DE69029104D1 - Polysiloxane und positiv arbeitende Resistmasse - Google Patents

Polysiloxane und positiv arbeitende Resistmasse

Info

Publication number
DE69029104D1
DE69029104D1 DE69029104T DE69029104T DE69029104D1 DE 69029104 D1 DE69029104 D1 DE 69029104D1 DE 69029104 T DE69029104 T DE 69029104T DE 69029104 T DE69029104 T DE 69029104T DE 69029104 D1 DE69029104 D1 DE 69029104D1
Authority
DE
Germany
Prior art keywords
polysiloxanes
positive working
working resist
resist
positive
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE69029104T
Other languages
English (en)
Other versions
DE69029104T2 (de
Inventor
Toshiaki Aoai
Kazuyoshi Mitzutani
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujifilm Holdings Corp
Original Assignee
Fuji Photo Film Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from JP1179784A external-priority patent/JP2598998B2/ja
Priority claimed from JP1180738A external-priority patent/JPH0344644A/ja
Priority claimed from JP18187989A external-priority patent/JPH0346662A/ja
Priority claimed from JP18188089A external-priority patent/JPH0346663A/ja
Priority claimed from JP18187889A external-priority patent/JPH0346661A/ja
Priority claimed from JP179590A external-priority patent/JPH03206460A/ja
Priority claimed from JP179690A external-priority patent/JPH03206461A/ja
Application filed by Fuji Photo Film Co Ltd filed Critical Fuji Photo Film Co Ltd
Publication of DE69029104D1 publication Critical patent/DE69029104D1/de
Application granted granted Critical
Publication of DE69029104T2 publication Critical patent/DE69029104T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G77/00—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
    • C08G77/04—Polysiloxanes
    • C08G77/22—Polysiloxanes containing silicon bound to organic groups containing atoms other than carbon, hydrogen and oxygen
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G77/00—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
    • C08G77/04—Polysiloxanes
    • C08G77/38—Polysiloxanes modified by chemical after-treatment
    • C08G77/382—Polysiloxanes modified by chemical after-treatment containing atoms other than carbon, hydrogen, oxygen or silicon
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/075—Silicon-containing compounds
    • G03F7/0757—Macromolecular compounds containing Si-O, Si-C or Si-N bonds
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/114—Initiator containing
    • Y10S430/122—Sulfur compound containing
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/114—Initiator containing
    • Y10S430/126—Halogen compound containing
DE69029104T 1989-07-12 1990-07-11 Polysiloxane und positiv arbeitende Resistmasse Expired - Fee Related DE69029104T2 (de)

Applications Claiming Priority (7)

Application Number Priority Date Filing Date Title
JP1179784A JP2598998B2 (ja) 1989-07-12 1989-07-12 感光性組成物
JP1180738A JPH0344644A (ja) 1989-07-13 1989-07-13 感光性組成物
JP18187889A JPH0346661A (ja) 1989-07-14 1989-07-14 感光性組成物
JP18188089A JPH0346663A (ja) 1989-07-14 1989-07-14 感光性組成物
JP18187989A JPH0346662A (ja) 1989-07-14 1989-07-14 感光性組成物
JP179590A JPH03206460A (ja) 1990-01-09 1990-01-09 感光性組成物
JP179690A JPH03206461A (ja) 1990-01-09 1990-01-09 感光性組成物

Publications (2)

Publication Number Publication Date
DE69029104D1 true DE69029104D1 (de) 1996-12-19
DE69029104T2 DE69029104T2 (de) 1997-03-20

Family

ID=27563155

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69029104T Expired - Fee Related DE69029104T2 (de) 1989-07-12 1990-07-11 Polysiloxane und positiv arbeitende Resistmasse

Country Status (3)

Country Link
US (2) US5216105A (de)
EP (1) EP0410606B1 (de)
DE (1) DE69029104T2 (de)

Families Citing this family (12)

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EP0492254B1 (de) * 1990-12-20 1999-03-17 Siemens Aktiengesellschaft Verfahren zur Herstellung von N-tert.-Butoxycarbonyl-maleinimid
DE4124028A1 (de) * 1991-07-19 1993-01-21 Hoechst Ag Verfahren zur herstellung von n-tert.-butoxycarbonyl-maleimid
DE69700397T2 (de) 1996-04-23 2000-04-13 Kodak Polychrome Graphics Co Vorläufer einer lithographischen druckform und ihre verwendung bei der bebilderung durch wärme
US6117610A (en) * 1997-08-08 2000-09-12 Kodak Polychrome Graphics Llc Infrared-sensitive diazonaphthoquinone imaging composition and element containing non-basic IR absorbing material and methods of use
US6063544A (en) * 1997-03-21 2000-05-16 Kodak Polychrome Graphics Llc Positive-working printing plate and method of providing a positive image therefrom using laser imaging
US6090532A (en) * 1997-03-21 2000-07-18 Kodak Polychrome Graphics Llc Positive-working infrared radiation sensitive composition and printing plate and imaging method
DE69801363T2 (de) 1997-07-05 2002-05-23 Kodak Polychrome Graphics Llc Bilderzeugungsverfahren
CN1061365C (zh) * 1997-07-18 2001-01-31 中国科学院化学研究所 一种梯形聚硅氧烷为基体的液晶定向膜及其制备方法和用途
US6060217A (en) * 1997-09-02 2000-05-09 Kodak Polychrome Graphics Llc Thermal lithographic printing plates
US6531260B2 (en) * 2000-04-07 2003-03-11 Jsr Corporation Polysiloxane, method of manufacturing same, silicon-containing alicyclic compound, and radiation-sensitive resin composition
WO2006137261A1 (ja) * 2005-06-21 2006-12-28 Konica Minolta Medical & Graphic, Inc. 感光性組成物、感光性平版印刷版材料および平版印刷版材料の画像形成方法
DE102013003329A1 (de) 2013-02-25 2014-08-28 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. Silane, Hybridpolymere und Photolack mit Positiv-Resist Verhalten sowie Verfahren zur Herstellung

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Also Published As

Publication number Publication date
EP0410606A2 (de) 1991-01-30
DE69029104T2 (de) 1997-03-20
EP0410606A3 (en) 1991-12-11
EP0410606B1 (de) 1996-11-13
US5216105A (en) 1993-06-01
US5338640A (en) 1994-08-16

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