EP2134665A4 - Mechanisches verfahren zur bildung von teilchen in einem fluid - Google Patents
Mechanisches verfahren zur bildung von teilchen in einem fluidInfo
- Publication number
- EP2134665A4 EP2134665A4 EP08727029A EP08727029A EP2134665A4 EP 2134665 A4 EP2134665 A4 EP 2134665A4 EP 08727029 A EP08727029 A EP 08727029A EP 08727029 A EP08727029 A EP 08727029A EP 2134665 A4 EP2134665 A4 EP 2134665A4
- Authority
- EP
- European Patent Office
- Prior art keywords
- particles
- template
- microscopic
- discrete surface
- fluid
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Withdrawn
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/0005—Separation of the coating from the substrate
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J13/00—Colloid chemistry, e.g. the production of colloidal materials or their solutions, not otherwise provided for; Making microcapsules or microballoons
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/04—Coating on selected surface areas, e.g. using masks
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/01—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes on temporary substrates, e.g. substrates subsequently removed by etching
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/04—Coating on selected surface areas, e.g. using masks
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D1/00—Electroforming
- C25D1/003—3D structures, e.g. superposed patterned layers
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D1/00—Electroforming
- C25D1/006—Nanostructures, e.g. using aluminium anodic oxidation templates [AAO]
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D1/00—Electroforming
- C25D1/20—Separation of the formed objects from the electrodes with no destruction of said electrodes
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01F—MAGNETS; INDUCTANCES; TRANSFORMERS; SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES
- H01F1/00—Magnets or magnetic bodies characterised by the magnetic materials therefor; Selection of materials for their magnetic properties
- H01F1/0036—Magnets or magnetic bodies characterised by the magnetic materials therefor; Selection of materials for their magnetic properties showing low dimensional magnetism, i.e. spin rearrangements due to a restriction of dimensions, e.g. showing giant magnetoresistivity
- H01F1/0045—Zero dimensional, e.g. nanoparticles, soft nanoparticles for medical/biological use
- H01F1/0054—Coated nanoparticles, e.g. nanoparticles coated with organic surfactant
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Organic Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Metallurgy (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Nanotechnology (AREA)
- Electrochemistry (AREA)
- Crystallography & Structural Chemistry (AREA)
- General Chemical & Material Sciences (AREA)
- Power Engineering (AREA)
- Molecular Biology (AREA)
- General Health & Medical Sciences (AREA)
- Biomedical Technology (AREA)
- Life Sciences & Earth Sciences (AREA)
- Health & Medical Sciences (AREA)
- Dispersion Chemistry (AREA)
- Inorganic Chemistry (AREA)
- Physical Or Chemical Processes And Apparatus (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US91889607P | 2007-03-20 | 2007-03-20 | |
PCT/US2008/003679 WO2008115550A1 (en) | 2007-03-20 | 2008-03-20 | Mechanical process for creating particles in a fluid |
Publications (2)
Publication Number | Publication Date |
---|---|
EP2134665A1 EP2134665A1 (de) | 2009-12-23 |
EP2134665A4 true EP2134665A4 (de) | 2011-09-14 |
Family
ID=39766278
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
EP08727029A Withdrawn EP2134665A4 (de) | 2007-03-20 | 2008-03-20 | Mechanisches verfahren zur bildung von teilchen in einem fluid |
Country Status (3)
Country | Link |
---|---|
EP (1) | EP2134665A4 (de) |
CA (1) | CA2681374A1 (de) |
WO (1) | WO2008115550A1 (de) |
Families Citing this family (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP5375005B2 (ja) * | 2008-09-30 | 2013-12-25 | ソニー株式会社 | マイクロビーズ作製方法 |
KR20120070558A (ko) * | 2009-07-14 | 2012-06-29 | 엠에스엠 크리스탈 지비알 | 인덱스 가능한 인서트의 제조 방법 |
WO2011021007A1 (en) * | 2009-08-21 | 2011-02-24 | Qinetiq Limited | Production of flake particles |
US9211519B2 (en) * | 2009-10-08 | 2015-12-15 | University Of Pittsburgh-Of The Commonwealth System Of Higher Education | Methods to prepare patchy microparticles |
JP5824878B2 (ja) * | 2011-05-31 | 2015-12-02 | 大日本印刷株式会社 | 偽装防止用粒子の製造方法 |
CN106752302A (zh) * | 2016-12-01 | 2017-05-31 | 深圳市美信电子有限公司 | 一种硅烷改性石墨烯油墨及其制备方法 |
CN108328610B (zh) * | 2018-04-28 | 2021-10-08 | 丁道其 | 一种脂质体修饰改性纳米石墨烯的制备方法及其应用 |
Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO1999029498A1 (en) * | 1997-12-08 | 1999-06-17 | Washington University | Designer particles of micron and submicron dimension |
Family Cites Families (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6832735B2 (en) | 2002-01-03 | 2004-12-21 | Nanoproducts Corporation | Post-processed nanoscale powders and method for such post-processing |
WO2000007702A2 (de) * | 1998-08-03 | 2000-02-17 | Poly-An Gmbh | Templat-geprägte materialien, verfahren zu ihrer herstellung und ihre verwendung |
US20050260503A1 (en) * | 2004-05-20 | 2005-11-24 | Taiwan Semiconductor Manufacturing Co., Ltd. | Reticle film stabilizing method |
WO2005121019A1 (ja) * | 2004-06-08 | 2005-12-22 | Riken | ナノ構造体の製造方法およびナノ構造体 |
WO2006105102A2 (en) * | 2005-03-28 | 2006-10-05 | The Research Foundation Of State University Of New York | Synthesis of nanostructured materials using liquid crystalline templates |
WO2006121819A1 (en) | 2005-05-06 | 2006-11-16 | Board Of Regents, The University Of Texas System | Methods for fabricating nano and microparticles for drug delivery |
US20070048383A1 (en) * | 2005-08-25 | 2007-03-01 | Helmus Michael N | Self-assembled endovascular structures |
-
2008
- 2008-03-20 WO PCT/US2008/003679 patent/WO2008115550A1/en active Application Filing
- 2008-03-20 EP EP08727029A patent/EP2134665A4/de not_active Withdrawn
- 2008-03-20 CA CA002681374A patent/CA2681374A1/en not_active Abandoned
Patent Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO1999029498A1 (en) * | 1997-12-08 | 1999-06-17 | Washington University | Designer particles of micron and submicron dimension |
Non-Patent Citations (4)
Title |
---|
HERNANDEZ C J ET AL: "Colloidal alphabet soup: monodisperse dispersions of shape-designed lithoparticles", JOURNAL OF PHYSICAL CHEMISTRY C, vol. 111, no. 12, 13 February 2007 (2007-02-13), American Chemical Society (ACS) [US], pages 4477 - 4480, XP002654297, ISSN: 1932-7447, DOI: 10.1021/jp0672095 * |
MIKRAJUDDIN ET AL: "Single route for producing organized metallic domes, dots, and pores by colloidal templating and over-sputtering", ADVANCED MATERIALS, vol. 14, no. 12, 17 June 2002 (2002-06-17), WILEY-VCH VERLAG [DE], pages 930 - 933, XP001130546, DOI: 10.1002/1521-4095(20020618)14:12<930::AID-ADMA930>3.0.CO;2-L * |
See also references of WO2008115550A1 * |
XIA Y ET AL: "Soft Lithography", ANNUAL REVIEW OF MATERIALS SCIENCE, vol. 28, August 1998 (1998-08-01), Annual Reviews Inc., Palo Alto, CA [US], pages 153 - 184, XP009023786, ISSN: 0084-6600, DOI: 10.1146/ANNUREV.MATSCI.28.1.153 * |
Also Published As
Publication number | Publication date |
---|---|
EP2134665A1 (de) | 2009-12-23 |
CA2681374A1 (en) | 2008-09-25 |
WO2008115550A1 (en) | 2008-09-25 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
PUAI | Public reference made under article 153(3) epc to a published international application that has entered the european phase |
Free format text: ORIGINAL CODE: 0009012 |
|
17P | Request for examination filed |
Effective date: 20091020 |
|
AK | Designated contracting states |
Kind code of ref document: A1 Designated state(s): AT BE BG CH CY CZ DE DK EE ES FI FR GB GR HR HU IE IS IT LI LT LU LV MC MT NL NO PL PT RO SE SI SK TR |
|
DAX | Request for extension of the european patent (deleted) | ||
RIC1 | Information provided on ipc code assigned before grant |
Ipc: C04B 41/50 20060101AFI20110801BHEP Ipc: C07F 7/18 20060101ALI20110801BHEP |
|
A4 | Supplementary search report drawn up and despatched |
Effective date: 20110811 |
|
17Q | First examination report despatched |
Effective date: 20140331 |
|
STAA | Information on the status of an ep patent application or granted ep patent |
Free format text: STATUS: THE APPLICATION IS DEEMED TO BE WITHDRAWN |
|
18D | Application deemed to be withdrawn |
Effective date: 20140812 |