DE60023630D1 - METHOD AND DEVICE FOR GENERATING A RECTANGULAR LIGHT-BEAM MATRIX - Google Patents

METHOD AND DEVICE FOR GENERATING A RECTANGULAR LIGHT-BEAM MATRIX

Info

Publication number
DE60023630D1
DE60023630D1 DE60023630T DE60023630T DE60023630D1 DE 60023630 D1 DE60023630 D1 DE 60023630D1 DE 60023630 T DE60023630 T DE 60023630T DE 60023630 T DE60023630 T DE 60023630T DE 60023630 D1 DE60023630 D1 DE 60023630D1
Authority
DE
Germany
Prior art keywords
generating
rectangular light
beam matrix
matrix
rectangular
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE60023630T
Other languages
German (de)
Other versions
DE60023630T2 (en
Inventor
C Howells
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Applied Materials Inc
Original Assignee
Applied Materials Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from US09/315,780 external-priority patent/US6243209B1/en
Application filed by Applied Materials Inc filed Critical Applied Materials Inc
Publication of DE60023630D1 publication Critical patent/DE60023630D1/en
Application granted granted Critical
Publication of DE60023630T2 publication Critical patent/DE60023630T2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70383—Direct write, i.e. pattern is written directly without the use of a mask by one or multiple beams
DE60023630T 1999-05-20 2000-05-19 METHOD AND DEVICE FOR GENERATING A RECTANGULAR LIGHT-BEAM MATRIX Expired - Fee Related DE60023630T2 (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US315780 1999-05-20
US09/315,780 US6243209B1 (en) 1999-05-20 1999-05-20 Method and apparatus for providing rectangular shape array of light beams
PCT/US2000/013977 WO2000072080A1 (en) 1999-05-20 2000-05-19 Method and apparatus for providing rectangular shaped array of light beams

Publications (2)

Publication Number Publication Date
DE60023630D1 true DE60023630D1 (en) 2005-12-08
DE60023630T2 DE60023630T2 (en) 2006-07-13

Family

ID=36599670

Family Applications (1)

Application Number Title Priority Date Filing Date
DE60023630T Expired - Fee Related DE60023630T2 (en) 1999-05-20 2000-05-19 METHOD AND DEVICE FOR GENERATING A RECTANGULAR LIGHT-BEAM MATRIX

Country Status (1)

Country Link
DE (1) DE60023630T2 (en)

Also Published As

Publication number Publication date
DE60023630T2 (en) 2006-07-13

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee