DE19635907C2 - Verfahren zur Messung der Phasendifferenz zwischen zwei orthogonal polarisierten Komponenten eines Prüfstrahls sowie Homodyn-Interferometer-Empfängervorrichtung zur Durchführung des Verfahrens - Google Patents
Verfahren zur Messung der Phasendifferenz zwischen zwei orthogonal polarisierten Komponenten eines Prüfstrahls sowie Homodyn-Interferometer-Empfängervorrichtung zur Durchführung des VerfahrensInfo
- Publication number
- DE19635907C2 DE19635907C2 DE19635907A DE19635907A DE19635907C2 DE 19635907 C2 DE19635907 C2 DE 19635907C2 DE 19635907 A DE19635907 A DE 19635907A DE 19635907 A DE19635907 A DE 19635907A DE 19635907 C2 DE19635907 C2 DE 19635907C2
- Authority
- DE
- Germany
- Prior art keywords
- spatially separated
- phase
- pair
- electrical signals
- beams
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Classifications
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
- G01J9/00—Measuring optical phase difference; Determining degree of coherence; Measuring optical wavelength
- G01J9/02—Measuring optical phase difference; Determining degree of coherence; Measuring optical wavelength by interferometric methods
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
- G01J9/00—Measuring optical phase difference; Determining degree of coherence; Measuring optical wavelength
- G01J9/02—Measuring optical phase difference; Determining degree of coherence; Measuring optical wavelength by interferometric methods
- G01J2009/0261—Measuring optical phase difference; Determining degree of coherence; Measuring optical wavelength by interferometric methods polarised
Landscapes
- Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- General Physics & Mathematics (AREA)
- Instruments For Measurement Of Length By Optical Means (AREA)
- Optical Communication System (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US08/523,559 US5663793A (en) | 1995-09-05 | 1995-09-05 | Homodyne interferometric receiver and calibration method having improved accuracy and functionality |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| DE19635907A1 DE19635907A1 (de) | 1997-03-06 |
| DE19635907C2 true DE19635907C2 (de) | 1999-02-18 |
Family
ID=24085499
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| DE19635907A Expired - Fee Related DE19635907C2 (de) | 1995-09-05 | 1996-09-04 | Verfahren zur Messung der Phasendifferenz zwischen zwei orthogonal polarisierten Komponenten eines Prüfstrahls sowie Homodyn-Interferometer-Empfängervorrichtung zur Durchführung des Verfahrens |
Country Status (3)
| Country | Link |
|---|---|
| US (1) | US5663793A (https=) |
| JP (1) | JP3791975B2 (https=) |
| DE (1) | DE19635907C2 (https=) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE102007025037B3 (de) * | 2007-05-29 | 2008-12-18 | Bundesrepublik Deutschland, vertr. d. d. Bundesministerium für Wirtschaft und Technologie, dieses vertr. d. d. Präsidenten der Physikalisch-Technischen Bundesanstalt | Verfahren zum Ermitteln eines Frequenz- und/oder Phasenunterschieds |
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| JP4547257B2 (ja) | 2002-07-08 | 2010-09-22 | ザイゴ コーポレーション | 干渉計システムにおける周期誤差の補正 |
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| US7321432B2 (en) * | 2002-09-09 | 2008-01-22 | Zygo Corporation | Measurement and compensation of errors in interferometers |
| US7075619B2 (en) * | 2002-12-12 | 2006-07-11 | Zygo Corporation | In-process correction of stage mirror deformations during a photolithography exposure cycle |
| WO2004113826A2 (en) * | 2003-06-19 | 2004-12-29 | Zygo Corporation | Compensation for imperfections in a measurement object and for beam misalignments in plane mirror interferometers |
| US7327465B2 (en) * | 2003-06-19 | 2008-02-05 | Zygo Corporation | Compensation for effects of beam misalignments in interferometer metrology systems |
| US7180603B2 (en) * | 2003-06-26 | 2007-02-20 | Zygo Corporation | Reduction of thermal non-cyclic error effects in interferometers |
| US7057737B2 (en) * | 2003-08-29 | 2006-06-06 | 4D Technology Corporation | Common optical-path testing of high-numerical-aperture wavefronts |
| US7230717B2 (en) * | 2003-08-28 | 2007-06-12 | 4D Technology Corporation | Pixelated phase-mask interferometer |
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| US7379190B2 (en) * | 2004-01-05 | 2008-05-27 | Zygo Corporation | Stage alignment in lithography tools |
| WO2005067579A2 (en) * | 2004-01-06 | 2005-07-28 | Zygo Corporation | Multi-axis interferometers and methods and systems using multi-axis interferometers |
| US7310152B2 (en) * | 2004-03-03 | 2007-12-18 | Zygo Corporation | Interferometer assemblies having reduced cyclic errors and system using the interferometer assemblies |
| US7206069B2 (en) * | 2004-03-29 | 2007-04-17 | Lucent Technologies Inc. | Optical analyzers of polarization properties |
| US7280224B2 (en) * | 2004-04-22 | 2007-10-09 | Zygo Corporation | Interferometry systems and methods of using interferometry systems |
| US7375823B2 (en) * | 2004-04-22 | 2008-05-20 | Zygo Corporation | Interferometry systems and methods of using interferometry systems |
| WO2006014406A2 (en) | 2004-06-30 | 2006-02-09 | Zygo Corporation | Interferometric optical assemblies and systems including interferometric optical assemblies |
| WO2006041984A2 (en) * | 2004-10-06 | 2006-04-20 | Zygo Corporation | Error correction in interferometry systems |
| US7433049B2 (en) * | 2005-03-18 | 2008-10-07 | Zygo Corporation | Multi-axis interferometer with procedure and data processing for mirror mapping |
| US7508527B2 (en) | 2005-04-11 | 2009-03-24 | Zetetic Institute | Apparatus and method of in situ and ex situ measurement of spatial impulse response of an optical system using phase-shifting point-diffraction interferometry |
| JP2008541130A (ja) * | 2005-05-18 | 2008-11-20 | ゼテテック インスティテュート | 光学系フレアを原位置および原位置以外で測定する装置および方法 |
| WO2007019548A2 (en) * | 2005-08-08 | 2007-02-15 | Zetetic Institute | Apparatus and methods for reduction and compensation of effects of vibrations and of environmental effects in wavefront interferometry |
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| WO2007059249A2 (en) * | 2005-11-15 | 2007-05-24 | Zetetic Institute | Interferometer with coherent artifact reduction plus vibration and enviromental compensation |
| US7576868B2 (en) * | 2007-06-08 | 2009-08-18 | Zygo Corporation | Cyclic error compensation in interferometry systems |
| US7821647B2 (en) * | 2008-02-21 | 2010-10-26 | Corning Incorporated | Apparatus and method for measuring surface topography of an object |
| KR101335233B1 (ko) * | 2009-01-28 | 2013-11-29 | 가부시키가이샤 코베루코 카겐 | 형상 측정 장치 |
| WO2012106246A2 (en) | 2011-02-01 | 2012-08-09 | Zygo Corporation | Interferometric heterodyne optical encoder system |
| CN102266116B (zh) * | 2011-06-08 | 2014-03-26 | 广东中烟工业有限责任公司 | 一种再造烟叶及其制备方法和应用 |
| KR101514679B1 (ko) * | 2014-04-10 | 2015-04-24 | 한국표준과학연구원 | 상태 변분 원리를 이용한 진동 변위 측정 방법 |
| IL275224B2 (en) | 2017-12-13 | 2025-01-01 | Asml Holding Nv | Beam Splitting Prism Systems |
| US11262191B1 (en) | 2018-07-12 | 2022-03-01 | Onto Innovation Inc. | On-axis dynamic interferometer and optical imaging systems employing the same |
| US12216051B2 (en) | 2022-01-21 | 2025-02-04 | Onto Innovation Inc. | Dynamic phase-shift interferometer utilizing a synchronous optical frequency-shift |
| CN114719951A (zh) * | 2022-03-01 | 2022-07-08 | 天津大学 | 适用于测量微振动的光学系统 |
Citations (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4688940A (en) * | 1985-03-12 | 1987-08-25 | Zygo Corporation | Heterodyne interferometer system |
| US4787747A (en) * | 1987-11-13 | 1988-11-29 | Zygo Corporation | Straightness of travel interferometer |
| US5018862A (en) * | 1989-11-02 | 1991-05-28 | Aerotech, Inc. | Successive fringe detection position interferometry |
| DE4114786A1 (de) * | 1991-05-06 | 1992-11-12 | Zimmer Gmbh Beruehrungsfreies | Interferometer zum bestimmen des betrags und der richtung einer messgutbewegung |
| US5374991A (en) * | 1991-03-29 | 1994-12-20 | Gradient Lens Corporation | Compact distance measuring interferometer |
| US5392116A (en) * | 1992-03-17 | 1995-02-21 | International Business Machines Corporation | Interferometric phase measurement |
| US5557399A (en) * | 1995-03-22 | 1996-09-17 | Zygo Corporation | Optical gap measuring apparatus and method |
Family Cites Families (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0663867B2 (ja) * | 1985-05-28 | 1994-08-22 | キヤノン株式会社 | 波面状態検出用の干渉装置 |
| US4842408A (en) * | 1986-05-09 | 1989-06-27 | Canon Kabushiki Kaisha | Phase shift measuring apparatus utilizing optical meterodyne techniques |
| US5243649A (en) * | 1992-09-29 | 1993-09-07 | The Johns Hopkins University | Apparatus and method for quantum mechanical encryption for the transmission of secure communications |
-
1995
- 1995-09-05 US US08/523,559 patent/US5663793A/en not_active Expired - Lifetime
-
1996
- 1996-08-26 JP JP22409196A patent/JP3791975B2/ja not_active Expired - Fee Related
- 1996-09-04 DE DE19635907A patent/DE19635907C2/de not_active Expired - Fee Related
Patent Citations (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4688940A (en) * | 1985-03-12 | 1987-08-25 | Zygo Corporation | Heterodyne interferometer system |
| US4787747A (en) * | 1987-11-13 | 1988-11-29 | Zygo Corporation | Straightness of travel interferometer |
| US5018862A (en) * | 1989-11-02 | 1991-05-28 | Aerotech, Inc. | Successive fringe detection position interferometry |
| US5374991A (en) * | 1991-03-29 | 1994-12-20 | Gradient Lens Corporation | Compact distance measuring interferometer |
| DE4114786A1 (de) * | 1991-05-06 | 1992-11-12 | Zimmer Gmbh Beruehrungsfreies | Interferometer zum bestimmen des betrags und der richtung einer messgutbewegung |
| US5392116A (en) * | 1992-03-17 | 1995-02-21 | International Business Machines Corporation | Interferometric phase measurement |
| US5557399A (en) * | 1995-03-22 | 1996-09-17 | Zygo Corporation | Optical gap measuring apparatus and method |
Non-Patent Citations (4)
| Title |
|---|
| DORSEY, A. (u.a.), in: Precision Engineering, 1993, Bd. 5, Nr. 1, S. 29-31 * |
| GRECO, V. (u.a.), in: Rev.Sci.Instrum., 1995, Bd. 66, Nr. 7, S. 3729-3734 * |
| HEYDEMANN, P.L.M., in: Applied Optics, 1981, Bd. 20, Nr. 19, S. 3382-3384 * |
| SMYTHE, R. und MOORE, R., in: Proc. SPIE, The International Society for Optical Engineering,1983, Bd. 429, S. 16-21 * |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE102007025037B3 (de) * | 2007-05-29 | 2008-12-18 | Bundesrepublik Deutschland, vertr. d. d. Bundesministerium für Wirtschaft und Technologie, dieses vertr. d. d. Präsidenten der Physikalisch-Technischen Bundesanstalt | Verfahren zum Ermitteln eines Frequenz- und/oder Phasenunterschieds |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH09126900A (ja) | 1997-05-16 |
| JP3791975B2 (ja) | 2006-06-28 |
| US5663793A (en) | 1997-09-02 |
| DE19635907A1 (de) | 1997-03-06 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| OP8 | Request for examination as to paragraph 44 patent law | ||
| D2 | Grant after examination | ||
| 8364 | No opposition during term of opposition | ||
| 8339 | Ceased/non-payment of the annual fee |