DE69201219D1 - Lichtempfindliche Beschichtungszusammensetzung. - Google Patents

Lichtempfindliche Beschichtungszusammensetzung.

Info

Publication number
DE69201219D1
DE69201219D1 DE69201219T DE69201219T DE69201219D1 DE 69201219 D1 DE69201219 D1 DE 69201219D1 DE 69201219 T DE69201219 T DE 69201219T DE 69201219 T DE69201219 T DE 69201219T DE 69201219 D1 DE69201219 D1 DE 69201219D1
Authority
DE
Germany
Prior art keywords
coating composition
photosensitive coating
photosensitive
composition
coating
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE69201219T
Other languages
English (en)
Inventor
Shinichi Yamamoto
Masatoshi Tomiki
Naohiko Kiryu
Akiko Yamazaki
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Somar Corp
Original Assignee
Somar Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Somar Corp filed Critical Somar Corp
Application granted granted Critical
Publication of DE69201219D1 publication Critical patent/DE69201219D1/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/022—Quinonediazides
    • G03F7/0226—Quinonediazides characterised by the non-macromolecular additives

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
DE69201219T 1991-06-28 1992-03-27 Lichtempfindliche Beschichtungszusammensetzung. Expired - Lifetime DE69201219D1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP3185214A JPH0816781B2 (ja) 1991-06-28 1991-06-28 感光性組成物

Publications (1)

Publication Number Publication Date
DE69201219D1 true DE69201219D1 (de) 1995-03-02

Family

ID=16166873

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69201219T Expired - Lifetime DE69201219D1 (de) 1991-06-28 1992-03-27 Lichtempfindliche Beschichtungszusammensetzung.

Country Status (5)

Country Link
US (1) US5318874A (de)
EP (1) EP0520606B1 (de)
JP (1) JPH0816781B2 (de)
CA (1) CA2064159A1 (de)
DE (1) DE69201219D1 (de)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE69425862T2 (de) * 1993-11-17 2001-05-03 At & T Corp., New York Verfahren zur Herstellung einer Vorrichtung unter Benutzung einer lichtempfindlichen Zusammensetzung
GB9517669D0 (en) * 1995-08-30 1995-11-01 Cromax Uk Ltd A printing apparatus and method
JP4241074B2 (ja) * 2003-02-12 2009-03-18 富士ゼロックス株式会社 画像探索装置
DE10307521A1 (de) * 2003-02-21 2004-09-09 Kodak Polychrome Graphics Gmbh Wärmeempfindlicher positiv arbeitender Lithographie-Druckplattenläufer mit hoher Chemikalienbeständigkeit
EP2335745B1 (de) * 2009-12-21 2017-11-22 Biotronik VI Patent AG Implantat mit Beschichtung
JP7149418B2 (ja) * 2019-06-27 2022-10-06 富士フイルム株式会社 保護層形成用組成物の製造方法、保護層形成用組成物の保存方法およびこの保存方法の応用
TW202121712A (zh) * 2019-07-30 2021-06-01 日商富士軟片股份有限公司 保護層形成用組成物、層狀膜、保護層、積層體、套組及半導體器件的製造方法

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4076537A (en) * 1976-01-02 1978-02-28 Fuji Photo Film Co., Ltd. Light-sensitive materials containing organo tellurium or selenium compounds and sensitizers
US4632891A (en) * 1984-10-04 1986-12-30 Ciba-Geigy Corporation Process for the production of images

Also Published As

Publication number Publication date
CA2064159A1 (en) 1992-12-29
JPH0816781B2 (ja) 1996-02-21
US5318874A (en) 1994-06-07
EP0520606B1 (de) 1995-01-18
EP0520606A1 (de) 1992-12-30
JPH0511405A (ja) 1993-01-22

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Legal Events

Date Code Title Description
8332 No legal effect for de