EP0845305B1 - Brushing system performing an epicycloidal movement - Google Patents
Brushing system performing an epicycloidal movement Download PDFInfo
- Publication number
- EP0845305B1 EP0845305B1 EP97306428A EP97306428A EP0845305B1 EP 0845305 B1 EP0845305 B1 EP 0845305B1 EP 97306428 A EP97306428 A EP 97306428A EP 97306428 A EP97306428 A EP 97306428A EP 0845305 B1 EP0845305 B1 EP 0845305B1
- Authority
- EP
- European Patent Office
- Prior art keywords
- brush
- bore
- bristles
- hub
- epicycloidal
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 230000001680 brushing effect Effects 0.000 title claims description 9
- 239000002245 particle Substances 0.000 claims description 18
- 230000008859 change Effects 0.000 claims description 5
- 238000009825 accumulation Methods 0.000 claims description 2
- 239000004065 semiconductor Substances 0.000 claims description 2
- 238000000034 method Methods 0.000 description 8
- 239000000758 substrate Substances 0.000 description 6
- 230000009471 action Effects 0.000 description 3
- 238000004519 manufacturing process Methods 0.000 description 3
- 230000008569 process Effects 0.000 description 3
- CYTYCFOTNPOANT-UHFFFAOYSA-N Perchloroethylene Chemical group ClC(Cl)=C(Cl)Cl CYTYCFOTNPOANT-UHFFFAOYSA-N 0.000 description 2
- 238000004140 cleaning Methods 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 229950011008 tetrachloroethylene Drugs 0.000 description 2
- 229910001369 Brass Inorganic materials 0.000 description 1
- 241000282836 Camelus dromedarius Species 0.000 description 1
- 241000282898 Sus scrofa Species 0.000 description 1
- 238000005411 Van der Waals force Methods 0.000 description 1
- 238000007664 blowing Methods 0.000 description 1
- 239000010951 brass Substances 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 230000003749 cleanliness Effects 0.000 description 1
- 238000011109 contamination Methods 0.000 description 1
- 239000002537 cosmetic Substances 0.000 description 1
- 239000003989 dielectric material Substances 0.000 description 1
- 238000005538 encapsulation Methods 0.000 description 1
- 239000004519 grease Substances 0.000 description 1
- 230000007246 mechanism Effects 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 238000004806 packaging method and process Methods 0.000 description 1
- 230000009467 reduction Effects 0.000 description 1
- 239000011347 resin Substances 0.000 description 1
- 229920005989 resin Polymers 0.000 description 1
- 238000005476 soldering Methods 0.000 description 1
Images
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B1/00—Cleaning by methods involving the use of tools
- B08B1/30—Cleaning by methods involving the use of tools by movement of cleaning members over a surface
- B08B1/32—Cleaning by methods involving the use of tools by movement of cleaning members over a surface using rotary cleaning members
Definitions
- the present invention relates to the removal of particles from a substrate during the manufacture of electronic packages and particularly to a system and method for removing the particles through epicycloidal brushing.
- first level packaging In the manufacturing process of an electronic package, the mounting of a chip (device) on a substrate, usually done through soldering, is called “first level packaging". This stage of the process needs to be performed in a "clean" environment to avoid unwanted particles being deposited on the module, before the module is encapsulated, usually with a resin, and the circuits are protected by external agents. For this reason the whole process is carried on in a so-called “Clean Room", which according to industry standards must be at least of class 100000. This means that in a cubic meter there are no more than 100000 particles with dimension less than 3 ⁇ m. As an example, in IBM manufacturing lines the Clean Rooms are of class 30000.
- US patent application US-A-5,361,449 discloses a system for cleaning the surface of a semiconductor wafer, using a rotary brush which can be rotated about its center, and be revolved substantially about the center of the wafer.
- a brushing system for removing unwanted particles from a surface comprising:
- the adhesion of a particle to a substrate is caused by a plurality of different forces.
- the main components of the adhesion force are: the Van der Waals force, which is the attraction any molecule or atom exercises on another molecule or atom; the electrical double layer force, which is caused by electrostatic contact potentials due to the differences in local energy states and electron work functions between two materials; the electrostatic image force, which is caused by bulk excess charges present on the surface which produce a coulombic attraction; and the capillary force, which is due to the humidity in the air.
- This multi-direction action can be easily realized by manually brushing the module, but it is very difficult to create an automatic movement which reproduces such action.
- the point P can be compared to a single bristle on a rotatable brush.
- Fig. 2 shows a rotating brush for cleaning electronic modules according to a preferred embodiment of the present invention, which realizes a substantially epicycloidal movement when the rotating brush comes in contact with the surface of the module to be cleaned.
- the circular brush 201 has a hub 202 with axis of rotation 211 which can freely rotate into the bore of the cylindric shaft 203.
- the cylindric shaft 203 is rotatable around an axis 213.
- the bore of the shaft is axially displaced with respect to the axis of rotation 213 of shaft 203; this causes the axis of rotation 211 of brush 201 to be eccentric with respect to the axis of rotation 213 of shaft 203.
- Motor 204 is coupled to cylindric shaft 203 and is able to make it rotate.
- the radius of brush 201 is between 30mm and 60mm, the distance between the axis 211 and the axis 213 is 1.5mm and the cylinder 203 has a rotation speed comprised between 1500 and 4000 rpm according to the dimension of brush 201.
- the hub 202 of the circular brush 201 is also able to move vertically along the axis 201 into the bore of the shaft 203.
- the hub 202 has a rim 222 which engages the recess 223.
- Coil spring 205 forces the brush in its lowest position while not in operation.
- a second coil spring 206 more strongly resilient than the first one opposes the upward movement of the brush in the bore of the shaft beyond a certain threshold.
- brush 201 When cylinder 203 rotates and the bristles of brush 201 are free from friction, brush 201 will simply follow cylinder 203 in its rotation. When a surface (e.g. the surface of an-electronic module) is brought into contact with the brush bristles, the friction will cause brush 201 to start looping on its own axis, describing epicycloidal curves. The orbit of the epicycloidal curves will depend from the strength of the friction.
- a surface e.g. the surface of an-electronic module
- an elevator 209 brings an electronic module 208 in contact with the brush 201 and contrasts the opposition of coil spring 206.
- the spring 206 will determine the load of the brush on the module and, as mentioned above, the orbit of the epicycloidal curves.
- the module is held in place by the elevator 209 by means of a vacuum 250.
- An optical sensor 207 controls the elevator 209 stopping the elevation when the module reaches a predetermined position. Changing the adjustment of the sensor 207 the pressure of spring 206 will change causing a modification of the epicycloidal curves. This mechanism also allows to provide a constant pressure regardless of the wear and tear of the brush bristles.
- an air blowing jet coupled to an aspirator can be provided to ensure the highest level of cleanliness.
- the bristles of the brush 201 are made of natural materials (e.g. camel or wild boar hair).
- natural materials e.g. camel or wild boar hair.
- a few conductive bristles e.g. 0.06 mm brass wires
- These conductive bristles should be shorter than the natural bristles (e.g. 3 mm shorter) otherwise they could scratch the module substrate.
- a group of ionizers is provided in order to further reduce the accumulation of electrostatic charges.
Landscapes
- Cleaning In General (AREA)
- Cleaning Or Drying Semiconductors (AREA)
- Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
Description
- The present invention relates to the removal of particles from a substrate during the manufacture of electronic packages and particularly to a system and method for removing the particles through epicycloidal brushing.
- In the manufacturing process of an electronic package, the mounting of a chip (device) on a substrate, usually done through soldering, is called "first level packaging". This stage of the process needs to be performed in a "clean" environment to avoid unwanted particles being deposited on the module, before the module is encapsulated, usually with a resin, and the circuits are protected by external agents. For this reason the whole process is carried on in a so-called "Clean Room", which according to industry standards must be at least of class 100000. This means that in a cubic meter there are no more than 100000 particles with dimension less than 3µm. As an example, in IBM manufacturing lines the Clean Rooms are of class 30000.
- Notwithstanding these precautions it can happen that particles of organic nature (eg. coming from a human body such as skin or hair) or of metallic nature (e.g. from moving mechanical machinery) deposit on the module.
- The removal of the particles from the module, before the encapsulation is essential for the functionality of the final package. The presence of particles of any nature between the circuits of the substrate can be very harmful. This is particularly true if the increasing reduction of dimensions in the electronic standards is considered. What, in the past, used to be a "cosmetic" problem, with the reduced space between the circuit lines is becoming a vital requirement. It is likely that smaller and smaller particles will become more and more dangerous.
- A technique which is normally used to remove the unwanted particles is to wash the modules with Perchlorethylene (PCE) which provides a grease removal. This technique, however does not give the assurance of a complete removal of the particles. For this reason, a manual check with the aid of microscopes must be performed afterwards and the residual particles manually removed with brushes and scrapers.
- It should be immediately evident that the above described technique is very laborious and also not completely reliable, because of the human intervention. Furthermore, the interruption of the mechanical handling of the modules for the manual checking and refinement leaves open the eventuality of contamination during the waiting times and the moving of the modules.
- US patent application US-A-5,361,449 discloses a system for cleaning the surface of a semiconductor wafer, using a rotary brush which can be rotated about its center, and be revolved substantially about the center of the wafer.
- It is an object of the present invention to provide a technique which overcomes the above drawbacks.
- According to the invention we provide a brushing system for removing unwanted particles from a surface, comprising:
- a rotatable shaft having a cylindric bore and connectable to a motor, the bore being radially displaced with respect to the axis of rotation of the shaft; and
- a rotatable brush for brushing the surface, the brush having a plurality of bristles and a cylindric hub extending into the bore of the shaft, the hub being free to rotate inside the bore and able to move axially inside the bore, the hub having substantially the same diameter of said bore; and
- elastic means for opposing axial movement of the hub, thereby causing the brush to exert pressure against the surface when in contact therewith, wherein movement of the brush describes a substantially epicycloidal curve on the surface in accordance with the pressure exerted against the surface, so that a change in the pressure causes a change in the epicycloidal curve.
-
- Various embodiments of the invention will now be described in detail by way of examples, with reference to accompanying figures, where:
- Figure 1 shows schematically a classic epicycloidal curve;
- Figure 2a shows schematically an embodiment of the present invention while not in operation;
- Figure 2b shows the same embodiment while in operation.
-
- The adhesion of a particle to a substrate is caused by a plurality of different forces. The main components of the adhesion force are: the Van der Waals force, which is the attraction any molecule or atom exercises on another molecule or atom; the electrical double layer force, which is caused by electrostatic contact potentials due to the differences in local energy states and electron work functions between two materials; the electrostatic image force, which is caused by bulk excess charges present on the surface which produce a coulombic attraction; and the capillary force, which is due to the humidity in the air.
- It has been proved that, to overcome the resistance of all the above forces, a pressure would be needed from different directions in order to more effectively remove the particles from the substrate.
- This multi-direction action can be easily realized by manually brushing the module, but it is very difficult to create an automatic movement which reproduces such action.
- This is the reason which prevented the manual removal to be substituted by a more affordable and economic automatic process.
- It has been discovered that an epicycloidal movement of a brush is theoretically a movement very close to the ideal one (i.e. with lateral pressure from different directions) and it is relatively easy to be mechanically reproduced.
- Fig. 1 shows a classic epicycloidal movement which is equivalent to the curve described by a point P on a circumference C1 with centre C and radius r=NC rotating, without sliding, on a circumference C2 with centre O and radius R=ON. The point P can be compared to a single bristle on a rotatable brush.
- Fig. 2 shows a rotating brush for cleaning electronic modules according to a preferred embodiment of the present invention, which realizes a substantially epicycloidal movement when the rotating brush comes in contact with the surface of the module to be cleaned.
- With reference to Fig. 2, the
circular brush 201 has ahub 202 with axis ofrotation 211 which can freely rotate into the bore of thecylindric shaft 203. Thecylindric shaft 203 is rotatable around anaxis 213. The bore of the shaft is axially displaced with respect to the axis ofrotation 213 ofshaft 203; this causes the axis ofrotation 211 ofbrush 201 to be eccentric with respect to the axis ofrotation 213 ofshaft 203.Motor 204 is coupled tocylindric shaft 203 and is able to make it rotate. In a preferred embodiment the radius ofbrush 201 is between 30mm and 60mm, the distance between theaxis 211 and theaxis 213 is 1.5mm and thecylinder 203 has a rotation speed comprised between 1500 and 4000 rpm according to the dimension ofbrush 201. - According to embodiment, the
hub 202 of thecircular brush 201 is also able to move vertically along theaxis 201 into the bore of theshaft 203. To limit this vertical movement and avoid thebrush 201 sliding out from the bore of theshaft 203, thehub 202 has arim 222 which engages therecess 223.Coil spring 205 forces the brush in its lowest position while not in operation. Asecond coil spring 206 more strongly resilient than the first one opposes the upward movement of the brush in the bore of the shaft beyond a certain threshold. - When
cylinder 203 rotates and the bristles ofbrush 201 are free from friction,brush 201 will simply followcylinder 203 in its rotation. When a surface (e.g. the surface of an-electronic module) is brought into contact with the brush bristles, the friction will causebrush 201 to start looping on its own axis, describing epicycloidal curves. The orbit of the epicycloidal curves will depend from the strength of the friction. - In a preferred embodiment when the brushing system is rotating an
elevator 209 brings anelectronic module 208 in contact with thebrush 201 and contrasts the opposition ofcoil spring 206. Thespring 206 will determine the load of the brush on the module and, as mentioned above, the orbit of the epicycloidal curves. In a preferred embodiment the module is held in place by theelevator 209 by means of avacuum 250. - An
optical sensor 207 controls theelevator 209 stopping the elevation when the module reaches a predetermined position. Changing the adjustment of thesensor 207 the pressure ofspring 206 will change causing a modification of the epicycloidal curves. This mechanism also allows to provide a constant pressure regardless of the wear and tear of the brush bristles. - With the action of the epicycloidal brushing described above, the particles on the module will be hit by the brush bristles from different directions and their adhesion forces will be overcome very effectively. The rotation of the brush will also cause the particles to be removed from the module before they can deposit in a different place on the module itself. According to a preferred embodiment an air blowing jet coupled to an aspirator can be provided to ensure the highest level of cleanliness.
- In a preferred embodiment the bristles of the
brush 201 are made of natural materials (e.g. camel or wild boar hair). To avoid that harmful electro-static charges, produced by the friction of the natural bristles with a dielectric material, could damage the electronic circuits of the module, a few conductive bristles (e.g. 0.06 mm brass wires) have been inserted. These conductive bristles should be shorter than the natural bristles (e.g. 3 mm shorter) otherwise they could scratch the module substrate. In a preferred embodiment, in order to further reduce the accumulation of electrostatic charges, a group of ionizers is provided.
Claims (12)
- A brushing system for removing unwanted particles from a surface, comprising:a rotatable shaft (203) having a cylindric bore and connectable to a motor (204), the bore being radially displaced with respect to the axis of rotation (213) of the shaft (203); anda rotatable brush (201) for brushing the surface, the brush having a plurality of bristles and a cylindric hub (202) extending into the bore of the shaft (203), the hub (202) being free to rotate inside the bore and able to move axially inside the bore, the hub (202) having substantially the same diameter of said bore; andelastic means (206) for opposing axial movement of the hub (202), thereby causing the brush (201) to exert pressure against the surface when in contact therewith,
- The system of claim 1 wherein the elastic means (206) comprises a coil spring.
- The system of any preceding claim further comprising elevator means (209) for bringing the surface in contact with the brush (201), the elevator means (209) capable of opposing said elastic means (206).
- The system of claim 3 further comprising sensor means (207) for controlling said elevator means (209).
- The system of claim 4 further comprising means for modifying the epicycloidal movement of the rotating brush (201) whereby constant pressure is maintained by the rotating brush on the surface.
- The system of any preceding claim wherein the bristles of the rotatable brush (201) comprise natural bristles.
- The system of claim 6 wherein the natural bristles are interleaved by conductive wires.
- The system of claim 7 wherein the conductive wires are shorter than the natural bristles.
- The system of claim 6, 7 or 8 further comprising an ionizer for preventing accumulation of electrostatic charges.
- The system of any preceding claim further comprising means for preventing redeposit of the unwanted particles on the surface.
- The system of claim 10 wherein the preventing means comprises an air jet coupled to an aspirator.
- The system of any preceding claim wherein the surface is a semiconductor device.
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
GB9625025A GB2319888A (en) | 1996-11-30 | 1996-11-30 | Brushes for cleaning substrates |
GB9625025 | 1996-11-30 |
Publications (3)
Publication Number | Publication Date |
---|---|
EP0845305A2 EP0845305A2 (en) | 1998-06-03 |
EP0845305A3 EP0845305A3 (en) | 1998-10-21 |
EP0845305B1 true EP0845305B1 (en) | 2002-10-23 |
Family
ID=10803802
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
EP97306428A Expired - Lifetime EP0845305B1 (en) | 1996-11-30 | 1997-08-22 | Brushing system performing an epicycloidal movement |
Country Status (4)
Country | Link |
---|---|
US (1) | US5956791A (en) |
EP (1) | EP0845305B1 (en) |
DE (1) | DE69716560D1 (en) |
GB (1) | GB2319888A (en) |
Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US8028707B2 (en) | 2005-06-02 | 2011-10-04 | The Procter & Gamble Company | Cosmetic applicator |
US8079373B2 (en) | 2007-09-18 | 2011-12-20 | The Proctor & Gamble Company | Applicator with helical applicator surface |
US8485201B2 (en) | 2007-02-21 | 2013-07-16 | The Procter & Gamble Company | Cosmetic applicator with torque limiter |
US8985883B2 (en) | 2007-07-30 | 2015-03-24 | The Procter & Gamble Company | Control surfaces for applicator with moveable applicator head |
CN108927381A (en) * | 2018-07-24 | 2018-12-04 | 宿州市微腾知识产权运营有限公司 | A method of improving projector radiating effect |
Families Citing this family (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP3641349B2 (en) * | 1997-05-19 | 2005-04-20 | 株式会社荏原製作所 | Cleaning device |
TW389684B (en) * | 1998-08-20 | 2000-05-11 | Luo De Liang | Portable electric cleaning device |
GB2387773A (en) * | 2002-04-26 | 2003-10-29 | Gordon Chih | Water flow-driven rotary and vibrational cleaning brush |
DE10226808A1 (en) * | 2002-06-15 | 2004-01-08 | Wandres Gmbh Micro-Cleaning | Cleaner for perforated furniture surfaces has housing with straight brushes and fluid outlets to define high pressure chambers between brushes |
US20040167481A1 (en) * | 2003-01-16 | 2004-08-26 | Conair Corporation | Hand-held buffing device |
WO2004098802A1 (en) * | 2003-04-01 | 2004-11-18 | Aju Systems Usa, Inc. | Automatic semiconductor contacts cleaner |
US7386911B2 (en) * | 2004-11-11 | 2008-06-17 | Ford Motor Company | Apparatus for dislodging and removing contaminants from a surface of a machine tool |
DE102004055656B4 (en) * | 2004-11-15 | 2008-07-24 | Qimonda Ag | Cleaning device for a tempering device for substrates and method for cleaning a temperature control device for substrates |
US7654271B2 (en) * | 2005-06-02 | 2010-02-02 | The Procter & Gamble Company | Cosmetic applicator |
US20080196736A1 (en) * | 2007-02-21 | 2008-08-21 | The Procter & Gamble Company | Cosmetic Applicator with Torque Limiter |
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DE18474C (en) * | J. J. BOURCART in Zürich | Ring spindle, the speed of which is influenced by the tension of the incoming thread | ||
US2967315A (en) * | 1957-01-28 | 1961-01-10 | Jerome D Rosenberg | Hand-propelled polishing machine |
GB1168407A (en) * | 1968-05-29 | 1969-10-22 | Samuel Allen Miller | Portable Polishing Device |
US3691582A (en) * | 1970-07-30 | 1972-09-19 | Circuit Equipment Corp | Machine for cleaning printed circuit board |
GB1596390A (en) * | 1978-05-25 | 1981-08-26 | Nicol & Andrew London Ltd | Machining apparatus |
US4177535A (en) * | 1978-08-02 | 1979-12-11 | Cole Bernie R | Polishing apparatus |
DE3033823A1 (en) * | 1980-02-29 | 1982-04-15 | Agfa-Gevaert Ag, 5090 Leverkusen | DEVICE FOR CLEANING DATA CARRIERS |
IT1134060B (en) * | 1980-10-27 | 1986-07-24 | Vorwerk Folletto Srl | WASHING-POLISHING MACHINE WITH EPICYCLOIDAL TRANSMISSION OF THE MOTORCYCLE TO THE BRUSHES |
US4474445A (en) * | 1983-03-21 | 1984-10-02 | E. I. Du Pont De Nemours And Company | Vacuum holddown device for flexographic printing plates |
FR2584011B1 (en) * | 1985-06-28 | 1989-02-24 | Renault | BRUSHING HEAD, ESPECIALLY FOR MACHINING CENTERS |
US4692959A (en) * | 1986-03-11 | 1987-09-15 | Monson Clifford L | Rotary cleaner/scrubber mechanism |
JP2660248B2 (en) * | 1988-01-06 | 1997-10-08 | 株式会社 半導体エネルギー研究所 | Film formation method using light |
US4993096A (en) * | 1989-07-31 | 1991-02-19 | D.E.M. Controls Of Canada | Circuit board deburring system |
US5143529A (en) * | 1990-12-13 | 1992-09-01 | Means Orville D Jr | Filter cleaning apparatus |
JP3018548B2 (en) * | 1991-04-16 | 2000-03-13 | 株式会社ニコン | Lens chamfering apparatus and lens chamfering method |
JPH04363022A (en) * | 1991-06-06 | 1992-12-15 | Enya Syst:Kk | Cleaning device for wafer mounter |
JP2571487B2 (en) * | 1991-12-27 | 1997-01-16 | 信越半導体株式会社 | Scrubber cleaning device for thin disk-shaped workpieces |
US5375291A (en) * | 1992-05-18 | 1994-12-27 | Tokyo Electron Limited | Device having brush for scrubbing substrate |
JP2877216B2 (en) * | 1992-10-02 | 1999-03-31 | 東京エレクトロン株式会社 | Cleaning equipment |
US5355542A (en) * | 1992-11-12 | 1994-10-18 | Oreck Corporation | Orbiter floor machine |
KR100213992B1 (en) * | 1995-05-12 | 1999-08-02 | 히가시 데쓰로 | Cleaning apparatus |
US5687442A (en) * | 1996-06-07 | 1997-11-18 | Mclain; Scott S. | Random orbital power cleaner |
-
1996
- 1996-11-30 GB GB9625025A patent/GB2319888A/en not_active Withdrawn
-
1997
- 1997-08-22 EP EP97306428A patent/EP0845305B1/en not_active Expired - Lifetime
- 1997-08-22 DE DE69716560T patent/DE69716560D1/en not_active Expired - Lifetime
- 1997-10-14 US US08/950,263 patent/US5956791A/en not_active Expired - Fee Related
Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US8028707B2 (en) | 2005-06-02 | 2011-10-04 | The Procter & Gamble Company | Cosmetic applicator |
US8485201B2 (en) | 2007-02-21 | 2013-07-16 | The Procter & Gamble Company | Cosmetic applicator with torque limiter |
US8985883B2 (en) | 2007-07-30 | 2015-03-24 | The Procter & Gamble Company | Control surfaces for applicator with moveable applicator head |
US8079373B2 (en) | 2007-09-18 | 2011-12-20 | The Proctor & Gamble Company | Applicator with helical applicator surface |
CN108927381A (en) * | 2018-07-24 | 2018-12-04 | 宿州市微腾知识产权运营有限公司 | A method of improving projector radiating effect |
Also Published As
Publication number | Publication date |
---|---|
DE69716560D1 (en) | 2002-11-28 |
GB2319888A (en) | 1998-06-03 |
EP0845305A3 (en) | 1998-10-21 |
GB9625025D0 (en) | 1997-01-15 |
US5956791A (en) | 1999-09-28 |
EP0845305A2 (en) | 1998-06-03 |
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