DE3342046A1 - Vorrichtung zur stabilen verankerung von schichten auf grossflaechigen halbleiterbauelementen - Google Patents

Vorrichtung zur stabilen verankerung von schichten auf grossflaechigen halbleiterbauelementen

Info

Publication number
DE3342046A1
DE3342046A1 DE19833342046 DE3342046A DE3342046A1 DE 3342046 A1 DE3342046 A1 DE 3342046A1 DE 19833342046 DE19833342046 DE 19833342046 DE 3342046 A DE3342046 A DE 3342046A DE 3342046 A1 DE3342046 A1 DE 3342046A1
Authority
DE
Germany
Prior art keywords
magazines
furnace
gas
magazine
components
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
DE19833342046
Other languages
German (de)
English (en)
Other versions
DE3342046C2 (https=
Inventor
Klaus 2000 Hamburg Hennings
Stefan Dipl.-Ing. Reul
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Telefunken Systemtechnik AG
Original Assignee
Licentia Patent Verwaltungs GmbH
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from DE19833329923 external-priority patent/DE3329923A1/de
Application filed by Licentia Patent Verwaltungs GmbH filed Critical Licentia Patent Verwaltungs GmbH
Priority to DE19833342046 priority Critical patent/DE3342046A1/de
Publication of DE3342046A1 publication Critical patent/DE3342046A1/de
Application granted granted Critical
Publication of DE3342046C2 publication Critical patent/DE3342046C2/de
Granted legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
    • H10F71/00—Manufacture or treatment of devices covered by this subclass
    • H10F71/137—Batch treatment of the devices
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
    • H10F77/00—Constructional details of devices covered by this subclass
    • H10F77/20—Electrodes
    • H10F77/206—Electrodes for devices having potential barriers
    • H10F77/211—Electrodes for devices having potential barriers for photovoltaic cells
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
    • Y02E10/00—Energy generation through renewable energy sources
    • Y02E10/50—Photovoltaic [PV] energy
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
    • Y02P70/00—Climate change mitigation technologies in the production process for final industrial or consumer products
    • Y02P70/50—Manufacturing or production processes characterised by the final manufactured product

Landscapes

  • Photovoltaic Devices (AREA)
  • Furnace Details (AREA)
  • Tunnel Furnaces (AREA)
DE19833342046 1983-08-19 1983-11-22 Vorrichtung zur stabilen verankerung von schichten auf grossflaechigen halbleiterbauelementen Granted DE3342046A1 (de)

Priority Applications (1)

Application Number Priority Date Filing Date Title
DE19833342046 DE3342046A1 (de) 1983-08-19 1983-11-22 Vorrichtung zur stabilen verankerung von schichten auf grossflaechigen halbleiterbauelementen

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE19833329923 DE3329923A1 (de) 1983-08-19 1983-08-19 Vorrichtung zur stabilen verankerung von schichten auf grossflaechigen halbleiterbauelementen
DE19833342046 DE3342046A1 (de) 1983-08-19 1983-11-22 Vorrichtung zur stabilen verankerung von schichten auf grossflaechigen halbleiterbauelementen

Publications (2)

Publication Number Publication Date
DE3342046A1 true DE3342046A1 (de) 1985-05-30
DE3342046C2 DE3342046C2 (https=) 1988-11-10

Family

ID=25813318

Family Applications (1)

Application Number Title Priority Date Filing Date
DE19833342046 Granted DE3342046A1 (de) 1983-08-19 1983-11-22 Vorrichtung zur stabilen verankerung von schichten auf grossflaechigen halbleiterbauelementen

Country Status (1)

Country Link
DE (1) DE3342046A1 (https=)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0379004A3 (en) * 1989-01-14 1990-10-10 Nukem Gmbh Process and apparatus for the production of a semiconductor layer system

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102006051557A1 (de) * 2006-11-02 2008-05-08 Manz Automation Ag Trocknungsanlage zur Trocknung von Solarzellen

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3004606A1 (de) * 1980-02-08 1981-08-13 Robert Bosch Gmbh, 7000 Stuttgart Verfahren zum einbrennen von dickschicht-nichtedelmetall-pasten und vorrichtung zur durchfuehrung des verfahrens
DE3329923A1 (de) * 1983-08-19 1985-02-28 Licentia Patent-Verwaltungs-Gmbh, 6000 Frankfurt Vorrichtung zur stabilen verankerung von schichten auf grossflaechigen halbleiterbauelementen

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3004606A1 (de) * 1980-02-08 1981-08-13 Robert Bosch Gmbh, 7000 Stuttgart Verfahren zum einbrennen von dickschicht-nichtedelmetall-pasten und vorrichtung zur durchfuehrung des verfahrens
DE3329923A1 (de) * 1983-08-19 1985-02-28 Licentia Patent-Verwaltungs-Gmbh, 6000 Frankfurt Vorrichtung zur stabilen verankerung von schichten auf grossflaechigen halbleiterbauelementen

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0379004A3 (en) * 1989-01-14 1990-10-10 Nukem Gmbh Process and apparatus for the production of a semiconductor layer system

Also Published As

Publication number Publication date
DE3342046C2 (https=) 1988-11-10

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