DE3368642D1 - N-alkylindolylidene and n-alkylbenzothiazolylidene alkanones as sensitizers for photopolymer compositions - Google Patents

N-alkylindolylidene and n-alkylbenzothiazolylidene alkanones as sensitizers for photopolymer compositions

Info

Publication number
DE3368642D1
DE3368642D1 DE8383108973T DE3368642T DE3368642D1 DE 3368642 D1 DE3368642 D1 DE 3368642D1 DE 8383108973 T DE8383108973 T DE 8383108973T DE 3368642 T DE3368642 T DE 3368642T DE 3368642 D1 DE3368642 D1 DE 3368642D1
Authority
DE
Germany
Prior art keywords
alkylbenzothiazolylidene
alkylindolylidene
alkanones
sensitizers
photopolymer compositions
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
DE8383108973T
Other languages
German (de)
English (en)
Inventor
Thomas Eugene Dueber
William J Link
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
EIDP Inc
Original Assignee
EI Du Pont de Nemours and Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by EI Du Pont de Nemours and Co filed Critical EI Du Pont de Nemours and Co
Application granted granted Critical
Publication of DE3368642D1 publication Critical patent/DE3368642D1/de
Expired legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/031—Organic compounds not covered by group G03F7/029
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2/00—Processes of polymerisation
    • C08F2/46—Polymerisation initiated by wave energy or particle radiation
    • C08F2/48—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
    • C08F2/50—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light with sensitising agents
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/106—Binder containing
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/106—Binder containing
    • Y10S430/111—Polymer of unsaturated acid or ester
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/114—Initiator containing
    • Y10S430/117—Free radical
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/127—Spectral sensitizer containing

Landscapes

  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Polymerisation Methods In General (AREA)
  • Plural Heterocyclic Compounds (AREA)
  • Indole Compounds (AREA)
DE8383108973T 1982-09-13 1983-09-10 N-alkylindolylidene and n-alkylbenzothiazolylidene alkanones as sensitizers for photopolymer compositions Expired DE3368642D1 (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US06/417,682 US4454218A (en) 1982-09-13 1982-09-13 N-Alkylindolylidene and N-alkylbenzo-thiazolylidene alkanones as sensitizers for photopolymer compositions

Publications (1)

Publication Number Publication Date
DE3368642D1 true DE3368642D1 (en) 1987-02-05

Family

ID=23654976

Family Applications (1)

Application Number Title Priority Date Filing Date
DE8383108973T Expired DE3368642D1 (en) 1982-09-13 1983-09-10 N-alkylindolylidene and n-alkylbenzothiazolylidene alkanones as sensitizers for photopolymer compositions

Country Status (4)

Country Link
US (1) US4454218A (enEXAMPLES)
EP (1) EP0103294B1 (enEXAMPLES)
JP (1) JPS5974551A (enEXAMPLES)
DE (1) DE3368642D1 (enEXAMPLES)

Families Citing this family (25)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB8321813D0 (en) * 1983-08-12 1983-09-14 Vickers Plc Radiation sensitive compounds
EP0152889B1 (de) * 1984-02-18 1987-09-16 BASF Aktiengesellschaft Lichtempfindliche Aufzeichnungsmaterialien
US4849322A (en) * 1986-04-30 1989-07-18 E. I. Du Pont De Nemours And Company Positive-working color proofing film and process
JP2538992B2 (ja) * 1987-07-21 1996-10-02 三菱化学株式会社 光重合性組成物
US4917977A (en) * 1988-12-23 1990-04-17 E. I. Du Pont De Nemours And Company Visible sensitizers for photopolymerizable compositions
CA2033821A1 (en) * 1990-01-12 1991-07-13 Evan D. Laganis Photopolymerizable compositions sensitive to longer wavelength visible actinic radiation
US5557308A (en) 1994-07-08 1996-09-17 E. I. Du Pont De Nemours And Company Ink jet print head photoresist layer having durable adhesion characteristics
SG78412A1 (en) 1999-03-31 2001-02-20 Ciba Sc Holding Ag Oxime derivatives and the use thereof as latent acids
US6335144B1 (en) * 1999-04-27 2002-01-01 Fuji Photo Film Co., Ltd. Photopolymerizable composition for short wavelength semiconductor laser exposure
DE10149077A1 (de) * 2001-10-05 2003-04-24 Tesa Ag Verfahren zur Herstellung UV-vernetzbarer Acrylathaftklebemassen
US6766740B1 (en) * 2002-02-21 2004-07-27 Precision Rubber Plate Co., Inc. Apparatus and method using a UV light collimator to expose a photopolymer plate
DE102004030019A1 (de) * 2004-06-22 2006-01-19 Xetos Ag Photopolymerisierbare Zusammensetzung
US20060154180A1 (en) 2005-01-07 2006-07-13 Kannurpatti Anandkumar R Imaging element for use as a recording element and process of using the imaging element
EP1701213A3 (en) * 2005-03-08 2006-11-22 Fuji Photo Film Co., Ltd. Photosensitive composition
US7579134B2 (en) * 2005-03-15 2009-08-25 E. I. Dupont De Nemours And Company Polyimide composite coverlays and methods and compositions relating thereto
WO2008015878A1 (fr) * 2006-08-03 2008-02-07 Konica Minolta Medical & Graphic, Inc. Matériau de plaque lithographique photosensible
KR20100010894A (ko) * 2008-07-23 2010-02-02 가부시키가이샤 키노파마 Ｄｙｒｋ를 저해하는 화합물을 함유하는 의약 조성물
EP2539316B1 (en) 2010-02-24 2019-10-23 Basf Se Latent acids and their use
JP6103470B2 (ja) * 2011-12-14 2017-03-29 川崎化成工業株式会社 縮合多環芳香族骨格を有する連鎖移動剤並びに該縮合多環芳香族骨格を有するポリマーおよびポリマーの製造方法
JP6020883B2 (ja) * 2012-05-29 2016-11-02 川崎化成工業株式会社 縮合多環芳香族骨格を有する連鎖移動剤組成物及び該縮合多環芳香族骨格を有するポリマー及びポリマーの製造方法
KR102537349B1 (ko) 2015-02-02 2023-05-26 바스프 에스이 잠재성 산 및 그의 용도
EP4043961B1 (de) 2021-02-11 2023-08-16 Xetos AG 2k-system
ES2955365T3 (es) 2021-02-11 2023-11-30 Xetos Ag Composición fotopolimerizable
EP4043963B1 (de) 2021-02-11 2023-07-05 Xetos AG Verbessertes ausbleichen
ES2969163T3 (es) 2021-02-11 2024-05-16 Xetos Ag Composición HOE fotopolimerizable

Family Cites Families (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3479185A (en) * 1965-06-03 1969-11-18 Du Pont Photopolymerizable compositions and layers containing 2,4,5-triphenylimidazoyl dimers
US3549367A (en) * 1968-05-24 1970-12-22 Du Pont Photopolymerizable compositions containing triarylimidazolyl dimers and p-aminophenyl ketones
US3697280A (en) * 1969-05-22 1972-10-10 Du Pont Hexaarylbiimidazole-selected aromatic hydrocarbon compositions
US3652275A (en) * 1970-07-09 1972-03-28 Du Pont HEXAARYLBIIMIDAZOLE BIS (p-DIALKYL-AMINOPHENYL-{60 ,{62 -UNSATURATED) KETONE COMPOSITIONS
JPS5148516B2 (enEXAMPLES) * 1973-02-07 1976-12-21
US3916069A (en) * 1973-04-02 1975-10-28 Minnesota Mining & Mfg Reduced styryl/cyanine dye
JPS5179342A (enEXAMPLES) * 1974-12-26 1976-07-10 Fuji Photo Film Co Ltd
US4062686A (en) * 1976-04-21 1977-12-13 Eastman Kodak Company Sensitizers for photocrosslinkable polymers
CA1127340A (en) * 1977-12-30 1982-07-06 Kohtaro Nagasawa Photocurable light-sensitive composition and material
US4162162A (en) * 1978-05-08 1979-07-24 E. I. Du Pont De Nemours And Company Derivatives of aryl ketones and p-dialkyl-aminoarylaldehydes as visible sensitizers of photopolymerizable compositions
JPS54152091A (en) * 1978-05-22 1979-11-29 Fuji Photo Film Co Ltd Photopolymerizable composition
JPS5550001A (en) * 1978-10-06 1980-04-11 Fuji Photo Film Co Ltd Photo-polymerizable composition
JPS55118030A (en) * 1979-03-06 1980-09-10 Fuji Photo Film Co Ltd Photopolymerizable composition
JPS5721401A (en) * 1980-07-14 1982-02-04 Mitsubishi Chem Ind Ltd Photopolymerizable composition
US4341860A (en) * 1981-06-08 1982-07-27 E. I. Du Pont De Nemours And Company Photoimaging compositions containing substituted cyclohexadienone compounds

Also Published As

Publication number Publication date
EP0103294B1 (en) 1986-12-30
US4454218A (en) 1984-06-12
JPH0143299B2 (enEXAMPLES) 1989-09-20
JPS5974551A (ja) 1984-04-27
EP0103294A1 (en) 1984-03-21

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee