DE2353333C3 - Integrierte Darlington-Hochleistungsschaltung - Google Patents
Integrierte Darlington-HochleistungsschaltungInfo
- Publication number
- DE2353333C3 DE2353333C3 DE2353333A DE2353333A DE2353333C3 DE 2353333 C3 DE2353333 C3 DE 2353333C3 DE 2353333 A DE2353333 A DE 2353333A DE 2353333 A DE2353333 A DE 2353333A DE 2353333 C3 DE2353333 C3 DE 2353333C3
- Authority
- DE
- Germany
- Prior art keywords
- mesa
- transistors
- emitter
- circuit
- base
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 239000004065 semiconductor Substances 0.000 claims description 16
- 238000009792 diffusion process Methods 0.000 claims description 14
- 238000004519 manufacturing process Methods 0.000 claims description 11
- 238000000034 method Methods 0.000 claims description 5
- 239000011248 coating agent Substances 0.000 claims description 4
- 238000000576 coating method Methods 0.000 claims description 4
- 230000015556 catabolic process Effects 0.000 claims description 3
- 230000000873 masking effect Effects 0.000 claims description 3
- 238000005516 engineering process Methods 0.000 claims 1
- 238000002955 isolation Methods 0.000 claims 1
- 238000000926 separation method Methods 0.000 claims 1
- 239000000463 material Substances 0.000 description 5
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 4
- 229910052782 aluminium Inorganic materials 0.000 description 4
- 229910052710 silicon Inorganic materials 0.000 description 4
- 239000010703 silicon Substances 0.000 description 4
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 2
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 description 2
- 229910052698 phosphorus Inorganic materials 0.000 description 2
- 239000011574 phosphorus Substances 0.000 description 2
- ZOXJGFHDIHLPTG-UHFFFAOYSA-N Boron Chemical compound [B] ZOXJGFHDIHLPTG-UHFFFAOYSA-N 0.000 description 1
- 230000004913 activation Effects 0.000 description 1
- 229910052785 arsenic Inorganic materials 0.000 description 1
- RQNWIZPPADIBDY-UHFFFAOYSA-N arsenic atom Chemical compound [As] RQNWIZPPADIBDY-UHFFFAOYSA-N 0.000 description 1
- 229910052796 boron Inorganic materials 0.000 description 1
- 239000007795 chemical reaction product Substances 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 239000004020 conductor Substances 0.000 description 1
- 238000010276 construction Methods 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 1
- 239000010931 gold Substances 0.000 description 1
- 229910052737 gold Inorganic materials 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- 239000000047 product Substances 0.000 description 1
- 108090000623 proteins and genes Proteins 0.000 description 1
- 229910000679 solder Inorganic materials 0.000 description 1
- 238000002604 ultrasonography Methods 0.000 description 1
- 239000002699 waste material Substances 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D84/00—Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers
- H10D84/60—Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers characterised by the integration of at least one component covered by groups H10D10/00 or H10D18/00, e.g. integration of BJTs
- H10D84/611—Combinations of BJTs and one or more of diodes, resistors or capacitors
- H10D84/613—Combinations of vertical BJTs and one or more of diodes, resistors or capacitors
- H10D84/615—Combinations of vertical BJTs and one or more of resistors or capacitors
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D84/00—Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers
- H10D84/60—Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers characterised by the integration of at least one component covered by groups H10D10/00 or H10D18/00, e.g. integration of BJTs
- H10D84/641—Combinations of only vertical BJTs
- H10D84/642—Combinations of non-inverted vertical BJTs of the same conductivity type having different characteristics, e.g. Darlington transistors
Landscapes
- Bipolar Transistors (AREA)
- Bipolar Integrated Circuits (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US00300207A US3821780A (en) | 1972-10-24 | 1972-10-24 | Double mesa transistor with integral bleeder resistors |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| DE2353333A1 DE2353333A1 (de) | 1974-05-02 |
| DE2353333B2 DE2353333B2 (de) | 1978-02-02 |
| DE2353333C3 true DE2353333C3 (de) | 1978-10-12 |
Family
ID=23158148
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| DE2353333A Expired DE2353333C3 (de) | 1972-10-24 | 1973-10-24 | Integrierte Darlington-Hochleistungsschaltung |
Country Status (5)
Families Citing this family (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| NL176322C (nl) * | 1976-02-24 | 1985-03-18 | Philips Nv | Halfgeleiderinrichting met beveiligingsschakeling. |
| US4291319A (en) * | 1976-05-19 | 1981-09-22 | National Semiconductor Corporation | Open base bipolar transistor protective device |
| US4236171A (en) * | 1978-07-17 | 1980-11-25 | International Rectifier Corporation | High power transistor having emitter pattern with symmetric lead connection pads |
| USD262962S (en) | 1978-11-03 | 1982-02-09 | Strumpell Winton C | Silicon wafer emitter electrode configuration |
| US4486770A (en) * | 1981-04-27 | 1984-12-04 | General Motors Corporation | Isolated integrated circuit transistor with transient protection |
| JPS6081660U (ja) * | 1983-11-10 | 1985-06-06 | 富士電機株式会社 | ダ−リントントランジスタ |
| US4783694A (en) * | 1984-03-16 | 1988-11-08 | Motorola Inc. | Integrated bipolar-MOS semiconductor device with common collector and drain |
-
1972
- 1972-10-24 US US00300207A patent/US3821780A/en not_active Expired - Lifetime
-
1973
- 1973-06-21 CA CA174,647A patent/CA972872A/en not_active Expired
- 1973-10-11 AU AU61256/73A patent/AU6125673A/en not_active Expired
- 1973-10-11 GB GB4747373A patent/GB1398368A/en not_active Expired
- 1973-10-24 DE DE2353333A patent/DE2353333C3/de not_active Expired
Also Published As
| Publication number | Publication date |
|---|---|
| DE2353333A1 (de) | 1974-05-02 |
| CA972872A (en) | 1975-08-12 |
| US3821780A (en) | 1974-06-28 |
| AU6125673A (en) | 1975-04-17 |
| GB1398368A (en) | 1975-06-18 |
| AU469567B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) | 1976-02-19 |
| DE2353333B2 (de) | 1978-02-02 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C3 | Grant after two publication steps (3rd publication) |