125000003903 2-propenyl group Chemical group [H]C([*])([H])C([H])=C([H])[H] 0.000 description 1
- 125000001494 2-propynyl group Chemical group [H]C#CC([H])([H])* 0.000 description 1
- LQJBNNIYVWPHFW-UHFFFAOYSA-N 20:1omega9c fatty acid Natural products CCCCCCCCCCC=CCCCCCCCC(O)=O LQJBNNIYVWPHFW-UHFFFAOYSA-N 0.000 description 1
- BMVIHLQXGBMZNN-JXMROGBWSA-N 3-[(e)-2-methyl-4-trimethoxysilylbut-3-en-2-yl]oxypropan-1-amine Chemical compound CO[Si](OC)(OC)\C=C\C(C)(C)OCCCN BMVIHLQXGBMZNN-JXMROGBWSA-N 0.000 description 1
- PMJIKKNFJBDSHO-UHFFFAOYSA-N 3-[3-aminopropyl(diethoxy)silyl]oxy-3-methylpentane-1,5-diol Chemical compound NCCC[Si](OCC)(OCC)OC(C)(CCO)CCO PMJIKKNFJBDSHO-UHFFFAOYSA-N 0.000 description 1
- BNYFUBOZYDQIDU-UHFFFAOYSA-N 3-[diethoxy(ethyl)silyl]propan-1-amine Chemical compound CCO[Si](CC)(OCC)CCCN BNYFUBOZYDQIDU-UHFFFAOYSA-N 0.000 description 1
- HXLAEGYMDGUSBD-UHFFFAOYSA-N 3-[diethoxy(methyl)silyl]propan-1-amine Chemical compound CCO[Si](C)(OCC)CCCN HXLAEGYMDGUSBD-UHFFFAOYSA-N 0.000 description 1
- GGZBCIDSFGUWRA-UHFFFAOYSA-N 3-[dimethoxy(methyl)silyl]-n-methylpropan-1-amine Chemical compound CNCCC[Si](C)(OC)OC GGZBCIDSFGUWRA-UHFFFAOYSA-N 0.000 description 1
- GLISOBUNKGBQCL-UHFFFAOYSA-N 3-[ethoxy(dimethyl)silyl]propan-1-amine Chemical compound CCO[Si](C)(C)CCCN GLISOBUNKGBQCL-UHFFFAOYSA-N 0.000 description 1
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- 238000007254 oxidation reaction Methods 0.000 description 1
- SOQBVABWOPYFQZ-UHFFFAOYSA-N oxygen(2-);titanium(4+) Chemical class [O-2].[O-2].[Ti+4] SOQBVABWOPYFQZ-UHFFFAOYSA-N 0.000 description 1
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- IUVKMZGDUIUOCP-BTNSXGMBSA-N quinbolone Chemical compound O([C@H]1CC[C@H]2[C@H]3[C@@H]([C@]4(C=CC(=O)C=C4CC3)C)CC[C@@]21C)C1=CCCC1 IUVKMZGDUIUOCP-BTNSXGMBSA-N 0.000 description 1
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- ODBLHEXUDAPZAU-UHFFFAOYSA-N threo-D-isocitric acid Natural products OC(=O)C(O)C(C(O)=O)CC(O)=O ODBLHEXUDAPZAU-UHFFFAOYSA-N 0.000 description 1
- 150000004992 toluidines Chemical class 0.000 description 1
- 125000003944 tolyl group Chemical group 0.000 description 1
- FRGPKMWIYVTFIQ-UHFFFAOYSA-N triethoxy(3-isocyanatopropyl)silane Chemical compound CCO[Si](OCC)(OCC)CCCN=C=O FRGPKMWIYVTFIQ-UHFFFAOYSA-N 0.000 description 1
- CPUDPFPXCZDNGI-UHFFFAOYSA-N triethoxy(methyl)silane Chemical compound CCO[Si](C)(OCC)OCC CPUDPFPXCZDNGI-UHFFFAOYSA-N 0.000 description 1
- JXUKBNICSRJFAP-UHFFFAOYSA-N triethoxy-[3-(oxiran-2-ylmethoxy)propyl]silane Chemical compound CCO[Si](OCC)(OCC)CCCOCC1CO1 JXUKBNICSRJFAP-UHFFFAOYSA-N 0.000 description 1
- ROWWCTUMLAVVQB-UHFFFAOYSA-N triethoxysilylmethanamine Chemical compound CCO[Si](CN)(OCC)OCC ROWWCTUMLAVVQB-UHFFFAOYSA-N 0.000 description 1
- BPSIOYPQMFLKFR-UHFFFAOYSA-N trimethoxy-[3-(oxiran-2-ylmethoxy)propyl]silane Chemical compound CO[Si](OC)(OC)CCCOCC1CO1 BPSIOYPQMFLKFR-UHFFFAOYSA-N 0.000 description 1
- ODHXBMXNKOYIBV-UHFFFAOYSA-N triphenylamine Chemical compound C1=CC=CC=C1N(C=1C=CC=CC=1)C1=CC=CC=C1 ODHXBMXNKOYIBV-UHFFFAOYSA-N 0.000 description 1
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Classifications
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09C—TREATMENT OF INORGANIC MATERIALS, OTHER THAN FIBROUS FILLERS, TO ENHANCE THEIR PIGMENTING OR FILLING PROPERTIES ; PREPARATION OF CARBON BLACK ; PREPARATION OF INORGANIC MATERIALS WHICH ARE NO SINGLE CHEMICAL COMPOUNDS AND WHICH ARE MAINLY USED AS PIGMENTS OR FILLERS
- C09C3/00—Treatment in general of inorganic materials, other than fibrous fillers, to enhance their pigmenting or filling properties
- C09C3/08—Treatment with low-molecular-weight non-polymer organic compounds
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B33/00—Silicon; Compounds thereof
- C01B33/113—Silicon oxides; Hydrates thereof
- C01B33/12—Silica; Hydrates thereof, e.g. lepidoic silicic acid
- C01B33/18—Preparation of finely divided silica neither in sol nor in gel form; After-treatment thereof
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B33/00—Silicon; Compounds thereof
- C01B33/113—Silicon oxides; Hydrates thereof
- C01B33/12—Silica; Hydrates thereof, e.g. lepidoic silicic acid
- C01B33/18—Preparation of finely divided silica neither in sol nor in gel form; After-treatment thereof
- C01B33/181—Preparation of finely divided silica neither in sol nor in gel form; After-treatment thereof by a dry process
- C01B33/183—Preparation of finely divided silica neither in sol nor in gel form; After-treatment thereof by a dry process by oxidation or hydrolysis in the vapour phase of silicon compounds such as halides, trichlorosilane, monosilane
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01F—COMPOUNDS OF THE METALS BERYLLIUM, MAGNESIUM, ALUMINIUM, CALCIUM, STRONTIUM, BARIUM, RADIUM, THORIUM, OR OF THE RARE-EARTH METALS
- C01F17/00—Compounds of rare earth metals
- C01F17/20—Compounds containing only rare earth metals as the metal element
- C01F17/206—Compounds containing only rare earth metals as the metal element oxide or hydroxide being the only anion
- C01F17/218—Yttrium oxides or hydroxides
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01F—COMPOUNDS OF THE METALS BERYLLIUM, MAGNESIUM, ALUMINIUM, CALCIUM, STRONTIUM, BARIUM, RADIUM, THORIUM, OR OF THE RARE-EARTH METALS
- C01F17/00—Compounds of rare earth metals
- C01F17/20—Compounds containing only rare earth metals as the metal element
- C01F17/206—Compounds containing only rare earth metals as the metal element oxide or hydroxide being the only anion
- C01F17/224—Oxides or hydroxides of lanthanides
- C01F17/235—Cerium oxides or hydroxides
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01G—COMPOUNDS CONTAINING METALS NOT COVERED BY SUBCLASSES C01D OR C01F
- C01G23/00—Compounds of titanium
- C01G23/04—Oxides; Hydroxides
- C01G23/047—Titanium dioxide
- C01G23/07—Producing by vapour phase processes, e.g. halide oxidation
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01G—COMPOUNDS CONTAINING METALS NOT COVERED BY SUBCLASSES C01D OR C01F
- C01G9/00—Compounds of zinc
- C01G9/02—Oxides; Hydroxides
- C01G9/03—Processes of production using dry methods, e.g. vapour phase processes
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- C09C1/00—Treatment of specific inorganic materials other than fibrous fillers; Preparation of carbon black
- C09C1/0096—Compounds of antimony
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- C09C1/00—Treatment of specific inorganic materials other than fibrous fillers; Preparation of carbon black
- C09C1/04—Compounds of zinc
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- C09C1/00—Treatment of specific inorganic materials other than fibrous fillers; Preparation of carbon black
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- C09C1/00—Treatment of specific inorganic materials other than fibrous fillers; Preparation of carbon black
- C09C1/36—Compounds of titanium
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- C09C3/00—Treatment in general of inorganic materials, other than fibrous fillers, to enhance their pigmenting or filling properties
- C09C3/12—Treatment with organosilicon compounds
Definitions
- the invention relates to a process for surface modification of metal oxide particles, and to the metal oxide particles obtainable by the process
- a surface modification can be performed by dispersing the unmodified powder in the presence of at least one organic compound which possesses at least one functional group which can react and/or interact with groups present on the surface of the powder particles in water and/or an organic solvent, and then optionally fully or partly removing the liquid phase.
- processes with which especially pyrogenic metal oxide particles can be surface-modified proceed from metal chlorides which are evaporated and combusted with hydrogen and air to form metal oxide particles.
- the metal oxide particles are sprayed with a surface-modifying reagent while mixing vigorously, and then heat-treated at a temperature of 100 to 400°C over a period of 1 to 6 hours.
- One variant of this process envisages mixing the metal oxide particles very substantially homogeneously with an organohalosilane while excluding oxygen, and heating the mixture together with small amounts of steam to temperatures of 200 to 800°C in an upright tubular oven in a continuous cocurrent process.
- a surface modifier is introduced into a gas stream comprising metal oxide particles, and the resulting reaction mixture is exposed to a temperature of 130 to 250°C, preferably of 150 to 230°C, more preferably of 170 to 210°C, for a minimum residence time in the range from 1 to 60 s, preferably 2 to 30 s, more preferably 5 to 10 s, and
- the solid reaction products are removed from the flowing reaction mixture by means of a filter apparatus and the reaction mixture present at the filter is treated at a temperature of 1 10 to 230°C, preferably 130 to 180°C, more preferably 140 to 150°C, for a minimum residence time in the range from 1 min to 1 hour, preferably 10 to 40 min, more preferably 20 to 30 min.
- minimum residence time shall be understood to mean that each particle is exposed to the conditions at least over this period.
- the mean residence time shall be determined by the quotient of the volume of the surface modification zone and the volume flow rate.
- the metal oxide particles used may be subjected beforehand to a steam treatment at temperatures of 200 to 700°C. This may be advisable when impurities removable with steam, such as halides, are to be removed.
- the metal oxide particles according to the invention are those which bear, on their surface, reactive groups which are suitable for entering into a covalent, ionic or coordinate bond with a surface modifier.
- these groups are hydroxyl groups.
- the attachment of the surface modifier may comprise all or only some of the reactive groups available.
- the process according to the invention allows the surface modification of metal oxide particles irrespective of their structure.
- the particles may be present as isolated individual particles and/or as aggregates of joined individual particles.
- the metal oxide particles may be those comprising one, two or more than two metal
- the particles comprising two or more metal components are mixed metal oxide particles wherein the particular proportions of the metal oxide components are not limited.
- coated or partly coated metal oxide particles are also understood to be mixed oxide particles.
- Mixed oxide particles are understood to mean those in which there is intimate mixing of the metal components at the atomic level.
- the origin of the metal oxide particles is unimportant for the performance of the process according to the invention, provided that the metal oxide particles bear reactive groups at the surface thereof.
- metal oxide particles obtainable by precipitation, sol-gel processes, hydrothermal synthesis or pyrogenic processes can be used. As explained later, it may be advantageous to use pyrogenic metal oxide particles.
- "Pyrogenic” is understood to mean hydrolysis, oxidation or a reaction sequence in which both types occur alongside one another, in which metal compounds are hydrolysed and/or oxidized in the gas phase, generally in a flame.
- the flame may be obtained, for example, by the reaction of hydrogen and oxygen. This firstly forms finely divided, nonporous primary particles, which become joined together later in the reaction to form aggregates.
- the BET surface area of these primary particles is between 5 and 600 m 2 /g.
- Pyrogenic metal oxide particles are very substantially free of inner pores and have hydroxyl groups on their surfaces.
- the metal oxide particles are preferably selected from the group consisting of aluminium oxide, antimony oxide, cerium oxide, iron oxide, indium oxide, silicon dioxide, titanium dioxide, vanadium oxide, tungsten oxide, yttrium oxide, zinc oxide, tin oxide and zirconium dioxide. Silicon dioxide shall be considered to be a metal oxide in the context of the invention.
- a process for producing surface-modified metal oxide particles in which in a reactor which comprises, in each case successively, a mixing zone, a combustion zone, a cooling zone, a surface modification zone and a removal zone,
- a stream comprising one or more hydrolysable and/or oxidizable metal compounds in the form of vapour or of an aerosol, one or more hydrogen-containing combustion gases and
- an oxygen-containing gas is obtained, b) this gas is transferred into the combustion zone, ignited there and reacted at a mean residence time of 10 ms to 10 s, preferably 100 ms to 5 s, more preferably 1 s to 5 s,
- a surface modifier is introduced into the stream of the reaction mixture, and the resulting reaction mixture is exposed to a temperature of 130 to 250°C, preferably of 150 to 230°C, more preferably of 170 to 210°C, for a minimum residence time in the range from 1 to 60 s, preferably 2 to 30 s, more preferably 5 to 10 s, and f) in an immediately downstream, second reaction step, the solid reaction products are removed from the flowing reaction mixture by means of a filter apparatus, and the reaction mixture present at the filter is treated at a temperature of 1 10 to 230°C, preferably 130 to 180°C, more preferably
- 140 to 150°C for a minimum residence time in the range from 1 min to 1 hour, preferably 10 to 40 min, more preferably 20 to 30 min.
- the pyrogenic particles are directly surface-modified without further isolation.
- the gas stream comprising the metal oxide particles is obtained by thermal decomposition of at least one metal compound in the presence of one or more hydrolysing and/or oxidizing gases or vapours.
- the oxidizing and/or hydrolysing gases or vapours are preferably used in a stoichiometric excess based on the metal compound.
- the metal compound may preferably be present in vaporous form, liquid form or in the form of an aerosol.
- the temperature needed for thermal decomposition can preferably be provided by a flame, preferably obtained by the ignition of a combustion gas with an oxygen-containing gas.
- Suitable oxygen-containing gases are in particular air and oxygen-enriched air.
- Suitable combustion gases are in particular hydrogen, methane, ethane, propane, butane, natural gas. Particular preference may be given to using a combination of air and hydrogen.
- flame types suitable for performance of the process according to the invention for example laminar or turbulent flames, premixed flames or diffusion flames, low-pressure or high- pressure flames, flames which spread below, at or above the speed of sound, pulsating or continuous flames, reducing or oxidizing flames, secondary flames, closed or open flames, flames from one or more burners, or a mixed form of the aforementioned flame types.
- the metal component of the metal compound may preferably be selected from the group consisting of aluminium, antimony, cerium, iron, indium, silicon, titanium, vanadium, tungsten, yttrium, zinc, tin and zirconium.
- the metal compounds used must be
- the amounts of hydrogenous combustion gas and oxygen-containing gas are generally selected such that the metal compound can be very substantially quantitatively hydrolysed and/or oxidized to the metal oxide.
- A represents one or more metal compounds
- B represents a hydrogenous combustion gas
- C represents an oxygen-containing gas
- D represents the point of introduction of the surface modifier
- E represents the surface modification zone
- G represents the surface-modified metal oxide particles.
- the filter apparatus used comprises filter types known to those skilled in the art. It may be advantageous to operate two or more filter apparatuses, optionally offset in time.
- the pyrogenic particles are directly surface-modified without further isolation.
- the gas stream comprising the metal oxide particles is obtained by thermal decomposition of at least one metal compound in the presence of one or more hydrolysing and/or oxidizing gases or vapours.
- the oxidizing and/or hydrolysing gases or vapours are preferably used in a stoichiometric excess based on the metal compound.
- the metal compound is generally present in vaporous form or in the form of an aerosol.
- the temperature needed for thermal decomposition can preferably be provided by a flame, preferably obtained by the ignition of a combustion gas with an oxygen-containing gas.
- Suitable oxygen-containing gases are in particular air and oxygen-enriched air.
- Suitable combustion gases are in particular hydrogen, methane, ethane, propane, butane, natural gas. Particular preference may be given to using a combination of air and hydrogen.
- flame types suitable for performance of the process according to the invention for example laminar or turbulent flames, premixed flames or diffusion flames, low-pressure or high- pressure flames, flames which spread below, at or above the speed of sound, pulsating or continuous flames, reducing or oxidizing flames, secondary flames, closed or open flames, flames from one or more burners, or a mixed form of the aforementioned flame types.
- the metal component of the metal compound may preferably be selected from the group consisting of aluminium, antimony, cerium, iron, indium, silicon, titanium, vanadium, tungsten, yttrium, zinc, tin and zirconium.
- the metal compounds used must be
- the surface modifier/metal oxide particle ratio in the process according to the invention is preferably selected such that the carbon content of the surface- modified metal oxide particles is 0.1 to 10% by weight. Particular preference may be given to a range of 0.5 to 5% by weight.
- the surface modifier may preferably be introduced in liquid or dissolved form. It is more preferably introduced in the form of fine droplets which are obtained by atomizing the surface modifier by means of a carrier gas.
- the mean diameter of the fine droplets is preferably less than 100 ⁇ , more preferably 30-100 ⁇ .
- the surface modifier used in the process according to the invention has at least one functional group which can chemically react or interact with reactive groups present on the surface of the metal oxide particles to form bonds.
- the bonding may be in the form of chemical bonding, such as covalent, including
- the surface modifier is preferably a substance whose boiling temperature is above the temperature in the first and/or second reaction step.
- Examples of preferred monocarboxylic acids are formic acid, acetic acid, propionic acid, butyric acid, pentanoic acid, hexanoic acid, lauric acid, stearic acid, palmitic acid or oleic acid, glycolic acid, lactic acid, malic acid, tartaric acid, citric acid, isocitric acid, mandelic acid, benzoic acid and pyromellitic acid.
- suitable amines are methylamine, dimethylamine, trimethylamine, ethylamine, diethylamine, triethylamine, aniline, N-methylaniline,
- diphenylamine triphenylamine, toluidine, ethylenediamine, diethylenetriamine.
- Preferred hydrolysable silanes have the general formula R x SiY 4-x (I)
- x has the value of 1 , 2 or 3
- the R radicals are the same or different and are nonhydrolysable groups
- the Y radicals are the same or different and are hydrolysable groups or hydroxyl groups.
- hydrolysable Y groups which may be the same or different from one another are, for example,
- halogen for example F, CI, Br or I
- Ci-C6-alkoxy such as methoxy, ethoxy
- aryloxy preferably C6-Cio-aryloxy, such as phenoxy
- Ci-C6-acyloxy such as acetoxy or propionyloxy
- alkylcarbonyl preferably C2-C 7 -alkylcarbonyl, such as acetyl.
- hydrolysable radicals are halogen, alkoxy groups and acyloxy groups. Particularly preferred hydrolysable radicals are Ci-C 4 -alkoxy groups, especially methoxy and ethoxy.
- the nonhydrolysable R radicals which may be the same or different, are R radicals with or without a functional group.
- the nonhydrolysable R radical without a functional group is, for example,
- Ci-Cs-alkyl such as methyl, ethyl
- n-propyl isopropyl, n-butyl, sec-butyl and tert-butyl, pentyl, hexyl, octyl or cyclohexyl;
- alkenyl preferably C2-C6-alkenyl, such as vinyl, 1 -propenyl,
- alkynyl preferably C2-C6-alkynyl, such as propargyl, - aryl, preferably C-6-Cio-aryl, such as phenyl and naphthyl, and
- alkaryls such as tolyl, benzyl and phenethyl.
- Preferred surface modifiers may especially be CH 3 SiCl3, CH 3 Si(OC2H 5 )3, CH 3 Si(OCH 3 ) 3 , C 2 H 5 SiCI 3 , C 2 H 5 Si(OC2H5) 3 , C 2 H 5 Si(OCH 3 ) 3 , C 3 H 7 Si(OC 2 H5) 3 , (C 2 H 5 O) 3 SiC 3 H 6 CI, (CH 3 ) 2 SiCI 2 , (CH 3 ) 2 Si(OC 2 H 5 ) 2 , (CH 3 ) 2 Si(OH) 2 ,
- CH 2 CH-CH 2 -Si(OC 2 H 5 ) 3
- CH 2 CH-CH 2 -Si(OC 2 H 5 ) 3
- CH 2 CH-CH 2 - Si(OOCCH 3 ) 3
- a nonhydrolysable R radical with a functional group may comprise, for example, as a functional group, an epoxy (such as glycidyl or glycidyloxy), hydroxyl, ether, amino, monoalkylamino, dialkylamino, optionally substituted anilino, amide, carboxyl, acryloyi, acryloyloxy, methacryloyl, methacryloyloxy, mercapto, cyano, alkoxy, isocyanato, aldehyde, alkylcarbonyl, acid anhydride and phosphoric acid group.
- an epoxy such as glycidyl or glycidyloxy
- hydroxyl ether
- amino, monoalkylamino, dialkylamino optionally substituted anilino, amide, carboxyl, acryloyi, acryloyloxy, methacryloyl, methacryloyloxy, mercapto, cyano, alkoxy
- nonhydrolysable R radicals with functional groups are a
- - glycidyl- or glycidyloxy-(Ci-C 2 o)-alkylene radical such as beta- glycidyloxyethyl, gamma-glycidyloxypropyl, delta-glycidyloxybutyl, epsilon- glycidyloxypentyl, omega-glycidyloxyhexyl and
- gamma-glycidyloxypropyltrimethoxysilane glycidyloxypropyltriethoxysilane, 3-isocyanatopropyltriethoxysilane, 3-isocyanatopropyldimethylchlorosilane, aminopropyltriethoxysilane, aminopropyltrimethoxysilane, aminomethyltriethoxysilane, aminomethyltrinnethoxysilane,
- aminopropyltnchlorosilane (N-cyclohexylanninonnethyl)triethoxysilane, 2-anninoethyl-3-anninopropyltrinnethoxysilane,
- 3-aminopropyltris(methoxyethoxyethoxy)silane 3-aminopropyltris(trimethylsiloxy)silane, 4-aminobutyltriethoxysilane, aminophenyltrimethoxysilane, bis(2-hydroxyethyl)-3- aminopropyltriethoxysilane, diethylaminomethyltnethoxysilane, N,N- dimethylanninonnethylethoxysilane,
- N-phenylaminomethyltriethoxysilane N-phenylaminomethyltriethoxysilane, phenylbis(dimethylannino)chlorosilane, tert-butylaminopropyltrimethoxysilane, aminopropylsilanetriol,
- N-phenylaminomethyltrinnethoxysilane 3- (nneth)acryloyloxypropyltriethoxysilane and 3- (meth)acryloyloxypropyltrinnethoxysilane.
- silylamines are understood to mean compounds which have at least one Si-N bond and can react with the Si-OH groups present on the surface of the silicon dioxide particles. Examples thereof are vinyldimethylsilylamine, octyldimethylsilylamine, phenyldimethylsilylamine, bis(dimethylanninodinnethylsilyl)ethane,
- n 0,1 ,2,3,... ⁇ , preferably 0,1 ,2,3,... 100 000
- Polysiloxanes or silicone oils are usually thermally activated for surface modification. Particular preference may be given to using citric acid, lauric acid, stearic acid and pyromellitic acid.
- the process according to the invention allows an inexpensive production for surface modification of metal oxide particles. For instance, the apparatus expenditure is low, the reaction time is short and the conversion is high. It is particularly advantageous to link the production of the metal oxide particles by a pyrogenic process to immediately subsequent surface modification. This can be done, for example, by utilizing the heat which arises in the process of preparation of the metal oxide particles, and apparatus as would be required in any case in the production of the metal oxide particles, for example a filter apparatus, for surface modification. The reason why the reaction times are only very short in the process according to the invention even though the reaction takes place in the immobile filtercake, compared to known surface modification processes, is not known to date.
- the solid particles are removed at a filter, the temperature at the filter being 170°C.
- the minimum residence time of the particles from the time of addition of the surface modifier up to the filter is 1 .2 s. In addition, the minimum residence time of the particles on the filter until the filter is cleaned is 8 min.
- the silicon dioxide particles which form are aftertreated with steam at temperatures of 500 to 600°C, and the process gas stream is cooled to 160°C. Subsequently, at this temperature, 2 kg/h of vaporous octyltrimethoxysilane are metered into the process gas stream. Subsequently, the solid particles are removed at a filter, the temperature at the filter being 170°C.
- the minimum residence time of the particles from the time of addition of the surface modifier up to the filter is 1 .8 s.
- the minimum residence time of the particles on the filter until the filter is cleaned is 15 min.
- the solid particles are removed at a filter, the temperature at the filter being 165°C.
- the minimum residence time of the particles from the time of addition of the surface modifier up to the filter is 1 .2 s.
- the minimum residence time of the particles on the filter until the filter is cleaned is 9 min.
- 2.77% by weight of antimony(lll) acetate, 16.03% by weight of acetic anhydride and 5.00% by weight of acetic acid are atomized with 4.0 m 3 (STP)/h of atomizer air by means of a two-substance nozzle.
- the resulting droplets have a droplet size spectrum d3o from 5 to 15 ⁇ .
- the droplets are combusted into a reaction chamber in a flame formed from hydrogen (2.5 m 3 (STP)/h) and air (24.0 m 3 (STP)/h), corresponding to a lambda of 4.1 .
- the antimony-tin mixed oxide particles which form are aftertreated with steam at temperatures of 500 to 600°C, and the process gas stream is cooled to 190°C. Subsequently, at this temperature, 200 g/h of an alcoholic lauric acid solution (10% by weight in ethanol) are metered into the process gas stream. Subsequently, the solid particles are removed at a filter, the temperature at the filter being 200°C.
- the minimum residence time of the particles from the time of addition of the surface modifier up to the filter is 1 .5 s.
- the minimum residence time of the particles on the filter until the filter is cleaned is 8 min.
- the silicon-titanium mixed oxide particles which form are aftertreated with steam at temperatures of 500 to 600°C, and the process gas stream is cooled to 200°C. Subsequently, at this temperature, 200 g/h of alcoholic pyromellitic acid (10% by weight in ethanol) are metered into the process gas stream.
- the solid particles are removed at a filter, the temperature at the filter being 200°C.
- the minimum residence time of the particles from the time of addition of the surface modifier up to the filter is 10.3 s. In addition, the minimum residence time of the particles on the filter until the filter is cleaned is 17 min.
- the minimum residence time of the particles from the time of addition of the surface modifier up to the filter is 1 .1 s. In addition, the minimum residence time of the particles on the filter until the filter is cleaned is 5 min.
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Abstract
Process for producing surface-modified metal oxide particles, characterized in that a) in a first reaction step, a surface modifier is introduced into a gas stream comprising metal oxide particles, and the resulting reaction mixture is exposed to a temperature of 130 to 250° C for a minimum residence time in the range from 1 to 60 s, and b) in an immediately subsequent, second reaction step, the solid reaction products are removed from the flowing reaction mixture by means of a filter apparatus and the reaction mixture present at the filter is treated at a temperature of 110 to 230° C for a minimum residence time in the range from 1 min to 1 hour.
Description
Process for surface modification of metal oxide particles
The invention relates to a process for surface modification of metal oxide particles, and to the metal oxide particles obtainable by the process
themselves. The surface modification of metal oxide particles is an important process for altering the surface and hence the properties of particles.
In the simplest case, a surface modification can be performed by dispersing the unmodified powder in the presence of at least one organic compound which possesses at least one functional group which can react and/or interact with groups present on the surface of the powder particles in water and/or an organic solvent, and then optionally fully or partly removing the liquid phase.
Additionally known are processes with which especially pyrogenic metal oxide particles can be surface-modified. These processes proceed from metal chlorides which are evaporated and combusted with hydrogen and air to form metal oxide particles. In a next step, the metal oxide particles are sprayed with a surface-modifying reagent while mixing vigorously, and then heat-treated at a temperature of 100 to 400°C over a period of 1 to 6 hours. One variant of this process envisages mixing the metal oxide particles very substantially homogeneously with an organohalosilane while excluding oxygen, and heating the mixture together with small amounts of steam to temperatures of 200 to 800°C in an upright tubular oven in a continuous cocurrent process.
It was an object of the present invention to provide a process for surface modification of metal oxide particles, which is easy to perform and inexpensive compared to the processes known in the prior art. It has now been found that, surprisingly, the object is achieved by a process in which
a) in a first reaction step, a surface modifier is introduced into a gas stream comprising metal oxide particles, and the resulting reaction mixture is exposed to a temperature of 130 to 250°C, preferably of 150 to 230°C,
more preferably of 170 to 210°C, for a minimum residence time in the range from 1 to 60 s, preferably 2 to 30 s, more preferably 5 to 10 s, and
in an immediately subsequent, second reaction step, the solid reaction
products are removed from the flowing reaction mixture by means of a filter apparatus and the reaction mixture present at the filter is treated at a temperature of 1 10 to 230°C, preferably 130 to 180°C, more preferably 140 to 150°C, for a minimum residence time in the range from 1 min to 1 hour, preferably 10 to 40 min, more preferably 20 to 30 min. In the context of the present invention, minimum residence time shall be understood to mean that each particle is exposed to the conditions at least over this period.
In the context of the present invention, the mean residence time shall be determined by the quotient of the volume of the surface modification zone and the volume flow rate.
The metal oxide particles used may be subjected beforehand to a steam treatment at temperatures of 200 to 700°C. This may be advisable when impurities removable with steam, such as halides, are to be removed.
The metal oxide particles according to the invention are those which bear, on their surface, reactive groups which are suitable for entering into a covalent, ionic or coordinate bond with a surface modifier. In general, these groups are hydroxyl groups. The attachment of the surface modifier may comprise all or only some of the reactive groups available. The process according to the invention allows the surface modification of metal oxide particles irrespective of their structure. For instance, the particles may be present as isolated individual particles and/or as aggregates of joined individual particles. The metal oxide particles may be those comprising one, two or more than two metal
components. The particles comprising two or more metal components are mixed metal oxide particles wherein the particular proportions of the metal oxide components are not limited. In the context of the invention, coated or
partly coated metal oxide particles are also understood to be mixed oxide particles. Mixed oxide particles are understood to mean those in which there is intimate mixing of the metal components at the atomic level.
The origin of the metal oxide particles is unimportant for the performance of the process according to the invention, provided that the metal oxide particles bear reactive groups at the surface thereof. For example, metal oxide particles obtainable by precipitation, sol-gel processes, hydrothermal synthesis or pyrogenic processes can be used. As explained later, it may be advantageous to use pyrogenic metal oxide particles. "Pyrogenic" is understood to mean hydrolysis, oxidation or a reaction sequence in which both types occur alongside one another, in which metal compounds are hydrolysed and/or oxidized in the gas phase, generally in a flame. The flame may be obtained, for example, by the reaction of hydrogen and oxygen. This firstly forms finely divided, nonporous primary particles, which become joined together later in the reaction to form aggregates. The BET surface area of these primary particles is between 5 and 600 m2/g. Pyrogenic metal oxide particles are very substantially free of inner pores and have hydroxyl groups on their surfaces.
The metal oxide particles are preferably selected from the group consisting of aluminium oxide, antimony oxide, cerium oxide, iron oxide, indium oxide, silicon dioxide, titanium dioxide, vanadium oxide, tungsten oxide, yttrium oxide, zinc oxide, tin oxide and zirconium dioxide. Silicon dioxide shall be considered to be a metal oxide in the context of the invention.
It has additionally been found that the object is also achieved by a process for producing surface-modified metal oxide particles, in which in a reactor which comprises, in each case successively, a mixing zone, a combustion zone, a cooling zone, a surface modification zone and a removal zone,
a) in the mixing zone, a stream comprising one or more hydrolysable and/or oxidizable metal compounds in the form of vapour or of an aerosol, one or more hydrogen-containing combustion gases and
an oxygen-containing gas is obtained,
b) this gas is transferred into the combustion zone, ignited there and reacted at a mean residence time of 10 ms to 10 s, preferably 100 ms to 5 s, more preferably 1 s to 5 s,
c) optionally, steam is introduced to remove halide-containing impurities, d) then the stream of the reaction mixture is cooled in the cooling zone to temperatures of 150 to 400°C, preferably 200 to 240°C,
e) in the surface modification zone, a surface modifier is introduced into the stream of the reaction mixture, and the resulting reaction mixture is exposed to a temperature of 130 to 250°C, preferably of 150 to 230°C, more preferably of 170 to 210°C, for a minimum residence time in the range from 1 to 60 s, preferably 2 to 30 s, more preferably 5 to 10 s, and f) in an immediately downstream, second reaction step, the solid reaction products are removed from the flowing reaction mixture by means of a filter apparatus, and the reaction mixture present at the filter is treated at a temperature of 1 10 to 230°C, preferably 130 to 180°C, more preferably
140 to 150°C, for a minimum residence time in the range from 1 min to 1 hour, preferably 10 to 40 min, more preferably 20 to 30 min.
In this particular embodiment of the invention, the pyrogenic particles are directly surface-modified without further isolation. To this end, the gas stream comprising the metal oxide particles is obtained by thermal decomposition of at least one metal compound in the presence of one or more hydrolysing and/or oxidizing gases or vapours. In this case, the oxidizing and/or hydrolysing gases or vapours are preferably used in a stoichiometric excess based on the metal compound. The metal compound may preferably be present in vaporous form, liquid form or in the form of an aerosol.
The temperature needed for thermal decomposition can preferably be provided by a flame, preferably obtained by the ignition of a combustion gas with an oxygen-containing gas. Suitable oxygen-containing gases are in particular air and oxygen-enriched air. Suitable combustion gases are in particular hydrogen, methane, ethane, propane, butane, natural gas. Particular preference may be given to using a combination of air and hydrogen.
The person skilled in the art is aware of different flame types suitable for performance of the process according to the invention, for example laminar or turbulent flames, premixed flames or diffusion flames, low-pressure or high- pressure flames, flames which spread below, at or above the speed of sound, pulsating or continuous flames, reducing or oxidizing flames, secondary flames, closed or open flames, flames from one or more burners, or a mixed form of the aforementioned flame types.
The metal component of the metal compound may preferably be selected from the group consisting of aluminium, antimony, cerium, iron, indium, silicon, titanium, vanadium, tungsten, yttrium, zinc, tin and zirconium. To prepare mixed metal oxides, two or more metal compounds with different metal components are correspondingly selected. The metal compounds used must be
hydrolysable and/or oxidizable.
The amounts of hydrogenous combustion gas and oxygen-containing gas are generally selected such that the metal compound can be very substantially quantitatively hydrolysed and/or oxidized to the metal oxide.
This embodiment is outlined in Figure 1 . In this figure,
A represents one or more metal compounds,
B represents a hydrogenous combustion gas,
C represents an oxygen-containing gas,
D represents the point of introduction of the surface modifier,
E represents the surface modification zone,
F represents the filter apparatus,
G represents the surface-modified metal oxide particles.
The filter apparatus used comprises filter types known to those skilled in the art. It may be advantageous to operate two or more filter apparatuses, optionally offset in time.
As already explained, it may be advantageous to use pyrogenic metal oxide particles in the process according to the invention. In a particular embodiment
of the invention, the pyrogenic particles are directly surface-modified without further isolation. To this end, the gas stream comprising the metal oxide particles is obtained by thermal decomposition of at least one metal compound in the presence of one or more hydrolysing and/or oxidizing gases or vapours. In this case, the oxidizing and/or hydrolysing gases or vapours are preferably used in a stoichiometric excess based on the metal compound. The metal compound is generally present in vaporous form or in the form of an aerosol.
The temperature needed for thermal decomposition can preferably be provided by a flame, preferably obtained by the ignition of a combustion gas with an oxygen-containing gas. Suitable oxygen-containing gases are in particular air and oxygen-enriched air. Suitable combustion gases are in particular hydrogen, methane, ethane, propane, butane, natural gas. Particular preference may be given to using a combination of air and hydrogen.
The person skilled in the art is aware of different flame types suitable for performance of the process according to the invention, for example laminar or turbulent flames, premixed flames or diffusion flames, low-pressure or high- pressure flames, flames which spread below, at or above the speed of sound, pulsating or continuous flames, reducing or oxidizing flames, secondary flames, closed or open flames, flames from one or more burners, or a mixed form of the aforementioned flame types.
The metal component of the metal compound may preferably be selected from the group consisting of aluminium, antimony, cerium, iron, indium, silicon, titanium, vanadium, tungsten, yttrium, zinc, tin and zirconium. To prepare mixed metal oxides, two or more metal compounds with different metal components are correspondingly selected. The metal compounds used must be
hydrolysable and/or oxidizable.
According to which surface modifier is used in which amount, it is possible to obtain predominantly hydrophobic or hydrophilic metal oxide particles. The surface modifier/metal oxide particle ratio in the process according to the invention is preferably selected such that the carbon content of the surface-
modified metal oxide particles is 0.1 to 10% by weight. Particular preference may be given to a range of 0.5 to 5% by weight. The surface modifier may preferably be introduced in liquid or dissolved form. It is more preferably introduced in the form of fine droplets which are obtained by atomizing the surface modifier by means of a carrier gas. The mean diameter of the fine droplets is preferably less than 100 μιτι, more preferably 30-100 μιτι.
The surface modifier used in the process according to the invention has at least one functional group which can chemically react or interact with reactive groups present on the surface of the metal oxide particles to form bonds. The bonding may be in the form of chemical bonding, such as covalent, including
coordinate, bonds (complexes), or ionic bonds of the functional group with the surface groups of the particles, while examples of interactions include dipole- dipole interactions, polar interactions, hydrogen bonds and van der Waals interactions. Preference is given to the formation of a chemical bond. The surface modifier is preferably a substance whose boiling temperature is above the temperature in the first and/or second reaction step.
Preference is given to using, in the process according to the invention,
saturated or unsaturated alkyl- and arylmonocarboxylic acids having 1 to 20 carbon atoms, i.e. those having one CO2H group, or polycarboxylic acids, i.e. those having more than one CO2H group, and the
corresponding esters and acid halides of the aforementioned carboxylic acids;
amines of the general formula R3-XNHX,
where x = 0, 1 or 2 and R = alkyl or aryl;
- hydrolysable organosilanes;
disilazanes;
cyclic polysiloxanes and silicone oils.
Examples of preferred monocarboxylic acids are formic acid, acetic acid, propionic acid, butyric acid, pentanoic acid, hexanoic acid, lauric acid, stearic acid, palmitic acid or oleic acid, glycolic acid, lactic acid, malic acid, tartaric acid, citric acid, isocitric acid, mandelic acid, benzoic acid and pyromellitic acid.
Examples of suitable amines are methylamine, dimethylamine, trimethylamine, ethylamine, diethylamine, triethylamine, aniline, N-methylaniline,
diphenylamine, triphenylamine, toluidine, ethylenediamine, diethylenetriamine.
Preferred hydrolysable silanes have the general formula RxSiY4-x (I)
in which x has the value of 1 , 2 or 3, and the R radicals are the same or different and are nonhydrolysable groups, the Y radicals are the same or different and are hydrolysable groups or hydroxyl groups.
In the general formula (I), the hydrolysable Y groups which may be the same or different from one another are, for example,
- hydrogen,
- halogen, for example F, CI, Br or I,
- alkoxy, preferably Ci-C6-alkoxy, such as methoxy, ethoxy,
n-propoxy, i-propoxy and butoxy,
- aryloxy, preferably C6-Cio-aryloxy, such as phenoxy,
- acyloxy, preferably Ci-C6-acyloxy, such as acetoxy or propionyloxy,
- alkylcarbonyl, preferably C2-C7-alkylcarbonyl, such as acetyl.
Preferred hydrolysable radicals are halogen, alkoxy groups and acyloxy groups. Particularly preferred hydrolysable radicals are Ci-C4-alkoxy groups, especially methoxy and ethoxy. The nonhydrolysable R radicals, which may be the same or different, are R radicals with or without a functional group.
The nonhydrolysable R radical without a functional group is, for example,
- alkyl, preferably Ci-Cs-alkyl, such as methyl, ethyl,
n-propyl, isopropyl, n-butyl, sec-butyl and tert-butyl, pentyl, hexyl, octyl or cyclohexyl;
substituted alkyl,
- alkenyl, preferably C2-C6-alkenyl, such as vinyl, 1 -propenyl,
2-propenyl and butenyl,
- alkynyl, preferably C2-C6-alkynyl, such as propargyl,
- aryl, preferably C-6-Cio-aryl, such as phenyl and naphthyl, and
corresponding alkaryls such as tolyl, benzyl and phenethyl.
Preferred surface modifiers may especially be CH3SiCl3, CH3Si(OC2H5)3, CH3Si(OCH3)3, C2H5SiCI3, C2H5Si(OC2H5)3, C2H5Si(OCH3)3, C3H7Si(OC2H5)3, (C2H5O)3SiC3H6CI, (CH3)2SiCI2, (CH3)2Si(OC2H5)2, (CH3)2Si(OH)2,
C6H5Si(OCH3)3, C6H5Si(OC2H5)3, C6H5CH2CH2Si(OCH3)3, (C6H5)2SiCI2, (C6H5)2Si(OC2H5)2, (i-C3H7)3SiOH, CH2=CHSi(OOCCH3)3, CH2=CHSiCI3, CH2=CH-Si(OC2H5)3, CH2=CHSi(OC2H5)3, CH2=CH-Si(OC2H4OCH3)3,
CH2=CH-CH2-Si(OC2H5)3, CH2=CH-CH2-Si(OC2H5)3, CH2=CH-CH2- Si(OOCCH3)3, n-C6Hi3-CH2-CH2-Si(OC2H5)3 and
n-C8Hi7-CH2-CH2-Si(OC2H5)3.
A nonhydrolysable R radical with a functional group may comprise, for example, as a functional group, an epoxy (such as glycidyl or glycidyloxy), hydroxyl, ether, amino, monoalkylamino, dialkylamino, optionally substituted anilino, amide, carboxyl, acryloyi, acryloyloxy, methacryloyl, methacryloyloxy, mercapto, cyano, alkoxy, isocyanato, aldehyde, alkylcarbonyl, acid anhydride and phosphoric acid group.
Preferred examples of nonhydrolysable R radicals with functional groups are a
- glycidyl- or glycidyloxy-(Ci-C2o)-alkylene radical, such as beta- glycidyloxyethyl, gamma-glycidyloxypropyl, delta-glycidyloxybutyl, epsilon- glycidyloxypentyl, omega-glycidyloxyhexyl and
2-(3,4-epoxycyclohexyl)ethyl,
- (meth)acryloyloxy-(Ci-C6)-alkylene radical, such as
(meth)acryloyloxymethyl, (meth)acryloyloxyethyl, (meth)acryloyloxypropyl or (meth)acryloyloxybutyl, and
- 3-isocyanatopropyl radical.
Specific surface modifiers which may be used include
gamma-glycidyloxypropyltrimethoxysilane, glycidyloxypropyltriethoxysilane, 3-isocyanatopropyltriethoxysilane, 3-isocyanatopropyldimethylchlorosilane,
aminopropyltriethoxysilane, aminopropyltrimethoxysilane, aminomethyltriethoxysilane, aminomethyltrinnethoxysilane,
aminopropyltnchlorosilane, (N-cyclohexylanninonnethyl)triethoxysilane, 2-anninoethyl-3-anninopropyltrinnethoxysilane,
N-(n-butyl)-3-aminopropyltrinnethoxysilane,
2- aminoethyl-3-aminopropylmethyldimethoxysilane,
(3-aminopropyl)diethoxynnethylsilane, (3-aminopropyl)ethyldiethoxysilane, (3-methylaminopropyl)trimethoxysilane,
(aminoethylaminomethyl)phenethyltrimethoxysilane,
(N,N-diethyl-3-aminopropyl)thnnethoxysilane,
(N,N-dimethylannino)dinnethylchlorosilane,
(N,N-dimethylanninopropyl)thnnethoxysilane,
(N-acetylglycyl)-3-aminopropylthnnethoxysilane,
(N-cyclohexylaminomethyl)methyldiethoxysilane,
(N-cyclohexylanninonnethyl)triethoxysilane,
(N-phenylaminomethyl)methyldimethoxysilane,
(N-phenylanninonnethyl)trinnethoxysilane, 1 1 -aminoundecyltriethoxysilane, 3- (1 ,3-dinnethylbutylidene)anninopropyltriethoxysilane,
3- (1 -aminopropoxy)-3,3-dimethyl-1 -propenyltrimethoxysilane,
3-(2,4-dinitrophenylamino)propyltriethoxysilane,
3-(2-aminoethylamino)propylmethyldimethoxysilane,
3-(2-aminoethylamino)propyltrimethoxysilane,
3-(cyclohexylamino)propyltrimethoxysilane,
3-(aminophenoxy)propyltrimethoxysilane,
3-(N-allylamino)propyltrimethoxysilane,
3-(N-styrylmethyl-2-aminoethylamino)propyltrimethoxysilane,
3-(phenylamino)propyltrimethoxysilane, 3- aminopropyldiisopropylethoxysilane,
3-aminopropyldimethylethoxysilane,
3-aminopropylmethylbis(trimethylsiloxy)silane,
3-aminopropylmethyldiethoxysilane,
3-aminopropyltris(methoxyethoxyethoxy)silane,
3-aminopropyltris(trimethylsiloxy)silane, 4-aminobutyltriethoxysilane, aminophenyltrimethoxysilane, bis(2-hydroxyethyl)-3- aminopropyltriethoxysilane, diethylaminomethyltnethoxysilane, N,N- dimethylanninonnethylethoxysilane,
N-(2-aminoethyl)-3-aminoisobutyldimethylmethoxysilane,
N-(2-aminoethyl)-3-aminopropylmethyldimethoxysilane,
N-(2-aminoethyl)-3-aminopropyltriethoxysilane,
N-(2-aminoethyl)-3-aminopropyltrimethoxysilane,
N-(2-aminonnethyl)-1 1 -aminoundecyltrimethoxysilane,
N-(3-acryloyloxy-2-hydroxypropyl)-3-anninopropyltriethoxysilane,
N-(3-methacryloyloxy-2-hydroxypropyl)-3-anninopropyltriethoxysilane,
N-(6-aminohexyl)aminopropyltrimethoxysilane,
N-(hydroxyethyl)-N-methylaminopropyltrimethoxysilane,
N-3-[amino(polypropylenoxy)]aminopropyltrimethoxysilane,
n-butylaminopropyltrimethoxysilane, N- cyclohexylaminopropyltrinnethoxysilane,
N-ethylaminoisobutylmethyldiethoxysilane,
N-ethylaminoisobutyltrimethoxysilane,
N-methylaminopropylmethyldimethoxysilane,
N-methylaminopropyltrinnethoxysilane,
N-phenylaminomethyltriethoxysilane, phenylbis(dimethylannino)chlorosilane, tert-butylaminopropyltrimethoxysilane, aminopropylsilanetriol,
N-(2-aminoethyl)-3-aminopropylsilanetriol,
N-cyclohexylaminonnethyltnethoxysilane,
N-cyclohexylaminomethylmethyldiethoxysilane,
N-phenylaminomethyltrinnethoxysilane, 3- (nneth)acryloyloxypropyltriethoxysilane and 3- (meth)acryloyloxypropyltrinnethoxysilane.
In addition, it is also possible to use silylamines. Silylamines are understood to mean compounds which have at least one Si-N bond and can react with the Si-OH groups present on the surface of the silicon dioxide particles. Examples thereof are vinyldimethylsilylamine, octyldimethylsilylamine,
phenyldimethylsilylamine, bis(dimethylanninodinnethylsilyl)ethane,
hexamethyldisilazane, (N,N-dimethylamino)trimethylsilane and
bis(thfluoropropyl)tetrannethyldisilazane. In addition, it is possible to use cyclic silazanes. Suitable surface modifiers also include the cyclic polysiloxanes D3, D4, D5 and the homologues thereof, where D3, D4 and D5 are understood to mean cyclic polysiloxanes having 3, 4 or 5 units of the -O-Si(CH3)2 type, for example octamethylcyclotetrasiloxane = D4.
Also polysiloxanes or silicon oils of the
Y-O-[(RR'SiO)m-(R"R"'SiO)n]u-Y type, where
m = 0,1 ,2,3,...∞, preferably 0,1 ,2,3,... 100 000,
n = 0,1 ,2,3,...∞, preferably 0,1 ,2,3,... 100 000,
u = 0,1 ,2,3,.. . .oo, preferably 0,1 ,2,3,... 100 000,
Y = CH3, H, CnH2n+i , n=2-20; Si(CH3)3, Si(CH3)2H, Si(CH3)2OH,
Si(CH3)2(OCH3), Si(CH3)2(CnH2n+i ), n=2-20
R, R', R", R'" are each independently alkyl such as CnH2n+i , n = 1 - 20; aryl such as phenyl radicals and substituted phenyl radicals, (CH2)n-NH2, H.
Polysiloxanes or silicone oils are usually thermally activated for surface modification. Particular preference may be given to using citric acid, lauric acid, stearic acid and pyromellitic acid.
The process according to the invention allows an inexpensive production for surface modification of metal oxide particles. For instance, the apparatus expenditure is low, the reaction time is short and the conversion is high. It is particularly advantageous to link the production of the metal oxide particles by a pyrogenic process to immediately subsequent surface modification. This can be done, for example, by utilizing the heat which arises in the process of preparation of the metal oxide particles, and apparatus as would be required in any case in the production of the metal oxide particles, for example a filter apparatus, for surface modification.
The reason why the reaction times are only very short in the process according to the invention even though the reaction takes place in the immobile filtercake, compared to known surface modification processes, is not known to date.
Examples Example 1
160 kg/h of TiCI4 are evaporated in an evaporator at 140°C. The vapours are transferred into a mixing chamber by means of 15 m3 (STP)/h of nitrogen as a carrier gas with a carrier gas moisture content of 15 g/m3 of carrier gas.
Separately therefrom, 52 m3 (STP)/h of hydrogen and 525 m3 (STP)/h of primary air are introduced into the mixing chamber. In a central tube, the reaction mixture is fed to a burner and ignited. The flame burns into a water- cooled flame tube. In addition, 200 m3 (STP)/h of secondary air are introduced into the reaction chamber. The titanium dioxide particles which form are aftertreated with steam at temperatures of 500 to 600°C, and the process gas stream is cooled to 160°C. Subsequently, at this temperature, 2 kg/h of vaporous octyltrimethoxysilane are metered into the process gas stream.
Subsequently, the solid particles are removed at a filter, the temperature at the filter being 170°C.
The minimum residence time of the particles from the time of addition of the surface modifier up to the filter is 1 .2 s. In addition, the minimum residence time of the particles on the filter until the filter is cleaned is 8 min.
Surface-modified titanium dioxide particles with a carbon content of 1 .7% by weight are obtained.
Example 2
95 kg/h of silicon tetrachloride and 5 kg/h of trichlorosilane (TCS) are
evaporated and transferred by means of nitrogen into the mixing chamber of a burner. At the same time, 34 m3 (STP)/h (1 .5 kmol/h) of hydrogen and 70 m3 (STP)/h (3.1 kmol/h) of primary air are introduced into the mixing chamber. The mixture has a temperature of 90°C. It is ignited and combusted in a flame into a reaction chamber. In addition, 24 m3 (STP)/h (1 .1 kmol/h) of secondary air which surrounds the flame is introduced into the reaction chamber. The ratio of
secondary air to primary air is 0.34.
The silicon dioxide particles which form are aftertreated with steam at temperatures of 500 to 600°C, and the process gas stream is cooled to 160°C. Subsequently, at this temperature, 2 kg/h of vaporous octyltrimethoxysilane are metered into the process gas stream. Subsequently, the solid particles are removed at a filter, the temperature at the filter being 170°C.
The minimum residence time of the particles from the time of addition of the surface modifier up to the filter is 1 .8 s. In addition, the minimum residence time of the particles on the filter until the filter is cleaned is 15 min.
Surface-modified silicon dioxide particles with a carbon content of 2.6% by weight are obtained.
Example 3
1200 g/h of a solution of cerium(lll) 2-ethylhexanoate (49% by weight) in 2- ethylhexanoic acid (51 % by weight) are atomized into a reaction chamber by means of air (5 m3 (STP)/h) via a nozzle with a diameter of 0.8 mm. A hydrogen/oxygen gas flame composed of hydrogen (10 m3 (STP)/h) and primary air (10 m3 (STP)/h) burns here, in which the aerosol is reacted. In addition, 20 m3/h of secondary air are introduced into the reaction chamber. The process gas stream is cooled to 185°C with quench air.
Subsequently, at this temperature, 200 g/h of an alcoholic lauric acid solution (10% by weight in ethanol) are metered into the process gas stream.
Subsequently, the solid particles are removed at a filter, the temperature at the filter being 165°C.
The minimum residence time of the particles from the time of addition of the surface modifier up to the filter is 1 .2 s. In addition, the minimum residence time of the particles on the filter until the filter is cleaned is 9 min.
Surface-modified cerium oxide particles with a carbon content of 7.8% by weight are obtained.
Example 4
900 g/h of a solution consisting of 76.20% by weight of dibutyltin diacetate,
2.77% by weight of antimony(lll) acetate, 16.03% by weight of acetic anhydride
and 5.00% by weight of acetic acid are atomized with 4.0 m3 (STP)/h of atomizer air by means of a two-substance nozzle. The resulting droplets have a droplet size spectrum d3o from 5 to 15 μιτι. The droplets are combusted into a reaction chamber in a flame formed from hydrogen (2.5 m3 (STP)/h) and air (24.0 m3 (STP)/h), corresponding to a lambda of 4.1 .
The antimony-tin mixed oxide particles which form are aftertreated with steam at temperatures of 500 to 600°C, and the process gas stream is cooled to 190°C. Subsequently, at this temperature, 200 g/h of an alcoholic lauric acid solution (10% by weight in ethanol) are metered into the process gas stream. Subsequently, the solid particles are removed at a filter, the temperature at the filter being 200°C.
The minimum residence time of the particles from the time of addition of the surface modifier up to the filter is 1 .5 s. In addition, the minimum residence time of the particles on the filter until the filter is cleaned is 8 min.
Surface-modified antimony-tin mixed oxide particles with a carbon content of 5.6% by weight are obtained.
Example 5
3.86 kg/h of TiCI4 and 0.332 kg/h of SiCI4 are evaporated at approx. 200°C. The vapours are mixed by means of nitrogen together with 1 .45 m3 (STP)/h of hydrogen and 7.8 m3 (STP)/h of dried air in the mixing chamber of a burner of known design, and supplied via a central tube, at the end of which the reaction mixture is ignited, to a water-cooled flame tube and combusted there. In addition, an outer tube concentrically surrounding the central tube is used to supply 0.9 m3 (STP)/h of hydrogen and 25 m3 (STP)/h of air to the flame tube. The silicon-titanium mixed oxide particles which form are aftertreated with steam at temperatures of 500 to 600°C, and the process gas stream is cooled to 200°C. Subsequently, at this temperature, 200 g/h of alcoholic pyromellitic acid (10% by weight in ethanol) are metered into the process gas stream.
Subsequently, the solid particles are removed at a filter, the temperature at the filter being 200°C.
The minimum residence time of the particles from the time of addition of the surface modifier up to the filter is 10.3 s. In addition, the minimum residence
time of the particles on the filter until the filter is cleaned is 17 min.
Surface-modified silicon titanium mixed oxide particles with a carbon content of 0.5% by weight are obtained.
Example 6
9 kg/h of zinc is evaporated at approx. 800°C. The vapour is introduced into a reactor via a central tube by means of 3.5 m3 (STP)/h of nitrogen at 600°C, and oxidized with 15 m3 (STP)/h of air. The addition of 40 m3 (STP)/h of quench air cools the process gas stream to 210°C.
Subsequently, at this temperature, 1000 g/h of alcoholic pyromellitic acid (10% by weight in ethanol) are metered into the process gas stream. Subsequently, the solid particles are removed at a filter, the temperature at the filter being 200°C.
The minimum residence time of the particles from the time of addition of the surface modifier up to the filter is 1 .1 s. In addition, the minimum residence time of the particles on the filter until the filter is cleaned is 5 min.
Surface-modified silicon-titanium mixed oxide particles with a carbon content of 0.3% by weight are obtained.
Claims
Process for producing surface-modified metal oxide particles,
characterized in that
a) in a first reaction step, a surface modifier is introduced into a gas stream comprising metal oxide particles, and the resulting reaction mixture is exposed to a temperature of 130 to 250°C for a minimum residence time in the range from 1 to 60 s, and
b) in an immediately subsequent, second reaction step, the solid
reaction products are removed from the flowing reaction mixture by means of a filter apparatus and the reaction mixture present at the filter is treated at a temperature of 1 10 to 230°C for a minimum residence time in the range from 1 min to 1 hour.
Process for producing surface-modified metal oxide particles,
characterized in that
the metal oxide particles are selected from the group consisting of aluminium oxide, antimony oxide, cerium oxide, iron oxide, indium oxide, silicon dioxide, titanium dioxide, vanadium oxide, tungsten oxide, yttrium oxide, zinc oxide, tin oxide and zirconium dioxide.
Process for producing surface-modified metal oxide particles,
characterized in that
in a reactor which comprises, in each case successively, a mixing zone, a combustion zone, a cooling zone, a surface modification zone and a removal zone,
a) in the mixing zone, a stream comprising one or more hydrolysable and/or oxidizable metal compounds in the form of vapour or of an aerosol,
one or more hydrogen-containing combustion gases and an oxygen-containing gas is obtained,
b) this gas is transferred into the combustion zone, ignited there and reacted at a mean residence time of 10 ms to 10 s,
c) optionally, steam is introduced to remove halide-containing impurities,
d) then the stream of the reaction mixture is cooled in the cooling zone to temperatures of 400 to 150°C,
e) in the surface modification zone, a surface modifier is introduced into the stream of the reaction mixture, and the resulting reaction mixture is exposed to a temperature of 130 to 250°C for a minimum residence time in the range from 1 to 60 s, and f) in an immediately downstream, second reaction step, the solid reaction products are removed from the flowing reaction mixture by means of a filter apparatus, and the reaction mixture present at the filter is treated at a temperature of 1 10 to 230°C for a minimum residence time in the range from 1 min to 1 hour.
Process according to Claims 1 to 3,
characterized in that
the metal component of the metal compound is selected from the group consisting of aluminium, cerium, iron, indium, silicon, titanium,
vanadium, tungsten, yttrium, zinc, tin and zirconium.
Process according to Claims 1 to 4,
characterized in that
two or more filter apparatuses are used.
Process according to Claims 1 to 5,
characterized in that
the surface modifier/metal oxide particle ratio is selected such that the carbon content of the surface-modified metal oxide particles is 0.1 to 10% by weight.
Process according to Claims 1 to 6,
characterized in that
the surface modifier is selected from the group consisting of saturated or unsaturated alkyl- and arylmonocarboxylic acids having 1 to 20 carbon
atoms, i.e. those having one CO2H group, or polycarboxylic acids, i.e. those having more than one CO2H group, and the corresponding esters and acid halides of the aforementioned carboxylic acids; amines of the general formula R3-XNHX, where x = 0, 1 or 2 and R = alkyl or aryl;
hydrolysable organosilanes; disilazanes; and cyclic polysiloxanes and silicone oils.
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| GB201207997D0 (en) * | 2012-05-04 | 2012-06-20 | Imp Innovations Ltd | Process |
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| JP7284474B1 (en) * | 2022-09-16 | 2023-05-31 | 国立大学法人東北大学 | Method for producing organically modified oxide fine particles and organically modified oxide fine particles |
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| US5176938A (en) * | 1988-11-23 | 1993-01-05 | Plasmacarb Inc. | Process for surface treatment of pulverulent material |
| US20020155059A1 (en) * | 2001-04-24 | 2002-10-24 | Tekna Plasma Systems Inc. | Plasma synthesis of titanium dioxide nanopowder and powder doping and surface modification process |
| US8117867B2 (en) * | 2005-08-17 | 2012-02-21 | Nitto Boseki Co., Ltd. | Process for producing spherical inorganic particle |
-
2009
- 2009-09-21 DE DE102009029640A patent/DE102009029640A1/en not_active Withdrawn
-
2010
- 2010-08-26 WO PCT/EP2010/062440 patent/WO2011032814A1/en not_active Ceased
- 2010-08-26 EP EP10745643A patent/EP2480500A1/en not_active Withdrawn
Non-Patent Citations (1)
| Title |
|---|
| See references of WO2011032814A1 * |
Also Published As
| Publication number | Publication date |
|---|---|
| WO2011032814A1 (en) | 2011-03-24 |
| DE102009029640A1 (en) | 2011-04-07 |
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