EP2220263A4 - Thin film coating system and method - Google Patents

Thin film coating system and method

Info

Publication number
EP2220263A4
EP2220263A4 EP08841116.0A EP08841116A EP2220263A4 EP 2220263 A4 EP2220263 A4 EP 2220263A4 EP 08841116 A EP08841116 A EP 08841116A EP 2220263 A4 EP2220263 A4 EP 2220263A4
Authority
EP
European Patent Office
Prior art keywords
thin film
film coating
coating system
thin
film
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
EP08841116.0A
Other languages
German (de)
French (fr)
Other versions
EP2220263A1 (en
Inventor
Norman L Boling
Miles Rains
Howard R Gray
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Deposition Sciences Inc
Original Assignee
Deposition Sciences Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Deposition Sciences Inc filed Critical Deposition Sciences Inc
Publication of EP2220263A1 publication Critical patent/EP2220263A1/en
Publication of EP2220263A4 publication Critical patent/EP2220263A4/en
Withdrawn legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/50—Substrate holders
    • C23C14/505—Substrate holders for rotation of the substrates
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C23C14/3492—Variation of parameters during sputtering
EP08841116.0A 2007-10-26 2008-10-27 Thin film coating system and method Withdrawn EP2220263A4 (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US99606307P 2007-10-26 2007-10-26
PCT/US2008/012170 WO2009055065A1 (en) 2007-10-26 2008-10-27 Thin film coating system and method

Publications (2)

Publication Number Publication Date
EP2220263A1 EP2220263A1 (en) 2010-08-25
EP2220263A4 true EP2220263A4 (en) 2014-06-04

Family

ID=40579882

Family Applications (1)

Application Number Title Priority Date Filing Date
EP08841116.0A Withdrawn EP2220263A4 (en) 2007-10-26 2008-10-27 Thin film coating system and method

Country Status (4)

Country Link
EP (1) EP2220263A4 (en)
JP (1) JP2011500971A (en)
CN (1) CN101809185B (en)
WO (1) WO2009055065A1 (en)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN103299392A (en) * 2010-07-20 2013-09-11 沉积科学公司 Improved IR coatings and methods
US9512519B2 (en) * 2012-12-03 2016-12-06 Taiwan Semiconductor Manufacturing Company, Ltd. Atomic layer deposition apparatus and method
JP6566750B2 (en) * 2015-07-02 2019-08-28 Cbc株式会社 Method for forming discontinuous metal film

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0428358A2 (en) * 1989-11-13 1991-05-22 Optical Coating Laboratory, Inc. Geometries and configurations for magnetron sputtering apparatus
WO2008153915A1 (en) * 2007-06-05 2008-12-18 Deposition Sciences, Inc. Method and apparatus for low cost high rate deposition tooling

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0741940A (en) * 1993-07-27 1995-02-10 Iwasaki Electric Co Ltd Sputtering device
US5849162A (en) * 1995-04-25 1998-12-15 Deposition Sciences, Inc. Sputtering device and method for reactive for reactive sputtering
US6485616B1 (en) * 1999-12-29 2002-11-26 Deposition Sciences, Inc. System and method for coating substrates with improved capacity and uniformity
US6440280B1 (en) * 2000-06-28 2002-08-27 Sola International, Inc. Multi-anode device and methods for sputter deposition
CN100540723C (en) * 2003-04-25 2009-09-16 旭硝子株式会社 Make the method for silicon oxide film and optical multilayer
WO2005035822A1 (en) * 2003-10-07 2005-04-21 Deposition Sciences, Inc. Apparatus and process for high rate deposition of rutile titanium dioxide
CN1789482A (en) * 2004-12-17 2006-06-21 上海广电电子股份有限公司 Evaporation apparatus and method for content gradually variational film

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0428358A2 (en) * 1989-11-13 1991-05-22 Optical Coating Laboratory, Inc. Geometries and configurations for magnetron sputtering apparatus
WO2008153915A1 (en) * 2007-06-05 2008-12-18 Deposition Sciences, Inc. Method and apparatus for low cost high rate deposition tooling

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
See also references of WO2009055065A1 *

Also Published As

Publication number Publication date
CN101809185B (en) 2013-05-08
JP2011500971A (en) 2011-01-06
CN101809185A (en) 2010-08-18
EP2220263A1 (en) 2010-08-25
WO2009055065A1 (en) 2009-04-30

Similar Documents

Publication Publication Date Title
TWI367130B (en) Film coating apparatus and film coating method
EP2337688B8 (en) Coating device and associated coating method
EP2127617A4 (en) Coating method and coating device
EP2067602A4 (en) Intermittent film forming system and intermittent film forming method
EP2147070A4 (en) Surface coating system and method
EP2155494A4 (en) Method and apparatus for controlling film deposition
EP2219700A4 (en) Automated coating apparatus and method
TWI349168B (en) Coating method and coating apparatus
IL215159A0 (en) Thin film coating and method of making the same
EP2060327A4 (en) Coating method and coating apparatus
EP2099062A4 (en) Film deposition apparatus and film deposition method
EP2351067A4 (en) Systems and methods for the crystallization of thin films
GB201107297D0 (en) Coating composition and method for forming coating film
ZA200905790B (en) System and method for glass sheet semiconductor coating
EP2243859A4 (en) Thin film forming method and thin film stack
HK1144447A1 (en) Film forming apparatus and film forming method
EP2101345A4 (en) Film deposition apparatus and film deposition method
EP2255891A4 (en) Coat film forming method and coat film forming apparatus
EP2298842A4 (en) Coating composition and coating film formation method using same
GB0614545D0 (en) Coating Film
GB2450052C (en) Coating system and coating method
ZA200807801B (en) Coatings and films
HK1144590A1 (en) Sputtering apparatus and film forming method
EP2220263A4 (en) Thin film coating system and method
EP2211544A4 (en) Film mode determination apparatus and determination method

Legal Events

Date Code Title Description
PUAI Public reference made under article 153(3) epc to a published international application that has entered the european phase

Free format text: ORIGINAL CODE: 0009012

17P Request for examination filed

Effective date: 20100520

AK Designated contracting states

Kind code of ref document: A1

Designated state(s): AT BE BG CH CY CZ DE DK EE ES FI FR GB GR HR HU IE IS IT LI LT LU LV MC MT NL NO PL PT RO SE SI SK TR

AX Request for extension of the european patent

Extension state: AL BA MK RS

DAX Request for extension of the european patent (deleted)
A4 Supplementary search report drawn up and despatched

Effective date: 20140502

RIC1 Information provided on ipc code assigned before grant

Ipc: C23C 14/34 20060101ALI20140425BHEP

Ipc: C23C 14/50 20060101AFI20140425BHEP

17Q First examination report despatched

Effective date: 20180424

STAA Information on the status of an ep patent application or granted ep patent

Free format text: STATUS: THE APPLICATION IS DEEMED TO BE WITHDRAWN

18D Application deemed to be withdrawn

Effective date: 20181106