DE1800663B2 - - Google Patents
Info
- Publication number
- DE1800663B2 DE1800663B2 DE19681800663 DE1800663A DE1800663B2 DE 1800663 B2 DE1800663 B2 DE 1800663B2 DE 19681800663 DE19681800663 DE 19681800663 DE 1800663 A DE1800663 A DE 1800663A DE 1800663 B2 DE1800663 B2 DE 1800663B2
- Authority
- DE
- Germany
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Withdrawn
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J31/00—Cathode ray tubes; Electron beam tubes
- H01J31/02—Cathode ray tubes; Electron beam tubes having one or more output electrodes which may be impacted selectively by the ray or beam, and onto, from, or over which the ray or beam may be deflected or de-focused
- H01J31/06—Cathode ray tubes; Electron beam tubes having one or more output electrodes which may be impacted selectively by the ray or beam, and onto, from, or over which the ray or beam may be deflected or de-focused with more than two output electrodes, e.g. for multiple switching or counting
- H01J31/065—Cathode ray tubes; Electron beam tubes having one or more output electrodes which may be impacted selectively by the ray or beam, and onto, from, or over which the ray or beam may be deflected or de-focused with more than two output electrodes, e.g. for multiple switching or counting for electrography or electrophotography, for transferring a charge pattern through the faceplate
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03G—ELECTROGRAPHY; ELECTROPHOTOGRAPHY; MAGNETOGRAPHY
- G03G15/00—Apparatus for electrographic processes using a charge pattern
- G03G15/22—Apparatus for electrographic processes using a charge pattern involving the combination of more than one step according to groups G03G13/02 - G03G13/20
- G03G15/32—Apparatus for electrographic processes using a charge pattern involving the combination of more than one step according to groups G03G13/02 - G03G13/20 in which the charge pattern is formed dotwise, e.g. by a thermal head
- G03G15/321—Apparatus for electrographic processes using a charge pattern involving the combination of more than one step according to groups G03G13/02 - G03G13/20 in which the charge pattern is formed dotwise, e.g. by a thermal head by charge transfer onto the recording material in accordance with the image
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03G—ELECTROGRAPHY; ELECTROPHOTOGRAPHY; MAGNETOGRAPHY
- G03G9/00—Developers
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J5/00—Details relating to vessels or to leading-in conductors common to two or more basic types of discharge tubes or lamps
- H01J5/02—Vessels; Containers; Shields associated therewith; Vacuum locks
- H01J5/18—Windows permeable to X-rays, gamma-rays, or particles
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Physical Vapour Deposition (AREA)
- Measurement Of Radiation (AREA)
- Printing Plates And Materials Therefor (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP6419367 | 1967-10-03 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| DE1800663A1 DE1800663A1 (de) | 1969-06-04 |
| DE1800663B2 true DE1800663B2 (enrdf_load_stackoverflow) | 1970-11-19 |
Family
ID=13250970
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| DE19681800663 Withdrawn DE1800663A1 (de) | 1967-10-03 | 1968-10-02 | Fuer Elektronenstrahlen durchlaessige Vorrichtung und Verfahren zu deren Herstellung |
Country Status (5)
| Country | Link |
|---|---|
| US (1) | US3607680A (enrdf_load_stackoverflow) |
| DE (1) | DE1800663A1 (enrdf_load_stackoverflow) |
| FR (1) | FR1585727A (enrdf_load_stackoverflow) |
| GB (1) | GB1239296A (enrdf_load_stackoverflow) |
| NL (1) | NL6814069A (enrdf_load_stackoverflow) |
Families Citing this family (20)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3715288A (en) * | 1970-11-10 | 1973-02-06 | Sensors Inc | Method of fabricating film-type sensing structures |
| US3850762A (en) * | 1973-08-13 | 1974-11-26 | Boeing Co | Process for producing an anodic aluminum oxide membrane |
| US4468282A (en) * | 1982-11-22 | 1984-08-28 | Hewlett-Packard Company | Method of making an electron beam window |
| US4455561A (en) * | 1982-11-22 | 1984-06-19 | Hewlett-Packard Company | Electron beam driven ink jet printer |
| US4494036A (en) * | 1982-11-22 | 1985-01-15 | Hewlett-Packard Company | Electron beam window |
| US4659429A (en) * | 1983-08-03 | 1987-04-21 | Cornell Research Foundation, Inc. | Method and apparatus for production and use of nanometer scale light beams |
| US4662747A (en) * | 1983-08-03 | 1987-05-05 | Cornell Research Foundation, Inc. | Method and apparatus for production and use of nanometer scale light beams |
| US4917462A (en) * | 1988-06-15 | 1990-04-17 | Cornell Research Foundation, Inc. | Near field scanning optical microscopy |
| FI885554L (fi) * | 1988-11-30 | 1990-05-31 | Outokumpu Oy | Indikationsfoenster foer analysator och dess framstaellningsfoerfarande. |
| DE4219562C1 (enrdf_load_stackoverflow) * | 1992-06-15 | 1993-07-15 | Fraunhofer-Gesellschaft Zur Foerderung Der Angewandten Forschung Ev, 8000 Muenchen, De | |
| US5612588A (en) * | 1993-05-26 | 1997-03-18 | American International Technologies, Inc. | Electron beam device with single crystal window and expansion-matched anode |
| US5659223A (en) * | 1995-07-14 | 1997-08-19 | Science Research Laboratory, Inc. | System for extracting a high power beam comprising air dynamic and foil windows |
| KR20000016521A (ko) | 1996-06-12 | 2000-03-25 | 워칼로 푸로스 죠지 | 박막의 모노리틱형 실리콘 막에 의해 형성된 윈도우 영역을 포함하는 애노드를 갖는 화학 방사선 소스 |
| US7030619B2 (en) * | 2004-02-19 | 2006-04-18 | Brooks Automation, Inc. | Ionization gauge |
| US7295015B2 (en) * | 2004-02-19 | 2007-11-13 | Brooks Automation, Inc. | Ionization gauge |
| US20090160309A1 (en) * | 2005-10-15 | 2009-06-25 | Dirk Burth | Electron beam exit window |
| US7768267B2 (en) * | 2007-07-11 | 2010-08-03 | Brooks Automation, Inc. | Ionization gauge with a cold electron source |
| WO2011011278A1 (en) * | 2009-07-20 | 2011-01-27 | Advanced Electron Beams, Inc. | Emitter exit window |
| US8907554B2 (en) * | 2010-02-08 | 2014-12-09 | Tetra Laval Holdings & Finance S.A. | Assembly and method for reducing foil wrinkles |
| US9384934B2 (en) * | 2010-12-02 | 2016-07-05 | Tetra Laval Holdings & Finance S.A. | Electron exit window foil |
-
1968
- 1968-09-24 US US762047A patent/US3607680A/en not_active Expired - Lifetime
- 1968-09-30 FR FR1585727D patent/FR1585727A/fr not_active Expired
- 1968-10-01 GB GB1239296D patent/GB1239296A/en not_active Expired
- 1968-10-02 DE DE19681800663 patent/DE1800663A1/de not_active Withdrawn
- 1968-10-02 NL NL6814069A patent/NL6814069A/xx unknown
Also Published As
| Publication number | Publication date |
|---|---|
| NL6814069A (enrdf_load_stackoverflow) | 1969-04-09 |
| DE1800663A1 (de) | 1969-06-04 |
| US3607680A (en) | 1971-09-21 |
| FR1585727A (enrdf_load_stackoverflow) | 1970-01-30 |
| GB1239296A (enrdf_load_stackoverflow) | 1971-07-14 |
Similar Documents
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| E77 | Valid patent as to the heymanns-index 1977 | ||
| EHJ | Ceased/non-payment of the annual fee |