DE69819407D1 - Messverfahren und Messvorrichtung zur Durchführung des Verfahrens - Google Patents

Messverfahren und Messvorrichtung zur Durchführung des Verfahrens

Info

Publication number
DE69819407D1
DE69819407D1 DE69819407T DE69819407T DE69819407D1 DE 69819407 D1 DE69819407 D1 DE 69819407D1 DE 69819407 T DE69819407 T DE 69819407T DE 69819407 T DE69819407 T DE 69819407T DE 69819407 D1 DE69819407 D1 DE 69819407D1
Authority
DE
Germany
Prior art keywords
measuring
carrying
measuring device
measuring method
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE69819407T
Other languages
English (en)
Other versions
DE69819407T2 (de
Inventor
Masaru Nyui
Mikichi Ban
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Inc filed Critical Canon Inc
Application granted granted Critical
Publication of DE69819407D1 publication Critical patent/DE69819407D1/de
Publication of DE69819407T2 publication Critical patent/DE69819407T2/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B37/00—Lapping machines or devices; Accessories
    • B24B37/005—Control means for lapping machines or devices
    • B24B37/013—Devices or means for detecting lapping completion
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B37/00—Lapping machines or devices; Accessories
    • B24B37/04—Lapping machines or devices; Accessories designed for working plane surfaces
    • B24B37/042—Lapping machines or devices; Accessories designed for working plane surfaces operating processes therefor
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B49/00—Measuring or gauging equipment for controlling the feed movement of the grinding tool or work; Arrangements of indicating or measuring equipment, e.g. for indicating the start of the grinding operation
    • B24B49/02—Measuring or gauging equipment for controlling the feed movement of the grinding tool or work; Arrangements of indicating or measuring equipment, e.g. for indicating the start of the grinding operation according to the instantaneous size and required size of the workpiece acted upon, the measuring or gauging being continuous or intermittent
    • B24B49/04—Measuring or gauging equipment for controlling the feed movement of the grinding tool or work; Arrangements of indicating or measuring equipment, e.g. for indicating the start of the grinding operation according to the instantaneous size and required size of the workpiece acted upon, the measuring or gauging being continuous or intermittent involving measurement of the workpiece at the place of grinding during grinding operation
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B49/00—Measuring or gauging equipment for controlling the feed movement of the grinding tool or work; Arrangements of indicating or measuring equipment, e.g. for indicating the start of the grinding operation
    • B24B49/12—Measuring or gauging equipment for controlling the feed movement of the grinding tool or work; Arrangements of indicating or measuring equipment, e.g. for indicating the start of the grinding operation involving optical means
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
    • H01L21/302—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to change their surface-physical characteristics or shape, e.g. etching, polishing, cutting
    • H01L21/306—Chemical or electrical treatment, e.g. electrolytic etching
    • H01L21/30625—With simultaneous mechanical treatment, e.g. mechanico-chemical polishing

Landscapes

  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Mechanical Treatment Of Semiconductor (AREA)
  • Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
  • Length Measuring Devices By Optical Means (AREA)
DE69819407T 1997-06-10 1998-06-04 Messverfahren und Messvorrichtung zur Durchführung des Verfahrens Expired - Lifetime DE69819407T2 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP16955797 1997-06-10
JP16955797A JP3450651B2 (ja) 1997-06-10 1997-06-10 研磨方法及びそれを用いた研磨装置

Publications (2)

Publication Number Publication Date
DE69819407D1 true DE69819407D1 (de) 2003-12-11
DE69819407T2 DE69819407T2 (de) 2004-09-02

Family

ID=15888680

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69819407T Expired - Lifetime DE69819407T2 (de) 1997-06-10 1998-06-04 Messverfahren und Messvorrichtung zur Durchführung des Verfahrens

Country Status (5)

Country Link
US (1) US6503361B1 (de)
EP (1) EP0884136B1 (de)
JP (1) JP3450651B2 (de)
KR (1) KR100282680B1 (de)
DE (1) DE69819407T2 (de)

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DE19901338C1 (de) * 1999-01-15 2000-03-02 Reishauer Ag Verfahren zum Profilieren von schnelldrehenden Schleifschnecken sowie Vorrichtung zur Durchführung des Verfahrens
US6190234B1 (en) * 1999-01-25 2001-02-20 Applied Materials, Inc. Endpoint detection with light beams of different wavelengths
JP2000269173A (ja) * 1999-03-17 2000-09-29 Toshiba Corp 半導体研磨装置及び半導体研磨方法
US6432823B1 (en) * 1999-11-04 2002-08-13 International Business Machines Corporation Off-concentric polishing system design
US6410441B1 (en) * 1999-12-13 2002-06-25 Worldwide Semiconductor Manufacturing Corp. Auto slurry deliver fine-tune system for chemical-mechanical-polishing process and method of using the system
US20020023715A1 (en) * 2000-05-26 2002-02-28 Norio Kimura Substrate polishing apparatus and substrate polishing mehod
JP2002219645A (ja) * 2000-11-21 2002-08-06 Nikon Corp 研磨装置、この研磨装置を用いた半導体デバイス製造方法並びにこの製造方法によって製造された半導体デバイス
JP4858798B2 (ja) * 2001-05-15 2012-01-18 株式会社ニコン 研磨装置、研磨方法およびこの研磨装置を用いた半導体デバイス製造方法
JP3932836B2 (ja) * 2001-07-27 2007-06-20 株式会社日立製作所 薄膜の膜厚計測方法及びその装置並びにそれを用いたデバイスの製造方法
KR100452852B1 (ko) * 2002-01-09 2004-10-14 삼성전자주식회사 확대 광학계 및 그것을 갖는 화상형성 장치
US6951597B2 (en) * 2003-10-31 2005-10-04 Novellus Systems, Inc. Dynamic polishing fluid delivery system for a rotational polishing apparatus
US7235154B2 (en) * 2004-01-08 2007-06-26 Strasbaugh Devices and methods for optical endpoint detection during semiconductor wafer polishing
US20060046618A1 (en) * 2004-08-31 2006-03-02 Sandhu Gurtej S Methods and systems for determining physical parameters of features on microfeature workpieces
JP2006261473A (ja) * 2005-03-18 2006-09-28 National Institute Of Advanced Industrial & Technology シリコン酸化膜が形成されたシリコン基板の保管方法
DE102005050432A1 (de) * 2005-10-21 2007-05-03 Rap.Id Particle Systems Gmbh Vorrichtung und Verfahren zur Charakterisierung von Gleitmittel und Hydrophobierungsfilmen in pharmazeutischen Behältnissen bezüglich Dicke und Homogenität
US7312154B2 (en) * 2005-12-20 2007-12-25 Corning Incorporated Method of polishing a semiconductor-on-insulator structure
DE102007035833B3 (de) * 2007-07-31 2009-03-12 Advanced Micro Devices, Inc., Sunnyvale Fortgeschrittene automatische Abscheideprofilzielsteuerung und Kontrolle durch Anwendung von fortgeschrittener Polierendpunktsystemrückkopplung
US8579675B2 (en) 2008-11-26 2013-11-12 Applied Materials, Inc. Methods of using optical metrology for feed back and feed forward process control
US20110195636A1 (en) * 2010-02-11 2011-08-11 United Microelectronics Corporation Method for Controlling Polishing Wafer
KR101383600B1 (ko) 2010-03-11 2014-04-11 주식회사 엘지화학 유리판 연마 상황을 모니터링하는 장치 및 방법
US20130017762A1 (en) * 2011-07-15 2013-01-17 Infineon Technologies Ag Method and Apparatus for Determining a Measure of a Thickness of a Polishing Pad of a Polishing Machine
JP2016064459A (ja) * 2014-09-24 2016-04-28 株式会社ディスコ 被加工物の研削方法
US10565701B2 (en) 2015-11-16 2020-02-18 Applied Materials, Inc. Color imaging for CMP monitoring
US11557048B2 (en) 2015-11-16 2023-01-17 Applied Materials, Inc. Thickness measurement of substrate using color metrology
US11100628B2 (en) 2019-02-07 2021-08-24 Applied Materials, Inc. Thickness measurement of substrate using color metrology
KR20220020346A (ko) * 2019-06-10 2022-02-18 도쿄엘렉트론가부시키가이샤 기판 처리 장치, 기판 검사 방법 및 기억 매체
KR102618657B1 (ko) * 2021-09-07 2023-12-29 한국생산기술연구원 로봇을 이용한 폴리싱 장치 및 이에 의한 폴리싱 방법

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* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5081796A (en) * 1990-08-06 1992-01-21 Micron Technology, Inc. Method and apparatus for mechanical planarization and endpoint detection of a semiconductor wafer
JPH06140365A (ja) * 1992-10-23 1994-05-20 Shin Etsu Handotai Co Ltd Ｓｏｉ基板におけるｓｏｉ膜厚均一化方法
US5372673A (en) * 1993-01-25 1994-12-13 Motorola, Inc. Method for processing a layer of material while using insitu monitoring and control
US5433651A (en) * 1993-12-22 1995-07-18 International Business Machines Corporation In-situ endpoint detection and process monitoring method and apparatus for chemical-mechanical polishing
JP3313505B2 (ja) * 1994-04-14 2002-08-12 株式会社日立製作所 研磨加工法
US5555474A (en) * 1994-12-21 1996-09-10 Integrated Process Equipment Corp. Automatic rejection of diffraction effects in thin film metrology
JPH08174411A (ja) * 1994-12-22 1996-07-09 Ebara Corp ポリッシング装置
EP0738561B1 (de) 1995-03-28 2002-01-23 Applied Materials, Inc. Verfahren und Vorrichtung zur In-Situ-Kontroll und Bestimmung des Endes von chemisch-mechanischen Planiervorgänge
TW284907B (en) * 1995-06-07 1996-09-01 Cauldron Lp Removal of material by polarized irradiation and back side application for radiation
US5695601A (en) * 1995-12-27 1997-12-09 Kabushiki Kaisha Toshiba Method for planarizing a semiconductor body by CMP method and an apparatus for manufacturing a semiconductor device using the method
EP0806266A3 (de) * 1996-05-09 1998-12-09 Canon Kabushiki Kaisha Polierverfahren und -vorrichtung zur Verwendung desselben
US5948203A (en) * 1996-07-29 1999-09-07 Taiwan Semiconductor Manufacturing Company, Ltd. Optical dielectric thickness monitor for chemical-mechanical polishing process monitoring
JP3788533B2 (ja) * 1996-09-30 2006-06-21 東京エレクトロン株式会社 研磨装置および研磨方法
US5888120A (en) * 1997-09-29 1999-03-30 Lsi Logic Corporation Method and apparatus for chemical mechanical polishing

Also Published As

Publication number Publication date
EP0884136B1 (de) 2003-11-05
DE69819407T2 (de) 2004-09-02
JP3450651B2 (ja) 2003-09-29
KR100282680B1 (ko) 2001-10-26
JPH113877A (ja) 1999-01-06
EP0884136A1 (de) 1998-12-16
US6503361B1 (en) 2003-01-07
KR19990006776A (ko) 1999-01-25

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