DE59407307D1 - SIMULTANEOUS DETERMINATION OF LAYER THICKNESS AND SUBSTRATE TEMPERATURE DURING COATING - Google Patents
SIMULTANEOUS DETERMINATION OF LAYER THICKNESS AND SUBSTRATE TEMPERATURE DURING COATINGInfo
- Publication number
- DE59407307D1 DE59407307D1 DE59407307T DE59407307T DE59407307D1 DE 59407307 D1 DE59407307 D1 DE 59407307D1 DE 59407307 T DE59407307 T DE 59407307T DE 59407307 T DE59407307 T DE 59407307T DE 59407307 D1 DE59407307 D1 DE 59407307D1
- Authority
- DE
- Germany
- Prior art keywords
- layer thickness
- temperature during
- substrate temperature
- during coating
- simultaneous determination
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 239000011248 coating agent Substances 0.000 title 1
- 238000000576 coating method Methods 0.000 title 1
- 239000000758 substrate Substances 0.000 title 1
Classifications
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B11/00—Measuring arrangements characterised by the use of optical techniques
- G01B11/02—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness
- G01B11/06—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material
- G01B11/0616—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material of coating
- G01B11/0625—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material of coating with measurement of absorption or reflection
- G01B11/0633—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material of coating with measurement of absorption or reflection using one or more discrete wavelengths
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
- G01J5/00—Radiation pyrometry, e.g. infrared or optical thermometry
- G01J5/60—Radiation pyrometry, e.g. infrared or optical thermometry using determination of colour temperature
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE4318520 | 1993-06-03 | ||
DE9400020 | 1994-01-11 | ||
PCT/DE1994/000168 WO1994029681A1 (en) | 1993-06-03 | 1994-02-16 | Simultaneous determination of layer thickness and substrate temperature during coating |
Publications (1)
Publication Number | Publication Date |
---|---|
DE59407307D1 true DE59407307D1 (en) | 1998-12-24 |
Family
ID=25926479
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE59407307T Expired - Lifetime DE59407307D1 (en) | 1993-06-03 | 1994-02-16 | SIMULTANEOUS DETERMINATION OF LAYER THICKNESS AND SUBSTRATE TEMPERATURE DURING COATING |
Country Status (2)
Country | Link |
---|---|
DE (1) | DE59407307D1 (en) |
WO (1) | WO1994029681A1 (en) |
Families Citing this family (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE19843891A1 (en) * | 1998-09-24 | 2000-04-20 | Wacker Chemie Gmbh | Determining temperature profile of cylindrical rod of semiconductor material involves comparing frequency-dependent resistance with expected resistance and using iterative technique |
US20120244290A1 (en) | 2011-03-24 | 2012-09-27 | United Technologies Corporation | Deposition Substrate Temperature and Monitoring |
Family Cites Families (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5029117A (en) * | 1989-04-24 | 1991-07-02 | Tektronix, Inc. | Method and apparatus for active pyrometry |
US5101111A (en) * | 1989-07-13 | 1992-03-31 | Dainippon Screen Mfg. Co., Ltd. | Method of measuring thickness of film with a reference sample having a known reflectance |
US5166080A (en) * | 1991-04-29 | 1992-11-24 | Luxtron Corporation | Techniques for measuring the thickness of a film formed on a substrate |
US5156461A (en) * | 1991-05-17 | 1992-10-20 | Texas Instruments Incorporated | Multi-point pyrometry with real-time surface emissivity compensation |
US5180226A (en) * | 1991-10-30 | 1993-01-19 | Texas Instruments Incorporated | Method and apparatus for precise temperature measurement |
-
1994
- 1994-02-16 WO PCT/DE1994/000168 patent/WO1994029681A1/en active IP Right Grant
- 1994-02-16 DE DE59407307T patent/DE59407307D1/en not_active Expired - Lifetime
Also Published As
Publication number | Publication date |
---|---|
WO1994029681A1 (en) | 1994-12-22 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
8364 | No opposition during term of opposition |