DE69229647D1 - Ausrichtverfahren - Google Patents

Ausrichtverfahren

Info

Publication number
DE69229647D1
DE69229647D1 DE69229647T DE69229647T DE69229647D1 DE 69229647 D1 DE69229647 D1 DE 69229647D1 DE 69229647 T DE69229647 T DE 69229647T DE 69229647 T DE69229647 T DE 69229647T DE 69229647 D1 DE69229647 D1 DE 69229647D1
Authority
DE
Germany
Prior art keywords
alignment process
alignment
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE69229647T
Other languages
English (en)
Other versions
DE69229647T2 (de
Inventor
Atsushi Kitaoka
Kenji Saitoh
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Inc filed Critical Canon Inc
Publication of DE69229647D1 publication Critical patent/DE69229647D1/de
Application granted granted Critical
Publication of DE69229647T2 publication Critical patent/DE69229647T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7073—Alignment marks and their environment
    • G03F9/7076—Mark details, e.g. phase grating mark, temporary mark
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7003—Alignment type or strategy, e.g. leveling, global alignment
    • G03F9/7023—Aligning or positioning in direction perpendicular to substrate surface

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Length Measuring Devices By Optical Means (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
DE69229647T 1991-01-11 1992-01-10 Ausrichtverfahren Expired - Fee Related DE69229647T2 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP1371591 1991-01-11
JP4020514A JP3008633B2 (ja) 1991-01-11 1992-01-09 位置検出装置

Publications (2)

Publication Number Publication Date
DE69229647D1 true DE69229647D1 (de) 1999-09-02
DE69229647T2 DE69229647T2 (de) 1999-12-16

Family

ID=26349537

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69229647T Expired - Fee Related DE69229647T2 (de) 1991-01-11 1992-01-10 Ausrichtverfahren

Country Status (4)

Country Link
US (1) US5377009A (de)
EP (1) EP0494789B1 (de)
JP (1) JP3008633B2 (de)
DE (1) DE69229647T2 (de)

Families Citing this family (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5625453A (en) * 1993-10-26 1997-04-29 Canon Kabushiki Kaisha System and method for detecting the relative positional deviation between diffraction gratings and for measuring the width of a line constituting a diffraction grating
US5573877A (en) * 1994-03-15 1996-11-12 Matsushita Electric Industrial Co., Ltd. Exposure method and exposure apparatus
JPH0886612A (ja) * 1994-09-19 1996-04-02 Canon Inc 光ヘテロダイン干渉を利用した位置ずれ検出装置
JPH08167559A (ja) * 1994-12-15 1996-06-25 Nikon Corp アライメント方法及び装置
JP3292022B2 (ja) * 1996-01-17 2002-06-17 キヤノン株式会社 位置検出装置及びそれを用いた半導体素子の製造方法
JPH1022213A (ja) * 1996-06-28 1998-01-23 Canon Inc 位置検出装置及びそれを用いたデバイスの製造方法
JPH11241908A (ja) 1997-12-03 1999-09-07 Canon Inc 位置検出装置及びそれを用いたデバイスの製造方法
US6240158B1 (en) * 1998-02-17 2001-05-29 Nikon Corporation X-ray projection exposure apparatus with a position detection optical system
US6281655B1 (en) * 1999-12-23 2001-08-28 Nikon Corporation High performance stage assembly
JP2001253114A (ja) * 2000-03-13 2001-09-18 Fuji Photo Film Co Ltd 画像露光記録装置における光量調整方法および装置
US6552790B1 (en) 2001-02-20 2003-04-22 Advanced Micro Devices, Inc. System and method for facilitating wafer alignment by mitigating effects of reticle rotation on overlay
US6852988B2 (en) * 2000-11-28 2005-02-08 Sumitomo Heavy Industries, Ltd. Gap adjustment apparatus and gap adjustment method for adjusting gap between two objects
JP3958134B2 (ja) * 2002-07-12 2007-08-15 キヤノン株式会社 測定装置
WO2004013693A2 (en) * 2002-08-01 2004-02-12 Molecular Imprints, Inc. Scatterometry alignment for imprint lithography
JP2009099873A (ja) * 2007-10-18 2009-05-07 Canon Inc 露光装置およびデバイス製造方法

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4405238A (en) * 1981-05-20 1983-09-20 Ibm Corporation Alignment method and apparatus for x-ray or optical lithography
US4606643A (en) * 1983-06-20 1986-08-19 The Perkin-Elmer Corporation Fine alignment system
JPS60216548A (ja) * 1985-02-20 1985-10-30 Hitachi Ltd 露光用板状物
US4815854A (en) * 1987-01-19 1989-03-28 Nec Corporation Method of alignment between mask and semiconductor wafer
JPS63221616A (ja) * 1987-03-11 1988-09-14 Toshiba Corp マスク・ウエハの位置合わせ方法
JPH01285803A (ja) * 1988-05-13 1989-11-16 Fujitsu Ltd フレネル・ゾーン・プレートおよびそれを用いる位置合せ方法
EP0336537B1 (de) * 1988-02-16 1995-12-20 Canon Kabushiki Kaisha Vorrichtung zum Nachweis der örtlichen Beziehung zwischen zwei Objekten
JP2626076B2 (ja) * 1988-09-09 1997-07-02 キヤノン株式会社 位置検出装置

Also Published As

Publication number Publication date
US5377009A (en) 1994-12-27
JP3008633B2 (ja) 2000-02-14
EP0494789A2 (de) 1992-07-15
JPH0566109A (ja) 1993-03-19
DE69229647T2 (de) 1999-12-16
EP0494789B1 (de) 1999-07-28
EP0494789A3 (en) 1992-11-19

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee