DE3441056A1 - Verfahren zur verminderung des verschleisses von bei der gasphasenabscheidung von silizium verwendeten quarzteilen - Google Patents

Verfahren zur verminderung des verschleisses von bei der gasphasenabscheidung von silizium verwendeten quarzteilen

Info

Publication number
DE3441056A1
DE3441056A1 DE19843441056 DE3441056A DE3441056A1 DE 3441056 A1 DE3441056 A1 DE 3441056A1 DE 19843441056 DE19843441056 DE 19843441056 DE 3441056 A DE3441056 A DE 3441056A DE 3441056 A1 DE3441056 A1 DE 3441056A1
Authority
DE
Germany
Prior art keywords
silicon
quartz parts
quartz
phase deposition
gas
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
DE19843441056
Other languages
English (en)
Inventor
Frank Stefan Dr Rer Nat Becker
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Siemens AG
Original Assignee
Siemens AG
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Siemens AG filed Critical Siemens AG
Priority to DE19843441056 priority Critical patent/DE3441056A1/de
Publication of DE3441056A1 publication Critical patent/DE3441056A1/de
Withdrawn legal-status Critical Current

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/30Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
    • C23C16/32Carbides
    • C23C16/325Silicon carbide
    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03CCHEMICAL COMPOSITION OF GLASSES, GLAZES, OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C03C17/22Surface treatment of glass, not in the form of fibres or filaments, by coating with other inorganic material
    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03CCHEMICAL COMPOSITION OF GLASSES, GLAZES, OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C03C17/22Surface treatment of glass, not in the form of fibres or filaments, by coating with other inorganic material
    • C03C17/225Nitrides
    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03CCHEMICAL COMPOSITION OF GLASSES, GLAZES, OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C03C17/22Surface treatment of glass, not in the form of fibres or filaments, by coating with other inorganic material
    • C03C17/23Oxides
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/30Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
    • C23C16/34Nitrides
    • C23C16/345Silicon nitride
    • CCHEMISTRY; METALLURGY
    • C30CRYSTAL GROWTH
    • C30BSINGLE-CRYSTAL-GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B25/00Single-crystal growth by chemical reaction of reactive gases, e.g. chemical vapour-deposition growth
    • C30B25/02Epitaxial-layer growth
    • C30B25/08Reaction chambers; Selection of materials therefor
    • CCHEMISTRY; METALLURGY
    • C30CRYSTAL GROWTH
    • C30BSINGLE-CRYSTAL-GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B25/00Single-crystal growth by chemical reaction of reactive gases, e.g. chemical vapour-deposition growth
    • C30B25/02Epitaxial-layer growth
    • C30B25/12Substrate holders or susceptors
    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03CCHEMICAL COMPOSITION OF GLASSES, GLAZES, OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2217/00Coatings on glass
    • C03C2217/20Materials for coating a single layer on glass
    • C03C2217/21Oxides
    • C03C2217/23Mixtures
    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03CCHEMICAL COMPOSITION OF GLASSES, GLAZES, OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2217/00Coatings on glass
    • C03C2217/20Materials for coating a single layer on glass
    • C03C2217/28Other inorganic materials
    • C03C2217/281Nitrides
    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03CCHEMICAL COMPOSITION OF GLASSES, GLAZES, OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2217/00Coatings on glass
    • C03C2217/20Materials for coating a single layer on glass
    • C03C2217/28Other inorganic materials
    • C03C2217/282Carbides, silicides
    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03CCHEMICAL COMPOSITION OF GLASSES, GLAZES, OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2218/00Methods for coating glass
    • C03C2218/10Deposition methods
    • C03C2218/15Deposition methods from the vapour phase
    • C03C2218/152Deposition methods from the vapour phase by cvd
DE19843441056 1984-11-09 1984-11-09 Verfahren zur verminderung des verschleisses von bei der gasphasenabscheidung von silizium verwendeten quarzteilen Withdrawn DE3441056A1 (de)

Priority Applications (1)

Application Number Priority Date Filing Date Title
DE19843441056 DE3441056A1 (de) 1984-11-09 1984-11-09 Verfahren zur verminderung des verschleisses von bei der gasphasenabscheidung von silizium verwendeten quarzteilen

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE19843441056 DE3441056A1 (de) 1984-11-09 1984-11-09 Verfahren zur verminderung des verschleisses von bei der gasphasenabscheidung von silizium verwendeten quarzteilen

Publications (1)

Publication Number Publication Date
DE3441056A1 true DE3441056A1 (de) 1986-05-22

Family

ID=6249948

Family Applications (1)

Application Number Title Priority Date Filing Date
DE19843441056 Withdrawn DE3441056A1 (de) 1984-11-09 1984-11-09 Verfahren zur verminderung des verschleisses von bei der gasphasenabscheidung von silizium verwendeten quarzteilen

Country Status (1)

Country Link
DE (1) DE3441056A1 (de)

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0470386A2 (de) * 1990-08-08 1992-02-12 Shin-Etsu Chemical Co., Ltd. Verfahren zum Abscheiden einer anorganischen Dünnschicht auf einem Substrat
DE4413423A1 (de) * 1994-04-18 1995-10-19 Paar Anton Kg Vorrichtung zum Aufschluß von Substanzen
DE4429825C1 (de) * 1994-08-23 1995-11-09 Heraeus Quarzglas Beschichtetes Bauteil aus Quarzglas
EP0763504A1 (de) * 1995-09-14 1997-03-19 Heraeus Quarzglas GmbH Quarzglasteil und Verfahren zur dessen Herstellung
DE10304913A1 (de) * 2002-11-02 2004-06-17 Rovema Verpackungsmaschinen Gmbh Vorrichtung zum Aufnehmen eines Folienschlauches und vertikale Schlauchbeutelmaschine mit einer derartigen Vorrichtung
WO2006110481A2 (en) * 2005-04-10 2006-10-19 Rec Silicon Inc Production of polycrystalline silicon
DE102013208799A1 (de) 2013-05-14 2014-11-20 Heraeus Quarzglas Gmbh & Co. Kg SiO2-basierte Sperrschicht für Hochtemperatur-Diffusions- und Beschichtungsprozesse

Citations (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR1190308A (fr) * 1958-01-21 1959-10-12 Manufactures Des Galces Et Pro Creusets ou pièces analogues en matière réfractaire et procédé pour leur fabrication
DE1260921B (de) * 1964-08-06 1968-02-08 Siemens Ag Verfahren zum Herstellen eines Tiegels zum Ziehen von Kristallen aus der Schmelze
DE1957952A1 (de) * 1969-11-18 1971-05-27 Siemens Ag Siliciumnitridbeschichtung an Quarzwaenden fuer Diffusions- und Oxydationsreaktoren
DE2330720A1 (de) * 1972-07-01 1974-01-10 Philips Nv Verfahren zur herstellung gasdichter rohre und behaelter
DE2455668A1 (de) * 1973-11-27 1975-05-28 Post Office Dielektrischer optischer wellenleiter und dessen herstellungsverfahren
US4145456A (en) * 1974-09-14 1979-03-20 Dieter Kuppers Method of producing internally coated glass tubes for the drawing of fibre optic light conductors
DE2853873A1 (de) * 1978-12-13 1980-07-03 Siemens Ag Herstellung einer glasfaser hoher zerreissfestigkeit
DE3037491A1 (de) * 1979-10-04 1981-04-09 Nippon Telegraph & Telephone Verfahren zur herstellung einer glasvorform fuer die optische uebertragung
CH623800A5 (de) * 1975-08-28 1981-06-30 Heraeus Schott Quarzschmelze
US4279947A (en) * 1975-11-25 1981-07-21 Motorola, Inc. Deposition of silicon nitride
DE3027592A1 (de) * 1980-07-21 1982-03-04 Siemens Ag Verfahren zum herstellen einer schicht aus glas auf einer innenflaeche eines hohlkoerpers
DE3232888A1 (de) * 1982-09-04 1984-03-08 Licentia Gmbh Verfahren zur herstellung eines lichtwellenleiters

Patent Citations (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR1190308A (fr) * 1958-01-21 1959-10-12 Manufactures Des Galces Et Pro Creusets ou pièces analogues en matière réfractaire et procédé pour leur fabrication
DE1260921B (de) * 1964-08-06 1968-02-08 Siemens Ag Verfahren zum Herstellen eines Tiegels zum Ziehen von Kristallen aus der Schmelze
DE1957952A1 (de) * 1969-11-18 1971-05-27 Siemens Ag Siliciumnitridbeschichtung an Quarzwaenden fuer Diffusions- und Oxydationsreaktoren
DE2330720A1 (de) * 1972-07-01 1974-01-10 Philips Nv Verfahren zur herstellung gasdichter rohre und behaelter
DE2455668A1 (de) * 1973-11-27 1975-05-28 Post Office Dielektrischer optischer wellenleiter und dessen herstellungsverfahren
US4145456A (en) * 1974-09-14 1979-03-20 Dieter Kuppers Method of producing internally coated glass tubes for the drawing of fibre optic light conductors
CH623800A5 (de) * 1975-08-28 1981-06-30 Heraeus Schott Quarzschmelze
US4279947A (en) * 1975-11-25 1981-07-21 Motorola, Inc. Deposition of silicon nitride
DE2853873A1 (de) * 1978-12-13 1980-07-03 Siemens Ag Herstellung einer glasfaser hoher zerreissfestigkeit
DE3037491A1 (de) * 1979-10-04 1981-04-09 Nippon Telegraph & Telephone Verfahren zur herstellung einer glasvorform fuer die optische uebertragung
DE3027592A1 (de) * 1980-07-21 1982-03-04 Siemens Ag Verfahren zum herstellen einer schicht aus glas auf einer innenflaeche eines hohlkoerpers
DE3232888A1 (de) * 1982-09-04 1984-03-08 Licentia Gmbh Verfahren zur herstellung eines lichtwellenleiters

Non-Patent Citations (5)

* Cited by examiner, † Cited by third party
Title
J. Electrochem. Soc., Solid-State Science and Technology, Jan. 1978, S.139-145 *
JP-Z: Patent Abstracts of Japan, C-143, Jan.7, 1983, Vol.7, No.3 *
JP-Z: Patent Abstracts of Japan, C-21, Aug.13, 1980, No.4 *
US-Z: *
US-Z: J. Electrochem. Soc., Solid-State Science and Technology, April 1977, S.599-606 *

Cited By (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0470386A2 (de) * 1990-08-08 1992-02-12 Shin-Etsu Chemical Co., Ltd. Verfahren zum Abscheiden einer anorganischen Dünnschicht auf einem Substrat
EP0470386A3 (en) * 1990-08-08 1993-01-13 Shin-Etsu Chemical Co., Ltd. Method for depositing an inorganic thin film on a substrate
DE4413423A1 (de) * 1994-04-18 1995-10-19 Paar Anton Kg Vorrichtung zum Aufschluß von Substanzen
DE4429825C1 (de) * 1994-08-23 1995-11-09 Heraeus Quarzglas Beschichtetes Bauteil aus Quarzglas
EP0698584A3 (de) * 1994-08-23 1997-05-28 Heraeus Quarzglas Beschichtetes Bauteil aus Quarzglas
EP0763504A1 (de) * 1995-09-14 1997-03-19 Heraeus Quarzglas GmbH Quarzglasteil und Verfahren zur dessen Herstellung
DE10304913A1 (de) * 2002-11-02 2004-06-17 Rovema Verpackungsmaschinen Gmbh Vorrichtung zum Aufnehmen eines Folienschlauches und vertikale Schlauchbeutelmaschine mit einer derartigen Vorrichtung
WO2006110481A2 (en) * 2005-04-10 2006-10-19 Rec Silicon Inc Production of polycrystalline silicon
WO2006110481A3 (en) * 2005-04-10 2007-04-05 Rec Silicon Inc Production of polycrystalline silicon
DE102013208799A1 (de) 2013-05-14 2014-11-20 Heraeus Quarzglas Gmbh & Co. Kg SiO2-basierte Sperrschicht für Hochtemperatur-Diffusions- und Beschichtungsprozesse

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