DE2341216A1 - A method for the complete removal of carbonaceous material from the surface of a support - Google Patents

A method for the complete removal of carbonaceous material from the surface of a support

Info

Publication number
DE2341216A1
DE2341216A1 DE19732341216 DE2341216A DE2341216A1 DE 2341216 A1 DE2341216 A1 DE 2341216A1 DE 19732341216 DE19732341216 DE 19732341216 DE 2341216 A DE2341216 A DE 2341216A DE 2341216 A1 DE2341216 A1 DE 2341216A1
Authority
DE
Germany
Prior art keywords
support
surface
method
carbonaceous material
complete removal
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
DE19732341216
Other languages
German (de)
Other versions
DE2341216C2 (en
Inventor
Donald Allen Bolon
Bolon Donald Allen
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
General Electric Co
Original Assignee
General Electric Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority to US28176472A priority Critical
Application filed by General Electric Co filed Critical General Electric Co
Publication of DE2341216A1 publication Critical patent/DE2341216A1/en
Application granted granted Critical
Publication of DE2341216C2 publication Critical patent/DE2341216C2/de
Expired legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26Processing photosensitive materials; Apparatus therefor
    • G03F7/42Stripping or agents therefor
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B08CLEANING
    • B08BCLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B7/00Cleaning by methods not provided for in a single other subclass or a single group in this subclass
    • B08B7/0035Cleaning by methods not provided for in a single other subclass or a single group in this subclass by radiant energy, e.g. UV, laser, light beam or the like
    • B08B7/0057Cleaning by methods not provided for in a single other subclass or a single group in this subclass by radiant energy, e.g. UV, laser, light beam or the like by ultraviolet radiation
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23GCLEANING OR DEGREASING OF METALLIC MATERIAL BY CHEMICAL METHODS OTHER THAN ELECTROLYSIS
    • C23G5/00Cleaning or de-greasing metallic material by other methods; Apparatus for cleaning or de-greasing metallic material with organic solvents
DE19732341216 1972-08-18 1973-08-16 Expired DE2341216C2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
US28176472A true 1972-08-18 1972-08-18

Publications (2)

Publication Number Publication Date
DE2341216A1 true DE2341216A1 (en) 1974-02-28
DE2341216C2 DE2341216C2 (en) 1985-11-07

Family

ID=23078694

Family Applications (1)

Application Number Title Priority Date Filing Date
DE19732341216 Expired DE2341216C2 (en) 1972-08-18 1973-08-16

Country Status (5)

Country Link
JP (1) JPS5815939B2 (en)
DE (1) DE2341216C2 (en)
FR (1) FR2196611A5 (en)
GB (1) GB1408067A (en)
IT (1) IT992983B (en)

Families Citing this family (22)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4341592A (en) * 1975-08-04 1982-07-27 Texas Instruments Incorporated Method for removing photoresist layer from substrate by ozone treatment
JPS5856340A (en) * 1981-09-30 1983-04-04 Toshiba Corp Purification of semiconductor wafer
DE3310117A1 (en) * 1982-04-05 1983-10-06 Maxwell Lab Method for photochemical disinfection
JPH0612766B2 (en) * 1983-03-04 1994-02-16 株式会社精密エンタプライズ Light irradiation device
JPH0447957Y2 (en) * 1983-08-24 1992-11-12
JPS6039239U (en) * 1983-08-24 1985-03-19
JPS6039238U (en) * 1983-08-24 1985-03-19
JPS6049630A (en) * 1983-08-29 1985-03-18 Fujitsu Ltd Manufacture of semiconductor device
JPS6053029A (en) * 1983-09-02 1985-03-26 Ushio Inc Cleaning device using ultraviolet rays
JPS6127635A (en) * 1984-07-17 1986-02-07 Samuko Internatl Kenkyusho:Kk High efficiency dry type removing device of photoresist
JPS6153335A (en) * 1984-08-22 1986-03-17 Tohoku Richo Kk Dry etching of plastic
JPH0473871B2 (en) * 1984-09-26 1992-11-24
JPH0622220B2 (en) * 1984-11-19 1994-03-23 富士通株式会社 Resist ashing method
JPS61163342A (en) * 1985-01-14 1986-07-24 Ricoh Co Ltd Method for removing photoresist
JPH0810690B2 (en) * 1987-01-29 1996-01-31 東京エレクトロン株式会社 Ashing method and ashing apparatus
US5028243A (en) * 1988-12-22 1991-07-02 University Of Dayton Gas chromatography methods and apparatus
US4923486A (en) * 1988-12-22 1990-05-08 University Of Dayton Gas chromatography methods and apparatus
US5068040A (en) * 1989-04-03 1991-11-26 Hughes Aircraft Company Dense phase gas photochemical process for substrate treatment
DE4113523A1 (en) * 1991-04-25 1992-10-29 Abb Patent Gmbh Method for treating surfaces
JPH05109674A (en) * 1991-10-18 1993-04-30 Ushio Inc Method and device for ashing resist film
DE4202158C1 (en) * 1992-01-27 1993-07-22 Siemens Ag, 8000 Muenchen, De
US5417826A (en) * 1992-06-15 1995-05-23 Micron Technology, Inc. Removal of carbon-based polymer residues with ozone, useful in the cleaning of plasma reactors

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2443373A (en) * 1943-08-20 1948-06-15 Victor N Borsoff Method of removing carbon and carbonaceous matter
US3664899A (en) * 1969-12-29 1972-05-23 Gen Electric Removal of organic polymeric films from a substrate

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2443373A (en) * 1943-08-20 1948-06-15 Victor N Borsoff Method of removing carbon and carbonaceous matter
US3664899A (en) * 1969-12-29 1972-05-23 Gen Electric Removal of organic polymeric films from a substrate

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
Römpp: Chemielexikon, 1966, Sp. 4621/4622 *

Also Published As

Publication number Publication date
GB1408067A (en) 1975-10-01
DE2341216C2 (en) 1985-11-07
IT992983B (en) 1975-09-30
JPS5815939B2 (en) 1983-03-28
JPS503958A (en) 1975-01-16
FR2196611A5 (en) 1974-03-15

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Legal Events

Date Code Title Description
OD Request for examination
8120 Willingness to grant licenses paragraph 23
8181 Inventor (new situation)

Free format text: BOLON, DONALD ALLEN, SCOTIA, N.Y., US

D2 Grant after examination
8364 No opposition during term of opposition