EP1434977A1 - Scatterometric measuring array and measuring method - Google Patents

Scatterometric measuring array and measuring method

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Publication number
EP1434977A1
EP1434977A1 EP02785122A EP02785122A EP1434977A1 EP 1434977 A1 EP1434977 A1 EP 1434977A1 EP 02785122 A EP02785122 A EP 02785122A EP 02785122 A EP02785122 A EP 02785122A EP 1434977 A1 EP1434977 A1 EP 1434977A1
Authority
EP
European Patent Office
Prior art keywords
beam
detector
characterized
sample
direction
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
EP02785122A
Other languages
German (de)
French (fr)
Inventor
Jörg BISCHOFF
Hans-Jürgen DOBSCHAL
Gunter Maschke
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Zeiss Carl Microelectronic Sys
Carl Zeiss Microelectronic Systems GmbH
Original Assignee
ZEISS CARL MICROELECTRONIC SYS
Carl Zeiss Microelectronic Systems GmbH
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority to DE10146945 priority Critical
Priority to DE2001146945 priority patent/DE10146945A1/en
Application filed by ZEISS CARL MICROELECTRONIC SYS, Carl Zeiss Microelectronic Systems GmbH filed Critical ZEISS CARL MICROELECTRONIC SYS
Priority to PCT/EP2002/010476 priority patent/WO2003029770A1/en
Publication of EP1434977A1 publication Critical patent/EP1434977A1/en
Application status is Withdrawn legal-status Critical

Links

Classifications

    • GPHYSICS
    • G01MEASURING; TESTING
    • G01JMEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRA-RED, VISIBLE OR ULTRA-VIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
    • G01J4/00Measuring polarisation of light
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01JMEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRA-RED, VISIBLE OR ULTRA-VIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
    • G01J3/00Spectrometry; Spectrophotometry; Monochromators; Measuring colours
    • G01J3/28Investigating the spectrum
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00Investigating or analysing materials by the use of optical means, i.e. using infra-red, visible or ultra-violet light
    • G01N21/17Systems in which incident light is modified in accordance with the properties of the material investigated
    • G01N21/21Polarisation-affecting properties
    • G01N21/211Ellipsometry
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00Investigating or analysing materials by the use of optical means, i.e. using infra-red, visible or ultra-violet light
    • G01N21/17Systems in which incident light is modified in accordance with the properties of the material investigated
    • G01N21/47Scattering, i.e. diffuse reflection

Abstract

The invention relates to a measuring array having an optical device into which a radiation beam (10) departing and diverging from a sample is injected for measurement and a detector (13) arranged downstream of said optical device, said detector having a plurality of detector pixels which are arranged on a plane and can be evaluated separately from one another, wherein the optical device (11) spectrally splits the diverging radiation beam (10) in a first direction crosswise to the direction of propagation of the radiation beam (10) and directs it towards the detector (13). The optical device parallelizes the radiation beam before it strikes the detector (13) in a second direction crosswise to the direction of propagation in such a manner that adjacent rays in the second direction of the radiation beam striking the detector (13) are parallel relative to one another.

Description

Scatterometric MEASURING DEVICE AND MEASURING METHOD

The invention relates to a measuring arrangement with an optical device, in which an outgoing from a sample diverging radiation beam is coupled to the measurement, and further downstream with one of the optical device detector which is arranged a plurality of in one plane and having independently evaluable detector pixels, the optical device, the diverging S transverse to the propagation direction of the beam spectrally dispersed (rahlenbündel in a first direction and articulated on the detector Further, the invention relates to a measuring method comprising the steps of:. directing a beam onto an assayed sample such that a diverging beam frets from the sample ! starts, performing a spectral decomposition of the divergent beam in a first direction transverse to the propagation direction of the diverging radiation beam and directing the spectrally dispersed beam on a detector having a plurality of i n has a plane arranged and independently evaluable detector pixels.

Such a measuring device is used for example in the optical scatterometry, wherein both photometry (measurement of the intensity of a coming of a sample radiation as a function of, for example, the exit angle and / or the wavelength) and ellipsometry (the measurement of the polarization state of one of a sample radiation coming depending on, for example, the exit angle and / or the wavelength) of the optical scatterometry method are. From the obtained measured values ​​in these methods, also referred to as an optical signature of the sample can then be pulled on the sample examined by suitable methods conclusions.

From DE 198 42 364 C 1 a measuring arrangement and a measuring method of the type mentioned in the ellipsometry are known, while the sample to be examined is imaged by means of the optical device in the detector plane for performing a spatially resolved measurement.

The object of the invention is to further develop a measuring arrangement of the type mentioned above and a measuring method of the type mentioned in such a way that can be performed quickly on a sample of a spectral and angular resolved scatterometric measurement.

The object is achieved in a measuring arrangement of the type mentioned above, that the optical device even before it hits the beam onto the detector, transversely to the direction of propagation parallelized in a second direction so that in the second direction adjacent beams of the incident on the detector beam parallel to each other. Thereby, the intensity of the beam as a function of the glancing angle and as a function of the wavelength can be simultaneously detected with a single measurement, which advantageously, the measuring time is significantly shortened.

Therefore, a particular advantage of the measuring assembly according to the invention is that angle resolved with a single measurement and spectrally resolved information can be obtained without the parts are mechanically move during the measurement. Thus, the measurement can be carried out very accurately and very quickly, which is especially in view of process controls, such as in semiconductor manufacturing, a big advantage.

extending the first and second direction is preferably perpendicular to the propagation direction, wherein it is even more particularly preferred that the first and second directions form an angle of 90 ° with each other. Thereby, it is advantageously achieved that the evaluation of the measurement data is facilitated, since in the first direction a spectral dependence is given only while present in the second direction, only an angular dependency.

It is particularly preferred that the Optikeinrϊchtung completely the beam (and therefore also in the first direction) in parallel. Characterized can be made with great accuracy the spectral decomposition that occurs in this case in particular by the parallelization, so that the measuring accuracy of the measuring arrangement is extremely high.

A particularly preferred development of the measuring arrangement of the invention is that the optical device performs the spectral dispersion such that in the first direction is a focusing in the plane of the detector pixels. Thus, the individual spectral components are side by side (or adjacent in the first direction) on the detector is focused, whereby a very high resolution for the measurement as a function of the wavelength is achieved.

More preferably a cylindrical mirror is provided in the inventive measuring arrangement for focusing. So that the desired focus can be achieved in a simple manner and without the generation of color defects. Further, the beam path can be folded by means of the cylinder mirror, so that the measuring arrangement can be realized compactly.

In particular, the optical device may be a dispersive element in the inventive measuring arrangement for the spectral decomposition, such as having a linear grating. Using this dispersive element, the desired spectral decomposition can safely be carried out only in the first direction.

Preferably the dispersive element is designed as a reflective element, such as a reflective grating. Can thereby take place a folding of the beam path, whereby the measuring arrangement is compact. A combination of the Zylinderspiegeis for focusing with the reflective, dispersive element is of particular advantage, since a two-time folding the beam path results in a very small measurement arrangement.

Further, there is an advantageous embodiment of the measuring arrangement according to the invention is that the optics for parallelizing one, two or more mirrors, in particular one, two or more spherical mirrors, comprising. Therefore, the parallelization may be performed without causing color errors are generated, which can occur with the use of refractive elements for parallelization. This leads to an improvement in the accuracy of measurement.

Further, it is also possible that the dispersive element, for example, is formed a grating spectral dispersion directly on the mirror surface of the mirror for the parallelization, so that the desired functions of the optical device can be realized with a single optical element.

If multiple mirrors are provided for the parallelization, the dispersive element may be formed on one or more of the mirror surfaces of the mirrors, so that the space requirement of the measuring arrangement is less.

In an advantageous further development of the measuring arrangement according to the invention, the optics system includes a first optical module for the parallelization of the coupled beam and a downstream second optical module to the first optical module for the spectral decomposition. Thus, it is possible (namely, the parallelism and the spectral resolution) to carry out the different optical functions by separate optical modules, which can be optimized accurately to their objects, so that the measuring arrangement is particularly suitable for high-precision measurements. It is particularly advantageous that the parallelization is carried out before the spectral division, since then the parallelization without the production of unwanted color errors easily be realized (for example, by the exclusive use of mirror elements for parallelizing) is.

Preferably, the detector pixels are arranged in rows and columns and carried out the spectral decomposition in the column direction, whereas the parallelism is conducted in the row direction. Characterized the evaluation of the detector pixels is particularly simple, since each detector pixel of a known wavelength and a known angle of reflection is assigned. Of course, the spectral decomposition can also take place in the row direction. In this case, the parallelization is performed in the column direction.

Further, in the inventive measuring arrangement, a micro polarizing filter may be disposed upstream of the detector, which comprises a plurality of pixel groups each having at least two (preferably three) ■■ Analysatorenpixel for ellipsometry with different principal axis orientation, and a transparent pixel for photometry have. In particular, each detector pixels is exactly one pixel of the pixel groups assigned. In this case, even an ellipsometric measurement can be simultaneously carried out in addition to the photometric measurement, can be obtained by means of a single measuring process also in the ellipsometric measuring angle-resolved and spectrally resolved information. Thus can be detected a plurality of different measurements by means of a single measuring operation, whereby a very accurate and quick measurement is made possible.

Furthermore, an illumination unit may be provided in the inventive measuring arrangement which produces a (preferably converging) beam bundle for illuminating the sample under investigation and is guided on this such that a divergent beam of rays emanating from the sample, which is then coupled into the optical device for examining , This provides a very compact measuring device, with which the sample can be illuminated the same in a suitable manner.

The illumination unit may be arranged relative to the optical device as a function of the test sample that is injected through the sample, reflected or transmitted light or radiation as a diverging bundle of rays in the optical device. So you can always choose the configuration that is best suited for the specific sample. it is also possible to arrange the illumination arm, that in the optical device only from the sample radiation coming one or more predetermined orders of diffraction, it is provided that occur coupled. Alternatively, of course, the optical device can be arranged such that only the desired radiation is coupled.

If the grating vector of the to be assayed sample portion (the grating vector indicates the direction of the periodicity of the grating) in the plane of incidence (this is the axis of the illumination arm and the axis of the measuring arm having the optical device and the detector determined) is located, are possibly occurring also diffraction orders in the plane of incidence. However, when the grating vector no longer lies in the plane of incidence, the so-called conical diffraction takes place, in which all the diffraction peaks with the exception of the zero diffraction order (direct reflection) lie on an arc perpendicular to the plane of incidence. By a suitable positioning of the sample (for example by turning) can thus be ensured in a simple manner that only the direct reflex is coupled into the optical device, and thus detected. Of course you can also rotate the entire measuring arrangement to the sample normal to produce the desired conical diffraction.

The object is achieved by the inventive measuring method that in addition to the measuring method of the type mentioned above nor the diverging radiation beam before it impinges on the detector, is made parallel in a second direction transverse to the propagation direction so that the adjacent in the second direction rays of parallel to each other on the detector impinging beam. Thus may be performed angularly resolved and spectrally resolved photometric measurement using a single measurement operation, without causing parts must be moved mechanically. This increases both the accuracy and the speed of measurement.

A particular embodiment of the measuring method according to the invention is that only a part of the detector pixels of the detector are evaluated as a function of the test sample. Thereby, the measurement can be speeded up, since the detector pixels whose information is less meaningful, are not considered, so that an undesired slowing of the measurement method can be prevented. As a result, measuring method according to the invention is faster and even in this case has a very high accuracy. Also by the rapid and optimal measurement of different sample types is possible.

Further, in the inventive measuring method, a (preferably converging) beam having a defined polarization state can be directed onto the sample, in which case the light which impinges on a part of the detector pixels, is guided by analyzers, while the light incident on the remainder of the detector pixels, not is passed through the analyzers. Characterized a combined ellipsometric and spectrophotometric measurement is possible, wherein both measurements in turn angularly resolved and can be spectrally resolved by means of a single measuring process. Thus, a large number of measured values ​​are detected very quickly, resulting conclusions on the desired parameters of the test sample can be drawn with high accuracy.

In the inventive method, the beam is focused onto the sample and then the light reflected from the sample or measured transmitted beam. the size of the samples to be analyzed spot can then be set via the focusing or defocusing also possible of the incident beam.

The invention is explained below by way of example with reference to the drawings in more detail. Show it:

FIG. 1 shows a schematic construction of a measuring arrangement according to the invention; 2 is a perspective view showing the structure of the measuring arm of the measuring arrangement shown in Fig. 1.

Figure 3 is a side view of the measuring arm of Fig. 2.

Fig. 4 is a view of the detector of the measuring arm, and

Fig. 5 is an exploded view of a detail of the arrangement of detector and micro polarizing filter.

In Fig. 1 shows the structure of a measuring arrangement according to the invention for a combined angle-resolved and spectral reflectance photometry is shown schematically. Preferably, with the measuring arrangement also simultaneously an angle-resolved and spectral ellipsometry, as will be described below in connection with FIG. 5, are performed.

The measuring arrangement comprises an illumination arm 1 and a measuring arm 2. The illumination unit 1 includes a broadband light source 3 that emits, for example, radiation in the wavelength range of 250 to 700 nm, a light source 3 downstream collimator 4 which produces a parallel beam 5, to which a is acted upon illumination optics. 6 , If desired, a polarizer 7 are inserted (as indicated by the double arrow A), so that the illumination optics 6 is subjected to polarized light in this case, between the collimator 4 and the illumination optics. 6

The illumination optics 6 generates a converging beam 8 with which a sample to be examined is illuminated. 9 The opening angle θ of the beam 8 in the plane of incidence (here the plane of the drawing) is approximately 40 ° whereas the opening angle of the beam 8 in a plane preferably perpendicular to the plane of incidence is smaller (for example 10 ° to 25 °), but of course the same value as the opening angle θ may have. The illumination unit 1 is tilted by about 50 ° (angle) relative to the sample normal N such that with the beam 8 in the plane of incidence an incident angle range of 10 ° to 60 ° is covered. As is apparent from Fig. 1, the two arms 1, 2 are arranged symmetrically to the sample normal N.

The converging radiation beam 8, incident on the sample 9 is subject to interaction with this (it is diffracted, for example, in a periodic structure), and thereby an outgoing from the sample 9, a diverging bundle of rays is generated, from which the drawn diverging radiation beam 10 in the measurement arm is coupled. 2 The measuring arm 2 is so designed and arranged that the diverging radiation beam 10 corresponds to the beam that, in a pure specular reflection (here essentially zero-order diffraction) would be generated. Thus, the opening angle φ of the beam 10 also is about 40 ° in the plane of incidence, so that be in the plane of incidence, the angle of reflection of the beams of the diverging beam 10 10 ° to 60 °. The propagation direction C of the beam 10 is the direction of propagation of the center beam (which is the beam having the angle of 35 °). With this arrangement, diffraction effects are detected zero-order mainly from which can be concluded then the parameters of the sample under investigation, the structure (for example, grating) is usually known in advance.

In particular, the sample 9, and thus the periodic structure to be examined of the sample 9 can be oriented such that the grating vector of the periodic structure is not in the plane of incidence. Then the conical diffraction occurs in only the zero diffraction order lies in the plane of incidence. In this way, can easily be achieved that only the zero diffraction order is evaluated.

The diverging radiation beam 10 is coupled into an optical device 11 of the measuring arm 2, wherein in the optical device 11, the diverging radiation beam 10 on the one hand so parallelization and is decomposed on the other hand perpendicular to the plane so spectrally that a failing radiation beam 12 is generated (the exact operation of the optical device 11 is described below in more detail). The radiation beam 12 thus formed is then directed to a two-dimensional detector 13 which comprises a plurality of spaced rows and columns detector pixels that can be independently evaluated from each other or read. In the embodiment described here, a CCD chip is used. If desired, between the optical device 11 and the detector 13 may be a micro polarizing filter 14 which is described in detail later, is inserted (as indicated by the double arrow B).

In FIGS. 2 and 3, an embodiment of the measuring arm 2 is shown, in Fig. 3, the plane of incidence is the plane of the drawing.

The optical device 11 includes a diaphragm 15 (shown only in FIG. 3) that limits the opening angle φ of the light coupled into the optical device 11 radiation beam 10. This is followed by a concave, spherical mirror 16 and a convex, spherical mirror 17 with which the diverging radiation beam 10 is fully parallelized so that both in the drawing plane of Fig. 3 adjacent rays of the collimated beam 18 as well as in a plane perpendicular to the drawing plane extend mutually adjacent rays of the collimated beam 18 in parallel. Due to the parallelization of the position of each extending in the plane of the drawing of Fig. 3 the beam in the beam 18 is dictated by the angle of reflection on the sample 9. Thus, the beam 19 is located with the smallest angle of δ1 (= 10 °) in the collimated radiation beam 18 on the far left, while the beam 20 with the largest exit angle δ2 (= 60 °) extends collimated radiation beam 18 on the right. The same applies to the position of the beams in planes which are parallel to the plane of the drawing.

The two mirrors 16, 17 thus cause the loss angle δ of the beams in the diverging radiation beam 10 to a position in the parallel beam bundle 18 is implemented. The diverging beam is thus also in a first direction transverse to the propagation direction C parallelized (the direction of the central ray) (in the drawing plane of Fig. 3).

As can be seen from Fig 2 and 3., The parallelized beam is focused on a reflection grating 21 18. The reflection grating 21 is so constructed and arranged that only perpendicular to the plane of Fig. 3 (second direction) a spectral decomposition takes place. Thus, going from the grid 21 for each outgoing angle δ from each parallel beam bundle of a wavelength, wherein the angle of the parallel ray pencils having different values ​​depending on the wavelength.

This parallel beam bundle impinge on a cylinder mirror 22 and are focused by means of this only in the direction of the spectral decomposition on the detector. 13 The detector 13, which is shown schematically in Fig. 4 and the plurality of spaced rows and columns, individually readable photoelements (detector pixels) comprises 23 is so arranged in the measuring arm 2 that the spectral resolution in the column direction (arrow Y) takes place and the reaction of the loss angle δ of the diverging beam 10 in the direction of the row (arrow X). The optical device 11 thus causes an image of the sample to infinity (the detector level is not conjugated to the sample plane), the spectral dispersion in the detector plane is present. With the detector 13 by an optical signature of the analyzed sample portion is detected, wherein in the row direction (X) an angular resolution and in the column direction (Y) is a wavelength resolution is carried out. Therefore, a measurement of the intensity can δ as a function of the glancing angle and are carried out in dependence on the wavelength λ by the inventive measuring arm 2 simultaneously.

The distances between the individual optical elements 16, 17, 21, 22 and 13 of the measuring arm 2 to each other and the radii of the mirrors 16, 17, 22 are shown in the following Table 1, wherein the plane of the drawing of Fig. 3 the meridional corresponds and the sagittal plane perpendicular is the meridional:

Table 1

Optical elements spacing (mm) optical element radius (mm)

9 -16 68.13 16 54.60 (spherical, concave)

16 - 17 27,00 17 34,70 (spherical, convex)

17-21 70.00 22 103.03 (sagittal radius concave)

21 - 22 50.00

22-13 50.00

The elements of the measuring arm are so arranged relative to each other that the following occur deflection angle (difference between the incoming and reflected beam) according to the guide beam principle. When lead spray principle of one member leaving the apex beam is used (or mid-stream of the element leaving beam) as an input reference beam for the next component. table 2

Optical element deflection angle (°)

16 57.43 deflection only in the meridional direction 17 110.00 deflection only in the meridional direction 22 20 deflection only in a sagittal direction

The grating 23 is a planar linear grating with a grating frequency of 500 lines / mm (a line is a complete structure period) and is arranged so that the angle of incidence at the grating relative to the grating normal 11 is 824 °. The deflection angle (in the sagittal direction) for a beam of wavelength of 380.91 nm is 12.652 °. The listed in Table 2. deflection angle of 20 ° at the cylinder mirror 22 is also related to the wavelength of 380.91 nm. The beam at this wavelength, which is reflected at the Zylinderspeigel 22, is perpendicularly incident on the detector. 13

Because in the measuring arm 3 first parallelization by means of the two mirrors 16 and 17 and thus performed without the use of refractive elements, contact advantageous in this parallelization no color errors.

The illumination optics 6 of the illumination arm 1 can in an identical manner to the measuring arm 2, two spherical mirrors (not shown) and a diaphragm (not shown), so that the desired converging radiation beam 8 is generated upon application of a parallel beam. 5

In the measurement of periodic structures of the beam diameter of the incident beam 8 is preferably selected on the sample 9 so that it illuminates at least some periods of the structure. In semiconductor manufacturing, the period of such structures (such as, for example, spaced apart lines which should have a predetermined width and height and a predetermined flank angle with proper process control) is 150 nm, so that then a beam diameter of several 10 micrometers is desired. Depending on the sample geometry (which varies due to, for example, process variations) also changes the measured optical signature, so that, starting by known methods from the measured optical signature (such as neural networks) for the actual values ​​of the desired parameters (such as line width, line height, flank angle) can be deduced. It has been found in measurements that the sensitivity (that is, the changes in optical signature in response to a change of the to be tested parameter, such as width and height of the parallel lines) is not over the entire bundle cross-section of the incident on the detector 13 the radiation beam is constant but very strongly on the particular type of sample (eg photoresist on silicon, etched silicon, etched aluminum) and the respective geometries (eg one or two dimensional recurring structures) depends.

In FIG. 4, the individual pixel elements 23 of the detector 13 are shown as squares, the sensitivity λ as a function of wavelength and loss angle δ for a first sample type by contour lines 24, 25, 26, 27 and for a second sample type by contour lines 28, 29, 30, 31 indicated. The contours can be determined experimentally and / or theoretically.

In measurement of the first sample type, the detector 13 is preferably so controlled that only the lying within the contour line 24 of pixel elements 23 is read while only the lying within the contour line 28 of pixel elements 23 are read out measurement of the second sample type. Means that only relevant pixel elements 23 can be detected and evaluated, so that the evaluation by the not so relevant information of the remaining image pixel elements is not unnecessarily slowed. As a detector 13, such are preferably used, in which individual image pixel can be selectively read out. This could be a CMOS image detector or a CID image detector (charge-injection-device- image detector).

In a further development of the embodiment described in the illumination arm 1, the polariser 7 is arranged so that the light coupled into the illumination optics 6 radiation beam is linearly polarized and thus has a defined or known polarization state. In the measuring arm 2 is inserted between optical device 11 and the detector 13, the micro polarizing filter 14 which is preferably arranged immediately in front of the detector. 13

The micro polarizing filter 14 comprises a plurality of spaced rows and columns filter pixels 32, 33, 34, 35, each filter pixels 32, 33, 34, 35 is assigned to one detector pixel 23 as shown in the schematic exploded view of a portion of the detector 13 and the micro polarization filter 14 can be seen in Fig. 5. In each case, 2 x 2 filter pixels form a pixel group 36 in which three Filteφixel 32, 33, 34 (for example, fine metal mesh which can be prepared by known Mikrostruktierungstechniken) of the pixel group 36 analyzers with different passband or major axis directions (for example, 0 °, 45 °, 90 °) polarized radiation and the fourth pixel filter is transparent 35th Thus, with the three Analysatorpixeln 32, 33, 34 associated detector pixels 23, the polarization state can be detected and with the fourth detector pixel 23, associated with the transparent pixel filter 35, the intensity can be measured. In this embodiment the resolution by a factor of 2 compared to the prescribed embodiment is thus to reduce, but additionally information about the changes in the polarization state are obtained, so that a spectral and angular resolved ellipsometry can still be carried out simultaneously with a single measurement.

If a spatially resolved measurement is to be performed with the described measuring arrangement, the distance of the sample 9 is set to the two arms 2 and 3 is preferably such that the converging beam bundle 8 has on the sample 9 has a small diameter as possible. The converging radiation beam 8 is thus focused as well as possible to the test. Sample 9 is further moved relative to the two arms 2 and 3 so that for each point of the measurement carried out as described in connection with the previous embodiments>. , can be. The spatial resolution is thus achieved by the measurement of separate points, since the individual measurements provide in itself is not spatially resolved information. This is because that no image of the examined sample point, but an integral optical signature (averaged over the sample spot optical signature) is detected in the inventive measuring arrangement of the measuring arm.

The movement of the specimen 9 on the arms 2 and 3, preferably by means of a sample table (not shown), on which the sample is supported 9 relative carried out, wherein with the sample stage also the distance to the arms 2,3 and thus the bundle diameter of the beam 8 is adjusted to the sample. 9 Alternatively, of course, also both arms can be moved 2 and 3 in accordance with relative to the sample 9, or it is also possible to combine both movements.

Claims

claims
1. Measuring arrangement with an optical device (11) in the outgoing to measure one of a sample (9), a diverging bundle of rays (10) is coupled, and further comprising the optical device (11) downstream detector (13), a plurality of arranged in a plane, independently of one another evaluable detector pixels (23), wherein the optical device (11) divides the diverging beams (10) in a first direction transverse to the propagation direction (C) of the beam (10) spectrally and onto the detector (13) articulated, characterized in that the Optikejnrichtung (11) even before it hits the beam on the detector (13) in a second direction transverse to the propagation direction (C) so parallelized that adjacent in the second direction rays of the detector (13) impinging the radiation beam parallel to each other.
2. Measuring arrangement according to claim 1, characterized in that the optical device (11) performs the spectral dispersion such that in the first direction, a focus in the plane of the detector pixels (23).
3. Measuring device according to claim 2, characterized in that the optical device (11) for focusing comprises a cylindrical mirror (22).
4. Measuring arrangement according to one of claims 1 to 3, characterized in that the optical device (11) for the spectral decomposition having a dispersive element, in particular a grating (21).
5. Measuring arrangement according to claim 4, characterized in that the dispersive element is reflective.
6. Measuring arrangement according to one of claims 1 to 5, characterized in that the optical device (11) for parallelizing a mirror, especially a spherical mirror (16; 17).
7. Measuring arrangement according to one of claims 1 to 6, characterized in that optical means includes a first optical module (16, 17) for the parallelization of the coupled beam (10) and a first optical module (16; 17) downstream of second optical module (21, 22) includes for the spectral splitting of the collimated beam.
8. Measuring arrangement according to claim 7, characterized in that the first optical module for parallelization only mirror elements (16, 17).
9. Measuring arrangement according to one of claims 1 to 8, characterized in that the Detektoφixel (23) are arranged in rows and columns and the spectral Zeriegung occurs in row or column direction.
10. Measuring device according to one of claims 1 to 9, characterized in that the detector (13), a micro polarizing filter (14) is arranged upstream, comprising a plurality of pixel groups each having at least two Analysatorenpixel with different main axis directions of ellipsometry and a transparent pixel for have photometry.
11. Measuring device according to one of claims 1 to 10, characterized in that an illumination unit (1) is provided, which can so set a radiation beam (8) on the examined sample, that the divergent bundle of rays (10) is generated.
12. Measuring method comprising the steps:
Directing a beam (8) to a sample under test (9) such that from the sample (9) extends a diverging bundle of rays (10)
Performing a spectral decomposition of the diverging beam (10) in a first direction transverse to the propagation direction (C) of the diverging beam (10) and
comprises directing the spectrally dispersed beam onto a detector (13) which is disposed a plurality of in one plane and independently evaluable detector pixels (23), characterized in that the divergent bundle of rays (10) even before it (on the detector 13 ) is true, in a second direction transverse to the propagation direction (C) is parallelized so that adjacent in the second direction of the beam on the detector (13) extend impinging beam parallel.
13. A measuring method according to claim 12, characterized in that in
Depending on the sample to be examined (9) only a predetermined portion of the detector pixels (23) are evaluated.
14. A measuring method according to claim 12 or 13, characterized in that the beam (8) which is directed onto the sample (9) has a defined polarization state, and that a part of the detector (13) directed beam is passed through analyzers ,
15. A measuring method according to any one of claims 12 to 14, characterized in that the beam (8) onto the sample (9) is focused.
EP02785122A 2001-09-24 2002-09-18 Scatterometric measuring array and measuring method Withdrawn EP1434977A1 (en)

Priority Applications (3)

Application Number Priority Date Filing Date Title
DE10146945 2001-09-24
DE2001146945 DE10146945A1 (en) 2001-09-24 2001-09-24 Measuring arrangement and measuring method
PCT/EP2002/010476 WO2003029770A1 (en) 2001-09-24 2002-09-18 Scatterometric measuring array and measuring method

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EP1434977A1 true EP1434977A1 (en) 2004-07-07

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EP (1) EP1434977A1 (en)
JP (1) JP2005504314A (en)
DE (1) DE10146945A1 (en)
WO (1) WO2003029770A1 (en)

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