DE3620214A1 - Process and apparatus for creating a chemically active environment for plasmochemical reactions, principally for separating off thin layers - Google Patents

Process and apparatus for creating a chemically active environment for plasmochemical reactions, principally for separating off thin layers

Info

Publication number
DE3620214A1
DE3620214A1 DE19863620214 DE3620214A DE3620214A1 DE 3620214 A1 DE3620214 A1 DE 3620214A1 DE 19863620214 DE19863620214 DE 19863620214 DE 3620214 A DE3620214 A DE 3620214A DE 3620214 A1 DE3620214 A1 DE 3620214A1
Authority
DE
Grant status
Application
Patent type
Prior art keywords
gas
vacuum
invention
plasma
activatable
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
DE19863620214
Other languages
German (de)
Inventor
Ladislav Dipl Ing Bardos
Jindrich Dipl Ing Musil
Vladinir Dipl Ing Dusek
Jiri Dipl Ing Vyskocil
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Akademie Ved Ceske Republiky (The Cezch Academy of Science)
Original Assignee
Akademie Ved Ceske Republiky (The Cezch Academy of Science)
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date

Links

Classifications

    • HELECTRICITY
    • H01BASIC ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32Gas-filled discharge tubes, e.g. for surface treatment of objects such as coating, plating, etching, sterilising or bringing about chemical reactions
    • H01J37/32431Constructional details of the reactor
    • H01J37/3244Gas supply means
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/50Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges
    • C23C16/513Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges using plasma jets

Abstract

The invention relates to possible methods of creating a directable and localisable zone of an activated gas directly in the region of a plasma. According to the invention, an activatable reaction gas or a mixture with at least one working gas is introduced into a vacuum system through a nozzle in the direction of the highest chemical activity required of the active zone forming in the region of the plasma generation at a pressure which is higher than the pressure of the circulating working gas. In this case, a significant part of the activatable gas is converted into a chemically active state in the activated zone of the flowing activatable reaction gas. One embodiment of the apparatus according to the invention is provided, in a vacuum chamber (7), with both a first electrode (6), which simultaneously forms a nozzle (2) through which the activatable gas (1) is passed, and a second electrode (8), which is arranged, as is the first electrode (6), in the region of the plasma generation, a solid substrate (9) being movably mounted between both electrodes (6, 8) in the range of the activated zone (5). The working gas (3) is introduced into the vacuum chamber (7) through a feed line. Both electrodes are connected to a power source (13). In the case of the second alternative, the essence of the invention, in the case of so-called electrodeless plasma generation, is based on the fact that the vacuum chamber (7) equipped with a so-called coupling element (14)... Original abstract incomplete. <IMAGE>
DE19863620214 1985-06-17 1986-06-16 Process and apparatus for creating a chemically active environment for plasmochemical reactions, principally for separating off thin layers Withdrawn DE3620214A1 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CS440785 1985-06-17

Publications (1)

Publication Number Publication Date
DE3620214A1 true true DE3620214A1 (en) 1986-12-18

Family

ID=5386747

Family Applications (1)

Application Number Title Priority Date Filing Date
DE19863620214 Withdrawn DE3620214A1 (en) 1985-06-17 1986-06-16 Process and apparatus for creating a chemically active environment for plasmochemical reactions, principally for separating off thin layers

Country Status (1)

Country Link
DE (1) DE3620214A1 (en)

Cited By (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3729347A1 (en) * 1986-09-05 1988-03-17 Mitsubishi Electric Corp plasma System
DE3810197A1 (en) * 1987-03-27 1988-10-13 Mitsubishi Electric Corp Plasma processing device
DE3741672A1 (en) * 1987-12-09 1989-06-22 Asea Brown Boveri Method and arrangement for surface finishing by substrates
DE3936518A1 (en) * 1989-11-02 1991-05-08 Rieter Ag Maschf Roving frame conveyor - has at height of flyer rail away from servicing side for bobbins and sleeves
EP0727508A1 (en) * 1995-02-16 1996-08-21 Fraunhofer-Gesellschaft Zur Förderung Der Angewandten Forschung E.V. Method and apparatus for treatment of substrate surfaces
DE19722624A1 (en) * 1997-05-30 1998-12-03 Je Plasmaconsult Gmbh An apparatus for generating a plurality of low-temperature plasma jets
EP1050395A2 (en) * 1999-05-05 2000-11-08 Institut für Oberflächenmodifizierung e.V. Open uv/vuv excimer radiator and method for surface modification of polymers
US6448565B1 (en) 1999-07-13 2002-09-10 Perkin Elmer Bodenseewerk Gmbh Unit for a plasma atomizer device with plasma gas-supply means, sample atomizer means and sample injection means

Cited By (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3729347A1 (en) * 1986-09-05 1988-03-17 Mitsubishi Electric Corp plasma System
DE3810197A1 (en) * 1987-03-27 1988-10-13 Mitsubishi Electric Corp Plasma processing device
DE3741672A1 (en) * 1987-12-09 1989-06-22 Asea Brown Boveri Method and arrangement for surface finishing by substrates
DE3936518A1 (en) * 1989-11-02 1991-05-08 Rieter Ag Maschf Roving frame conveyor - has at height of flyer rail away from servicing side for bobbins and sleeves
DE3936518C2 (en) * 1989-11-02 2001-10-11 Rieter Ag Maschf roving
EP0727508A1 (en) * 1995-02-16 1996-08-21 Fraunhofer-Gesellschaft Zur Förderung Der Angewandten Forschung E.V. Method and apparatus for treatment of substrate surfaces
DE19722624A1 (en) * 1997-05-30 1998-12-03 Je Plasmaconsult Gmbh An apparatus for generating a plurality of low-temperature plasma jets
DE19722624C2 (en) * 1997-05-30 2001-08-09 Je Plasmaconsult Gmbh An apparatus for generating a plurality of low-temperature plasma jets
EP1050395A2 (en) * 1999-05-05 2000-11-08 Institut für Oberflächenmodifizierung e.V. Open uv/vuv excimer radiator and method for surface modification of polymers
EP1050395A3 (en) * 1999-05-05 2001-07-11 Institut für Oberflächenmodifizierung e.V. Open uv/vuv excimer radiator and method for surface modification of polymers
US6448565B1 (en) 1999-07-13 2002-09-10 Perkin Elmer Bodenseewerk Gmbh Unit for a plasma atomizer device with plasma gas-supply means, sample atomizer means and sample injection means
DE19932630C2 (en) * 1999-07-13 2003-12-04 Perkin Elmer Bodenseewerk Zwei Unit for a plasma atomization device with a plasma gas supply, Probenzerstäubereinrichtung and sample injection device

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Legal Events

Date Code Title Description
8139 Disposal/non-payment of the annual fee