DE3685941D1 - Automatische entwickelvorrichtung. - Google Patents
Automatische entwickelvorrichtung.Info
- Publication number
- DE3685941D1 DE3685941D1 DE8686116012T DE3685941T DE3685941D1 DE 3685941 D1 DE3685941 D1 DE 3685941D1 DE 8686116012 T DE8686116012 T DE 8686116012T DE 3685941 T DE3685941 T DE 3685941T DE 3685941 D1 DE3685941 D1 DE 3685941D1
- Authority
- DE
- Germany
- Prior art keywords
- automatic developer
- developer
- automatic
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
- G03F7/30—Imagewise removal using liquid means
- G03F7/3021—Imagewise removal using liquid means from a wafer supported on a rotating chuck
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S134/00—Cleaning and liquid contact with solids
- Y10S134/902—Semiconductor wafer
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP25795385A JPS62117323A (ja) | 1985-11-18 | 1985-11-18 | 自動現像装置 |
JP25795485A JPS62117324A (ja) | 1985-11-18 | 1985-11-18 | 自動現像装置 |
Publications (2)
Publication Number | Publication Date |
---|---|
DE3685941D1 true DE3685941D1 (de) | 1992-08-13 |
DE3685941T2 DE3685941T2 (de) | 1993-02-11 |
Family
ID=26543470
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE8686116012T Expired - Fee Related DE3685941T2 (de) | 1985-11-18 | 1986-11-18 | Automatische entwickelvorrichtung. |
Country Status (3)
Country | Link |
---|---|
US (1) | US4745422A (de) |
EP (1) | EP0223237B1 (de) |
DE (1) | DE3685941T2 (de) |
Families Citing this family (27)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS63271931A (ja) * | 1987-04-28 | 1988-11-09 | Tokyo Electron Ltd | 現像装置 |
US4924892A (en) * | 1987-07-28 | 1990-05-15 | Mazda Motor Corporation | Painting truck washing system |
US5224504A (en) * | 1988-05-25 | 1993-07-06 | Semitool, Inc. | Single wafer processor |
US5168887A (en) * | 1990-05-18 | 1992-12-08 | Semitool, Inc. | Single wafer processor apparatus |
US5168886A (en) * | 1988-05-25 | 1992-12-08 | Semitool, Inc. | Single wafer processor |
US5230743A (en) * | 1988-05-25 | 1993-07-27 | Semitool, Inc. | Method for single wafer processing in which a semiconductor wafer is contacted with a fluid |
US5431421A (en) * | 1988-05-25 | 1995-07-11 | Semitool, Inc. | Semiconductor processor wafer holder |
US5235995A (en) * | 1989-03-27 | 1993-08-17 | Semitool, Inc. | Semiconductor processor apparatus with dynamic wafer vapor treatment and particulate volatilization |
JPH0264646A (ja) * | 1988-08-31 | 1990-03-05 | Toshiba Corp | レジストパターンの現像方法及びこの方法に使用する現像装置 |
US5357991A (en) * | 1989-03-27 | 1994-10-25 | Semitool, Inc. | Gas phase semiconductor processor with liquid phase mixing |
US6375741B2 (en) * | 1991-03-06 | 2002-04-23 | Timothy J. Reardon | Semiconductor processing spray coating apparatus |
US5156174A (en) * | 1990-05-18 | 1992-10-20 | Semitool, Inc. | Single wafer processor with a bowl |
GB9022781D0 (en) * | 1990-10-19 | 1990-12-05 | Kodak Ltd | Photographic processing apparatus |
KR0155390B1 (ko) * | 1991-05-08 | 1998-12-01 | 이노우에 아키라 | 세정 장치 |
US5224503A (en) * | 1992-06-15 | 1993-07-06 | Semitool, Inc. | Centrifugal wafer carrier cleaning apparatus |
US5489341A (en) * | 1993-08-23 | 1996-02-06 | Semitool, Inc. | Semiconductor processing with non-jetting fluid stream discharge array |
JPH08108125A (ja) * | 1994-10-13 | 1996-04-30 | Sony Disc Technol:Kk | 液供給装置 |
US5954911A (en) * | 1995-10-12 | 1999-09-21 | Semitool, Inc. | Semiconductor processing using vapor mixtures |
TW386256B (en) * | 1997-12-24 | 2000-04-01 | United Microelectronics Corp | Method for removing photoresistor |
US6062239A (en) * | 1998-06-30 | 2000-05-16 | Semitool, Inc. | Cross flow centrifugal processor |
US6125863A (en) * | 1998-06-30 | 2000-10-03 | Semitool, Inc. | Offset rotor flat media processor |
US6432214B2 (en) | 1998-07-10 | 2002-08-13 | Semitool, Inc. | Cleaning apparatus |
KR100292075B1 (ko) * | 1998-12-29 | 2001-07-12 | 윤종용 | 반도체소자제조용웨이퍼처리장치 |
US6516816B1 (en) * | 1999-04-08 | 2003-02-11 | Applied Materials, Inc. | Spin-rinse-dryer |
US6725868B2 (en) * | 2000-11-14 | 2004-04-27 | Tokyo Electron Limited | Liquid processing apparatus |
JP2005534188A (ja) * | 2002-07-26 | 2005-11-10 | アプライド マテリアルズ インコーポレイテッド | スピンドライヤーの為の親水性構成要素 |
US20200176278A1 (en) * | 2018-12-04 | 2020-06-04 | Nanya Technology Corporation | Wafer drying equipment and method thereof |
Family Cites Families (15)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3401705A (en) * | 1966-09-21 | 1968-09-17 | Goldware David | Etching equipment |
US3727620A (en) * | 1970-03-18 | 1973-04-17 | Fluoroware Of California Inc | Rinsing and drying device |
US3769992A (en) * | 1971-12-06 | 1973-11-06 | Fluoroware Inc | Spray processing machine |
US3990462A (en) * | 1975-05-19 | 1976-11-09 | Fluoroware Systems Corporation | Substrate stripping and cleaning apparatus |
JPS5271871A (en) * | 1975-12-11 | 1977-06-15 | Nec Corp | Washing apparatus |
US4161356A (en) * | 1977-01-21 | 1979-07-17 | Burchard John S | Apparatus for in-situ processing of photoplates |
US4197000A (en) * | 1978-05-23 | 1980-04-08 | Fsi Corporation | Positive developing method and apparatus |
JPS552212A (en) * | 1978-06-19 | 1980-01-09 | Toshiba Corp | Copying apparatus |
JPS5655048A (en) * | 1979-10-11 | 1981-05-15 | Matsushita Electric Ind Co Ltd | Developing method and device therefor |
JPS56130923A (en) * | 1980-03-18 | 1981-10-14 | Nec Corp | Developing apparatus for semiconductor substrate |
JPS57166032A (en) * | 1981-04-03 | 1982-10-13 | Toshiba Corp | Spray type developing device for positive resist |
US4429983A (en) * | 1982-03-22 | 1984-02-07 | International Business Machines Corporation | Developing apparatus for exposed photoresist coated wafers |
US4564280A (en) * | 1982-10-28 | 1986-01-14 | Fujitsu Limited | Method and apparatus for developing resist film including a movable nozzle arm |
JPS59134829A (ja) * | 1983-01-22 | 1984-08-02 | Nec Corp | 半導体スプレ−現像装置 |
GB2154434A (en) * | 1984-02-22 | 1985-09-11 | Stohrer Doduco Gmbh & Co | Machine for washing circuit boards |
-
1986
- 1986-11-17 US US06/930,925 patent/US4745422A/en not_active Expired - Lifetime
- 1986-11-18 EP EP86116012A patent/EP0223237B1/de not_active Expired
- 1986-11-18 DE DE8686116012T patent/DE3685941T2/de not_active Expired - Fee Related
Also Published As
Publication number | Publication date |
---|---|
EP0223237B1 (de) | 1992-07-08 |
DE3685941T2 (de) | 1993-02-11 |
US4745422A (en) | 1988-05-17 |
EP0223237A3 (en) | 1988-10-05 |
EP0223237A2 (de) | 1987-05-27 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
DE3685941D1 (de) | Automatische entwickelvorrichtung. | |
DE3683573D1 (de) | Automatischer analysenapparat. | |
DE3679041D1 (de) | Elektrophotographisches entwicklungsgeraet. | |
FI871021A0 (fi) | Eldriven pipett. | |
DE3687461D1 (de) | Entwicklungsgeraet. | |
FI853084L (fi) | Tvaettmedel foer automatiska diskmaskiner. | |
DE3674812D1 (de) | Photographisches setzen. | |
DE3669791D1 (de) | Kopiereinrichtung. | |
FI853083L (fi) | Tvaettmedel foer automatiska diskmaskiner. | |
DE3674460D1 (de) | Automatisches spulenwechselverfahren. | |
DE3676008D1 (de) | Substituierte di-t-butylphenole. | |
ATE50243T1 (de) | Fluorbenzylester. | |
DE3678618D1 (de) | Entwicklungsvorrichtung. | |
FI862346A (fi) | Haorsax. | |
DE3669772D1 (de) | Russblaeser. | |
DE3577013D1 (de) | Elektrophotographische einrichtung. | |
DE3687827D1 (de) | Kopiergeraet. | |
DE3675418D1 (de) | Entwicklungsvorrichtung. | |
DE3683724D1 (de) | Zahnstutz. | |
FI861671A (fi) | Foerbraenningsmotor. | |
FI871055A0 (fi) | Taendroer foer projektil. | |
FI863783A0 (fi) | Nytt framstaellningsfoerfarande foer vaermebestaendig transglukosidas. | |
NO167425C (no) | Koblingslist. | |
DE3676586D1 (de) | Substituierte di-t-butylphenole. | |
FI852119L (fi) | Goedslingsbill foer en saoddgoedslingsmaskin. |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
8364 | No opposition during term of opposition | ||
8339 | Ceased/non-payment of the annual fee |