DE3683012D1 - Verfahren fuer die defektdetektion in einem schritt-projektionssystem. - Google Patents

Verfahren fuer die defektdetektion in einem schritt-projektionssystem.

Info

Publication number
DE3683012D1
DE3683012D1 DE8686114707T DE3683012T DE3683012D1 DE 3683012 D1 DE3683012 D1 DE 3683012D1 DE 8686114707 T DE8686114707 T DE 8686114707T DE 3683012 T DE3683012 T DE 3683012T DE 3683012 D1 DE3683012 D1 DE 3683012D1
Authority
DE
Germany
Prior art keywords
projection system
defect detection
defect
detection
projection
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE8686114707T
Other languages
English (en)
Inventor
Alexander Leon Flamholz
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
International Business Machines Corp
Original Assignee
International Business Machines Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by International Business Machines Corp filed Critical International Business Machines Corp
Application granted granted Critical
Publication of DE3683012D1 publication Critical patent/DE3683012D1/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/68—Preparation processes not covered by groups G03F1/20 - G03F1/50
    • G03F1/82—Auxiliary processes, e.g. cleaning or inspecting
    • G03F1/84—Inspecting
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/70605—Workpiece metrology
    • G03F7/70616—Monitoring the printed patterns
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/62—Pellicles, e.g. pellicle assemblies, e.g. having membrane on support frame; Preparation thereof

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Testing Or Measuring Of Semiconductors Or The Like (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
DE8686114707T 1985-10-31 1986-10-23 Verfahren fuer die defektdetektion in einem schritt-projektionssystem. Expired - Fee Related DE3683012D1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US06/793,599 US4637714A (en) 1985-10-31 1985-10-31 Inspection system for pellicalized reticles

Publications (1)

Publication Number Publication Date
DE3683012D1 true DE3683012D1 (de) 1992-01-30

Family

ID=25160312

Family Applications (1)

Application Number Title Priority Date Filing Date
DE8686114707T Expired - Fee Related DE3683012D1 (de) 1985-10-31 1986-10-23 Verfahren fuer die defektdetektion in einem schritt-projektionssystem.

Country Status (5)

Country Link
US (1) US4637714A (de)
EP (1) EP0221457B1 (de)
JP (1) JPS6337617A (de)
CA (1) CA1227355A (de)
DE (1) DE3683012D1 (de)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CA1242815A (en) * 1987-03-20 1988-10-04 Pak K. Leung Defect detection method of semiconductor wafer patterns
JPH05323582A (ja) * 1992-05-15 1993-12-07 Mitsubishi Electric Corp 露光装置およびこの露光装置を用いた露光方法
CN1910516B (zh) * 2004-01-29 2011-01-12 克拉-坦科技术股份有限公司 用于检测标线设计数据中的缺陷的计算机实现方法
DE102007052052B4 (de) * 2007-10-31 2016-02-04 Globalfoundries Dresden Module One Limited Liability Company & Co. Kg Verfahren zum Erkennen von Wiederholungsdefekten in Lithographiemasken auf der Grundlage von Testsubstraten, die unter veränderlichen Bedingungen belichtet werden

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3819265A (en) * 1972-08-02 1974-06-25 Bell Telephone Labor Inc Scanning projection printer apparatus and method
DE2753632C2 (de) * 1977-12-01 1985-08-29 Agfa-Gevaert Ag, 5090 Leverkusen Verfahren und Vorrichtung zum Selektieren von kopierunwürdigen fotografischen Vorlagen
US4131363A (en) * 1977-12-05 1978-12-26 International Business Machines Corporation Pellicle cover for projection printing system
DE2911567A1 (de) * 1979-03-23 1980-10-09 Agfa Gevaert Ag Verfahren zur ueberpruefung des betriebszustandes einer kopiervorrichtung und der nachgeschalteten entwicklungsvorrichtung
JPS5662323A (en) * 1979-10-26 1981-05-28 Fujitsu Ltd Reticle examination method
JPS5758151A (en) * 1980-09-25 1982-04-07 Nec Corp Manufacturing and inspecting method for photomask
US4443096A (en) * 1981-05-18 1984-04-17 Optimetrix Corporation On machine reticle inspection device
JPS57211136A (en) * 1981-06-22 1982-12-24 Fuji Photo Film Co Ltd Abnormal negative discriminating method
JPS5983144A (ja) * 1982-11-02 1984-05-14 Fuji Photo Film Co Ltd 写真フイルムの測光条件修正方法

Also Published As

Publication number Publication date
EP0221457A2 (de) 1987-05-13
EP0221457A3 (en) 1988-09-14
JPS6337617A (ja) 1988-02-18
CA1227355A (en) 1987-09-29
EP0221457B1 (de) 1991-12-18
US4637714A (en) 1987-01-20
JPH046937B2 (de) 1992-02-07

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee