DE2428696A1 - Mittel und verfahren zur chemischen oberflaechenbehandlung - Google Patents

Mittel und verfahren zur chemischen oberflaechenbehandlung

Info

Publication number
DE2428696A1
DE2428696A1 DE2428696A DE2428696A DE2428696A1 DE 2428696 A1 DE2428696 A1 DE 2428696A1 DE 2428696 A DE2428696 A DE 2428696A DE 2428696 A DE2428696 A DE 2428696A DE 2428696 A1 DE2428696 A1 DE 2428696A1
Authority
DE
Germany
Prior art keywords
melt
substrate
molten
substrates
lead monoxide
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
DE2428696A
Other languages
German (de)
English (en)
Inventor
Robert Gene Warren
Eugene Coleman Whitcomb
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Boeing North American Inc
Original Assignee
Rockwell International Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Rockwell International Corp filed Critical Rockwell International Corp
Publication of DE2428696A1 publication Critical patent/DE2428696A1/de
Pending legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
    • C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
    • C04B41/00—After-treatment of mortars, concrete, artificial stone or ceramics; Treatment of natural stone
    • C04B41/009—After-treatment of mortars, concrete, artificial stone or ceramics; Treatment of natural stone characterised by the material treated
    • C—CHEMISTRY; METALLURGY
    • C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
    • C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
    • C04B41/00—After-treatment of mortars, concrete, artificial stone or ceramics; Treatment of natural stone
    • C04B41/53—After-treatment of mortars, concrete, artificial stone or ceramics; Treatment of natural stone involving the removal of at least part of the materials of the treated article, e.g. etching, drying of hardened concrete
    • C04B41/5338—Etching
    • C04B41/5361—Etching with molten material
    • C—CHEMISTRY; METALLURGY
    • C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
    • C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
    • C04B41/00—After-treatment of mortars, concrete, artificial stone or ceramics; Treatment of natural stone
    • C04B41/80—After-treatment of mortars, concrete, artificial stone or ceramics; Treatment of natural stone of only ceramics
    • C04B41/91—After-treatment of mortars, concrete, artificial stone or ceramics; Treatment of natural stone of only ceramics involving the removal of part of the materials of the treated articles, e.g. etching
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N97/00—Electric solid-state thin-film or thick-film devices, not otherwise provided for
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W99/00—Subject matter not provided for in other groups of this subclass

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Ceramic Engineering (AREA)
  • Materials Engineering (AREA)
  • Structural Engineering (AREA)
  • Organic Chemistry (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Crystals, And After-Treatments Of Crystals (AREA)
DE2428696A 1973-06-18 1974-06-14 Mittel und verfahren zur chemischen oberflaechenbehandlung Pending DE2428696A1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US371197A US3878005A (en) 1973-06-18 1973-06-18 Method of chemically polishing metallic oxides

Publications (1)

Publication Number Publication Date
DE2428696A1 true DE2428696A1 (de) 1975-01-16

Family

ID=23462925

Family Applications (1)

Application Number Title Priority Date Filing Date
DE2428696A Pending DE2428696A1 (de) 1973-06-18 1974-06-14 Mittel und verfahren zur chemischen oberflaechenbehandlung

Country Status (4)

Country Link
US (1) US3878005A (https=)
JP (1) JPS5022389A (https=)
DE (1) DE2428696A1 (https=)
FR (1) FR2233154B3 (https=)

Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4033743A (en) * 1974-03-22 1977-07-05 General Electric Company Chemically polished polycrystalline alumina material
US4038117A (en) * 1975-09-04 1977-07-26 Ilc Technology, Inc. Process for gas polishing sapphire and the like
US4011099A (en) * 1975-11-07 1977-03-08 Monsanto Company Preparation of damage-free surface on alpha-alumina
US4069094A (en) * 1976-12-30 1978-01-17 Rca Corporation Method of manufacturing apertured aluminum oxide substrates
US4124698A (en) * 1977-02-14 1978-11-07 Tyco Laboratories, Inc. Method of chemically sharpening monocrystalline ribbon
JPS56122507A (en) * 1980-03-03 1981-09-26 Nec Corp Antenna having rotary asymmetrical radial beam
DE3523961A1 (de) * 1985-07-04 1987-01-15 Licentia Gmbh Vorrichtung zum behandeln mindestens eines keramikgegenstandes in einer alkalihydroxidschmelze
JPH0611617Y2 (ja) * 1987-03-31 1994-03-23 日本電気株式会社 アンテナ装置
US5330842A (en) * 1992-03-17 1994-07-19 David M. Volz Surface treated vestibule block and process of making the same
FR3023464B1 (fr) * 2014-07-08 2017-02-03 Seb Sa Revetement antiadhesif comprenant au moins une couche de decor fonctionnel et article muni d'un tel revetement
KR102074340B1 (ko) 2017-05-26 2020-02-06 한국생산기술연구원 사파이어 웨이퍼의 표면처리 방법

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE1242972B (de) * 1964-03-06 1967-06-22 Ibm Deutschland Verfahren zum AEtzen von SiC
US3510219A (en) * 1966-10-13 1970-05-05 Xerox Corp Optical alignment system
US3668082A (en) * 1970-12-07 1972-06-06 Ibm Method for strongly adhering a metal film on epoxy substrates
US3808065A (en) * 1972-02-28 1974-04-30 Rca Corp Method of polishing sapphire and spinel

Also Published As

Publication number Publication date
JPS5022389A (https=) 1975-03-10
FR2233154B3 (https=) 1977-04-15
FR2233154A1 (https=) 1975-01-10
US3878005A (en) 1975-04-15

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