DE3460905D1 - Process for the electrochemical compensation of the oxidation in the electrochemical regeneration of copper etching solutions containing chloride - Google Patents

Process for the electrochemical compensation of the oxidation in the electrochemical regeneration of copper etching solutions containing chloride

Info

Publication number
DE3460905D1
DE3460905D1 DE8484108467T DE3460905T DE3460905D1 DE 3460905 D1 DE3460905 D1 DE 3460905D1 DE 8484108467 T DE8484108467 T DE 8484108467T DE 3460905 T DE3460905 T DE 3460905T DE 3460905 D1 DE3460905 D1 DE 3460905D1
Authority
DE
Germany
Prior art keywords
electrochemical
oxidation
solutions containing
compensation
etching solutions
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
DE8484108467T
Other languages
English (en)
Inventor
Rudi Dr Dipl Chem Ott
Heribert Reith
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Robert Bosch GmbH
Original Assignee
Robert Bosch GmbH
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Robert Bosch GmbH filed Critical Robert Bosch GmbH
Priority to DE8484108467T priority Critical patent/DE3460905D1/de
Application granted granted Critical
Publication of DE3460905D1 publication Critical patent/DE3460905D1/de
Expired legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23F—NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLIC MATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASS C23 AND AT LEAST ONE PROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25
    • C23F1/00—Etching metallic material by chemical means
    • C23F1/46—Regeneration of etching compositions

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • ing And Chemical Polishing (AREA)
  • Manufacturing Of Printed Circuit Boards (AREA)
DE8484108467T 1983-08-23 1984-07-18 Process for the electrochemical compensation of the oxidation in the electrochemical regeneration of copper etching solutions containing chloride Expired DE3460905D1 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
DE8484108467T DE3460905D1 (en) 1983-08-23 1984-07-18 Process for the electrochemical compensation of the oxidation in the electrochemical regeneration of copper etching solutions containing chloride

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE3330349A DE3330349A1 (de) 1983-08-23 1983-08-23 Verfahren zur elektrochemischen kompensation der luftoxidation bei der elektrochemischen regenerierung von chloridhaltigen kupferaetzloesungen
DE8484108467T DE3460905D1 (en) 1983-08-23 1984-07-18 Process for the electrochemical compensation of the oxidation in the electrochemical regeneration of copper etching solutions containing chloride

Publications (1)

Publication Number Publication Date
DE3460905D1 true DE3460905D1 (en) 1986-11-13

Family

ID=6207205

Family Applications (2)

Application Number Title Priority Date Filing Date
DE3330349A Withdrawn DE3330349A1 (de) 1983-08-23 1983-08-23 Verfahren zur elektrochemischen kompensation der luftoxidation bei der elektrochemischen regenerierung von chloridhaltigen kupferaetzloesungen
DE8484108467T Expired DE3460905D1 (en) 1983-08-23 1984-07-18 Process for the electrochemical compensation of the oxidation in the electrochemical regeneration of copper etching solutions containing chloride

Family Applications Before (1)

Application Number Title Priority Date Filing Date
DE3330349A Withdrawn DE3330349A1 (de) 1983-08-23 1983-08-23 Verfahren zur elektrochemischen kompensation der luftoxidation bei der elektrochemischen regenerierung von chloridhaltigen kupferaetzloesungen

Country Status (2)

Country Link
EP (1) EP0141905B1 (de)
DE (2) DE3330349A1 (de)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE4010035A1 (de) * 1990-03-29 1991-10-02 Hoellmueller Maschbau H Vorrichtung zur elektrolytischen regeneration eines chlorid- und metallionen enthaltenden aetzmittels
DE69219063T2 (de) * 1991-10-28 1997-11-20 Nittetsu Mining Co Ltd Verfahren zum Regenerieren von Ätzmitteln

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE2008766B2 (de) * 1970-02-23 1971-07-29 Licentia Patent Verwaltungs GmbH, 6000 Frankfurt Verfahren zum regenerieren einer kupferhaltigen aetzloesung insbesondere fuer die herstellung von gedruckten schaltungen
DE2241462A1 (de) * 1972-08-23 1974-03-07 Bach & Co Verfahren zum rueckgewinnen einer kupfer(ii)-chlorid enthaltenden aetzloesung
DE2641905C2 (de) * 1976-09-17 1986-03-20 Geb. Bakulina Galina Aleksandrovna Batova Verfahren zur Regenerierung verbrauchter Ätzlösungen
DE2650912A1 (de) * 1976-11-06 1978-05-18 Hoellmueller Maschbau H Elektrolytische regeneration eines aetzmittels
DE2850564C2 (de) * 1978-11-22 1982-12-23 Kernforschungsanlage Jülich GmbH, 5170 Jülich Verfahren und Vorrichtung zum Regenerieren einer Kupfer(II)-Chlorid und/oder Eisen(III)-Chlorid enthaltenden Ätzlösung in einer Elektrolysezelle

Also Published As

Publication number Publication date
EP0141905A1 (de) 1985-05-22
EP0141905B1 (de) 1986-10-08
DE3330349A1 (de) 1985-03-14

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8320 Willingness to grant licences declared (paragraph 23)
8339 Ceased/non-payment of the annual fee