DE3852026D1 - Verfahren zur herstellung eines elektrolytischen kondensators. - Google Patents
Verfahren zur herstellung eines elektrolytischen kondensators.Info
- Publication number
- DE3852026D1 DE3852026D1 DE3852026T DE3852026T DE3852026D1 DE 3852026 D1 DE3852026 D1 DE 3852026D1 DE 3852026 T DE3852026 T DE 3852026T DE 3852026 T DE3852026 T DE 3852026T DE 3852026 D1 DE3852026 D1 DE 3852026D1
- Authority
- DE
- Germany
- Prior art keywords
- producing
- electrolytic condenser
- electrolytic
- condenser
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 238000004519 manufacturing process Methods 0.000 title 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01G—CAPACITORS; CAPACITORS, RECTIFIERS, DETECTORS, SWITCHING DEVICES, LIGHT-SENSITIVE OR TEMPERATURE-SENSITIVE DEVICES OF THE ELECTROLYTIC TYPE
- H01G9/00—Electrolytic capacitors, rectifiers, detectors, switching devices, light-sensitive or temperature-sensitive devices; Processes of their manufacture
- H01G9/004—Details
- H01G9/04—Electrodes or formation of dielectric layers thereon
- H01G9/042—Electrodes or formation of dielectric layers thereon characterised by the material
- H01G9/045—Electrodes or formation of dielectric layers thereon characterised by the material based on aluminium
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/14—Metallic material, boron or silicon
- C23C14/16—Metallic material, boron or silicon on metallic substrates or on substrates of boron or silicon
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01G—CAPACITORS; CAPACITORS, RECTIFIERS, DETECTORS, SWITCHING DEVICES, LIGHT-SENSITIVE OR TEMPERATURE-SENSITIVE DEVICES OF THE ELECTROLYTIC TYPE
- H01G9/00—Electrolytic capacitors, rectifiers, detectors, switching devices, light-sensitive or temperature-sensitive devices; Processes of their manufacture
- H01G9/004—Details
- H01G9/04—Electrodes or formation of dielectric layers thereon
- H01G9/042—Electrodes or formation of dielectric layers thereon characterised by the material
- H01G9/0425—Electrodes or formation of dielectric layers thereon characterised by the material specially adapted for cathode
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01G—CAPACITORS; CAPACITORS, RECTIFIERS, DETECTORS, SWITCHING DEVICES, LIGHT-SENSITIVE OR TEMPERATURE-SENSITIVE DEVICES OF THE ELECTROLYTIC TYPE
- H01G9/00—Electrolytic capacitors, rectifiers, detectors, switching devices, light-sensitive or temperature-sensitive devices; Processes of their manufacture
- H01G9/004—Details
- H01G9/04—Electrodes or formation of dielectric layers thereon
- H01G9/048—Electrodes or formation of dielectric layers thereon characterised by their structure
Landscapes
- Engineering & Computer Science (AREA)
- Power Engineering (AREA)
- Chemical & Material Sciences (AREA)
- Materials Engineering (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Fixed Capacitors And Capacitor Manufacturing Machines (AREA)
- Physical Vapour Deposition (AREA)
Applications Claiming Priority (5)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP62190729A JPS6433916A (en) | 1987-07-30 | 1987-07-30 | Aluminum electrolytic capacitor |
JP19073087A JPS6433917A (en) | 1987-07-30 | 1987-07-30 | Aluminum electrolytic capacitor |
JP19072887A JPS6433915A (en) | 1987-07-30 | 1987-07-30 | Aluminum electrolytic capacitor |
JP19073187A JPS6433918A (en) | 1987-07-30 | 1987-07-30 | Aluminum electrolytic capacitor |
PCT/JP1988/000757 WO1989001230A1 (en) | 1987-07-30 | 1988-07-28 | Electrolytic capacitor and production method thereof |
Publications (2)
Publication Number | Publication Date |
---|---|
DE3852026D1 true DE3852026D1 (de) | 1994-12-08 |
DE3852026T2 DE3852026T2 (de) | 1995-03-30 |
Family
ID=27475499
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE3852026T Expired - Lifetime DE3852026T2 (de) | 1987-07-30 | 1988-07-28 | Verfahren zur herstellung eines elektrolytischen kondensators. |
Country Status (4)
Country | Link |
---|---|
US (1) | US4970626A (de) |
EP (1) | EP0344316B1 (de) |
DE (1) | DE3852026T2 (de) |
WO (1) | WO1989001230A1 (de) |
Families Citing this family (35)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE4127743C2 (de) * | 1991-08-22 | 1994-05-11 | Fraunhofer Ges Forschung | Oberflächenvergrößerte Aluminiumfolie für Elektrolytkondensatoren und Vakuum-Beschichtungsverfahren zu deren Herstellung |
FR2688092B1 (fr) * | 1992-02-14 | 1994-04-15 | Traitement Metaux Alliages Sa | Feuille pour electrode de condensateur electrolytique et procede de fabrication. |
US5715133A (en) * | 1995-06-21 | 1998-02-03 | Philips Electronics North America Corporation | Method of producing aluminum foil for electrolytic capacitors and product thereof |
JP3475193B2 (ja) * | 1996-04-03 | 2003-12-08 | “オーケービー“チタン”ザクトリー アクティネルノー オブシェストフ | 電解コンデンサの多孔質被覆およびカソードフィルムを形成するための方法および装置 |
US5968210A (en) * | 1997-11-12 | 1999-10-19 | Pacesetter, Inc. | Electrolytic capacitor and method of manufacture |
US6865071B2 (en) * | 1998-03-03 | 2005-03-08 | Acktar Ltd. | Electrolytic capacitors and method for making them |
US6287673B1 (en) * | 1998-03-03 | 2001-09-11 | Acktar Ltd. | Method for producing high surface area foil electrodes |
IL141592A (en) * | 2001-02-22 | 2007-02-11 | Zvi Finkelstein | Electrolytic capacitors and method for making them |
DE19817405A1 (de) * | 1998-04-20 | 1999-10-21 | Becromal Spa | Verfahren zur Herstellung einer Anode für elektrolytische Kondensatoren und so hergestellte Anoden |
DE69936537T2 (de) * | 1998-09-30 | 2008-03-13 | Nippon Chemi-Con Corp., Ome | Festkörperelektrolyt-kondensator und dessen herstellungsverfahren |
DE69936151T2 (de) * | 1999-03-29 | 2008-01-24 | Nippon Chemi-Con Corp., Ome | Festelektrolytkondensator und herstellungsverfahren |
DE10005124C2 (de) * | 2000-02-07 | 2002-03-28 | Becromal Spa | Elektrode sowie Verfahren zu ihrer Herstellung |
IL135550A0 (en) * | 2000-04-09 | 2001-05-20 | Acktar Ltd | Method and apparatus for temperature controlled vapor deposition on a substrate |
US6522525B1 (en) | 2000-11-03 | 2003-02-18 | Cardiac Pacemakers, Inc. | Implantable heart monitors having flat capacitors with curved profiles |
US6684102B1 (en) | 2000-11-03 | 2004-01-27 | Cardiac Pacemakers, Inc. | Implantable heart monitors having capacitors with endcap headers |
US6687118B1 (en) | 2000-11-03 | 2004-02-03 | Cardiac Pacemakers, Inc. | Flat capacitor having staked foils and edge-connected connection members |
US6699265B1 (en) | 2000-11-03 | 2004-03-02 | Cardiac Pacemakers, Inc. | Flat capacitor for an implantable medical device |
US6833987B1 (en) | 2000-11-03 | 2004-12-21 | Cardiac Pacemakers, Inc. | Flat capacitor having an active case |
US6509588B1 (en) | 2000-11-03 | 2003-01-21 | Cardiac Pacemakers, Inc. | Method for interconnecting anodes and cathodes in a flat capacitor |
US7951479B2 (en) | 2005-05-11 | 2011-05-31 | Cardiac Pacemakers, Inc. | Method and apparatus for porous insulative film for insulating energy source layers |
US7479349B2 (en) | 2002-12-31 | 2009-01-20 | Cardiac Pacemakers, Inc. | Batteries including a flat plate design |
US7149076B2 (en) * | 2003-07-15 | 2006-12-12 | Cabot Corporation | Capacitor anode formed of metallic columns on a substrate |
EP1591553A1 (de) * | 2004-04-28 | 2005-11-02 | Becromal S.p.A. | Verfahren zum Herstellen einer mit Titannitrid überzogenen Elektrode |
US7715174B1 (en) | 2004-05-17 | 2010-05-11 | Pacesetter, Inc. | Electrolytic capacitors with alternate cathode materials for use in pulse discharge applications |
US7180727B2 (en) | 2004-07-16 | 2007-02-20 | Cardiac Pacemakers, Inc. | Capacitor with single sided partial etch and stake |
US7224575B2 (en) | 2004-07-16 | 2007-05-29 | Cardiac Pacemakers, Inc. | Method and apparatus for high voltage aluminum capacitor design |
IL173121A (en) * | 2006-01-12 | 2011-07-31 | Dina Katsir | Electrodes, membranes, printing plate precursors and other articles including multi-strata porous coatings |
US7402183B1 (en) | 2006-07-19 | 2008-07-22 | Pacesetter, Inc. | High capacitance cathode foil produced by abrasion process using titanium nitride powder |
WO2008010747A1 (en) * | 2006-07-19 | 2008-01-24 | Sandvik Intellectual Property Ab | Method of producing a rough surface on a substrate |
CN101093751B (zh) * | 2006-11-17 | 2010-05-19 | 深圳清华大学研究院 | 高比容阴极箔的制备方法 |
US8351186B2 (en) | 2008-10-10 | 2013-01-08 | Panasonic Corporation | Electrode foil for capacitor, manufacturing method therefor, and solid electrolytic capacitor using the electrode foil |
US9023186B1 (en) * | 2009-06-26 | 2015-05-05 | Applied Materials, Inc. | High performance titania capacitor with a scalable processing method |
JP5423454B2 (ja) * | 2010-02-09 | 2014-02-19 | パナソニック株式会社 | コンデンサ用電極箔及びコンデンサ |
EP2469549A4 (de) * | 2010-03-16 | 2015-05-27 | Panasonic Ip Man Co Ltd | Elektrodenfolie und kondensator damit |
JP5429436B2 (ja) * | 2011-11-29 | 2014-02-26 | パナソニック株式会社 | コンデンサ |
Family Cites Families (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US2647079A (en) * | 1948-06-03 | 1953-07-28 | Sprague Electric Co | Production of insulated condenser electrodes |
US2722637A (en) * | 1951-02-03 | 1955-11-01 | Joseph B Brennan | Electrolytic condensers |
US3245888A (en) * | 1961-01-27 | 1966-04-12 | Gen Electric | Method of electroforming an electrolytic capacitor electrode |
GB2056503B (en) * | 1979-08-09 | 1983-12-07 | Standard Telephones Cables Ltd | Porous metal films |
GB2056501A (en) * | 1979-08-09 | 1981-03-18 | Standard Telephones Cables Ltd | Porous metal films |
JPS57181373A (en) * | 1981-04-28 | 1982-11-08 | Hitachi Condenser Co Ltd | Vacuum deposition device |
JPS61180420A (ja) * | 1985-02-05 | 1986-08-13 | 昭和アルミニウム株式会社 | 電解コンデンサ用陰極材料 |
JPS61214420A (ja) * | 1985-03-19 | 1986-09-24 | 昭和アルミニウム株式会社 | 電解コンデンサ用陰極材料 |
DE3773870D1 (de) * | 1986-12-24 | 1991-11-21 | Showa Aluminium Co Ltd | Eine aluminium-kondensatorelektrode fuer elektrolytische kondensatoren und verfahren zu ihrer herstellung. |
-
1988
- 1988-07-28 WO PCT/JP1988/000757 patent/WO1989001230A1/ja active IP Right Grant
- 1988-07-28 US US07/360,932 patent/US4970626A/en not_active Expired - Lifetime
- 1988-07-28 EP EP88906867A patent/EP0344316B1/de not_active Expired - Lifetime
- 1988-07-28 DE DE3852026T patent/DE3852026T2/de not_active Expired - Lifetime
Also Published As
Publication number | Publication date |
---|---|
EP0344316B1 (de) | 1994-11-02 |
DE3852026T2 (de) | 1995-03-30 |
US4970626A (en) | 1990-11-13 |
EP0344316A4 (en) | 1990-10-10 |
WO1989001230A1 (en) | 1989-02-09 |
EP0344316A1 (de) | 1989-12-06 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
8364 | No opposition during term of opposition |