DE3431739A1 - Vorrichtung und verfahren zur positionserfassung - Google Patents
Vorrichtung und verfahren zur positionserfassungInfo
- Publication number
- DE3431739A1 DE3431739A1 DE19843431739 DE3431739A DE3431739A1 DE 3431739 A1 DE3431739 A1 DE 3431739A1 DE 19843431739 DE19843431739 DE 19843431739 DE 3431739 A DE3431739 A DE 3431739A DE 3431739 A1 DE3431739 A1 DE 3431739A1
- Authority
- DE
- Germany
- Prior art keywords
- light
- pattern
- information
- signal
- scanning
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000000034 method Methods 0.000 title claims description 20
- 238000001514 detection method Methods 0.000 claims description 61
- 238000004364 calculation method Methods 0.000 claims description 9
- 230000007717 exclusion Effects 0.000 claims 5
- 230000000903 blocking effect Effects 0.000 claims 1
- 108091008695 photoreceptors Proteins 0.000 description 22
- 229920002120 photoresistant polymer Polymers 0.000 description 21
- 230000003287 optical effect Effects 0.000 description 12
- 230000010287 polarization Effects 0.000 description 10
- 210000001747 pupil Anatomy 0.000 description 5
- 239000000463 material Substances 0.000 description 4
- 238000012545 processing Methods 0.000 description 4
- 238000004519 manufacturing process Methods 0.000 description 3
- 239000004065 semiconductor Substances 0.000 description 3
- 230000015572 biosynthetic process Effects 0.000 description 2
- 238000006243 chemical reaction Methods 0.000 description 2
- 239000011248 coating agent Substances 0.000 description 2
- 238000000576 coating method Methods 0.000 description 2
- 238000013461 design Methods 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 239000004973 liquid crystal related substance Substances 0.000 description 2
- 230000000149 penetrating effect Effects 0.000 description 2
- 239000012780 transparent material Substances 0.000 description 2
- 238000007796 conventional method Methods 0.000 description 1
- 238000012937 correction Methods 0.000 description 1
- 238000011161 development Methods 0.000 description 1
- 230000018109 developmental process Effects 0.000 description 1
- 230000002996 emotional effect Effects 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 238000001914 filtration Methods 0.000 description 1
- 238000007373 indentation Methods 0.000 description 1
- 238000007689 inspection Methods 0.000 description 1
- 230000002452 interceptive effect Effects 0.000 description 1
- 239000003550 marker Substances 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000005192 partition Methods 0.000 description 1
- 230000005855 radiation Effects 0.000 description 1
- 230000001360 synchronised effect Effects 0.000 description 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
- G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP58159652A JPS6052021A (ja) | 1983-08-31 | 1983-08-31 | 位置検出方法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| DE3431739A1 true DE3431739A1 (de) | 1985-03-07 |
| DE3431739C2 DE3431739C2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) | 1992-06-17 |
Family
ID=15698384
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| DE19843431739 Granted DE3431739A1 (de) | 1983-08-31 | 1984-08-29 | Vorrichtung und verfahren zur positionserfassung |
Country Status (4)
Families Citing this family (18)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6139021A (ja) * | 1984-07-31 | 1986-02-25 | Canon Inc | 光学装置 |
| US4937459A (en) * | 1984-11-16 | 1990-06-26 | Canon Kabushiki Kaisha | Alignment signal detecting device |
| JPS6220313A (ja) * | 1985-07-19 | 1987-01-28 | Hitachi Ltd | パタ−ン検出方法及びその装置 |
| US5231471A (en) * | 1986-03-25 | 1993-07-27 | Canon Kabushiki Kaisha | Alignment and exposure apparatus |
| US5148214A (en) * | 1986-05-09 | 1992-09-15 | Canon Kabushiki Kaisha | Alignment and exposure apparatus |
| JPS62262426A (ja) * | 1986-05-09 | 1987-11-14 | Canon Inc | 露光装置 |
| DE3735154C2 (de) * | 1986-10-17 | 1994-10-20 | Canon Kk | Verfahren zum Erfassen der Lage einer auf einem Objekt vorgesehenen Marke |
| JP2514037B2 (ja) * | 1987-07-02 | 1996-07-10 | キヤノン株式会社 | 検知光学系 |
| DE68901933T2 (de) * | 1988-02-16 | 1992-12-24 | Canon Kk | Vorrichtung zur lagefeststellung. |
| US5340992A (en) * | 1988-02-16 | 1994-08-23 | Canon Kabushiki Kaisha | Apparatus and method of detecting positional relationship using a weighted coefficient |
| US5218415A (en) * | 1988-05-31 | 1993-06-08 | Canon Kabushiki Kaisha | Device for optically detecting inclination of a surface |
| JPH07111340B2 (ja) * | 1990-10-31 | 1995-11-29 | 信越半導体株式会社 | パターンシフト測定方法 |
| US5268775A (en) * | 1991-02-19 | 1993-12-07 | Hughes-Jvc Technology Corporation | Contrast enhancement and ghost elimination, for reflective light valve system |
| JP3210123B2 (ja) * | 1992-03-27 | 2001-09-17 | キヤノン株式会社 | 結像方法及び該方法を用いたデバイス製造方法 |
| JP3624048B2 (ja) * | 1996-03-29 | 2005-02-23 | キヤノン株式会社 | 照度測定方法 |
| JP3643572B2 (ja) * | 2002-05-31 | 2005-04-27 | 株式会社アドテックエンジニアリング | 投影露光装置及び位置合わせ装置 |
| DE102005061834B4 (de) | 2005-12-23 | 2007-11-08 | Ioss Intelligente Optische Sensoren & Systeme Gmbh | Vorrichtung und Verfahren zum optischen Prüfen einer Oberfläche |
| JP2018207140A (ja) * | 2017-05-30 | 2018-12-27 | セイコーエプソン株式会社 | スキャナーおよびスキャンデータの生産方法 |
Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3922093A (en) * | 1972-11-24 | 1975-11-25 | Bbc Brown Boveri & Cie | Device for measuring the roughness of a surface |
| US4112309A (en) * | 1975-11-22 | 1978-09-05 | Nippon Kogaku K.K. | Apparatus for measuring the line width of a pattern |
| WO1980001002A1 (fr) * | 1978-10-30 | 1980-05-15 | Fujitsu Ltd | Systeme d'inspection de motifs |
| DE2953303C2 (de) * | 1978-10-30 | 1987-04-16 | Fujitsu Ltd., Kawasaki, Kanagawa | Musterüberprüfungssystem |
Family Cites Families (21)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| GB1063479A (en) * | 1963-10-21 | 1967-03-30 | Owens Illinois Inc | Improvements in and relating to the inspection of transparent or translucent containers |
| CH465269A (de) * | 1967-06-15 | 1968-11-15 | Emhart Zuerich Sa | Einrichtung zur optischen Prüfung von gläsernen Gegenständen auf Risse |
| US3739247A (en) * | 1971-05-17 | 1973-06-12 | Canon Kk | Positioning device using photoelectric scanning |
| US3796497A (en) * | 1971-12-01 | 1974-03-12 | Ibm | Optical alignment method and apparatus |
| US3821545A (en) * | 1972-05-26 | 1974-06-28 | Hitachi Ltd | Mask alignment in manufacturing semiconductor integrated circuits |
| US3885877A (en) * | 1973-10-11 | 1975-05-27 | Ibm | Electro-optical fine alignment process |
| US3880750A (en) * | 1974-06-06 | 1975-04-29 | Owens Illinois Inc | Sealing surface gauge |
| NO135609C (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) * | 1975-06-03 | 1977-05-11 | Tore Planke | |
| US4092068A (en) * | 1976-05-05 | 1978-05-30 | Domtar Inc. | Surface sensor |
| JPS53111280A (en) * | 1977-03-10 | 1978-09-28 | Canon Inc | Mask or wafer for production of semiconductor elements and device for aligning these |
| JPS53135654A (en) * | 1977-05-01 | 1978-11-27 | Canon Inc | Photoelectric detecting device |
| US4200395A (en) * | 1977-05-03 | 1980-04-29 | Massachusetts Institute Of Technology | Alignment of diffraction gratings |
| DE2727927C3 (de) * | 1977-06-21 | 1980-01-24 | Erwin Sick Gmbh Optik-Elektronik, 7808 Waldkirch | Vorrichtung zur getrennten Erfassung von Lichtstrahlen |
| FR2401415A1 (fr) * | 1977-08-24 | 1979-03-23 | Emballage Ste Gle Pour | Inspection et controle d'objets transparents |
| JPS5453562A (en) * | 1977-10-05 | 1979-04-26 | Canon Inc | Photoelectric detector |
| DE2808360C3 (de) * | 1978-02-27 | 1981-09-24 | Erwin Sick Gmbh Optik-Elektronik, 7808 Waldkirch | Optische Vorrichtung zur Bestimmung des Lichtaustrittswinkels |
| JPS5534490A (en) * | 1978-09-01 | 1980-03-11 | Canon Inc | Alignment device |
| JPS5617017A (en) * | 1979-07-20 | 1981-02-18 | Nippon Kogaku Kk <Nikon> | Positioning device using bidirectional diffraction grating |
| JPS5624504A (en) * | 1979-08-06 | 1981-03-09 | Canon Inc | Photoelectric detector |
| JPS5874038A (ja) * | 1981-10-28 | 1983-05-04 | Canon Inc | マスクとウエハ−の位置合せ方法 |
| JPS5972728A (ja) * | 1982-10-20 | 1984-04-24 | Canon Inc | 自動整合装置 |
-
1983
- 1983-08-31 JP JP58159652A patent/JPS6052021A/ja active Granted
-
1984
- 1984-08-21 US US06/642,760 patent/US4641035A/en not_active Expired - Lifetime
- 1984-08-29 DE DE19843431739 patent/DE3431739A1/de active Granted
- 1984-08-30 GB GB08421876A patent/GB2147411B/en not_active Expired
Patent Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3922093A (en) * | 1972-11-24 | 1975-11-25 | Bbc Brown Boveri & Cie | Device for measuring the roughness of a surface |
| US4112309A (en) * | 1975-11-22 | 1978-09-05 | Nippon Kogaku K.K. | Apparatus for measuring the line width of a pattern |
| WO1980001002A1 (fr) * | 1978-10-30 | 1980-05-15 | Fujitsu Ltd | Systeme d'inspection de motifs |
| DE2953303C2 (de) * | 1978-10-30 | 1987-04-16 | Fujitsu Ltd., Kawasaki, Kanagawa | Musterüberprüfungssystem |
Also Published As
| Publication number | Publication date |
|---|---|
| US4641035A (en) | 1987-02-03 |
| DE3431739C2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) | 1992-06-17 |
| JPS6052021A (ja) | 1985-03-23 |
| JPH0145973B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) | 1989-10-05 |
| GB2147411A (en) | 1985-05-09 |
| GB2147411B (en) | 1987-08-26 |
| GB8421876D0 (en) | 1984-10-03 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| 8110 | Request for examination paragraph 44 | ||
| D2 | Grant after examination | ||
| 8364 | No opposition during term of opposition |