EP0385205A1 - Dispositif de radiation à haute puissance - Google Patents
Dispositif de radiation à haute puissance Download PDFInfo
- Publication number
- EP0385205A1 EP0385205A1 EP90103082A EP90103082A EP0385205A1 EP 0385205 A1 EP0385205 A1 EP 0385205A1 EP 90103082 A EP90103082 A EP 90103082A EP 90103082 A EP90103082 A EP 90103082A EP 0385205 A1 EP0385205 A1 EP 0385205A1
- Authority
- EP
- European Patent Office
- Prior art keywords
- dielectric
- radiator according
- power radiator
- discharge
- electrode
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
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Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J65/00—Lamps without any electrode inside the vessel; Lamps with at least one main electrode outside the vessel
- H01J65/04—Lamps in which a gas filling is excited to luminesce by an external electromagnetic field or by external corpuscular radiation, e.g. for indicating plasma display panels
- H01J65/042—Lamps in which a gas filling is excited to luminesce by an external electromagnetic field or by external corpuscular radiation, e.g. for indicating plasma display panels by an external electromagnetic field
- H01J65/046—Lamps in which a gas filling is excited to luminesce by an external electromagnetic field or by external corpuscular radiation, e.g. for indicating plasma display panels by an external electromagnetic field the field being produced by using capacitive means around the vessel
Definitions
- the invention relates to a high-power radiator, in particular for ultraviolet light, with a discharge space filled with filling gas emitting radiation under discharge conditions, the walls of which are formed by a first tubular and a second dielectric, which have first and second electrodes on its surfaces facing away from the discharge space with an AC power source connected to the first and second electrodes for feeding the discharge.
- the invention relates to a state of the art, such as that derived from EP-A 054 111, US patent application 07/076 926 or EP patent application 88113393.3 from August 22, 1988 or US patent application 07 / 260,869 from October 21, 1988.
- UV sources The industrial use of photochemical processes depends heavily on the availability of suitable UV sources.
- the classic UV lamps deliver low to medium UV intensities at some discrete wavelengths, such as the low-pressure mercury lamps at 185 nm and especially at 254 nm.
- Really high UV powers can only be obtained from high-pressure lamps (Xe, Hg), which then but their radiation over you distribute a larger wavelength range.
- the new excimer lasers have provided some new wavelengths for basic photochemical experiments. for cost reasons for an industrial process probably only suitable in exceptional cases.
- the high-performance radiators mentioned are characterized by high efficiency, economical structure and enable the creation of large area radiators, with the restriction that large-area flat radiators require a rather large technical effort.
- omnidirectional radiators on the other hand, a not inconsiderable proportion of the radiation due to the shadow effect of the inner electrode is not used.
- the invention has for its object to provide a high-performance radiator, in particular for UV or VUV radiation, which is characterized in particular by high efficiency, is economical to manufacture, enables the construction of very large area radiators and in which the Shadow effect of the inner electrode (s) is reduced to a minimum.
- a rod made of dielectric material is arranged within the first tubular dielectric, inside which an electrical conductor is inserted or embedded, which conductor forms the second electrode.
- the outer diameter of the rod which is preferably made of quartz glass, is preferably five to ten times smaller than the inner diameter of the outer tube.
- the radiation should preferably be coupled out in one direction, for example in order to irradiate a surface.
- the ideal discharge geometry for this purpose is a flat radiator mirrored on the back (for example according to EP-A-0254 111).
- the production of flat quartz cells is associated with great technical effort and correspondingly high costs.
- One can easily achieve a preferred direction of the radiation if the discharge is distributed unevenly in the discharge gap, which can be achieved most simply by an eccentric arrangement of the dielectric rod. It is thereby achieved that the electrical discharge takes place predominantly on the side on which the optical radiation is to be coupled out.
- the layer simultaneously serving as an electrode and reflector is sufficient, the layer simultaneously serving as an electrode and reflector.
- Aluminum which is provided with a suitable protective layer (anodized, MgF2 coating), is a suitable material that is both easy to vaporize and has a high UV reflection.
- the (semi-cylindrical) recesses in the aluminum block also serve as a holder for the quartz discharge tubes, as an (earth) electrode and as a reflector. Any number of these discharge tubes can be connected in parallel by placing the internal electrodes on a common AC voltage source. For special applications you can combine tubes with different gas filling and therefore different (UV) wavelengths.
- the aluminum blocks described do not necessarily have to have flat surfaces. One can also imagine cylindrical arrangements in which the recesses for receiving the discharge tubes are either outside or inside.
- the individual gas discharge tubes can also be cooled if, for example, forms the inner electrode as a cooling channel.
- UV treatment in the absence of air is indicated.
- the first reason is when the radiation is so short-wave that it is absorbed by air and thus weakened (wavelengths ⁇ 190 nm). This radiation leads to the splitting of oxygen and thus to the un wanted ozone formation.
- the second reason is when the intended photochemical effect of UV radiation is hindered by the presence of oxygen (oxygen inhibition). This occurs, for example, in the photo crosslinking (UV polymerization, UV drying) of paints and inks.
- a quartz tube 1 with a wall thickness of approximately 0.5 to 1.5 mm and an outer diameter of approximately 20 to 30 mm is provided with an outer electrode 2 in the form of a wire mesh.
- a second quartz tube 3 is arranged concentrically in the quartz tube 1 and has a substantially smaller outside diameter than the inside diameter of the quartz tube 1, typically 3 to 5 mm outside diameter.
- a wire 4 is inserted into the inner quartz tube 3. This forms the inner electrode of the radiator, the wire mesh 2 the outer electrode of the radiator.
- the outer quartz tube 1 is closed at both ends.
- the space between the two tubes 1 and 3, the discharge space 5, is filled with a gas / gas mixture which emits radiation under discharge conditions.
- the two electrodes 2, 4 are connected to the two poles of an alternating current source 6.
- the AC power source basically corresponds to those used to feed ozone generators. Typically, it supplies an adjustable AC voltage in the order of magnitude of several 100 volts to 20,000 volts at frequencies in the range of technical alternating current up to a few 1000 kHz - depending on the electrode geometry, pressure in the discharge space and composition of the filling gas.
- the fill gas is e.g. Mercury, noble gas, noble gas-metal vapor mixture, noble gas-halogen mixture, optionally using an additional further noble gas, preferably Ar, He, Ne, as a buffer gas.
- a substance / substance mixture according to the following table can be used: Filling gas radiation helium 60-100 nm neon 80 - 90 nm argon 107 - 165 nm Argon + fluorine 180-200 nm Argon + chlorine 165-190 nm Argon + krypton + chlorine 165-190, 200-240 nm xenon 160-190 nm nitrogen 337 - 415 nm krypton 124, 140-160 nm Krypton + fluorine 240 - 255 nm Krypton + chlorine 200-240 nm mercury 185, 254, 320-370, 390-420 nm selenium 196, 204, 206 nm deuterium 150-250 nm Xenon + fluorine 340 - 360 nm, 400 - 550 nm Xenon + chlorine 300-320 nm
- a noble gas Ar, He, Kr, Ne, Xe
- Hg A gas or vapor from F2, J2, Br2, Cl2 or a compound that splits off one or more atoms F, J, Br or Cl in the discharge
- An inert gas Ar, He, Kr, Ne, Xe
- Hg an inert gas
- Ar, He, Kr, Ne, Xe an inert gas with Hg.
- the electron energy distribution can be optimally adjusted by the thickness of the dielectrics and their properties, pressure and / or temperature in the discharge space.
- quartz rods into which a metal wire is melted can also be used.
- Metal rods covered with a dielectric also lead to success.
- a perforated metal foil or a UV-transparent, electrically conductive covering can also be used.
- the discharge is distributed unevenly in the discharge space.
- the easiest way to do this is by eccentrically arranging the inner dielectric tube 3 in the outer tube 1, as is illustrated in FIG. 2, for example.
- the inner quartz tube 3 is arranged outside the center near the inner wall of the tube 1. In the borderline case, the pipe 3 can even rest against the pipe 1 and be glued there linearly or selectively to the inner wall.
- the eccentric arrangement of the inner quartz tube and thus the inner electrode 4 has no decisive influence on the quality of the discharge.
- the peak voltage is set just a small area ignites in the immediate vicinity of the quartz tube 3.
- By increasing the voltage one can gradually increase the discharge zone until the entire discharge space 5 is filled with luminous plasma.
- an electrode 2 (FIG. 2) applied to the entire outer circumference of the outer dielectric tube 1 (FIG. 2) is sufficient also a partial coating of the outer surface of the tube 1, as illustrated in Figure 3.
- an eccentric arrangement of the inner quartz tube 3 is also possible here, the coating 7 only extending symmetrically over the outer wall section facing the inner quartz tube 3. This layer 7 is simultaneously the outer electrode and the reflector.
- Aluminum is particularly suitable as a material that is both easy to vaporize and has a high UV reflection.
- FIG. 5 illustrates the manner in which a multiplicity of concentric radiators according to FIG. 3 can be combined to form a surface radiator.
- 6 shows a corresponding arrangement with eccentrically arranged inner quartz tubes 3 according to FIG.
- an aluminum body 8 is provided with a plurality of parallel grooves 9 with a circular cross section, which are spaced apart from one another by more than one outer tube diameter.
- the grooves 9 are adapted to the outer quartz tubes 1 and treated by polishing or the like so that they reflect well. Additional bores 10, which run in the direction of the tubes 1, serve to cool the radiators.
- the AC source 6 leads with one pole to the aluminum body 8, the inner electrodes 4 of the radiators are connected in parallel and connected to the other pole of the source 6.
- the groove walls serve both as an outer electrode and as reflectors.
- single emitters can be combined with different gas fillings and thus different (UV) wavelengths.
- the aluminum bodies 8 do not necessarily have to have flat surfaces.
- E.g. 7 and 8 illustrate a variant with a hollow cylindrical aluminum body 8a with axially parallel grooves 9 regularly distributed over its inner circumference, in each of which a radiator element according to FIGS. 3 and 4 is inserted.
- the radiator according to Fig. 9 basically corresponds to that according to Fig. 5. with additional channels 11 running in the longitudinal direction of the metal block 8. These channels are connected to the treatment room 12 via a multiplicity of bores or slots 13 in the metal block 8, specifically via the comparatively narrow gap between the outer ones, which is caused by inevitable manufacturing tolerances of the quartz tubes 1 Quartz tubes 1 and the grooves 9 in the metal block 8 in connection.
- the channels 11 are connected to an inert gas source, not shown, e.g. Nitrogen or argon source connected.
- the pressurized inert gas reaches the treatment room 12 from the channels 11 in the manner described. This treatment room is delimited on the one hand by legs 14 on the metal block 8 and by the substrate 15 to be irradiated.
- FIG. 9 A further possibility of supplying inert gas to the treatment room 12 is illustrated in FIG.
- the emitter largely corresponds to that according to Fig. 6.
- Metal blocks 8 extending channels 11 are provided, which are connected directly to the treatment room 12 via bores or slots 13. Otherwise the structure and mode of operation correspond to those according to Fig. 9.
- the cylinder emitters according to FIGS. 7 and 8 can also be provided with means for supplying inert gas to the treatment room (there the inside of the tube 8a) without leaving the scope of the invention.
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- Physics & Mathematics (AREA)
- Electromagnetism (AREA)
- Engineering & Computer Science (AREA)
- Plasma & Fusion (AREA)
- Physical Or Chemical Processes And Apparatus (AREA)
- Superconductors And Manufacturing Methods Therefor (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
AT90103082T ATE98050T1 (de) | 1989-02-27 | 1990-02-17 | Hochleistungsstrahler. |
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CH720/89 | 1989-02-27 | ||
CH720/89A CH677292A5 (fr) | 1989-02-27 | 1989-02-27 |
Publications (2)
Publication Number | Publication Date |
---|---|
EP0385205A1 true EP0385205A1 (fr) | 1990-09-05 |
EP0385205B1 EP0385205B1 (fr) | 1993-12-01 |
Family
ID=4193615
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
EP90103082A Expired - Lifetime EP0385205B1 (fr) | 1989-02-27 | 1990-02-17 | Dispositif de radiation à haute puissance |
Country Status (6)
Country | Link |
---|---|
US (1) | US5013959A (fr) |
EP (1) | EP0385205B1 (fr) |
JP (1) | JP2823637B2 (fr) |
AT (1) | ATE98050T1 (fr) |
CH (1) | CH677292A5 (fr) |
DE (1) | DE59003641D1 (fr) |
Cited By (13)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0458140A1 (fr) * | 1990-05-22 | 1991-11-27 | Heraeus Noblelight GmbH | Radiateur à haute puissance |
EP0482230A1 (fr) * | 1990-10-22 | 1992-04-29 | Heraeus Noblelight GmbH | Dispositif de rayonnement à haute puissance |
EP0489184A1 (fr) * | 1990-12-03 | 1992-06-10 | Heraeus Noblelight GmbH | Dispositif de rayonnement à haute puissance |
EP0497360A2 (fr) * | 1991-02-01 | 1992-08-05 | Hughes Aircraft Company | Système d'éclairage fluorescent à RF |
EP0517929A1 (fr) * | 1991-06-01 | 1992-12-16 | Heraeus Noblelight GmbH | Dispositif d'irradiation avec un radiateur à haute puissance |
EP0521553A2 (fr) * | 1991-07-01 | 1993-01-07 | Koninklijke Philips Electronics N.V. | Lampe à décharge luminescente à haute pression |
DE4140497A1 (de) * | 1991-12-09 | 1993-06-17 | Asea Brown Boveri | Hochleistungsstrahler |
DE4235743A1 (de) * | 1992-10-23 | 1994-04-28 | Heraeus Noblelight Gmbh | Hochleistungsstrahler |
DE4430300C1 (de) * | 1994-08-26 | 1995-12-21 | Abb Research Ltd | Excimerstrahler und dessen Verwendung |
EP0754400A1 (fr) * | 1994-04-07 | 1997-01-22 | The Regents Of The University Of California | Lampe au soufre a haute-frequence |
DE19844921A1 (de) * | 1998-09-30 | 2000-04-13 | Patent Treuhand Ges Fuer Elektrische Gluehlampen Mbh | Flache Beleuchtungsvorrichtung |
EP1519407A2 (fr) * | 2003-08-06 | 2005-03-30 | Patent-Treuhand-Gesellschaft für elektrische Glühlampen mbH | Radiateur UV avec enveloppe tubulaire |
WO2014060592A1 (fr) * | 2012-10-19 | 2014-04-24 | Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. | Source de lumière uv avec ionisation et formation d'excimères combinée |
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DE4010190A1 (de) * | 1990-03-30 | 1991-10-02 | Asea Brown Boveri | Bestrahlungseinrichtung |
US5220236A (en) * | 1991-02-01 | 1993-06-15 | Hughes Aircraft Company | Geometry enhanced optical output for rf excited fluorescent lights |
EP0509110B1 (fr) * | 1991-04-15 | 1995-06-21 | Heraeus Noblelight GmbH | Dispositif d'irradiation |
DE4222130C2 (de) * | 1992-07-06 | 1995-12-14 | Heraeus Noblelight Gmbh | Hochleistungsstrahler |
US5384515A (en) * | 1992-11-02 | 1995-01-24 | Hughes Aircraft Company | Shrouded pin electrode structure for RF excited gas discharge light sources |
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US5733693A (en) | 1993-08-05 | 1998-03-31 | Kimberly-Clark Worldwide, Inc. | Method for improving the readability of data processing forms |
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Citations (3)
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FR2109228A5 (fr) * | 1970-10-07 | 1972-05-26 | Mcb | |
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EP0254111B1 (fr) * | 1986-07-22 | 1992-01-02 | BBC Brown Boveri AG | Dispositif de rayonnement ultraviolet |
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US3828277A (en) * | 1971-12-27 | 1974-08-06 | Us Army | Integral capacitor lateral discharge laser |
JPS5732564A (en) * | 1980-08-04 | 1982-02-22 | Toshiba Corp | High-frequency flat electric-discharge lamp |
JPS5763756A (en) * | 1980-09-12 | 1982-04-17 | Chow Shing Cheung | Discharge lamp |
JPS599849A (ja) * | 1982-07-09 | 1984-01-19 | Okaya Denki Sangyo Kk | 高周波放電ランプ |
-
1989
- 1989-02-27 CH CH720/89A patent/CH677292A5/de not_active IP Right Cessation
-
1990
- 1990-02-17 AT AT90103082T patent/ATE98050T1/de not_active IP Right Cessation
- 1990-02-17 EP EP90103082A patent/EP0385205B1/fr not_active Expired - Lifetime
- 1990-02-17 DE DE90103082T patent/DE59003641D1/de not_active Expired - Fee Related
- 1990-02-27 JP JP2044687A patent/JP2823637B2/ja not_active Expired - Fee Related
- 1990-02-27 US US07/485,544 patent/US5013959A/en not_active Expired - Fee Related
Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
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US4038577A (en) * | 1969-04-28 | 1977-07-26 | Owens-Illinois, Inc. | Gas discharge display device having offset electrodes |
FR2109228A5 (fr) * | 1970-10-07 | 1972-05-26 | Mcb | |
EP0254111B1 (fr) * | 1986-07-22 | 1992-01-02 | BBC Brown Boveri AG | Dispositif de rayonnement ultraviolet |
Cited By (24)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CH680099A5 (fr) * | 1990-05-22 | 1992-06-15 | Asea Brown Boveri | |
EP0458140A1 (fr) * | 1990-05-22 | 1991-11-27 | Heraeus Noblelight GmbH | Radiateur à haute puissance |
US5214344A (en) * | 1990-05-22 | 1993-05-25 | Asea Brown Boveri Ltd. | High-power radiator |
US5283498A (en) * | 1990-10-22 | 1994-02-01 | Heraeus Noblelight Gmbh | High-power radiator |
EP0482230A1 (fr) * | 1990-10-22 | 1992-04-29 | Heraeus Noblelight GmbH | Dispositif de rayonnement à haute puissance |
JPH081671U (ja) * | 1990-10-22 | 1996-12-17 | ヘレーウス ノーブルライト ゲゼルシャフト ミット ベシュレンクテル ハフツング | 高出力ビーム発生装置 |
EP0489184A1 (fr) * | 1990-12-03 | 1992-06-10 | Heraeus Noblelight GmbH | Dispositif de rayonnement à haute puissance |
US5198717A (en) * | 1990-12-03 | 1993-03-30 | Asea Brown Boveri Ltd. | High-power radiator |
EP0497360A2 (fr) * | 1991-02-01 | 1992-08-05 | Hughes Aircraft Company | Système d'éclairage fluorescent à RF |
EP0497360A3 (fr) * | 1991-02-01 | 1994-03-16 | Hughes Aircraft Co | |
EP0517929A1 (fr) * | 1991-06-01 | 1992-12-16 | Heraeus Noblelight GmbH | Dispositif d'irradiation avec un radiateur à haute puissance |
EP0521553A2 (fr) * | 1991-07-01 | 1993-01-07 | Koninklijke Philips Electronics N.V. | Lampe à décharge luminescente à haute pression |
EP0521553A3 (en) * | 1991-07-01 | 1993-02-24 | N.V. Philips' Gloeilampenfabrieken | High-pressure glow discharge lamp |
EP0547366A1 (fr) * | 1991-12-09 | 1993-06-23 | Heraeus Noblelight GmbH | Radiateur à haute puissance |
DE4140497A1 (de) * | 1991-12-09 | 1993-06-17 | Asea Brown Boveri | Hochleistungsstrahler |
US5386170A (en) * | 1991-12-09 | 1995-01-31 | Heraeus Noblelight Gmbh | High-power radiator |
DE4235743A1 (de) * | 1992-10-23 | 1994-04-28 | Heraeus Noblelight Gmbh | Hochleistungsstrahler |
EP0754400A1 (fr) * | 1994-04-07 | 1997-01-22 | The Regents Of The University Of California | Lampe au soufre a haute-frequence |
EP0754400A4 (fr) * | 1994-04-07 | 1997-05-28 | Univ California | Lampe au soufre a haute-frequence |
DE4430300C1 (de) * | 1994-08-26 | 1995-12-21 | Abb Research Ltd | Excimerstrahler und dessen Verwendung |
DE19844921A1 (de) * | 1998-09-30 | 2000-04-13 | Patent Treuhand Ges Fuer Elektrische Gluehlampen Mbh | Flache Beleuchtungsvorrichtung |
EP1519407A2 (fr) * | 2003-08-06 | 2005-03-30 | Patent-Treuhand-Gesellschaft für elektrische Glühlampen mbH | Radiateur UV avec enveloppe tubulaire |
WO2014060592A1 (fr) * | 2012-10-19 | 2014-04-24 | Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. | Source de lumière uv avec ionisation et formation d'excimères combinée |
US9718705B2 (en) | 2012-10-19 | 2017-08-01 | Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. | UV light source having combined ionization and formation of excimers |
Also Published As
Publication number | Publication date |
---|---|
ATE98050T1 (de) | 1993-12-15 |
JP2823637B2 (ja) | 1998-11-11 |
JPH03201358A (ja) | 1991-09-03 |
CH677292A5 (fr) | 1991-04-30 |
EP0385205B1 (fr) | 1993-12-01 |
US5013959A (en) | 1991-05-07 |
DE59003641D1 (de) | 1994-01-13 |
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