EP1436866A4 - LASER WITH HIGH REPLACEMENT RATE WITH IMPROVED ELECTRODES - Google Patents

LASER WITH HIGH REPLACEMENT RATE WITH IMPROVED ELECTRODES

Info

Publication number
EP1436866A4
EP1436866A4 EP02759577A EP02759577A EP1436866A4 EP 1436866 A4 EP1436866 A4 EP 1436866A4 EP 02759577 A EP02759577 A EP 02759577A EP 02759577 A EP02759577 A EP 02759577A EP 1436866 A4 EP1436866 A4 EP 1436866A4
Authority
EP
European Patent Office
Prior art keywords
rate laser
improved electrodes
high rep
rep
electrodes
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
EP02759577A
Other languages
German (de)
English (en)
French (fr)
Other versions
EP1436866A2 (en
Inventor
Richard G Morton
Timothy S Dyer
Thomas D Steiger
Richard C Ujazdowski
Tom A Watson
Bryan G Moosman
Alex P Ivaschenko
Walter D Gillespie
Curtis L Rettig
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Cymer LLC
Original Assignee
Cymer Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from US09/953,026 external-priority patent/US6711202B2/en
Priority claimed from US10/081,589 external-priority patent/US20020154670A1/en
Priority claimed from US10/104,502 external-priority patent/US6690706B2/en
Application filed by Cymer Inc filed Critical Cymer Inc
Publication of EP1436866A2 publication Critical patent/EP1436866A2/en
Publication of EP1436866A4 publication Critical patent/EP1436866A4/en
Withdrawn legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/02—Constructional details
    • H01S3/03—Constructional details of gas laser discharge tubes
    • H01S3/038—Electrodes, e.g. special shape, configuration or composition
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/14—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range characterised by the material used as the active medium
    • H01S3/22—Gases
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/02—Constructional details
    • H01S3/03—Constructional details of gas laser discharge tubes
    • H01S3/036—Means for obtaining or maintaining the desired gas pressure within the tube, e.g. by gettering, replenishing; Means for circulating the gas, e.g. for equalising the pressure within the tube
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/02—Constructional details
    • H01S3/03—Constructional details of gas laser discharge tubes
    • H01S3/038—Electrodes, e.g. special shape, configuration or composition
    • H01S3/0381—Anodes or particular adaptations thereof
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/02—Constructional details
    • H01S3/03—Constructional details of gas laser discharge tubes
    • H01S3/038—Electrodes, e.g. special shape, configuration or composition
    • H01S3/0388—Compositions, materials or coatings
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/09—Processes or apparatus for excitation, e.g. pumping
    • H01S3/097—Processes or apparatus for excitation, e.g. pumping by gas discharge of a gas laser
    • H01S3/09702—Details of the driver electronics and electric discharge circuits
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/14—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range characterised by the material used as the active medium
    • H01S3/22—Gases
    • H01S3/223—Gases the active gas being polyatomic, i.e. containing two or more atoms
    • H01S3/225—Gases the active gas being polyatomic, i.e. containing two or more atoms comprising an excimer or exciplex

Landscapes

  • Physics & Mathematics (AREA)
  • Electromagnetism (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Optics & Photonics (AREA)
  • Lasers (AREA)
EP02759577A 2001-09-13 2002-09-06 LASER WITH HIGH REPLACEMENT RATE WITH IMPROVED ELECTRODES Withdrawn EP1436866A4 (en)

Applications Claiming Priority (7)

Application Number Priority Date Filing Date Title
US953026 2001-09-13
US09/953,026 US6711202B2 (en) 2000-06-09 2001-09-13 Discharge laser with porous insulating layer covering anode discharge surface
US81589 2002-02-21
US10/081,589 US20020154670A1 (en) 2000-06-09 2002-02-21 Electric discharge laser with two-material electrodes
US10/104,502 US6690706B2 (en) 2000-06-09 2002-03-22 High rep-rate laser with improved electrodes
US104502 2002-03-22
PCT/US2002/028463 WO2003023910A2 (en) 2001-09-13 2002-09-06 High rep-rate laser with improved electrodes

Publications (2)

Publication Number Publication Date
EP1436866A2 EP1436866A2 (en) 2004-07-14
EP1436866A4 true EP1436866A4 (en) 2009-10-28

Family

ID=27374022

Family Applications (1)

Application Number Title Priority Date Filing Date
EP02759577A Withdrawn EP1436866A4 (en) 2001-09-13 2002-09-06 LASER WITH HIGH REPLACEMENT RATE WITH IMPROVED ELECTRODES

Country Status (4)

Country Link
EP (1) EP1436866A4 (ko)
JP (1) JP3971382B2 (ko)
KR (1) KR100940782B1 (ko)
WO (1) WO2003023910A2 (ko)

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7230965B2 (en) * 2001-02-01 2007-06-12 Cymer, Inc. Anodes for fluorine gas discharge lasers
US7095774B2 (en) * 2001-09-13 2006-08-22 Cymer, Inc. Cathodes for fluorine gas discharge lasers
US7339973B2 (en) * 2001-09-13 2008-03-04 Cymer, Inc. Electrodes for fluorine gas discharge lasers
US7301980B2 (en) * 2002-03-22 2007-11-27 Cymer, Inc. Halogen gas discharge laser electrodes
EP2259390A1 (en) * 2003-07-29 2010-12-08 Cymer, Inc. Gas discharge laser electrode
JP4579002B2 (ja) * 2005-02-21 2010-11-10 株式会社小松製作所 パルス発振型放電励起レーザ装置
US7542502B2 (en) * 2005-09-27 2009-06-02 Cymer, Inc. Thermal-expansion tolerant, preionizer electrode for a gas discharge laser
WO2015125286A1 (ja) * 2014-02-21 2015-08-27 ギガフォトン株式会社 レーザチャンバ
CN111587471B (zh) 2018-01-11 2024-04-05 西默有限公司 用于放电室的电极
CN112210775B (zh) * 2020-10-09 2022-12-02 中国科学院微电子研究所 一种零件涂层制备装置及零件涂层制备方法、终端装置

Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6348874A (ja) * 1986-08-19 1988-03-01 Matsushita Electric Ind Co Ltd レ−ザ装置
DE4401892A1 (de) * 1994-01-24 1995-07-27 Lambda Physik Forschung Elektrode für einen Gasentladungslaser
JPH1168196A (ja) * 1997-08-26 1999-03-09 Nissin Electric Co Ltd ガスレーザ装置
WO1999060679A1 (en) * 1998-05-20 1999-11-25 Cymer, Inc. Reliable modular production quality narrow-band high rep rate f2 laser
WO2001097344A1 (en) * 2000-06-09 2001-12-20 Cymer, Inc. Flow shaping electrode with erosion pad for gas discharge laser
WO2001097345A1 (en) * 2000-06-09 2001-12-20 Cymer, Inc. Gas discharge laser long life electrodes
WO2002037626A1 (en) * 2000-11-01 2002-05-10 Cymer, Inc. Anode with porous insulating layer for discharge lasers

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH04218985A (ja) * 1990-07-06 1992-08-10 Mitsubishi Electric Corp エキシマレーザ装置
WO1992016036A1 (en) * 1991-03-06 1992-09-17 L'air Liquide, Societe Anonyme Pour L'etude Et L'exploitation Des Procedes Georges Claude A method for extending the gas lifetime of excimer lasers
DE4113241C2 (de) * 1991-04-23 1994-08-11 Lambda Physik Forschung Gepulster Gasentladungslaser
US5359620A (en) * 1992-11-12 1994-10-25 Cymer Laser Technologies Apparatus for, and method of, maintaining a clean window in a laser
US5377215A (en) * 1992-11-13 1994-12-27 Cymer Laser Technologies Excimer laser
US5763930A (en) * 1997-05-12 1998-06-09 Cymer, Inc. Plasma focus high energy photon source
US5818865A (en) * 1997-05-16 1998-10-06 Cymer, Inc. Compact excimer laser insulator with integral pre-ionizer

Patent Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6348874A (ja) * 1986-08-19 1988-03-01 Matsushita Electric Ind Co Ltd レ−ザ装置
DE4401892A1 (de) * 1994-01-24 1995-07-27 Lambda Physik Forschung Elektrode für einen Gasentladungslaser
JPH1168196A (ja) * 1997-08-26 1999-03-09 Nissin Electric Co Ltd ガスレーザ装置
WO1999060679A1 (en) * 1998-05-20 1999-11-25 Cymer, Inc. Reliable modular production quality narrow-band high rep rate f2 laser
WO2001097344A1 (en) * 2000-06-09 2001-12-20 Cymer, Inc. Flow shaping electrode with erosion pad for gas discharge laser
WO2001097345A1 (en) * 2000-06-09 2001-12-20 Cymer, Inc. Gas discharge laser long life electrodes
WO2002037626A1 (en) * 2000-11-01 2002-05-10 Cymer, Inc. Anode with porous insulating layer for discharge lasers

Also Published As

Publication number Publication date
KR20040031790A (ko) 2004-04-13
KR100940782B1 (ko) 2010-02-11
WO2003023910A2 (en) 2003-03-20
JP3971382B2 (ja) 2007-09-05
WO2003023910A3 (en) 2003-05-30
EP1436866A2 (en) 2004-07-14
JP2005503027A (ja) 2005-01-27

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Legal Events

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PUAI Public reference made under article 153(3) epc to a published international application that has entered the european phase

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AX Request for extension of the european patent

Extension state: AL LT LV MK RO SI

RIN1 Information on inventor provided before grant (corrected)

Inventor name: GILLESPIE, WALTER, D

Inventor name: UJAZDOWSKI, RICHARD, C.

Inventor name: MORTON, RICHARD, G.

Inventor name: STEIGER, THOMAS, D.

Inventor name: DYER, TIMOTHY, S.

Inventor name: IVASCHENKO, ALEX, P.

Inventor name: WATSON, TOM, A.

Inventor name: MOOSMAN, BRYAN G.

Inventor name: RETTIG, CURTIS, L.

A4 Supplementary search report drawn up and despatched

Effective date: 20090924

RIC1 Information provided on ipc code assigned before grant

Ipc: H01S 3/038 20060101ALI20090918BHEP

Ipc: H01S 3/225 20060101AFI20090918BHEP

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Effective date: 20091215

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Owner name: CYMER, LLC

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Inventor name: WATSON, TOM, A.

Inventor name: IVASCHENKO, ALEX, P.

Inventor name: STEIGER, THOMAS, D.

Inventor name: MOOSMAN, BRYAN G.

Inventor name: RETTIG, CURTIS, L.

Inventor name: MORTON, RICHARD, G.

Inventor name: DYER, TIMOTHY, S.

Inventor name: UJAZDOWSKI, RICHARD, C.

Inventor name: GILLESPIE, WALTER, D

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