DE19541014B4 - Antireflection coating system and method for producing an antireflection coating system - Google Patents

Antireflection coating system and method for producing an antireflection coating system

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Publication number
DE19541014B4
DE19541014B4 DE19541014A DE19541014A DE19541014B4 DE 19541014 B4 DE19541014 B4 DE 19541014B4 DE 19541014 A DE19541014 A DE 19541014A DE 19541014 A DE19541014 A DE 19541014A DE 19541014 B4 DE19541014 B4 DE 19541014B4
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layer
nitride
covering
substrate
absorption
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DE19541014A
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DE19541014A1 (en
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Joachim Dr. Szczyrbowski
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Applied Materials GmbH and Co KG
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Applied Materials GmbH and Co KG
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    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS, OR APPARATUS
    • G02B1/00Optical elements characterised by the material of which they are made
    • G02B1/10Optical coatings produced by application to, or surface treatment of, optical elements
    • G02B1/11Anti-reflection coatings
    • G02B1/113Anti-reflection coatings using inorganic layer materials only
    • G02B1/115Multilayers
    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03CCHEMICAL COMPOSITION OF GLASSES, GLAZES, OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C03C17/34Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
    • C03C17/3411Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials
    • C03C17/3429Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials at least one of the coatings being a non-oxide coating
    • C03C17/3435Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials at least one of the coatings being a non-oxide coating comprising a nitride, oxynitride, boronitride or carbonitride
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/0021Reactive sputtering or evaporation
    • C23C14/0036Reactive sputtering
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS, OR APPARATUS
    • G02B1/00Optical elements characterised by the material of which they are made
    • G02B1/10Optical coatings produced by application to, or surface treatment of, optical elements
    • G02B1/11Anti-reflection coatings
    • G02B1/113Anti-reflection coatings using inorganic layer materials only
    • G02B1/115Multilayers
    • G02B1/116Multilayers including electrically conducting layers
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS, OR APPARATUS
    • G02B1/00Optical elements characterised by the material of which they are made
    • G02B1/10Optical coatings produced by application to, or surface treatment of, optical elements
    • G02B1/16Optical coatings produced by application to, or surface treatment of, optical elements having an anti-static effect, e.g. electrically conducting coatings
    • HELECTRICITY
    • H01BASIC ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H01L31/00Semiconductor devices sensitive to infra-red radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus peculiar to the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L31/02Details
    • H01L31/0216Coatings
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05FSTATIC ELECTRICITY; NATURALLY-OCCURRING ELECTRICITY
    • H05F1/00Preventing the formation of electrostatic charges
    • H05F1/02Preventing the formation of electrostatic charges by surface treatment
    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03CCHEMICAL COMPOSITION OF GLASSES, GLAZES, OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2217/00Coatings on glass
    • C03C2217/70Properties of coatings
    • C03C2217/73Anti-reflective coatings with specific characteristics
    • C03C2217/734Anti-reflective coatings with specific characteristics comprising an alternation of high and low refractive indexes

Abstract

Coating comprising an optically active layer system for substrates, wherein the layer system has a high antireflection effect and a high light transmission or a high antireflection effect at a given light transmission, characterized in that on the substrate (2) a first, absorption-free layer (4, 12) Subsequently, a second nitride or mixed nitride absorbent layer (6) is arranged, followed by a third, non-nitride or mixed nitride coating layer (8), followed by a fourth, non-absorbent layer (10), which is composed of SiO 2 or MgF 2 or Al 2 O 3 or mixtures thereof, wherein at least one of the nitride or mixed nitride layers consists of a metal nitride or a metal mixed nitride.

Description

  • The invention relates to an optically acting layer covering consisting of a multi-layer system arranged on substrates, wherein the layer system has a high antireflection effect and a high light transmission or a high antireflection effect with a given light transmission.
  • Such antireflection coatings are preferably applied to substrates which are transparent in the visible spectrum of light, in particular glass panes, which z. B. used to protect against paintings or for use in showcases or as shop windows.
  • From the DE 41 17 257 A1 a layer system is known, which is applied to a transparent substrate and has a high antireflection effect. This on the DE 39 42 990 A1 based layer system consists essentially of deposited on the substrate in an alternating sequence of metal oxide and nitride layers. The after the DE 41 17 257 A1 produced layer systems no longer meet the high degree of transmission required today and the demands for a cost-effective production process. In particular, the TiO 2 layers proposed there can only be produced with correspondingly expensive production methods with a high manufacturing outlay, since the sputtering rate of TiO 2 in the coating method used there is approximately 5 times smaller than that for low-refraction SiO 2 .
  • The DE 39 41 797 A1 discloses an antireflective multilayer system wherein metal oxide layers and nitride layers are alternately provided.
  • Also the EP 0 564 709 A1 and US 5 091 244 A show such layer sequences of oxide layers and nitride layers in antireflection layer systems.
  • However, this layer structure is disadvantageous because of the high refractive index of the oxide layers and a possible oxidative attack of the nitride layers due to the adjacent oxide layers.
  • Object of the present invention is to provide a generic layer system and its manufacturing method, which avoids the disadvantages of the aforementioned layer systems and meets the requirements required today in terms of the anti-reflection, increasing the contrast and increasing the anti-static effect of today's layers.
  • At the same time conditions are to be created that only a small number of individual layers is needed.
  • This object is achieved by a features of the main claim exhibiting layer system. A method for producing a layer system according to the invention is given with the features listed in claim 15.
  • A layer system according to the invention consists of at least four individual layers forming a coating, which are successively applied to a light-transparent substrate by means of a vacuum-supported coating method, wherein at least two individual layers consist of a nitride or a mixed nitride and at least one of the nitride layers consists of a metal nitride or of a metal compound nitride and wherein the fourth layer is an absorption-free layer consisting of SiO 2 or MgF 2 or Al 2 O 3 or mixtures thereof. For this purpose, metal nitrides from the group of titanium nitride (TiN) and / or zirconium nitride (ZrN) (see claim 2) are preferably provided, which advantageously form both chemically and mechanically stable and hard layers. These metal nitride layers thus form an advantageous replacement for the highly refractive oxide layers previously used in classical antireflection filter layers. As a substrate material, as mentioned in claim 12, z. Glass, which has a refractive index nG of 1.46 ≤ nG ≤ 1.6.
  • Furthermore, it is envisaged that the very thin, according to the invention as claimed in claim 12, about 70 nm to 90 nm thick metal nitride layers are each embedded between two nitride layers. This embedding ensures in a surprising way that destruction of a z. B. consisting of zirconium nitride or titanium nitride layer is avoided by oxidation due to a directly attached to these layers oxide layer. This ensures a high optical stability and quality of the overall layer system over a long period of time.
  • A further advantage is that metal nitride layers having layer systems have a good antistatic effect, resulting in a significant reduction or prevention of electrostatic charges, such as this z. B. might occur in television CRTs otherwise causes.
  • As indicated in the dependent claims 8, an inventive layer system comprises z. B. five individual layers, which are successively applied to a substrate by means of a sputtering method according to claim 15. According to claim 10, it is provided that to improve the adhesion of the nitride layers on an underlying oxide layer, the nitride layer is deposited on the oxide layer by means of a primer layer, which preferably consists of nickel-chromium nitride (NiCrN) and a layer thickness of preferably 1 nm to 25 nm has (see claim 11).
  • To produce a layer system according to the invention by means of a sputtering method, it is provided to use a double magnetron operated electrically with a medium-frequency power supply in the frequency range from 20 kHz to 70 kHz, which enables an advantageous, inexpensive and high-quality layer production. Typical process chamber pressures for layer production are in a pressure range of 1 × 10 -3 mbar to 8 × 10 -3 mbar. Depending on the type of layer to be applied, the process gas consists of a noble gas, preferably argon, and a reactive gas, preferably nitrogen or oxygen.
  • A further advantage of a layer produced according to the invention consists in the overall thickness of only about 100 nm, which is small compared to conventionally produced layer systems. In comparison, classic antireflective coating systems have overall thicknesses of about 240 nm to 350 nm layer thickness, which are therefore more expensive to produce. because the sputtering rate of high refractive index material like TiO 2 is very small compared to SiO 2 . ZrN and TiN have comparable rates to TiO 2 , but the layer thickness required according to the invention becomes much lower with the same effect; z. For example, a conventionally used TiO 2 layer has a thickness of about 100 nm, whereas a ZrN or TiN layer has a thickness of only 10 nm.
  • Further advantageous features of the invention are specified in the subclaims.
  • Hereinafter, particularly advantageous embodiments are described in the figures.
  • Show it:
  • 1 a cross section of an existing of four individual layers, applied to a substrate layer system,
  • 2 a cross-section through a layer system consisting of four individual layers,
  • 3 a cross-sectional view of a layer system consisting of five individual layers,
  • 4 a cross-sectional view of a layer system consisting of five individual layers,
  • 5 a Transmissonsgrad- or reflectance curve as a function of the wavelength of light for a four-layer layers system according to a first embodiment,
  • 6 a Transmissonsgrad- or reflectance curve as a function of the incident light wavelength of a four-layer coatings layer system according to a second embodiment and
  • 7 a transmittance or reflectance curve as a function of the light wavelength of a layer system consisting of five individual layers.
  • The in the 1 to 4 Layer systems shown consist of four, as in the 1 and 2 reproduced, or from five (see 3 ) or six (see 4 ) on a substrate 2 by means of a vacuum-supported coating process applied individual layers 4 . 6 . 8th . 10 . 12 . 14 ,
  • The shift system 1 of the first embodiment (see 1 ) is structured as follows:
    • - On the front side 16 of the substrate 2 is a first, absorption-free layer 4 applied, which consists of Si 3 N 4 or AlN and has a layer thickness of 20 nm to 24 nm,
    • - The second optically active layer 6 consists of a 7 nm to 9 nm thick ZrN or TiN layer,
    • The third optically active layer 8th consists of an absorption-free Si 3 N 4 or AlN layer, which has a layer thickness of 1.5 nm to 2.5 nm,
    • - The fourth optically active layer 10 consists of an absorption-free layer of SiO 2 or MgF 2 or of Al 2 O 3 and has a layer thickness of 60 nm to 100 nm.
  • The shift system of the second, in 2 illustrated embodiment is constructed as follows:
    • - The first, immediately on the front 16 of the substrate 2 applied layer 12 consists of TiO 2 or Ta 2 O 5 and has a layer thickness of 20 nm to 24 nm,
    • - The second optically active layer 6 consists of ZrN or TiN and has a layer thickness of 7 nm to 9 nm,
    • The third optically active layer 8th consists of Si 3 N 4 or AlN and has a layer thickness of 1.5 nm to 2.5 nm,
    • - The fourth optically active layer 10 consists of SiO 2 or of MgF 2 or of Al 2 O 3 and has a layer thickness of 60 nm to 100 nm.
  • The shift system of the third, in 3 illustrated embodiment is constructed as follows:
    • - The directly on the substrate 2 applied first layer 12 consists of an absorption-free, consisting of TiO 2 or Ta 2 O 5 oxide layer with a layer thickness of 20 nm to 24 nm,
    • - on the first layer 12 applied second layer 4 consists of Si 3 N 4 or of AlN and has a layer thickness of 20 nm to 24 nm,
    • The third optically active layer 6 consists of ZrN or TiN and has a layer thickness of 7 nm to 9 nm,
    • The fourth optically active layer is an absorption-free nitride layer consisting of Si 3 N 4 or AlN and having a layer thickness of 1.5 nm to 2.5 nm,
    • As the fifth layer is an absorption-free layer consisting of SiO 2 or of MgF 2 or Al 2 O 3 10 provided, which has a layer thickness of 60 nm to 100 nm.
  • The shift system of the fourth, in 4 illustrated embodiment has a total of six layers and is constructed as follows:
    • - As a first shift 12 is an absorption-free oxide layer consisting of TiO 2 or Ta 2 O 5 , provided with a layer thickness of 20 nm to 24 nm, on which a
    • Second adhesion promoter layer consisting of nickel-chromium-nitride is applied, which has a layer thickness of 1 nm to 3 nm,
    • - As the second optically active layer is an absorption-free, consisting of Si 3 N 4 or AlN nitride layer 4 provided, which has a layer thickness of 20 nm to 24 nm, to which
    • A third optically active and absorbing nitride layer 6 is applied, which consists of ZrN or TiN and has a layer thickness of 7 nm to 9 nm, to which
    • A fourth optically active, absorption-free nitride layer 8th consisting of Si 3 N 4 or AlN, is applied in a layer thickness of 1.5 nm to 2.5 nm and off
    • - A fifth optically active layer 10 which consists of SiO 2 or MgF 2 or of Al 2 O 3 and has a layer thickness of 60 nm to 100 nm.
  • The substrate 2 In the aforementioned four embodiments consists of glass, in particular of float glass, mineral glass or Plexiglas, and has a refractive index n G of 1.46 ≤ n G ≤ 1.6, preferably of n G = 1.52. The essential light-optical properties of the parameters defined by the layer sequence and the respective layer thickness form the degree of reflection or transmittance as a function of the incident light wavelength. The basic idea of the invention thus permits a plurality of exemplary embodiments or layer systems, which are characterized in the three examples described below by the choice of the layer materials and layer thicknesses mentioned. Shown are coating systems in which the reflectance and the transmittance in the visible wavelength range of the light was measured.
  • The measurement results are graphically based on curves in the 5 . 6 and 7 shown. In the description of the 6 underlying layer system, the reference numbers of the description of the 1 used and in the description of in 7 layer system shown are the reference numerals of the description of 3 used.
  • The layer system of the first example is constructed as follows:
    substratum 2 : Material glass, thickness: 2 mm;
    layer 4 : Material Si 3 N 4 , layer thickness 22 nm;
    layer 6 : Material ZrN, layer thickness 8 nm;
    layer 8th : Material Si 3 N 4 , layer thickness 6 nm;
    layer 10 : Material SiO 2 , layer thickness 76 nm.
  • In the 4 With 14 designated adhesive layer is not present in this embodiment.
  • For this layer system, the degree of reflection or transmittance in percent over a wavelength range of 400 nm to 700 nm is specified.
  • In the following, the measurement results for the reflection and the transmission in Table 1 are compared with specific wavelengths: TABLE 1 Wavelength (μm) Reflectance (%) Transmittance (%) 0.688 79.6 0.45 0.652 81.4 0.22 0,620 82.96 0.13 0,590 84.32 0.11 0.563 85.32 0.13 0,339 86,60 0.16 0.516 87.58 0.18 0,496 89.49 0.19 0.477 89.31 0.21 0.459 90.04 0.23 0.443 90.69 0.29 0.427 91.22 0.39 0.413 91.64 0.56 0,400 91.92 0.83
  • The results of the measurements are shown as curves in 5 shown graphically. To guide the eye, the individual measuring points are connected to each other. On the abscissa of the coordinate system in 5 the wavelengths are entered in μm. On the left ordinate of the curve diagram are the measured values for the reflectance and on the right ordinate of the coordinate system the percentage values for the transmittance are entered.
  • From the course of the reflection curve it can be seen that in the core wavelength range from 420 nm to 680 nm, the reflectance is far less than 0.5%. This desired high antireflection effect corresponds to the profile of the transmittance curve having high values over the range of wavelengths mentioned. Thus, the layer system has high transmittance values between 80% and 90% in the stated wavelength range.
  • The shift system of the second, in 2 illustrated example, is constructed as follows:
    substratum 2 : Material glass, thickness 2 mm;
    layer 12 : Material TiO 2 , layer thickness 12 nm;
    layer 6 : Material ZrN, layer thickness 10 nm;
    layer 8th : Material Si 3 N 4 , layer thickness 10 nm;
    layer 10 : Material SiO 2 , layer thickness 74 nm.
  • The reflection and transmission behavior of this layer system is in the wavelength range of 400 nm to 688 nm in 6 applied as a function of the light wavelength. The the the 6 underlying reflection and transmission values are compared in Table 2: Table 2 Wavelength (μm) Reflectance (%) Transmittance (%) 0.688 75.39 0.38 0.652 77.47 0.13 0,620 79.25 0.05 0,590 80.83 0.07 0.563 82.23 0.12 0.539 83.52 0.16 0.516 94.72 0.17 0,496 85.85 0.16 0.477 86.91 0.12 0.459 87.87 0.09 0.443 83.73 0.08 0.427 89.46 0.15 0.413 90.02 0.33 0,400 90.40 0.65
  • From the light wavelength dependent behavior of in 6 plotted reflection curve can be seen that this has very low reflection values of less than 0.2% in the interval from 420 nm to 660 nm in the optically visible range. Only for light wavelengths shorter than 400 nm or at wavelengths greater than 700 nm, the reflectance is greater than 0.5%. The transmission behavior of the latter layer system is determined by a high transmittance of over 90% at 400 nm and falls to higher wavelengths to about 75% at 688 nm substantially linear.
  • A light wavelength-dependent transmission and reflection behavior similar to the second example is shown in FIG 3 illustrated third exemplary layer system. This latter layer system consists of the following layer structure:
    substratum 2 : Material glass, thickness 2 mm;
    layer 12 : Material TiO 2 , layer thickness 10 nm;
    layer 6 : Material Si 3 O 4 , layer thickness 2 nm;
    layer 6 : Material ZrN, layer thickness 10 nm;
    layer 8th : Material Si 3 N 4 , layer thickness 10 nm;
    layer 10 : Material SiO 2 , layer thickness 75 nm.
  • In comparison to the layer system described in the second example, this layer covering has a further layer consisting of Si 3 N 4 . The transmission and reflectivity of the layer system according to Example 3 is as a function of the wavelength of light in 7 shown. A comparison of the functional courses with those in the 6 shows that the reflection and transmission behavior is similar to that of the layer system presented in Example 2. As in the case of the layer system according to Example 3, a very low degree of reflection and a high degree of transmittance over the optically visible light wavelength range are realized as desired. The the 7 underlying reflection and transmission values are listed in Table 3 below. Table 3 Wavelength (μm) Reflectance (%) Transmittance (%) 0.688 75.81 0.39 0.652 77.86 0.14 0,620 79.64 0.06 0,590 81.19 0.07 0.563 82.59 0.11 0.539 93.86 0.16 0.516 85.04 0.17 0,496 86.15 0.16 0.477 87.18 0.13 0.459 88.13 0.10 0.443 88.97 0.10 0.427 89.68 0.17 0.413 90.23 0.35 0,400 90,60 0.66
  • The layer systems with which the transmission and reflection values mentioned above in Examples 1 to 3 were obtained were prepared by the method described below. Depending on the optical layer to be deposited, titanium, zirconium, silicon, aluminum, tantalum or nickel chromium were selected as the target material in a reactive gas atmosphere of about 5 × 10 -3 mbar. Using noble gas with the addition of a reactive gas, such as. As an Ar / N gas mixture was sputtered from the target surface under sputtering Targetsubstanzmaterial which is located on the substrate to be coated 2 as a chemical compound, such as. As ZrN or Si 3 N 4 , precipitates and forms as a closed single layer. By temporal sequence of the sputtering process on different target materials individual layers consisting of different chemical elements consisting of individual layers are successively constructed to form a layer system which has the optically active properties mentioned.
  • On the coated side of the layer systems, in each case the sheet resistance R □ was measured to be R ≦ ≦ 5 kΩ / □. The static charge of the coated surfaces is reduced by grounding the same or even completely eliminated. This achieves the desired antistatic effect.
  • LIST OF REFERENCE NUMBERS
  • 1
    Coating, layer system
    2
    Substrate, glass
    4
    first shift
    6
    second layer
    8th
    third layer
    10
    fourth layer, topcoat
    12
    oxide
    14
    Bonding layer
    15
    back
    16
    front

Claims (22)

  1. Coating consisting of an optically active layer system for substrates, wherein the layer system has a high antireflection effect and a high light transmission or a high antireflection effect with a given light transmission, characterized in that on the substrate ( 2 ) a first, absorption-free layer ( 4 . 12 ), followed by a second, nitride or mixed nitride absorbent layer ( 6 ), followed by a third, absorption-free nitride or mixed nitride layer ( 8th ) followed by a fourth, absorption-free layer ( 10 ), which consists of SiO 2 or MgF 2 or Al 2 O 3 or mixtures thereof, wherein at least one of the nitride or mixed nitride layers consists of a metal nitride or a metal mixed nitride.
  2. Covering according to Claim 1, characterized in that the second, nitride-absorbing layer ( 6 ) consists of ZrN and / or TiN.
  3. Covering according to claim 1 or 2, characterized in that the third absorption-free nitride layer ( 8th ) consists of Si 3 N 4 or AlN.
  4. Covering according to one of claims 1 to 3, characterized in that the first, on the substrate ( 2 ) layer ( 4 ) a nitride layer ( 4 ).
  5. Covering according to claim 4, characterized in that the nitride layer ( 4 ) consists of Si 3 N 4 or AlN.
  6. Covering according to one of claims 1 to 3, characterized in that the first, on the substrate ( 2 ) layer ( 12 ) is an oxide layer.
  7. Covering according to claim 6, characterized in that the first oxide layer ( 12 ) consists of TiO 2 or Ta 2 O 5 .
  8. Covering according to one of the preceding claims, characterized in that between the first absorption-free layer ( 12 ) and the second absorbent nitride layer ( 6 ) an absorption-free nitride layer ( 4 ), wherein the first absorption-free layer is an oxide layer.
  9. Covering according to claim 8, characterized in that the absorption-free nitride layer ( 4 ) consists of Si 3 N 4 or AlN.
  10. Covering according to one of claims 1 to 9, characterized in that between the nitride layer and an underlying oxide layer, a primer layer ( 14 ) is arranged.
  11. Covering according to claim 10, characterized in that the adhesive layer ( 14 ) consists of nickel chromium nitride (NiCrN) and has a layer thickness of 1 nm to 2.5 nm.
  12. Covering according to one of the preceding claims, characterized in that the substrate ( 2 ) of glass having a refractive index n G of 1.46 ≦ n G ≦ 1.60, and wherein the first layer deposited on the substrate ( 4 ) consists of Si 3 N 4 and has a layer thickness of 200 nm up to 240 nm, that the second layer ( 6 ) consists of ZrN and has a layer thickness of 70 to 90 nm and that the third layer ( 8th ) consists of Si 3 N 4 and has a layer thickness of 1.5 nm to 2.5 nm and wherein the fourth layer ( 10 ) consists of SiO 2 and has a layer thickness of 70 nm to 80 nm.
  13. Covering according to claim 12, characterized in that the refractive index n G = 1.52.
  14. Covering according to one of claims 1 to 13, characterized in that the layer system ( 1 ) has a sheet resistance R von of R ≦ 5kΩ / □.
  15. Process for producing a coating according to one of Claims 1 to 14, characterized in that the individual layers ( 4 . 6 . 8th . 10 . 12 ) are produced by means of a sputtering process.
  16. A method according to claim 15, characterized in that a reactive sputtering method using a double magnetron operated with a medium frequency power supply is used.
  17. A method according to claim 15 or 16, characterized in that for coating a substrate ( 2 ) by reactive sputtering from a silicon target using a double magnetron electrically driven with a center frequency generator, a layer of Si 3 N 4 in the presence of a sputtering gas mixture comprising argon gas and nitrogen gas at a process chamber pressure p of 1 × 10 -3 mbar ≤ p ≤ 8 × 10 -3 mbar on the substrate ( 2 ) is deposited.
  18. Method according to one of claims 15 to 17, characterized in that by reactive sputtering of a silicon target with one of a medium frequency generator at a current frequency of 30 kHz a layer of SiO 2 is formed in the presence of a sputtering gas mixture comprising Ar and O 2 to 60 kHz electrically powered double magnetron, wherein the process chamber pressure p in a range of 1 × 10 -3 mbar ≤ p ≤ 8 × 10 -3 mbar.
  19. Method according to one of claims 15 to 18, characterized in that by reactive sputtering of an aluminum target using a double magnetron electrically powered by a medium frequency generator, a layer of Al 2 O 3 in the presence of a Sputtergasgemisches comprising Ar and O 2 , at a process chamber pressure p of 1 × 10 -3 mbar ≦ p ≦ 8 × 10 -3 mbar on the substrate ( 2 ) is formed.
  20. Method according to one of claims 16 to 19, characterized in that the double magnetron is operated at a current frequency of 30 kHz to 60 kHz.
  21. Method according to one of claims 15 to 20, characterized in that the substrate ( 2 ) consists of glass.
  22. A method according to claim 21, characterized in that the glass is used as float glass.
DE19541014A 1995-11-03 1995-11-03 Antireflection coating system and method for producing an antireflection coating system Expired - Fee Related DE19541014B4 (en)

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Publication number Priority date Publication date Assignee Title
TW347369B (en) * 1996-12-17 1998-12-11 Asahi Glass Co Ltd Organic substrate provided with a light absorptive antireflection film and process for production
US6881487B2 (en) 2002-11-15 2005-04-19 Guardian Industries Corp. Heat treatable coated articles with zirconium or zirconium nitride layer and methods of making same
WO2005097697A1 (en) * 2004-04-03 2005-10-20 Applied Materials Gmbh & Co. Kg Glass coating
RU2608858C2 (en) * 2015-06-17 2017-01-25 Открытое акционерное общество "Ракетно-космическая корпорация "Энергия" имени С.П. Королёва" (ОАО "РКК "Энергия") Glass with optically transparent protective coating and method of its production

Citations (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3941797A1 (en) * 1989-12-19 1991-06-20 Leybold Ag Belag, consisting of an optical layer system, for substrates, in which the layer system in particular has a high anti-flexible effect, and method for producing the laminate
DE3942990A1 (en) * 1989-12-19 1991-06-20 Leybold Ag Anti-reflection coating for transparent substrates - comprises 1st layer of dielectric metal oxide, nitride 2nd layer, and 3rd layer of dielectric metal oxide
US5091244A (en) * 1990-08-10 1992-02-25 Viratec Thin Films, Inc. Electrically-conductive, light-attenuating antireflection coating
EP0530672A1 (en) * 1991-08-30 1993-03-10 Lutz Lange Washable filter
WO1993004993A1 (en) * 1991-09-03 1993-03-18 Viratec Thin Films, Inc. An electrically-conductive, light-attenuating antireflection coating
EP0564709A1 (en) * 1991-12-13 1993-10-13 Balzers Aktiengesellschaft Coated transparent substrate, use thereof, method and apparatus of manufacturing such coatings, and hafnium-oxynitride HfOxNy with 1.5 x/y 3 and 2.6 n 2.8
US5298048A (en) * 1991-12-09 1994-03-29 Guardian Industries Corp. Heat treatable sputter-coated glass systems
US5342675A (en) * 1991-02-21 1994-08-30 Nippon Sheet Glass Co., Ltd. Heat-screening glass

Patent Citations (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3941797A1 (en) * 1989-12-19 1991-06-20 Leybold Ag Belag, consisting of an optical layer system, for substrates, in which the layer system in particular has a high anti-flexible effect, and method for producing the laminate
DE3942990A1 (en) * 1989-12-19 1991-06-20 Leybold Ag Anti-reflection coating for transparent substrates - comprises 1st layer of dielectric metal oxide, nitride 2nd layer, and 3rd layer of dielectric metal oxide
US5091244A (en) * 1990-08-10 1992-02-25 Viratec Thin Films, Inc. Electrically-conductive, light-attenuating antireflection coating
US5342675A (en) * 1991-02-21 1994-08-30 Nippon Sheet Glass Co., Ltd. Heat-screening glass
EP0530672A1 (en) * 1991-08-30 1993-03-10 Lutz Lange Washable filter
WO1993004993A1 (en) * 1991-09-03 1993-03-18 Viratec Thin Films, Inc. An electrically-conductive, light-attenuating antireflection coating
US5298048A (en) * 1991-12-09 1994-03-29 Guardian Industries Corp. Heat treatable sputter-coated glass systems
EP0564709A1 (en) * 1991-12-13 1993-10-13 Balzers Aktiengesellschaft Coated transparent substrate, use thereof, method and apparatus of manufacturing such coatings, and hafnium-oxynitride HfOxNy with 1.5 x/y 3 and 2.6 n 2.8

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