EP0783830B1 - Electric heating element - Google Patents
Electric heating element Download PDFInfo
- Publication number
- EP0783830B1 EP0783830B1 EP95930361A EP95930361A EP0783830B1 EP 0783830 B1 EP0783830 B1 EP 0783830B1 EP 95930361 A EP95930361 A EP 95930361A EP 95930361 A EP95930361 A EP 95930361A EP 0783830 B1 EP0783830 B1 EP 0783830B1
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- EP
- European Patent Office
- Prior art keywords
- heating element
- electrical heating
- element according
- heat
- support
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Revoked
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- 238000005485 electric heating Methods 0.000 title description 4
- 238000010438 heat treatment Methods 0.000 claims abstract description 45
- 229910052581 Si3N4 Inorganic materials 0.000 claims abstract description 13
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 claims abstract description 13
- HBMJWWWQQXIZIP-UHFFFAOYSA-N silicon carbide Chemical compound [Si+]#[C-] HBMJWWWQQXIZIP-UHFFFAOYSA-N 0.000 claims abstract description 5
- 229910052751 metal Inorganic materials 0.000 claims abstract description 4
- 239000002184 metal Substances 0.000 claims abstract description 4
- 229910052710 silicon Inorganic materials 0.000 claims abstract description 4
- 239000010703 silicon Substances 0.000 claims abstract description 4
- 239000011888 foil Substances 0.000 claims description 7
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 5
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 claims description 4
- NRTOMJZYCJJWKI-UHFFFAOYSA-N Titanium nitride Chemical compound [Ti]#N NRTOMJZYCJJWKI-UHFFFAOYSA-N 0.000 claims description 3
- 238000009835 boiling Methods 0.000 claims description 3
- 230000007613 environmental effect Effects 0.000 claims description 3
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 3
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 claims description 2
- 229910001006 Constantan Inorganic materials 0.000 claims description 2
- 229910000990 Ni alloy Inorganic materials 0.000 claims description 2
- 229910000831 Steel Inorganic materials 0.000 claims description 2
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 claims description 2
- 238000006243 chemical reaction Methods 0.000 claims description 2
- 239000011521 glass Substances 0.000 claims description 2
- 239000011810 insulating material Substances 0.000 claims description 2
- 229910001092 metal group alloy Inorganic materials 0.000 claims description 2
- 229910052759 nickel Inorganic materials 0.000 claims description 2
- MOFOBJHOKRNACT-UHFFFAOYSA-N nickel silver Chemical compound [Ni].[Ag] MOFOBJHOKRNACT-UHFFFAOYSA-N 0.000 claims description 2
- 239000010956 nickel silver Substances 0.000 claims description 2
- 239000010453 quartz Substances 0.000 claims description 2
- 239000010959 steel Substances 0.000 claims description 2
- 239000010936 titanium Substances 0.000 claims description 2
- 229910010293 ceramic material Inorganic materials 0.000 claims 2
- 229910052804 chromium Inorganic materials 0.000 claims 1
- 239000011651 chromium Substances 0.000 claims 1
- VNNRSPGTAMTISX-UHFFFAOYSA-N chromium nickel Chemical compound [Cr].[Ni] VNNRSPGTAMTISX-UHFFFAOYSA-N 0.000 claims 1
- 229910052719 titanium Inorganic materials 0.000 claims 1
- 239000007787 solid Substances 0.000 abstract description 6
- 229910010271 silicon carbide Inorganic materials 0.000 abstract description 3
- 239000011248 coating agent Substances 0.000 abstract 1
- 238000000576 coating method Methods 0.000 abstract 1
- 239000012799 electrically-conductive coating Substances 0.000 abstract 1
- 239000010410 layer Substances 0.000 description 22
- 239000000463 material Substances 0.000 description 12
- 238000003825 pressing Methods 0.000 description 7
- 239000000919 ceramic Substances 0.000 description 5
- 238000004519 manufacturing process Methods 0.000 description 5
- 230000035939 shock Effects 0.000 description 5
- FRWYFWZENXDZMU-UHFFFAOYSA-N 2-iodoquinoline Chemical compound C1=CC=CC2=NC(I)=CC=C21 FRWYFWZENXDZMU-UHFFFAOYSA-N 0.000 description 3
- LTPBRCUWZOMYOC-UHFFFAOYSA-N beryllium oxide Inorganic materials O=[Be] LTPBRCUWZOMYOC-UHFFFAOYSA-N 0.000 description 3
- PMHQVHHXPFUNSP-UHFFFAOYSA-M copper(1+);methylsulfanylmethane;bromide Chemical compound Br[Cu].CSC PMHQVHHXPFUNSP-UHFFFAOYSA-M 0.000 description 3
- 238000009413 insulation Methods 0.000 description 3
- 238000000034 method Methods 0.000 description 3
- 239000011241 protective layer Substances 0.000 description 3
- 239000000969 carrier Substances 0.000 description 2
- 239000004020 conductor Substances 0.000 description 2
- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 description 2
- 238000005245 sintering Methods 0.000 description 2
- 238000004544 sputter deposition Methods 0.000 description 2
- 230000002588 toxic effect Effects 0.000 description 2
- 229910018072 Al 2 O 3 Inorganic materials 0.000 description 1
- 229910000570 Cupronickel Inorganic materials 0.000 description 1
- 229910004298 SiO 2 Inorganic materials 0.000 description 1
- 239000000654 additive Substances 0.000 description 1
- 229910045601 alloy Inorganic materials 0.000 description 1
- 239000000956 alloy Substances 0.000 description 1
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 1
- 238000005219 brazing Methods 0.000 description 1
- 239000012459 cleaning agent Substances 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- YOCUPQPZWBBYIX-UHFFFAOYSA-N copper nickel Chemical compound [Ni].[Cu] YOCUPQPZWBBYIX-UHFFFAOYSA-N 0.000 description 1
- 230000001419 dependent effect Effects 0.000 description 1
- 238000010292 electrical insulation Methods 0.000 description 1
- 239000012777 electrically insulating material Substances 0.000 description 1
- 238000005265 energy consumption Methods 0.000 description 1
- 239000002241 glass-ceramic Substances 0.000 description 1
- 239000007791 liquid phase Substances 0.000 description 1
- 230000007774 longterm Effects 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 229910001000 nickel titanium Inorganic materials 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- SIWVEOZUMHYXCS-UHFFFAOYSA-N oxo(oxoyttriooxy)yttrium Chemical compound O=[Y]O[Y]=O SIWVEOZUMHYXCS-UHFFFAOYSA-N 0.000 description 1
- 230000005855 radiation Effects 0.000 description 1
- 230000003678 scratch resistant effect Effects 0.000 description 1
- 229910052814 silicon oxide Inorganic materials 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
- 230000000930 thermomechanical effect Effects 0.000 description 1
- 231100000331 toxic Toxicity 0.000 description 1
- 231100000563 toxic property Toxicity 0.000 description 1
- MTPVUVINMAGMJL-UHFFFAOYSA-N trimethyl(1,1,2,2,2-pentafluoroethyl)silane Chemical compound C[Si](C)(C)C(F)(F)C(F)(F)F MTPVUVINMAGMJL-UHFFFAOYSA-N 0.000 description 1
Images
Classifications
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- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
- H05B3/00—Ohmic-resistance heating
- H05B3/20—Heating elements having extended surface area substantially in a two-dimensional plane, e.g. plate-heater
- H05B3/22—Heating elements having extended surface area substantially in a two-dimensional plane, e.g. plate-heater non-flexible
- H05B3/26—Heating elements having extended surface area substantially in a two-dimensional plane, e.g. plate-heater non-flexible heating conductor mounted on insulating base
- H05B3/265—Heating elements having extended surface area substantially in a two-dimensional plane, e.g. plate-heater non-flexible heating conductor mounted on insulating base the insulating base being an inorganic material, e.g. ceramic
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
- H05B3/00—Ohmic-resistance heating
- H05B3/10—Heating elements characterised by the composition or nature of the materials or by the arrangement of the conductor
- H05B3/12—Heating elements characterised by the composition or nature of the materials or by the arrangement of the conductor characterised by the composition or nature of the conductive material
- H05B3/14—Heating elements characterised by the composition or nature of the materials or by the arrangement of the conductor characterised by the composition or nature of the conductive material the material being non-metallic
- H05B3/141—Conductive ceramics, e.g. metal oxides, metal carbides, barium titanate, ferrites, zirconia, vitrous compounds
Definitions
- the invention relates to an electric heating element with the Features of the preamble of claim 1.
- the inventive Heating element is used in particular as Thermal shock resistant plate heat exchanger, especially as Hot plate.
- WO 91/10336 describes an electrical heating element, which has an electrically insulating support and one attached to it comprises electrically conductive layer, wherein at the electrically conductive layer attached electrical contacts are. Amorphous or polycrystalline is used as the conductive layer Silicon used. The conductive layer, when energized, Heat that is given off directly to the wearer.
- the support although electrically insulating, must have good heat-conducting properties.
- beryllium oxide or aluminum nitride is used as the carrier in this publication.
- both materials have the required properties, they are not very resistant to thermal shock, so that cracks can occur in the carrier.
- These carriers must therefore be dimensioned relatively small. They typically have a thickness of 1 mm and a cross-sectional area of 2-5 cm 2 .
- they must be arranged on a heat-conducting, preferably metallic body which absorbs the heat generated and thus acts as a so-called heat sink. This body is generally formed by a solid plate. Since the carrier and the metallic heat sink have very different coefficients of thermal expansion, a complicated mounting of the carrier plates on the heat sink is required.
- the bracket must ensure that the support plates move relative to the heat sink when the temperature changes and still be in good contact with it.
- beryllium oxide or aluminum nitride as Carrier platelets have other disadvantages. So is Beryllium oxide is highly toxic and therefore needs a protective layer be covered. Just the use of such Heating elements in the household is because of their toxic Properties unthinkable. However, aluminum nitride is not hot water resistant. This heating element would at least have to be covered with a protective layer in the household area. Both materials also have low impact resistance are easily damaged.
- EP-A-069'298 discloses a hotplate with a hotplate body made of a thin ceramic substrate, on the underside of which a thin layer of resistance material is printed.
- US-A-4'652'727 describes a heating element which consists of a sintered body made of a mixture of an electrically conductive material such as titanium carbide and an electrically insulating material such as silicon nitride.
- US-A-4,804,823 discloses a heating element which consists of a carrier element and a heat source arranged therein. The carrier element is formed by a sintered body and the heat source consists of titanium nitride.
- JP-A-3'025'880 describes a heating element which is used as an infrared miniature heating source.
- the heating element according to the invention has the advantage that it no longer with another serving as a heat sink massive carrier must be coupled, but that it is the generated heat can give directly to the object to be heated.
- the heating element is structurally simplified on the one hand and technically more feasible, on the other hand, the efficiency elevated.
- the electrically insulating carrier consists of silicon nitride (Si 3 N 4 ). This material has high thermal shock resistance, high impact resistance and good hot water resistance, is harmless to health, hardly undergoes chemical reactions and is scratch-resistant. In addition, silicon nitride exhibits optimal behavior of the change in electrical resistance in relation to the change in temperature.
- the electrically insulating carrier consists of high-resistance silicon carbide (SiC), which also has very good mechanical, thermomechanical and chemical properties. The specific electrical resistance is approximately 10 13 ohm cm. A method for producing such a silicon carbide carrier is known.
- the silicon carbide is produced by means of a liquid phase sintering process in which aluminum oxide and yttrium oxide are added as sintering additives.
- the carrier can also consist of other electrically insulating ceramics or, for example, of aluminum oxide (Al 2 O 3 ). These ceramics can also be used at higher temperatures if the heating and cooling of the heating element is controlled and slow, so that thermal shock can hardly occur.
- the layer or foil serving as a heat source is preferably meandering and can be made from a wide variety Materials exist. Depending on the material, the layer becomes direct applied to the carrier by means of sputtering process or them is evaporated. In other embodiments, one is first Produced film and then using a Pressing means pressed against the carrier.
- the heating element shown schematically here has the shape of a circular plate, the shape being determined by a solid support 1.
- This carrier consists of an electrically insulating but heat-conducting ceramic, preferably of silicon nitride (Si 3 N 4 ).
- This plate typically has a cross-sectional area of 100-500 cm 2 and a thickness of 1-5 mm. However, the dimensions vary depending on the area of application, which will be discussed later.
- An electrically conductive layer 2 is applied to the carrier 1. It preferably runs to optimize the electrical resistance meandering over the entire surface of the carrier 2.
- This electrically conductive layer consists of this example from amorphous or polycrystalline doped Silicon, as already known from publication WO 91/10336.
- Other electrically conductive layers are also suitable, such as for example metallic layers, especially of chrome, Nickel, chrome-nickel alloys, titanium or titanium nitride.
- the Choice of the material of the electrically conductive layer depends on the specified boundary conditions, which vary depending on the area of application from.
- the electrically conductive layer 2 is preferably on the Carrier 1 applied by means of sputtering or it is evaporated. In typical areas of application it is Thickness between a few tenths and a few micrometers.
- the electrically conductive layer 2 forms the heat source.
- she is provided with electrical contacts 3 that connect to enable a voltage source. Attaching the electrical contacts 3 is especially when using Silicon nitride as carrier 1 simplified, since it is then directly on the carrier can be soldered, whereby due to the heat resistance of Silicon nitride even brazing processes can be used.
- the carrier 1 in particular if it is made of silicon nitride, typically up to a temperature of 650 ° C without long-term damage occur on the material. However, it is peak temperatures up to 1650 ° C possible.
- the heating element according to the invention is particularly suitable for Use as a heat exchanger, the direct environmental influences, especially water.
- a special area of application is the use as a hotplate.
- Figure 2 is one such hotplate shown in the use position.
- Layer 2 serving as a heat source is located on the underside of the carrier 1.
- the carrier 1 itself forms the hotplate.
- the carrier is made of silicon nitride, that can heating object, here a pan P, directly on the support be put.
- the carrier 1 needs because of its good Material properties not even a protective layer. On the Plate can hardly burn anything, and the carrier can also conventional cleaning agents can be cleaned, also abrasive rags can be used.
- the object to be heated is directly on the Carrier placed and the electrically conductive layer is located itself on the bottom of the carrier.
- the Carriers are not necessarily made of silicon nitride, but also the use of other ceramics like Alumina is possible.
- the heating elements can also be stacked in a sandwich. It is always essential that the carrier transfers the heat directly to the object to be heated, such as a pan, for example, without another solid, heat-conducting carrier being arranged in between.
- the electrically conductive layer 2 is covered with a further layer of silicon oxide (SiO 2 ) or silicon nitride (Si 3 N 4 ) in order to prevent oxidation.
- the electrically conductive layer can also be coated with a thermally insulating layer.
- the Invention consists of the meandering heat source from a Foil 2 'made of metal or a metal alloy is.
- Preferred materials are Constantan, Aluchrom, Nickel silver, copper-nickel alloys and steel.
- the choice of Material depends on the desired temperature, which with this heat source is to be achieved.
- This slide 2 ' is itself in Maander form self-supporting, so that it is separated from the carrier 1 can be manufactured. In a simple manufacturing process it is punched. This will reduce the manufacturing costs significantly reduced and the production of the heating element simplified.
- This film 2 ' is completely on by means of a pressing means 4 Carrier 1 pressed.
- This pressing means 4 is like the carrier 1 plate-shaped and here has at least approximately the same Diameter on.
- the mechanical and thermal properties of the pressure medium must be such that a complete Pressing the film 2 'over the entire temperature range is guaranteed.
- the pressing means 4 is preferably made made of a heat insulating material, in particular quartz or Glass with a thermal conductivity of approximately 1 W / mK. As a result, the pressure medium also serves as thermal insulation. It is not imperative that the pressing means 4 be electrical has insulating properties. If the pressure medium is out electrically conductive material is located between Film 2 'and pressing means 4 a not shown here electrical insulation layer in the form of insulation paper or an insulation plate.
- Another advantage of this embodiment is besides its inexpensive and easy manufacture that at Damage to the heat source, i.e. the film 2 ', this is easy can be removed and the more expensive component, the carrier 1, can be reused.
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- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Ceramic Engineering (AREA)
- Resistance Heating (AREA)
- Cookers (AREA)
Abstract
Description
Die Erfindung betrifft ein elektrisches Heizelement mit den
Merkmalen des Oberbegriffs des Patentanspruches 1. Das erfindungsgemässe
Heizelement findet insbesondere Anwendung als
thermoschockresistenter Plattenwärmetauscher, insbesondere als
Kochplatte.The invention relates to an electric heating element with the
Features of the preamble of
Bekannte konventionelle elektrische Heizelemente weisen stromdurchflossene Widerstandsdrähte auf, bei denen die erzeugte Wärme mittels Wärmestrahlung abgegeben wird. Der Wirkungsgrad ist klein, da ein beträchtlicher Teil der Energie frei abgestrahlt wird und nicht zu dem zu erwärmenden Objekt gelangt. Zudem ist eine derartige Wärmeübertragung träge.Known conventional electrical heating elements have current-carrying ones Resistance wires where the one created Heat is emitted by means of heat radiation. The efficiency is small because a significant part of the energy is radiated freely and does not reach the object to be heated. In addition, such heat transfer is sluggish.
Es sind deshalb bereits elektrische Heizelemente entwickelt worden, die eine Wärmeübertragung mittels Wärmeleitung ermöglichen. So beschreibt WO 91/10336 ein elektrisches Heizelement, das einen elektrisch isolierenden Träger und eine darauf angebrachte elektrisch leitende Schicht umfasst, wobei an der elektrisch leitenden Schicht elektrische Kontakte angebracht sind. Als leitende Schicht wird amorphes oder polykristallines Silizium verwendet. Die leitende Schicht erzeugt, wenn stromdurchflossen, Wärme, die direkt an den Träger abgegeben wird. Electric heating elements have therefore already been developed that allow heat transfer by means of heat conduction. Thus WO 91/10336 describes an electrical heating element, which has an electrically insulating support and one attached to it comprises electrically conductive layer, wherein at the electrically conductive layer attached electrical contacts are. Amorphous or polycrystalline is used as the conductive layer Silicon used. The conductive layer, when energized, Heat that is given off directly to the wearer.
Damit die Wärme jedoch zu dem effektiv zu erwärmenden Objekt
gelangt, muss der Träger, obwohl elektrisch isolierend, gute
wärmeleitende Eigenschaften aufweisen. Deshalb wird in dieser
Publikation als Träger Berylliumoxid oder Aluminium-Nitrid
verwendet. Beide Materialien weisen zwar die geforderten Eigenschaften
auf, sie sind jedoch nicht sehr thermoschockresistent,
so dass Risse im Träger entstehen können. Diese Träger müssen
deshalb relativ klein bemessen werden. Typischerweise besitzen
sie eine Dicke von 1 mm und eine Querschnittsfläche von 2-5
cm2. Zudem müssen sie, damit sie durch Temperaturschwankungen
nicht zerstört werden, auf einem gut wärmeleitenden,
vorzugsweise metallischen Körper angeordnet werden, der die
erzeugte Warme aufnimmt und somit als sogenannte Wärmesenke
wirkt. Dieser Körper wird im allgemeinen durch eine massive
Platte gebildet.
Da der Träger und die metallische Wärmesenke sehr unterschiedliche
Warmeausdehnungskoeffizienten aufweisen, ist eine komplizierte
Halterung der Trägerplättchen auf der Wärmesenke
erforderlich. Die Halterung muss nämlich gewährleisten, dass
sich die Tragerplättchen gegenüber der Wärmesenke Bei
Temperaturveränderungen verschieben und trotzdem stets in gutem
Beruhrungskontakt mit ihr stehen können.However, in order for the heat to reach the object to be heated effectively, the support, although electrically insulating, must have good heat-conducting properties. For this reason, beryllium oxide or aluminum nitride is used as the carrier in this publication. Although both materials have the required properties, they are not very resistant to thermal shock, so that cracks can occur in the carrier. These carriers must therefore be dimensioned relatively small. They typically have a thickness of 1 mm and a cross-sectional area of 2-5 cm 2 . In addition, so that they are not destroyed by temperature fluctuations, they must be arranged on a heat-conducting, preferably metallic body which absorbs the heat generated and thus acts as a so-called heat sink. This body is generally formed by a solid plate.
Since the carrier and the metallic heat sink have very different coefficients of thermal expansion, a complicated mounting of the carrier plates on the heat sink is required. The bracket must ensure that the support plates move relative to the heat sink when the temperature changes and still be in good contact with it.
Die Verwendung von Berylliumoxid oder Aluminiumnitrid als Trägerplättchen weist noch weitere Nachteile auf. So ist Berylliumoxid stark toxisch und muss deshalb mit einer Schutzschicht überzogen werden. Gerade die Verwendung derartiger Heizelemente im Haushaltsbereich ist wegen ihrer toxischen Eigenschaften undenkbar. Aluminiumnitrid hingegen ist nicht heisswasserresistent. Auch dieses Heizelement müsste zumindest im Haushaltsbereich mit einer Schutzschicht überzogen werden. Beide Materialien weisen zudem eine geringe Schlagfestigkeit auf, sind also leicht beschädigbar.The use of beryllium oxide or aluminum nitride as Carrier platelets have other disadvantages. So is Beryllium oxide is highly toxic and therefore needs a protective layer be covered. Just the use of such Heating elements in the household is because of their toxic Properties unthinkable. However, aluminum nitride is not hot water resistant. This heating element would at least have to be covered with a protective layer in the household area. Both materials also have low impact resistance are easily damaged.
Diese Nachteile führen dazu, dass derartige Heizelemente klein ausgebildet sein müssen und stets mit einem massiven, gut wärmeleitenden und somit als Wärmesenke dienenden Träger gekoppelt werden müssen.These disadvantages make such heating elements small must be trained and always with a solid, good heat-conducting and thus serving as a heat sink must be coupled.
Ferner offenbart EP-A-069'298 eine Kochplatte mit einem
Kochplattenkörper aus einem dünnen Substrat aus Keramik, auf
deren Unterseite eine dünne Schicht aus Widerstandsmaterial
aufgedruckt ist.
US-A-4'652'727 beschreibt ein Heizelement, welches einen
gesinterten Körper aus einer Mischung einem elektrisch
leitenden Material wie Titaniumkarbid und einem elektrisch
isolierendem Material wie Siliziumnitrid besteht.
US-A-4'804'823 offenbart ein Heizelement, welches aus einem
Trägerelement und einer darin angeordneten Wärmequelle besteht.
Das Trägerelement ist durch einen gesinterten Körper gebildet
und die Wärmequelle besteht aus Titaniumnitrid.
In JP-A-3'025'880 ist ein Heizelement beschrieben, welches als
Infrarot-Miniaturheizquelle eingesetzt wird.Furthermore, EP-A-069'298 discloses a hotplate with a hotplate body made of a thin ceramic substrate, on the underside of which a thin layer of resistance material is printed.
US-A-4'652'727 describes a heating element which consists of a sintered body made of a mixture of an electrically conductive material such as titanium carbide and an electrically insulating material such as silicon nitride.
US-A-4,804,823 discloses a heating element which consists of a carrier element and a heat source arranged therein. The carrier element is formed by a sintered body and the heat source consists of titanium nitride.
JP-A-3'025'880 describes a heating element which is used as an infrared miniature heating source.
Es ist deshalb Aufgabe der Erfindung, ein elektrisches Heizelement zu schaffen, das obengenannte Nachteile behebt und das insbesondere als Wärmetauscher eingesetzt werden kann, der direkten Umwelteinflüssen ausgesetzbar ist. It is therefore an object of the invention to provide an electrical heating element to create that eliminates the above disadvantages and that can be used in particular as a heat exchanger is directly exposed to environmental influences.
Diese Aufgabe löst ein elektrisches Heizelement mit den Merkmalen
einer der Patentansprüche 1,2,3 oder 4.This task is solved by an electric heating element with the features
one of the
Weitere Ausführungsformen gehen aus den abhängigen Patentansprüchen hervor.Further embodiments emerge from the dependent patent claims forth.
Das erfindungsgemässe Heizelement weist den Vorteil auf, dass es nicht mehr mit einem weiteren als Wärmesenke dienenden massiven Träger gekoppelt werden muss, sondern dass es die erzeugte Wärme direkt an das zu erwärmende Objekt abgeben kann. Dadurch ist das Heizelement einerseits baulich vereinfacht und technisch besser realisierbar, andererseits ist der Wirkungsgrad erhöht. Zudem ist die Heizflächenbelastung für das erfindungsgemässe Heizelement in Bezug auf den plattenförmigen und massiven Träger zu betrachten und nicht wie bei den aus WO 91/10336 bekannten Heizelementen in Bezug auf die kleinen Trägerplättchen.The heating element according to the invention has the advantage that it no longer with another serving as a heat sink massive carrier must be coupled, but that it is the generated heat can give directly to the object to be heated. As a result, the heating element is structurally simplified on the one hand and technically more feasible, on the other hand, the efficiency elevated. In addition, the heating surface load for the invention Heating element in relation to the plate-shaped and massive bearers and not like those from WO 91/10336 known heating elements in relation to the small Carrier plates.
In einer bevorzugten Ausführungsform besteht der elektrisch
isolierende Träger aus Siliziumnitirid (Si3N4). Dieses Material
weist eine hohe Wärmeschockresistenz, eine hohe Schlagfestigkeit
und eine gute Heisswasserresistenz auf, ist gesundheitlich
unbedenklich, geht kaum chemische Reaktionen ein und ist
kratzfest. Zudem weist Siliziumnitrid ein optimales Verhalten
der Veränderung des elektrischen Widerstandes im Verhältnis der
Temperaturveränderung auf.
In einer anderen bevorzugten Ausführungsform besteht der
elektrisch isolierende Träger aus hochohmigen Siliziumkarbid
(SiC), das ebenfalls sehr gute mechanische, thermomechanische
wie auch chemische Eigenschaften aufweist. Der spezifische
elektrische Widerstand beträgt annähernd 1013 Ohm cm. Ein
Verfahren zur Herstellung eines derartigen Siliziumkarbid-Trägers
ist bekannt. Das Siliziumkarbid wird mittels einem
Flüssigphasensinter-Verfahren hergestellt, bei dem Aluminiumoxyd
und Yttriumoxyd als Sinteradditive zugegeben werden.
Wird das Heizelement jedoch lediglich für tiefe Temperaturen im
Bereich von 250°C eingesetzt, so kann der Träger auch aus
anderen elektrisch isolierenden Keramiken oder beispielsweise
aus Aluminiumoxid (Al2O3) bestehen. Diese Keramiken können bei
höheren Temperaturen auch eingesetzt werden, wenn die Erhitzung
und Abkühlung des Heizelementes kontrolliert und langsam
erfolgt, so dass kaum ein Thermoschock entstehen kann. In a preferred embodiment, the electrically insulating carrier consists of silicon nitride (Si 3 N 4 ). This material has high thermal shock resistance, high impact resistance and good hot water resistance, is harmless to health, hardly undergoes chemical reactions and is scratch-resistant. In addition, silicon nitride exhibits optimal behavior of the change in electrical resistance in relation to the change in temperature.
In another preferred embodiment, the electrically insulating carrier consists of high-resistance silicon carbide (SiC), which also has very good mechanical, thermomechanical and chemical properties. The specific electrical resistance is approximately 10 13 ohm cm. A method for producing such a silicon carbide carrier is known. The silicon carbide is produced by means of a liquid phase sintering process in which aluminum oxide and yttrium oxide are added as sintering additives. However, if the heating element is only used for low temperatures in the range of 250 ° C., the carrier can also consist of other electrically insulating ceramics or, for example, of aluminum oxide (Al 2 O 3 ). These ceramics can also be used at higher temperatures if the heating and cooling of the heating element is controlled and slow, so that thermal shock can hardly occur.
Die als Wärmequelle dienende Schicht oder Folie ist bevorzugterweise mäanderförmig und kann aus verschiedensten Materialien bestehen. Je nach Material wird die Schicht direkt auf den Träger mittels Sputterverfahren aufgebracht oder sie wird aufgedampft. In anderen Ausführungsformen wird zuerst eine Folie hergestellt und diese anschliessend mittels einem Anpressmittel an den Träger gepresst.The layer or foil serving as a heat source is preferably meandering and can be made from a wide variety Materials exist. Depending on the material, the layer becomes direct applied to the carrier by means of sputtering process or them is evaporated. In other embodiments, one is first Produced film and then using a Pressing means pressed against the carrier.
In den Figuren sind Ausführungsbeispiele des erfindungsgemässen Heizelementes dargestellt, die in der nachfolgenden Beschreibung erläutert werden. Es zeigen
Figur 1- ein beschichtetes Heizelement gemass der Erfindung in der Ansicht von unten dargestellt;
Figur 2- dasselbe Heizelement in Gebrauchslage als Kochplatte im Schnitt dargestellt und
Figur 3- eine Explosionsdarstellung eines Heizelementes mit einer Folie und einer Gegendruckplatte.
- Figure 1
- a coated heating element according to the invention shown in the view from below;
- Figure 2
- the same heating element shown in use as a hotplate in section and
- Figure 3
- an exploded view of a heating element with a film and a pressure plate.
Das hier schematisch dargestellte Heizelement weist die Form
einer kreisrunden Platte auf, wobei die Form durch einen
massiven Träger 1 bestimmt wird. Dieser Träger besteht aus
einer elektrisch isolierenden, jedoch wärmeleitenden Keramik,
bevorzugterweise aus Siliziumnitrid (Si3N4). Diese Platte weist
typischerweise eine Querschnittsfläche von 100 - 500 cm2 und
eine Dicke von 1 - 5 mm auf. Die Abmessungen variieren jedoch
je nach Anwendungsbereich, auf den später noch eingegangen
wird.The heating element shown schematically here has the shape of a circular plate, the shape being determined by a
Auf dem Träger 1 ist eine elektrisch leitende Schicht 2 aufgebracht.
Sie verläuft bevorzugterweise zur Optimierung des
elektrischen Widerstandes mäanderförmig über die gesamte Fläche
des Trägers 2. Diese elektrisch leitende Schicht besteht in
diesem Beispiel aus amorphem oder polykristallinen dotiertem
Silizium, wie bereits aus der Publikation WO 91/10336 bekannt.
Auch andere elektrisch leitende Schichten sind geeignet, wie
beispielsweise metallische Schichten, insbesondere aus Chrom,
Nickel, Chrom-Nickellegierungen, Titan oder Titannitrid. Die
Wahl des Materials der elektrisch leitenden Schicht hängt von
den vorgegebenen, je nach Anwendungsbereich verschiedenen Randbedingungen
ab.An electrically
Die elektrisch leitende Schicht 2 wird bevorzugterweise auf den
Träger 1 mittels Sputterverfahren aufgebracht oder sie wird
aufgedampft. In typischen Anwendungsbereichen beträgt ihre
Dicke zwischen einigen Zehntel und einigen Mikrometern. Die
elektrisch leitende Schicht 2 bildet die Wärmequelle. Sie ist
mit elektrischen Kontakten 3 versehen, die eine Verbindung zu
einer Spannungsquelle ermöglichen. Das Anbringen der
elektrischen Kontakte 3 ist vorallem bei Verwendung von
Siliziumnitrid als Träger 1 vereinfacht, da sie dann direkt auf
den Träger lötbar sind, wobei wegen der Hitzebeständigkeit von
Siliziumnitrid sogar Hartlötverfahren eingesetzt werden können. The electrically
Wird eine Spannung angelegt, so erzeugt die stromdurchflossene
Schicht 2 Wärme, die sogleich an den Träger 1 abgegeben wird.
Da dieser massiv ausgebildet ist und eine gute Wärmeschockresistenz
aufweist, kann er als Wärmesenke eingesetzt werden.
Dieser Träger nimmt nun die erzeugte Wärme auf und gibt sie an
das zu erwärmende Objekt weiter. Der Träger 1, insbesondere
wenn er aus Siliziumnitrid besteht, kann typischerweise bis zu
einer Temperatur von 650 °C erwärmt werden, ohne dass Langzeitschäden
am Material auftreten. Es sind jedoch Spitzentemperaturen
bis zu 1650°C möglich.If a voltage is applied, the current flows through it
Das erfindungsgemässe Heizelement eignet sich vorallem zur
Verwendung als Wärmetauscher, der direkten Umwelteinflüssen,
insbesondere Wasser, ausgesetzt ist. Ein spezieller Anwendungsbereich
ist die Verwendung als Kochplatte. In Figur 2 ist eine
derartige Kochplatte in Gebrauchslage dargestellt. Die als
Warmequelle dienende Schicht 2 befindet sich auf der Unterseite
des Trägers 1. Der Träger 1 selber bildet die Kochplatte. Da
der Träger aus Siliziumnitrid gefertigt ist, kann das zu
erwarmende Objekt, hier eine Pfanne P, direkt auf den Träger
gestellt werden. Der Träger 1 benötigt wegen seiner guten
Materialeigenschaften nicht einmal eine Schutzschicht. Auf der
Platte kann kaum etwas anbrennen, zudem kann der Träger mit
herkömmlichen Putzmitteln gereinigt werden, wobei auch
scheuernde Lappen eingesetzt werden können. Im Vergleich zu den
heute bekannten Glaskeramikherden weist die erfindungsgemässe
Kochplatte somit wesentliche Vorteile auf, nicht nur im
täglichen Gebrauch sondern auch in der Energiebilanz.
Testversuche haben gezeigt, dass bei Verwendung des
erfindungsgemässen Heizelementes zum Erhitzen von 1.5 Liter
Wasser bis zum Siedepunkt der Energieverbrauch bis zu 40%
reduziert wird.The heating element according to the invention is particularly suitable for
Use as a heat exchanger, the direct environmental influences,
especially water. A special area of application
is the use as a hotplate. In Figure 2 is one
such hotplate shown in the use position. As
Ein weiterer Anwendungsbereich ist die Verwendung als Wärmeplatte. Auch hier wird das zu erwärmende Objekt direkt auf den Träger gestellt und die elektrisch leitende Schicht befindet sich auf der Unterseite des Trägers. Da jedoch hier meistens in einem tieferen Temperaturbereich gearbeitet wird, muss der Träger nicht zwingend aus Siliziumnitrid gefertigt sein, sondern auch die Verwendung von anderen Keramiken wie Aluminiumoxid ist möglich.Another area of application is the use as a hot plate. Here, too, the object to be heated is directly on the Carrier placed and the electrically conductive layer is located itself on the bottom of the carrier. However, since here mostly in working in a lower temperature range, the Carriers are not necessarily made of silicon nitride, but also the use of other ceramics like Alumina is possible.
Je nach Anwendungsbereich können die Heizelemente auch sandwichartig
gestapelt werden. Wesentlich ist stets, dass der Träger
die Wärme direkt an das zu erwärmende Objekt, wie
beispielsweise eine Pfanne, weitergibt, ohne dass ein weiterer
massiver, wärmeleitender Träger dazwischen angeordnet ist.
In einer Ausführungsform ist die elektrisch leitende Schicht 2
mit einer weiteren Schicht aus Siliziumoxid (SiO2) oder
Siliziumnitrid (Si3N4) bedeckt sein, um Oxidationen zu
verhindern.
Um Wärmeverluste auf der nicht dem Träger zugewandten Seite zu
verhindern, kann die elektrisch leitende Schicht zudem mit
einer thermisch isolierenden Schicht überzogen sein.Depending on the application, the heating elements can also be stacked in a sandwich. It is always essential that the carrier transfers the heat directly to the object to be heated, such as a pan, for example, without another solid, heat-conducting carrier being arranged in between. In one embodiment, the electrically
In order to prevent heat losses on the side not facing the carrier, the electrically conductive layer can also be coated with a thermally insulating layer.
In einer weiteren in Figur 3 dargestellten Ausführungsform der
Erfindung besteht die mäanderförmige Heizquelle aus einer
Folie 2', die aus Metall oder einer Metallegierung gefertigt
ist. Bevorzugte Materialien sind Konstantan, Aluchrom,
Neusilber, Kupfer-Nickel-Legierungen und Stahl. Die Wahl des
Materiales hängt von der gewünschten Temperatur ab, die mit
dieser Heizquelle erzielt werden soll. Die Folie 2' weist je
nach Material und gewünschtes Temperaturverhalten eine Dicke
von 1 bis 100 Mikrometer auf. Diese Folie 2' ist selbst in
Maanderform selbsttragend, so dass sie getrennt vom Träger 1
hergestellt werden kann. In einem einfachen Herstellungsverfahren
wird sie gestanzt. Dadurch werden die Herstellungskosten
wesentlich gesenkt und die Produktion des Heizelementes
vereinfacht.In a further embodiment of the
Invention consists of the meandering heat source from a
Foil 2 'made of metal or a metal alloy
is. Preferred materials are Constantan, Aluchrom,
Nickel silver, copper-nickel alloys and steel. The choice of
Material depends on the desired temperature, which with
this heat source is to be achieved. The film 2 'each
a thickness depending on the material and the desired temperature behavior
from 1 to 100 microns. This slide 2 'is itself in
Maander form self-supporting, so that it is separated from the
Diese Folie 2' ist mittels einem Anpressmittel 4 vollständig am
Träger 1 angepresst. Dieses Anpressmittel 4 ist wie der Träger
1 plattenförmig und weist hier mindestens annähernd denselben
Durchmesser auf. Die mechanischen und thermischen Eigenschaften
des Anpressmittels müssen derart sein, dass eine vollständige
Anpressung der Folie 2' über den gesamten Temperaturbereich
gewährleistet ist. Das Anpressmittel 4 besteht bevorzugterweise
aus einem warmeisolierenden Material, insbesondere Quarz oder
Glas mit einem Warmeleitkoeffizienten von annähernd 1 W/mK.
Dadurch dient das Anpressmittel zugleich als Thermoisolation.
Es ist nicht zwingend, dass das Anpressmittel 4 elektrisch
isolierende Eigenschaften aufweist. Falls das Anpressmittel aus
elektrisch leitendem Material besteht, befindet sich zwischen
Folie 2' und Anpressmittel 4 eine hier nicht dargestellte
elektrische Isolationsschicht in Form von Isolationspapier oder
einer Isolationsplatte. This film 2 'is completely on by means of a pressing means 4
Ein weiterer Vorteil dieser Ausführungsform ist neben seiner
kostengünstigen und einfachen Herstellung, dass bei
Beschädigung der Heizquelle, also der Folie 2', diese einfach
entfernt werden kann und das teurere Bauteil, der Träger 1,
wiederverwendet werden kann.Another advantage of this embodiment is besides its
inexpensive and easy manufacture that at
Damage to the heat source, i.e. the film 2 ', this is easy
can be removed and the more expensive component, the
Claims (14)
- Electrical heating element having an electrically insulating, heat-conducting, plate-shaped support (1) made of ceramic material having an area of 100 to 500 cm2 and a thickness of 1 to 5 mm and a heat source in the shape of an electrically-conducting layer attached to the support and provided with electrical contacts, characterized in that the support (1) consists of high-resistance silicon carbide (SiC).
- Electrical heating element configured as a boiling plate having an electrically insulating, heat-conducting, plate-shaped support (1) made of ceramic material having an area of 100 to 500 cm2 and a thickness of 1 to 5 mm and a heat source in the shape of an electrically-conducting layer (2) attached to the support and provided with electrical contacts, characterized in that the support (1) consists of silicon nitride (Si3n4) except reaction-bound silicon nitride.
- Electrical heating element according to one of claims 1 to 2, characterized in that the heat source is an electrically-conducting self-supporting foil (2') provided with electrical contacts.
- Electrical heating element according to one of claims 1 to 3, characterized in that the conducting layer (2) or foil (2') extends meander-like on the support (1).
- Electrical heating element according to one of claims 1 to 4, characterized in that the thickness of the conducting layer (2) is 0.1 to 10 µm.
- Electrical heating element according to one of claims 1 to 5, characterized in that the conducting layer (2) consists of polycrystalline or amorphous doped silicon or of metal, preferably from the group containing chromium, nickel, titanium, titanium nitride or a chromium nickel alloy.
- Electrical heating element according to one of claims 1 to 6, characterized in that the conducting layer (2) is sputtered or evaporated onto the support (1).
- Electrical heating element according to one of claims 1 to 5, characterized in that the conducting foil (2') consists of metal or a metal alloy preferably of constantan, aluchrome, nickel silver or steel.
- Electrical heating element according to claim 8, characterized in that the thickness of the foil (2') is 1 to 100 µm.
- Electrical heating element according to claim 8, characterized in that the foil (2') is pressed against the support (1) by a pressure means (4).
- Electrical heating element according to claim 10, characterized in that the pressure means (4) consists of heat-insulating material, particularly quartz or glass, and is plate-shaped.
- Use of an electrical heating element according to one of claims 1 to 11 as a heat exchanger which is exposed to direct environmental influence, particularly to water.
- Use of an electrical heating element according to claim 1 as a boiling plate.
- Use of an electrical heating element according to claim 1 as a hot plate.
Applications Claiming Priority (10)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CH285494 | 1994-09-20 | ||
CH2854/94 | 1994-09-20 | ||
CH285494 | 1994-09-20 | ||
CH41495 | 1995-02-13 | ||
CH414/95 | 1995-02-13 | ||
CH41495 | 1995-02-13 | ||
CH2069/95 | 1995-07-13 | ||
CH206995 | 1995-07-13 | ||
CH206995 | 1995-07-13 | ||
PCT/CH1995/000208 WO1996009738A1 (en) | 1994-09-20 | 1995-09-19 | Electric heating element |
Publications (2)
Publication Number | Publication Date |
---|---|
EP0783830A1 EP0783830A1 (en) | 1997-07-16 |
EP0783830B1 true EP0783830B1 (en) | 1999-06-09 |
Family
ID=27172084
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
EP95930361A Revoked EP0783830B1 (en) | 1994-09-20 | 1995-09-19 | Electric heating element |
Country Status (7)
Country | Link |
---|---|
EP (1) | EP0783830B1 (en) |
AT (1) | ATE181199T1 (en) |
AU (1) | AU3378695A (en) |
DE (1) | DE59506182D1 (en) |
DK (1) | DK0783830T3 (en) |
ES (1) | ES2135084T3 (en) |
WO (1) | WO1996009738A1 (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP1130006A1 (en) | 2000-02-24 | 2001-09-05 | Wacker-Chemie GmbH | Coated silicon nitride article |
Families Citing this family (13)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE19617319A1 (en) * | 1996-04-19 | 1997-10-23 | Inter Control Koehler Hermann | Procedure for controlling heat from electric kitchen stove having cooking and/or grilling plate |
SE506968C2 (en) * | 1996-07-25 | 1998-03-09 | Electrolux Ab | Ceramic hob and process for making film layer coating |
DE29702813U1 (en) | 1997-01-10 | 1997-05-22 | E.G.O. Elektro-Gerätebau Gmbh, 75038 Oberderdingen | Contact heat transferring cooking system with an electric hotplate |
EP0853444B1 (en) * | 1997-01-10 | 2005-11-23 | E.G.O. ELEKTRO-GERÄTEBAU GmbH | Cooking system with an electric cooking-plate, transferring heat by conduction |
DE19814949C2 (en) * | 1997-05-07 | 2002-04-18 | Aeg Hausgeraete Gmbh | Cooking equipment with induction heating and resistance heating |
DE19746845C1 (en) * | 1997-10-23 | 1998-12-03 | Schott Glas | Ceramic heating element for electric cooking hob |
DE19746844C1 (en) * | 1997-10-23 | 1998-12-03 | Schott Glas | Ceramic heating element for electric cooking hob |
US6037574A (en) * | 1997-11-06 | 2000-03-14 | Watlow Electric Manufacturing | Quartz substrate heater |
DE19813996A1 (en) * | 1998-03-28 | 1999-10-07 | Aeg Hausgeraete Gmbh | Cooker with structure for heating both by induction and resistance |
DE19820108C2 (en) * | 1998-05-06 | 2001-03-15 | Schott Glas | Arrangement of a heat-conducting ceramic carrier with a heating element as a cooking zone in a recess in a cooking surface |
US8481896B2 (en) * | 2009-12-08 | 2013-07-09 | Phillip G. Quinton, Jr. | Heater plate with embedded hyper-conductive thermal diffusion layer for increased temperature rating and uniformity |
CN105509488B (en) * | 2015-12-23 | 2017-09-12 | 西安超码科技有限公司 | A kind of immersion ceramic resistor inner heating device |
DE102016113815A1 (en) * | 2016-07-27 | 2018-02-01 | Heraeus Noblelight Gmbh | Infrared surface radiator and method for producing the infrared surface radiator |
Family Cites Families (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE3126989A1 (en) * | 1981-07-08 | 1983-01-27 | E.G.O. Elektro-Geräte Blanc u. Fischer, 7519 Oberderdingen | COOKING PLATE |
JPH0628248B2 (en) * | 1984-04-20 | 1994-04-13 | 富士通株式会社 | Two-stage diffusion furnace |
JPH0719643B2 (en) * | 1984-10-26 | 1995-03-06 | 日本電装株式会社 | Ceramic heater and method for producing the same |
JPS60166469A (en) * | 1985-01-21 | 1985-08-29 | Tdk Corp | Thermal head |
US4804823A (en) * | 1986-07-31 | 1989-02-14 | Kyocera Corporation | Ceramic heater |
JPS63278203A (en) * | 1987-05-09 | 1988-11-15 | Oki Electric Ind Co Ltd | Heating resistor |
JPS63278201A (en) * | 1987-05-09 | 1988-11-15 | Oki Electric Ind Co Ltd | Heating resistor |
JP2778598B2 (en) * | 1989-06-23 | 1998-07-23 | 東京エレクトロン株式会社 | Heating method and heating device |
-
1995
- 1995-09-19 EP EP95930361A patent/EP0783830B1/en not_active Revoked
- 1995-09-19 DK DK95930361T patent/DK0783830T3/en active
- 1995-09-19 ES ES95930361T patent/ES2135084T3/en not_active Expired - Lifetime
- 1995-09-19 AU AU33786/95A patent/AU3378695A/en not_active Abandoned
- 1995-09-19 AT AT95930361T patent/ATE181199T1/en not_active IP Right Cessation
- 1995-09-19 WO PCT/CH1995/000208 patent/WO1996009738A1/en active IP Right Grant
- 1995-09-19 DE DE59506182T patent/DE59506182D1/en not_active Revoked
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP1130006A1 (en) | 2000-02-24 | 2001-09-05 | Wacker-Chemie GmbH | Coated silicon nitride article |
Also Published As
Publication number | Publication date |
---|---|
AU3378695A (en) | 1996-04-09 |
ATE181199T1 (en) | 1999-06-15 |
ES2135084T3 (en) | 1999-10-16 |
EP0783830A1 (en) | 1997-07-16 |
WO1996009738A1 (en) | 1996-03-28 |
DE59506182D1 (en) | 1999-07-15 |
DK0783830T3 (en) | 1999-12-27 |
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