DE3681051D1 - Nieder-energie-raster-transmissions-elektronenmikroskop. - Google Patents

Nieder-energie-raster-transmissions-elektronenmikroskop.

Info

Publication number
DE3681051D1
DE3681051D1 DE8686103216T DE3681051T DE3681051D1 DE 3681051 D1 DE3681051 D1 DE 3681051D1 DE 8686103216 T DE8686103216 T DE 8686103216T DE 3681051 T DE3681051 T DE 3681051T DE 3681051 D1 DE3681051 D1 DE 3681051D1
Authority
DE
Germany
Prior art keywords
low
electron microscope
energy grid
transmissions electron
grid transmissions
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE8686103216T
Other languages
German (de)
English (en)
Inventor
David Anthony Smith
Oliver Craig Wells
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
International Business Machines Corp
Original Assignee
International Business Machines Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by International Business Machines Corp filed Critical International Business Machines Corp
Application granted granted Critical
Publication of DE3681051D1 publication Critical patent/DE3681051D1/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/26—Electron or ion microscopes; Electron or ion diffraction tubes
    • H01J37/28—Electron or ion microscopes; Electron or ion diffraction tubes with scanning beams
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/02—Details
    • H01J2237/024—Moving components not otherwise provided for
    • H01J2237/0245—Moving whole optical system relatively to object
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/15—Means for deflecting or directing discharge
    • H01J2237/1502—Mechanical adjustments
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/15—Means for deflecting or directing discharge
    • H01J2237/1502—Mechanical adjustments
    • H01J2237/1503—Mechanical scanning
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/25—Tubes for localised analysis using electron or ion beams
    • H01J2237/2505—Tubes for localised analysis using electron or ion beams characterised by their application
    • H01J2237/2583—Tubes for localised analysis using electron or ion beams characterised by their application using tunnel effects, e.g. STM, AFM
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/26—Electron or ion microscopes
    • H01J2237/28—Scanning microscopes
    • H01J2237/2802—Transmission microscopes
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S977/00—Nanotechnology
    • Y10S977/84—Manufacture, treatment, or detection of nanostructure
    • Y10S977/849—Manufacture, treatment, or detection of nanostructure with scanning probe
    • Y10S977/852—Manufacture, treatment, or detection of nanostructure with scanning probe for detection of specific nanostructure sample or nanostructure-related property
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S977/00—Nanotechnology
    • Y10S977/84—Manufacture, treatment, or detection of nanostructure
    • Y10S977/849—Manufacture, treatment, or detection of nanostructure with scanning probe
    • Y10S977/86—Scanning probe structure

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Analysing Materials By The Use Of Radiation (AREA)
DE8686103216T 1985-03-22 1986-03-11 Nieder-energie-raster-transmissions-elektronenmikroskop. Expired - Lifetime DE3681051D1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US06/715,139 US4618767A (en) 1985-03-22 1985-03-22 Low-energy scanning transmission electron microscope

Publications (1)

Publication Number Publication Date
DE3681051D1 true DE3681051D1 (de) 1991-10-02

Family

ID=24872814

Family Applications (1)

Application Number Title Priority Date Filing Date
DE8686103216T Expired - Lifetime DE3681051D1 (de) 1985-03-22 1986-03-11 Nieder-energie-raster-transmissions-elektronenmikroskop.

Country Status (5)

Country Link
US (1) US4618767A (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)
EP (1) EP0195349B1 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)
JP (1) JPS61220260A (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)
CA (1) CA1223678A (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)
DE (1) DE3681051D1 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)

Families Citing this family (51)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0189498B1 (en) * 1985-01-29 1989-05-03 International Business Machines Corporation Field-emission scanning auger electron microscope
USRE33387E (en) * 1985-11-26 1990-10-16 International Business Machines Corporation Atomic force microscope and method for imaging surfaces with atomic resolution
US4724318A (en) * 1985-11-26 1988-02-09 International Business Machines Corporation Atomic force microscope and method for imaging surfaces with atomic resolution
US4788426A (en) * 1986-06-11 1988-11-29 Kuehnle Manfred R Interactive image recording method and means
US4798989A (en) * 1986-09-26 1989-01-17 Research Development Corporation Scanning tunneling microscope installed in electron microscope
WO1988004047A1 (en) * 1986-11-24 1988-06-02 Lasarray Holding Ag Device for generating and detecting magnetic material structures at atomic levels
EP0555941B1 (en) * 1986-12-24 1997-07-30 Canon Kabushiki Kaisha Recording device and reproducing device
EP0290647B1 (en) * 1987-05-12 1991-07-24 International Business Machines Corporation Oscillating quartz atomic force microscope
DE3854620T2 (de) * 1987-08-12 1996-03-28 Olympus Optical Co., Ltd., Tokio/Tokyo Tunnel-abtastmikroskop.
DE3856296T2 (de) * 1987-08-25 1999-07-15 Canon K.K., Tokio/Tokyo Tunnelstromkodierer
EP0307210A3 (en) * 1987-09-10 1991-05-15 Seiko Instruments Inc. Memory writing apparatus
EP0307211A3 (en) * 1987-09-10 1991-05-15 Seiko Instruments Inc. Memory reading device
US5315247A (en) * 1987-11-09 1994-05-24 California Institute Of Technology Method and apparatus for measuring a magnetic field using a deflectable energized loop and a tunneling tip
US5293781A (en) * 1987-11-09 1994-03-15 California Institute Of Technology Tunnel effect measuring systems and particle detectors
US5265470A (en) * 1987-11-09 1993-11-30 California Institute Of Technology Tunnel effect measuring systems and particle detectors
US4823004A (en) * 1987-11-24 1989-04-18 California Institute Of Technology Tunnel and field effect carrier ballistics
JP2936545B2 (ja) * 1988-06-24 1999-08-23 株式会社日立製作所 走査プローブ顕微鏡
US5009111A (en) * 1988-08-31 1991-04-23 Quanscan, Inc. Differential force balance apparatus
JP2834173B2 (ja) * 1989-02-17 1998-12-09 株式会社日立製作所 走査型トンネル音響顕微鏡
JP2686645B2 (ja) * 1989-05-08 1997-12-08 キヤノン株式会社 走査型トンネル電流検出装置
US5266801A (en) * 1989-06-05 1993-11-30 Digital Instruments, Inc. Jumping probe microscope
US5229606A (en) * 1989-06-05 1993-07-20 Digital Instruments, Inc. Jumping probe microscope
US5224376A (en) * 1989-12-08 1993-07-06 Digital Instruments, Inc. Atomic force microscope
US5237859A (en) * 1989-12-08 1993-08-24 Digital Instruments, Inc. Atomic force microscope
DE4030242A1 (de) * 1990-09-25 1992-04-02 Raith Gmbh Vakuum-korpuskularstrahlgeraete
JPH0756443B2 (ja) * 1990-12-20 1995-06-14 株式会社島津製作所 生体試料観察用走査型トンネル顕微鏡
KR940007963A (ko) * 1992-09-03 1994-04-28 오오가 노리오 판그물 및 투과형 전자현미경용 시료의 연마방법
JP3270165B2 (ja) * 1993-01-22 2002-04-02 セイコーインスツルメンツ株式会社 表面分析及び加工装置
JP2983876B2 (ja) * 1994-03-22 1999-11-29 徹雄 大原 リアルタイムかつナノメータスケールの位置測定方法および装置
JPH08313544A (ja) * 1995-05-24 1996-11-29 Hitachi Ltd 電子顕微鏡及びこれを用いた試料観察方法
US6198299B1 (en) * 1998-08-27 2001-03-06 The Micromanipulator Company, Inc. High Resolution analytical probe station
US6744268B2 (en) * 1998-08-27 2004-06-01 The Micromanipulator Company, Inc. High resolution analytical probe station
US7659739B2 (en) 2006-09-14 2010-02-09 Micro Porbe, Inc. Knee probe having reduced thickness section for control of scrub motion
USRE43503E1 (en) 2006-06-29 2012-07-10 Microprobe, Inc. Probe skates for electrical testing of convex pad topologies
US7759949B2 (en) 2004-05-21 2010-07-20 Microprobe, Inc. Probes with self-cleaning blunt skates for contacting conductive pads
US8988091B2 (en) 2004-05-21 2015-03-24 Microprobe, Inc. Multiple contact probes
US9476911B2 (en) 2004-05-21 2016-10-25 Microprobe, Inc. Probes with high current carrying capability and laser machining methods
US7733101B2 (en) 2004-05-21 2010-06-08 Microprobe, Inc. Knee probe having increased scrub motion
US9097740B2 (en) 2004-05-21 2015-08-04 Formfactor, Inc. Layered probes with core
US7649367B2 (en) 2005-12-07 2010-01-19 Microprobe, Inc. Low profile probe having improved mechanical scrub and reduced contact inductance
US7312617B2 (en) 2006-03-20 2007-12-25 Microprobe, Inc. Space transformers employing wire bonds for interconnections with fine pitch contacts
US7488950B2 (en) * 2006-06-05 2009-02-10 Blaise Laurent Mouttet Crosswire sensor
JP4851263B2 (ja) * 2006-08-23 2012-01-11 日本電子株式会社 ビーム応用装置
US8907689B2 (en) 2006-10-11 2014-12-09 Microprobe, Inc. Probe retention arrangement
US7786740B2 (en) 2006-10-11 2010-08-31 Astria Semiconductor Holdings, Inc. Probe cards employing probes having retaining portions for potting in a potting region
US7514948B2 (en) 2007-04-10 2009-04-07 Microprobe, Inc. Vertical probe array arranged to provide space transformation
US8723546B2 (en) 2007-10-19 2014-05-13 Microprobe, Inc. Vertical guided layered probe
US7671610B2 (en) 2007-10-19 2010-03-02 Microprobe, Inc. Vertical guided probe array providing sideways scrub motion
US8230593B2 (en) 2008-05-29 2012-07-31 Microprobe, Inc. Probe bonding method having improved control of bonding material
US8586923B1 (en) * 2012-06-21 2013-11-19 International Business Machines Corporation Low-voltage transmission electron microscopy
US9552961B2 (en) * 2015-04-10 2017-01-24 International Business Machines Corporation Scanning transmission electron microscope having multiple beams and post-detection image correction

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE2711536A1 (de) * 1977-03-14 1978-09-21 Siemens Ag Durchstrahlungs-raster-korpuskularstrahlmikroskop
CH643397A5 (de) * 1979-09-20 1984-05-30 Ibm Raster-tunnelmikroskop.
US4550257A (en) * 1984-06-29 1985-10-29 International Business Machines Corporation Narrow line width pattern fabrication

Also Published As

Publication number Publication date
EP0195349A3 (en) 1988-07-27
JPH0453070B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) 1992-08-25
JPS61220260A (ja) 1986-09-30
EP0195349B1 (en) 1991-08-28
US4618767A (en) 1986-10-21
CA1223678A (en) 1987-06-30
EP0195349A2 (en) 1986-09-24

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee