EP1905072A4 - Substrates including a capping layer on electrically conductive regions - Google Patents
Substrates including a capping layer on electrically conductive regionsInfo
- Publication number
- EP1905072A4 EP1905072A4 EP06740290A EP06740290A EP1905072A4 EP 1905072 A4 EP1905072 A4 EP 1905072A4 EP 06740290 A EP06740290 A EP 06740290A EP 06740290 A EP06740290 A EP 06740290A EP 1905072 A4 EP1905072 A4 EP 1905072A4
- Authority
- EP
- European Patent Office
- Prior art keywords
- electrically conductive
- capping layer
- conductive regions
- substrates including
- substrates
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Withdrawn
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/70—Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
- H01L21/71—Manufacture of specific parts of devices defined in group H01L21/70
- H01L21/768—Applying interconnections to be used for carrying current between separate components within a device comprising conductors and dielectrics
- H01L21/76801—Applying interconnections to be used for carrying current between separate components within a device comprising conductors and dielectrics characterised by the formation and the after-treatment of the dielectrics, e.g. smoothing
- H01L21/76829—Applying interconnections to be used for carrying current between separate components within a device comprising conductors and dielectrics characterised by the formation and the after-treatment of the dielectrics, e.g. smoothing characterised by the formation of thin functional dielectric layers, e.g. dielectric etch-stop, barrier, capping or liner layers
- H01L21/76834—Applying interconnections to be used for carrying current between separate components within a device comprising conductors and dielectrics characterised by the formation and the after-treatment of the dielectrics, e.g. smoothing characterised by the formation of thin functional dielectric layers, e.g. dielectric etch-stop, barrier, capping or liner layers formation of thin insulating films on the sidewalls or on top of conductors
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y30/00—Nanotechnology for materials or surface science, e.g. nanocomposites
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/70—Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
- H01L21/71—Manufacture of specific parts of devices defined in group H01L21/70
- H01L21/768—Applying interconnections to be used for carrying current between separate components within a device comprising conductors and dielectrics
- H01L21/76801—Applying interconnections to be used for carrying current between separate components within a device comprising conductors and dielectrics characterised by the formation and the after-treatment of the dielectrics, e.g. smoothing
- H01L21/76822—Modification of the material of dielectric layers, e.g. grading, after-treatment to improve the stability of the layers, to increase their density etc.
- H01L21/76826—Modification of the material of dielectric layers, e.g. grading, after-treatment to improve the stability of the layers, to increase their density etc. by contacting the layer with gases, liquids or plasmas
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/70—Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
- H01L21/71—Manufacture of specific parts of devices defined in group H01L21/70
- H01L21/768—Applying interconnections to be used for carrying current between separate components within a device comprising conductors and dielectrics
- H01L21/76801—Applying interconnections to be used for carrying current between separate components within a device comprising conductors and dielectrics characterised by the formation and the after-treatment of the dielectrics, e.g. smoothing
- H01L21/76829—Applying interconnections to be used for carrying current between separate components within a device comprising conductors and dielectrics characterised by the formation and the after-treatment of the dielectrics, e.g. smoothing characterised by the formation of thin functional dielectric layers, e.g. dielectric etch-stop, barrier, capping or liner layers
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/70—Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
- H01L21/71—Manufacture of specific parts of devices defined in group H01L21/70
- H01L21/768—Applying interconnections to be used for carrying current between separate components within a device comprising conductors and dielectrics
- H01L21/76838—Applying interconnections to be used for carrying current between separate components within a device comprising conductors and dielectrics characterised by the formation and the after-treatment of the conductors
- H01L21/76841—Barrier, adhesion or liner layers
- H01L21/76843—Barrier, adhesion or liner layers formed in openings in a dielectric
- H01L21/76849—Barrier, adhesion or liner layers formed in openings in a dielectric the layer being positioned on top of the main fill metal
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US11/132,817 US7390739B2 (en) | 2005-05-18 | 2005-05-18 | Formation of a masking layer on a dielectric region to facilitate formation of a capping layer on electrically conductive regions separated by the dielectric region |
US11/132,841 US7749881B2 (en) | 2005-05-18 | 2005-05-18 | Formation of a masking layer on a dielectric region to facilitate formation of a capping layer on electrically conductive regions separated by the dielectric region |
PCT/US2006/012098 WO2006124131A2 (en) | 2005-05-18 | 2006-04-03 | Substrates including a capping layer on electrically conductive regions |
Publications (2)
Publication Number | Publication Date |
---|---|
EP1905072A2 EP1905072A2 (en) | 2008-04-02 |
EP1905072A4 true EP1905072A4 (en) | 2010-11-03 |
Family
ID=37431723
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
EP06740290A Withdrawn EP1905072A4 (en) | 2005-05-18 | 2006-04-03 | Substrates including a capping layer on electrically conductive regions |
Country Status (3)
Country | Link |
---|---|
EP (1) | EP1905072A4 (en) |
TW (1) | TWI329349B (en) |
WO (1) | WO2006124131A2 (en) |
Families Citing this family (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US9018516B2 (en) | 2012-12-19 | 2015-04-28 | Sunpower Corporation | Solar cell with silicon oxynitride dielectric layer |
US10176984B2 (en) * | 2017-02-14 | 2019-01-08 | Lam Research Corporation | Selective deposition of silicon oxide |
Citations (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6323131B1 (en) * | 1998-06-13 | 2001-11-27 | Agere Systems Guardian Corp. | Passivated copper surfaces |
US20040087176A1 (en) * | 2002-11-05 | 2004-05-06 | International Business Machines Corporation | Nonlithographic method to produce self-aligned mask, articles produced by same and compositions for same |
US20040213971A1 (en) * | 2002-11-05 | 2004-10-28 | International Business Machines Corporation | Nonlithographic method to produce masks by selective reaction, articles produced, and composition for same |
US20040248409A1 (en) * | 2003-06-03 | 2004-12-09 | Applied Materials, Inc. | Selective metal encapsulation schemes |
US20040250755A1 (en) * | 2003-06-16 | 2004-12-16 | Ivanov Igor C. | Microelectronic fabrication system components and method for processing a wafer using such components |
US20050001317A1 (en) * | 2003-06-13 | 2005-01-06 | Ramanath Ganapathiraman | Polyelectrolyte nanolayers as diffusion barriers in semiconductor devices |
Family Cites Families (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US7063164B2 (en) * | 2004-04-01 | 2006-06-20 | Schlumberger Technology Corporation | System and method to seal by bringing the wall of a wellbore into sealing contact with a tubing |
-
2006
- 2006-04-03 WO PCT/US2006/012098 patent/WO2006124131A2/en active Application Filing
- 2006-04-03 EP EP06740290A patent/EP1905072A4/en not_active Withdrawn
- 2006-04-06 TW TW95112178A patent/TWI329349B/en not_active IP Right Cessation
Patent Citations (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6323131B1 (en) * | 1998-06-13 | 2001-11-27 | Agere Systems Guardian Corp. | Passivated copper surfaces |
US20040087176A1 (en) * | 2002-11-05 | 2004-05-06 | International Business Machines Corporation | Nonlithographic method to produce self-aligned mask, articles produced by same and compositions for same |
US20040213971A1 (en) * | 2002-11-05 | 2004-10-28 | International Business Machines Corporation | Nonlithographic method to produce masks by selective reaction, articles produced, and composition for same |
US20040248409A1 (en) * | 2003-06-03 | 2004-12-09 | Applied Materials, Inc. | Selective metal encapsulation schemes |
US20050001317A1 (en) * | 2003-06-13 | 2005-01-06 | Ramanath Ganapathiraman | Polyelectrolyte nanolayers as diffusion barriers in semiconductor devices |
US20040250755A1 (en) * | 2003-06-16 | 2004-12-16 | Ivanov Igor C. | Microelectronic fabrication system components and method for processing a wafer using such components |
Also Published As
Publication number | Publication date |
---|---|
TWI329349B (en) | 2010-08-21 |
WO2006124131A3 (en) | 2009-04-16 |
TW200731459A (en) | 2007-08-16 |
EP1905072A2 (en) | 2008-04-02 |
WO2006124131A2 (en) | 2006-11-23 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
PUAI | Public reference made under article 153(3) epc to a published international application that has entered the european phase |
Free format text: ORIGINAL CODE: 0009012 |
|
17P | Request for examination filed |
Effective date: 20080118 |
|
AK | Designated contracting states |
Kind code of ref document: A2 Designated state(s): AT BE BG CH CY CZ DE DK EE ES FI FR GB GR HU IE IS IT LI LT LU LV MC NL PL PT RO SE SI SK TR |
|
AX | Request for extension of the european patent |
Extension state: AL BA HR MK YU |
|
DAX | Request for extension of the european patent (deleted) | ||
R17D | Deferred search report published (corrected) |
Effective date: 20090416 |
|
A4 | Supplementary search report drawn up and despatched |
Effective date: 20101005 |
|
RIC1 | Information provided on ipc code assigned before grant |
Ipc: H01L 21/76 20060101AFI20061206BHEP Ipc: H01L 21/768 20060101ALI20100929BHEP Ipc: H01L 29/00 20060101ALI20100929BHEP |
|
RAP1 | Party data changed (applicant data changed or rights of an application transferred) |
Owner name: INTERMOLECULAR, INC. |
|
STAA | Information on the status of an ep patent application or granted ep patent |
Free format text: STATUS: THE APPLICATION HAS BEEN WITHDRAWN |
|
17Q | First examination report despatched |
Effective date: 20171010 |
|
18W | Application withdrawn |
Effective date: 20171023 |