DE69405451D1 - Verfahren und Vorrichtung zur Herstellung eines strukturierten Reliefbildes aus vernetztem Photoresist auf einer flachen Substratoberfläche - Google Patents

Verfahren und Vorrichtung zur Herstellung eines strukturierten Reliefbildes aus vernetztem Photoresist auf einer flachen Substratoberfläche

Info

Publication number
DE69405451D1
DE69405451D1 DE69405451T DE69405451T DE69405451D1 DE 69405451 D1 DE69405451 D1 DE 69405451D1 DE 69405451 T DE69405451 T DE 69405451T DE 69405451 T DE69405451 T DE 69405451T DE 69405451 D1 DE69405451 D1 DE 69405451D1
Authority
DE
Germany
Prior art keywords
producing
cross
substrate surface
flat substrate
relief image
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE69405451T
Other languages
English (en)
Other versions
DE69405451T2 (de
Inventor
Jan Haisma
Martinus Johannes Verheijen
Johannes Thomas Schrama
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Koninklijke Philips NV
Original Assignee
Koninklijke Philips Electronics NV
Philips Electronics NV
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Koninklijke Philips Electronics NV, Philips Electronics NV filed Critical Koninklijke Philips Electronics NV
Publication of DE69405451D1 publication Critical patent/DE69405451D1/de
Application granted granted Critical
Publication of DE69405451T2 publication Critical patent/DE69405451T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C43/00—Compression moulding, i.e. applying external pressure to flow the moulding material; Apparatus therefor
    • B29C43/003—Compression moulding, i.e. applying external pressure to flow the moulding material; Apparatus therefor characterised by the choice of material
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C35/00—Heating, cooling or curing, e.g. crosslinking or vulcanising; Apparatus therefor
    • B29C35/02—Heating or curing, e.g. crosslinking or vulcanizing during moulding, e.g. in a mould
    • B29C35/08—Heating or curing, e.g. crosslinking or vulcanizing during moulding, e.g. in a mould by wave energy or particle radiation
    • B29C35/0888—Heating or curing, e.g. crosslinking or vulcanizing during moulding, e.g. in a mould by wave energy or particle radiation using transparant moulds
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C35/00—Heating, cooling or curing, e.g. crosslinking or vulcanising; Apparatus therefor
    • B29C35/02—Heating or curing, e.g. crosslinking or vulcanizing during moulding, e.g. in a mould
    • B29C35/08—Heating or curing, e.g. crosslinking or vulcanizing during moulding, e.g. in a mould by wave energy or particle radiation
    • B29C35/10—Heating or curing, e.g. crosslinking or vulcanizing during moulding, e.g. in a mould by wave energy or particle radiation for articles of indefinite length
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C39/00—Shaping by casting, i.e. introducing the moulding material into a mould or between confining surfaces without significant moulding pressure; Apparatus therefor
    • B29C39/14—Shaping by casting, i.e. introducing the moulding material into a mould or between confining surfaces without significant moulding pressure; Apparatus therefor for making articles of indefinite length
    • B29C39/148—Shaping by casting, i.e. introducing the moulding material into a mould or between confining surfaces without significant moulding pressure; Apparatus therefor for making articles of indefinite length characterised by the shape of the surface
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0002—Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2002—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image
    • G03F7/2012—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image using liquid photohardening compositions, e.g. for the production of reliefs such as flexographic plates or stamps
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C35/00—Heating, cooling or curing, e.g. crosslinking or vulcanising; Apparatus therefor
    • B29C35/02—Heating or curing, e.g. crosslinking or vulcanizing during moulding, e.g. in a mould
    • B29C35/08—Heating or curing, e.g. crosslinking or vulcanizing during moulding, e.g. in a mould by wave energy or particle radiation
    • B29C35/0805—Heating or curing, e.g. crosslinking or vulcanizing during moulding, e.g. in a mould by wave energy or particle radiation using electromagnetic radiation
    • B29C2035/0827—Heating or curing, e.g. crosslinking or vulcanizing during moulding, e.g. in a mould by wave energy or particle radiation using electromagnetic radiation using UV radiation
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C43/00—Compression moulding, i.e. applying external pressure to flow the moulding material; Apparatus therefor
    • B29C43/02—Compression moulding, i.e. applying external pressure to flow the moulding material; Apparatus therefor of articles of definite length, i.e. discrete articles
    • B29C43/021—Compression moulding, i.e. applying external pressure to flow the moulding material; Apparatus therefor of articles of definite length, i.e. discrete articles characterised by the shape of the surface
    • B29C2043/023—Compression moulding, i.e. applying external pressure to flow the moulding material; Apparatus therefor of articles of definite length, i.e. discrete articles characterised by the shape of the surface having a plurality of grooves
    • B29C2043/025—Compression moulding, i.e. applying external pressure to flow the moulding material; Apparatus therefor of articles of definite length, i.e. discrete articles characterised by the shape of the surface having a plurality of grooves forming a microstructure, i.e. fine patterning
DE69405451T 1993-03-16 1994-03-09 Verfahren und Vorrichtung zur Herstellung eines strukturierten Reliefbildes aus vernetztem Photoresist auf einer flachen Substratoberfläche Expired - Fee Related DE69405451T2 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
EP93200758 1993-03-16

Publications (2)

Publication Number Publication Date
DE69405451D1 true DE69405451D1 (de) 1997-10-16
DE69405451T2 DE69405451T2 (de) 1998-03-12

Family

ID=8213702

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69405451T Expired - Fee Related DE69405451T2 (de) 1993-03-16 1994-03-09 Verfahren und Vorrichtung zur Herstellung eines strukturierten Reliefbildes aus vernetztem Photoresist auf einer flachen Substratoberfläche

Country Status (3)

Country Link
US (1) US5425848A (de)
JP (1) JPH075693A (de)
DE (1) DE69405451T2 (de)

Families Citing this family (195)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5410713A (en) * 1992-01-02 1995-04-25 Smith Corona/Acer Power-management system for a computer
JP3267844B2 (ja) * 1994-11-09 2002-03-25 シャープ株式会社 液晶素子およびその製造方法
KR100215330B1 (ko) * 1994-12-22 1999-08-16 기타지마 요시토시 복합 필름
US6518189B1 (en) * 1995-11-15 2003-02-11 Regents Of The University Of Minnesota Method and apparatus for high density nanostructures
US6309580B1 (en) * 1995-11-15 2001-10-30 Regents Of The University Of Minnesota Release surfaces, particularly for use in nanoimprint lithography
US20040036201A1 (en) * 2000-07-18 2004-02-26 Princeton University Methods and apparatus of field-induced pressure imprint lithography
US7758794B2 (en) * 2001-10-29 2010-07-20 Princeton University Method of making an article comprising nanoscale patterns with reduced edge roughness
US20040137734A1 (en) * 1995-11-15 2004-07-15 Princeton University Compositions and processes for nanoimprinting
US5891806A (en) * 1996-04-22 1999-04-06 Nikon Corporation Proximity-type microlithography apparatus and method
US6069077A (en) * 1997-07-07 2000-05-30 Vanguard International Semiconductor Corporation UV resist curing as an indirect means to increase SiN corner selectivity on self-aligned contact etching process
EP1003078A3 (de) * 1998-11-17 2001-11-07 Corning Incorporated Verfahren zur Vervielfältigung eines Nanomusters
US6334960B1 (en) * 1999-03-11 2002-01-01 Board Of Regents, The University Of Texas System Step and flash imprint lithography
US6238868B1 (en) * 1999-04-12 2001-05-29 Nanogen/Becton Dickinson Partnership Multiplex amplification and separation of nucleic acid sequences using ligation-dependant strand displacement amplification and bioelectronic chip technology
CA2369016A1 (en) * 1999-04-12 2000-10-19 Nanogen/Becton Dickinson Partnership Amplification and separation of nucleic acid sequences using strand displacement amplification and bioelectronic microchip technology
US6326173B1 (en) * 1999-04-12 2001-12-04 Nanogen/Becton Dickinson Partnership Electronically mediated nucleic acid amplification in NASBA
US6531302B1 (en) * 1999-04-12 2003-03-11 Nanogen/Becton Dickinson Partnership Anchored strand displacement amplification on an electronically addressable microchip
US7432634B2 (en) 2000-10-27 2008-10-07 Board Of Regents, University Of Texas System Remote center compliant flexure device
US6873087B1 (en) 1999-10-29 2005-03-29 Board Of Regents, The University Of Texas System High precision orientation alignment and gap control stages for imprint lithography processes
JP4524833B2 (ja) * 2000-02-01 2010-08-18 住友ベークライト株式会社 高分子フィルムシートの製造方法、製造装置、およびこれを用いた高分子フィルムシート
US6322850B1 (en) * 2000-04-24 2001-11-27 Tse Industries, Inc. Mold release reaction product and method of coating of a mold core
US7066234B2 (en) 2001-04-25 2006-06-27 Alcove Surfaces Gmbh Stamping tool, casting mold and methods for structuring a surface of a work piece
EP1303792B1 (de) * 2000-07-16 2012-10-03 Board Of Regents, The University Of Texas System Hoch auflösende ausrichtungsverfahren und entsprechende systeme für die präge-lithographie
US20050160011A1 (en) * 2004-01-20 2005-07-21 Molecular Imprints, Inc. Method for concurrently employing differing materials to form a layer on a substrate
EP2270592B1 (de) 2000-07-17 2015-09-02 Board of Regents, The University of Texas System Verfahren zur Bildung einer Struktur auf einem Substrat
US7211214B2 (en) * 2000-07-18 2007-05-01 Princeton University Laser assisted direct imprint lithography
AU2001280980A1 (en) * 2000-08-01 2002-02-13 Board Of Regents, The University Of Texas System Methods for high-precision gap and orientation sensing between a transparent template and substrate for imprint lithography
US8016277B2 (en) * 2000-08-21 2011-09-13 Board Of Regents, The University Of Texas System Flexure based macro motion translation stage
JP2004523906A (ja) * 2000-10-12 2004-08-05 ボード・オブ・リージエンツ，ザ・ユニバーシテイ・オブ・テキサス・システム 室温かつ低圧マイクロおよびナノ転写リソグラフィのためのテンプレート
ITPS20010006A1 (it) * 2001-02-23 2002-08-23 Canti & Figli Srl Procedimento e macchina atti ad ottenere goffrature su superfici verniciate di pannelli o di pellicole di rivestimento ed elementi ottenuti
US6673287B2 (en) * 2001-05-16 2004-01-06 International Business Machines Corporation Vapor phase surface modification of composite substrates to form a molecularly thin release layer
US6964793B2 (en) 2002-05-16 2005-11-15 Board Of Regents, The University Of Texas System Method for fabricating nanoscale patterns in light curable compositions using an electric field
US20030080472A1 (en) * 2001-10-29 2003-05-01 Chou Stephen Y. Lithographic method with bonded release layer for molding small patterns
KR20030057067A (ko) * 2001-12-28 2003-07-04 엘지.필립스 엘시디 주식회사 인쇄방식을 이용한 패턴형성방법
JP2003318126A (ja) * 2002-04-25 2003-11-07 Mitsubishi Electric Corp 半導体装置の製造方法
US7037639B2 (en) * 2002-05-01 2006-05-02 Molecular Imprints, Inc. Methods of manufacturing a lithography template
US7569153B2 (en) * 2002-05-23 2009-08-04 Lg Display Co., Ltd. Fabrication method of liquid crystal display device
US20030235787A1 (en) * 2002-06-24 2003-12-25 Watts Michael P.C. Low viscosity high resolution patterning material
KR100850472B1 (ko) * 2002-07-05 2008-08-07 엘지디스플레이 주식회사 유브이 경화장치를 포함하는 홀로그래픽 확산층 복제장비
US7179079B2 (en) * 2002-07-08 2007-02-20 Molecular Imprints, Inc. Conforming template for patterning liquids disposed on substrates
US6926929B2 (en) * 2002-07-09 2005-08-09 Molecular Imprints, Inc. System and method for dispensing liquids
US7077992B2 (en) 2002-07-11 2006-07-18 Molecular Imprints, Inc. Step and repeat imprint lithography processes
US6908861B2 (en) 2002-07-11 2005-06-21 Molecular Imprints, Inc. Method for imprint lithography using an electric field
US7442336B2 (en) * 2003-08-21 2008-10-28 Molecular Imprints, Inc. Capillary imprinting technique
US6932934B2 (en) 2002-07-11 2005-08-23 Molecular Imprints, Inc. Formation of discontinuous films during an imprint lithography process
US7019819B2 (en) * 2002-11-13 2006-03-28 Molecular Imprints, Inc. Chucking system for modulating shapes of substrates
US7027156B2 (en) * 2002-08-01 2006-04-11 Molecular Imprints, Inc. Scatterometry alignment for imprint lithography
US7070405B2 (en) * 2002-08-01 2006-07-04 Molecular Imprints, Inc. Alignment systems for imprint lithography
US6916584B2 (en) * 2002-08-01 2005-07-12 Molecular Imprints, Inc. Alignment methods for imprint lithography
US7071088B2 (en) * 2002-08-23 2006-07-04 Molecular Imprints, Inc. Method for fabricating bulbous-shaped vias
US6936194B2 (en) * 2002-09-05 2005-08-30 Molecular Imprints, Inc. Functional patterning material for imprint lithography processes
US7108809B2 (en) * 2002-10-01 2006-09-19 International Business Machines Corporation Optical coupler replication arrangement and process
US8349241B2 (en) 2002-10-04 2013-01-08 Molecular Imprints, Inc. Method to arrange features on a substrate to replicate features having minimal dimensional variability
KR100495055B1 (ko) * 2002-10-10 2005-06-14 엘지전자 주식회사 자외선 경화수지의 패턴 형성 장치 및 방법
US20040250683A1 (en) * 2002-10-18 2004-12-16 Innovative Construction And Building Materials, Llc Advanced filtration devices and methods
US6980282B2 (en) * 2002-12-11 2005-12-27 Molecular Imprints, Inc. Method for modulating shapes of substrates
US7641840B2 (en) * 2002-11-13 2010-01-05 Molecular Imprints, Inc. Method for expelling gas positioned between a substrate and a mold
US7365103B2 (en) * 2002-12-12 2008-04-29 Board Of Regents, The University Of Texas System Compositions for dark-field polymerization and method of using the same for imprint lithography processes
US6871558B2 (en) 2002-12-12 2005-03-29 Molecular Imprints, Inc. Method for determining characteristics of substrate employing fluid geometries
US20040112862A1 (en) * 2002-12-12 2004-06-17 Molecular Imprints, Inc. Planarization composition and method of patterning a substrate using the same
TW200500811A (en) * 2002-12-13 2005-01-01 Molecular Imprints Inc Magnification correction employing out-of-plane distortion of a substrate
US7452574B2 (en) 2003-02-27 2008-11-18 Molecular Imprints, Inc. Method to reduce adhesion between a polymerizable layer and a substrate employing a fluorine-containing layer
US7179396B2 (en) * 2003-03-25 2007-02-20 Molecular Imprints, Inc. Positive tone bi-layer imprint lithography method
US7186656B2 (en) * 2004-05-21 2007-03-06 Molecular Imprints, Inc. Method of forming a recessed structure employing a reverse tone process
US20040191639A1 (en) * 2003-03-26 2004-09-30 Danliang Jin Micro-imprinting method and template for use in same
US7396475B2 (en) * 2003-04-25 2008-07-08 Molecular Imprints, Inc. Method of forming stepped structures employing imprint lithography
US6951173B1 (en) 2003-05-14 2005-10-04 Molecular Imprints, Inc. Assembly and method for transferring imprint lithography templates
US6860956B2 (en) * 2003-05-23 2005-03-01 Agency For Science, Technology & Research Methods of creating patterns on substrates and articles of manufacture resulting therefrom
US7218817B2 (en) * 2003-06-02 2007-05-15 Board Of Regents, The University Of Texas System Nonlinear optical guided mode resonance filter
US20060108710A1 (en) * 2004-11-24 2006-05-25 Molecular Imprints, Inc. Method to reduce adhesion between a conformable region and a mold
US7307118B2 (en) * 2004-11-24 2007-12-11 Molecular Imprints, Inc. Composition to reduce adhesion between a conformable region and a mold
US7150622B2 (en) * 2003-07-09 2006-12-19 Molecular Imprints, Inc. Systems for magnification and distortion correction for imprint lithography processes
GB2403682A (en) * 2003-07-10 2005-01-12 Suisse Electronique Microtech Moulding of optical coupling devices
EP1660240A2 (de) * 2003-08-19 2006-05-31 Nanoopto Corporation Musterbildungsverfahren und systeme im submikroskopischen bereich
US7224529B2 (en) * 2003-09-09 2007-05-29 3M Innovative Properties Company Microreplicated article
US7804649B2 (en) * 2003-09-09 2010-09-28 3M Innovative Properties Company Microreplicated achromatic lens
US7165959B2 (en) * 2003-09-09 2007-01-23 3M Innovative Properties Company Apparatus and method for producing two-sided patterned webs in registration
US20050231809A1 (en) * 2003-09-09 2005-10-20 Carlson Daniel H Microreplicated polarizing article
ATE551383T1 (de) 2003-09-23 2012-04-15 Univ North Carolina Photohärtbare perfluorpolyether zur verwendung als neue werkstoffe in mikrofluidischen vorrichtungen
US8211214B2 (en) 2003-10-02 2012-07-03 Molecular Imprints, Inc. Single phase fluid imprint lithography method
US7090716B2 (en) * 2003-10-02 2006-08-15 Molecular Imprints, Inc. Single phase fluid imprint lithography method
US7261830B2 (en) * 2003-10-16 2007-08-28 Molecular Imprints, Inc. Applying imprinting material to substrates employing electromagnetic fields
US20050084804A1 (en) * 2003-10-16 2005-04-21 Molecular Imprints, Inc. Low surface energy templates
US7122482B2 (en) * 2003-10-27 2006-10-17 Molecular Imprints, Inc. Methods for fabricating patterned features utilizing imprint lithography
US20050106321A1 (en) * 2003-11-14 2005-05-19 Molecular Imprints, Inc. Dispense geometery to achieve high-speed filling and throughput
US20050098534A1 (en) * 2003-11-12 2005-05-12 Molecular Imprints, Inc. Formation of conductive templates employing indium tin oxide
US9040090B2 (en) 2003-12-19 2015-05-26 The University Of North Carolina At Chapel Hill Isolated and fixed micro and nano structures and methods thereof
CA2847260C (en) 2003-12-19 2016-06-21 The University Of North Carolina At Chapel Hill Methods for fabricating isolated micro- and nano- structures using soft or imprint lithography
US20050158419A1 (en) * 2004-01-15 2005-07-21 Watts Michael P. Thermal processing system for imprint lithography
US20050156353A1 (en) * 2004-01-15 2005-07-21 Watts Michael P. Method to improve the flow rate of imprinting material
AU2005220150A1 (en) * 2004-02-13 2005-09-15 The University Of North Carolina At Chapel Hill Functional materials and novel methods for the fabrication of microfluidic devices
WO2007021762A2 (en) 2005-08-09 2007-02-22 The University Of North Carolina At Chapel Hill Methods and materials for fabricating microfluidic devices
US7019835B2 (en) * 2004-02-19 2006-03-28 Molecular Imprints, Inc. Method and system to measure characteristics of a film disposed on a substrate
US8076386B2 (en) 2004-02-23 2011-12-13 Molecular Imprints, Inc. Materials for imprint lithography
US20050189676A1 (en) * 2004-02-27 2005-09-01 Molecular Imprints, Inc. Full-wafer or large area imprinting with multiple separated sub-fields for high throughput lithography
US7906180B2 (en) * 2004-02-27 2011-03-15 Molecular Imprints, Inc. Composition for an etching mask comprising a silicon-containing material
US7730834B2 (en) 2004-03-04 2010-06-08 Asml Netherlands B.V. Printing apparatus and device manufacturing method
KR101024650B1 (ko) * 2004-04-13 2011-03-25 엘지디스플레이 주식회사 액정표시패널 및 그 제조방법
US7140861B2 (en) * 2004-04-27 2006-11-28 Molecular Imprints, Inc. Compliant hard template for UV imprinting
US20050253307A1 (en) * 2004-05-11 2005-11-17 Molecualr Imprints, Inc. Method of patterning a conductive layer on a substrate
WO2005119802A2 (en) * 2004-05-28 2005-12-15 Board Of Regents, The University Of Texas System Adaptive shape substrate support system and method
US20050270516A1 (en) * 2004-06-03 2005-12-08 Molecular Imprints, Inc. System for magnification and distortion correction during nano-scale manufacturing
US20070228593A1 (en) * 2006-04-03 2007-10-04 Molecular Imprints, Inc. Residual Layer Thickness Measurement and Correction
JP2006005022A (ja) * 2004-06-15 2006-01-05 Dainippon Printing Co Ltd インプリント方法及びインプリント装置
US7785526B2 (en) * 2004-07-20 2010-08-31 Molecular Imprints, Inc. Imprint alignment method, system, and template
US20060017876A1 (en) * 2004-07-23 2006-01-26 Molecular Imprints, Inc. Displays and method for fabricating displays
US7105452B2 (en) * 2004-08-13 2006-09-12 Molecular Imprints, Inc. Method of planarizing a semiconductor substrate with an etching chemistry
US7309225B2 (en) * 2004-08-13 2007-12-18 Molecular Imprints, Inc. Moat system for an imprint lithography template
US7939131B2 (en) * 2004-08-16 2011-05-10 Molecular Imprints, Inc. Method to provide a layer with uniform etch characteristics
US7282550B2 (en) * 2004-08-16 2007-10-16 Molecular Imprints, Inc. Composition to provide a layer with uniform etch characteristics
US7252777B2 (en) * 2004-09-21 2007-08-07 Molecular Imprints, Inc. Method of forming an in-situ recessed structure
US7241395B2 (en) * 2004-09-21 2007-07-10 Molecular Imprints, Inc. Reverse tone patterning on surfaces having planarity perturbations
US7041604B2 (en) * 2004-09-21 2006-05-09 Molecular Imprints, Inc. Method of patterning surfaces while providing greater control of recess anisotropy
US7205244B2 (en) * 2004-09-21 2007-04-17 Molecular Imprints Patterning substrates employing multi-film layers defining etch-differential interfaces
US7547504B2 (en) * 2004-09-21 2009-06-16 Molecular Imprints, Inc. Pattern reversal employing thick residual layers
US20060062922A1 (en) * 2004-09-23 2006-03-23 Molecular Imprints, Inc. Polymerization technique to attenuate oxygen inhibition of solidification of liquids and composition therefor
JP4839592B2 (ja) * 2004-09-24 2011-12-21 凸版印刷株式会社 カラーフィルタのブラックマトリックスの形成方法およびカラーフィルタの形成方法
US7244386B2 (en) * 2004-09-27 2007-07-17 Molecular Imprints, Inc. Method of compensating for a volumetric shrinkage of a material disposed upon a substrate to form a substantially planar structure therefrom
US20060081557A1 (en) * 2004-10-18 2006-04-20 Molecular Imprints, Inc. Low-k dielectric functional imprinting materials
US20070231421A1 (en) * 2006-04-03 2007-10-04 Molecular Imprints, Inc. Enhanced Multi Channel Alignment
US7630067B2 (en) 2004-11-30 2009-12-08 Molecular Imprints, Inc. Interferometric analysis method for the manufacture of nano-scale devices
US7292326B2 (en) * 2004-11-30 2007-11-06 Molecular Imprints, Inc. Interferometric analysis for the manufacture of nano-scale devices
KR20070086766A (ko) * 2004-12-01 2007-08-27 몰레큘러 임프린츠 인코퍼레이티드 임프린트 리소그래피 공정용 열관리를 위한 노출 방법
WO2006060757A2 (en) * 2004-12-01 2006-06-08 Molecular Imprints, Inc. Eliminating printability of sub-resolution defects in imprint lithography
TWI263096B (en) * 2004-12-03 2006-10-01 Hon Hai Prec Ind Co Ltd Method for manufacturing a cavity of a light guide plate
US7811505B2 (en) 2004-12-07 2010-10-12 Molecular Imprints, Inc. Method for fast filling of templates for imprint lithography using on template dispense
US20060177535A1 (en) * 2005-02-04 2006-08-10 Molecular Imprints, Inc. Imprint lithography template to facilitate control of liquid movement
US7635263B2 (en) * 2005-01-31 2009-12-22 Molecular Imprints, Inc. Chucking system comprising an array of fluid chambers
US7636999B2 (en) * 2005-01-31 2009-12-29 Molecular Imprints, Inc. Method of retaining a substrate to a wafer chuck
EP1853967A4 (de) * 2005-02-03 2009-11-11 Univ North Carolina Polymermaterial mit niedriger oberflächenenergie zur verwendung in flüssigkristallanzeigen
KR20070111544A (ko) * 2005-03-09 2007-11-21 쓰리엠 이노베이티브 프로퍼티즈 컴파니 미세 복제품 제조 장치 및 방법
JP4861400B2 (ja) 2005-03-09 2012-01-25 スリーエム イノベイティブ プロパティズ カンパニー 位置合わせされた両面パターン化ウェブの作製装置および方法
KR101286897B1 (ko) * 2005-03-09 2013-07-16 쓰리엠 이노베이티브 프로퍼티즈 컴파니 미세복제품을 제조하기 위한 장치 및 방법
US20060209428A1 (en) * 2005-03-09 2006-09-21 Dobbs James N Microreplicated article with moire reducing surface
KR101312140B1 (ko) * 2005-03-09 2013-09-26 쓰리엠 이노베이티브 프로퍼티즈 컴파니 미세복제품 및 그 제조 방법
EP1856566A1 (de) * 2005-03-09 2007-11-21 3M Innovative Properties Company Mikroreplizierter gegenstand mit fehlerreduzierender oberfläche
JP4797414B2 (ja) * 2005-03-23 2011-10-19 凸版印刷株式会社 カラーフィルタのブラックマトリックスの形成方法およびカラーフィルタの形成方法
US20070228608A1 (en) * 2006-04-03 2007-10-04 Molecular Imprints, Inc. Preserving Filled Features when Vacuum Wiping
US20060266916A1 (en) * 2005-05-25 2006-11-30 Molecular Imprints, Inc. Imprint lithography template having a coating to reflect and/or absorb actinic energy
US7256131B2 (en) * 2005-07-19 2007-08-14 Molecular Imprints, Inc. Method of controlling the critical dimension of structures formed on a substrate
US8557351B2 (en) 2005-07-22 2013-10-15 Molecular Imprints, Inc. Method for adhering materials together
US7759407B2 (en) * 2005-07-22 2010-07-20 Molecular Imprints, Inc. Composition for adhering materials together
US8808808B2 (en) 2005-07-22 2014-08-19 Molecular Imprints, Inc. Method for imprint lithography utilizing an adhesion primer layer
US20070064384A1 (en) * 2005-08-25 2007-03-22 Molecular Imprints, Inc. Method to transfer a template transfer body between a motion stage and a docking plate
US20070074635A1 (en) * 2005-08-25 2007-04-05 Molecular Imprints, Inc. System to couple a body and a docking plate
US7665981B2 (en) * 2005-08-25 2010-02-23 Molecular Imprints, Inc. System to transfer a template transfer body between a motion stage and a docking plate
US7670534B2 (en) 2005-09-21 2010-03-02 Molecular Imprints, Inc. Method to control an atmosphere between a body and a substrate
US8142703B2 (en) * 2005-10-05 2012-03-27 Molecular Imprints, Inc. Imprint lithography method
US7906058B2 (en) * 2005-12-01 2011-03-15 Molecular Imprints, Inc. Bifurcated contact printing technique
US7803308B2 (en) 2005-12-01 2010-09-28 Molecular Imprints, Inc. Technique for separating a mold from solidified imprinting material
US7670530B2 (en) 2006-01-20 2010-03-02 Molecular Imprints, Inc. Patterning substrates employing multiple chucks
MY144847A (en) 2005-12-08 2011-11-30 Molecular Imprints Inc Method and system for double-sided patterning of substrates
US20090155401A1 (en) * 2006-03-28 2009-06-18 Sang-Choll Han Method of Forming Nanopattern and Substrate Having Pattern Formed Using the Method
KR100871059B1 (ko) 2006-03-28 2008-11-27 주식회사 엘지화학 나노 패턴 형성 방법 및 이에 의하여 형성된 패턴을 갖는기판
US7802978B2 (en) 2006-04-03 2010-09-28 Molecular Imprints, Inc. Imprinting of partial fields at the edge of the wafer
JP5306989B2 (ja) * 2006-04-03 2013-10-02 モレキュラー・インプリンツ・インコーポレーテッド 複数のフィールド及びアライメント・マークを有する基板を同時にパターニングする方法
US8850980B2 (en) 2006-04-03 2014-10-07 Canon Nanotechnologies, Inc. Tessellated patterns in imprint lithography
US8142850B2 (en) 2006-04-03 2012-03-27 Molecular Imprints, Inc. Patterning a plurality of fields on a substrate to compensate for differing evaporation times
WO2007116972A1 (ja) * 2006-04-07 2007-10-18 Asahi Glass Company, Limited ワイヤグリッド型偏光子およびその製造方法
US8012395B2 (en) 2006-04-18 2011-09-06 Molecular Imprints, Inc. Template having alignment marks formed of contrast material
US7547398B2 (en) * 2006-04-18 2009-06-16 Molecular Imprints, Inc. Self-aligned process for fabricating imprint templates containing variously etched features
WO2007124007A2 (en) 2006-04-21 2007-11-01 Molecular Imprints, Inc. Method for detecting a particle in a nanoimprint lithography system
KR20070105040A (ko) * 2006-04-25 2007-10-30 엘지.필립스 엘시디 주식회사 레지스트 조성물, 이를 이용한 레지스트 패턴 형성방법 및이를 이용하여 제조된 어레이 기판
US8215946B2 (en) 2006-05-18 2012-07-10 Molecular Imprints, Inc. Imprint lithography system and method
WO2008011051A1 (en) * 2006-07-17 2008-01-24 Liquidia Technologies, Inc. Nanoparticle fabrication methods, systems, and materials
KR101296638B1 (ko) * 2006-12-07 2013-08-14 엘지디스플레이 주식회사 박막 패턴의 제조장치 및 방법
US20080229950A1 (en) * 2007-03-19 2008-09-25 Ping Mei Seamless imprint roller and method of making
US20100151031A1 (en) * 2007-03-23 2010-06-17 Desimone Joseph M Discrete size and shape specific organic nanoparticles designed to elicit an immune response
US7763869B2 (en) * 2007-03-23 2010-07-27 Asm Japan K.K. UV light irradiating apparatus with liquid filter
US8071277B2 (en) * 2007-12-21 2011-12-06 3M Innovative Properties Company Method and system for fabricating three-dimensional structures with sub-micron and micron features
JP2009170773A (ja) * 2008-01-18 2009-07-30 Toppan Printing Co Ltd インプリントモールドおよびインプリント装置
AU2008348353A1 (en) * 2008-01-22 2009-07-30 Rolith, Inc. Large area nanopatterning method and apparatus
EP2274367A1 (de) * 2008-04-03 2011-01-19 DKI Plast A/S Verfahren zur herstellung eines optischen films
JP2012501084A (ja) * 2008-08-27 2012-01-12 エーエムオー ゲーエムベーハー 改良型ナノインプリント方法
WO2010071055A1 (ja) * 2008-12-17 2010-06-24 シャープ株式会社 ローラー型インプリント装置、及び、インプリントシートの製造方法
KR100988935B1 (ko) * 2009-10-28 2010-10-20 한국기계연구원 롤 임프린트 장치
KR101102027B1 (ko) * 2010-03-30 2012-01-04 한국기계연구원 롤임프린트 장치
JP2012061832A (ja) * 2010-09-17 2012-03-29 Sony Corp 積層体の製造方法、原盤および転写装置
US9415539B2 (en) 2011-05-31 2016-08-16 3M Innovative Properties Company Method for making microstructured tools having discontinuous topographies, and articles produced therefrom
EP2714358B1 (de) 2011-05-31 2020-02-19 3M Innovative Properties Company Verfahren zur herstellung von unterschiedlich gemusterten gehärteten mikrostrukturierten artikeln
JP2013035243A (ja) * 2011-08-10 2013-02-21 Hoya Corp ローラーモールド、ローラーモールド用基材及びパターン転写方法
US9511543B2 (en) 2012-08-29 2016-12-06 Cc3D Llc Method and apparatus for continuous composite three-dimensional printing
JP6190138B2 (ja) * 2013-04-02 2017-08-30 キヤノン株式会社 インプリント装置、インプリント方法及び物品の製造方法
JP6233001B2 (ja) * 2013-12-20 2017-11-22 ソニー株式会社 造形装置および造形物の製造方法
AT518465B1 (de) * 2016-03-25 2017-11-15 Stadlmann Klaus Anlage und Verfahren zum Generieren eines dreidimensionalen Körpers
JP6844217B2 (ja) * 2016-11-24 2021-03-17 ソニー株式会社 情報処理装置、造形装置、情報処理方法、およびプログラム
DE102016123538A1 (de) 2016-12-06 2018-06-07 Ev Group E. Thallner Gmbh Verfahren zum Prägen von Mikro- und/oder Nanostrukturen
DE102016124428A1 (de) 2016-12-14 2018-06-14 Amo Gmbh Vorrichtung sowie ein Verfahren zur Herstellung großflächiger periodischer Nanostrukturen auf einem flächenhaft ausgedehnten Substrat mittels eines Nanoimprintverfahrens
CN106547044B (zh) * 2017-01-24 2019-03-01 深圳市华星光电技术有限公司 一种偏光片的加工设备及制造方法
US11358331B2 (en) * 2018-11-19 2022-06-14 Continuous Composites Inc. System and head for continuously manufacturing composite structure
EP3722009A1 (de) 2019-03-29 2020-10-14 Airbus Operations GmbH Vorrichtung und system
EP3725539A1 (de) 2019-03-29 2020-10-21 Airbus Operations GmbH Vorrichtung zur lackübertragung
EP3722007A1 (de) 2019-03-29 2020-10-14 Airbus Operations GmbH Vorrichtung zur lackübertragung
EP3750637A1 (de) 2019-03-29 2020-12-16 Airbus Operations GmbH Lackiervorrichtung
EP3733300A1 (de) 2019-04-11 2020-11-04 Airbus Operations GmbH Vorrichtung zur lackübertragung
EP3725422A1 (de) * 2019-04-12 2020-10-21 Airbus Operations GmbH Vorrichtung zur lackübertragung

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0168530B1 (de) * 1984-07-05 1990-04-04 Docdata N.V. Verfahren und Vorrichtung zum Reproduzieren von Reliefstrukturen auf einem Substrat
JPH0354569A (ja) * 1989-07-24 1991-03-08 Dainippon Printing Co Ltd レジストパターンの形成方法
JPH0580530A (ja) * 1991-09-24 1993-04-02 Hitachi Ltd 薄膜パターン製造方法

Also Published As

Publication number Publication date
JPH075693A (ja) 1995-01-10
US5425848A (en) 1995-06-20
DE69405451T2 (de) 1998-03-12

Similar Documents

Publication Publication Date Title
DE69405451D1 (de) Verfahren und Vorrichtung zur Herstellung eines strukturierten Reliefbildes aus vernetztem Photoresist auf einer flachen Substratoberfläche
DE69327874T2 (de) Verfahren und element zur herstellung eines reliefbildes mittels einsatz einer infrarot empfindlichen schicht
DE69322926D1 (de) Verfahren und Vorrichtung zur Herstellung eines lichtempfindlichen Elements
DE69625093D1 (de) Belichtungsverfahren, Belichtungsapparat und Verfahren zur Herstellung einer Vorrichtung
DE59401711D1 (de) Verfahren und vorrichtung zur herstellung einer kontaktmetallisierung
DE69200528D1 (de) Vorrichtung und Verfahren zur Transformation eines Farbkoordinatensatzes.
DE69221340D1 (de) Verfahren und Vorrichtung zur wiederholten Abbildung eines Maskermusters auf einem Substrat
DE69711702T2 (de) Verfahren und vorrichtung zur herstellung einer kohlenstoffreichen beschichtung auf einem beweglichen substrat
DE69531854D1 (de) Verfahren zur wiederholten abbildung eines maskenmusters auf einem substrat
DE59002410D1 (de) Verfahren und Vorrichtung zur Herstellung eines Halbleiter-Schichtsystems.
DE69422273D1 (de) Verfahren und Vorrichtung zur Herstellung eines Flächenhaftverschlusses
DE69434837D1 (de) Verfahren zur Herstellung einer photolithographischen Maske
DE59503839D1 (de) Verfahren und Vorrichtung zur Herstellung einer Druckform
DE69324294T2 (de) Vorrichtung und Verfahren zur Herstellung eines Kabels
DE69837912D1 (de) Vorrichtung und verfahren zum auftrag einer dünnen schicht und verfahren zur herstellung eines lcd-elementes
DE69508228T2 (de) Verfahren zur wiederholten abbildung eines maskenmusters auf einem substrat und vorrichtung zur durchführung des verfahrens
DE69624009D1 (de) Verfahren und vorrichtung zur platzierung eines fadens auf einem substrat
DE69704623T2 (de) Verfahren und vorrichtung zur herstellung eines dreidimensionalen gegenstandes aus einer härtbaren flüssigkeit
DE59406668D1 (de) Verfahren und Vorrichtung zur Herstellung eines Folienverbundes
DE69424725D1 (de) Verfahren und Vorrichtung zur Herstellung einer Halbleiteranordnung
DE69403275T2 (de) Verfahren und Vorrichtung zur Herstellung eines Silizium-Einkristalles
DE69603388D1 (de) Verfahren und Vorrichtung zur Herstellung einer Kunststofffolie
DE69426662D1 (de) Vorrichtung und Verfahren zur Herstellung einer Druckplatte
DE69410621D1 (de) Verfahren und vorrichtung zur herstellung einer einbanddecke
DE59303361D1 (de) Vorrichtung zum Anbringen und/oder Entfernen einer Maske an einem Substrat

Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8327 Change in the person/name/address of the patent owner

Owner name: KONINKLIJKE PHILIPS ELECTRONICS N.V., EINDHOVEN, N

8339 Ceased/non-payment of the annual fee