EA201190323A1 - PROTECTIVE COATING, METHOD OF PROTECTING SUBSTRATES AND USING THIS METHOD - Google Patents

PROTECTIVE COATING, METHOD OF PROTECTING SUBSTRATES AND USING THIS METHOD

Info

Publication number
EA201190323A1
EA201190323A1 EA201190323A EA201190323A EA201190323A1 EA 201190323 A1 EA201190323 A1 EA 201190323A1 EA 201190323 A EA201190323 A EA 201190323A EA 201190323 A EA201190323 A EA 201190323A EA 201190323 A1 EA201190323 A1 EA 201190323A1
Authority
EA
Eurasian Patent Office
Prior art keywords
layer
substrate
protective coating
pores
protecting substrates
Prior art date
Application number
EA201190323A
Other languages
Russian (ru)
Inventor
Микко Сайкконен
Луис Гуцман
Original Assignee
Бенек Ой
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Бенек Ой filed Critical Бенек Ой
Publication of EA201190323A1 publication Critical patent/EA201190323A1/en

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/04Coating on selected surface areas, e.g. using masks
    • C23C16/045Coating cavities or hollow spaces, e.g. interior of tubes; Infiltration of porous substrates
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/30Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
    • C23C16/34Nitrides
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/30Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
    • C23C16/40Oxides
    • C23C16/403Oxides of aluminium, magnesium or beryllium
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/455Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
    • C23C16/45523Pulsed gas flow or change of composition over time
    • C23C16/45525Atomic layer deposition [ALD]
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C28/00Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D
    • C23C28/04Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D only coatings of inorganic non-metallic material
    • C23C28/042Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D only coatings of inorganic non-metallic material including a refractory ceramic layer, e.g. refractory metal oxides, ZrO2, rare earth oxides
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C28/00Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D
    • C23C28/04Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D only coatings of inorganic non-metallic material
    • C23C28/044Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D only coatings of inorganic non-metallic material coatings specially adapted for cutting tools or wear applications

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Inorganic Chemistry (AREA)
  • General Chemical & Material Sciences (AREA)
  • Ceramic Engineering (AREA)
  • Chemical Vapour Deposition (AREA)
  • Formation Of Insulating Films (AREA)

Abstract

Предложены способ и защитное покрытие для защиты подложки (1) от эффектов, вызываемых взаимодействием подложки (1) с окружающей средой, путем осаждения на подложку (1) первого слоя (3), верхняя поверхность (4) которого ориентирована, по существу, параллельно поверхности подложки (1). Способ включает стадию осаждения второго слоя (5) на первый слой (3) путем воздействия на первый слой (3) поочередно повторяющимися поверхностными реакциями двух или более различных предшественников, чтобы, по меньшей мере, частично заполнить поры (7) в первом слое (3), причем поры (7) открыты через верхнюю поверхность (4), материалом второго слоя (5), так что второй слой (5) соответствует форме поверхности пор.The proposed method and protective coating to protect the substrate (1) from the effects caused by the interaction of the substrate (1) with the environment, by deposition on the substrate (1) of the first layer (3), the upper surface (4) of which is oriented essentially parallel to the surface substrate (1). The method includes the step of depositing the second layer (5) on the first layer (3) by exposing the first layer (3) to alternately repeated surface reactions of two or more different precursors to at least partially fill the pores (7) in the first layer (3 ), with the pores (7) open through the upper surface (4), the material of the second layer (5), so that the second layer (5) corresponds to the shape of the surface of the pores.

EA201190323A 2009-06-05 2010-06-01 PROTECTIVE COATING, METHOD OF PROTECTING SUBSTRATES AND USING THIS METHOD EA201190323A1 (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
FI20095630A FI20095630A0 (en) 2009-06-05 2009-06-05 Protective coating, method of protecting a substrate and use of the method
PCT/FI2010/050444 WO2010139855A1 (en) 2009-06-05 2010-06-01 Protective coating, method for protecting a substrate and use for the same

Publications (1)

Publication Number Publication Date
EA201190323A1 true EA201190323A1 (en) 2012-06-29

Family

ID=40825334

Family Applications (1)

Application Number Title Priority Date Filing Date
EA201190323A EA201190323A1 (en) 2009-06-05 2010-06-01 PROTECTIVE COATING, METHOD OF PROTECTING SUBSTRATES AND USING THIS METHOD

Country Status (5)

Country Link
CN (1) CN102459702A (en)
EA (1) EA201190323A1 (en)
FI (1) FI20095630A0 (en)
TW (1) TW201100590A (en)
WO (1) WO2010139855A1 (en)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102010015470A1 (en) * 2010-04-16 2011-10-20 Forschungszentrum Jülich GmbH Process for the internal coating of functional layers with a tempering material
EP2628817B1 (en) * 2012-02-15 2016-11-02 IHI Hauzer Techno Coating B.V. A coated article of martensitic steel and a method of forming a coated article of steel
PL2628822T3 (en) * 2012-02-15 2016-04-29 Picosun Oy Current insulated bearing components and bearings
EP3784815A4 (en) * 2018-04-27 2021-11-03 Applied Materials, Inc. Protection of components from corrosion
JP2021531410A (en) * 2018-07-26 2021-11-18 ラム リサーチ コーポレーションLam Research Corporation Surface coating for plasma processing chamber components
CN112553598B (en) * 2019-09-25 2023-03-28 中微半导体设备(上海)股份有限公司 Method for enhancing repair of anodic oxidation coating of etching equipment component by using ALD (atomic layer deposition) technology
CN111560602B (en) * 2020-04-13 2021-10-26 哈尔滨工业大学 Optimization method for surface recombination of oxide film
CN114256047B (en) * 2020-09-25 2023-12-22 中微半导体设备(上海)股份有限公司 Semiconductor component, coating forming method and plasma reaction apparatus

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6482733B2 (en) * 2000-05-15 2002-11-19 Asm Microchemistry Oy Protective layers prior to alternating layer deposition
KR100814980B1 (en) 2000-09-28 2008-03-18 프레지던트 앤드 펠로우즈 오브 하바드 칼리지 Vapor deposition of oxides, silicates, and phosphates
JP4359001B2 (en) * 2001-03-02 2009-11-04 本田技研工業株式会社 Anodized film modification method, anodized film structure, and aluminum alloy outboard motor
CN1223552C (en) * 2003-01-17 2005-10-19 西安交通大学 Method for preparing coat layer of composite material between ceramic and organic binder
GB2445218B (en) * 2006-09-21 2011-05-25 Smith International Atomic layer deposition nanocoating on cutting tool powder materials
US7824743B2 (en) 2007-09-28 2010-11-02 Applied Materials, Inc. Deposition processes for titanium nitride barrier and aluminum

Also Published As

Publication number Publication date
CN102459702A (en) 2012-05-16
TW201100590A (en) 2011-01-01
FI20095630A0 (en) 2009-06-05
WO2010139855A1 (en) 2010-12-09

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