EP1987044A1 - Oligo- und polymere arylphosphonsäure-substituierte siloxane - Google Patents
Oligo- und polymere arylphosphonsäure-substituierte siloxaneInfo
- Publication number
- EP1987044A1 EP1987044A1 EP07704553A EP07704553A EP1987044A1 EP 1987044 A1 EP1987044 A1 EP 1987044A1 EP 07704553 A EP07704553 A EP 07704553A EP 07704553 A EP07704553 A EP 07704553A EP 1987044 A1 EP1987044 A1 EP 1987044A1
- Authority
- EP
- European Patent Office
- Prior art keywords
- phosphonic acid
- oligomeric
- polymeric
- siloxanes
- alkyl
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Withdrawn
Links
- -1 siloxanes Chemical group 0.000 title claims abstract description 288
- 239000002253 acid Substances 0.000 title claims abstract description 43
- 150000007513 acids Chemical class 0.000 title claims description 13
- ABLZXFCXXLZCGV-UHFFFAOYSA-N phosphonic acid group Chemical group P(O)(O)=O ABLZXFCXXLZCGV-UHFFFAOYSA-N 0.000 claims abstract description 143
- 229920000642 polymer Polymers 0.000 claims abstract description 82
- 239000000203 mixture Substances 0.000 claims abstract description 67
- KPUWHANPEXNPJT-UHFFFAOYSA-N disiloxane Chemical class [SiH3]O[SiH3] KPUWHANPEXNPJT-UHFFFAOYSA-N 0.000 claims abstract description 61
- 239000012528 membrane Substances 0.000 claims abstract description 54
- 125000000217 alkyl group Chemical group 0.000 claims abstract description 26
- 239000002131 composite material Substances 0.000 claims abstract description 20
- 239000010408 film Substances 0.000 claims abstract description 12
- 125000001181 organosilyl group Chemical group [SiH3]* 0.000 claims abstract 4
- 238000000034 method Methods 0.000 claims description 74
- 230000008569 process Effects 0.000 claims description 56
- 125000003118 aryl group Chemical group 0.000 claims description 50
- 125000005907 alkyl ester group Chemical group 0.000 claims description 37
- 239000002904 solvent Substances 0.000 claims description 36
- 239000003054 catalyst Substances 0.000 claims description 29
- PXHVJJICTQNCMI-UHFFFAOYSA-N nickel Substances [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 claims description 29
- 229910052751 metal Inorganic materials 0.000 claims description 28
- 239000002184 metal Substances 0.000 claims description 28
- 229910052794 bromium Inorganic materials 0.000 claims description 26
- 125000005842 heteroatom Chemical group 0.000 claims description 25
- 238000005954 phosphonylation reaction Methods 0.000 claims description 25
- KDLHZDBZIXYQEI-UHFFFAOYSA-N palladium Substances [Pd] KDLHZDBZIXYQEI-UHFFFAOYSA-N 0.000 claims description 23
- 238000002360 preparation method Methods 0.000 claims description 23
- 150000001875 compounds Chemical class 0.000 claims description 22
- 229910052727 yttrium Inorganic materials 0.000 claims description 20
- 125000001424 substituent group Chemical group 0.000 claims description 18
- 125000004429 atom Chemical group 0.000 claims description 17
- USIUVYZYUHIAEV-UHFFFAOYSA-N diphenyl ether Chemical compound C=1C=CC=CC=1OC1=CC=CC=C1 USIUVYZYUHIAEV-UHFFFAOYSA-N 0.000 claims description 15
- 239000000446 fuel Substances 0.000 claims description 15
- 229910052759 nickel Inorganic materials 0.000 claims description 14
- 229910052710 silicon Inorganic materials 0.000 claims description 14
- 238000007257 deesterification reaction Methods 0.000 claims description 13
- 239000000463 material Substances 0.000 claims description 13
- 229910052763 palladium Inorganic materials 0.000 claims description 13
- 125000001931 aliphatic group Chemical group 0.000 claims description 12
- 125000003342 alkenyl group Chemical group 0.000 claims description 12
- 229910052736 halogen Inorganic materials 0.000 claims description 12
- 150000002367 halogens Chemical class 0.000 claims description 12
- 125000003710 aryl alkyl group Chemical group 0.000 claims description 11
- KZTYYGOKRVBIMI-UHFFFAOYSA-N diphenyl sulfone Chemical compound C=1C=CC=CC=1S(=O)(=O)C1=CC=CC=C1 KZTYYGOKRVBIMI-UHFFFAOYSA-N 0.000 claims description 11
- 125000000753 cycloalkyl group Chemical group 0.000 claims description 10
- 238000006136 alcoholysis reaction Methods 0.000 claims description 9
- 229910021645 metal ion Inorganic materials 0.000 claims description 8
- 150000002739 metals Chemical class 0.000 claims description 8
- 238000000926 separation method Methods 0.000 claims description 8
- RWCCWEUUXYIKHB-UHFFFAOYSA-N benzophenone Chemical compound C=1C=CC=CC=1C(=O)C1=CC=CC=C1 RWCCWEUUXYIKHB-UHFFFAOYSA-N 0.000 claims description 7
- 239000012965 benzophenone Substances 0.000 claims description 7
- 230000006872 improvement Effects 0.000 claims description 6
- 125000004430 oxygen atom Chemical group O* 0.000 claims description 6
- 229920003023 plastic Polymers 0.000 claims description 6
- 239000004033 plastic Substances 0.000 claims description 6
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Substances [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 claims description 6
- 239000000126 substance Substances 0.000 claims description 6
- 230000008961 swelling Effects 0.000 claims description 6
- 230000009467 reduction Effects 0.000 claims description 5
- 150000003839 salts Chemical class 0.000 claims description 5
- 238000000576 coating method Methods 0.000 claims description 4
- 238000004132 cross linking Methods 0.000 claims description 4
- 125000000843 phenylene group Chemical group C1(=C(C=CC=C1)*)* 0.000 claims description 4
- 229910052697 platinum Inorganic materials 0.000 claims description 4
- 125000002924 primary amino group Chemical group [H]N([H])* 0.000 claims description 4
- 229910052703 rhodium Inorganic materials 0.000 claims description 4
- 239000010948 rhodium Substances 0.000 claims description 4
- 238000005260 corrosion Methods 0.000 claims description 3
- 230000007797 corrosion Effects 0.000 claims description 3
- 238000010952 in-situ formation Methods 0.000 claims description 3
- 230000002401 inhibitory effect Effects 0.000 claims description 3
- 238000006884 silylation reaction Methods 0.000 claims description 3
- ISIJQEHRDSCQIU-UHFFFAOYSA-N tert-butyl 2,7-diazaspiro[4.5]decane-7-carboxylate Chemical compound C1N(C(=O)OC(C)(C)C)CCCC11CNCC1 ISIJQEHRDSCQIU-UHFFFAOYSA-N 0.000 claims description 3
- 238000001149 thermolysis Methods 0.000 claims description 3
- FYYHWMGAXLPEAU-UHFFFAOYSA-N Magnesium Chemical compound [Mg] FYYHWMGAXLPEAU-UHFFFAOYSA-N 0.000 claims description 2
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 claims description 2
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 claims description 2
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 claims description 2
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 claims description 2
- QCWXUUIWCKQGHC-UHFFFAOYSA-N Zirconium Chemical compound [Zr] QCWXUUIWCKQGHC-UHFFFAOYSA-N 0.000 claims description 2
- 239000003377 acid catalyst Substances 0.000 claims description 2
- 229910052768 actinide Inorganic materials 0.000 claims description 2
- 150000001255 actinides Chemical class 0.000 claims description 2
- 229910052784 alkaline earth metal Inorganic materials 0.000 claims description 2
- 150000001342 alkaline earth metals Chemical class 0.000 claims description 2
- 229910052782 aluminium Inorganic materials 0.000 claims description 2
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 claims description 2
- 238000010467 ester pyrolysis Methods 0.000 claims description 2
- 229910052732 germanium Inorganic materials 0.000 claims description 2
- GNPVGFCGXDBREM-UHFFFAOYSA-N germanium atom Chemical compound [Ge] GNPVGFCGXDBREM-UHFFFAOYSA-N 0.000 claims description 2
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 claims description 2
- 229910052737 gold Inorganic materials 0.000 claims description 2
- 239000010931 gold Substances 0.000 claims description 2
- 229910052735 hafnium Inorganic materials 0.000 claims description 2
- VBJZVLUMGGDVMO-UHFFFAOYSA-N hafnium atom Chemical compound [Hf] VBJZVLUMGGDVMO-UHFFFAOYSA-N 0.000 claims description 2
- 229910052740 iodine Inorganic materials 0.000 claims description 2
- 229910052741 iridium Inorganic materials 0.000 claims description 2
- 229910052749 magnesium Inorganic materials 0.000 claims description 2
- 239000011777 magnesium Substances 0.000 claims description 2
- 229910052762 osmium Inorganic materials 0.000 claims description 2
- OJMIONKXNSYLSR-UHFFFAOYSA-N phosphorous acid Chemical class OP(O)O OJMIONKXNSYLSR-UHFFFAOYSA-N 0.000 claims description 2
- 229920000570 polyether Polymers 0.000 claims description 2
- MHOVAHRLVXNVSD-UHFFFAOYSA-N rhodium atom Chemical compound [Rh] MHOVAHRLVXNVSD-UHFFFAOYSA-N 0.000 claims description 2
- 229910052707 ruthenium Inorganic materials 0.000 claims description 2
- 229910052709 silver Inorganic materials 0.000 claims description 2
- 239000004332 silver Substances 0.000 claims description 2
- HXJUTPCZVOIRIF-UHFFFAOYSA-N sulfolane Chemical compound O=S1(=O)CCCC1 HXJUTPCZVOIRIF-UHFFFAOYSA-N 0.000 claims description 2
- 229910052718 tin Inorganic materials 0.000 claims description 2
- 239000011135 tin Substances 0.000 claims description 2
- 229910052719 titanium Inorganic materials 0.000 claims description 2
- 239000010936 titanium Substances 0.000 claims description 2
- 229910052725 zinc Inorganic materials 0.000 claims description 2
- 239000011701 zinc Substances 0.000 claims description 2
- 229910052726 zirconium Inorganic materials 0.000 claims description 2
- 125000001072 heteroaryl group Chemical group 0.000 claims 1
- 125000003107 substituted aryl group Chemical group 0.000 claims 1
- 125000003808 silyl group Chemical group [H][Si]([H])([H])[*] 0.000 abstract description 9
- 238000004519 manufacturing process Methods 0.000 abstract description 5
- IGYZIZQEEZDUQY-UHFFFAOYSA-N OP(=O)O[SiH3] Chemical compound OP(=O)O[SiH3] IGYZIZQEEZDUQY-UHFFFAOYSA-N 0.000 abstract description 2
- 125000005600 alkyl phosphonate group Chemical group 0.000 abstract 3
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 42
- 150000003254 radicals Chemical class 0.000 description 35
- 239000000243 solution Substances 0.000 description 35
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 30
- WKBOTKDWSSQWDR-UHFFFAOYSA-N Bromine atom Chemical compound [Br] WKBOTKDWSSQWDR-UHFFFAOYSA-N 0.000 description 24
- GDTBXPJZTBHREO-UHFFFAOYSA-N bromine Substances BrBr GDTBXPJZTBHREO-UHFFFAOYSA-N 0.000 description 23
- CPELXLSAUQHCOX-UHFFFAOYSA-N Hydrogen bromide Chemical compound Br CPELXLSAUQHCOX-UHFFFAOYSA-N 0.000 description 20
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 description 18
- 238000004448 titration Methods 0.000 description 18
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 16
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 16
- 238000006243 chemical reaction Methods 0.000 description 16
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 16
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 15
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 15
- SECXISVLQFMRJM-UHFFFAOYSA-N N-Methylpyrrolidone Chemical compound CN1CCCC1=O SECXISVLQFMRJM-UHFFFAOYSA-N 0.000 description 14
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 14
- 210000004027 cell Anatomy 0.000 description 13
- HEDRZPFGACZZDS-UHFFFAOYSA-N Chloroform Chemical compound ClC(Cl)Cl HEDRZPFGACZZDS-UHFFFAOYSA-N 0.000 description 12
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 description 12
- 229910052698 phosphorus Inorganic materials 0.000 description 12
- 239000011574 phosphorus Substances 0.000 description 12
- 230000002378 acidificating effect Effects 0.000 description 11
- 238000000746 purification Methods 0.000 description 11
- 230000031709 bromination Effects 0.000 description 10
- 238000005893 bromination reaction Methods 0.000 description 10
- GBNDTYKAOXLLID-UHFFFAOYSA-N zirconium(4+) ion Chemical compound [Zr+4] GBNDTYKAOXLLID-UHFFFAOYSA-N 0.000 description 10
- 125000004432 carbon atom Chemical group C* 0.000 description 9
- 230000029087 digestion Effects 0.000 description 9
- 229910052757 nitrogen Inorganic materials 0.000 description 9
- 230000001590 oxidative effect Effects 0.000 description 9
- 229920000867 polyelectrolyte Polymers 0.000 description 9
- 238000003756 stirring Methods 0.000 description 9
- QPFMBZIOSGYJDE-UHFFFAOYSA-N 1,1,2,2-tetrachloroethane Chemical compound ClC(Cl)C(Cl)Cl QPFMBZIOSGYJDE-UHFFFAOYSA-N 0.000 description 8
- NLHHRLWOUZZQLW-UHFFFAOYSA-N Acrylonitrile Chemical compound C=CC#N NLHHRLWOUZZQLW-UHFFFAOYSA-N 0.000 description 8
- 229920001577 copolymer Polymers 0.000 description 8
- 238000001035 drying Methods 0.000 description 8
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 8
- 229910000042 hydrogen bromide Inorganic materials 0.000 description 8
- 230000035484 reaction time Effects 0.000 description 8
- 101710134784 Agnoprotein Proteins 0.000 description 7
- 239000000654 additive Substances 0.000 description 7
- 238000001556 precipitation Methods 0.000 description 7
- 239000000047 product Substances 0.000 description 7
- 239000011541 reaction mixture Substances 0.000 description 7
- WEVYAHXRMPXWCK-UHFFFAOYSA-N Acetonitrile Chemical compound CC#N WEVYAHXRMPXWCK-UHFFFAOYSA-N 0.000 description 6
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 6
- IAZDPXIOMUYVGZ-UHFFFAOYSA-N Dimethylsulphoxide Chemical compound CS(C)=O IAZDPXIOMUYVGZ-UHFFFAOYSA-N 0.000 description 6
- 239000003795 chemical substances by application Substances 0.000 description 6
- 238000000921 elemental analysis Methods 0.000 description 6
- 230000026030 halogenation Effects 0.000 description 6
- 238000005658 halogenation reaction Methods 0.000 description 6
- ZUOUZKKEUPVFJK-UHFFFAOYSA-N phenylbenzene Natural products C1=CC=CC=C1C1=CC=CC=C1 ZUOUZKKEUPVFJK-UHFFFAOYSA-N 0.000 description 6
- 229920002480 polybenzimidazole Polymers 0.000 description 6
- 229920002530 polyetherether ketone Polymers 0.000 description 6
- 229920002959 polymer blend Polymers 0.000 description 6
- 239000000843 powder Substances 0.000 description 6
- 239000002244 precipitate Substances 0.000 description 6
- GFQYVLUOOAAOGM-UHFFFAOYSA-N zirconium(iv) silicate Chemical compound [Zr+4].[O-][Si]([O-])([O-])[O-] GFQYVLUOOAAOGM-UHFFFAOYSA-N 0.000 description 6
- FXHOOIRPVKKKFG-UHFFFAOYSA-N N,N-Dimethylacetamide Chemical compound CN(C)C(C)=O FXHOOIRPVKKKFG-UHFFFAOYSA-N 0.000 description 5
- 239000004696 Poly ether ether ketone Substances 0.000 description 5
- 238000013459 approach Methods 0.000 description 5
- RTZKZFJDLAIYFH-UHFFFAOYSA-N ether Substances CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 5
- 238000010438 heat treatment Methods 0.000 description 5
- 125000005647 linker group Chemical group 0.000 description 5
- 239000007788 liquid Substances 0.000 description 5
- 239000011159 matrix material Substances 0.000 description 5
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 5
- 230000026731 phosphorylation Effects 0.000 description 5
- 238000006366 phosphorylation reaction Methods 0.000 description 5
- 229920001643 poly(ether ketone) Polymers 0.000 description 5
- 229920001652 poly(etherketoneketone) Polymers 0.000 description 5
- 238000010992 reflux Methods 0.000 description 5
- 229920000930 2, 6-dimethyl-1, 4-phenylene oxide Polymers 0.000 description 4
- SNRUBQQJIBEYMU-UHFFFAOYSA-N Dodecane Natural products CCCCCCCCCCCC SNRUBQQJIBEYMU-UHFFFAOYSA-N 0.000 description 4
- 125000003545 alkoxy group Chemical group 0.000 description 4
- 239000008346 aqueous phase Substances 0.000 description 4
- 239000004305 biphenyl Substances 0.000 description 4
- 235000010290 biphenyl Nutrition 0.000 description 4
- 238000009835 boiling Methods 0.000 description 4
- 125000000484 butyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 4
- 239000007795 chemical reaction product Substances 0.000 description 4
- 125000002704 decyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 4
- 125000003438 dodecyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 4
- 150000002148 esters Chemical class 0.000 description 4
- 230000002140 halogenating effect Effects 0.000 description 4
- 229910052500 inorganic mineral Inorganic materials 0.000 description 4
- 125000001449 isopropyl group Chemical group [H]C([H])([H])C([H])(*)C([H])([H])[H] 0.000 description 4
- 238000001840 matrix-assisted laser desorption--ionisation time-of-flight mass spectrometry Methods 0.000 description 4
- 239000011707 mineral Substances 0.000 description 4
- QMMRZOWCJAIUJA-UHFFFAOYSA-L nickel dichloride Chemical compound Cl[Ni]Cl QMMRZOWCJAIUJA-UHFFFAOYSA-L 0.000 description 4
- 239000003921 oil Substances 0.000 description 4
- 235000012736 patent blue V Nutrition 0.000 description 4
- 229920002492 poly(sulfone) Polymers 0.000 description 4
- 238000000425 proton nuclear magnetic resonance spectrum Methods 0.000 description 4
- 239000012266 salt solution Substances 0.000 description 4
- 125000000542 sulfonic acid group Chemical group 0.000 description 4
- VMZOBROUFBEGAR-UHFFFAOYSA-N tris(trimethylsilyl) phosphite Chemical compound C[Si](C)(C)OP(O[Si](C)(C)C)O[Si](C)(C)C VMZOBROUFBEGAR-UHFFFAOYSA-N 0.000 description 4
- BQCIDUSAKPWEOX-UHFFFAOYSA-N 1,1-Difluoroethene Chemical compound FC(F)=C BQCIDUSAKPWEOX-UHFFFAOYSA-N 0.000 description 3
- LSNNMFCWUKXFEE-UHFFFAOYSA-M Bisulfite Chemical compound OS([O-])=O LSNNMFCWUKXFEE-UHFFFAOYSA-M 0.000 description 3
- XDTMQSROBMDMFD-UHFFFAOYSA-N Cyclohexane Chemical compound C1CCCCC1 XDTMQSROBMDMFD-UHFFFAOYSA-N 0.000 description 3
- YMWUJEATGCHHMB-UHFFFAOYSA-N Dichloromethane Chemical compound ClCCl YMWUJEATGCHHMB-UHFFFAOYSA-N 0.000 description 3
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 3
- 238000005481 NMR spectroscopy Methods 0.000 description 3
- 229920000265 Polyparaphenylene Polymers 0.000 description 3
- 239000004721 Polyphenylene oxide Substances 0.000 description 3
- 239000004734 Polyphenylene sulfide Substances 0.000 description 3
- BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical compound [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 description 3
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical group [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 3
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 3
- BZHJMEDXRYGGRV-UHFFFAOYSA-N Vinyl chloride Chemical compound ClC=C BZHJMEDXRYGGRV-UHFFFAOYSA-N 0.000 description 3
- 230000002411 adverse Effects 0.000 description 3
- 150000005840 aryl radicals Chemical class 0.000 description 3
- 125000001797 benzyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])([H])* 0.000 description 3
- 230000015572 biosynthetic process Effects 0.000 description 3
- 150000001732 carboxylic acid derivatives Chemical class 0.000 description 3
- 230000008859 change Effects 0.000 description 3
- 238000009833 condensation Methods 0.000 description 3
- 230000005494 condensation Effects 0.000 description 3
- 238000001816 cooling Methods 0.000 description 3
- 239000003792 electrolyte Substances 0.000 description 3
- 238000005516 engineering process Methods 0.000 description 3
- 238000000605 extraction Methods 0.000 description 3
- 238000007306 functionalization reaction Methods 0.000 description 3
- 239000007789 gas Substances 0.000 description 3
- 239000011521 glass Substances 0.000 description 3
- 229930195733 hydrocarbon Natural products 0.000 description 3
- 125000004435 hydrogen atom Chemical group [H]* 0.000 description 3
- RAXXELZNTBOGNW-UHFFFAOYSA-N imidazole Natural products C1=CNC=N1 RAXXELZNTBOGNW-UHFFFAOYSA-N 0.000 description 3
- 239000012442 inert solvent Substances 0.000 description 3
- 150000002500 ions Chemical class 0.000 description 3
- 150000002894 organic compounds Chemical class 0.000 description 3
- 230000003647 oxidation Effects 0.000 description 3
- 238000007254 oxidation reaction Methods 0.000 description 3
- 229910052760 oxygen Inorganic materials 0.000 description 3
- 125000001918 phosphonic acid ester group Chemical group 0.000 description 3
- 229920006393 polyether sulfone Polymers 0.000 description 3
- 229920006380 polyphenylene oxide Polymers 0.000 description 3
- 229920000069 polyphenylene sulfide Polymers 0.000 description 3
- 229920001296 polysiloxane Polymers 0.000 description 3
- 125000001436 propyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])[H] 0.000 description 3
- 229910000077 silane Inorganic materials 0.000 description 3
- 150000004756 silanes Chemical class 0.000 description 3
- 150000003377 silicon compounds Chemical class 0.000 description 3
- 238000001228 spectrum Methods 0.000 description 3
- 229910052717 sulfur Inorganic materials 0.000 description 3
- 238000003786 synthesis reaction Methods 0.000 description 3
- BDZBKCUKTQZUTL-UHFFFAOYSA-N triethyl phosphite Chemical compound CCOP(OCC)OCC BDZBKCUKTQZUTL-UHFFFAOYSA-N 0.000 description 3
- 238000002604 ultrasonography Methods 0.000 description 3
- 125000001140 1,4-phenylene group Chemical group [H]C1=C([H])C([*:2])=C([H])C([H])=C1[*:1] 0.000 description 2
- OSSNTDFYBPYIEC-UHFFFAOYSA-N 1-ethenylimidazole Chemical compound C=CN1C=CN=C1 OSSNTDFYBPYIEC-UHFFFAOYSA-N 0.000 description 2
- ARXJGSRGQADJSQ-UHFFFAOYSA-N 1-methoxypropan-2-ol Chemical compound COCC(C)O ARXJGSRGQADJSQ-UHFFFAOYSA-N 0.000 description 2
- AFABGHUZZDYHJO-UHFFFAOYSA-N 2-Methylpentane Chemical compound CCCC(C)C AFABGHUZZDYHJO-UHFFFAOYSA-N 0.000 description 2
- KAKZBPTYRLMSJV-UHFFFAOYSA-N Butadiene Chemical compound C=CC=C KAKZBPTYRLMSJV-UHFFFAOYSA-N 0.000 description 2
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical group [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 2
- XTHFKEDIFFGKHM-UHFFFAOYSA-N Dimethoxyethane Chemical compound COCCOC XTHFKEDIFFGKHM-UHFFFAOYSA-N 0.000 description 2
- PCLIMKBDDGJMGD-UHFFFAOYSA-N N-bromosuccinimide Chemical compound BrN1C(=O)CCC1=O PCLIMKBDDGJMGD-UHFFFAOYSA-N 0.000 description 2
- 229920000557 Nafion® Polymers 0.000 description 2
- VEQPNABPJHWNSG-UHFFFAOYSA-N Nickel(2+) Chemical class [Ni+2] VEQPNABPJHWNSG-UHFFFAOYSA-N 0.000 description 2
- 239000004952 Polyamide Substances 0.000 description 2
- 239000004642 Polyimide Substances 0.000 description 2
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- SLGWESQGEUXWJQ-UHFFFAOYSA-N formaldehyde;phenol Chemical class O=C.OC1=CC=CC=C1 SLGWESQGEUXWJQ-UHFFFAOYSA-N 0.000 description 1
- 150000004820 halides Chemical class 0.000 description 1
- 125000006038 hexenyl group Chemical group 0.000 description 1
- 239000012456 homogeneous solution Substances 0.000 description 1
- 229920001519 homopolymer Polymers 0.000 description 1
- 239000001257 hydrogen Substances 0.000 description 1
- WGCNASOHLSPBMP-UHFFFAOYSA-N hydroxyacetaldehyde Natural products OCC=O WGCNASOHLSPBMP-UHFFFAOYSA-N 0.000 description 1
- 239000007943 implant Substances 0.000 description 1
- 238000005470 impregnation Methods 0.000 description 1
- 238000011065 in-situ storage Methods 0.000 description 1
- 239000011261 inert gas Substances 0.000 description 1
- 150000004694 iodide salts Chemical class 0.000 description 1
- 230000026045 iodination Effects 0.000 description 1
- 238000006192 iodination reaction Methods 0.000 description 1
- 239000003014 ion exchange membrane Substances 0.000 description 1
- 229960004592 isopropanol Drugs 0.000 description 1
- 150000002576 ketones Chemical class 0.000 description 1
- 239000000314 lubricant Substances 0.000 description 1
- 125000004401 m-toluyl group Chemical group [H]C1=C([H])C(=C([H])C(=C1[H])C([H])([H])[H])C(*)=O 0.000 description 1
- 230000014759 maintenance of location Effects 0.000 description 1
- 229910001463 metal phosphate Inorganic materials 0.000 description 1
- 125000005397 methacrylic acid ester group Chemical group 0.000 description 1
- 230000001617 migratory effect Effects 0.000 description 1
- 150000007522 mineralic acids Chemical class 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000000877 morphologic effect Effects 0.000 description 1
- 125000001624 naphthyl group Chemical group 0.000 description 1
- 230000007935 neutral effect Effects 0.000 description 1
- 229910017604 nitric acid Inorganic materials 0.000 description 1
- QJGQUHMNIGDVPM-UHFFFAOYSA-N nitrogen group Chemical group [N] QJGQUHMNIGDVPM-UHFFFAOYSA-N 0.000 description 1
- JFNLZVQOOSMTJK-KNVOCYPGSA-N norbornene Chemical compound C1[C@@H]2CC[C@H]1C=C2 JFNLZVQOOSMTJK-KNVOCYPGSA-N 0.000 description 1
- 125000004365 octenyl group Chemical group C(=CCCCCCC)* 0.000 description 1
- 150000007524 organic acids Chemical class 0.000 description 1
- 235000005985 organic acids Nutrition 0.000 description 1
- 238000006053 organic reaction Methods 0.000 description 1
- 125000005440 p-toluyl group Chemical group [H]C1=C([H])C(=C([H])C([H])=C1C(*)=O)C([H])([H])[H] 0.000 description 1
- 150000002940 palladium Chemical class 0.000 description 1
- VSIIXMUUUJUKCM-UHFFFAOYSA-D pentacalcium;fluoride;triphosphate Chemical compound [F-].[Ca+2].[Ca+2].[Ca+2].[Ca+2].[Ca+2].[O-]P([O-])([O-])=O.[O-]P([O-])([O-])=O.[O-]P([O-])([O-])=O VSIIXMUUUJUKCM-UHFFFAOYSA-D 0.000 description 1
- RGSFGYAAUTVSQA-UHFFFAOYSA-N pentamethylene Natural products C1CCCC1 RGSFGYAAUTVSQA-UHFFFAOYSA-N 0.000 description 1
- 235000021317 phosphate Nutrition 0.000 description 1
- 229910000065 phosphene Inorganic materials 0.000 description 1
- 125000000394 phosphonato group Chemical group [O-]P([O-])(*)=O 0.000 description 1
- 150000003007 phosphonic acid derivatives Chemical class 0.000 description 1
- 150000003008 phosphonic acid esters Chemical group 0.000 description 1
- NBIIXXVUZAFLBC-UHFFFAOYSA-N phosphoric acid Substances OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 description 1
- 239000002985 plastic film Substances 0.000 description 1
- 229920006255 plastic film Polymers 0.000 description 1
- 229920000110 poly(aryl ether sulfone) Polymers 0.000 description 1
- 229920001467 poly(styrenesulfonates) Polymers 0.000 description 1
- 239000004584 polyacrylic acid Substances 0.000 description 1
- 229920002857 polybutadiene Polymers 0.000 description 1
- 229920000515 polycarbonate Polymers 0.000 description 1
- 229920000728 polyester Polymers 0.000 description 1
- 229920001601 polyetherimide Polymers 0.000 description 1
- 239000005518 polymer electrolyte Substances 0.000 description 1
- 238000006116 polymerization reaction Methods 0.000 description 1
- 229920000137 polyphosphoric acid Polymers 0.000 description 1
- 229920000379 polypropylene carbonate Polymers 0.000 description 1
- 229920001451 polypropylene glycol Polymers 0.000 description 1
- 229920002635 polyurethane Polymers 0.000 description 1
- 239000004814 polyurethane Substances 0.000 description 1
- 235000019422 polyvinyl alcohol Nutrition 0.000 description 1
- 229920000131 polyvinylidene Polymers 0.000 description 1
- 229920002981 polyvinylidene fluoride Polymers 0.000 description 1
- 229910052573 porcelain Inorganic materials 0.000 description 1
- 239000003361 porogen Substances 0.000 description 1
- 235000010333 potassium nitrate Nutrition 0.000 description 1
- 230000001376 precipitating effect Effects 0.000 description 1
- 239000002243 precursor Substances 0.000 description 1
- 238000012545 processing Methods 0.000 description 1
- 230000001737 promoting effect Effects 0.000 description 1
- BDERNNFJNOPAEC-UHFFFAOYSA-N propan-1-ol Chemical compound CCCO BDERNNFJNOPAEC-UHFFFAOYSA-N 0.000 description 1
- 125000002577 pseudohalo group Chemical group 0.000 description 1
- UMJSCPRVCHMLSP-UHFFFAOYSA-N pyridine Natural products COC1=CC=CN=C1 UMJSCPRVCHMLSP-UHFFFAOYSA-N 0.000 description 1
- 230000003014 reinforcing effect Effects 0.000 description 1
- 238000001226 reprecipitation Methods 0.000 description 1
- 238000002390 rotary evaporation Methods 0.000 description 1
- 230000007017 scission Effects 0.000 description 1
- 125000000467 secondary amino group Chemical group [H]N([*:1])[*:2] 0.000 description 1
- 238000002444 silanisation Methods 0.000 description 1
- 230000000391 smoking effect Effects 0.000 description 1
- 239000011877 solvent mixture Substances 0.000 description 1
- 238000004611 spectroscopical analysis Methods 0.000 description 1
- 239000003381 stabilizer Substances 0.000 description 1
- 229920006159 sulfonated polyamide Polymers 0.000 description 1
- 239000000725 suspension Substances 0.000 description 1
- 229920001897 terpolymer Polymers 0.000 description 1
- 150000003512 tertiary amines Chemical class 0.000 description 1
- 125000001302 tertiary amino group Chemical group 0.000 description 1
- VZGDMQKNWNREIO-UHFFFAOYSA-N tetrachloromethane Chemical compound ClC(Cl)(Cl)Cl VZGDMQKNWNREIO-UHFFFAOYSA-N 0.000 description 1
- BFKJFAAPBSQJPD-UHFFFAOYSA-N tetrafluoroethene Chemical group FC(F)=C(F)F BFKJFAAPBSQJPD-UHFFFAOYSA-N 0.000 description 1
- 239000004753 textile Substances 0.000 description 1
- 238000002411 thermogravimetry Methods 0.000 description 1
- 229920001169 thermoplastic Polymers 0.000 description 1
- 150000003852 triazoles Chemical class 0.000 description 1
- RIOQSEWOXXDEQQ-UHFFFAOYSA-N triphenylphosphine Chemical class C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1 RIOQSEWOXXDEQQ-UHFFFAOYSA-N 0.000 description 1
- NLVXSWCKKBEXTG-UHFFFAOYSA-N vinylsulfonic acid Chemical class OS(=O)(=O)C=C NLVXSWCKKBEXTG-UHFFFAOYSA-N 0.000 description 1
- 239000003039 volatile agent Substances 0.000 description 1
- 239000002351 wastewater Substances 0.000 description 1
- 238000004065 wastewater treatment Methods 0.000 description 1
- 229910052845 zircon Inorganic materials 0.000 description 1
- IPCAPQRVQMIMAN-UHFFFAOYSA-L zirconyl chloride Chemical compound Cl[Zr](Cl)=O IPCAPQRVQMIMAN-UHFFFAOYSA-L 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
- C07F7/00—Compounds containing elements of Groups 4 or 14 of the Periodic Table
- C07F7/02—Silicon compounds
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
- C07F9/00—Compounds containing elements of Groups 5 or 15 of the Periodic Table
- C07F9/02—Phosphorus compounds
- C07F9/547—Heterocyclic compounds, e.g. containing phosphorus as a ring hetero atom
- C07F9/6596—Heterocyclic compounds, e.g. containing phosphorus as a ring hetero atom having atoms other than oxygen, sulfur, selenium, tellurium, nitrogen or phosphorus as ring hetero atoms
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
- C07F7/00—Compounds containing elements of Groups 4 or 14 of the Periodic Table
- C07F7/02—Silicon compounds
- C07F7/08—Compounds having one or more C—Si linkages
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
- C07F9/00—Compounds containing elements of Groups 5 or 15 of the Periodic Table
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G77/00—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
- C08G77/04—Polysiloxanes
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G77/00—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
- C08G77/04—Polysiloxanes
- C08G77/045—Polysiloxanes containing less than 25 silicon atoms
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G77/00—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
- C08G77/04—Polysiloxanes
- C08G77/22—Polysiloxanes containing silicon bound to organic groups containing atoms other than carbon, hydrogen and oxygen
- C08G77/30—Polysiloxanes containing silicon bound to organic groups containing atoms other than carbon, hydrogen and oxygen phosphorus-containing groups
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G77/00—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
- C08G77/04—Polysiloxanes
- C08G77/38—Polysiloxanes modified by chemical after-treatment
- C08G77/382—Polysiloxanes modified by chemical after-treatment containing atoms other than carbon, hydrogen, oxygen or silicon
- C08G77/395—Polysiloxanes modified by chemical after-treatment containing atoms other than carbon, hydrogen, oxygen or silicon containing phosphorus
Definitions
- the present invention relates to oligomeric or polymeric siloxanes containing phosphonic acid groups, a process for their preparation, oligomeric or polymeric siloxanes containing phosphonic acid silyl ester and / or alkyl ester groups, mixtures containing at least one oligomeric or polymeric siloxane containing at least one polyphosphonic acid group according to the invention and / or at least an oligomeric or polymeric siloxane containing phosphonic acid silyl ester and / or alkyl ester groups and at least one further polymer, membranes, films, composite or composite materials containing at least one oligomeric or polymeric siloxane containing phosphonic acid groups according to the invention and / or at least one polyphosphoric acid silyl ester and / or polyester according to the invention Oligo- or polymeric siloxane containing one or more alkyl groups, or a mixture according to the invention, the use of oligomeric or polymeric siloxanes containing phosphonic acid
- They can be used, for example, as lubricants on metals and textiles, flame retardant additives, adhesion promoters, additives for cosmetics or detergents, defoamers, release agents, damping fluids, fluids for heat transfer, antistatic agents, polishes and coatings, in or as membranes, films, composites or composites , in particular in or used as membranes in fuel cells or in the separation technique and for the binding of metal ions.
- WO 2005/005519 relates to a process for the preparation of silicones modified with phosphonic acid esters.
- the phosphonic acid-modified silicones are prepared by reacting phosphonic acid ester group-containing silanes with reactive silicon compounds.
- WO 2005/036687 relates to water-insoluble additives for improving the performance of ion-exchange membranes, these additives being able to be built up from a siloxane matrix modified with phosphonic acid groups. It is preferably a crosslinked siloxane matrix which has covalently bonded phosphonic acid groups via linkers. According to WO 2005/036687, the preparation of these crosslinked siloxanes functionalized via a linker with phosphonic acid groups is carried out by reaction of a silane with a further silane which has a phosphonato group which is linked to the silane via a linker, in water and in the presence a catalytic amount of a concentrated acid.
- the attachment of the phosphonic acid function to the siloxane skeleton takes place via linkers which contain aliphatic units.
- the preparation of the oligosiloxanes and polysiloxanes is effected by condensation of siloxane compounds containing phosphonic acid derivatives, cocondensation with phosphonic acid derivative-free compounds being also possible for modifying the solubility and the mechanical properties.
- the object of the present invention is to provide further phosphonic acid-containing oligomeric or polymeric siloxanes having a controllable content of phosphonic acid groups, which can be obtained according to a process which is simple to carry out.
- the oligomeric or polymeric siloxanes containing phosphonic acid groups are intended in particular for use in membranes for fuel cells. len, for example, as additives, be suitable.
- the oligomeric or polymeric siloxanes containing phosphonic acid groups should be suitable for such purposes, in which such functionalized siloxanes are usually used.
- B, B 1 , B 2 , B 3 are independent of each other - R
- n are independently 0, 1 or 2; but do not mean 0 at the same time;
- k is an integer> 2, k ', k ", k'" 0 to 4, preferably 0 to 2, particularly preferably 0;
- the inventive phosphonic acid-containing oligomeric or polymeric siloxanes are characterized by a linear, ladder-like linear, cage-like or crosslinked, siloxane matrix having silicon atoms which are crosslinked by a plurality of disiloxy bonds (Si-O-Si). At least some of the silicon atoms are covalently linked to residues containing phosphonic acid groups.
- the oligomeric or polymeric siloxane main bodies of the oligomeric or polymeric siloxanes containing phosphonic acid groups according to the invention may in principle be organic or inorganic hybrid oligo- and poly (siloxanes), silsesquisiloxanes and polyhydric silsesquisiloxanes.
- the oligomeric or polymeric siloxane skeleton is silsesquisiloxanes, that is, the siloxanes of the invention are silsesquisiloxanes containing phosphonic acid groups.
- the silsesquisiloxanes are a specific group of siloxanes, which are generally a composition of the general formula Si 2n Os n R 2n , where R can in principle be Cl, H or other substituents, for example hydrocarbon radicals.
- the silsesquisiloxanes are distinguished by the fact that each Si atom is bound via an O atom to three further SiMcium atoms.
- the silsesquisiloxanes may be present as structureless matrix, in the form of ladder-like structures or in the form of wholly or partially closed cage-like polyhedral structures.
- the carbon chain of the alkyl group is interrupted by heteroatoms or heteroatom-containing groups, for example by O or by NR 3 , where R 3 is again alkyl, alkenyl, cycloalkyl, aryl or aralkyl.
- the alkyl groups may
- alkenyl is to be understood as meaning groups which may be linear or branched and have 2 to 20, preferably 2 to 8, particularly preferably 2 to 6, very particularly preferably 2 to 4, carbon atoms.
- the carbon chains of the alkenyl groups can furthermore be interrupted by heteroatoms, for example by O or NR 3 , where R 3 has already been defined above.
- the alkenyl groups may be further substituted with the groups referred to the alkyl groups.
- Suitable alkenyl groups are, for example, butenyl, hexenyl, octenyl in all isomeric forms.
- cycloalkylene refers to substituted and unsubstituted cycloalkyl groups having 3 to 20, preferably 3 to 12, particularly preferably 3 to 6, carbon atoms in the cyclic skeleton.
- Suitable substituents of the cycloalkyl groups are the substituents mentioned above with respect to the alkyl groups. It is also possible that one or more carbon atoms of the cyclic backbone have been replaced by heteroatoms or heteroatom-containing groups, for example O, S or NR 3 , where R 3 has already been defined above.
- Suitable cycloalkyl groups are, for example, 1-cyclooctyl, 1-cycloheptyl, 1-cyclohexyl, 1-cyclopentyl, 1-methyl-cyclopentyl, 1-methylcyclohexyl, 1-methyl-4-i-propylcyclohexyl, preferably 1-cyclopentyl, 1-cyclohexyl and 1-cyclooctyl.
- aryl groups substituted and unsubstituted aryl groups are suitable for the purposes of the present application, where, in the case of R 2, the aryl groups optionally have one or more radicals (P (OO) (OH) 2 ).
- the aryl groups preferably have 6 to 20, particularly preferably 6 to 12, carbon atoms in the skeleton.
- Aryl groups are also to be understood as those groups in which 2 or more aryl groups are linked via one or more single bonds, for example diphenyl.
- Suitable substituents - in addition to optionally one or more radicals (P (OO) (OH 2 ) in the case of R 2 in formula (I) - have already been mentioned above with respect to the alkyl radicals
- Suitable aralkyl groups in the context of the present application are substituted or unsubstituted aralkyl groups having 7 to 20, preferably 7 to 18, particularly preferably 7 to 14, carbon atoms in the aralkyl radical. It is possible that one or more of the carbon atoms in the aryl radical of the aralkyl radical or in the alkyl radical of the aralkyl radical have been replaced by heteroatom or heteroatom-containing groups, for example O or NR 3 , where R 3 has already been defined above. Furthermore, the aralkyl groups may be substituted with the substituents referred to the alkyl groups. Suitable aralkyl groups are, for example, m / p-phenylethyl or benzyl, m / p-toluyl and i-xylyl.
- 2- or polyvalent aromatic radicals are to be understood as meaning substituted or unsubstituted radicals, where, in the case of R 1 in formula (I), these radicals optionally contain one or more radicals (P (OO) (OH) 2 ) are substituted.
- the 2- or polyvalent aromatic radicals may further contain heteroatoms, for example N, O or S.
- 2- or polyvalent aromatic radicals may contain other substituents, suitable above for the alkyl substituents mentioned as substituents
- Preferred radicals are bivalent aromatic radicals which, in the case of R 1 in formula (I), may optionally have one or more radicals (P (OO) (OH) 2 ).
- Suitable two-valent radicals are, for example, arylene radicals such as 1,4-phenylene, 1,3-phenylene, 1,2-phenylene, 1,6-naphthylene, 2,4-naphthylene, 2,6-carbazole, 3-phenyl- 1, 4-arylene, 3-alkyl-1, 4-arylene, 2-alkyl-1,4-arylene, 2-alkoxy-1,4-arylene, 3-alkoxy-1,4-arylene, 2,4- Dimethyl 1, 4-phenylene, 2,3,5,6-tetramethyl-1, 4-phenylene, 4,4'-biphenylene, 3,3'-diphenyl-4,4'-biphenylene or arylenealkylene, for example 2 '2'-Isopropylidene bis (1,4-phenylene).
- arylene radicals such as 1,4-phenylene, 1,3-phenylene, 1,2-phenylene, 1,6-naphthylene, 2,4-n
- Suitable alkyl radicals in the context of the present application have already been mentioned above.
- Suitable alkoxy radicals in the context of the present application are those which contain the abovementioned alkyl radicals.
- k in the general formula (I) is an integer ⁇ 2.
- k is particularly preferably 6, 8, 10 or 12th
- x and y denote 0, 1 or 2, with the proviso that the sum (x + y) means a maximum of 3 and x and y do not simultaneously denote 0.
- the sum (x + y) is 1 or 2, more preferably 1.
- the sum (x + y) is 3, in a preferred embodiment x 1 and y 2 and in another embodiment x 2 and y 1.
- the sum (x + y) is 2, in a preferred embodiment x and y are 1.
- x ', x ", x'" and y ', y ", y'" in the units of the general formula I. 0, 1 or 2, with the proviso that the sums of (x '+ y') and (x "+ y") and (x '"+ y'”) each mean a maximum of 3.
- siloxanes of the invention may have mixed structures wherein x and y are 0.
- n and m in the groups A and B of the units of the general formula (I) are independently 0, 1 or 2, wherein in at least one of the k units of the formula (I) at least m or n is not 0.
- n and m each independently 1 or 2, generally as long as the solubility or dispersibility is not adversely affected by aggregation.
- the siloxanes containing phosphonic acid groups according to the invention thus have a silsesquisiloxane skeleton, the silsesquisiloxanes being wholly or partially closed cagey polyhedral silsesquisiloxanes, in which k in the general formula (I) is particularly preferably 6, 8 , 10 or 12 means.
- the siloxanes containing phosphonic acid groups according to the invention are silsesquisiloxanes which are ladder-like or structureless, in which x 1 and y are 0.
- the radical R 1 in the ladder-type or structureless silsesquisiloxanes is particularly preferably phenylene.
- the present invention relates to phosphonic acid-containing oligomeric or polymeric siloxanes of the general formula I wherein k ', k "and k'" denote 0, i. polymeric siloxanes containing one or more units of the general formula (Ia)
- x, y 0, 1 or 2, with the proviso that the sum (x + y) is a maximum of 3 m, n are independently 0, 1 or 2; but not at the same time 0; k 6, 8, 10 or 12;
- R 1 is phenylene, biphenylene, phenoxyphenylene or naphthylene
- R 2 is phenylene, biphenylene, phenoxyphenylene or naphthylene.
- the inventive phosphonic acid-containing oligomeric or polymeric siloxanes containing one or more units of the general formula (I) generally have a molecular weight of from 400 to 5000, preferably from 1000 to 3000, more preferably from 1200 to 2600. Further, higher molecular weight ladder-like structures comprising one or more units of the general formula (I) are included in the present invention having molecular weights higher than those given above.
- the oligomeric or polymeric siloxanes containing phosphonic acid groups exclusively comprise units of the general formula (I). At least one of the units of the general formula (I) has at least one group A, B, A 1 , B 1 , A 2 and / or B 2 , preferably at least one group A or B, according to formula (I), in which n and / or m are not equal to 0.
- the degree of phosphonylation can be determined by conventional methods, for example, by weight, NMR spectroscopy or elemental analysis. These methods are known to the person skilled in the art.
- the novel phosphonic acid-containing oligomeric or polymeric siloxanes containing one or more units of the general formula (I) are generally halogen-free.
- Halogen-free in the context of the present application means that the content of halogen in the oligomeric or polymeric siloxanes containing phosphonic acid groups contains one or more units of the general formula (I) less than 10% by weight, preferably less than 5% by weight. , Particularly preferably less than 3 wt .-%, each based on the mass of the phosphonic acid-containing oligomeric or polymeric siloxane containing one or more units of the general formula (I) is.
- the inventive phosphonic acid-containing oligomeric or polymeric siloxanes containing one or more units of the general formula (I) are generally prepared by phosphonylation of the corresponding oligomeric or polymeric sialoxylates.
- Another object of the present invention is therefore a process for the preparation of phosphonic acid-containing oligomeric or polymeric siloxanes comprising the step:
- x, y, x ', y ⁇ x ", y", X'", y '" independently of one another 0, 1 or 2, with the proviso that the sums (x + y), (x' + y ') , (x "+ y") and (x '"+ y'") each represent a maximum of 3; m, n are independently 0, 1 or 2; but not at the same time 0;
- k is an integer> 2, wherein at least in one of the units of the formula (II) x and y do not simultaneously denote 0; k ', k ", k'" 0 to 4, preferably 0 to 2, particularly preferably 0;
- R 1 is a 2- or polyvalent aromatic radical which may optionally bear one or more substituents and / or may contain one or more heteroatoms;
- R 2 is an aryl or alkyl group which may optionally bear one or more substituents and / or may contain one or more heteroatoms;
- X, X ' is halogen, preferably Br, I, more preferably Br;
- Attoomm ooddeerr ddiiee GGrruppppee A 2 may be bonded to a Si atom of the compounds of general formula I;
- the process according to the invention is used to prepare the inventive phosphonic acid-containing oligomeric or polymeric siloxanes containing one or more units of the general formula (I).
- the groups and indices x, x ', x ", x'", y, y ', y ", y'", m, n, k, k ', k ", k'", R 1 and R 2 correspond therefore, with respect to the phosphonic acid-containing oligomeric or polymeric siloxanes containing one or more units of the general formula (I) embodiments mentioned.
- the phosphonic acid groups are not composed of a linker composed of aliphatic units with one or more silicon atoms of the siloxane skeleton connected, but on aromatic moieties containing radicals. It has surprisingly been found that the synthesis of structurally defined phosphonic acid-containing oligomeric or polymeric siloxanes containing one or more units of the general formula (I) is well possible by subsequent catalytic phosphonylation of halogenated correspondingly structured siloxanes. The siloxane matrix is not destroyed or damaged in the phosphonylation process according to the invention.
- phosphorous acid silyl esters are used for the phosphonylation. These preferably have the general formulas (III) or (IV).
- R 4 D ⁇ ⁇ 5 , D ⁇ ⁇ 6 , D ⁇ ⁇ 7 , D ⁇ ⁇ 8 , D ⁇ ⁇ 9 , D ⁇ ⁇ 10 , D ⁇ ⁇ 11 , D ⁇ ⁇ 12 independently of one another alkyl, alkenyl, cycloalkyl, aralkyl, aryl, where the abovementioned Groups may be substituted and / or may have heteroatoms.
- the phosphorous acid silyl esters are mixtures of O-silylated Phosphorigklaes- ter, which are obtainable by silylation of phosphorous acid with one or more amino, halogen and / or alkoxysilanes.
- phosphonylation is carried out using phosphorous acid alkyl esters which preferably have the general formulas (V) or (VI).
- R 13 , R 14 , R 15 are independently alkyl, alkenyl, cycloalkyl, aralkyl, wherein the abovementioned groups may be substituted and / or may have heteroatoms.
- phosphorus acid silyl esters which have the general formulas P (OSiR 4 R 5 R 6 ) 3 and / or P (OSiR 4 R 5 R 6 ) 2 (OH).
- R 7 and R 10 are identical to R 4
- R 8 and R 11 are identical to R 5 and R 9 and R 12 are identical to R 6 .
- the radicals R 4 , R 5 , R 6 , R 7 , R 8 , R 9 , R 10 , R 11 and R 12 are preferably selected independently of one another from linear or branched C 1 - to C 20 -alkyl, alkenyl and aryl Radicals, preferably methyl, ethyl, n-propyl, i-propyl, n-butyl, 1- (but-3-yenyl), s-butyl, t-butyl, 1-pentyl, t-pentyl, 1-hexyl, 1-octyl, i -octyl, t -octyl, 2-ethylhexyl, 1-cyclooctyl, 1-cycloheptyl, 1-cyclohexyl, 1-cyclopentyl, 1-methylcyclopentyl, 1-methylcyclohexyl, 1-methyl-4 i-propylcyclohexyl, non
- phosphorous acid silyl esters used in the process according to the invention in one embodiment can be prepared by processes known to the person skilled in the art, for example by silylation of phosphorous acid with one or more amino, halogen or alkoxysilanes, or in some cases are commercially available.
- the phosphorous acid silyl ester used is tris (trimethylsilyl) phosphite.
- the radicals R 13 , R 14 and R 15 which are used in the phosphorous acid alkyl esters of the formulas (V) or (VI) used in a further embodiment of the process according to the invention are preferably likewise selected from those relating to the radicals R 4 , R 5 , R 6 , R 7 , R 8 , R 9 , R 10 , R 11 and R 12 mentioned radicals.
- the radicals R 13 , R 14 and R 15 of the phosphorous acid alkyl esters have the same meanings. Very particular preference is given to using triethyl phosphite and tributyl phosphite or diethyl phosphite as the phosphorous acid alkyl ester.
- the preparation of the alkyl phosphorous acid esters which can be used according to one embodiment of the process according to the invention is carried out by methods known to the person skilled in the art, in some cases the alkyl phosphates are furthermore commercially available.
- the process according to the invention for the preparation of the oligo- or polymeric siloxanes containing phosphonic acid groups according to the invention is carried out in the presence of a catalyst.
- the catalyst contains at least one metal selected from the group consisting of Ni, Pd, Pt, Rh, Ru, Os and Ir, preferably Ni and Pd. It is also possible that the catalyst comprises mixtures of two or more of said metals.
- Nickel and palladium can be present in the oxidation states 0 to +2, that is, in a preferred embodiment, either nickel and / or palladium salts or complexes of nickel and / or palladium are used.
- a catalyst which contains palladium, then a phosphorous acid silyl ester of the formula (IV) or a phosphorous acid alkyl ester of the formula (VI) is generally used.
- a nickel-containing catalyst is used, a phosphorous acid silyl ester of the formula (III) or a phosphorous acid alkyl ester of the formula (V) is generally used.
- Suitable salts of nickel and / or palladium are halides, preferably chlorides, bromides or iodides, particularly preferably chlorides, pseudohalides, preferably cyanides, OCN, SCN, particularly preferably cyanides, .beta.-diketonates, preferably acetylacetonates.
- Preferred salts of nickel are nickel (II) salts.
- Ni [CO] 4 , Ni [P (OR) 3 ] 4 with R is a linear or branched C 1 -C 20 -alkyl radical, preferably ethyl, as described, for example, in J. Org. Chem. 1980, 45, 5426-5499, is preferred.
- Pd (0) complexes examples include triphenylphosphine complexes or dibenzylidene acetonates. Examples are tetrakis (triphenylphosphine) palladium or tris (dibenzylideneacetone) palladium.
- a catalyst which contains nickel, preferably Ni (O) or Ni (II), in particular a catalyst which contains nickel in the form of a nickel (II) salt.
- nickel (II) salt preferably Ni (O) or Ni (II) salt.
- Suitable salts have already been mentioned above.
- Particular preference is given to using a nickel (II) halide, in particular NiCl 2 , as the catalyst in the process according to the invention.
- the catalyst is generally used in an amount of 0.01 to 1 molar equivalents, based on the amount of the molar equivalents of halogen in the halogenated th oligomeric or polymeric siloxanes containing one or more units of the formula (II), in each case based on the amount of the metal used.
- the inventive method is characterized in particular by the fact that even with small amounts of the catalyst used, a nearly complete
- the exact amount of catalyst used depends, inter alia, on whether the phosphonylation is carried out with alkyl phosphorous acid silyl or phosphorous acid esters and on the metal used in the catalyst.
- the amount of catalyst used in the case where a catalyst containing nickel is used is preferably from 0.01 to 0.2 molar equivalents, based on the amount of molar Equivalents of halogenation in the halogenated oligomeric or polymeric siloxanes containing one or more units of the formula (II), particularly preferably 0.01 to 0.1 molar equivalents.
- a catalyst comprising palladium is used when using phosphorous acid silyl esters for phosphonylation, the catalyst is preferably used in an amount of from 0.025 to 0.5 molar equivalents, based on the molar equivalents of halogen in the halogenated oligomeric or polymeric siloxanes containing one or more units of the formula (II) used.
- the amount of nickel catalyst preferably used is preferably 0.05 to 0.5 molar equivalents, based on the amount of molar equivalents of halogen in the halogenated oligomeric or polymeric siloxanes containing one or more units of formula (II), more preferably 0.05 to 0.2 molar equivalents.
- the solvents used in the process according to the invention are nitrogen-free solvents. This may be a single solvent or solvent mixtures.
- the nitrogen-free solvent or the mixture of nitrogen-free solvents preferably has a boiling point above 150 ° C.
- Suitable solvents are selected from the group consisting of diphenyl ethers, benzophenone, diphenylsulfone, sulfolane, the alkyl or alkoxy substituted derivatives of these compounds, in particular the methyl, ethyl, propyl, butyl, methoxy, ethoxy, propoxy, butoxy-substituted derivatives, aliphatic, partially aromatic, aromatic oligo- and polyethers, aliphatic, partially aromatic , aromatic .beta.-diketones, for example acetylacetone, acetylbenzophenone and 1, 3H-diphenylpropane-1, 3-dione, the alkyl, alkoxy, aryl and aryl
- Benzophenone, diphenyl ether and diphenyl sulfone, or dimethyl, ethyl, propyl, butyl, methoxy, ethoxy, propoxy, butoxy-substituted derivatives of these compounds are preferably used as solvents. Very particular preference is given to using diphenyl ether and benzophenone.
- the reaction temperature in the process according to the invention is ⁇ 150 ° C according to the invention.
- the process according to the invention is preferably carried out at temperatures of from 150 to 250.degree. C., particularly preferably from 170 to 250.degree. C., very particularly preferably from 190 to 250.degree.
- the solvent is used in a quantitative ratio to the halogenated oligomeric or polymeric siloxanes used in the process according to the invention containing one or more units of the formula (II) of generally 5 to 300% by weight to 5 to 200% by weight, preferably 5 to 100 wt .-% to 5 to 50 wt .-%, particularly preferably 5 to 25 wt .-% used.
- a preferred embodiment of the process according to the invention for the phosphonylation of halogenated oligomeric or polymeric siloxanes containing one or more units of the formula (II) is shown by way of example.
- the halogenated oligomeric or polymeric siloxane comprising one or more units of the formula (II) with a catalyst, preferably one of the abovementioned catalysts, particularly preferably a nickel- or palladium-containing catalyst in the abovementioned amount in a reactor of sufficient size, preferably glass reactor, initially charged and freed of moisture at the abovementioned temperatures by passage over several hours, for example two to four hours, of a stream of nitrogen.
- This gas stream is preferably maintained throughout the reaction period, whereby volatile reaction products can be removed.
- a solution is generated by stirring at the above temperatures.
- the phosphorus component that is to say the phosphorous acid silyl and / or the phosphorous acid alkyl ester, is now preferred for the homogeneous batch
- Phosphorigkladsilyl- and alkyl esters are already mentioned above and tris (trimethylsilyl) phosphite or triethyl phosphite are very particularly suitable, so added dropwise that the entire amount is preferably supplied to the batch in a period of 15 to 60, more preferably from 30 to 45 minutes.
- the reaction temperature is further increased within the aforementioned temperatures until a color change is visible, if this is not already visible without increasing the temperature.
- the appearance of color change is accompanied by the appearance of a colorless liquid carried by the N 2 stream from the reaction vessel and high foaming.
- the reaction mixture is slightly cooled (within the above-mentioned temperature ranges) and at this temperature for a period of generally 4 to 24, preferably Held 4 to 12 hours, more preferably 4 to 8 hours.
- the mixture is taken up in a suitable low-boiling solvent, for example tetrahydrofuran, and freed from solvent, reaction residues and catalyst by precipitation in alcohol, preferably methanol.
- a suitable low-boiling solvent for example tetrahydrofuran
- alcohol preferably methanol
- the silyl ester is generally simultaneously cleaved by alcoholysis to give the phosphonic acid.
- the amount of alcohol used for this purpose is generally 3- to 20-fold batch weight.
- Improved catalyst separation can be achieved, for example, by acidifying the alcoholysis bath with from 0.1 to 5% by volume of a strong mineral acid, preferably concentrated HCl, HBr or dilute HNO 3 .
- the alcohol is generally exchanged after a residence time of 15 to 240 minutes, preferably 30 to 180 minutes, more preferably 30 to 120 minutes, and this process is repeated several times, for example 3 to 10 times.
- An intensification of the cleaning and alcoholysis step is achieved by the simultaneous action of ultrasound or by Soxhlet extraction of the batch with a weakly acidic alcohol containing from 0.1 to 5% by volume of a strong mineral acid, with preferred strong mineral acids mentioned above , for generally 4 to 96 hours, preferably 12 to 48 hours possible.
- a strong mineral acid with preferred strong mineral acids mentioned above
- halogenated oligomeric or polymeric siloxanes containing one or more units of the formula (II) are generally prepared by reacting the corresponding oligomeric or polymeric siloxanes with a halogenating agent.
- Preferred oligomeric or polymeric siloxanes contain units of the general formula (VII)
- R 1 is a 2- or polyvalent aromatic radical which may optionally bear one or more substituents and / or may contain one or more heteroatoms;
- R 2 is an aryl or alkyl group which may optionally bear one or more substituents and / or may contain one or more heteroatoms;
- Attoomm ooddeerr ddiiee GGrruppppee A 2 may be bonded to a Si atom of the compounds of general formula I.
- the halogenation of the compounds of general formula (VII) is generally carried out at a temperature of -20 to 140 ° C, preferably 20 to 140 ° C, particularly preferably 25 to 100 ° C.
- the halogenation is usually carried out in an inert solvent.
- Suitable inert solvents are, for example, alkylcarboxylic acids, chlorinated hydrocarbons, inorganic acids such as sulfuric acid, alkylsulfonic acid or mixtures thereof.
- Suitable halogenating agents are known to the person skilled in the art. Preferably, a bromination or iodination is carried out. Preferred brominating agents are elemental bromine and N-bromo compounds such as N-bromosuccinimide or dibromoisocyanuric acid.
- the duration of the reaction time of the halogenating agent used, the molar ratio of halogenating agent to the oligomeric or polymeric siloxane and the temperature of the desired degree of halogenation can be controlled.
- the degree of halogenation in particular the degree of bromination, can be determined by conventional methods, for example by weighing, by NMR spectroscopy or by elemental analysis. These methods are known to the person skilled in the art.
- the amounts of brominated siloxane and solvent in the resulting reaction mixture are generally from 0.1 to 99.9% by weight of siloxane and from 0.1 to 99.9% by weight of solvent.
- the siloxane content in the reaction mixture is between 3 and 95 wt .-%, with a high siloxane content of usually at least 80 wt .-%, particularly preferably at least 90 wt .-%, is particularly preferred.
- the oligomeric or polymeric siloxanes used as starting compounds can be prepared by condensation of reactive silicon compounds by processes known to those skilled in the art.
- the resulting structures, degrees of polymerization and homogeneities of the resulting oligomeric or polymeric siloxanes, in particular of the resulting oligomeric or polymeric siloxanes containing units of the general formula (VII) can to a great extent be replaced by the reactive solvents used as starting materials Silicon compounds that influence the temperature, concentration, the catalysts used as well as the nature and molar ratios of any condensation partners. Suitable processes for the preparation of oligomeric or polymeric siloxanes are described, for example, in J.
- Siloxane [phenyl-SiOi 5 ] 8 is suspended in tetrachloroethane or in 1, 2,4-
- Termination of the reaction is the approach in a cooled non-solvent such as
- step (i) the corresponding phosphonic acid silyl ester and / or phosphonic acid alkyl ester groups are obtained by phosphonylation of halogenated oligomeric or polymeric siloxanes containing one or more units of the formula (II) with alkyl phosphorous acid silyl and / or phosphoric acid alkyl esters containing oligomeric or polymeric siloxanes.
- Another object of the present invention are therefore phosphonic acid silyl ester and / or - alkyl ester group-containing oligomeric or polymeric siloxanes prepared by the novel process.
- the phosphonic acid silyl ester and / or alkyl ester-containing oligomeric or polymeric siloxanes are converted by ester cleavage into the corresponding oligomeric or polymeric siloxanes containing phosphonic acid groups.
- ester cleavage can be carried out by methods known to those skilled in the art, wherein oligomeric or polymeric siloxanes containing phosphonic acid silyl groups can generally be reacted under milder conditions to give the corresponding phosphonic acid-containing oligomeric or polymeric siloxanes than the corresponding oligomeric or polymeric siloxanes containing phosphonic acid alkyl ester groups.
- a method for cleaving the phosphonic acid silyl ester groups has already been mentioned above.
- Another object of the present invention is therefore a process for the preparation of phosphonic acid-containing oligomeric or polymeric siloxanes comprising the steps
- Step (i) has already been described above.
- the alcoholysis of the phosphonic acid silyl ester group-containing oligomeric or polymeric siloxanes is carried out according to methods known to those skilled in the art.
- the release of the corresponding phosphonic acid-containing oligomeric or polymeric siloxanes from the corresponding silyl esters can be achieved not only with the aid of an alcohol but also with another organic compound which has acidic hydrogen atoms or with water. In a preferred embodiment, however, the release is carried out with the aid of an alcohol, wherein methanol is preferably used as the alcohol.
- step (iia) the release of the corresponding phosphonic acid-containing oligomeric or polymeric siloxanes from the corresponding silyl esters by alcoholysis takes place simultaneously with the purification of the phosphonic acid-containing oligomeric or polymeric siloxanes.
- a preferred embodiment of a process according to step (iia) comprising the liberation of the oligomeric or polymeric siloxanes containing phosphonic acid groups from the corresponding silyl esters by alcoholysis and simultaneous purification of the corresponding phosphonic acid-containing oligomeric or polymeric siloxanes is described below:
- the reaction mixture containing phosphonic acid silyl ester group-containing oligomeric or polymeric siloxanes is generally taken up in a suitable low-boiling solvent, for example tetrahydrofuran, and precipitated with water or an organic compound having acidic hydrogen atoms, for example, with an alcohol, preferably with methanol, freed of solvent, reaction residues and catalyst, wherein at the same time the silyl ester is cleaved to the corresponding phosphonic acid.
- a suitable low-boiling solvent for example tetrahydrofuran
- the amount of alcohol used for this purpose is usually three to twenty times the weight of the amount of phosphonic acid silyl ester group-containing oligomeric or polymeric siloxanes to be reacted.
- An improved catalyst separation can be achieved by acidifying the reaction mixture with 0.1 to 5% by volume of a strong mineral acid, preferably concentrated HCl, HBr or diluted HNO 3 .
- the organic compound having acidic hydrogen atoms, preferably the alcohol, more preferably methanol, is generally exchanged after a time of 30 to 120 minutes, and the above-described process is preferably repeated 3 to 10 times.
- suitable solvents are acetic acid dimethylamide (DMAC), N-methyl-2-pyrrolidone (NMP), dimethylformamide (DMF), tetrahydrofuran (THF) or mixtures thereof
- suitable precipitants are, for example, water, methanol, ethanol, ISO-propanol or mixtures thereof.
- the resulting purified oligomeric or polymeric phosphonic acid-containing siloxane is generally freed of the extractant by drying at generally 50 to 100 ° C in vacuo.
- ester cleavage of oligomeric or polymeric siloxanes containing phosphonic acid alkyl ester groups is carried out by methods known to the person skilled in the art.
- the phosphonic acid alkyl ester group-containing oligomeric or polymeric siloxane is preferably oxygenated under inert gas (e.g., nitrogen) at 250-400 ° C
- the reaction time in the ester cleavage of the alkyl esters is generally 10 minutes to 4 hours, preferably up to 15 minutes to 3 hours, particularly preferably 30 to 1 hour.
- purification of the resulting phosphonic acid-containing oligomeric or polymeric siloxanes according to the invention is generally carried out.
- the purification takes place in accordance with methods known to those skilled in the art, for example dissolving the oligomeric or polymeric siloxane in a low-boiling solvent such as THF and reprecipitation in water or methanol.
- a low-boiling solvent such as THF and reprecipitation in water or methanol.
- the purified phosphonic acid-containing oligomeric or polymeric siloxanes obtained according to the invention are dried at temperatures generally from 50 to 100 ° C. in vacuo.
- a liberation of the inventive phosphonic acid-containing oligomeric or polymeric siloxanes from the corresponding alkyl esters by acidolysis with concentrated acids is possible.
- Suitable concentrated acids are preferably concentrated hydrogen halides.
- the corresponding phosphonic acid alkyl ester-containing oligomeric or polymeric siloxane is dissolved in a solvent solved.
- a concentrated acid preferably a concentrated hydrogen halide, is added.
- the amount of concentrated acid is 35-48% by weight.
- Acidolysis is at reflux temperature.
- the reaction time of the acidolysis is generally 2 to 48 hours, preferably 4 to 24 hours.
- the oligomeric or polymeric siloxanes containing phosphonic acid groups according to the invention obtained after the acid hydrolysis are purified after the acidolysis. Suitable purification methods are known to the person skilled in the art.
- the resulting purified phosphonic acid-containing oligomeric or polymeric siloxanes according to the invention are generally subsequently dried at temperatures of generally from 50 to 100.degree. C. in vacuo.
- step (ii) of the process according to the invention more than 60%, preferably more than 70%, more preferably more than 80%, very particularly preferably more than 90% of the corresponding silyl ester or alkyl ester are generally cleaved.
- the reaction product therefore generally comprises more than 60%, preferably more than 70%, particularly preferably more than 80%, very particularly preferably more than 90% of oligomeric or polymeric siloxanes containing phosphonic acid groups comprising one or more units after carrying out step (ii) the general formula (I).
- Another object of the present invention are thus phosphonic acid-containing oligomeric or polymeric siloxanes prepared by the novel process.
- the phosphonic acid-containing oligomeric or polymeric siloxanes containing units of the formula I and / or the siloxanes containing phosphonic acid silyl esters or alkylester groups according to the invention can be used for the production of membranes, films, composites or composite materials. Preference is given to using the inventive phosphonic acid-containing oligomeric or polymeric siloxanes containing units of the formula I and / or the phosphonic acid silyl esters or alkylester groups according to the invention containing siloxanes for the preparation of membranes.
- proton-conducting membranes can be used as membranes in fuel cells or in separation technology, for example as selectively permeable membranes in water desalination, wastewater purification, dialysis or ion extraction or as separators in galvanic or electrochemical cells.
- the phosphonic acid-containing oligomeric or polymeric siloxanes containing units of the formula I and / or the siloxanes containing phosphonic acid or alkylester groups according to the invention can also be used together with other compounds, for example in the form of polymer blends. These polymer blends are also useful in making membranes, films, composite or composite materials as noted above.
- the phosphonic acid-containing oligomeric or polymeric siloxanes containing units of the formula I and / or siloxanes containing phosphonic acid or alkylester groups according to the invention are particularly suitable as additives in membranes to increase the proton conductivity, the water retention and the increase of the operating temperature, especially for membranes is of interest to fuel cells.
- non-functionalized polymers refers to polymers in the present invention, which are neither perfluorinated and sulfonated or carboxylated (ionomeric) polymers such as Nafion ® or Flemion ® (carboxylic acid polyelectrolyte) still to obtain a sufficient proton conductivity by suitable groups for example, -SO 3 H groups or -COOH groups are functionalized polymers.
- non-functionalized polymers which can be used in the context of the present invention, there are no particular restrictions as long as they are stable within the fields of application in which the polymer systems according to the invention are used. If, according to a preferred use, these are used in fuel cells, then polymers are to be used which are thermally stable up to 100 ° C. and preferably up to 200 ° C. or higher and have the highest possible chemical stability.
- Preferably used are:
- Polymers with aromatic backbone such as polyimides, polysulfones, polyethersulfones such as Ultrason ® , polyaryletherketones such as polyether ether ketones (PEEK), polyether ketones (PEK), polyether ketone ketones (PEKK), polyetheretherketonketone (PEEKK), polybenzothiazoles, polybenzimidazoles, polyamides, polyphenylene oxides , z.
- PEEK polyether ether ketones
- PEK polyether ketones
- PEKK polyether ketone ketones
- PEEKK polyetheretherketonketone
- Fluorinated backbone polymers such as Teflon® or PVDF
- Thermoplastic polymers or copolymers such as polycarbonates, such as polyethylene carbonate, polypropylene carbonate, polybutadiene carbonyl nat or polyvinylidene carbonate or polyurethanes as described inter alia in WO 98/44576,
- Vinyl polymers such as polymers and copolymers of styrene or methylstyrene, vinyl chloride, acrylonitrile, methacrylonitrile, N-methylpyrrolidone, N-vinylimidazole, vinyl acetate, vinylidene fluoride,
- Such polymers are disclosed, for example, in US 5,540,741, the disclosure of which is incorporated herein by reference in its entirety in the context of the present application; Phenol-formaldehyde resins, polytrifluorostyrene, poly-2,6-diphenyl-1,4-phenylene oxide, polyaryl ether sulfones, polyarylene ether sulfones, phosphonated poly-2,6-dimethyl-1,4-phenylene oxide.
- Olefinic hydrocarbons such as, for example, ethylene, propylene, butylene, isobutene, propene, hexene or higher homologues, butadiene, cyclopentene, cyclohexene, norbornene, vinylcyclohexane,
- Acrylic acid or methacrylic acid esters such as, for example, methyl, ethyl, propyl, isopropyl, butyl, isobutyl, hexyl, octyl, decyl, dodecyl, 2-ethylhexyl, cyclohexyl, benzyl, trifluoromethyl , or hexafluoropropyl ester or tetrafluoropropyl acrylate or tetrafluoropropyl methacrylate,
- - Vinyl ethers such as methyl, ethyl, - propyl, isopropyl, butyl, isobutyl, hexyl, octyl, decyl, dodecyl, 2-ethylhexyl, cyclohexyl, benzyl, trifluoromethyl, or hexafluoropropyl - or tetrafluoropropyl vinyl ether.
- nitrogen-containing polymers such as poly (p-phenylquinoxaline), poly (benzimidazoles).
- non-functionalized polymers can be used in principle in crosslinked or uncrosslinked form. It is also possible to use mixtures of the stated polymers.
- Particularly preferred as blend suitable non-functionalized polymers are polymers lyethersulfone having an aromatic backbone such as polyimides, polysulfones, polyvinyl such as Ultrason ®, polyaryletherketones such as polyetherether tone (PEEK), polyether ketones (PEK), polyether ketone ketones (PEKK), polyetherether tonketone (PEEKK), polybenzothiazoles, polybenzimidazoles, polyamides, polyphenylene oxides, e.g. As poly-2,6-dimethyl-1, 4-phenylene oxides, polyphenylene sulfides, polyphenylenes. Very particular preference is given to polysulfones and polyethersulfones.
- the phosphonic acid-containing siloxane according to the invention and / or the siloxane containing phosphonic acid silyl ester or alkyl ester groups can furthermore be used together with one or more further functionalized polymers.
- functionalized polymers are polymers which are ion-conducting, in particular proton-conducting. These may be either basic or acidic polymers.
- Preferred proton-conducting polymers having acidic groups are sulfonic acid groups, phosphonic acid groups and / or polymers containing carboxylic acid groups.
- Sulfonic acid, carboxylic acid and / or phosphonic acid groups are to be understood as meaning groups of the formulas -SO 3 X, -COOX and -PO 3 X 2 , where XH, NH 4 + , NH 3 R + , NH 2 R 3 + , NHR 3 + or NR 4 + , where R is any radical, preferably an alkyl radical, which optionally has one or more further radicals which can give off protons under conditions which are usually present for fuel cells.
- R is any radical, preferably an alkyl radical, which optionally has one or more further radicals which can give off protons under conditions which are usually present for fuel cells.
- Suitable functionalized polymers are described, for example, in WO 2004/076530, EP-A 0 574 791, EP-A 0 008 895, EP-A 0 575 807, WO 02/077068, WO 03/054991, JP 2000294033 A2, JP 2001233974 A2 and US Pat JP 2002025580 discloses.
- Preferred basic polymers are poly (benzimidazole), poly (p-phenylquinoxaline) or mixtures thereof. These polymers are known to the person skilled in the art and are commercially available, or can be prepared by processes known to those skilled in the art.
- Preferred functionalized polymers are, for. B. sulfonic acid-containing polymers selected from the group consisting of perfluorinated sulfonated hydrocarbons such as Nafion® by EI Dupont, sulfonated aromatic polymers such as sulfonated poly-aryl ether ketones such as polyetheretherketones (sPEEK), sulfonated polyether ketones (sPEK), sulfonated polyether ketone ketones (sPEKK), sulfonated polyetheretherketone ketones ( sPEEKK), sulfonated polyarylene ether sulfones, sulfonated polybenzobisbenzazoles, sulfonated polybenzothiazoles, sulfonated polybenzimidazoles, sulfonated polyamides, sulfonated polyetherimides, sulfonated polyphenylene oxides, eg.
- the sulfonated aromatic polymers may be partially or completely fluorinated.
- Other sulfonated polymers include polyvinylsulfonic acids, copolymers of acrylonitrile and 2-acrylamido-2-methyl-1-propanesulfonic acids, acrylonitrile and
- Vinylsulfonic acids acrylonitrile and styrenesulfonic acids, acrylonitrile and methacryloxyethyl lenoxypropanesulfonic acids, acrylonitrile and Methacryloxyethylenoxytetrafluoroethylensulfonic acids, etc.
- the polymers may in turn be partially or completely fluorinated.
- Other groups of suitable sulfonated polymers include sulfonated polyphosphazenes such as poly (sulfophenoxy) phosphazenes or poly (sulfoethoxy) phosphenes.
- the polyphosphazene polymers may be partially or fully fluorinated.
- Sulfonated polyphenylsiloxanes and copolymers thereof, poly (sulfoalkoxy) phosphazenes, poly (sulfotetrafluoroethoxypropoxy) siloxanes are also suitable.
- carboxylic acid group-containing polymers examples include polyacrylic acid, polymethacrylic acid and any copolymers thereof.
- Suitable polymers are, for. B. copolymers with vinylimidazole or acrylonitrile. The polymers may in turn be partially or fully fluorinated.
- Suitable polymers containing phosphonic acid groups are, for. B. Polyvi- nylphosphonklare, Polybenzimidazolphosphonklare, phosphonated Polyphenylenoxi- de, z. As poly-2,6-dimethyl-phenylene oxides, etc.
- the polymers may be partially or completely fluorinated.
- acid-base blends as disclosed in WO 99/54389 and WO 00/09588 are used.
- These are generally polymer blends comprising a sulfonic acid group-containing polymer and a polymer having primary, secondary or tertiary amino groups as disclosed in WO 99/54389 or polymer blends prepared by blending polymers containing basic groups in the side chain contained with sulfonate, phosphonate or carboxylate groups (acid or salt form) containing polymers.
- Suitable sulfonate, phosphonate or carboxylate-containing polymers are mentioned above (see sulfonic acid, carboxylic acid or phosphonic acid-containing polymers).
- Polymers containing basic groups in the side chain are those polymers obtained by side-chain modification of organometallic-deprotonatable engineering aryl backbone polymers having arylene-containing N-basic groups, tertiary basic N groups (such as e.g. tertiary amine or basic N-containing heterocyclic aromatic compounds such as pyridine, pyrimidine, triazine, imidazole, pyrazole, triazole, thiazole, oxazole, etc.) and aldehydes bound to the metalated polymer.
- the metal alkoxide formed as an intermediate compound can either be protonated with water in a further step or be etherified with haloalkanes (WO 00/09588).
- inventive phosphonic acid-containing oligomeric or polymeric siloxanes containing units of the formula I and / or the phosphonic acid silyl esters or alkylester groups according to the invention can be used together with a plurality of the abovementioned functionalized polymers.
- the mixtures may additionally contain one or more non-functionalized polymers. Suitable non-functionalized polymers are also mentioned above.
- Particularly preferred functionalized polymers used as blend partners are polymers containing sulfonic acid groups, suitable polymers containing sulfonic acid groups being mentioned above.
- blends comprising at least one siloxane containing phosphonic acid groups according to the invention and / or siloxane containing at least one phosphonic acid silyl ester or alkyl ester group and at least one functionalized, preferably sulfonated polymer.
- Very particularly preferably used sulfonated polymers are selected from the group consisting of sulfonated poly (ether ether ketone), poly (phenylsulfone), poly (sulfone) and poly (ether sulfone).
- Suitable polymers which are preferably used as blend partners are the basic polymers poly (benzimidazole), poly (p-phenylquinoxaline) or mixtures thereof and also derivatives thereof. These can form acid-base blends with the inventive phosphonic acid-containing oligomeric or polymeric siloxanes containing units of the formula I and / or the phosphonic acid silyl esters or alkyl ester groups according to the invention containing siloxanes.
- polymer blends are generally from 0.1 to 95 wt .-%, preferably 1 to 25 wt .-% of the inventive phosphonic acid containing oligomeric or polymeric siloxanes containing units of formula I and / or silanes according to the invention or silyl phosphonates generally from 99.9 to 5 wt .-%, preferably 75 to 99 wt .-% of at least one further polymer before.
- a further subject of the present application are therefore mixtures comprising at least one siloxane containing phosphonic acid groups according to the invention and / or siloxane containing at least one phosphonic acid silyl ester or alkyl ester group and at least one further polymer, preferably at least one further functionalized polymer.
- Preferred phosphonic acid-containing oligomeric or polymeric siloxanes and oligomeric or polymeric siloxanes containing phosphonic acid silyl or alkyl ester groups and preferred further polymers are mentioned above. It has surprisingly been found that when using mixtures of at least one oligomeric or polymeric siloxane containing phosphonic acid groups or at least one oligomeric or polymeric siloxane containing phosphonic acid silyl or alkyl ester groups and at least one further functionalized polymer, membranes having excellent ionic conductivity and fuel cells having outstanding performance are obtained which goes beyond the expected summation of the individual performances of said functionalized polymers.
- Membranes containing at least one siloxane containing phosphonic acid groups according to the invention and / or siloxane containing at least one phosphonic acid silyl ester or alkyl ester group can be prepared according to processes known to those skilled in the art. Suitable processes are mentioned, for example, in US Pat. No. 6,828,407 B2.
- Phosphonic polyelectrolyte membranes from the oligomeric or polymeric siloxanes containing phosphonic acid groups according to the invention comprising units of the formula I and / or the siloxanes or silanes containing phosphonic acid or alkyl esters according to the invention are generally obtained by dissolving or dispersing the phosphonic siloxane in an organic solvent, applying the preferably filtered solution or mixture to a suitable surface, or impregnating a support material therewith, followed by partial to complete evaporation of the solvent.
- soluble or homogeneously dispersible additives such as further polyelectrolytes, stabilizers, fillers and porogens such as poly (ethylene oxide), poly (propylene oxide), poly (vinyl alcohol) to the preferably filtered polymer solution and their subsequent processing into a membrane.
- Solvent selection is limited only by suitable solubility and inertness with respect to the phosphonic aromatic polymer and includes chlorinated hydrocarbons such as dichloromethane, chloroform and tetrachlorocarbon, 1, 2-dichloroethane, chlorobenzene and dichlorobenzene, ethers such as diethyl ether, tetrahydrofuran, and dioxane, the alkylene glycol alkyl ethers as Ethylene glycol dimethyl ether, ethylene glycol ethyl ether and propylene glycol methyl ether, alcohols such as methanol, ethanol and propanol, and the aprotic, preferably polar, amide-type liquids such as N, N-dimethylformamide, N, N-dimethylacetamide and N-methylpyrrolidone, with particular preference for N-methylpyrrolidone, as well as mixtures of these solvents.
- chlorinated hydrocarbons such as dichlorome
- An improvement in the solubility, especially of highly functionalized phosphonic acid siloxanes, in organic solvents can be achieved, for example. can be achieved by adding 0.05 - 2 vol .-% of a strong acid to the solvent, so long as this does not hinder the formation of a homogeneous solution.
- Acids used are concentrated aqueous hydrogen halide solutions such as HCl or HBr, or concentrated sulfuric or nitric acid or strong organic acids such as alkylsulfonic acids and trifluoroacetic acid.
- surfaces such as e.g. Glass, silanization hydrophobized glasses and plastic films, as support materials plastic nets, porous plastic membranes and other substrates suitable for reinforcing, flexibilizing and increasing the toughness in question.
- the solvent is completely or partially removed by evaporation at temperatures of generally 0-150 ° C. If the solvent is largely removed by a sufficient drying temperature and duration, a homogeneous membrane without morphological structuring is generally obtained.
- the residual amount of the solvent in the film can be influenced by the choice of dry temperature and time.
- a residual solvent-containing film, or composite in an incompatible with the polyelectrolyte, with the solvent-miscible precipitation bath surface porous, asymmetric membrane morphologies can be generated.
- the morphology and morphology of the resulting porous structuring can be influenced by the residual solvent content, choice of precipitation bath and its temperature.
- the membrane structures produced can be used to increase the surface area required for ion absorption or contacting of the membrane with an electrode layer and as microvoids for the deposition of polymeric or low molecular weight substances such as acidic polyelectrolytes or polyvalent metal phosphates, phosphonates and polyvalent metal sulfone phosphonates. Water retention at elevated temperature promoting silicates or acidic functionalized silicates, are used, as long as the chemical and mechanical resistance, flexibility and separation performance of the membrane are not adversely affected.
- the thickness of the membrane produced can be influenced by the concentration of the polymer electrolyte solution used, the layer thickness of the applied polymer solution, and the thickness of the carrier material used, with a membrane which is as thin as possible being preferred for increasing the proton conductivity.
- a preferred membrane thickness for use as a fuel cell membrane is 1 to 200 ⁇ m and is chosen such that the highest possible proton conductivity results with adequate mechanical strength and diffusion barrier effect.
- a further subject of the present application are therefore membranes, films, composite or composite materials comprising at least one siloxane containing phosphonic acid groups and / or siloxane containing at least one phosphonic acid ester or alkyl ester group or a mixture according to the invention comprising at least one siloxane containing phosphonic acid groups according to the invention and / or at least one phosphonic acid silyl ester or alkyl ester group-containing siloxane and at least one further polymer.
- Preferred phosphonic acid-containing oligomeric or polymeric siloxanes and oligomeric or polymeric siloxanes containing phosphonic acid silyl or alkyl ester groups and preferred further polymers are mentioned above.
- membranes can be used in fuel cells and as membranes in separation technology, preferably as selectively permeable membranes in the desalination, wastewater treatment, dialysis and in the ion extraction and retention.
- a further subject matter of the present invention is a fuel cell containing at least one membrane according to the invention or at least one siloxane containing phosphonic acid groups according to the invention and / or at least one siloxane containing phosphonic acid silyl ester or alkyl ester groups or mixtures according to the present invention.
- the present invention relates to the use of the membranes according to the invention in fuel cells.
- a further intended use of the phosphonic acid polyelectrolytes according to the invention is the swelling reduction of aromatic polyphosphonic acid and polyelectrolyte-polyphosphonic acid blend membranes via ionically crosslinking in situ formation of polyvalent metal polyphosphonates, eg Zircon (IV) polyphosphonates, by the action of metal salt solutions of polyvalent metals, eg. As Zr (IV) salt solutions such as aqueous zirconyl chloride, on such membranes.
- membranes of the phosphonic acid polyelectrolytes according to the invention ie the phosphonic acid-containing oligo- or polymeric siloxanes containing units of the formula I and / or the phosphonic acid silyl esters or alkylester phenomenon containing siloxanes or mixtures with other polymers
- aqueous salt solutions of polyvalent metals eg Zr (IV) salt solutions, in particular ZrOCb solutions
- a further subject of the present invention is therefore the use of the phosphonic acid-containing oligomeric or polymeric siloxanes containing units of the formula I and / or the phosphonic acid silylesters or alkylester groups according to the invention for swelling reduction of aromatic polyphosphonic acid and polyelectrolyte-polyphosphonic acid blend membranes via ionically crosslinking in situ formation of polyvalent metal polyphosphonates, e.g. Zirconium (IV) polyphosphonates, as well as aromatic polyphosphonic acid and polyelectrolyte-polyphosphonic acid blend membranes containing polyvalent metal polyphosphonates, e.g. Contain zirconium (IV) polyphosphonates.
- polyvalent metal polyphosphonates e.g. Zirconium (IV) polyphosphonates
- aromatic polyphosphonic acid and polyelectrolyte-polyphosphonic acid blend membranes containing polyvalent metal polyphosphonates e.g. Contain zirconium (IV) polyphosphon
- polyelectrolytes according to the invention can likewise serve as a non-migratory polyphosphonic acid component in blend membranes with basic nitrogen-containing aromatic polymers such as poly (benzimidazole) or poly (p-phenylquinoxaline).
- basic nitrogen-containing aromatic polymers such as poly (benzimidazole) or poly (p-phenylquinoxaline).
- the siloxanes having phosphonic acid groups according to the invention and / or the siloxanes containing phosphonic acid silyl ester and / or alkyl ester groups can be used to bind metal ions, preferably selected from metal ions of titanium, zinc, tin, magnesium, germanium, zirconium, aluminum, hafnium, alkaline earth metals, rhodium , Palladium, platinum, gold, silver and the actinides serve.
- the siloxanes according to the invention are used as temperature- and oxidation-resistant cation exchangers for extraction and / or binding of the abovementioned metal ions.
- the siloxanes according to the invention can form complexes with metal ions, either via the phosphonic acid group of the siloxanes according to the invention or via the siloxane skeleton and thus for supporting catalytically active metal derivatives Example used in organic synthesis.
- Another area of use of the phosphonic acid-containing siloxanes according to the invention is their use as acid catalysts in organic synthesis.
- the preferred arylphosphonic acids according to the present invention are superior to siloxane types according to the present invention because of their aromatic character due to their inherently higher temperature, free radical and oxidation resistance compared to the alkylphosphonic siloxane types preparable by the process according to the prior art.
- a further subject matter of the present invention is the use of the oligomeric or polymeric siloxanes containing phosphonic acid groups according to the invention and / or of the oligomeric or polymeric siloxanes containing phosphonic acid silyl ester and / or alkyl ester groups or of the novel mixtures for contact mediation or improvement between materials from the group consisting of the following classes: metals, plastics and other materials, eg Apatites, wherein the contact brokerage or improvement between several materials of a single class of substances and / or materials of several of these classes can be done together. For example, for contact mediation or improvement between apatite surfaces of teeth or bone and plastic or metal implants.
- Another object of the present invention is the use of the inventive phosphonic acid-containing oligomeric or polymeric siloxanes and / or the inventive Phosphonklasilylester- and / or alkylester groups containing oligomeric or polymeric siloxanes or mixtures of the invention in or as corrosion-inhibiting (n) metal coatings or their use as an adhesion-promoting layer between metal surfaces and other materials.
- distilled water 1000 ml of distilled water are placed in a 2 l three-necked flask with KPG stirrer, reflux condenser and connected gas washing bottle.
- PTCS phenyltrichlorosilane
- the benzene phase is transferred to a 1 l one-necked flask and 16.6 ml of a 40% methanolic trimethylbenzylammonium hydroxide are added, with the clear solution immediately precipitating out into a crystalline white precipitate.
- the amount of precipitate increases in the subsequent refluxing in the 90 ° C hot oil bath visibly. After 4 h, the oil bath is removed, the batch is kept for 96 h without stirring at room temperature and then refluxed again at 90 ° C for 24 h.
- the product obtained is henceforth designated phT8. It is insoluble in tetrahydrofuran, acetone, dimethyl sulfoxide, methanol, i-propanol, chloroform, 1,1,2,2-tetrachloroethane and acetonitrile.
- the product is soluble with heating to about 75 ° C in N-methylpyrrolidone, N, N-dimethylacetamide and N, N-dimethylformamide, and by heating to 150 ° C in 1, 3,5-trichlorobenzene, benzophenone, diphenyl sulfone and diphenyl - lether.
- pho-phT8-1 From the product obtained, which is referred to as pho-phT8-1 below, a 1 H spectrum is recorded. Weigh out pho-phT8-1: 5.4 g
- Bromine content determination Oxidative digestion of pho-phT8-1 with KNO3 / Na ⁇ 2 and titration with AgNO 3 solution and back-titration with FeSCN solution gives a bromine content of 5.4% by weight.
- the approach will be sky blue and by the nitrogen flow will be about 3 ml a liquid smoking in the air (identified spectroscopically as trimethylbromosilane) into the cold trap. After about 2 h significant increase in viscosity is observed. The mixture is heated to 180 ° C for the remainder of the reaction time from 8 h. The sky-blue, gelled mass is worked up as described under pho-phT8-1, wherein the final precipitation in water at the same time the silyl ester group is cleaved off.
- Bromine content determination pho-phT8-1.1 Oxidative digestion of pho-phT8-1.1 with KNO 3 / Na ⁇ 2 and titration with AgNCv solution and back-titration with FeSCN solution gives a bromine content of 3.4% by weight.
- Example 1.2 Preparation of a hybrid phosphonic acid based on polyhedral octaphenylsilsesquisiloxane POSS
- Bromine content determination pho-phT8-1.2 Oxidative digestion of pho-phT8-1.2 with KNO 3 / NaO 2 and titration with AgNO 3 solution and back-titration with FeSCN solution gives a bromine content of 3.8% by weight.
- the MALDI-TOF sample was prepared by dissolving br-phT8-2, alpha-cyano-hydroxycinnamic acid and lithium chloride in tetrahydrofuran. 1669.71 m / z; relative intensity 1500 1749.58 m / z; relative intensity 3750 1827.58 m / z; relative intensity 5250 1907.34 m / z; relative intensity 3000 1987.27 m / z; relative intensity 1000
- Bromine content determination pho-phT8-2 Oxidative digestion of pho-phT8-2 with KNO 3 / Na ⁇ 2 and titration with AgNO ß solution and back-titration with FeSCN solution gives a bromine content of 2.8 wt .-%.
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EP07704553A EP1987044A1 (de) | 2006-02-17 | 2007-02-13 | Oligo- und polymere arylphosphonsäure-substituierte siloxane |
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EP07704553A EP1987044A1 (de) | 2006-02-17 | 2007-02-13 | Oligo- und polymere arylphosphonsäure-substituierte siloxane |
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US (1) | US20090048395A1 (ru) |
EP (1) | EP1987044A1 (ru) |
JP (1) | JP2009526888A (ru) |
KR (1) | KR20080094717A (ru) |
CN (1) | CN101421283A (ru) |
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WO (1) | WO2007093588A1 (ru) |
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JP4858955B2 (ja) * | 2006-03-31 | 2012-01-18 | 独立行政法人産業技術総合研究所 | 架橋型高分子電解質膜 |
US8637325B2 (en) * | 2009-02-16 | 2014-01-28 | University Of Wyoming | Method and apparatus for pyrolysis-induced cleavage in peptides and proteins |
US7915436B2 (en) * | 2008-11-03 | 2011-03-29 | 3M Innovative Properties Company | Phosphorus-containing silsesquioxane derivatives as flame retardants |
FR2974091B1 (fr) * | 2011-04-12 | 2013-05-24 | Commissariat Energie Atomique | Copolymeres phosphones specifiques et particules inorganiques greffees par lesdits copolymeres |
KR101968641B1 (ko) * | 2012-01-27 | 2019-04-12 | 삼성전자주식회사 | 화합물, 이를 포함하는 조성물, 이로부터 형성된 복합체, 이를 이용한 전극과 복합막 및 이를 채용한 연료전지 |
FR2992321B1 (fr) * | 2012-06-22 | 2015-06-05 | Arkema France | Procede de fabrication d'un materiau fibreux pre-impregne de polymere thermoplastique. |
CN103408760B (zh) * | 2013-08-16 | 2015-09-30 | 武汉理工大学 | 一种中温质子交换膜材料及其制备方法及使用该材料制备的燃料电池 |
US9868902B2 (en) * | 2014-07-17 | 2018-01-16 | Soulbrain Co., Ltd. | Composition for etching |
CN104900896B (zh) * | 2015-04-27 | 2017-07-11 | 武汉理工大学 | 一种二膦酸功能化有机硅高温质子导体及其制备方法 |
CN107104242B (zh) * | 2017-05-03 | 2020-01-14 | 武汉理工大学 | 一种聚硅氧烷多膦酸掺杂speek高低温通用型质子交换膜及其制备方法 |
US20220017779A1 (en) * | 2018-12-18 | 2022-01-20 | 3M Innovative Properties Company | Composition including polysiloxane phosphate or phosphonate and method of making a treated article |
TWI740542B (zh) * | 2020-06-16 | 2021-09-21 | 元智大學 | 耐高溫質子交換膜、膜電極組、燃料電池、及發電裝置 |
CN114433229B (zh) * | 2020-10-20 | 2024-01-30 | 中国石油化工股份有限公司 | 一种用于制备碳酸亚烷酯的催化剂及其制备方法和应用 |
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US6559070B1 (en) * | 2000-04-11 | 2003-05-06 | Applied Materials, Inc. | Mesoporous silica films with mobile ion gettering and accelerated processing |
JP4381636B2 (ja) * | 2001-11-05 | 2009-12-09 | 新日鐵化学株式会社 | シリコーン樹脂組成物及びシリコーン樹脂成形体 |
US7183370B2 (en) * | 2003-09-11 | 2007-02-27 | Toyota Technical Center Usa, Inc | Phosphonic-acid grafted hybrid inorganic-organic proton electrolyte membranes (PEMs) |
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- 2007-02-13 CN CNA2007800136508A patent/CN101421283A/zh active Pending
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- 2007-02-13 US US12/279,656 patent/US20090048395A1/en not_active Abandoned
- 2007-02-13 WO PCT/EP2007/051381 patent/WO2007093588A1/de active Application Filing
- 2007-02-13 EP EP07704553A patent/EP1987044A1/de not_active Withdrawn
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CN101421283A (zh) | 2009-04-29 |
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US20090048395A1 (en) | 2009-02-19 |
DE102007007451A1 (de) | 2007-09-06 |
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