EP0411966A3 - Position detection method and apparatus - Google Patents

Position detection method and apparatus Download PDF

Info

Publication number
EP0411966A3
EP0411966A3 EP19900308601 EP90308601A EP0411966A3 EP 0411966 A3 EP0411966 A3 EP 0411966A3 EP 19900308601 EP19900308601 EP 19900308601 EP 90308601 A EP90308601 A EP 90308601A EP 0411966 A3 EP0411966 A3 EP 0411966A3
Authority
EP
European Patent Office
Prior art keywords
detection method
position detection
detection
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
EP19900308601
Other versions
EP0411966B1 (en
EP0411966A2 (en
Inventor
Masakazu Matsugu
Kenji Saitoh
Mitsutoshi Ohwada
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from JP1203053A external-priority patent/JP2791120B2/en
Priority claimed from JP2136827A external-priority patent/JP2874284B2/en
Application filed by Canon Inc filed Critical Canon Inc
Publication of EP0411966A2 publication Critical patent/EP0411966A2/en
Publication of EP0411966A3 publication Critical patent/EP0411966A3/en
Application granted granted Critical
Publication of EP0411966B1 publication Critical patent/EP0411966B1/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7073—Alignment marks and their environment
    • G03F9/7076—Mark details, e.g. phase grating mark, temporary mark
EP90308601A 1989-08-04 1990-08-03 Position detection method and apparatus Expired - Lifetime EP0411966B1 (en)

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
JP203053/89 1989-08-04
JP1203053A JP2791120B2 (en) 1989-08-04 1989-08-04 Position detecting device and method
JP136827/90 1990-05-25
JP2136827A JP2874284B2 (en) 1990-05-25 1990-05-25 Interval measuring device

Publications (3)

Publication Number Publication Date
EP0411966A2 EP0411966A2 (en) 1991-02-06
EP0411966A3 true EP0411966A3 (en) 1991-04-17
EP0411966B1 EP0411966B1 (en) 1994-11-02

Family

ID=26470322

Family Applications (1)

Application Number Title Priority Date Filing Date
EP90308601A Expired - Lifetime EP0411966B1 (en) 1989-08-04 1990-08-03 Position detection method and apparatus

Country Status (3)

Country Link
US (1) US5114236A (en)
EP (1) EP0411966B1 (en)
DE (1) DE69013790T2 (en)

Families Citing this family (52)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5319444A (en) * 1988-02-16 1994-06-07 Canon Kabushiki Kaisha Position detecting method and apparatus
JP2890943B2 (en) * 1990-11-30 1999-05-17 キヤノン株式会社 Position detecting method and position detecting device using the same
JP2796899B2 (en) * 1991-02-16 1998-09-10 住友重機械工業株式会社 Illumination method for band light and multicolor light in a chromatic aberration double focus device
JPH0540013A (en) * 1991-08-05 1993-02-19 Canon Inc Deviation measuring method and exposing device using it
JPH0590126A (en) * 1991-09-27 1993-04-09 Canon Inc Position detection equipment
CA2078732A1 (en) * 1991-09-27 1993-03-28 Koichi Sentoku Displacement measuring device and displacement measuring method
JP3187093B2 (en) * 1991-09-27 2001-07-11 キヤノン株式会社 Position shift measuring device
JP3008654B2 (en) * 1992-02-21 2000-02-14 キヤノン株式会社 Position detection device
JP2833908B2 (en) * 1992-03-04 1998-12-09 山形日本電気株式会社 Positioning device in exposure equipment
US5585923A (en) * 1992-11-14 1996-12-17 Canon Kabushiki Kaisha Method and apparatus for measuring positional deviation while correcting an error on the basis of the error detection by an error detecting means
US5455679A (en) * 1993-02-22 1995-10-03 Canon Kabushiki Kaisha Position detecting system
JPH06311315A (en) * 1993-04-26 1994-11-04 Canon Inc Picture reader
JP3428705B2 (en) * 1993-10-20 2003-07-22 キヤノン株式会社 Position detecting device and method of manufacturing semiconductor device using the same
US5625453A (en) * 1993-10-26 1997-04-29 Canon Kabushiki Kaisha System and method for detecting the relative positional deviation between diffraction gratings and for measuring the width of a line constituting a diffraction grating
JP3379200B2 (en) * 1994-03-25 2003-02-17 株式会社ニコン Position detection device
US5469263A (en) * 1994-07-01 1995-11-21 Motorola, Inc. Method for alignment in photolithographic processes
KR0132269B1 (en) * 1994-08-24 1998-04-11 이대원 Alignment apparatus of stepper and control method therefor
JPH0886612A (en) * 1994-09-19 1996-04-02 Canon Inc Positional shift-detecting apparatus utilizing optical heterodyne interference
JPH1022213A (en) * 1996-06-28 1998-01-23 Canon Inc Position detector and manufacture of device using it
JPH11241908A (en) * 1997-12-03 1999-09-07 Canon Inc Position detecting apparatus and manufacture of device employing the same
US5939611A (en) * 1998-02-24 1999-08-17 Data I/O Corporation Method and system for calibrating a device handler
US6130902A (en) * 1998-05-26 2000-10-10 Shimoji; Yutaka Solid state laser chip
US6312373B1 (en) * 1998-09-22 2001-11-06 Nikon Corporation Method of manufacturing an optical system
JP3019095B1 (en) * 1998-12-22 2000-03-13 日本電気株式会社 Manufacturing method of organic thin film EL device
JP2003007601A (en) * 2001-06-26 2003-01-10 Canon Inc Method of measuring interval between two objects, method of exposing semiconductor using the same, interval measuring instrument, and semiconductor exposure system
DE10151216A1 (en) * 2001-10-16 2003-04-24 Zeiss Carl Jena Gmbh Method for the optical detection of characteristic quantities of an illuminated sample
KR100632889B1 (en) * 2002-09-20 2006-10-13 에이에스엠엘 네델란즈 비.브이. Alignment system and methods for lithographic systems using at least two wavelengths
CN100390502C (en) * 2003-03-12 2008-05-28 中国科学院沈阳自动化研究所 Measuring method for precision parallelism
JPWO2004107415A1 (en) * 2003-05-28 2006-07-20 株式会社ニコン Position information measuring method and apparatus, and exposure method and apparatus
US7247952B2 (en) * 2003-10-30 2007-07-24 Hewlett-Packard Development Company, L.P. Optical targets
US7573580B2 (en) * 2003-11-17 2009-08-11 Asml Holding N.V. Optical position measuring system and method using a low coherence light source
US8422027B2 (en) * 2010-06-08 2013-04-16 Nikon Corporation Imaging optical system for producing control information regarding lateral movement of an image plane or an object plane
DE102012221566A1 (en) * 2012-11-26 2014-05-28 Dr. Johannes Heidenhain Gmbh Optical position measuring device
JP2014220263A (en) * 2013-04-30 2014-11-20 キヤノン株式会社 Lithographic apparatus and method for manufacturing article
WO2015008365A1 (en) * 2013-07-18 2015-01-22 ギガフォトン株式会社 Exposure device
FR3014212B1 (en) * 2013-12-04 2017-05-26 Fogale Nanotech DEVICE AND METHOD FOR POSITIONING PHOTOLITHOGRAPHY MASK BY OPTICAL NON-CONTACT METHOD
US10254942B2 (en) 2014-07-31 2019-04-09 Microsoft Technology Licensing, Llc Adaptive sizing and positioning of application windows
US10678412B2 (en) 2014-07-31 2020-06-09 Microsoft Technology Licensing, Llc Dynamic joint dividers for application windows
US10592080B2 (en) 2014-07-31 2020-03-17 Microsoft Technology Licensing, Llc Assisted presentation of application windows
US11086216B2 (en) 2015-02-09 2021-08-10 Microsoft Technology Licensing, Llc Generating electronic components
US9513480B2 (en) 2015-02-09 2016-12-06 Microsoft Technology Licensing, Llc Waveguide
US10317677B2 (en) 2015-02-09 2019-06-11 Microsoft Technology Licensing, Llc Display system
US9827209B2 (en) 2015-02-09 2017-11-28 Microsoft Technology Licensing, Llc Display system
US10018844B2 (en) 2015-02-09 2018-07-10 Microsoft Technology Licensing, Llc Wearable image display system
US9535253B2 (en) 2015-02-09 2017-01-03 Microsoft Technology Licensing, Llc Display system
US9372347B1 (en) 2015-02-09 2016-06-21 Microsoft Technology Licensing, Llc Display system
US9429692B1 (en) 2015-02-09 2016-08-30 Microsoft Technology Licensing, Llc Optical components
US9423360B1 (en) * 2015-02-09 2016-08-23 Microsoft Technology Licensing, Llc Optical components
WO2016204878A1 (en) * 2015-06-15 2016-12-22 Zygo Corporation Displacement measurement of deformable bodies
JP6686564B2 (en) * 2016-03-11 2020-04-22 コニカミノルタ株式会社 Image reader
US10607873B2 (en) 2016-03-30 2020-03-31 Asml Netherlands B.V. Substrate edge detection
CN116830155A (en) * 2020-05-11 2023-09-29 康耐视公司 Method and device for extracting contour from three-dimensional image

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2598797A1 (en) * 1986-05-07 1987-11-20 Nippon Telegraph & Telephone Method for measuring and/or adjusting the displacement of an object and apparatus for implementing this method
EP0302178A2 (en) * 1987-08-07 1989-02-08 Sumitomo Heavy Industries, Ltd Position sensor
EP0323242A2 (en) * 1987-12-28 1989-07-05 Kabushiki Kaisha Toshiba Method and apparatus for aligning two objects, and method and apparatus for providing a desired gap between two objects

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4037969A (en) * 1976-04-02 1977-07-26 Bell Telephone Laboratories, Incorporated Zone plate alignment marks
US4326805A (en) * 1980-04-11 1982-04-27 Bell Telephone Laboratories, Incorporated Method and apparatus for aligning mask and wafer members
US4355892A (en) * 1980-12-18 1982-10-26 Censor Patent- Und Versuchs-Anstalt Method for the projection printing
US4398824A (en) * 1981-04-15 1983-08-16 Bell Telephone Laboratories, Incorporated Wafer tilt compensation in zone plate alignment system
JPS5979527A (en) * 1982-10-29 1984-05-08 Hitachi Ltd Pattern detector
US4514858A (en) * 1983-03-15 1985-04-30 Micronix Partners Lithography system
JPH0732109B2 (en) * 1983-10-07 1995-04-10 株式会社日立製作所 Light exposure method
US4748333A (en) * 1986-03-31 1988-05-31 Nippon Kogaku K. K. Surface displacement sensor with opening angle control
US4814829A (en) * 1986-06-12 1989-03-21 Canon Kabushiki Kaisha Projection exposure apparatus
JPS63220521A (en) * 1987-03-10 1988-09-13 Canon Inc Focusing device
US4857744A (en) * 1987-07-29 1989-08-15 Hitachi, Ltd. Optical projection printing apparatus wherein wafer mark has a grating pitch in the sagittal plane of the first optical system

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2598797A1 (en) * 1986-05-07 1987-11-20 Nippon Telegraph & Telephone Method for measuring and/or adjusting the displacement of an object and apparatus for implementing this method
EP0302178A2 (en) * 1987-08-07 1989-02-08 Sumitomo Heavy Industries, Ltd Position sensor
EP0323242A2 (en) * 1987-12-28 1989-07-05 Kabushiki Kaisha Toshiba Method and apparatus for aligning two objects, and method and apparatus for providing a desired gap between two objects

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
OPTICAL ENGINEERING. vol. 22, no. 2, April 1983, BELLINGHAM US pages 203 - 207; M.FELDMAN, ET.AL.: "APPLICATION OF ZONE PLATES TO ALIGNMENT IN X-RAY LITHOGRAPHY" *

Also Published As

Publication number Publication date
DE69013790T2 (en) 1995-05-04
EP0411966B1 (en) 1994-11-02
EP0411966A2 (en) 1991-02-06
DE69013790D1 (en) 1994-12-08
US5114236A (en) 1992-05-19

Similar Documents

Publication Publication Date Title
EP0411966A3 (en) Position detection method and apparatus
GB2237412B (en) Method and apparatus for advance edge detection
EP0430226A3 (en) Method and device for detecting approaching objects
IL91491A0 (en) Displacement detector device and method
GB2229536B (en) Signal processing apparatus and method
EP0582320A3 (en) Measuring apparatus and method
GB2286248B (en) Detection method and apparatus
GB2235355B (en) Method and apparatus for detecting cursors
GB2289344B (en) Detection method and apparatus
GB8912219D0 (en) Sensing apparatus and method
EP0413576A3 (en) Method and apparatus for motion detection
EP0499876A3 (en) Position detecting apparatus and method
ZA90765B (en) Signal processing apparatus and method
GB8829909D0 (en) Discrimination method and apparatus therefor
GB8912240D0 (en) Apparatus and method
GB9013398D0 (en) Signal processing apparatus and method
GB8904718D0 (en) Detection apparatus and methods
EP0428391A3 (en) Method and apparatus for beautificating drawings
EP0333326A3 (en) Position detecting method and apparatus
GB2228158B (en) Detection method and apparatus
GB9025071D0 (en) Method and apparatus
GB2200206B (en) Detection apparatus and method
EP0488613A3 (en) Motion detection method and its apparatus
GB8906235D0 (en) Flame detection apparatus and method
GB2230698B (en) Explosive-screening apparatus and method

Legal Events

Date Code Title Description
PUAI Public reference made under article 153(3) epc to a published international application that has entered the european phase

Free format text: ORIGINAL CODE: 0009012

AK Designated contracting states

Kind code of ref document: A2

Designated state(s): DE FR GB NL

PUAL Search report despatched

Free format text: ORIGINAL CODE: 0009013

17P Request for examination filed

Effective date: 19901231

AK Designated contracting states

Kind code of ref document: A3

Designated state(s): DE FR GB NL

17Q First examination report despatched

Effective date: 19930427

GRAA (expected) grant

Free format text: ORIGINAL CODE: 0009210

AK Designated contracting states

Kind code of ref document: B1

Designated state(s): DE FR GB NL

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: FR

Effective date: 19941102

REF Corresponds to:

Ref document number: 69013790

Country of ref document: DE

Date of ref document: 19941208

EN Fr: translation not filed
PLBE No opposition filed within time limit

Free format text: ORIGINAL CODE: 0009261

STAA Information on the status of an ep patent application or granted ep patent

Free format text: STATUS: NO OPPOSITION FILED WITHIN TIME LIMIT

26N No opposition filed
REG Reference to a national code

Ref country code: GB

Ref legal event code: IF02

PGFP Annual fee paid to national office [announced via postgrant information from national office to epo]

Ref country code: DE

Payment date: 20080831

Year of fee payment: 19

Ref country code: NL

Payment date: 20080819

Year of fee payment: 19

PGFP Annual fee paid to national office [announced via postgrant information from national office to epo]

Ref country code: GB

Payment date: 20080814

Year of fee payment: 19

REG Reference to a national code

Ref country code: NL

Ref legal event code: V1

Effective date: 20100301

GBPC Gb: european patent ceased through non-payment of renewal fee

Effective date: 20090803

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: DE

Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES

Effective date: 20100302

Ref country code: NL

Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES

Effective date: 20100301

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: GB

Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES

Effective date: 20090803