EP0893736A4 - Method for sticking a pellicle on an article to be protected, pellicle-protected articles obtained by the method, pellicle for ultraviolet rays, and case for pellicles - Google Patents

Method for sticking a pellicle on an article to be protected, pellicle-protected articles obtained by the method, pellicle for ultraviolet rays, and case for pellicles

Info

Publication number
EP0893736A4
EP0893736A4 EP98901549A EP98901549A EP0893736A4 EP 0893736 A4 EP0893736 A4 EP 0893736A4 EP 98901549 A EP98901549 A EP 98901549A EP 98901549 A EP98901549 A EP 98901549A EP 0893736 A4 EP0893736 A4 EP 0893736A4
Authority
EP
European Patent Office
Prior art keywords
pellicle
article
protected
pressure
ultraviolet rays
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
EP98901549A
Other languages
German (de)
French (fr)
Other versions
EP0893736A1 (en
Inventor
Takamasa Tsumoto
Shigeto Shigematsu
Hiroaki Nakagawa
Masahiro Kondo
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsui Chemicals Inc
Original Assignee
Mitsui Chemicals Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from JP02907397A external-priority patent/JP4112649B2/en
Application filed by Mitsui Chemicals Inc filed Critical Mitsui Chemicals Inc
Publication of EP0893736A1 publication Critical patent/EP0893736A1/en
Publication of EP0893736A4 publication Critical patent/EP0893736A4/en
Withdrawn legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/62—Pellicles, e.g. pellicle assemblies, e.g. having membrane on support frame; Preparation thereof
    • G03F1/64—Pellicles, e.g. pellicle assemblies, e.g. having membrane on support frame; Preparation thereof characterised by the frames, e.g. structure or material, including bonding means therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/38—Masks having auxiliary features, e.g. special coatings or marks for alignment or testing; Preparation thereof
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/38—Masks having auxiliary features, e.g. special coatings or marks for alignment or testing; Preparation thereof
    • G03F1/48—Protective coatings
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/62—Pellicles, e.g. pellicle assemblies, e.g. having membrane on support frame; Preparation thereof
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/68—Preparation processes not covered by groups G03F1/20 - G03F1/50
    • G03F1/82—Auxiliary processes, e.g. cleaning or inspecting
    • G03F1/84—Inspecting

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Adhesives Or Adhesive Processes (AREA)
  • Adhesive Tapes (AREA)

Abstract

A method for sticking a pellicle on an article to be protected, which comprises pressing a pellicle to the article with a pressure-sensitive adhesive having a hardness of 200 gf or below present between the open side of the pellicle frame and the article under a pressure equivalent to or exceeding the close adhesion pressure inherent in the pressure-sensitive adhesive to thereby make the pellicle adhere closely to the article; and pellicle-protected articles obtained by the method. A pellicle for ultraviolet rays of 140 to 200 nm in wavelength, provided with a pressure-sensitive adhesive and comprising a pellicle membrane, a pellicle frame for spreading and holding the membrane through an adhesive layer (a), and an adhesive layer (b) for fixing the frame on an article to be protected, wherein the generation from the layers (a) and (b) of compounds which are adsorbed or absorbed by the pellicle membrane and generate free radicals when irradiated with ultraviolet rays of 140 to 200 nm in wavelength is depressed to an amount of 200 ppm or below; and a case for the pellicles. Thus, the present invention provides a process for the production of an article (such as a mask, reticle or the like) which has a pellicle stuck thereon and is protected from the adhesion of dust thereon; a pellicle for ultraviolet rays of 200 nm or shorter in wavelength, provided with a pressure-sensitive adhesive and excellent in light resistance (endurance); and a case for the pellicles.
EP98901549A 1997-02-10 1998-02-06 Method for sticking a pellicle on an article to be protected, pellicle-protected articles obtained by the method, pellicle for ultraviolet rays, and case for pellicles Withdrawn EP0893736A4 (en)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
JP2622597 1997-02-10
JP26225/97 1997-02-10
JP02907397A JP4112649B2 (en) 1997-02-13 1997-02-13 UV pellicle and pellicle case
JP29073/97 1997-02-13
PCT/JP1998/000514 WO1998035270A1 (en) 1997-02-10 1998-02-06 Method for sticking a pellicle on an article to be protected, pellicle-protected articles obtained by the method, pellicle for ultraviolet rays, and case for pellicles

Publications (2)

Publication Number Publication Date
EP0893736A1 EP0893736A1 (en) 1999-01-27
EP0893736A4 true EP0893736A4 (en) 2000-06-28

Family

ID=26363968

Family Applications (1)

Application Number Title Priority Date Filing Date
EP98901549A Withdrawn EP0893736A4 (en) 1997-02-10 1998-02-06 Method for sticking a pellicle on an article to be protected, pellicle-protected articles obtained by the method, pellicle for ultraviolet rays, and case for pellicles

Country Status (5)

Country Link
EP (1) EP0893736A4 (en)
KR (1) KR20000064877A (en)
CA (1) CA2251550A1 (en)
TW (1) TW357284B (en)
WO (1) WO1998035270A1 (en)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6593035B1 (en) 2001-01-26 2003-07-15 Advanced Micro Devices, Inc. Pellicle for use in small wavelength lithography and a method for making such a pellicle using polymer films
US6544693B2 (en) * 2001-01-26 2003-04-08 Advanced Micro Devices, Inc. Pellicle for use in small wavelength lithography and a method for making such a pellicle
KR101164460B1 (en) * 2006-04-07 2012-07-18 신에쓰 가가꾸 고교 가부시끼가이샤 Pellicle for lithography
JP2008065258A (en) * 2006-09-11 2008-03-21 Shin Etsu Chem Co Ltd Pellicle for lithography
KR100928505B1 (en) * 2007-10-22 2009-11-26 주식회사 동부하이텍 Semiconductor device manufacturing method and apparatus
JP5513616B2 (en) 2010-07-09 2014-06-04 三井化学株式会社 Pellicle and mask adhesive used therefor
JP6150300B2 (en) 2014-04-04 2017-06-21 信越化学工業株式会社 How to check the pellicle sticking part
GB2534404A (en) * 2015-01-23 2016-07-27 Cnm Tech Gmbh Pellicle

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0438602A1 (en) * 1989-08-10 1991-07-31 Daicel Chemical Industries, Ltd. Dust-preventing film
US5378514A (en) * 1992-08-21 1995-01-03 Shin-Etsu Chemical Co., Ltd. Frame-supported pellicle for photolithography

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0772793B2 (en) * 1986-09-05 1995-08-02 三井石油化学工業株式会社 Pellicle
JPH0442156A (en) * 1990-06-08 1992-02-12 Daicel Chem Ind Ltd Pellicle
JPH04237056A (en) * 1991-01-21 1992-08-25 Daicel Chem Ind Ltd Pellicle

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0438602A1 (en) * 1989-08-10 1991-07-31 Daicel Chemical Industries, Ltd. Dust-preventing film
US5378514A (en) * 1992-08-21 1995-01-03 Shin-Etsu Chemical Co., Ltd. Frame-supported pellicle for photolithography

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
See also references of WO9835270A1 *

Also Published As

Publication number Publication date
EP0893736A1 (en) 1999-01-27
TW357284B (en) 1999-05-01
CA2251550A1 (en) 1998-08-13
KR20000064877A (en) 2000-11-06
WO1998035270A1 (en) 1998-08-13

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