DE19733053A1 - Oxide and metal coated transparent substrate useful for monitor - Google Patents

Oxide and metal coated transparent substrate useful for monitor

Info

Publication number
DE19733053A1
DE19733053A1 DE19733053A DE19733053A DE19733053A1 DE 19733053 A1 DE19733053 A1 DE 19733053A1 DE 19733053 A DE19733053 A DE 19733053A DE 19733053 A DE19733053 A DE 19733053A DE 19733053 A1 DE19733053 A1 DE 19733053A1
Authority
DE
Germany
Prior art keywords
oxide
layer
layers
transparent substrate
transparent
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
DE19733053A
Other languages
German (de)
Inventor
Johannes Stollenwerk
Karl-Heinz Kretschmer
Berthold Ocker
Bernd Heinz
Marcus Bender
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Oerlikon Deutschland Holding GmbH
Original Assignee
Leybold AG
Balzers und Leybold Deutschland Holding AG
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Leybold AG, Balzers und Leybold Deutschland Holding AG filed Critical Leybold AG
Priority to DE19733053A priority Critical patent/DE19733053A1/en
Priority to KR19980029896A priority patent/KR19990014165A/ko
Priority to JP10215429A priority patent/JPH11116280A/en
Publication of DE19733053A1 publication Critical patent/DE19733053A1/en
Ceased legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
    • C03C17/36—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal
    • C03C17/3602—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer
    • C03C17/3613—Coatings of type glass/inorganic compound/metal/inorganic compound/metal/other
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
    • C03C17/36—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
    • C03C17/36—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal
    • C03C17/3602—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer
    • C03C17/3639—Multilayers containing at least two functional metal layers
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
    • C03C17/36—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal
    • C03C17/3602—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer
    • C03C17/3644—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer the metal being silver
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C28/00—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2217/00—Coatings on glass
    • C03C2217/90—Other aspects of coatings
    • C03C2217/94—Transparent conductive oxide layers [TCO] being part of a multilayer coating
    • C03C2217/948—Layers comprising indium tin oxide [ITO]

Abstract

In a transparent substrate bearing a sequence of a transparent low ohmic oxide coating, a thin transparent metal layer and a second oxide layer, the second oxide layer (4) is coated with a further thin transparent metal layer (5) and an oxide cover layer (6). Preferably, the oxide layers (2, 4, 6) are 30-70 nm thick indium-tin oxide (ITO) layers and the metal layers (3, 5) are 6-12 nm thick layers of silver alloyed with a small amount of copper.

Description

Die Erfindung betrifft ein transparentes Substrat mit ei­ ner transparenten, niederohmigen Beschichtung, welche eine unmittelbar auf das Substrat aufgebrachte Oxid­ schicht, darauf eine dünne, transparente Metallschicht und darauf eine zweite Oxidschicht aufweist.The invention relates to a transparent substrate with egg a transparent, low-resistance coating, which an oxide applied directly to the substrate layer, on top of that a thin, transparent metal layer and has a second oxide layer thereon.

Ein solches transparentes Substrat ist beispielsweise in der DE 42 39 355 A1 beschrieben und kann für großflächige Displays (Monitore) Anwendung finden. Das Substrat hat über einen Wellenlängenbereich zwischen 400 und 600 nm eine Transmission von über 80%, was für die Monitoranwen­ dung vorteilhaft ist. Bei größeren Wellenlängen fällt die Transmission jedoch deutlich unter 80% ab, wodurch in­ folge von Reflexion ein roter Farbeindruck entsteht, der bei verschiedenen Anwendungen, insbesondere bei großflä­ chigen Displays, als störend empfunden wird. Da die Be­ schichtung einen geringen elektrischen Widerstand haben muß, besteht zur Vermeidung des Transmissionsabfalls nicht die Möglichkeit der Verringerung der Schichtdicke der Metallschicht.Such a transparent substrate is, for example, in DE 42 39 355 A1 and can be used for large areas Displays (monitors) are used. The substrate has over a wavelength range between 400 and 600 nm a transmission of over 80%, which is for monitor users is advantageous. At longer wavelengths, the falls However, transmission drops significantly below 80%, which means in following reflection a red color impression arises that in various applications, especially in large areas display is perceived as annoying. Since the Be layering have a low electrical resistance must exist to avoid the transmission drop not the possibility of reducing the layer thickness the metal layer.

Der Erfindung liegt das Problem zugrunde, ein Substrat mit einer solchen Beschichtung zu entwickeln, welches in einem Wellenlängenbereich zwischen 400 und 700 nm eine möglichst konstante, hohe Transmission hat, so daß ein Rotlichteindruck vermieden werden kann.The invention is based on the problem of a substrate to develop with such a coating, which in a wavelength range between 400 and 700 nm has the highest possible constant, high transmission, so that a Red light impression can be avoided.

Dieses Problem wird erfindungsgemäß dadurch gelöst, daß auf der zweiten Oxidschicht eine weitere, dünne, transpa­ rente Metallschicht und darauf als Deckschicht wiederum eine Oxidschicht vorgesehen ist. This problem is solved according to the invention in that on the second oxide layer another, thin, transparent annuity metal layer and then as a top layer an oxide layer is provided.  

Überraschenderweise zeigte sich, daß durch die zweite Metallschicht und die Deckschicht der Transmissionsabfall im Rotlichtbereich vermieden werden kann, ohne daß die Transmission im übrigen sichtbaren Spektralbereich we­ sentlich verringert wird. Die beiden Metallschichten kön­ nen jeweils eine gleiche Schichtdicke aufweisen wie die Metallschicht nach der DE 42 39 355 A1, so daß sich we­ gen der insgesamt stärkeren Metallbeschichtung der elek­ trische Widerstand vermindert und bei einer Transmission von über 80% ein elektrischer Widerstand des Schichtsys­ tems von etwa 5,5 Ohm/sq. und bei einer Transmission von 70% ein Widerstand von nur 2,5 Ohm/sq. erreichbar sind. Die Herstellung des erfindungsgemäßen Substrates kann mit geringem zusätzlichen Aufwand in Sputteranlagen erfolgen, weil in ihnen ohnehin zur Erstellung der ersten drei Schichten ein Target mit einem Metalloxid und ein Target mit reinem Metall vorhanden sein müssen.Surprisingly, it turned out that the second Metal layer and the top layer of the transmission waste in the red light area can be avoided without the Transmission in the rest of the visible spectral range is significantly reduced. The two metal layers can NEN each have the same layer thickness as that Metal layer according to DE 42 39 355 A1, so that we against the overall stronger metal coating of the elek trical resistance reduced and with a transmission an electrical resistance of the layer system of more than 80% tems of about 5.5 ohms / sq. and with a transmission of 70% a resistance of only 2.5 ohms / sq. are reachable. The substrate according to the invention can be produced with little additional effort in sputtering systems, because in them anyway to create the first three Layer a target with a metal oxide and a target must be present with pure metal.

Besonders gute optische Eigenschaften hat das Substrat aufgrund seiner Beschichtung, wenn gemäß einer Weiterbil­ dung der Erfindung die Oxidschichten ITO-Schichten (Indium-Zinn-Oxid) sind.The substrate has particularly good optical properties due to its coating, if according to a ref tion of the invention, the oxide layers ITO layers (Indium tin oxide).

Wegen seines weißen Aussehens ist aus optischen Gründen reines Silber für die Metallschichten am besten geeignet. Um jedoch eine ausreichende Härte der Metallschicht zu erreichen, ist es vorteilhaft, wenn die Metallschichten aus Silber mit einem geringen Legierungsanteil Kupfer be­ stehen.Because of its white appearance is for visual reasons pure silver best suited for the metal layers. However, to ensure sufficient hardness of the metal layer reach, it is advantageous if the metal layers made of silver with a low alloy content of copper stand.

Für die Monitoranwendung des erfindungsgemäßen Substrates sind die Schichtdicken optimal bemessen, wenn die Oxid­ schichten eine Schichtdicke von 30-70 nm und die Me­ tallschichten eine Schichtdicke von 6-12 nm aufweisen.For the monitor application of the substrate according to the invention the layer thicknesses are optimally dimensioned when the oxide layer a layer thickness of 30-70 nm and the me tall layers have a layer thickness of 6-12 nm.

Die Erfindung läßt verschiedene Ausführungsformen zu. Zur weiteren Verdeutlichung ihres Grundprinzips wird nachfolgend auf die Zeichnung Bezug genommen. Diese zeigt inThe invention allows various embodiments. To further clarify their basic principle hereinafter referred to the drawing. This shows in

Fig. 1 einen Schnitt durch ein Substrat mit der erfindungsgemäßen Beschichtung, Fig. 1 shows a section through a substrate with the inventive coating,

Fig. 2 ein Diagramm, welches die Transmission zweier Substrate über die Wellenlänge wiedergibt. Fig. 2 is a diagram showing the transmission of two substrates over the wavelength.

Die Fig. 1 zeigt einen Teilbereich eines glasförmigen Substrates 1, auf welchem zunächst eine Oxidschicht 2 von 30-70 nm Dicke aus Indium-Zinn-Oxid (ITO) durch Sput­ tern aufgebracht wurde. Darüber verläuft eine dünne Me­ tallschicht 3 von 6-12 nm Dicke aus Silber, welches ei­ nen geringen Kupferanteil als Legierungsbestandteil hat. Es folgt wiederum eine Oxidschicht 4 von 30-70 nm Dicke aus Indium-Zinn-Oxid, der sich eine weitere Metallschicht 5 und als Deckschicht wiederum eine Oxidschicht 6 anschließt. Die beiden äußeren Schichten 5 und 6 sind gleich beschaffen und haben eine gleiche Dicke wie die Oxidschicht 2 und die Metallschicht 3. Fig. 1 shows a portion of a glass substrate 1 , on which an oxide layer 2 of 30-70 nm thickness of indium tin oxide (ITO) was first applied by sputtering. A thin metal layer 3 of 6-12 nm thick is made of silver, which has a small copper content as an alloy component. This is followed in turn by an oxide layer 4 of 30-70 nm thick made of indium tin oxide, which is followed by a further metal layer 5 and an oxide layer 6 as a cover layer. The two outer layers 5 and 6 are of the same nature and have the same thickness as the oxide layer 2 and the metal layer 3 .

In der Fig. 2 sind für zwei glasförmige, beschichtete Substrate die Transmission in Abhängigkeit von der auf der Wellenlänge des Lichtes wiedergegeben. Die gestri­ chelte Linie gibt für ein bekanntes Substrat mit einem Schichtsystem aus ITO, Metall und ITO die Transmission wieder. Diese liegt bis zu einer Wellenlänge von etwas mehr als 600 nm über 80% und fällt dann bis zu einer Wel­ lenlänge von 700 nm deutlich auf unter 65% ab. Dieser Ab­ fall führt bei einem Monitor mit einem solchen Substrat zu einem Rotlichteindruck. In FIG. 2, the transmission as a function are reproduced from the on the wavelength of light for two hourglass-shaped, coated substrates. The dashed line represents the transmission for a known substrate with a layer system made of ITO, metal and ITO. Up to a wavelength of a little more than 600 nm, this lies above 80% and then drops significantly down to a wavelength of 700 nm to below 65%. From a monitor with such a substrate, this drop leads to a red light impression.

Mit einer durchgezogenen Linie ist in Fig. 2 die Trans­ mission eines glasförmigen Substrates mit der erfindungs­ gemäßen Beschichtung dargestellt. Zu erkennen ist, daß diese bis zu einer Wellenlänge von 600 nm geringfügig ge­ ringer ist als bei dem Substrat nach dem Stand der Tech­ nik, dann jedoch bis 700 nm auf einem Wert deutlich über 80% verbleibt und somit nicht im Rotlichtbereich abfällt.With a solid line is shown in Fig. 2, the Trans mission of a glass substrate with the coating according to the Invention. It can be seen that this is slightly lower up to a wavelength of 600 nm than for the substrate according to the prior art, but then remains at a value of well above 80% up to 700 nm and thus does not drop in the red light range.

Claims (4)

1. Transparentes Substrat mit einer transparenten, nie­ derohmigen Beschichtung, welche eine unmittelbar auf das Substrat aufgebrachte Oxidschicht, darauf eine dünne, transparente Metallschicht und darauf eine zweite Oxid­ schicht aufweist, dadurch gekennzeichnet, daß auf der zweiten Oxidschicht (4) eine weitere, dünne, transparente Metallschicht (5) und darauf als Deckschicht wiederum eine Oxidschicht (6) vorgesehen ist.1. Transparent substrate with a transparent, non-resistive coating, which has an oxide layer applied directly to the substrate, then a thin, transparent metal layer and then a second oxide layer, characterized in that on the second oxide layer ( 4 ) a further thin , transparent metal layer ( 5 ) and an oxide layer ( 6 ) is in turn provided thereon as a cover layer. 2. Transparentes Substrat nach Anspruch 1, dadurch ge­ kennzeichnet, daß die Oxidschichten (2, 4, 6) ITO- Schichten (Indium-Zinn-Oxid) sind.2. Transparent substrate according to claim 1, characterized in that the oxide layers ( 2 , 4 , 6 ) are ITO layers (indium tin oxide). 3. Transparentes Substrat nach Anspruch 2, dadurch ge­ kennzeichnet, daß die Metallschichten (3, 5) aus Silber mit einem geringen Legierungsanteil Kupfer bestehen.3. Transparent substrate according to claim 2, characterized in that the metal layers ( 3 , 5 ) consist of silver with a small amount of alloy copper. 4. Transparentes Substrat nach zumindest einem der voran­ gehenden Ansprüche, dadurch gekennzeichnet, daß die Oxidschichten (2, 4, 6) eine Schichtdicke von 30-70 nm und die Metallschichten (3, 5) eine Schichtdicke von 6-12 nm aufweisen.4. Transparent substrate according to at least one of the preceding claims, characterized in that the oxide layers ( 2 , 4 , 6 ) have a layer thickness of 30-70 nm and the metal layers ( 3 , 5 ) have a layer thickness of 6-12 nm.
DE19733053A 1997-07-31 1997-07-31 Oxide and metal coated transparent substrate useful for monitor Ceased DE19733053A1 (en)

Priority Applications (3)

Application Number Priority Date Filing Date Title
DE19733053A DE19733053A1 (en) 1997-07-31 1997-07-31 Oxide and metal coated transparent substrate useful for monitor
KR19980029896A KR19990014165A (en) 1997-07-31 1998-07-24
JP10215429A JPH11116280A (en) 1997-07-31 1998-07-30 Transparent base having transparent low-resistance coating

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE19733053A DE19733053A1 (en) 1997-07-31 1997-07-31 Oxide and metal coated transparent substrate useful for monitor

Publications (1)

Publication Number Publication Date
DE19733053A1 true DE19733053A1 (en) 1999-02-04

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ID=7837529

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DE19733053A Ceased DE19733053A1 (en) 1997-07-31 1997-07-31 Oxide and metal coated transparent substrate useful for monitor

Country Status (3)

Country Link
JP (1) JPH11116280A (en)
KR (1) KR19990014165A (en)
DE (1) DE19733053A1 (en)

Cited By (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP1108693A1 (en) * 1999-12-06 2001-06-20 Nippon Sheet Glass Co., Ltd. Heat shading glass, method for manufacturing the same, and heat shading laminated glass using the same
DE10031280A1 (en) * 2000-06-27 2002-01-24 Roth & Rauh Oberflaechentechni Multifunctional multilayer on transparent plastics and process for their production
WO2002050579A2 (en) * 2000-12-20 2002-06-27 Flabeg Gmbh & Co. Kg Method for the production of an auxiliary shield for a plasma display and corresponding auxiliary shield produced by said method
EP1601018A1 (en) * 2004-05-25 2005-11-30 Applied Films GmbH & Co. KG Method for manufacturing an organic, light emitting planar element and organic light emitting planar element
FR2925981A1 (en) * 2007-12-27 2009-07-03 Saint Gobain CARRIER SUBSTRATE OF AN ELECTRODE, ORGANIC ELECTROLUMINESCENT DEVICE INCORPORATING IT.
US8339031B2 (en) 2006-09-07 2012-12-25 Saint-Gobain Glass France Substrate for an organic light-emitting device, use and process for manufacturing this substrate, and organic light-emitting device
US8593055B2 (en) 2007-11-22 2013-11-26 Saint-Gobain Glass France Substrate bearing an electrode, organic light-emitting device incorporating it, and its manufacture
US8753906B2 (en) 2009-04-02 2014-06-17 Saint-Gobain Glass France Method for manufacturing a structure with a textured surface for an organic light-emitting diode device, and structure with a textured surface
US8808790B2 (en) 2008-09-25 2014-08-19 Saint-Gobain Glass France Method for manufacturing a submillimetric electrically conductive grid coated with an overgrid
US9099673B2 (en) 2006-11-17 2015-08-04 Saint-Gobain Glass France Electrode for an organic light-emitting device, acid etching thereof and also organic light-emitting device incorporating it
US9108881B2 (en) 2010-01-22 2015-08-18 Saint-Gobain Glass France Glass substrate coated with a high-index layer under an electrode coating, and organic light-emitting device comprising such a substrate
US9114425B2 (en) 2008-09-24 2015-08-25 Saint-Gobain Glass France Method for manufacturing a mask having submillimetric apertures for a submillimetric electrically conductive grid, mask having submillimetric apertures and submillimetric electrically conductive grid

Citations (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE2912943A1 (en) * 1978-04-03 1979-10-04 American Optical Corp INFRARED REFLECTOR
EP0332717A1 (en) * 1986-11-27 1989-09-20 Asahi Glass Company Ltd. Transparent laminated product
EP0488048A1 (en) * 1990-11-29 1992-06-03 Asahi Glass Company Ltd. A low emissivity film
EP0599071A1 (en) * 1992-11-24 1994-06-01 Leybold Aktiengesellschaft Transparent substrate with a transparent layer system and method for the production of such a layer system
EP0709349A1 (en) * 1994-10-25 1996-05-01 Saint-Gobain Vitrage Transparent substrate with a stack of silver layers; application as laminated heating window
DE19546962A1 (en) * 1994-12-15 1996-06-20 Frontec Inc Metallisation structure e.g. of liq. crystal device
EP0719876A2 (en) * 1994-12-27 1996-07-03 Ppg Industries, Inc. Annealed low emissivity coating
DE19549129A1 (en) * 1995-03-06 1996-09-12 Hyundai Electronics Ind Process for forming a PLT thin film
DE19612389A1 (en) * 1995-04-10 1996-10-17 Siemens Ag Applying abrasion-resistant adhesion promoting layer to substrate
DE19520843A1 (en) * 1995-06-08 1996-12-12 Leybold Ag Disc made of translucent material and process for its manufacture
DE19548551A1 (en) * 1995-12-23 1997-06-26 Euwe Eugen Wexler Gmbh Ventilating shutter device for automobile
DE19613209A1 (en) * 1996-04-02 1997-10-09 Daimler Benz Aerospace Ag Structure with low thermal conductivity used in space technology

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63134232A (en) * 1986-11-27 1988-06-06 旭硝子株式会社 Infrared reflecting article having high transmittance
JPH02111644A (en) * 1988-10-19 1990-04-24 Central Glass Co Ltd Laminated glass for vehicle

Patent Citations (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE2912943A1 (en) * 1978-04-03 1979-10-04 American Optical Corp INFRARED REFLECTOR
EP0332717A1 (en) * 1986-11-27 1989-09-20 Asahi Glass Company Ltd. Transparent laminated product
EP0488048A1 (en) * 1990-11-29 1992-06-03 Asahi Glass Company Ltd. A low emissivity film
EP0599071A1 (en) * 1992-11-24 1994-06-01 Leybold Aktiengesellschaft Transparent substrate with a transparent layer system and method for the production of such a layer system
EP0709349A1 (en) * 1994-10-25 1996-05-01 Saint-Gobain Vitrage Transparent substrate with a stack of silver layers; application as laminated heating window
DE19546962A1 (en) * 1994-12-15 1996-06-20 Frontec Inc Metallisation structure e.g. of liq. crystal device
EP0719876A2 (en) * 1994-12-27 1996-07-03 Ppg Industries, Inc. Annealed low emissivity coating
DE19549129A1 (en) * 1995-03-06 1996-09-12 Hyundai Electronics Ind Process for forming a PLT thin film
DE19612389A1 (en) * 1995-04-10 1996-10-17 Siemens Ag Applying abrasion-resistant adhesion promoting layer to substrate
DE19520843A1 (en) * 1995-06-08 1996-12-12 Leybold Ag Disc made of translucent material and process for its manufacture
DE19548551A1 (en) * 1995-12-23 1997-06-26 Euwe Eugen Wexler Gmbh Ventilating shutter device for automobile
DE19613209A1 (en) * 1996-04-02 1997-10-09 Daimler Benz Aerospace Ag Structure with low thermal conductivity used in space technology

Cited By (18)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP1108693A1 (en) * 1999-12-06 2001-06-20 Nippon Sheet Glass Co., Ltd. Heat shading glass, method for manufacturing the same, and heat shading laminated glass using the same
DE10031280A1 (en) * 2000-06-27 2002-01-24 Roth & Rauh Oberflaechentechni Multifunctional multilayer on transparent plastics and process for their production
WO2002050579A2 (en) * 2000-12-20 2002-06-27 Flabeg Gmbh & Co. Kg Method for the production of an auxiliary shield for a plasma display and corresponding auxiliary shield produced by said method
WO2002050579A3 (en) * 2000-12-20 2003-05-01 Flabeg Gmbh & Co Kg Method for the production of an auxiliary shield for a plasma display and corresponding auxiliary shield produced by said method
EP1601018A1 (en) * 2004-05-25 2005-11-30 Applied Films GmbH & Co. KG Method for manufacturing an organic, light emitting planar element and organic light emitting planar element
US8339031B2 (en) 2006-09-07 2012-12-25 Saint-Gobain Glass France Substrate for an organic light-emitting device, use and process for manufacturing this substrate, and organic light-emitting device
US9099673B2 (en) 2006-11-17 2015-08-04 Saint-Gobain Glass France Electrode for an organic light-emitting device, acid etching thereof and also organic light-emitting device incorporating it
US8593055B2 (en) 2007-11-22 2013-11-26 Saint-Gobain Glass France Substrate bearing an electrode, organic light-emitting device incorporating it, and its manufacture
CN101960638A (en) * 2007-12-27 2011-01-26 法国圣-戈班玻璃公司 Substrate for an organic light-emitting device, and organic light-emitting device incorporating it
WO2009083693A3 (en) * 2007-12-27 2009-12-10 Saint-Gobain Glass France Substrate for an organic light-emitting device, and organic light-emitting device incorporating it
WO2009083693A2 (en) * 2007-12-27 2009-07-09 Saint-Gobain Glass France Substrate for an organic light-emitting device, and organic light-emitting device incorporating it
US8786176B2 (en) 2007-12-27 2014-07-22 Saint-Gobain Glass France Substrate for organic light-emitting device, and also organic light-emitting device incorporating it
FR2925981A1 (en) * 2007-12-27 2009-07-03 Saint Gobain CARRIER SUBSTRATE OF AN ELECTRODE, ORGANIC ELECTROLUMINESCENT DEVICE INCORPORATING IT.
EA021647B1 (en) * 2007-12-27 2015-08-31 Сэн-Гобэн Гласс Франс Substrate for organic light-emitting device, and also organic light-emitting device incorporating it
US9114425B2 (en) 2008-09-24 2015-08-25 Saint-Gobain Glass France Method for manufacturing a mask having submillimetric apertures for a submillimetric electrically conductive grid, mask having submillimetric apertures and submillimetric electrically conductive grid
US8808790B2 (en) 2008-09-25 2014-08-19 Saint-Gobain Glass France Method for manufacturing a submillimetric electrically conductive grid coated with an overgrid
US8753906B2 (en) 2009-04-02 2014-06-17 Saint-Gobain Glass France Method for manufacturing a structure with a textured surface for an organic light-emitting diode device, and structure with a textured surface
US9108881B2 (en) 2010-01-22 2015-08-18 Saint-Gobain Glass France Glass substrate coated with a high-index layer under an electrode coating, and organic light-emitting device comprising such a substrate

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JPH11116280A (en) 1999-04-27
KR19990014165A (en) 1999-02-25

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