DE3785090D1 - Opto-lithographische vorrichtung mit einem verstellbaren linsensystem und kontrollverfahren fuer die abbildungseigenschaften eines linsensystems in einer solchen vorrichtung. - Google Patents

Opto-lithographische vorrichtung mit einem verstellbaren linsensystem und kontrollverfahren fuer die abbildungseigenschaften eines linsensystems in einer solchen vorrichtung.

Info

Publication number
DE3785090D1
DE3785090D1 DE8787201100T DE3785090T DE3785090D1 DE 3785090 D1 DE3785090 D1 DE 3785090D1 DE 8787201100 T DE8787201100 T DE 8787201100T DE 3785090 T DE3785090 T DE 3785090T DE 3785090 D1 DE3785090 D1 DE 3785090D1
Authority
DE
Germany
Prior art keywords
lens system
opto
control method
image properties
enlargement
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE8787201100T
Other languages
English (en)
Other versions
DE3785090T2 (de
Inventor
Adrianus Bouwer
De Looy Guido Van
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Koninklijke Philips NV
Original Assignee
Philips Gloeilampenfabrieken NV
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Philips Gloeilampenfabrieken NV filed Critical Philips Gloeilampenfabrieken NV
Application granted granted Critical
Publication of DE3785090D1 publication Critical patent/DE3785090D1/de
Publication of DE3785090T2 publication Critical patent/DE3785090T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70241—Optical aspects of refractive lens systems, i.e. comprising only refractive elements

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Lenses (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Automatic Focus Adjustment (AREA)
  • Focusing (AREA)
  • Lens Barrels (AREA)
DE87201100T 1986-06-16 1987-06-11 Opto-lithographische Vorrichtung mit einem verstellbaren Linsensystem und Kontrollverfahren für die Abbildungseigenschaften eines Linsensystems in einer solchen Vorrichtung. Expired - Fee Related DE3785090T2 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
NL8601547A NL8601547A (nl) 1986-06-16 1986-06-16 Optisch litografische inrichting met verplaatsbaar lenzenstelsel en werkwijze voor het regelen van de afbeeldingseigenschappen van een lenzenstelsel in een dergelijke inrichting.

Publications (2)

Publication Number Publication Date
DE3785090D1 true DE3785090D1 (de) 1993-05-06
DE3785090T2 DE3785090T2 (de) 1993-10-07

Family

ID=19848171

Family Applications (1)

Application Number Title Priority Date Filing Date
DE87201100T Expired - Fee Related DE3785090T2 (de) 1986-06-16 1987-06-11 Opto-lithographische Vorrichtung mit einem verstellbaren Linsensystem und Kontrollverfahren für die Abbildungseigenschaften eines Linsensystems in einer solchen Vorrichtung.

Country Status (6)

Country Link
US (1) US4737823A (de)
EP (1) EP0250031B1 (de)
JP (1) JP2598408B2 (de)
AT (1) ATE87750T1 (de)
DE (1) DE3785090T2 (de)
NL (1) NL8601547A (de)

Families Citing this family (33)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0782981B2 (ja) * 1986-02-07 1995-09-06 株式会社ニコン 投影露光方法及び装置
US5184307A (en) * 1988-04-18 1993-02-02 3D Systems, Inc. Method and apparatus for production of high resolution three-dimensional objects by stereolithography
JPH0812843B2 (ja) * 1989-03-15 1996-02-07 日本精工株式会社 光学結像装置及び方法
US5311362A (en) * 1989-04-20 1994-05-10 Nikon Corporation Projection exposure apparatus
EP0459770B1 (de) * 1990-05-31 1995-05-03 Canon Kabushiki Kaisha Verfahren zur Herstellung einer Halbleiteranordnung mit Gatestruktur
NL9001611A (nl) * 1990-07-16 1992-02-17 Asm Lithography Bv Apparaat voor het afbeelden van een maskerpatroon op een substraat.
NL9001908A (nl) * 1990-08-30 1992-03-16 Philips Nv Elektromagnetische ondersteuning met positie-onafhankelijke eigenschappen.
US5361122A (en) * 1990-09-06 1994-11-01 Canon Kabushiki Kaisha Autofocusing device and projection exposure apparatus with the same
NL9100202A (nl) * 1991-02-05 1992-09-01 Asm Lithography Bv Lithografische inrichting met een hangende objecttafel.
NL9100215A (nl) * 1991-02-07 1992-09-01 Asm Lithography Bv Inrichting voor het repeterend afbeelden van een maskerpatroon op een substraat.
NL9100407A (nl) * 1991-03-07 1992-10-01 Philips Nv Optisch lithografische inrichting met een krachtgecompenseerd machinegestel.
NL9100410A (nl) 1991-03-07 1992-10-01 Asm Lithography Bv Afbeeldingsapparaat voorzien van een focusfout- en/of scheefstandsdetectie-inrichting.
NL9100421A (nl) * 1991-03-08 1992-10-01 Asm Lithography Bv Ondersteuningsinrichting met een kantelbare objecttafel alsmede optisch lithografische inrichting voorzien van een dergelijke ondersteuningsinrichting.
US6989647B1 (en) * 1994-04-01 2006-01-24 Nikon Corporation Positioning device having dynamically isolated frame, and lithographic device provided with such a positioning device
JP3209641B2 (ja) * 1994-06-02 2001-09-17 三菱電機株式会社 光加工装置及び方法
WO1995034025A1 (en) * 1994-06-02 1995-12-14 Philips Electronics N.V. Method of repetitively imaging a mask pattern on a substrate, and apparatus for performing the method
US6721034B1 (en) 1994-06-16 2004-04-13 Nikon Corporation Stage unit, drive table, and scanning exposure apparatus using the same
US5530516A (en) * 1994-10-04 1996-06-25 Tamarack Scientific Co., Inc. Large-area projection exposure system
KR100399813B1 (ko) 1994-12-14 2004-06-09 가부시키가이샤 니콘 노광장치
JP3709896B2 (ja) * 1995-06-15 2005-10-26 株式会社ニコン ステージ装置
TW406292B (en) * 1997-06-03 2000-09-21 Koninkl Philips Electronics Nv Motion damper with electrical amplifier, and lithographic device with such a motion damper
US6160622A (en) * 1997-12-29 2000-12-12 Asm Lithography, B.V. Alignment device and lithographic apparatus comprising such a device
US6417922B1 (en) 1997-12-29 2002-07-09 Asml Netherlands B.V. Alignment device and lithographic apparatus comprising such a device
US6248486B1 (en) 1998-11-23 2001-06-19 U.S. Philips Corporation Method of detecting aberrations of an optical imaging system
US6368763B2 (en) 1998-11-23 2002-04-09 U.S. Philips Corporation Method of detecting aberrations of an optical imaging system
US6544694B2 (en) 2000-03-03 2003-04-08 Koninklijke Philips Electronics N.V. Method of manufacturing a device by means of a mask phase-shifting mask for use in said method
JP4666747B2 (ja) * 2000-11-06 2011-04-06 キヤノン株式会社 露光装置およびデバイス製造方法
TW526573B (en) * 2000-12-27 2003-04-01 Koninkl Philips Electronics Nv Method of measuring overlay
TW556296B (en) * 2000-12-27 2003-10-01 Koninkl Philips Electronics Nv Method of measuring alignment of a substrate with respect to a reference alignment mark
JP4504622B2 (ja) * 2001-05-18 2010-07-14 コーニンクレッカ フィリップス エレクトロニクス エヌ ヴィ デバイスを製造するリソグラフィック方法
DE102016204535A1 (de) * 2016-03-18 2017-09-21 Carl Zeiss Smt Gmbh Messmikroskop zur Vermessung von Masken für lithographische Verfahren sowie Messverfahren und Kalibrierverfahren hierfür
US11982521B2 (en) * 2017-02-23 2024-05-14 Nikon Corporation Measurement of a change in a geometrical characteristic and/or position of a workpiece
EP3451060A1 (de) 2017-08-28 2019-03-06 ASML Netherlands B.V. Substrat, metrologievorrichtung und zugehörige verfahren für einen lithographischen prozess

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3563648A (en) * 1967-10-18 1971-02-16 Texas Instruments Inc Step and repeat camera with computer controlled film table
US3735686A (en) * 1970-12-18 1973-05-29 Sidney R Littlejohn & Co Ltd Camera systems
FR2371716A1 (fr) * 1976-11-19 1978-06-16 Thomson Csf Appareil photorepeteur de masques
FR2388300A1 (fr) * 1977-04-20 1978-11-17 Thomson Csf Dispositif optique de projection de motifs comportant un asservissement de focalisation a grandissement constant
JPS59150424A (ja) * 1983-02-14 1984-08-28 Toshiba Corp 半導体装置の製造装置および方法
JPS6119129A (ja) * 1984-07-05 1986-01-28 Nippon Kogaku Kk <Nikon> 投影光学装置

Also Published As

Publication number Publication date
DE3785090T2 (de) 1993-10-07
JPS6324211A (ja) 1988-02-01
NL8601547A (nl) 1988-01-18
EP0250031B1 (de) 1993-03-31
EP0250031A1 (de) 1987-12-23
US4737823A (en) 1988-04-12
JP2598408B2 (ja) 1997-04-09
ATE87750T1 (de) 1993-04-15

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8327 Change in the person/name/address of the patent owner

Owner name: PHILIPS ELECTRONICS N.V., EINDHOVEN, NL

8339 Ceased/non-payment of the annual fee