DE69825138D1 - Verfahren und Vorrichtung zum Herstellen von dünnen Schichten einer Metallverbindung - Google Patents

Verfahren und Vorrichtung zum Herstellen von dünnen Schichten einer Metallverbindung

Info

Publication number
DE69825138D1
DE69825138D1 DE69825138T DE69825138T DE69825138D1 DE 69825138 D1 DE69825138 D1 DE 69825138D1 DE 69825138 T DE69825138 T DE 69825138T DE 69825138 T DE69825138 T DE 69825138T DE 69825138 D1 DE69825138 D1 DE 69825138D1
Authority
DE
Germany
Prior art keywords
metal compound
thin layers
producing thin
producing
layers
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE69825138T
Other languages
English (en)
Other versions
DE69825138T2 (de
Inventor
Matsumoto Shigeharu
Kikuchi Kazuo
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Shincron Co Ltd
Original Assignee
Shincron Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from JP10073166A external-priority patent/JPH11256327A/ja
Priority claimed from JP10197698A external-priority patent/JP3735462B2/ja
Application filed by Shincron Co Ltd filed Critical Shincron Co Ltd
Application granted granted Critical
Publication of DE69825138D1 publication Critical patent/DE69825138D1/de
Publication of DE69825138T2 publication Critical patent/DE69825138T2/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/0021—Reactive sputtering or evaporation
    • C23C14/0036—Reactive sputtering
    • C23C14/0047—Activation or excitation of reactive gases outside the coating chamber
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/0021—Reactive sputtering or evaporation
    • C23C14/0036—Reactive sputtering
    • C23C14/0073—Reactive sputtering by exposing the substrates to reactive gases intermittently
    • C23C14/0078—Reactive sputtering by exposing the substrates to reactive gases intermittently by moving the substrates between spatially separate sputtering and reaction stations

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
DE1998625138 1998-03-05 1998-08-19 Verfahren und Vorrichtung zum Herstellen von dünnen Schichten einer Metallverbindung Expired - Lifetime DE69825138T2 (de)

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
JP7316698 1998-03-05
JP10073166A JPH11256327A (ja) 1998-03-05 1998-03-05 金属化合物薄膜の形成方法および成膜装置
JP10197698A JP3735462B2 (ja) 1998-03-30 1998-03-30 金属酸化物光学薄膜の形成方法および成膜装置
JP10197698 1998-03-30

Publications (2)

Publication Number Publication Date
DE69825138D1 true DE69825138D1 (de) 2004-08-26
DE69825138T2 DE69825138T2 (de) 2004-11-18

Family

ID=26414322

Family Applications (1)

Application Number Title Priority Date Filing Date
DE1998625138 Expired - Lifetime DE69825138T2 (de) 1998-03-05 1998-08-19 Verfahren und Vorrichtung zum Herstellen von dünnen Schichten einer Metallverbindung

Country Status (3)

Country Link
US (2) US6103320A (de)
EP (1) EP0940481B1 (de)
DE (1) DE69825138T2 (de)

Families Citing this family (61)

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JP3735461B2 (ja) 1998-03-27 2006-01-18 株式会社シンクロン 複合金属の化合物薄膜形成方法及びその薄膜形成装置
US20070137653A1 (en) * 2000-03-13 2007-06-21 Wood Thomas J Ventilation interface for sleep apnea therapy
JP2001003166A (ja) * 1999-04-23 2001-01-09 Nippon Sheet Glass Co Ltd 基体表面に被膜を被覆する方法およびその方法による基体
JP2001049428A (ja) * 1999-08-05 2001-02-20 Nippon Sheet Glass Co Ltd 基体に被膜を被覆する方法およびその方法に用いるスパッタリング装置
US6733513B2 (en) 1999-11-04 2004-05-11 Advanced Bioprosthetic Surfaces, Ltd. Balloon catheter having metal balloon and method of making same
US7335426B2 (en) * 1999-11-19 2008-02-26 Advanced Bio Prosthetic Surfaces, Ltd. High strength vacuum deposited nitinol alloy films and method of making same
US6379383B1 (en) * 1999-11-19 2002-04-30 Advanced Bio Prosthetic Surfaces, Ltd. Endoluminal device exhibiting improved endothelialization and method of manufacture thereof
US7736687B2 (en) 2006-01-31 2010-06-15 Advance Bio Prosthetic Surfaces, Ltd. Methods of making medical devices
US8458879B2 (en) 2001-07-03 2013-06-11 Advanced Bio Prosthetic Surfaces, Ltd., A Wholly Owned Subsidiary Of Palmaz Scientific, Inc. Method of fabricating an implantable medical device
US6936066B2 (en) * 1999-11-19 2005-08-30 Advanced Bio Prosthetic Surfaces, Ltd. Complaint implantable medical devices and methods of making same
US7262130B1 (en) * 2000-01-18 2007-08-28 Micron Technology, Inc. Methods for making integrated-circuit wiring from copper, silver, gold, and other metals
US6376370B1 (en) * 2000-01-18 2002-04-23 Micron Technology, Inc. Process for providing seed layers for using aluminum, copper, gold and silver metallurgy process for providing seed layers for using aluminum, copper, gold and silver metallurgy
US6420262B1 (en) * 2000-01-18 2002-07-16 Micron Technology, Inc. Structures and methods to enhance copper metallization
US6527866B1 (en) * 2000-02-09 2003-03-04 Conductus, Inc. Apparatus and method for deposition of thin films
US8252044B1 (en) 2000-11-17 2012-08-28 Advanced Bio Prosthestic Surfaces, Ltd. Device for in vivo delivery of bioactive agents and method of manufacture thereof
US8632583B2 (en) 2011-05-09 2014-01-21 Palmaz Scientific, Inc. Implantable medical device having enhanced endothelial migration features and methods of making the same
US6494997B1 (en) * 2000-08-18 2002-12-17 General Electric Company Radio frequency magnetron sputtering for lighting applications
WO2002038080A2 (en) 2000-11-07 2002-05-16 Advanced Bio Prosthetic Surfaces, Ltd. Endoluminal stent, self-fupporting endoluminal graft and methods of making same
US6917158B2 (en) * 2002-03-08 2005-07-12 City University Of Hong Kong High-qualty aluminum-doped zinc oxide layer as transparent conductive electrode for organic light-emitting devices
US8679517B2 (en) 2002-09-26 2014-03-25 Palmaz Scientific, Inc. Implantable materials having engineered surfaces made by vacuum deposition and method of making same
US8268340B2 (en) 2002-09-26 2012-09-18 Advanced Bio Prosthetic Surfaces, Ltd. Implantable materials having engineered surfaces and method of making same
WO2004028340A2 (en) 2002-09-26 2004-04-08 Advanced Bio Prosthetic Surfaces, Ltd. High strength vacuum deposited nitionol alloy films, medical thin film graft materials and method of making same
AU2003272710B2 (en) * 2002-09-26 2008-05-15 Vactronix Scientific, Llc Implantable materials having engineered surfaces and method of making same
DE10347521A1 (de) * 2002-12-04 2004-06-24 Leybold Optics Gmbh Verfahren zur Herstellung Multilayerschicht und Vorrichtung zur Durchführung des Verfahrens
US20040182701A1 (en) * 2003-01-29 2004-09-23 Aashi Glass Company, Limited Sputtering apparatus, a mixed film produced by the sputtering apparatus and a multilayer film including the mixed film
CN100558320C (zh) * 2003-03-19 2009-11-11 先进生物假体表面有限公司 具有支柱间相互连接单元的腔内支架
AU2004238270B2 (en) * 2003-05-07 2011-02-03 Advanced Bio Prosthetic Surfaces, Ltd. Metallic implantable grafts and method of making same
US6972136B2 (en) 2003-05-23 2005-12-06 Optima, Inc. Ultra low residual reflection, low stress lens coating and vacuum deposition method for making the same
US20060189046A1 (en) * 2003-06-03 2006-08-24 Yizhou Song Thin film forming method and forming device therefor
JP2005054220A (ja) * 2003-08-01 2005-03-03 Canon Inc フッ化物薄膜の形成方法及びその形成装置
EP1680527B1 (de) * 2003-10-07 2012-03-21 Deposition Sciences, Inc. Vorrichtung und verfahren zur schnellen abscheidung von rutil-titandioxid
US20050281958A1 (en) * 2004-06-22 2005-12-22 Walton Scott G Electron beam enhanced nitriding system (EBENS)
JP3986513B2 (ja) * 2004-08-05 2007-10-03 株式会社シンクロン 薄膜形成装置
JP2008524442A (ja) * 2004-12-15 2008-07-10 エヌエックスピー ビー ヴィ 薄膜音響積層反射体ならびにその製造方法および製造装置
US7833904B2 (en) * 2005-06-16 2010-11-16 The Trustees Of Columbia University In The City Of New York Methods for fabricating nanoscale electrodes and uses thereof
US20070061006A1 (en) * 2005-09-14 2007-03-15 Nathan Desatnik Methods of making shape memory films by chemical vapor deposition and shape memory devices made thereby
US7518880B1 (en) 2006-02-08 2009-04-14 Bi-Link Shielding arrangement for electronic device
US20090202807A1 (en) * 2006-06-22 2009-08-13 National Kuniversity Corporation Kitami Institue Of Technology Method for producing metal nitride film, oxide film, metal carbide film or composite film of them, and production apparatus therefor
JP5174825B2 (ja) * 2006-10-26 2013-04-03 ハウザー テクノ−コーティング ベー．フェー． デュアルマグネトロンスパッタリング電源およびマグネトロンスパッタリング装置
TWI383059B (zh) * 2007-02-12 2013-01-21 Hon Hai Prec Ind Co Ltd 濺鍍式鍍膜裝置及方法
US8974514B2 (en) 2007-03-13 2015-03-10 Abbott Cardiovascular Systems Inc. Intravascular stent with integrated link and ring strut
DE102007021896A1 (de) * 2007-05-10 2008-11-20 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. Flexibles Leiterplattenmaterial und Verfahren zum Herstellen desselben
TWI381058B (zh) * 2007-07-03 2013-01-01 Univ Nat Chunghsing A method for preparing a metal nitride film
JP5101690B2 (ja) * 2008-04-09 2012-12-19 株式会社アルバック 成膜装置及び成膜方法
US20100257732A1 (en) * 2009-04-14 2010-10-14 Ziberna Frank J Shielding Arrangement for Electronic Device
US20120164051A1 (en) * 2009-05-07 2012-06-28 Stefan Bruns Method for the production of oxide and nitride coatings and its use
WO2010151339A1 (en) * 2009-06-26 2010-12-29 Sol Array Llc In-line sputtering for improving thin film solar modules
US8728563B2 (en) 2011-05-03 2014-05-20 Palmaz Scientific, Inc. Endoluminal implantable surfaces, stents, and grafts and method of making same
CN103038387B (zh) 2011-08-02 2015-05-27 新柯隆株式会社 碳化硅薄膜的成膜方法
WO2013044402A1 (en) 2011-09-26 2013-04-04 Evatec Ag Process of coating a substrate with a thin film of metal or semiconductor compound
DE102013221029A1 (de) * 2013-10-16 2015-04-16 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. Verfahren und Vorrichtung zur Herstellung uniformer Schichten auf bewegten Substraten und derart hergestellte Schichten
CN103643204B (zh) * 2013-11-10 2019-03-08 广东世创金属科技股份有限公司 柔性化多功能真空镀膜设备及其智能控制系统
WO2017070488A1 (en) * 2015-10-22 2017-04-27 Richard Devito Deposition system with integrated cooling on a rotating drum
US12057297B2 (en) * 2015-10-22 2024-08-06 Richard DeVito Deposition system with integrated cooling on a rotating drum
CN108690963B (zh) * 2017-04-10 2020-06-23 株式会社新柯隆 成膜装置
CN111359447A (zh) * 2020-03-17 2020-07-03 广州康滤净化科技有限公司 一种磁共溅射法制备的金属过滤膜及其制备方法
CN112410742A (zh) * 2020-10-30 2021-02-26 东莞市烽元科技有限公司 一种在Al2O3陶瓷基体表面磁控溅射镀纳米级铜膜的方法
JP2023000829A (ja) * 2021-06-18 2023-01-04 東京エレクトロン株式会社 成膜装置及び成膜方法
CN115029665B (zh) * 2022-06-14 2023-08-25 浙江水晶光电科技股份有限公司 一种化合物薄膜及其制备方法
CN116180029B (zh) * 2023-04-26 2023-07-21 电子科技大学 一种柔性薄膜的分层磁控溅射镀膜装置及其制备方法

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Also Published As

Publication number Publication date
EP0940481A1 (de) 1999-09-08
DE69825138T2 (de) 2004-11-18
US6274014B1 (en) 2001-08-14
EP0940481B1 (de) 2004-07-21
US6103320A (en) 2000-08-15

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