DE19733053A1 - Oxide and metal coated transparent substrate useful for monitor - Google Patents

Oxide and metal coated transparent substrate useful for monitor

Info

Publication number
DE19733053A1
DE19733053A1 DE1997133053 DE19733053A DE19733053A1 DE 19733053 A1 DE19733053 A1 DE 19733053A1 DE 1997133053 DE1997133053 DE 1997133053 DE 19733053 A DE19733053 A DE 19733053A DE 19733053 A1 DE19733053 A1 DE 19733053A1
Authority
DE
Grant status
Application
Patent type
Prior art keywords
oxide
layer
layers
transparent substrate
metal
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
DE1997133053
Other languages
German (de)
Inventor
Johannes Stollenwerk
Karl-Heinz Kretschmer
Berthold Ocker
Bernd Heinz
Marcus Bender
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
UNAXIS DEUTSCHLAND HOLDING GMBH, 63450 HANAU, DE
Original Assignee
Balzers und Leybold Deutschland Holding AG
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03CCHEMICAL COMPOSITION OF GLASSES, GLAZES, OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C03C17/34Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
    • C03C17/36Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal
    • C03C17/3602Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer
    • C03C17/3613Coatings of type glass/inorganic compound/metal/inorganic compound/metal/other
    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03CCHEMICAL COMPOSITION OF GLASSES, GLAZES, OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C03C17/34Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
    • C03C17/36Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal
    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03CCHEMICAL COMPOSITION OF GLASSES, GLAZES, OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C03C17/34Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
    • C03C17/36Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal
    • C03C17/3602Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer
    • C03C17/3639Multilayers containing at least two functional metal layers
    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03CCHEMICAL COMPOSITION OF GLASSES, GLAZES, OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C03C17/34Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
    • C03C17/36Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal
    • C03C17/3602Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer
    • C03C17/3644Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer the metal being silver
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C28/00Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D
    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03CCHEMICAL COMPOSITION OF GLASSES, GLAZES, OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2217/00Coatings on glass
    • C03C2217/90Other aspects of coatings
    • C03C2217/94Transparent conductive oxide layers [TCO] being part of a multilayer coating
    • C03C2217/948Layers comprising indium tin oxide [ITO]

Abstract

In a transparent substrate bearing a sequence of a transparent low ohmic oxide coating, a thin transparent metal layer and a second oxide layer, the second oxide layer (4) is coated with a further thin transparent metal layer (5) and an oxide cover layer (6). Preferably, the oxide layers (2, 4, 6) are 30-70 nm thick indium-tin oxide (ITO) layers and the metal layers (3, 5) are 6-12 nm thick layers of silver alloyed with a small amount of copper.

Description

Die Erfindung betrifft ein transparentes Substrat mit ei ner transparenten, niederohmigen Beschichtung, welche eine unmittelbar auf das Substrat aufgebrachte Oxid schicht, darauf eine dünne, transparente Metallschicht und darauf eine zweite Oxidschicht aufweist. The invention relates to a transparent substrate with egg ner transparent, low-resistance coating which is applied directly to a layer of the substrate oxide, thereon a thin, transparent metal layer and then a second oxide layer.

Ein solches transparentes Substrat ist beispielsweise in der DE 42 39 355 A1 beschrieben und kann für großflächige Displays (Monitore) Anwendung finden. Such a transparent substrate is for example described in DE 42 39 355 A1, and can be applied for large-area displays (monitors). Das Substrat hat über einen Wellenlängenbereich zwischen 400 und 600 nm eine Transmission von über 80%, was für die Monitoranwen dung vorteilhaft ist. The substrate has a transmission of over 80%, which for the dung monitor appli is advantageous over a wavelength range between 400 and 600 nm. Bei größeren Wellenlängen fällt die Transmission jedoch deutlich unter 80% ab, wodurch in folge von Reflexion ein roter Farbeindruck entsteht, der bei verschiedenen Anwendungen, insbesondere bei großflä chigen Displays, als störend empfunden wird. At longer wavelengths, however, the transmittance drops significantly below 80%, whereby a red color impression is formed as a result of reflection, is perceived in different applications, especially in großflä speaking displays as disturbing. Da die Be schichtung einen geringen elektrischen Widerstand haben muß, besteht zur Vermeidung des Transmissionsabfalls nicht die Möglichkeit der Verringerung der Schichtdicke der Metallschicht. Since the Be coating must have a low electrical resistance is to avoid the transmission waste not the possibility of reducing the thickness of the metal layer.

Der Erfindung liegt das Problem zugrunde, ein Substrat mit einer solchen Beschichtung zu entwickeln, welches in einem Wellenlängenbereich zwischen 400 und 700 nm eine möglichst konstante, hohe Transmission hat, so daß ein Rotlichteindruck vermieden werden kann. The invention is based on the problem of developing a substrate with such a coating, which has a constant, high transmission as possible in a wavelength range between 400 and 700 nm, so that a red light impression can be avoided.

Dieses Problem wird erfindungsgemäß dadurch gelöst, daß auf der zweiten Oxidschicht eine weitere, dünne, transpa rente Metallschicht und darauf als Deckschicht wiederum eine Oxidschicht vorgesehen ist. This problem is solved by the invention that other thin, transpa pension metal layer and an oxide layer provided on the second oxide layer provided thereon as a cap layer in turn.

Überraschenderweise zeigte sich, daß durch die zweite Metallschicht und die Deckschicht der Transmissionsabfall im Rotlichtbereich vermieden werden kann, ohne daß die Transmission im übrigen sichtbaren Spektralbereich we sentlich verringert wird. Surprisingly, it was found that can be avoided in the red light region through the second metal layer and the top layer of the transmission waste without the transmission in the rest of the visible spectral region we will sentlich reduced. Die beiden Metallschichten kön nen jeweils eine gleiche Schichtdicke aufweisen wie die Metallschicht nach der DE 42 39 355 A1, so daß sich we gen der insgesamt stärkeren Metallbeschichtung der elek trische Widerstand vermindert und bei einer Transmission von über 80% ein elektrischer Widerstand des Schichtsys tems von etwa 5,5 Ohm/sq. The two metal layers Kgs NEN each having a same layer thickness as the metal layer according to the DE 42 39 355 A1, so that we gene of the overall stronger metal coating of the elec tric resistance is reduced and with a transmission of over 80%, an electric resistance of the Schichtsys tems of about 5.5 ohms / sq. und bei einer Transmission von 70% ein Widerstand von nur 2,5 Ohm/sq. and at transmittance of 70%, a resistance of only 2.5 ohms / sq. erreichbar sind. can be reached. Die Herstellung des erfindungsgemäßen Substrates kann mit geringem zusätzlichen Aufwand in Sputteranlagen erfolgen, weil in ihnen ohnehin zur Erstellung der ersten drei Schichten ein Target mit einem Metalloxid und ein Target mit reinem Metall vorhanden sein müssen. The preparation of the substrate of the invention can be done with little additional effort in sputtering because in them anyway to create the first three layers of a target with a metal oxide and a target with pure metal must be present.

Besonders gute optische Eigenschaften hat das Substrat aufgrund seiner Beschichtung, wenn gemäß einer Weiterbil dung der Erfindung die Oxidschichten ITO-Schichten (Indium-Zinn-Oxid) sind. Particularly good optical properties, the substrate because of its coating when according to a CVET the invention, the oxide layers of ITO layers (indium tin oxide), respectively.

Wegen seines weißen Aussehens ist aus optischen Gründen reines Silber für die Metallschichten am besten geeignet. Because of its white appearance of pure silver for the metal layers is best suited for optical reasons. Um jedoch eine ausreichende Härte der Metallschicht zu erreichen, ist es vorteilhaft, wenn die Metallschichten aus Silber mit einem geringen Legierungsanteil Kupfer be stehen. However, to achieve sufficient hardness of the metal layer, it is advantageous if the metal layers be made of silver with a low alloy content copper stand.

Für die Monitoranwendung des erfindungsgemäßen Substrates sind die Schichtdicken optimal bemessen, wenn die Oxid schichten eine Schichtdicke von 30-70 nm und die Me tallschichten eine Schichtdicke von 6-12 nm aufweisen. the layer thicknesses are optimally sized, if the oxide layers have a layer thickness of 30-70 nm, and the Me metal layers have a layer thickness of 6-12 nm for the monitor application of the substrate of the invention.

Die Erfindung läßt verschiedene Ausführungsformen zu. The invention allows various embodiments. Zur weiteren Verdeutlichung ihres Grundprinzips wird nachfolgend auf die Zeichnung Bezug genommen. To further illustrate its basic principle, reference is made to the drawing below. Diese zeigt in This shows

Fig. 1 einen Schnitt durch ein Substrat mit der erfindungsgemäßen Beschichtung, Fig. 1 shows a section through a substrate with the inventive coating,

Fig. 2 ein Diagramm, welches die Transmission zweier Substrate über die Wellenlänge wiedergibt. Fig. 2 is a diagram representing the transmission of two substrates on the wavelength.

Die Fig. 1 zeigt einen Teilbereich eines glasförmigen Substrates 1 , auf welchem zunächst eine Oxidschicht 2 von 30-70 nm Dicke aus Indium-Zinn-Oxid (ITO) durch Sput tern aufgebracht wurde. Fig. 1 shows a section of a glass-like substrate 1 on which a first oxide layer 2 of 30-70 nm thickness of indium-tin-oxide (ITO) was deposited by sputter tern. Darüber verläuft eine dünne Me tallschicht 3 von 6-12 nm Dicke aus Silber, welches ei nen geringen Kupferanteil als Legierungsbestandteil hat. In a thin Me extends tallschicht 3 of 6-12 nm in thickness of silver, which has ei NEN low copper content as an alloy component. Es folgt wiederum eine Oxidschicht 4 von 30-70 nm Dicke aus Indium-Zinn-Oxid, der sich eine weitere Metallschicht 5 und als Deckschicht wiederum eine Oxidschicht 6 anschließt. In turn is followed by an oxide layer 4 of 30-70 nm thickness of indium-tin-oxide of a further metal layer, in turn, joins 5 and as a top layer, an oxide layer. 6 Die beiden äußeren Schichten 5 und 6 sind gleich beschaffen und haben eine gleiche Dicke wie die Oxidschicht 2 und die Metallschicht 3 . The two outer layers 5 and 6 are of the same nature and have a same thickness as the oxide layer 2 and the metal layer. 3

In der Fig. 2 sind für zwei glasförmige, beschichtete Substrate die Transmission in Abhängigkeit von der auf der Wellenlänge des Lichtes wiedergegeben. In FIG. 2, the transmission in dependence on the reproduced on the wavelength of light for two hourglass-shaped, coated substrates. Die gestri chelte Linie gibt für ein bekanntes Substrat mit einem Schichtsystem aus ITO, Metall und ITO die Transmission wieder. The gestri smiled line represents the transmission of a known substrate with a layer system made of ITO, metal and ITO. Diese liegt bis zu einer Wellenlänge von etwas mehr als 600 nm über 80% und fällt dann bis zu einer Wel lenlänge von 700 nm deutlich auf unter 65% ab. This is up to a wavelength of slightly more than 600 nm above 80% and then drops to a Wel lenlänge of 700 nm sharply to below 65% from. Dieser Ab fall führt bei einem Monitor mit einem solchen Substrat zu einem Rotlichteindruck. This case leads from a monitor with such a substrate at a red light impression.

Mit einer durchgezogenen Linie ist in Fig. 2 die Trans mission eines glasförmigen Substrates mit der erfindungs gemäßen Beschichtung dargestellt. With a solid line is shown the trans-mission of a glass-shaped substrate with the fiction, modern coating in Fig. 2. Zu erkennen ist, daß diese bis zu einer Wellenlänge von 600 nm geringfügig ge ringer ist als bei dem Substrat nach dem Stand der Tech nik, dann jedoch bis 700 nm auf einem Wert deutlich über 80% verbleibt und somit nicht im Rotlichtbereich abfällt. It can be seen that this up to a wavelength of 600 nm is slightly ge ringer as the substrate according to the prior Tech nik, but then to 700 nm at a value remains well over 80% and thus does not decrease in the red light range.

Claims (4)

  1. 1. Transparentes Substrat mit einer transparenten, nie derohmigen Beschichtung, welche eine unmittelbar auf das Substrat aufgebrachte Oxidschicht, darauf eine dünne, transparente Metallschicht und darauf eine zweite Oxid schicht aufweist, dadurch gekennzeichnet , daß auf der zweiten Oxidschicht ( 4 ) eine weitere, dünne, transparente Metallschicht ( 5 ) und darauf als Deckschicht wiederum eine Oxidschicht ( 6 ) vorgesehen ist. 1. A transparent substrate with a transparent, never derohmigen coating having an applied directly to the substrate oxide layer on it, a thin transparent metal layer and then a second oxide layer, characterized in that on the second oxide layer (4), a further, thin transparent metal layer (5) and then again as a top layer, an oxide layer (6) is provided.
  2. 2. Transparentes Substrat nach Anspruch 1, dadurch ge kennzeichnet, daß die Oxidschichten ( 2 , 4 , 6 ) ITO- Schichten (Indium-Zinn-Oxid) sind. 2. A transparent substrate according to claim 1, characterized in that the oxide layers (2, 4, 6) ITO layers (indium tin oxide), respectively.
  3. 3. Transparentes Substrat nach Anspruch 2, dadurch ge kennzeichnet, daß die Metallschichten ( 3 , 5 ) aus Silber mit einem geringen Legierungsanteil Kupfer bestehen. 3. Transparent substrate according to claim 2, characterized in that the metal layers (3, 5) consists of silver with a low alloy content consist of copper.
  4. 4. Transparentes Substrat nach zumindest einem der voran gehenden Ansprüche, dadurch gekennzeichnet, daß die Oxidschichten ( 2 , 4 , 6 ) eine Schichtdicke von 30-70 nm und die Metallschichten ( 3 , 5 ) eine Schichtdicke von 6-12 nm aufweisen. 4. A transparent substrate according to at least one of the preceding claims, characterized in that the oxide layers (2, 4, 6) has a layer thickness of 30-70 nm and the metal layers (3, 5) have a layer thickness of 6-12 nm.
DE1997133053 1997-07-31 1997-07-31 Oxide and metal coated transparent substrate useful for monitor Ceased DE19733053A1 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
DE1997133053 DE19733053A1 (en) 1997-07-31 1997-07-31 Oxide and metal coated transparent substrate useful for monitor

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE1997133053 DE19733053A1 (en) 1997-07-31 1997-07-31 Oxide and metal coated transparent substrate useful for monitor
JP21542998A JPH11116280A (en) 1997-07-31 1998-07-30 Transparent base having transparent low-resistance coating

Publications (1)

Publication Number Publication Date
DE19733053A1 true true DE19733053A1 (en) 1999-02-04

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Family Applications (1)

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Country Status (2)

Country Link
JP (1) JPH11116280A (en)
DE (1) DE19733053A1 (en)

Cited By (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP1108693A1 (en) * 1999-12-06 2001-06-20 Nippon Sheet Glass Company Limited Heat shading glass, method for manufacturing the same, and heat shading laminated glass using the same
DE10031280A1 (en) * 2000-06-27 2002-01-24 Roth & Rauh Oberflaechentechni Multifunctional multi-ply layer on transparent plastic materials and methods for their preparation
WO2002050579A2 (en) * 2000-12-20 2002-06-27 Flabeg Gmbh & Co. Kg Method for the production of an auxiliary shield for a plasma display and corresponding auxiliary shield produced by said method
EP1601018A1 (en) * 2004-05-25 2005-11-30 Applied Films GmbH & Co. KG Method for manufacturing an organic, light emitting planar element and organic light emitting planar element
FR2925981A1 (en) * 2007-12-27 2009-07-03 Saint Gobain Substrate carrying an electrode, organic electroluminescent device incorporating it.
US8339031B2 (en) 2006-09-07 2012-12-25 Saint-Gobain Glass France Substrate for an organic light-emitting device, use and process for manufacturing this substrate, and organic light-emitting device
US8593055B2 (en) 2007-11-22 2013-11-26 Saint-Gobain Glass France Substrate bearing an electrode, organic light-emitting device incorporating it, and its manufacture
US8753906B2 (en) 2009-04-02 2014-06-17 Saint-Gobain Glass France Method for manufacturing a structure with a textured surface for an organic light-emitting diode device, and structure with a textured surface
US8808790B2 (en) 2008-09-25 2014-08-19 Saint-Gobain Glass France Method for manufacturing a submillimetric electrically conductive grid coated with an overgrid
US9099673B2 (en) 2006-11-17 2015-08-04 Saint-Gobain Glass France Electrode for an organic light-emitting device, acid etching thereof and also organic light-emitting device incorporating it
US9108881B2 (en) 2010-01-22 2015-08-18 Saint-Gobain Glass France Glass substrate coated with a high-index layer under an electrode coating, and organic light-emitting device comprising such a substrate
US9114425B2 (en) 2008-09-24 2015-08-25 Saint-Gobain Glass France Method for manufacturing a mask having submillimetric apertures for a submillimetric electrically conductive grid, mask having submillimetric apertures and submillimetric electrically conductive grid

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DE2912943A1 (en) * 1978-04-03 1979-10-04 American Optical Corp Infrared reflector
EP0332717A1 (en) * 1986-11-27 1989-09-20 Asahi Glass Company Ltd. Transparent laminated product
EP0488048A1 (en) * 1990-11-29 1992-06-03 Asahi Glass Company Ltd. A low emissivity film
EP0599071A1 (en) * 1992-11-24 1994-06-01 Leybold Aktiengesellschaft Transparent substrate with a transparent layer system and method for the production of such a layer system
EP0709349A1 (en) * 1994-10-25 1996-05-01 Saint-Gobain Vitrage Transparent substrate with a stack of silver layers; application as laminated heating window
DE19546962A1 (en) * 1994-12-15 1996-06-20 Frontec Inc Metallisation structure e.g. of liq. crystal device
EP0719876A2 (en) * 1994-12-27 1996-07-03 Ppg Industries, Inc. Annealed low emissivity coating
DE19549129A1 (en) * 1995-03-06 1996-09-12 Hyundai Electronics Ind A method for forming a thin film PLT
DE19612389A1 (en) * 1995-04-10 1996-10-17 Siemens Ag Applying abrasion-resistant adhesion promoting layer to substrate
DE19520843A1 (en) * 1995-06-08 1996-12-12 Leybold Ag Disc of translucent material as well as process for their preparation
DE19548551A1 (en) * 1995-12-23 1997-06-26 Euwe Eugen Wexler Gmbh Ventilating shutter device for automobile
DE19613209A1 (en) * 1996-04-02 1997-10-09 Daimler Benz Aerospace Ag Structure with low thermal conductivity used in space technology

Patent Citations (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE2912943A1 (en) * 1978-04-03 1979-10-04 American Optical Corp Infrared reflector
EP0332717A1 (en) * 1986-11-27 1989-09-20 Asahi Glass Company Ltd. Transparent laminated product
EP0488048A1 (en) * 1990-11-29 1992-06-03 Asahi Glass Company Ltd. A low emissivity film
EP0599071A1 (en) * 1992-11-24 1994-06-01 Leybold Aktiengesellschaft Transparent substrate with a transparent layer system and method for the production of such a layer system
EP0709349A1 (en) * 1994-10-25 1996-05-01 Saint-Gobain Vitrage Transparent substrate with a stack of silver layers; application as laminated heating window
DE19546962A1 (en) * 1994-12-15 1996-06-20 Frontec Inc Metallisation structure e.g. of liq. crystal device
EP0719876A2 (en) * 1994-12-27 1996-07-03 Ppg Industries, Inc. Annealed low emissivity coating
DE19549129A1 (en) * 1995-03-06 1996-09-12 Hyundai Electronics Ind A method for forming a thin film PLT
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DE19548551A1 (en) * 1995-12-23 1997-06-26 Euwe Eugen Wexler Gmbh Ventilating shutter device for automobile
DE19613209A1 (en) * 1996-04-02 1997-10-09 Daimler Benz Aerospace Ag Structure with low thermal conductivity used in space technology

Cited By (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP1108693A1 (en) * 1999-12-06 2001-06-20 Nippon Sheet Glass Company Limited Heat shading glass, method for manufacturing the same, and heat shading laminated glass using the same
DE10031280A1 (en) * 2000-06-27 2002-01-24 Roth & Rauh Oberflaechentechni Multifunctional multi-ply layer on transparent plastic materials and methods for their preparation
WO2002050579A2 (en) * 2000-12-20 2002-06-27 Flabeg Gmbh & Co. Kg Method for the production of an auxiliary shield for a plasma display and corresponding auxiliary shield produced by said method
WO2002050579A3 (en) * 2000-12-20 2003-05-01 Flabeg Gmbh & Co Kg Method for the production of an auxiliary shield for a plasma display and corresponding auxiliary shield produced by said method
EP1601018A1 (en) * 2004-05-25 2005-11-30 Applied Films GmbH & Co. KG Method for manufacturing an organic, light emitting planar element and organic light emitting planar element
US8339031B2 (en) 2006-09-07 2012-12-25 Saint-Gobain Glass France Substrate for an organic light-emitting device, use and process for manufacturing this substrate, and organic light-emitting device
US9099673B2 (en) 2006-11-17 2015-08-04 Saint-Gobain Glass France Electrode for an organic light-emitting device, acid etching thereof and also organic light-emitting device incorporating it
US8593055B2 (en) 2007-11-22 2013-11-26 Saint-Gobain Glass France Substrate bearing an electrode, organic light-emitting device incorporating it, and its manufacture
WO2009083693A2 (en) * 2007-12-27 2009-07-09 Saint-Gobain Glass France Substrate for an organic light-emitting device, and organic light-emitting device incorporating it
FR2925981A1 (en) * 2007-12-27 2009-07-03 Saint Gobain Substrate carrying an electrode, organic electroluminescent device incorporating it.
US8786176B2 (en) 2007-12-27 2014-07-22 Saint-Gobain Glass France Substrate for organic light-emitting device, and also organic light-emitting device incorporating it
WO2009083693A3 (en) * 2007-12-27 2009-12-10 Saint-Gobain Glass France Substrate for an organic light-emitting device, and organic light-emitting device incorporating it
US9114425B2 (en) 2008-09-24 2015-08-25 Saint-Gobain Glass France Method for manufacturing a mask having submillimetric apertures for a submillimetric electrically conductive grid, mask having submillimetric apertures and submillimetric electrically conductive grid
US8808790B2 (en) 2008-09-25 2014-08-19 Saint-Gobain Glass France Method for manufacturing a submillimetric electrically conductive grid coated with an overgrid
US8753906B2 (en) 2009-04-02 2014-06-17 Saint-Gobain Glass France Method for manufacturing a structure with a textured surface for an organic light-emitting diode device, and structure with a textured surface
US9108881B2 (en) 2010-01-22 2015-08-18 Saint-Gobain Glass France Glass substrate coated with a high-index layer under an electrode coating, and organic light-emitting device comprising such a substrate

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